CN101515500B - Microminiature retardation coil and manufacture method thereof - Google Patents
Microminiature retardation coil and manufacture method thereof Download PDFInfo
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- CN101515500B CN101515500B CN2008100072076A CN200810007207A CN101515500B CN 101515500 B CN101515500 B CN 101515500B CN 2008100072076 A CN2008100072076 A CN 2008100072076A CN 200810007207 A CN200810007207 A CN 200810007207A CN 101515500 B CN101515500 B CN 101515500B
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- coil
- microminiature
- ferrimagnet
- retardation
- coil body
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- 238000000034 method Methods 0.000 title claims abstract description 42
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 20
- 238000005516 engineering process Methods 0.000 claims abstract description 26
- 238000004804 winding Methods 0.000 claims abstract description 20
- 239000013078 crystal Substances 0.000 claims abstract description 13
- 238000009713 electroplating Methods 0.000 claims abstract description 11
- 238000005229 chemical vapour deposition Methods 0.000 claims abstract description 10
- 239000011248 coating agent Substances 0.000 claims abstract description 10
- 238000000576 coating method Methods 0.000 claims abstract description 10
- 238000004544 sputter deposition Methods 0.000 claims abstract description 5
- 239000010408 film Substances 0.000 claims description 19
- 239000010409 thin film Substances 0.000 claims description 18
- 238000007747 plating Methods 0.000 claims description 12
- 230000005294 ferromagnetic effect Effects 0.000 claims description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000000428 dust Substances 0.000 claims description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims description 3
- 230000008021 deposition Effects 0.000 claims description 3
- 238000007772 electroless plating Methods 0.000 claims description 3
- 230000004927 fusion Effects 0.000 claims description 3
- 238000001659 ion-beam spectroscopy Methods 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 239000011701 zinc Substances 0.000 claims description 3
- 239000003302 ferromagnetic material Substances 0.000 abstract description 4
- 239000000758 substrate Substances 0.000 abstract 1
- 238000000465 moulding Methods 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 238000003825 pressing Methods 0.000 description 5
- 238000005452 bending Methods 0.000 description 4
- 238000005253 cladding Methods 0.000 description 4
- 239000000696 magnetic material Substances 0.000 description 4
- 239000011810 insulating material Substances 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 230000005291 magnetic effect Effects 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 208000027418 Wounds and injury Diseases 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005234 chemical deposition Methods 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 230000003321 amplification Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 238000007596 consolidation process Methods 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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Abstract
The invention discloses a microminiature retardation coil and a manufacture method thereof. The manufacture method comprises the following steps: firstly, preparing a lacquered wire or a wire coated with an insulating film; secondly, winding the lacquered wire or the wire coated with the insulating film into a spiral coil; thirdly, coating a layer of ferromagnetic material with the thickness more than 1 tenthmeter (10 <-10>m) as a substrate on the surface of the spiral coil by process procedures such as sputtering; and finally, coating proper amount of the ferromagnetic material on the coil surface which have been coated with the ferromagnetic material and between coils through process procedures such as electroplating technology, crystal growing technology or chemical vapor deposition to obtain the microminiature retardation coil of which the shape is blocky.
Description
Technical field
The present invention relates to a kind of microminiature retardation coil; Particularly relate to a kind of on the surface of electric wire coiling coil with the lining dielectric film; Successively with thin film manufacture process, crystal growing technology or other chemical processing procedure; Make ferrimagnet earlier be attached to coil surface, and then adhere in right amount and be filled in outside the thin magnetic layer's that is covered the coil, make choking winding be able to hypomegetic choking winding with the film pattern.
Background technology
The general choking winding of being sold on the market; Mainly by coil on the magnetic cylinder form; But the volume of the magnetic cylinder of mechanicalness structure is very big, can't be applicable to the demand of the electronic product that day by day tends to compact, therefore; Promptly there is relevant dealer that this is studied, hopes to obtain being more suitable for choking winding in present electronic product demand.
