CN101609811B - Method for manufacturing integrated circuit - Google Patents
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- 238000004220 aggregation Methods 0.000 claims abstract description 11
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- 239000002184 metal Substances 0.000 claims description 4
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- 101150085270 cut7 gene Proteins 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
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Abstract
Description
技术领域 technical field
本发明是有关于一种集成电路设计及布局(Integrated Circuit Design andLayout)技术,特别是指一种具备光掩模(mask)再利用性的集成电路制作方法。The present invention relates to an Integrated Circuit Design and Layout technology, in particular to an integrated circuit manufacturing method with photomask reusability.
背景技术 Background technique
在许多系统应用中,经常会使用多个功能相似的硬件单元来增强工作效能。例如,通讯系统通过增加接收器个数提升接收能力;电脑系统以多个处理器来加快运算速度并提高可承载运算能力。其中,各个系统所需硬件单元的数目随应用层次和目的而不同。In many system applications, multiple hardware units with similar functions are often used to enhance work performance. For example, the communication system improves the receiving capacity by increasing the number of receivers; the computer system uses multiple processors to speed up the calculation speed and increase the loadable calculation capacity. Among them, the number of hardware units required by each system varies with the application level and purpose.
已知用以提供不同硬件单元数目的方法有三:Three methods are known to provide different numbers of hardware units:
第一种方法,是利用单一套光掩模制作包含硬件单元的管芯(die),然后依据实际应用将多个管芯封装(package)成包含期望硬件单元数目的芯片。如此虽可大幅降低光掩模费用,但是硬件单元间的沟通将受限于每一管芯的焊垫(pad)数目,且传送速度也受影响。除此之外,封装成本也将相对提高许多。The first method is to use a single set of photomasks to fabricate dies including hardware units, and then package multiple dies into chips including a desired number of hardware units according to actual applications. Although the photomask cost can be greatly reduced in this way, the communication between hardware units will be limited by the number of pads per die, and the transmission speed will also be affected. In addition, the packaging cost will also be relatively higher.
第二种方法,是针对每一需要不同硬件单元数目的用途,分别制作一套光掩模来生产对应芯片(chip)。虽然较不用担心硬件单元间的沟通,但是下单多套光掩模并不符经济效益。The second method is to manufacture a set of photomasks to produce corresponding chips for each application requiring different numbers of hardware units. Although less of a concern for communication between hardware units, it is not economical to order multiple sets of photomasks.
第三种方法,是以一套光掩模生产包含硬件单元的芯片,然后视情况在印刷电路板(Printed Circuit Board,简称PCB)上设置期望数目的芯片。这样的方法虽然可以简化光掩模和封装的下单,但是实际应用时硬件单元间的沟通仍会受到每一芯片的接脚(pin)的限制,且所费封装成本也不低。The third method is to produce chips containing hardware units with a set of photomasks, and then set a desired number of chips on a Printed Circuit Board (PCB) as the case may be. Although such a method can simplify the ordering of photomasks and packaging, the communication between hardware units is still limited by the pins of each chip in actual application, and the packaging cost is not low.
发明内容 Contents of the invention
因此,本发明的目的,即在于提供一种可以降低光掩模和封装成本的集成电路制作方法,能重复利用光掩模来生产多种包含不同硬件单元数目的芯片,且不使硬件单元间的沟通受到过多限制。Therefore, the object of the present invention is to provide a method for manufacturing integrated circuits that can reduce the cost of photomasks and packaging, and can reuse photomasks to produce a variety of chips that include different numbers of hardware units without making the difference between hardware units communication is too limited.
于是,本发明集成电路制作方法包含以下步骤:在多个硬件单元整合布线的S层电路布局中,将同一硬件单元的电路布线分布于每层的相对相同位置;将每层的相对相同位置形成聚集电路,并于其中的C层至少以沟通布线连接同一层的不同硬件单元的聚集电路;及将每个沟通布线集中于其中C层的另一个相对相同位置,且C为小于S的正整数;其中,该另一个相对相同位置至少包含一切割道以上的宽度,且该切割道是否切割将决定所产生的管芯数目以及每一管芯所包含的硬件单元数目。Therefore, the integrated circuit manufacturing method of the present invention includes the following steps: in the S-layer circuit layout of integrated wiring of multiple hardware units, distributing the circuit wiring of the same hardware unit at the relatively same position of each layer; forming the relatively same position of each layer Aggregating circuits, and at least connecting different hardware units of the same layer with communication wiring on the C layer; and concentrating each communication wiring on another relatively identical position of the C layer, and C is a positive integer less than S ; Wherein, the other relatively same position includes at least a width of more than one dicing line, and whether the dicing line is cut or not will determine the number of dies produced and the number of hardware units included in each die.
