CN101576686B - Liquid crystal display device and production method thereof - Google Patents
Liquid crystal display device and production method thereof Download PDFInfo
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- CN101576686B CN101576686B CN 200810095371 CN200810095371A CN101576686B CN 101576686 B CN101576686 B CN 101576686B CN 200810095371 CN200810095371 CN 200810095371 CN 200810095371 A CN200810095371 A CN 200810095371A CN 101576686 B CN101576686 B CN 101576686B
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Abstract
The invention provides a liquid crystal display device and a production method thereof. The liquid crystal display device comprises a liquid crystal display panel which comprises a first basal plate, a second basal plate and a liquid crystal layer, wherein the first basal plate comprises a patterning electrode layer and a patterning alignment layer; the patterning electrode layer is provided with a first electrode part, a second electrode part and a first opening part; the patterning alignment layer is provided with an alignment part, a second opening part and a third opening part, wherein thesecond opening part of the patterning alignment layer corresponds to the first opening part of the patterning electrode layer, the third opening part of the patterning alignment layer corresponds to the first electrode part of the patterning electrode layer, and the alignment part of the patterning alignment layer corresponds to the second electrode part of the patterning electrode layer; the second basal plate and the first basal plate are arranged oppositely, and the liquid crystal layer is clamped between the first basal plate and the second basal plate.
Description
Technical field
The present invention relates to a kind of Liquid crystal disply device and its preparation method, more particularly, relate to a kind of display panels, the manufacture method of display panels, Liquid crystal disply device and its preparation method that utilizes photo-marsk process to form both alignment layers.
Background technology
With reference to Fig. 1, be the diagrammatic cross-section of known a kind of liquid crystal indicator 1, the backlight module 30 that it comprises display panels 20 and is arranged at display panels 20 1 sides.Wherein, display panels 20 have colored filter substrate 21, be arranged at the thin film transistor base plate 22 of colored filter substrate 21 1 sides and be arranged at thin film transistor base plate 22 and colored filter substrate 21 between liquid crystal layer 24.In addition, colored filter substrate 21 has substrate body 211, and the chromatic filter layer 212, black-matrix layer 213, electrode layer 214 and the both alignment layers 215 that are arranged at substrate body 211 1 sides.In addition, thin film transistor base plate 22 has substrate body 221, and substrate body 221 through five road photo-marsk processes after, and sequentially form the first metal layer 222, semiconductor layer 223, the second metal level 224, insulation course 225 and electrode layer 226 in substrate body 221 1 sides, then, in a side of electrode layer 226 both alignment layers 227 is set again.
In addition, liquid crystal layer 24 is arranged between the both alignment layers 227 of the both alignment layers 215 of colored filter substrate 21 and thin film transistor base plate 22, so that a plurality of liquid crystal molecules of liquid crystal layer 24 are able to arrange along both alignment layers 215, a plurality of ditch rail lines (not shown) of 227.
As shown in Figure 2, form many data lines (dataline) 228, multi-strip scanning line (scan line) 229 and a plurality of thin film transistor (TFT) (TFT) 230 (shown in circular dashed line) on the substrate body 221 of thin film transistor base plate 22.And every adjacent 2 data lines 228 namely are called a pixel (pixel) 231 with every adjacent 2 sweep traces 229 staggered zones that center on.And, substrate body 221 has viewing area 232 (shown in dashed region among the figure) and peripheral edge margin 233, wherein, viewing area 232 is corresponding to the zone of the described pixel 231 of having of thin film transistor base plate 22, peripheral edge margin 233 is arranged at viewing area 232 peripheries, and peripheral edge margin 233 has the conductor layer (not shown).Driver element D is electrically connected with the conductor layer of peripheral edge margin 233 by flexible circuit board B, is come show image so that driver element D drives the described pixel 231 of control.
See also Fig. 3, be the synoptic diagram of both alignment layers printing equipment 4, next the both alignment layers 215 of colored filter substrate 21 and the method for making of the both alignment layers 227 of thin film transistor base plate 22 are described.
