CN101517454A - 适用于加工多光子可固化光反应性组合物的光学系统 - Google Patents

适用于加工多光子可固化光反应性组合物的光学系统 Download PDF

Info

Publication number
CN101517454A
CN101517454A CNA2007800342238A CN200780034223A CN101517454A CN 101517454 A CN101517454 A CN 101517454A CN A2007800342238 A CNA2007800342238 A CN A2007800342238A CN 200780034223 A CN200780034223 A CN 200780034223A CN 101517454 A CN101517454 A CN 101517454A
Authority
CN
China
Prior art keywords
beamlets
beam splitter
beamlet
layer
prism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2007800342238A
Other languages
English (en)
Chinese (zh)
Inventor
迪安·法克里斯
安德鲁·J·默南
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of CN101517454A publication Critical patent/CN101517454A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/101—Scanning systems with both horizontal and vertical deflecting means, e.g. raster or XY scanners
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/105—Scanning systems with one or more pivoting mirrors or galvano-mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0905—Dividing and/or superposing multiple light beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0961—Lens arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0972—Prisms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166—Manufacturing methods
    • G02B2006/1219—Polymerisation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
CNA2007800342238A 2006-09-14 2007-09-10 适用于加工多光子可固化光反应性组合物的光学系统 Pending CN101517454A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/531,836 US20080083886A1 (en) 2006-09-14 2006-09-14 Optical system suitable for processing multiphoton curable photoreactive compositions
US11/531,836 2006-09-14

Publications (1)

Publication Number Publication Date
CN101517454A true CN101517454A (zh) 2009-08-26

Family

ID=39184118

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2007800342238A Pending CN101517454A (zh) 2006-09-14 2007-09-10 适用于加工多光子可固化光反应性组合物的光学系统

Country Status (5)

Country Link
US (1) US20080083886A1 (https=)
EP (1) EP2069850A4 (https=)
JP (1) JP2010503537A (https=)
CN (1) CN101517454A (https=)
WO (1) WO2008033750A1 (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102335795A (zh) * 2010-07-20 2012-02-01 株式会社迪思科 光学装置以及具备该光学装置的激光加工装置
CN108027482A (zh) * 2015-08-10 2018-05-11 德国多元光子光学有限公司 具有射束偏转元件的光学构件、其制造方法及适合于光学构件的射束偏转元件
CN111427236A (zh) * 2019-01-09 2020-07-17 芯恩（青岛）集成电路有限公司 一种多光束光掩膜板曝光系统

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7551359B2 (en) * 2006-09-14 2009-06-23 3M Innovative Properties Company Beam splitter apparatus and system
US8322874B2 (en) * 2007-09-06 2012-12-04 3M Innovative Properties Company Lightguides having light extraction structures providing regional control of light output
CN101795961B (zh) * 2007-09-06 2013-05-01 3M创新有限公司 用于制备微结构化制品的工具
CN101795838B (zh) 2007-09-06 2014-02-12 3M创新有限公司 形成模具的方法以及使用所述模具形成制品的方法
US8451457B2 (en) 2007-10-11 2013-05-28 3M Innovative Properties Company Chromatic confocal sensor
EP2232531B1 (en) 2007-12-12 2018-09-19 3M Innovative Properties Company Method for making structures with improved edge definition
EP2257854B1 (en) * 2008-02-26 2018-10-31 3M Innovative Properties Company Multi-photon exposure system
US10029331B2 (en) * 2009-09-14 2018-07-24 Preco, Inc. Multiple laser beam focusing head
JP6057583B2 (ja) * 2012-07-20 2017-01-11 オリンパス株式会社 光走査装置および走査型検査装置
CA2994966A1 (en) 2015-08-07 2017-02-16 Planet Labs, Inc. Controlling a line of sight angle of an imaging platform
DE102016113978B4 (de) * 2016-07-28 2021-09-02 Lilas Gmbh Vorrichtung zum Ablenken einer Laserstrahlung oder zum Ablenken von Licht
US11320643B2 (en) * 2016-12-23 2022-05-03 Chongqing Hylon Co., Ltd. Composite prism for multi-functional telescope, and binocular telescopic optical system for same
CN111051953B (zh) * 2017-07-07 2022-05-27 罗切斯特大学 具有弯曲样品平面的两自由度扫描系统的光学设计
DE102018200036B3 (de) * 2018-01-03 2019-01-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Optische Anordnung zur direkten Laserinterferenzstrukturierung
DE102019128362B3 (de) * 2019-10-21 2021-02-18 Trumpf Laser- Und Systemtechnik Gmbh Segmentiertes Strahlformungselement und Laserbearbeitungsanlage
CN215953962U (zh) * 2021-09-03 2022-03-04 佛山市南海威宏模具制造有限公司 双眼式望远镜