TaiWan, China patent announcement I279818 number has disclosed a kind of manufacturing approach of choking winding, and it comprises step: prepare the upright flat sheet-like of a strip, and two ends have the metal wire rod that the extension of certain altitude is extended in downward bending; End with metal wire rod is a starting point; The other end according to this starting point end do the many rings of horizontal direction around and be wound into upright horizontal shape continuous helical coil; Extension with the coil bottom outwards is bent into horizontal respectively again; From inside to outside stretch out after forming inner extension level bending, the then direct level bending of the extension of outer end is positioned at the outside; Spiral coil is inserted in the mould, the two ends extension is extended outside the mould; In mould, fill magnetic material powder, do not have an air gap with what coat that spiral coil makes; Molded, form a pair of tank in coil cladding outer surface; After the moulding, will stretch out the outer extension of cladding along the bending of cladding surface, the extension end then embeds in the tank of cladding.
But the choking winding that this bulletin disclosed, it is inserted in the mould with spiral coil earlier, and next is used in fills magnetic material powder in the mould, get with the mode of high-pressure molding then.But utilize the choking winding and the imperfection of said method gained.Main is this method of utilizing nature to fill pressing; As shown in Figure 1, be formed at the ferrimagnet 2 outside the coil body 1 through the press mold processing procedure, have isolation clearly between itself and the coil body 1; And driving fit fully, make that its whole volume can't microminiature.And, in pressing process, easily coil body is produced injury, so the moulding article that pressing is come out cause the inhomogeneous of integral body and have influence on the inaccuracy of inductance value because of coil is impaired easily.
In addition; Above-mentioned existing choking winding; Because ferrimagnet system is filled in the mould, get with the moulding of mechanical high-pressure molding mode again, so the ferrimagnet that is coated outside the coil body all can be more than in fact needed amount; This still existing choking winding can't microminiaturization reason, the cost that the unnecessary ferrimagnet that also caused choking winding causes increases.
Summary of the invention
Main purpose of the present invention is, a kind of microminiature retardation coil is provided, so that ferrimagnet is formed at the surface of coil body earlier with the mode of film, avoids damage with the protection coil body, reaches and improves the existing problem of moulding pressing and forming.
A purpose more of the present invention is providing a kind of microminiature retardation coil; With thin film manufacture process and electroplating technology, crystal growing technology or chemical deposition processing procedures such as sputters, let an amount of ferrimagnet not only be attached to coil body via successively, and; Ferrimagnet can fully be filled the space that coil body is surrounded; Combine fully with coil body, so ferrimagnet can not have unnecessary waste under the situation of optimal dose; And can reduce the cost of choking winding because of too much ferrimagnet, more can be applicable to the manufacturing moulding of microminiature retardation coil.
The present invention adopts following technological means to realize:
A kind of microminiature retardation coil, this choking winding comprise the coil body that a continuous helical is reeled, and two respectively from the outward extending electrode part of coil body one end; Described coil body is coated with the wire rod of dielectric film, and its surface is being covered the ferrimagnet of combining closely with dielectric film again as basic unit.
The space that the outside of aforesaid coil body and coil body are centered on all is full of ferrimagnet, and coil body is coated.
The ferrimagnet of the dielectric film that aforesaid lining coil bulk line material is outer is a ferromagnetic thin film basic unit, and the thickness of this ferrimagnet film basic unit is at least greater than 1 dust.
Aforesaid ferrimagnet can be ferro element, cobalt element or nickel element.
A kind of manufacturing approach of microminiature retardation coil comprises the following steps:
Select the enamel-cover wire rod for use or be coated with the body of the metal wire rod of dielectric film as coil method;
With enamelled wire or be coated with the metallic wire coil coiling coil of dielectric film;
Utilize thin film manufacture process to form the film basic unit of ferrimagnet in the coil method outer surface;
Via electroplating technology, let ferromagnetic material be formed in right amount in the space that is surrounded with coil body on the coil body that has ferrimagnet film basic unit; Form the microminiaturization choking winding with this.
The ferrimagnet of aforesaid whole coating coil body utilizes crystal growing technology to form.
The ferrimagnet of aforesaid whole coating coil body, chemical vapour deposition technique capable of using forms.
The ferrimagnet of aforesaid whole coating coil body, chemical plating capable of using, fusion are plating, meltallizing is plating, vacuum is being plated, (cathode) sputtering, ion beam sputtering deposition, strike plating or the hot method electroless plating techniques of zinc, or the collosol and gel law technology forms.