As shown in Figure 3, both alignment layers printing equipment 4 comprises mobile platform 41, alignment materials nozzle 42, the first cylinder 43 and second tin roller 44, and wherein, second tin roller 44 surfaces are provided with relief printing plate 441.
At first, be positioned on the mobile platform 41 having formed the substrate body 221 that has formed electrode layer 226 in the substrate body 211 of electrode layer 214 or thin film transistor (TFT) 22 techniques in colored filter substrate 21 techniques, alignment materials nozzle 42 drips alignment materials on the first cylinder 43, then, the first cylinder 43 is needed on alignment materials on the second tin roller 44 equably, so that second tin roller 44 can be printed in alignment materials one side of substrate body 211 or 221 and form both alignment layers 215 or 227 according to the ditch slot texture that relief printing plate 441 has.
From the above, no matter be colored filter substrate 21 or thin film transistor base plate 22, all its substrate body 211,221 must be moved to both alignment layers printing equipment 4 and just can print both alignment layers 215,227 action, so that production process is complicated and waste Production Time.In addition, factory increases from generation to generation along with liquid crystal panel, that is the increase of mother substrate size, and the cylinder sizes of printing alignment materials also must increase thereupon, causes operation difficult and difficult in maintenance.In addition, both alignment layers 215,227 material have water absorptivity and adhesive properties usually, absorb easily extraneous aqueous vapors and dizzy opening so that be positioned at the both alignment layers 215,227 of colored filter substrate 21 or thin film transistor base plate 22 peripheral edge margin 233.In addition, when the outside contamination particulate falls into colored filter substrate 21 or thin film transistor base plate 22 accidentally, contaminate particulate sticks easily in both alignment layers 215,227 and is difficult for removing, so that colored filter substrate 21 and thin film transistor base plate 22 short circuits, even changed the spacing (cell gap) of accommodating liquid crystal layer, so that liquid crystal indicator 1 produces the defective of black ball (edge mura) phenomenon in edge, thereby affects the product quality of liquid crystal indicator 1, really have much room for improvement.
Summary of the invention
Because above-mentioned problem, one object of the present invention is to provide the method for making of a kind of display panels, display panels and the method for making of liquid crystal indicator, and it has the technique facility, reduces work hours, contraposition reaches easily and improves advantages such as making quality.
Therefore, in order to achieve the above object, display panels according to the present invention comprises first substrate, second substrate and liquid crystal layer.First substrate comprises patterned electrode layer and patterning both alignment layers, patterned electrode layer comprises the first electrode part, the second electrode part and the first peristome, the patterning both alignment layers comprises orientation section, the second peristome and the 3rd peristome, wherein, the second peristome of patterning both alignment layers is corresponding with the first peristome of patterned electrode layer, the 3rd peristome of patterning both alignment layers is corresponding with the first electrode part of patterned electrode layer, and the orientation section of patterning both alignment layers is corresponding with the second electrode part of patterned electrode layer.Second substrate and first substrate are oppositely arranged, and liquid crystal layer is located between first substrate and the second substrate.
For reaching above-mentioned purpose, comprise the following step according to the method for making of display panels of the present invention: electrode layer is set on substrate body; On electrode layer, form both alignment layers; Form patterning photoresist layer on both alignment layers, patterning photoresist layer has the first photoresist section, the second photoresist section and peristome; Remove electrode layer and both alignment layers corresponding to the peristome of patterning photoresist layer, make electrode layer and both alignment layers form respectively the first peristome and the second peristome; Remove the first photoresist section and corresponding to the both alignment layers of the first photoresist layer to expose the first electrode part of electrode layer; The second photoresist section that removes is to expose both alignment layers and to form first substrate; Second substrate is set in first substrate one side; And liquid crystal layer is set between first substrate and second substrate.
