CN101473405B - Insert piece for an end-block of a sputtering installation - Google Patents
Insert piece for an end-block of a sputtering installation Download PDFInfo
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- CN101473405B CN101473405B CN2007800229926A CN200780022992A CN101473405B CN 101473405 B CN101473405 B CN 101473405B CN 2007800229926 A CN2007800229926 A CN 2007800229926A CN 200780022992 A CN200780022992 A CN 200780022992A CN 101473405 B CN101473405 B CN 101473405B
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- 238000004544 sputter deposition Methods 0.000 title description 2
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- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3423—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
- H01J37/3497—Temperature of target
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
An insert piece (340) is described for introducing between the mounting base (314) and the end-block (310) of a magnetron sputtering installation. Such an insert piece replicates (320', 322') on one end the end-block interface (322) and at the other end the mounting base interface(320). Inside the insert, transfer rods (342) and tubing (444,444') are provided for the transfer of coolant, electrical current and motive force between the mounting base (314) and the end-block (310). The insert piece (340) is useful to adjust the distance between the target and the substrate. An advantageous embodiment of the insert piece incorporates resilient means into it for accommodating small movements of the end-block caused by thermal expansion or sagging of the target tube. In another advantageous embodiment, the inserts are so long that they cross the plane of the substrate. In this way a target can conveniently be mounted to coat the side opposite to the normal coating side of the substrate without the need for extensive refurbishment of the installation.
Description
Technical field
The present invention relates to a kind of annex, promptly a kind of plug-in unit is used for the distance between sputter equipment adjusting sputtering target material and matrix.By introducing plug-in unit of the present invention, just can regulate this distance easily, and need not sputter equipment is made further change.
Background technology
It is the coating technology of the establishment of planar substrates plating, for example plating display glass plate, glass pane, touch-screen and many other equivalent device that sputter has become a kind of.In sputter equipment, be transmitted in the place ahead of sputter magnetron by the matrix of plating.This sputter magnetron is as the atom injection source, and like this, the target atom that is used for the plating matrix is just evicted from target material surface by the ion that quickens out from low pressure gaseous plasma electricity.This plasma is by magnetic confinement, and this magnetic field is kept by the magnet of relative installation with the target as sputter side.In this sputter procedure, the distance between target and the matrix is very important, will introduce a variety of causes below.
Although atom mainly sprays in the direction perpendicular to target material surface, because atom is evicted the stochastic behaviour of process from, so still there is the diffusion of sizable angle.In order to guarantee the even of plating, therefore preferably making target exceed matrix border is the twice of target to distance between the matrix at least.Therefore, target is big more to the distance between the matrix, has just caused overflowing in edge many more.More overflow nature and mean that also total plating speed is slower.In addition, target means that to the distance between the matrix is big more dispossessed target atom is high more with probability that gas atom bumps in arriving the way of matrix, therefore also causes the efficient of plating lower.Sometimes, need make magnetic field line extend to matrix, so that the fine setting plating performance always.When this is in case of necessity, adopt special magnet array, extend farther magnetic field to produce.Because magnetic field intensity is along with target sharply reduces to the distance between the matrix, i.e. the possibility of dipole field, so this so-called " uneven magnetron " extended magnetic field line is quite restricted on distance.In this case, magnetron is entirely moved more close matrix so that be under the influence of magnetic field line by the matrix of plating be can be helpful.
Target also influences the temperature of matrix to the distance of matrix: because the impact of gas ion, target trends towards becoming very hot (and therefore having to cool off), so thermal radiation will make the matrix heating.Sometimes, this is helpful in the plating process, has for example improved adhesion or the side reaction in the plating, but also has been harmful to for matrix, for example when matrix has low softening point.In this case, be necessary to increase target to the distance between the matrix.
Equally, what is interesting is,, need to increase target again to the distance between the matrix in order to be limited in the starting the arc influence at target matrix place.Electric arc promptly is created in sputter area on the target material surface and the spark between the non-sputter area, can apply enough energy bigger target fragment is sprayed towards matrix.When this phenomenon when matrix too closely takes place, will cause the plating defective.