附图说明 Description of drawings
图1是一示意图,说明属于同一硬件单元的电路布线分布于S层电路布局的相对相同位置;FIG. 1 is a schematic diagram illustrating that the circuit wiring belonging to the same hardware unit is distributed in the relatively same position of the S-layer circuit layout;
图2是一示意图,说明管芯包含多个模块,且每个模块间预留适当宽度的切割道;FIG. 2 is a schematic diagram illustrating that the die includes a plurality of modules, and dicing lanes of appropriate width are reserved between each module;
图3是一示意图,说明管芯受一道额外切割所切割;Figure 3 is a schematic diagram illustrating a die being cut by an additional cut;
图4是一示意图,说明管芯受二道额外切割所切割;FIG. 4 is a schematic diagram illustrating that a die is cut by two additional cuts;
图5是一示意图,说明管芯受二道额外切割而形成分别包含一个硬件单元的切割区块;及5 is a schematic diagram illustrating that the die is subjected to two additional dicing to form dicing blocks each including a hardware unit; and
图6是一示意图,说明管芯受二道额外切割而形成分别包含一、二、四个硬件单元的切割区块。FIG. 6 is a schematic diagram illustrating that a die is subjected to two additional dicing operations to form dicing blocks comprising one, two, and four hardware units, respectively.
【主要元件符号说明】[Description of main component symbols]
1:管芯1: Die
11:模块11: module
111:输入输出焊垫111: Input and output pads
12:模块12: Module
121:输入输出焊垫121: Input and output pads
13:模块13: Module
131:输入输出焊垫131: Input and output pads
14:模块14: module
141:输入输出焊垫141: Input and output pads
15:信号连接15: Signal connection
2:管芯2: die
cut1~7:额外切割cut1~7: extra cutting
unit1~4:硬件单元unit1~4: hardware unit
Cmass1~4:聚集电路C mass1~4 : Gathering circuit
Punit1~4:位置P unit1~4 : position
Pconnect:位置P connect : position
具体实施方式 Detailed ways
有关本发明的前述及其他技术内容、特点与功效,在以下配合参考附图示出的二个优选实施例的详细说明中,将可清楚的呈现。The aforementioned and other technical contents, features and effects of the present invention will be clearly presented in the following detailed description of two preferred embodiments shown with reference to the accompanying drawings.
在本发明被详细描述之前,要注意的是,在以下的说明内容中,类似的元件是以相同的编号来表示。Before the present invention is described in detail, it should be noted that in the following description, similar elements are denoted by the same reference numerals.
本发明集成电路制作方法的优选实施例适用于生产多种包含不同硬件单元数目的芯片,且每一硬件单元皆可独立或合并运作,例如:每一硬件单元可作为无线通讯系统的接收器。主要原理在于先将多个功能相似的硬件单元整合布线(routing)在S层电路布局(layout)中,然后经光掩模制作和芯片加工后,再将其切割并封装成包含期望数目的硬件单元的芯片。The preferred embodiment of the integrated circuit manufacturing method of the present invention is suitable for producing a variety of chips including different numbers of hardware units, and each hardware unit can operate independently or combined, for example: each hardware unit can be used as a receiver of a wireless communication system. The main principle is to integrate and route multiple hardware units with similar functions in the S-layer circuit layout (layout), and then after photomask fabrication and chip processing, it is cut and packaged to contain the desired number of hardware unit chip.
【第一优选实施例】【The first preferred embodiment】
请参阅图1,在电路布局时,使属于同一硬件单元unit1、unit2、unit3、unit4的电路布线分布于该S层电路布局的相对相同位置Punit1、Punit2、Punit3、Punit4,并集合每层的相对相同位置Punit1~4形成聚集电路Cmass1、Cmass2、Cmass3、Cmass4。于其中的C层,至少以沟通布线连接同一层的不同硬件单元unit1~4的聚集电路Cmass1~4,并将每个沟通布线集中于其中C层的另一个相对相同位置Pconnect,且C为小于S的正整数。而该另一个相对相同位置Pconnect至少包含一切割道以上的宽度,且该切割道是否切割将决定所产生的管芯(die)数目以及每一管芯所包含的硬件单元数目。Please refer to Figure 1. During the circuit layout, the circuit wiring belonging to the same hardware unit unit1, unit2, unit3, and unit4 is distributed in the relatively same position P unit1 , P unit2 , P unit3 , and P unit4 of the S-layer circuit layout, and assembled Relatively same positions P unit1-4 of each layer form aggregation circuits C mass1 , C mass2 , C mass3 , C mass4 . In the C layer, at least the aggregation circuits C mass1~ 4 of the different hardware units unit1~4 on the same layer are connected by communication wiring, and each communication wiring is concentrated in another relatively same position P connect of the C layer, and C is a positive integer less than S. The other relative to the same position P connect includes at least a width of more than one dicing line, and whether the dicing line is cut or not will determine the number of dies produced and the number of hardware units included in each die.