For reaching above-mentioned purpose, comprise the following step according to the method for making of liquid crystal indicator of the present invention: on substrate body, form electrode layer; On electrode layer, form both alignment layers; Form patterning photoresist layer on both alignment layers, patterning photoresist layer has the first photoresist section, the second photoresist section and peristome; Remove electrode layer and both alignment layers corresponding to the peristome of patterning photoresist layer, make electrode layer and both alignment layers form respectively the first peristome and the second peristome; Remove the first photoresist section and corresponding to the both alignment layers of the first photoresist layer to expose the first electrode part of electrode layer; The second photoresist section that removes is to expose both alignment layers and to form first substrate; Second substrate is set in a side of first substrate; Arrange liquid crystal layer between first substrate and second substrate to form display panels; And backlight module is set in display panels one side.
For reaching above-mentioned purpose, comprise the following step according to the method for making of display panels of the present invention: on substrate body, form electrode layer; Form patterning sensitization both alignment layers on electrode layer, patterning sensitization both alignment layers has the first sensitization orientation section, the second sensitization orientation section and the first peristome; Remove the electrode layer corresponding to the first peristome of patterning sensitization both alignment layers, make electrode layer form the second peristome; Remove the first sensitization orientation section and expose the first electrode part and form first substrate; Second substrate is set in a side of first substrate; And liquid crystal layer is set between first substrate and second substrate.
For reaching above-mentioned purpose, comprise the following step according to the method for making of liquid crystal indicator of the present invention: on substrate body, form electrode layer; Form patterning sensitization both alignment layers on electrode layer, patterning sensitization both alignment layers has the first sensitization orientation section, the second sensitization orientation section and the first peristome; Remove the electrode layer corresponding to the first peristome of patterning sensitization both alignment layers, make electrode layer form the second peristome; Remove the first sensitization orientation section and expose the first electrode part to form first substrate; Second substrate is set in a side of first substrate; Arrange liquid crystal layer between first substrate and second substrate to form display panels; And backlight module is set in a side of display panels.
From the above, according to the method for making of display panels of the present invention, display panels and the method for making of liquid crystal indicator, can utilize existing photo-marsk process technology to form both alignment layers or patterning sensitization both alignment layers.Compared to the prior art, the method for making of display panels of the present invention, display panels and the method for making of liquid crystal indicator have the advantage of simplifying technique, saving man-hour really.In addition, because both alignment layers has the setting that the second peristome, the 3rd peristome or patterning sensitization both alignment layers have the first peristome, can improve aqueous vapor to enter and cause the dizzy shortcoming of dying of both alignment layers or patterning sensitization both alignment layers, also can improve that the outside contamination particulate falls into both alignment layers accidentally or patterning sensitization both alignment layers may cause the edge to deceive the defective of ball (edge mura) phenomenon, really can improve the product quality of display panels and liquid crystal indicator.
Description of drawings
Fig. 1 is the synoptic diagram of known liquid crystal indicator;
Fig. 2 is the synoptic diagram of known thin film transistor base plate;
Fig. 3 is the synoptic diagram of known orientation printing equipment;
Fig. 4 is the process flow diagram of method for making of the liquid crystal indicator of first embodiment of the invention;
Fig. 5 is the synoptic diagram of method for making of the liquid crystal indicator of first embodiment of the invention, and the display base plate body arranges the aspect of electrode layer;
Fig. 6 is the synoptic diagram of method for making of the liquid crystal indicator of first embodiment of the invention, and show electrode layer one side arranges the aspect of patterning photoresist layer;