Therefore, need in sputter equipment, can adjust target to the distance between the matrix always.Although for static plane plating machine, for example in electronics industry, be used for concerning the plating machine of the chip plating of 200mm or 300mm diameter, it is simple relatively to the distance of matrix to adjust target, but for the rotatable tubulose target that extends beyond 4 meters width in large tracts of land plating machine, it is just much more difficult to the distance of matrix to adjust target.
The serial United States Patent (USP) of McKelvey (4356073,4422916,4443318,4445997,4466877) has at first been introduced by providing rotatable tubular target target to be sent to the design of plasma, wherein, stable elongation magnetic field is maintained at this target material surface place.Bigger raw material, better cooling and better process control, the importance of these advantages has surpassed installs the bigger shortcoming of target complexity.In fact, must provide high electric current to keep plasma to target, and this cools off target by the cooling agent that passes in and out target that circulates when causing rotating before target must keep static magnetic array, and all these need keep the integrality of vacuum simultaneously.
Basically, from this imagine substantially amplify out two kinds mutually the competition designs.
At first, a solution be by the single bearing housing that is installed in being called on the vacuum-chamber wall " end block " come to target tube input and output necessity cooling agent, supply with necessary electric current and necessary motive power be provided.Under this situation, target axis is usually perpendicular to the wall that end block is installed.This installation is called cantilever (US 4519885, US 5200049, US 2004/0140208, WO2006/023257) is installed.Be necessary to be provided with small-sized machine at the target end place relative and support, so that the mechanical support effect is provided in operating process with end block.By for the mounting screw that end block is installed on the wall provides elongate slot, just can adjust the distance of target relatively like a cork to matrix.
Secondly, second kind of solution is to distribute necessity to target by two end blocks that are positioned at the target two ends.Under this situation, target is installed into its parallel axes in the wall that end block is installed.Therefore, these two end blocks are " right angle " type.Introduced the example that further develops among US 4422916, US 4445997, US 5096562, US 6736948, the WO 2006/007504.In this second kind of solution, two kinds " design schools " have appearred, and in a kind of " design school ", end block is the box that is attached on the wall, can touch and can see the inside (for example US 6736948) of box from the atmospheric side of wall; In second in " design school ", end block is the modular cartridge of sealing, this modular cartridge has the interface that is complementary with the interface that is attached on the pedestal in the device wall, its median surface allows with single lock screw Fast Installation (dismounting), shown in http://www.bekaert.com/bac/Products/Sputter%20hardware/End%20Bl ock.htm.
Fig. 1 a and 1b provide the sketch of back a kind of design, and wherein, the end block 110 that is used to carry rotatable target 112 is removably attached to mounting base 114, and this mounting base 114 is located in the wall 116 of sputter equipment.Mounting base 114 has the pedestal interface 120 that is complementary with end block interface 122.Interface 120,122 is compressed mutually by threaded collar 118.Cooling agent or electric current or motive power pass to target 112 by interface 120,122 from supply line 122,122 '.In the time need making amendment to this existing design, on the wall of sputter equipment, cut out opening for rotatable target being moved away from the also promptly mobile close matrix of mounting base.Shown in Fig. 2 a and 2b, by on the wall 216 of sputter equipment, cutting out opening and box 230 being welded on the wall or with the bolt with static seal (for example O type circle) it is tightened on the wall, can carry out above-mentioned modification.Mounting base 214 is installed in bottom at box 230.Needless to say, such process makes consuming time, huge to the change of sputter equipment.In addition, all supply pipelines all need to prolong, and the connection supply pipeline is not easy in box.Therefore, the inventor seeks and has found the solution of this problem.
