CN101465626A - Wideband low pass high-frequency filter based on embedding capacitance - Google Patents
Wideband low pass high-frequency filter based on embedding capacitance Download PDFInfo
- Publication number
- CN101465626A CN101465626A CNA2007101798593A CN200710179859A CN101465626A CN 101465626 A CN101465626 A CN 101465626A CN A2007101798593 A CNA2007101798593 A CN A2007101798593A CN 200710179859 A CN200710179859 A CN 200710179859A CN 101465626 A CN101465626 A CN 101465626A
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- 239000003990 capacitor Substances 0.000 claims abstract description 28
- 238000001914 filtration Methods 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 18
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 5
- 238000003475 lamination Methods 0.000 claims description 4
- 230000008901 benefit Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000004020 conductor Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000003071 parasitic effect Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000010921 in-depth analysis Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 238000010200 validation analysis Methods 0.000 description 1
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2007101798593A CN101465626B (en) | 2007-12-19 | 2007-12-19 | Wideband low pass high-frequency filter based on embedding capacitance |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2007101798593A CN101465626B (en) | 2007-12-19 | 2007-12-19 | Wideband low pass high-frequency filter based on embedding capacitance |
Publications (2)
Publication Number | Publication Date |
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CN101465626A true CN101465626A (en) | 2009-06-24 |
CN101465626B CN101465626B (en) | 2010-08-25 |
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Application Number | Title | Priority Date | Filing Date |
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CN2007101798593A Active CN101465626B (en) | 2007-12-19 | 2007-12-19 | Wideband low pass high-frequency filter based on embedding capacitance |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103002652A (en) * | 2011-09-08 | 2013-03-27 | 德州仪器公司 | Apparatus for broadband matching |
CN104576583A (en) * | 2013-10-18 | 2015-04-29 | 北大方正集团有限公司 | Power supply chip, printed circuit board and manufacturing method of printed circuit board |
CN105743455A (en) * | 2016-02-02 | 2016-07-06 | 中国振华(集团)新云电子元器件有限责任公司 | Distribution parameter RLC integrated low-pass filter and manufacturing method thereof |
CN107683032A (en) * | 2017-08-31 | 2018-02-09 | 江苏普诺威电子股份有限公司 | Two-sided etching burying capacitance circuit board manufacture craft |
-
2007
- 2007-12-19 CN CN2007101798593A patent/CN101465626B/en active Active
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103002652A (en) * | 2011-09-08 | 2013-03-27 | 德州仪器公司 | Apparatus for broadband matching |
CN103002652B (en) * | 2011-09-08 | 2017-07-18 | 德州仪器公司 | Equipment for Broadband Matching |
CN104576583A (en) * | 2013-10-18 | 2015-04-29 | 北大方正集团有限公司 | Power supply chip, printed circuit board and manufacturing method of printed circuit board |
CN105743455A (en) * | 2016-02-02 | 2016-07-06 | 中国振华(集团)新云电子元器件有限责任公司 | Distribution parameter RLC integrated low-pass filter and manufacturing method thereof |
CN105743455B (en) * | 2016-02-02 | 2018-10-09 | 中国振华(集团)新云电子元器件有限责任公司 | A kind of distributed constant RLC integrates low-pass filter and its manufacturing method |
CN107683032A (en) * | 2017-08-31 | 2018-02-09 | 江苏普诺威电子股份有限公司 | Two-sided etching burying capacitance circuit board manufacture craft |
Also Published As
Publication number | Publication date |
---|---|
CN101465626B (en) | 2010-08-25 |
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Owner name: NATIONAL CENTER FOR ADVANCED PACKAGING Free format text: FORMER OWNER: INST OF MICROELECTRONICS, C. A. S Effective date: 20150217 |
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Free format text: CORRECT: ADDRESS; FROM: 100029 CHAOYANG, BEIJING TO: 214135 WUXI, JIANGSU PROVINCE |
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Effective date of registration: 20150217 Address after: 214135 Jiangsu Wuxi City Linghu Road No. 200 Chinese Sensor Network International Innovation Park building D1 Patentee after: National Center for Advanced Packaging Co., Ltd. Address before: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee before: Institute of Microelectronics, Chinese Academy of Sciences |
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Effective date of registration: 20170817 Address after: 200331 room 155-2, ginkgo Road, Shanghai, Putuo District, China, 4 Patentee after: Shanghai State Intellectual Property Services Co., Ltd. Address before: 214135 Jiangsu Wuxi City Linghu Road No. 200 Chinese Sensor Network International Innovation Park building D1 Patentee before: National Center for Advanced Packaging Co., Ltd. |
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Effective date of registration: 20191205 Address after: 214028 Jiangsu New District of Wuxi City Linghu Road No. 200 Chinese Sensor Network International Innovation Park building D1 Patentee after: National Center for Advanced Packaging Co., Ltd. Address before: 200331 room 155-2, ginkgo Road, Shanghai, Putuo District, China, 4 Patentee before: Shanghai State Intellectual Property Services Co., Ltd. |
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