Fig. 7 is the synoptic diagram of method for making of the liquid crystal indicator of first embodiment of the invention, the aspect of shows patterned metal electrode layer and both alignment layers;
Fig. 8 is the synoptic diagram of method for making of the liquid crystal indicator of first embodiment of the invention, shows the aspect that exposes the first electrode part;
Fig. 9 is the synoptic diagram of method for making of the liquid crystal indicator of first embodiment of the invention;
Figure 10 is the synoptic diagram of method for making of the liquid crystal indicator of first embodiment of the invention, and the aspect of the display panels of the second embodiment and the 3rd embodiment;
Figure 11 is the synoptic diagram of method for making of the liquid crystal indicator of first embodiment of the invention, shows the aspect that forms liquid crystal indicator;
Figure 12 is the process flow diagram of method for making of the liquid crystal indicator of fourth embodiment of the invention;
Figure 13 is the synoptic diagram of method for making of the liquid crystal indicator of fourth embodiment of the invention, and the display base plate body arranges the aspect of electrode layer;
Figure 14 is the synoptic diagram of method for making of the liquid crystal indicator of fourth embodiment of the invention, and a side of show electrode layer arranges the aspect of patterning sensitization both alignment layers;
Figure 15 is the synoptic diagram of method for making of the liquid crystal indicator of fourth embodiment of the invention, the aspect of shows patterned metal electrode layer and patterning sensitization both alignment layers;
Figure 16 is the synoptic diagram of method for making of the liquid crystal indicator of fourth embodiment of the invention, shows the aspect that exposes the first electrode part;
Figure 17 is the synoptic diagram of method for making of the display panels of the liquid crystal indicator of fourth embodiment of the invention and the 5th embodiment; And
Figure 18 is the synoptic diagram of method for making of the liquid crystal indicator of fourth embodiment of the invention, shows the aspect of the liquid crystal indicator that forms the 4th embodiment.
Description of reference numerals
1 liquid crystal indicator, 20 display panels
21 colored filter substrates, 211 substrate body
212 chromatic filter layers, 213 black-matrix layer
214 electrode layers, 215 both alignment layers
22 thin film transistor base plates, 221 substrate body
222 the first metal layers, 223 semiconductor layers
224 second metal levels, 225 insulation courses
226 electrode layers, 227 both alignment layers
228 data lines, 229 sweep traces
230 thin film transistor (TFT)s, 231 pixels
232 viewing areas, 233 peripheral edge margin
24 liquid crystal layers, 30 backlight modules
4 both alignment layers printing equipments, 41 mobile platforms
42 alignment materials nozzles, 43 first cylinders
44 second tin rollers, 441 relief printing plates
5 liquid crystal indicators, 60 display panels
61 first substrates, 611 substrate body
612 patterned electrode layer 612a the first peristome
612b the first electrode part 612c the second electrode part
613 the first metal layers, 614 semiconductor layers
615 second metal levels, 616 insulation courses
617 patterning both alignment layers 617a the second peristome
617b the 3rd peristome 617c orientation section
618 patterning photoresist layer 618a the first photoresist section
618b the second 618c of photoresist section peristome
62 second substrates, 621 substrate body
622 chromatic filter layers, 623 black-matrix layer
624 electrode layers, 625 both alignment layers
63 liquid crystal layers, 70 backlight modules
8 liquid crystal indicators, 80 display panels
81 first substrates, 811 substrate body
812 electrode layer 812a the first opening
812b the first electrode part 812c the second electrode part
813 patterning sensitization both alignment layers 813a the first sensitization orientation section
813b the second sensitization orientation 813c of section the first peristome
82 second substrates, 821 both alignment layers
83 liquid crystal layers, 90 backlight modules
B flexible circuit board D driver element
TFT thin film transistor (TFT) S1～S16 make liquid crystal indicator step
Embodiment
Hereinafter with reference to the display panels of description of drawings some embodiment according to the present invention, the method for making of display panels and the method for making of liquid crystal indicator.
At first, see also Fig. 4 to Figure 11, with the method for making of liquid crystal indicator 5 of explanation first embodiment of the invention.
Seeing also Fig. 4, is the process flow diagram of method for making of the liquid crystal indicator 5 of the first embodiment, and wherein, step S1 is the step of method for making of the liquid crystal indicator 5 of present embodiment to step S9.