Summary of the invention
Therefore, the purpose of this invention is to provide a kind of quick, reversible and simple system,, can change the locus of end block in the sputter equipment by this system.The present invention has introduced a kind of annex, is under the situation of sealing, modular at end block, and this annex provides the possibility that changes distance between mounting base and the end block in a few minutes.Except the problem of end block location, also will introduce some other problem that solves as additional benefit below.
According to a first aspect of the present invention, a kind of plug-in unit is provided, this plug-in unit can be inserted at the inner available mounting base of sputter plater and removably be attached between the end block on the described mounting base, described end block is used at the rotatable sputter magnetron of the inner carrying of described sputter plater, described mounting base has the pedestal interface that the end block interface with described end block is complementary, it is characterized in that, be provided with at an end of described plug-in unit and duplicate the pedestal interface, and be provided with at the other end of described plug-in unit and duplicate the end block interface, described plug-in unit also comprises and is used for the device that operationally described mounting base is connected with described end block, thereby provides the degree of freedom that increases for the location of described end block in described sputter plater.This plug-in unit can be inserted between end block and the inner available mounting base of sputter equipment.The combination of known this mounting base/end block in this area.Usually, one or more (being generally even number) mounting base can be arranged on the sputter module that can be installed on the sputter equipment.This mounting base generally includes the back-up ring on the flange that is fixed to sputter module, and this flange is the flange that engages with the sputter equipment vacuum-tight.This mounting base has the pedestal interface that the end block interface with end block is complementary, mate mutually by making these interfaces, when pedestal and end block clamp mutually, cooling agent input or coolant extraction or electric current input or operate the just interconnection automatically of these necessitys of the required motive power of rotatable target.In addition, the interface has the device that prevents issuable cooling agent leakage and/or gas leakage, for example O type circle and O type circle receiving slit.For end block itself, target tube connects by rotary connector.Known multiple connector in this area, for example connector of in US 5591314 and WO 00/00766, introducing.The function of end block is that the sputter necessity is transferred to target, allow target to rotate in a vacuum simultaneously, in order to reach this purpose, be provided with the supporting of rotation vacuum seal, rotation coolant seals, rotatory current connector, carrying target in end block inside and make bar magnet keep the holding device of location.Described end block can be straight-through end block, also can be the perpendicular type end block.
The feature of plug-in unit of the present invention is: an end of plug-in unit has the pedestal of duplicating interface, and the other end has the end block of duplicating interface.When inserting plug-in unit, plug-in unit duplicate the interface that the pedestal interface is connected to end block, the end block interface of duplicating of plug-in unit is connected to the pedestal interface.Just look like that mounting base has been transferred into sputter equipment, so end block can be positioned at other place of internal vacuum chamber.Because the function of plug-in unit is not only the transfer end block, also will keep the operating characteristics of end block simultaneously, so the inside of plug-in unit just must provide the device that can realize these functions.
The degree of freedom of end block immigration vacuum chamber is restricted hardly, but must consider that plug-in unit must be able to carry the weight of end block and target and cooling agent.Therefore two kinds of particularly advantageous structures are arranged, in wherein a kind of structure, the interface is in the substantially parallel each other plane; In the another kind of structure, the interface is in the plane of perpendicular each other.
It is extremely important how the interface clamps mutually, because this clamping must be able to be carried the load of end block and target and cooling agent.The first kind of mode that achieves this end is to connect by threaded collar.By with the inner side step at place, end of threaded collar against plug-in unit on circumferential ridge, threaded collar is just rotatably remained on duplicates pedestal interface edge place on the plug-in unit.Cut out the internal thread that is meshed with the end block external screw thread at place, inboard towards the threaded collar other end.At first, end block interface and plug-in unit interface are matched together carefully, then, threaded collar is screwed on and tighten with monkey wrench.At the other end of plug-in unit, threaded collar is mounted pedestal and keeps, and external screw thread is having on the plug-in unit end of duplicating the end block interface.Another kind of plug-in unit is fixed to mounting base and is to adopt segmentation tensioning circle the mode that plug-in unit is fixed to end block.The inboard of this tensioning circle has the V-type crack, and this tensioning circle is divided into two sections or three sections that are hinged together usually.The truncated cone flange on end block and plug-in unit and plug-in unit and the mounting base is blocked in the crack.When the spanner spiral that connects two sections is closed (vacuum coupling of similar ISO-KF type), the interface has just been compressed mutually.