此外,这些聚集电路Cmass1~4的安置(place)间隔必须符合芯片切割规则,以使不同聚集电路Cmass1~4间预留适当宽度的切割道,确保之后的切割作业不令硬件单元unit1~4效能受损坏。这样的做法不同于一般布局所采用的任意布线方式。In addition, the placement (place) intervals of these aggregation circuits C mass1-4 must conform to the chip cutting rules, so that different aggregation circuits C mass1-4 reserve appropriate width dicing lines to ensure that the subsequent cutting operation does not make the hardware units unit1-4 4 Potency is impaired. This approach is different from the arbitrary routing method used in general layout.
而沟通布线所在的C层电路布局可根据单一芯片所期望硬件单元数目来调整修改,以适切地仅联系不同数目的硬件单元,以为后续作业中若有要切割切割道做准备。此时其余(S-C)层电路布局是维持不变的,且至多需调整该C层电路布局。举例来说:若是已知会需要生产包含四硬件单元的芯片(用途1,如图2所示)、包含二硬件单元的芯片(用途2,如图3所示)及包含一硬件单元的芯片(用途3,如图4所示)。当已完成用途1芯片的布局时,只需要修改C层电路布局中的至少一部分(假设是C2unit(C2unit>0))层电路布局)即可完成用途2芯片的布局;当已完成用途2芯片的布局时,只需要再修改C层电路布局中的至少一部分(假设相较于用途2芯片的布局,会发生异动的电路布局层数是C1unit(C1unit>0))个)即可完成用途3芯片的布局。请注意,布局修改可能是针对修改层的Pconnect(例如:去除沟通布线)或是Punit1~4(例如:避免输入浮接(input floating))位置。The C-layer circuit layout where the communication wiring is located can be adjusted and modified according to the expected number of hardware units of a single chip, so as to properly connect only different numbers of hardware units, so as to prepare for cutting dicing lanes in subsequent operations. At this time, the circuit layout of the other (SC) layers remains unchanged, and at most the circuit layout of the C layer needs to be adjusted. For example: if it is known that it is necessary to produce a chip comprising four hardware units (use 1, as shown in Figure 2), a chip comprising two hardware units (use 2, as shown in Figure 3) and a chip comprising one hardware unit (Purpose 3, as shown in Figure 4). When the layout of the
接着,为每一层可能的电路布局制作一光掩模层,而本例的可能电路布局层数为S+C2unit+C1unit。然后,根据实际用途,从这些光掩模层中选出适当的S个光掩模层来加工成所需芯片(wafer),如图2、3、4所示。Next, a photomask layer is fabricated for each possible circuit layout layer, and the number of possible circuit layout layers in this example is S+C 2unit +C 1unit . Then, according to the actual application, appropriate S photomask layers are selected from these photomask layers to be processed into a desired wafer (wafer), as shown in FIGS. 2 , 3 , and 4 .
以图2而言,芯片的其中一管芯(die)1包含多个分别对应这些聚集电路Cmass1~4的模块11、12、13、14和多个分别对应这些沟通布线且位于切割道上的信号连接15,而不同模块11~14间的信号连接15是曝露于相关模块11~14外。并且每一模块11~14包括多个输入输出焊垫111、121、131、141(I/Opad)。其中,图3和图4的部分切割道不存在具联系作用的信号连接15是因为布局时已视情况调整修改。Referring to FIG. 2 , one
接着,对管芯1进行额外切割以得到包含期望硬件单元数目的切割区块,且每一切割道皆可选择进行切割或不进行切割。选择用途1时(见图2),因为恰巧管芯1的硬件单元数目符合所需,所以不需进行额外切割。选择用途2时(见图3),是沿着已无联系关系的切割道来执行一额外切割cut1,来得到二个切割区块(一个由模块11和12组成,一个由模块13和14组成)。同理,对图4(用途3)中已无联系关系的切割道进行额外切割cut2、cut3,即可获取四个分别属于模块11~14的切割区块。由于所得切割区块均可独立运作,所以皆可视为管芯,最后分别进行封装作业即能获取期望的芯片。Then, additional dicing is performed on the
本实施例修改电路布局的原因在于:当模块11~14的运作不能独立于信号连接15时,若不经修改直接对图2的管芯1进行切割,可能会造成每一切割区块内的部分相关电路无法正常运作,例如输入浮接(input floating)。The reason for modifying the circuit layout in this embodiment is: when the operation of the modules 11-14 cannot be independent of the
至此可知,本实施例仅需通过不同版本的修改电路布局和额外切割作业,便能制成期望芯片。在这样的芯片中,硬件单元unit1~4间的沟通是直接以布局布线来实现,所以传送速度不受影响,且信号连接15数目可依据布线电路而定,不会像已知那样受芯片的接脚或管芯的焊垫所限制。So far, it can be seen that in this embodiment, desired chips can be manufactured only through different versions of modified circuit layouts and additional dicing operations. In such a chip, the communication between the hardware units unit1-4 is directly implemented by layout and wiring, so the transmission speed is not affected, and the number of