Please simultaneously with reference to Fig. 5, in step S1, form electrode layer 612 in substrate body 611 1 sides.In the present embodiment, substrate body 611 forms the first metal layer 613, semiconductor layer 614, the second metal level 615 and insulation course 616 through four road photo-marsk processes in the one side, and forms thin film transistor (TFT) TFT on substrate body 611.In addition, electrode layer 612 is formed on the insulation course 616, and its material can be indium tin oxide (indium tin oxide, ITO), indium-zinc oxide (indium zinc oxide, IZO) or polysilicon (polyslicon).
Please continue to consult Fig. 5, in step S2, on electrode layer 612, form both alignment layers 617.In the present embodiment, the material of both alignment layers 617 can be polyimide (polyimide), and the mode by rotary coating (spincoating) or slot coated (slit coating) is formed at both alignment layers 617 on the electrode layer 612.
As shown in Figure 6, in step S3, form patterning photoresist layer (patterned photoresist layer) 618 on both alignment layers 617, patterning photoresist layer 618 has the first 618a of photoresist section, the second 618b of photoresist section and peristome 618c.In the present embodiment, utilize photo-marsk process to form patterning photoresist layer 618 in a side of electrode layer 612.In this photo-marsk process, can utilize half color range photomask (halftone mask) so that patterning photoresist layer 618 forms the first 618a of photoresist section, the second 618b of photoresist section and peristome 618c, wherein, the thickness of the first 618a of photoresist section is less than the thickness of the second 618b of photoresist section.Certainly, if will reach the thickness of the first 618a of photoresist section less than the thickness of the second 618b of photoresist section, also can utilize than the photomask of Alternative and reach, to thicken the thickness of the second 618b of photoresist section.Certainly, patterning photoresist layer 618 of the present invention also can utilize the twice photo-marsk process to make respectively the first 618a of photoresist section and the second 618b of photoresist section, and forms the thickness of the first 618a of photoresist section less than the structure of the thickness of the second 618b of photoresist section.
As shown in Figure 7, in step S4, remove electrode layer 612 and both alignment layers 617 corresponding to the peristome 618c of patterning photoresist layer 618, make electrode layer 612 and both alignment layers 617 form respectively the first peristome 612a and the second peristome 617a.In the present embodiment, as mask layer, respectively form first opening 612a and second peristome 617a through being etched with in electrode layer 612 and both alignment layers 617 with the first 618a of photoresist section and the second 618b of photoresist section.
As shown in Figure 8, in step S5, remove the both alignment layers 617 of the first 618a of photoresist section and corresponding the first 618a of photoresist section to expose the first electrode part 612b of electrode layer 612.In the present embodiment, carry out ozone ashing (O
3Ashing) removing the first 618a of photoresist section, and in both alignment layers 617, form the 3rd opening 617b with etching mode, so that the first electrode part 612b of electrode layer 612 is able to be exposed and the first electrode part 612b can be conductive connecting pin by the 3rd opening 617b.Certainly, the present invention also can carry out other ashing (ashing) mode, for example is plasma ashing, or utilizes the modes such as stripper (stripper), dry ecthing method to remove the first 618a of photoresist section.In addition, the second 618b of photoresist section also can when ashing, cause thickness to reduce.
As shown in Figure 9, in step S6, remove the second 618b of photoresist section to expose both alignment layers 617 and to form first substrate 61.In the present embodiment, can remove the second 618b of photoresist section by modes such as ashing, stripper or etchings, to expose the 617c of orientation section of both alignment layers 617.In addition, the electrode layer 612 corresponding with the second 618b of photoresist section is second electrode part 612c, and the second electrode part 612c has identical pattern with the 617c of orientation section of both alignment layers 617.At this moment, electrode layer 612 forms patterned electrode layer 612, and both alignment layers 617 forms patterning both alignment layers 617.In addition, the first substrate 61 of present embodiment is take the substrate that is equipped with thin film transistor (TFT) TFT as example.Certainly, first substrate 61 also can be the substrate that is equipped with colored filter or the thin film transistor base plate that is integrated with colored filter (color filter on array).