For the interface is correctly interconnected, advantageously provide the guide finger that cooperates with the hole, to obtain good alignment.Alternately, can utilize the import or export of current feed device or cooling agent to come to provide guiding for matched interface.
Can certainly adopt the connection of other type, for example the connection of bayonet type.
In order when plug-in unit being introduced between mounting base and the end block, to keep the operating characteristics of target, must transmit those necessitys that must supply to target and pass through plug-in unit.As noted earlier:, just need to realize following process in order to keep the function of target:
-provide negative current to keep plasma and the cation in the plasma is quickened towards target, so that make the sputter material atom break away from target.The dynamic impact forces of ion is very high, and therefore the supply of most of energy has all changed into heat, i.e. target heating.By solid copper bar axial in plug-in unit and that elasticity is installed, just can pass through the plug-in unit transmission current.
-therefore need to supply with cooling agent (normally chilled water) to make target remain on working temperature.Owing to need considerable cooling energy, just must from target, extract the cooling agent of heating out.For this reason, adopt the cooling circuit of sealing.Plug-in unit duplicate mounting base at the interface, have the sharp mouth that engages with the reception mouth of end block, and at the plug-in unit other end, the mouth that duplicates the end block interface receives the sharp mouth of mounting base.
-for the new target of input in plasma, must provide motive power to make target keep rotation to target.The rotation of target is also extremely important, in case because the heated part of target withdraws from plasma slab, it just is cooled.Normally the axle of socket by having rotation condition and pin formula device is realized rotation, although the rotation transfer mode of other type can adopt equally.In plug-in unit, motive power can be by being kept by bearing and can having the solid shafting of suitable socket and pin formula device to transmit in both sides.In order to reach this purpose, also can adopt flexible shaft.
In the operating process, target all can become more and more hotter in any case.This has caused the axial expansion of target.Except axial expansion, because for example target tube is sagging, radial missing also can take place in target.In order to make sputtering technology controlled, the deviation between these and the ideal state (not having axially or radial missing) must be remained to minimum degree.But this is impossible, and may cause the sealing in the end block and the excessive wear of bearing in the extreme situation lower deviation.US 6736948 has found the solution of this problem, promptly introduces " axial compliance end block ".The inventor recognizes to have certain flexible plug-in unit by employing and just can easily solve identical problem.Elasticity must be allowed and duplicated interface little deviation each other.Can adopt following multiple mode to obtain elasticity:
-flexible O type the circle of employing between the interface.Owing to have such O type circle at present, therefore had the elasticity of less degree.But, adopt for example thicker O type circle, have the O type circle of better elastic performance, two O type circle (each side at interface each with) just can improve elasticity.
-be that plug-in unit adopts elastic outer cover.Outer cover is tubulose normally, although do not get rid of other shape; Outer cover can for example allow necessarily flexible by high-grade polymeric material
PVDF (Kynoar) or ECTFE (copolymer of ethene and chlorotrifluoroethylene) or PEEK
TM(polyether-ether-ketone).Alternately, also can adopt the metal tube that is welded with circumferential metal spring, for example the part of stainless-steel vacuum bellows.
Certainly also may adopt these combination of features.But must be careful, when plug-in unit is forced to when leaving its equilbrium position, plug-in unit neutralization transfer device is not at the interface wanted overstrain, and still keeps it functional.In order to reach this purpose, can adopt flexible pipe, flexible shaft and flexible electrical conductor to transmit necessity and pass through plug-in unit.