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1549077A (en) * 1977-08-09 1979-08-01 Redifon Flight Simulation Ltd Scanning systems
US4796038A (en) * 1985-07-24 1989-01-03 Ateq Corporation Laser pattern generation apparatus
FR2665959B1 (fr) * 1990-08-16 1994-01-14 Oreal Appareil destine a permettre d'evaluer la brillance d'une surface, en particulier de la peau.
JPH0735994A (ja) * 1993-07-22 1995-02-07 Asahi Optical Co Ltd レーザ描画装置
US5548444A (en) * 1994-07-06 1996-08-20 Hughes Danbury Optical Systems, Inc. Optical beam homogenizing apparatus and method
JP4106478B2 (ja) * 1998-03-06 2008-06-25 株式会社オーク製作所 多ビーム走査型露光装置
EP1031868B1 (de) * 1999-02-26 2003-05-14 Dr. Johannes Heidenhain GmbH Kompensierter Parallel-Strahlteiler mit zwei Platten sowie Interferometer
US6767685B2 (en) * 1999-12-03 2004-07-27 Fuji Photo Film Co., Ltd. Plate-making method, plate-making apparatus used in such plate-making method, and image recording material
US6606197B2 (en) * 2000-03-28 2003-08-12 Corning Incorporated Dual grating filtering system
ATE433129T1 (de) 2000-06-15 2009-06-15 3M Innovative Properties Co Mikroherstellungsverfahren für organische optische bauteile
US6611379B2 (en) * 2001-01-25 2003-08-26 Brookhaven Science Associates Llc Beam splitter and method for generating equal optical path length beams
TW522281B (en) * 2001-05-21 2003-03-01 Hitachi Ltd Projector
US6561648B2 (en) * 2001-05-23 2003-05-13 David E. Thomas System and method for reconstruction of aberrated wavefronts
US20040012872A1 (en) 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
US7298415B2 (en) * 2001-07-13 2007-11-20 Xenogen Corporation Structured light imaging apparatus
US6909556B2 (en) * 2002-01-14 2005-06-21 Lightmaster Systems, Inc. Design of prism assemblies and kernel configurations for use in projection systems
US6781763B1 (en) * 2002-04-01 2004-08-24 The United States Of America As Represented By The Secretary Of The Air Force Image analysis through polarization modulation and combination
US7359045B2 (en) * 2002-05-06 2008-04-15 Applied Materials, Israel, Ltd. High speed laser scanning inspection system
ATE538412T1 (de) * 2002-10-25 2012-01-15 Mapper Lithography Ip Bv Lithographisches system
US7307787B2 (en) * 2002-12-20 2007-12-11 Fuji Xerox Co., Ltd. Beam splitting prism, method of manufacturing beam splitting prism, and all-optical switching device
US6909735B2 (en) * 2003-04-10 2005-06-21 Hitachi Via Mechanics, Ltd. System and method for generating and controlling multiple independently steerable laser beam for material processing
US7057720B2 (en) * 2003-06-24 2006-06-06 Corning Incorporated Optical interrogation system and method for using same
US7421973B2 (en) * 2003-11-06 2008-09-09 Axcelis Technologies, Inc. System and method for performing SIMOX implants using an ion shower
EP1723455B1 (en) * 2003-12-05 2009-08-12 3M Innovative Properties Company Process for producing photonic crystals
EP1710609A1 (en) * 2005-04-08 2006-10-11 Deutsches Krebsforschungszentrum Stiftung des öffentlichen Rechts Optical scanning device and method of deriving same
US7551359B2 (en) * 2006-09-14 2009-06-23 3M Innovative Properties Company Beam splitter apparatus and system