As shown in figure 10, in step S7, second substrate 62 is set in a side of first substrate 61.In the present embodiment, second substrate 62 is the substrate 62 that is equipped with colored filter, and second substrate 62 has substrate body 621, chromatic filter layer 622, black-matrix layer 623, electrode layer 624 and both alignment layers 625.Wherein, second substrate 62 can utilize according to step S1 and form both alignment layers 625 to the mode of step S6.
Please continue to consult Figure 10, in step S8, liquid crystal layer 63 is set between first substrate 61 and second substrate 62, to form display panels 60.
As shown in figure 11, in step S9, backlight module 70 is set in a side of display panels 60, to form liquid crystal indicator 5.Backlight module 70 can be down straight aphototropism mode set 70 or side-light backlight module 70 according to actual needs.
This shows, the method for making of the liquid crystal indicator 5 of first embodiment of the invention, in manufacturing process, first substrate 61 (being equipped with the substrate of thin film transistor (TFT) TFT) can form both alignment layers 617 in the lump in existing five road photo-marsk processes.Comparatively speaking the structure of using with routine can omit the trouble that substrate body 611 is moved to the orientation printing equipment, really can save production process and time.In addition, the both alignment layers 617 of first substrate 61 has the setting of the second peristome 617a and the 3rd peristome 617b, compare the conventional technology of using, can avoid causing the dizzy problem of opening of the 617c of orientation section because aqueous vapor enters, also can avoid the outside contamination particulate accidentally to fall into the 617c of orientation section and may cause the edge to deceive the defective of ball (edge mura) phenomenon, really can improve the making quality of liquid crystal indicator 5.
Then, please cooperate and consult Fig. 4 to Figure 10, with the method for making of display panels 60 of explanation second embodiment of the invention.
In the present embodiment, the step S1 that utilizes the first embodiment makes display panels 60 to the method for step S8, gives same reference numerals and repeats no more at this.
Then, see also Figure 10, be the display panels 60 of third embodiment of the invention, have first substrate 61, second substrate 62 and liquid crystal layer 63.
In the present embodiment, the structure of first substrate 61, second substrate 62 and liquid crystal layer 63 and element connection relationship are identical with first substrate 61, second substrate 62 and the liquid crystal layer 63 of the first embodiment, give same reference numerals and repeat no more at this.
Then, please cooperate and consult Figure 12 to Figure 18, with the liquid crystal indicator 8 of explanation the present invention the 4th preferred embodiment.
See also Figure 12, be the process flow diagram of the manufacture method of the liquid crystal indicator 8 of the present invention's the 4th preferred embodiment.
As shown in figure 13, in step S10, on substrate body 811, form electrode layer 812.
As shown in figure 14, in step S11, form patterning sensitization both alignment layers (patterned photosensitive alignment layer) 813 on electrode layer 812, patterning sensitization both alignment layers 813 has the first sensitization orientation 813a of section, the second sensitization orientation 813b of section and the first opening 813c.In the present embodiment, can utilize first the mode of rotary coating or slot coated that patterning sensitization both alignment layers 813 is formed on the electrode layer 812, and the material of patterning sensitization both alignment layers 813 is the material of photosensitivity, then, patterning sensitization both alignment layers 813 can again via after the half color range optical mask pattern, form the first sensitization orientation 813a of section, the second sensitization orientation 813b of section and the first peristome 813c.Wherein, the thickness of the first sensitization orientation 813a of section is less than the thickness of the second sensitization orientation 813b of section.
As shown in figure 15, in step S12, remove the electrode layer 812 of the first peristome 813c of corresponding pattern allelopathic light both alignment layers 813, make electrode layer 812 form the second peristome 812a.Utilize patterning sensitization both alignment layers 813 to come patterned electrode layer 812, that is to say, utilize patterning sensitization both alignment layers 813 to be used as mask layer, so that electrode layer 812 is formed the first peristome 812a, the first electrode part 812b and the second electrode part 812c.Wherein, the first electrode part 812b and the second electrode part 812c be respectively to should the first sensitization orientation 813a of section and the second sensitization orientation 813b of section, and the second electrode part 812c and the second sensitization orientation 813b of section have identical patterns.