According to a second aspect of the invention, the claimed a pair of plug-in unit of the present invention.Can know according to the explanation of front and to know that if adopt two end blocks to support the two ends of targets, the necessity of so not all operation target all must be provided by these two end blocks the while.In fact, these necessitys can be divided by these two end blocks.When these necessitys being categorized as the input of (F) cooling agent, (E) coolant extraction, the input of (C) electric current, (M) motive power, then these necessitys can be divided into seven kinds of significant combinations: [F] [ECM], [E] [FCM], [C] [FEM], [M] [FEC], [FE] [CM], [FC] [EM] and [FM] [EC].Though each from technical standpoint the combination of these divisions has equal feasibility, what can see in the practice is the combination of [M] [FEC] and [C] [FEM].
According to a third aspect of the present invention, the claimed a kind of sputter module of the present invention.This module is as the carrier of mounting base, and comprises the input that is necessary and the control annex of pipe-line system and electronic system usually.But this module can be a door also, fixed installation pedestal on it, the end block of portion's carrying within it (that is for example introduced in application PCT/EP2006/060216 co-pending is such).Plug-in unit of the present invention is installed between end block and mounting base.Because the interface is compatible, so this insert design directly makes them to be installed in series.
The combination that this module also can be equipped with the mounting base of a pair of coupling and end block (promptly, these first parts to mounting base and end block combination comprise first mounting base that is complementary with first end block, and these second parts to mounting base and end block combination comprise second mounting base that is complementary with second end block).This can carry a target to mounting base and end block combination.Equally, can on identical module, increase another to (mounting base, end block) combination, to carry second target.Existence can be carried the nearly module of four targets, but this principle can further be expanded.Plug-in unit of the present invention can be advantageously used in a target is reduced with respect to another.When plug-in unit was done longlyer, plug-in unit even can extend to matrix plane below can be installed second target, herein to be used for the opposite side in the single pass sputtered substrate.By this way, the disclosed thought of patent application PCT/EP2006/063173 just becomes especially simple and is easy to implement in practice.
Utilize the present invention,, just can transform existing sputter equipment expediently by between different (perhaps one) mounting bases and corresponding end block, inserting above-mentioned plug-in unit.This remodeling method can be implemented on quick and convenient ground, need not any special processing, because do not need to prolong the supply pipeline of existing apparatus, does not also need the plating module is done any special transformation.
Description of drawings
Below with reference to accompanying drawing the present invention is done more detailed description, wherein:
Fig. 1 a and Fig. 1 b have described the standard state that end block is installed.
Fig. 2 a and 2b have shown the prior art solutions that is used for reducing towards the matrix direction target.
Fig. 3 a and 3b have shown front view and the cutaway view that plug-in unit of the present invention how can favourable use.
Fig. 4 a, 4b and 4c are depicted as the end view of [FEC] type plug-in unit, axial cutaway view and perpendicular to the cutaway view of its axis.
Fig. 5 a, 5b and 5c are depicted as the end view of [M] type plug-in unit, axial cutaway view and perpendicular to the cutaway view of its axis.
Since Fig. 1 a has been discussed in " background technology " basically, 1b and Fig. 2 a, and next therefore the prior art shown in the 2b just no longer further explained these figure.In the accompanying drawings, the back two digits of similar part is identical, and first digit is then represented figure number.
Embodiment
Fig. 3 a and 3b have shown that plug-in unit of the present invention is how can be incorporated into expediently in the existing sputter equipment under need not to transform the situation of sputter equipment.Fig. 3 a and 3b have shown the existing parts of mounting base 314, and this mounting base 314 is fixed on the wall 316 of sputter plater.End block 310 can match with mounting base 314 by interface 320 and 322, but in this embodiment, has introduced plug-in unit 340 between mounting base and end block.Plug-in unit 340 has identical with the end block interface 322 end block interface 322 ' of duplicating, and identical with the interface 320 of the mounting base pedestal interface 320 ' of duplicating.Before be used to the threaded collar 318 that end block is fixed on the mounting base is used for plug-in unit 340 is fixed on the mounting base 314 now, another respective threads ring 318 is introduced into now and is used for end block is fixed to plug-in unit.In the inside of plug-in unit 340, be provided with device 344, be used for cooling agent is transported to end block from service and extraction pipeline 324,324 ', and be used for electric current being transported to end block 310 from connector 324 ' by connecting rod 342.