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102335795A (zh) * 2010-07-20 2012-02-01 株式会社迪思科 光学装置以及具备该光学装置的激光加工装置
CN102335795B (zh) * 2010-07-20 2015-03-18 株式会社迪思科 光学装置以及具备该光学装置的激光加工装置
CN108027482A (zh) * 2015-08-10 2018-05-11 德国多元光子光学有限公司 具有射束偏转元件的光学构件、其制造方法及适合于光学构件的射束偏转元件
CN108027482B (zh) * 2015-08-10 2021-09-28 德国多元光子光学有限公司 具有射束偏转元件的光学构件、其制造方法及适合于光学构件的射束偏转元件
CN111427236A (zh) * 2019-01-09 2020-07-17 芯恩（青岛）集成电路有限公司 一种多光束光掩膜板曝光系统

Also Published As

Publication number Publication date
US20080083886A1 (en) 2008-04-10
EP2069850A1 (en) 2009-06-17
EP2069850A4 (en) 2010-07-28
WO2008033750A1 (en) 2008-03-20
JP2010503537A (ja) 2010-02-04

Similar Documents

Publication Publication Date Title
CN101529309B (zh) 分束器装置和系统
CN101517454A (zh) 适用于加工多光子可固化光反应性组合物的光学系统
US11796720B2 (en) Apparatus, laser system and method for combining coherent laser beams
CN115121940B (zh) 激光线照射
KR102143085B1 (ko) 노광 시스템, 노광 장치 및 노광 방법
JP6768067B2 (ja) 幾何要素のアレイを印刷するための方法およびシステム
US7991037B2 (en) Multi-beam laser apparatus
US20100309559A1 (en) Device for Beam Shaping
JP2005262290A (ja) レーザ加工装置、レーザ加工方法、及び該加工装置又は加工方法により作製された構造体
CN101960385A (zh) 多光子曝光系统
CN106062636A (zh) 光刻系统
EP3781989B1 (en) Methods and systems for printing large periodic patterns by overlapping exposure fields
TWI687777B (zh) 輻射光源模組
US20230375760A1 (en) Method For Producing A Continuous Diffractive Optical Element, Device For Carrying Out The Production Method And Continuous Diffractive Optical Element
JP4456881B2 (ja) レーザ加工装置
Zuo et al. Demonstration of femtosecond laser micromachining for figure correction of thin silicon optics for x-ray telescopes
US8585390B2 (en) Mold making system and mold making method
TWI536122B (zh) 微影投影曝光設備之照明系統
CN101344726B (zh) 制作周期性图案的步进排列式干涉微影方法及其装置
WO2005025800A1 (ja) レーザ加工方法及び加工装置
CN119526757A (zh) 用于生成三维结构的方法以及激光光刻设备
CN121729316A (zh) 用于制备三维结构的激光光刻装置及其操作方法
Prasciolu et al. Fiber-to-rectangular waveguide optical coupling by means of diffractive elements
NL2010242A (en) A lithography apparatus, a device manufacturing method, a method of manufacturing an attenuator.
KR20050060808A (ko) 레이저 빔을 이용한 미세 구조물 제작방법

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
AD01 Patent right deemed abandoned

Effective date of abandoning: 20090826

C20 Patent right or utility model deemed to be abandoned or is abandoned