As shown in figure 16, in step S13, remove the first sensitization orientation 813a of section and expose the first electrode part 812b, to form first substrate 81.In addition, the first sensitization orientation 813a of section removes by the ozone ashing method, certainly, also can remove the first sensitization orientation 813a of section by other ashing methods or dry ecthing method.In the present embodiment, first substrate 81 is for being equipped with the substrate of thin film transistor (TFT).
As shown in figure 17, in step S14, second substrate 82 is set in a side of first substrate 81.In the present embodiment, second substrate 82 is for being equipped with the substrate of colored filter.In addition, the method for making of the both alignment layers 821 of second substrate 82 also can be made by the method for making of first substrate 81.
Please refer to again shown in Figure 17ly, in step S15, liquid crystal layer 83 is set between first substrate 81 and second substrate 82, to form display panels 80.
As shown in figure 18, in step S16, backlight module 90 is set in a side of display panels 80, to form liquid crystal indicator 8.
This shows, the method for making of the liquid crystal indicator 8 of fourth embodiment of the invention, can utilize photo-marsk process equally so that patterning sensitization both alignment layers 813 has the first sensitization orientation 813a of section and the second sensitization orientation 813b of section, really can save and make formality and time.In addition, patterning sensitization both alignment layers 813 has the setting of the first peristome 813c, can avoid equally causing the dizzy problems of opening of patterning sensitization both alignment layers 813 because aqueous vapor enters, and the outside contamination particulate falls into the defective that causes accidentally, really can improve the making quality of liquid crystal indicator 8.
Then, please cooperate and consult Figure 12 to Figure 17, with the method for making of display panels 80 of explanation fifth embodiment of the invention.
In the present embodiment, the step S10 that utilizes the 4th embodiment makes display panels 80 to the method for step S15, gives same reference numerals and repeats no more at this.
From the above, according to display panels of the present invention, the method for making of display panels and the method for making of liquid crystal indicator, can utilize existing photo-marsk process technology to form both alignment layers or patterning sensitization both alignment layers.Compare the conventional technology of using, the method for making of display panels of the present invention, display panels and the method for making of liquid crystal indicator have the advantage of simplifying technique, saving man-hour really.In addition, because both alignment layers has the setting that the second peristome, the 3rd peristome or patterning sensitization both alignment layers have the first peristome, can improve aqueous vapor to enter and cause the dizzy shortcoming of dying of both alignment layers or patterning sensitization both alignment layers, also can improve that the outside contamination particulate falls into both alignment layers accidentally or patterning sensitization both alignment layers may cause the edge to deceive the defective of ball (edge mura) phenomenon, really can improve the product quality of display panels and liquid crystal indicator.
The above only is illustrative, rather than restricted.Anyly do not break away from spirit of the present invention and category, and to its equivalent modifications of carrying out or change, all should be contained in the scope of appending claims.
Claims (10)
1. liquid crystal indicator comprises:
Display panels comprises:
First substrate, this first substrate comprises:
Patterned electrode layer, this patterned electrode layer comprise the first electrode part, the second electrode part and the first peristome;
The patterning both alignment layers is arranged on the patterned electrode layer, and this patterning both alignment layers comprises orientation section, the second peristome and the 3rd peristome,
Wherein, the second peristome of this patterning both alignment layers is corresponding with the first peristome of this patterned electrode layer, the 3rd peristome of this patterning both alignment layers is corresponding with the first electrode part of this patterned electrode layer, and the orientation section of this patterning both alignment layers is corresponding with the second electrode part of this patterned electrode layer;
Second substrate is oppositely arranged with this first substrate;
Liquid crystal layer is folded between this first substrate and this second substrate, and
Backlight module is positioned at a side of this display panels.
2. liquid crystal indicator as claimed in claim 1, wherein the material of this patterning both alignment layers is the photosensitive type material.