Fig. 4 a, 4b and 4c have shown the plug-in unit 440 among Fig. 3 in further detail.End at plug-in unit is provided with screw thread 445, is used for being screwed to the threaded collar of mounting base.Connecting rod 442 can be installed (can be spring-loaded ground) with moving axially and in plug-in unit 442, be used to guarantee suitable electrically contacting.Pipeline 444,444 ' is provided with the nozzle connector (not shown), and wherein a pipeline is used for supply coolant, and another is used for extracting cooling agent from end block.Threaded collar 418 ' is corresponding with the threaded collar of mounting base, and is screwed onto on the screw thread of end block.
Fig. 5 a, 5b and 5c are depicted as this another parts to plug-in unit, are used to transmit motive power.The shell 540 of this plug-in unit is still identical.Portion in the enclosure, rotating shaft 550 is kept by swivel bearing 552,552 '.The drive plate 554 of motive power by having cross recess is from the mounting base transmission, and wherein, the post bolt of mounting base axle is combined in the described cross recess.The other end at plug-in unit 555 has the post bolt identical with these post bolts, is used for plug-in unit further is connected to end block.
Two plug-in units all are furnished with vacuum necessary sealing and coolant seals, in case stopping leak leaks.These sealings are static seals, and promptly the part that they sealed does not have relative motion each other.All rotary seals all are integrated into the inside of end block.Like this, the pressure in the plug-in unit just can keep atmospheric pressure.
Claims (17)
1. plug-in unit, this plug-in unit can be inserted at the inner available mounting base of sputter plater and removably be attached between the end block on the described mounting base, described end block is used at the rotatable sputter magnetron of the inner carrying of described sputter plater, described mounting base has the pedestal interface that the end block interface with described end block is complementary, it is characterized in that, be provided with at an end of described plug-in unit and duplicate the pedestal interface, and be provided with at the other end of described plug-in unit and duplicate the end block interface, described plug-in unit also comprises and is used for the device that operationally described mounting base is connected with described end block, thereby provides the degree of freedom that increases for the location of described end block in described sputter plater.
2. plug-in unit according to claim 1, wherein, described rotatable sputter magnetron is the tubulose magnetron of elongation.
3. plug-in unit according to claim 1, wherein, described end block is a right-angled end-block.
4. plug-in unit according to claim 1, wherein, the described plane parallel at pedestal interface of duplicating is in described plane of duplicating the end block interface.
5. plug-in unit according to claim 1, wherein, described plane of duplicating the plane at pedestal interface perpendicular to described end block interface.
6. plug-in unit according to claim 1, wherein, the described interface that cooperatively interacts is secured to together by threaded collar.
7. plug-in unit according to claim 1, wherein, the described interface that cooperatively interacts is secured to together by segmentation tensioning circle.
8. plug-in unit according to claim 1, wherein, the described interface that cooperatively interacts is secured to together by bayonet coupling.
9. according to any described plug-in unit of claim 1 to 8, this plug-in unit also comprises be used for transmitting cooling agent, electric current and motive transfer device between described mounting base and described end block.
10. according to any described plug-in unit of claim 1 to 8, this plug-in unit also comprises elastic device, still keeps simultaneously working to be used to allowing described plug-in unit to shift out the equilbrium position.
11. a pair of plug-in unit, this can be compatible with a pair of mounting base that is complementary and end block combination to plug-in unit, each plug-in unit of described a pair of plug-in unit all is a plug-in unit according to claim 9, wherein, be used between the combination of the described a pair of mounting base that is complementary and end block, transmitting between cooling agent, electric current and the parts of motive described transfer device and divide at described a pair of plug-in unit.