The present invention compared with prior art has following significantly above and beneficial effect:
Microminiature retardation coil provided by the present invention, elder generation prepares enamelled wire or is coated with the wire rod of dielectric film, and next is reeled becomes helical coil, on coil body, forms a layer thickness greater than 1 dust (10 in the surface of this helical coil with thin film manufacture process such as sputters again
-10M) ferromagnetic thin film; Multiple the coil body of surface-coated ferromagnetic thin film is inserted among the tool; Utilize electroplating technology, crystal growing technology or chemical deposition processing procedure then, the whole coating of an amount of ferrimagnet has been covered outside the coil of ferromagnetic thin film, process microminiature retardation coil with this.
Description of drawings
The choking winding section diagrammatic sketch that Fig. 1 manufactures for the method with existing TaiWan, China patent announcement I279818;
The enamelled wire diagrammatic sketch that Fig. 2 uses for the present invention;
Fig. 3 is the helical form diagrammatic sketch for microminiature retardation coil of the present invention;
Fig. 4 adheres to the stereogram and the local amplification profile thereof of ferrimagnet through thin film manufacture process for microminiature retardation coil of the present invention;
Fig. 5 inserts the diagrammatic sketch in the tool for microminiature retardation coil of the present invention;
Fig. 6 is the manufactured goods and the section diagrammatic sketch thereof of microminiature retardation coil of the present invention.
Embodiment
Below in conjunction with accompanying drawing specific embodiment of the present invention is explained:
Microminiature retardation coil of the present invention, its manufacturing step comprises:
1. select the body (as shown in Figure 2) of enamelled wire 3 (insulating material 30 such as metal wire appearance coated high molecular) for use as coil method;
2. the enamelled wire 3 of insulating material 30 films such as metal wire appearance coated high molecular is processed flat spin coil 4 through up-coiler, the spiral of its helical coil is very close, and preferable is round (as shown in Figure 3);
3. the thin film manufacture process that utilizes sputter (sputtering) etc. is attached to the wire surface of helical coil 4 with the fine-powder of ferrimagnet (like iron, cobalt, nickel etc.), and forms a layer thickness greater than 1 dust (10 at wire surface
-10M) ferromagnetic thin film basic unit 5 (as shown in Figure 4), this ferromagnetic thin film basic unit 5 fits tightly with the insulating material that wire surface the coated 30 films formation of helical coil 4;
4. again helical coil 4 is inserted (as shown in Figure 5) among the tool 6, the size of tool only is large enough to hold and is fit to come the ferrimagnet of whole coating coil body promptly enough;
5. utilize electroplating technology, crystal growing technology (CRYSTAL GROWTH) or chemical vapour deposition technique (Chemical vapordeposition; CVD); Make ferrimagnet riddle this tool 6 volume inside 7; Not only be attached to the surface of the ferromagnetic thin film basic unit 5 of helical coil 4 then in right amount, in helical coil 4 outsides with and the inner space that surrounded also all be full of ferrimagnet 8 (as shown in Figure 6);
6. remove tool 6, promptly get microminiature retardation coil.
Carrying out above-mentioned manufacturing step when making choking winding, because ferrimagnet is that (Chemical vapordeposition CVD) forms the state that helical coil 4 is coated via electroplating technology (electroplating), crystal growing technology (CRYSTAL GROWTH) or chemical vapour deposition technique; Via the made choking winding of these technology, its ferrimagnet not only can fill a part driving fit with coil body, and; Because coil body is very little, utilize electroplating technology, crystal growing technology, even the formed trace iron magnetic material of chemical vapour deposition technique; Promptly be enough to be full of the inner space that helical coil 4 is centered on; And the helical coil body coated fully, form the choking winding of a consolidation, therefore; The present invention never has the impaired and unequal problem of coil body that the moulding pressing is produced, and improves the characteristic of assembly.
Microminiature retardation coil of the present invention; Utilize electroplating technology, crystal growing technology or chemical vapour deposition technique; Should be used for forming the ferrimagnet that coats microminiature retardation coil; The ferrimagnet that coats the choking winding body that forms not only density is high but also do not account for volume, the formation of no a large amount of and unnecessary ferrimagnet, and can be implemented on the more making of microminiature retardation coil.