3. the method for making of a liquid crystal indicator comprises:
Form electrode layer in substrate body;
Form both alignment layers at this electrode layer;
Form patterning photoresist layer in this both alignment layers, this patterning photoresist layer has the first photoresist section, the second photoresist section and peristome;
Remove this electrode layer corresponding with the peristome of this patterning photoresist layer and this both alignment layers, make this electrode layer form the first peristome and make this both alignment layers form the second peristome;
Remove this first photoresist section and corresponding to this both alignment layers of the first photoresist layer to expose the first electrode part of this electrode layer;
Remove this second photoresist section to expose this both alignment layers and to form first substrate;
Second substrate is set in a side of this first substrate;
Arrange liquid crystal layer between this first substrate and this second substrate to form display panels; And
Backlight module is set in a side of this display panels.
4. the method for making of liquid crystal indicator as claimed in claim 3, wherein the thickness of this first photoresist section is less than the thickness of this second photoresist section.
5. the method for making of liquid crystal indicator as claimed in claim 3, the step that wherein forms this patterning photoresist layer also comprises utilizes half color range photomask with this patterning photoresist layer of patterning, and forms this first photoresist section and this second photoresist section.
6. the method for making of liquid crystal indicator as claimed in claim 3, wherein this electrode layer corresponding with this second photoresist section is the second electrode part, and this second electrode part has identical pattern with this both alignment layers.
7. the method for making of a liquid crystal indicator comprises:
Form electrode layer in substrate body;
Form patterning sensitization both alignment layers at this electrode layer, this patterning sensitization both alignment layers has the first sensitization orientation section, the second sensitization orientation section and the first peristome;
Remove this electrode layer corresponding to this first peristome of this patterning sensitization both alignment layers, make this electrode layer form the second peristome;
Remove this first sensitization orientation section and expose the first electrode part to form first substrate;
Second substrate is set in a side of this first substrate;
Arrange liquid crystal layer between this first substrate and this second substrate to form a display panels; And
Backlight module is set in a side of this display panels.
8. the method for making of liquid crystal indicator as claimed in claim 7, wherein the thickness of this first sensitization orientation section is less than the thickness of this second sensitization orientation section.
9. the method for making of liquid crystal indicator as claimed in claim 7, the step that wherein forms this patterning sensitization both alignment layers also comprises utilizes half color range photomask, with this patterning sensitization both alignment layers of patterning, and form this first sensitization orientation section and this second sensitization orientation section.
10. the method for making of liquid crystal indicator as claimed in claim 7, wherein this electrode layer has the second electrode part with this second sensitization orientation section identical patterns.
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| CN 200810095371 CN101576686B (en) | 2008-05-05 | 2008-05-05 | Liquid crystal display device and production method thereof |
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| CN109545086A (en) * | 2018-11-29 | 2019-03-29 | 华映科技（集团）股份有限公司 | Production method, array substrate and the display panel of array substrate |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000002886A (en) * | 1998-06-16 | 2000-01-07 | Mitsubishi Electric Corp | Manufacture of liquid crystal display device |
| CN1614481A (en) * | 2003-11-07 | 2005-05-11 | 三星电子株式会社 | System and method for printing direction-orienting films |
| KR20060134680A (en) * | 2005-06-23 | 2006-12-28 | 삼성전자주식회사 | Method of forming alignment film in liquid crystal display |
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2008
- 2008-05-05 CN CN 200810095371 patent/CN101576686B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000002886A (en) * | 1998-06-16 | 2000-01-07 | Mitsubishi Electric Corp | Manufacture of liquid crystal display device |
| CN1614481A (en) * | 2003-11-07 | 2005-05-11 | 三星电子株式会社 | System and method for printing direction-orienting films |
| KR20060134680A (en) * | 2005-06-23 | 2006-12-28 | 삼성전자주식회사 | Method of forming alignment film in liquid crystal display |
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| CN101576686A (en) | 2009-11-11 |
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