12. a pair of plug-in unit according to claim 11, wherein, parts of described a pair of plug-in unit comprise the device that is used to provide cooling agent, extracts cooling agent and supplying electric current, and another parts of described a pair of plug-in unit comprise and are used to transmit motive device.
13. a pair of plug-in unit according to claim 11, wherein, parts of described a pair of plug-in unit comprise and are used to provide cooling agent, extract cooling agent and transmit motive device, and another parts of described a pair of plug-in unit comprise the device that is used for supplying electric current.
14. sputter module that is used to be installed on the sputter plater, this module comprises the end block that at least one mounting base and at least one and described mounting base are complementary, it is characterized in that described sputter module comprises that also between described mounting base and described end block at least one is according to any described plug-in unit of claim 1 to 10.
15. sputter module according to claim 14 wherein, is inserted according to any described two or more plug-in units in the claim 1 to 10 between described mounting base and described end block, described plug-in unit is arranged in series with each other.
16. sputter module that is used to be installed on the sputter plater, this sputter module comprises mounting base and the end block combination that at least one pair of is complementary, it is characterized in that, described sputter module also comprise can be inserted between described mounting base that is complementary and the end block according to any described at least one pair of plug-in unit in the claim 11 to 13.
17. one kind by inserting plug-in unit changes the distance between end block and its corresponding mounting base in sputter equipment method, one end of described plug-in unit has the interface that is complementary with described mounting base, the other end of plug-in unit has the interface that is complementary with described end block, and described plug-in unit comprises the device that described mounting base is operably connected with described end block.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP06115659.2 | 2006-06-19 | ||
| EP06115659 | 2006-06-19 | ||
| PCT/EP2007/055791 WO2007147757A1 (en) | 2006-06-19 | 2007-06-13 | Insert piece for an end-block of a sputtering installation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101473405A CN101473405A (en) | 2009-07-01 |
| CN101473405B true CN101473405B (en) | 2010-11-17 |
Family
ID=37402710
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007800229926A Expired - Fee Related CN101473405B (en) | 2006-06-19 | 2007-06-13 | Insert piece for an end-block of a sputtering installation |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20090183983A1 (en) |
| EP (1) | EP2030221A1 (en) |
| JP (1) | JP5080573B2 (en) |
| KR (1) | KR20090029213A (en) |
| CN (1) | CN101473405B (en) |
| WO (1) | WO2007147757A1 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102008033902B4 (en) | 2008-07-18 | 2012-01-19 | Von Ardenne Anlagentechnik Gmbh | End block for a magnetron assembly with a rotating target and vacuum coating equipment |
| DE102008058528B4 (en) | 2008-11-21 | 2011-03-03 | Von Ardenne Anlagentechnik Gmbh | End block for a magnetron assembly with a rotating target |
| EP2372744B1 (en) | 2010-04-01 | 2016-01-13 | Applied Materials, Inc. | Device for supporting a rotatable target and sputtering installation |
| DE102010028421B4 (en) | 2010-04-30 | 2012-02-23 | Von Ardenne Anlagentechnik Gmbh | Ceramic rolling bearing and end block for a rotating magnetron |
| WO2013003458A1 (en) | 2011-06-27 | 2013-01-03 | Soleras Ltd. | Sputtering target |
| US9809876B2 (en) * | 2014-01-13 | 2017-11-07 | Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique (C.R.V.C.) Sarl | Endblock for rotatable target with electrical connection between collector and rotor at pressure less than atmospheric pressure |