【第二优选实施例】[Second preferred embodiment]
而布局作业时,未必需要修改该C层电路布局,可以视实际电路设计来判定。而当电路设计使得模块11~14的运作能独立于信号连接15时,电路布局不需异动,可直接任意切割该管芯来取得期望芯片,例如:图5的管芯1可通过额外切割cut4、cut5来制成包含一个硬件单元的芯片。而图6的管芯2可受额外切割cut6、cut7切割后,分别封装为包含一、二、四个硬件单元的芯片。During the layout operation, it is not necessarily necessary to modify the C-layer circuit layout, which can be determined according to the actual circuit design. And when the circuit design makes the operation of the modules 11-14 independent of the
值得注意的是,通常修改层数会随电路设计优劣而不同,最差情况是所有集中布局的C层电路布局都必须修改,而最佳情况是不需修改即可进行切割。所以,电路设计者的事先考量将有助于本发明的顺利进行。譬如:一些电路设计者会为各种可能情况(即针对每一管芯所包含的硬件单元数目)设定工作模式,当选用特定工作模式时,可使切割区块的运作独立于信号连接15,如此便可降低修改电路布局层数,甚至是不需任何更动。It is worth noting that the number of modified layers usually varies with the quality of the circuit design. In the worst case, all the C-layer circuit layouts in the centralized layout must be modified, and in the best case, cutting can be performed without modification. Therefore, the prior consideration of the circuit designer will contribute to the smooth progress of the present invention. For example: Some circuit designers will set the working mode for various possible situations (that is, the number of hardware units included in each die). When a specific working mode is selected, the operation of the cutting block can be independent of the
更值得注意的是,集中布局的C个光掩模层可以是指金属(Metal)光掩模层或连接(Via)光掩模层,且不以此为限。且该C个光掩模层可以是彼此连续关系,也可以自所有S个光掩模层中任意选取。当然,被修改的Cunit2、Cunit1层电路布局也不必是连续的。再者,这些信号连接15可以是用来联系不同模块11~14,但也可用来当作相关模块11~14的输入输出焊垫111~141,以为输入输出用途。It is worth noting that the C photomask layers arranged in a centralized manner may refer to a metal (Metal) photomask layer or a connection (Via) photomask layer, and is not limited thereto. In addition, the C photomask layers may be in a continuous relationship with each other, or may be arbitrarily selected from all the S photomask layers. Of course, the circuit layouts of the modified C unit2 and C unit1 layers do not have to be continuous. Moreover, these
综上所述,本发明集成电路制作方法将用以沟通不同硬件单元unit1~4的聚集电路Cmass1~4间沟通布线集中布局在C层电路布局内,所以最多只需修改其中C2unit、C1unit层电路布局,即可进行光掩模和芯片切割作业,以封装成多个包含不同硬件单元数目的芯片,且无碍于硬件单元unit1~4间的沟通,故确实能达成本发明的目的。To sum up, in the integrated circuit manufacturing method of the present invention, the communication wiring between the aggregation circuits C mass1-4 used to communicate with different hardware units unit1-4 is centralized and laid out in the C-layer circuit layout, so at most it only needs to modify C2unit , C2unit 1 unit layer circuit layout, photomask and chip cutting operations can be performed to package multiple chips containing different numbers of hardware units, without hindering the communication between hardware units unit1-4, so the purpose of the present invention can indeed be achieved .
以上所述者,仅为本发明的优选实施例而已,当不能以此限定本发明实施的范围,即大凡依本发明权利要求及发明说明内容所作的简单的等同变化与修饰,皆仍属本发明专利涵盖的范围内。The above are only preferred embodiments of the present invention, and should not limit the scope of the present invention with this, that is, all simple equivalent changes and modifications made according to the claims of the present invention and the content of the description of the invention still belong to the present invention. within the scope of invention patents.
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US8786080B2 (en) * | 2011-03-11 | 2014-07-22 | Altera Corporation | Systems including an I/O stack and methods for fabricating such systems |
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