The present invention makes the trace iron magnetic material be full of inner space that helical coil 4 centered on the helical coil body is coated fully except utilizing electroplating technology, crystal growing technology or chemical vapour deposition technique; Can utilize also that chemical plating, fusion are plating that (hot-dip), meltallizing are plating, vacuum is being plated, (cathode) sputtering, ion beam sputtering deposition, strike plating or electroless plating techniques such as the hot method of zinc, or technology such as sol-gal process (Sol-gel method) forms.
What should explain at last is: above embodiment only in order to the explanation the present invention and and unrestricted technical scheme described in the invention; Therefore, although this specification has carried out detailed explanation to the present invention with reference to each above-mentioned embodiment,, those of ordinary skill in the art should be appreciated that still and can make amendment or be equal to replacement the present invention; And all do not break away from the technical scheme and the improvement thereof of the spirit and the scope of invention, and it all should be encompassed in the middle of the claim scope of the present invention.
Claims (7)
1. microminiature retardation coil, this choking winding comprise the coil body that a continuous helical is reeled, and two respectively from the outward extending electrode part of coil body one end; It is characterized in that: described coil body; Be around forming with the surface-coated wire coil that dielectric film is arranged; The ferromagnetic thin film basic unit that the dielectric film surface of this wire rod is being covered again and is combining closely with dielectric film; And the space that the outside of coil body and coil body are centered on all is full of ferrimagnet, and coil body is coated.
2. microminiature retardation coil according to claim 1 is characterized in that: the thickness of wherein said ferromagnetic thin film basic unit is at least greater than 1 dust.
3. microminiature retardation coil according to claim 1 is characterized in that: wherein said ferrimagnet is ferro element, cobalt element or nickel element.
4. the manufacturing approach of a microminiature retardation coil is characterized in that: comprise the following steps:
Select the enamel-cover wire rod for use or be coated with the body of the metal wire rod of dielectric film as coil method;
With the enamel-cover wire rod or be coated with the metallic wire coil coiling coil of dielectric film;
Utilize thin film manufacture process to form ferromagnetic thin film basic unit in the coil method surface;
Via electroplating technology, let ferrimagnet be formed in the space that is surrounded with coil body on the coil body that has ferromagnetic thin film basic unit;
Form microminiature retardation coil with this.
5. the manufacturing approach of microminiature retardation coil according to claim 4 is characterized in that: the ferrimagnet of described whole coating coil body, utilize crystal growing technology to form.
6. the manufacturing approach of microminiature retardation coil according to claim 4 is characterized in that: the ferrimagnet of wherein said whole coating coil body forms for utilizing chemical vapour deposition technique.
7. the manufacturing approach of microminiature retardation coil according to claim 4; It is characterized in that: the ferrimagnet of wherein said whole coating coil body; For utilize chemical plating, fusion plating, meltallizing is plating, vacuum is being plated, (cathode) sputtering, ion beam sputtering deposition, strike plating or the hot method electroless plating techniques of zinc, or the collosol and gel law technology forms.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008100072076A CN101515500B (en) | 2008-02-19 | 2008-02-19 | Microminiature retardation coil and manufacture method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008100072076A CN101515500B (en) | 2008-02-19 | 2008-02-19 | Microminiature retardation coil and manufacture method thereof |
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| Publication Number | Publication Date |
|---|---|
| CN101515500A CN101515500A (en) | 2009-08-26 |
| CN101515500B true CN101515500B (en) | 2012-05-02 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008100072076A Expired - Fee Related CN101515500B (en) | 2008-02-19 | 2008-02-19 | Microminiature retardation coil and manufacture method thereof |
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| Country | Link |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1208792C (en) * | 2001-02-22 | 2005-06-29 | Tdk株式会社 | Electronic element and making method thereof |
| CN1260745C (en) * | 2003-04-01 | 2006-06-21 | 乾坤科技股份有限公司 | Anticurrent coil and its manufacturing method |
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2008
- 2008-02-19 CN CN2008100072076A patent/CN101515500B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1208792C (en) * | 2001-02-22 | 2005-06-29 | Tdk株式会社 | Electronic element and making method thereof |
| CN1260745C (en) * | 2003-04-01 | 2006-06-21 | 乾坤科技股份有限公司 | Anticurrent coil and its manufacturing method |
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| Publication number | Publication date |
|---|---|
| CN101515500A (en) | 2009-08-26 |
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Granted publication date: 20120502 |