| DE102014115282B4 (en) | 2014-10-20 | 2019-10-02 | VON ARDENNE Asset GmbH & Co. KG | socket assembly |
| DE102014115280B4 (en) * | 2014-10-20 | 2023-02-02 | VON ARDENNE Asset GmbH & Co. KG | magnetron assembly |
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| US5334298A (en) * | 1992-01-22 | 1994-08-02 | Leybold Ag | Sputtering cathode |
| CN1500908A (en) * | 2002-11-15 | 2004-06-02 | ���ǵ�����ʽ���� | Magnetron sputtering apparatus and magnetron sputtering method using the same |
| CN1714422A (en) * | 2002-10-15 | 2005-12-28 | 尤纳克西斯巴尔策斯公司 | Method for the production of a substrate with a magnetron sputter coating and unit for the same |
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| US4356073A (en) * | 1981-02-12 | 1982-10-26 | Shatterproof Glass Corporation | Magnetron cathode sputtering apparatus |
| US4422916A (en) * | 1981-02-12 | 1983-12-27 | Shatterproof Glass Corporation | Magnetron cathode sputtering apparatus |
| US4443318A (en) * | 1983-08-17 | 1984-04-17 | Shatterproof Glass Corporation | Cathodic sputtering apparatus |
| US4445997A (en) * | 1983-08-17 | 1984-05-01 | Shatterproof Glass Corporation | Rotatable sputtering apparatus |
| US4466877A (en) * | 1983-10-11 | 1984-08-21 | Shatterproof Glass Corporation | Magnetron cathode sputtering apparatus |
| US4519885A (en) * | 1983-12-27 | 1985-05-28 | Shatterproof Glass Corp. | Method and apparatus for changing sputtering targets in a magnetron sputtering system |
| US5096562A (en) * | 1989-11-08 | 1992-03-17 | The Boc Group, Inc. | Rotating cylindrical magnetron structure for large area coating |
| US5200049A (en) * | 1990-08-10 | 1993-04-06 | Viratec Thin Films, Inc. | Cantilever mount for rotating cylindrical magnetrons |
| US5620577A (en) * | 1993-12-30 | 1997-04-15 | Viratec Thin Films, Inc. | Spring-loaded mount for a rotatable sputtering cathode |
| US5445721A (en) * | 1994-08-25 | 1995-08-29 | The Boc Group, Inc. | Rotatable magnetron including a replacement target structure |
| US5591314A (en) * | 1995-10-27 | 1997-01-07 | Morgan; Steven V. | Apparatus for affixing a rotating cylindrical magnetron target to a spindle |
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| DE69928790T2 (en) * | 1998-04-16 | 2006-08-31 | Bekaert Advanced Coatings N.V. | MEANS FOR CONTROLLING TARGET TRANSFER AND SPRAYING IN A MAGNETRON |
| US6365010B1 (en) * | 1998-11-06 | 2002-04-02 | Scivac | Sputtering apparatus and process for high rate coatings |
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2007
- 2007-06-13 CN CN2007800229926A patent/CN101473405B/en not_active Expired - Fee Related
- 2007-06-13 JP JP2009515828A patent/JP5080573B2/en not_active Expired - Fee Related
- 2007-06-13 KR KR1020087030620A patent/KR20090029213A/en active IP Right Grant
- 2007-06-13 WO PCT/EP2007/055791 patent/WO2007147757A1/en active Application Filing
- 2007-06-13 US US12/304,213 patent/US20090183983A1/en not_active Abandoned
- 2007-06-13 EP EP07730105A patent/EP2030221A1/en not_active Withdrawn
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| US5334298A (en) * | 1992-01-22 | 1994-08-02 | Leybold Ag | Sputtering cathode |
| CN1714422A (en) * | 2002-10-15 | 2005-12-28 | 尤纳克西斯巴尔策斯公司 | Method for the production of a substrate with a magnetron sputter coating and unit for the same |
| CN1500908A (en) * | 2002-11-15 | 2004-06-02 | ���ǵ�����ʽ���� | Magnetron sputtering apparatus and magnetron sputtering method using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2030221A1 (en) | 2009-03-04 |
| JP5080573B2 (en) | 2012-11-21 |
| CN101473405A (en) | 2009-07-01 |
| US20090183983A1 (en) | 2009-07-23 |
| WO2007147757A1 (en) | 2007-12-27 |
| KR20090029213A (en) | 2009-03-20 |
| JP2009541583A (en) | 2009-11-26 |
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Granted publication date: 20101117 Termination date: 20130613 |