CN101435698B - Method and system for measuring surface appearance of micro-device under transparent encapsulation medium - Google Patents
Method and system for measuring surface appearance of micro-device under transparent encapsulation medium Download PDFInfo
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- CN101435698B CN101435698B CN200810154188XA CN200810154188A CN101435698B CN 101435698 B CN101435698 B CN 101435698B CN 200810154188X A CN200810154188X A CN 200810154188XA CN 200810154188 A CN200810154188 A CN 200810154188A CN 101435698 B CN101435698 B CN 101435698B
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Abstract
The invention discloses a system and a method for measuring surface topography of a micro structure under transparent encapsulating medium. The system comprises an LED point light source or laser light source, a beam enlarging collimating lens set, a diaphragm, a beam splitter prism, a measuring object lens, a reference object lens, a plane reference reflector, an optical path compensating plate, a nano orientator, a nano orientator controller, a digital video camera, an optical imaging lens, a digital image acquisition card, a three-dimensional electric control displacement platform, and a data processing and control computer. The measuring method comprises matching selection of the thickness of the compensation optical plate and compensation of the distribution of optical path difference between the measurement and reference optical paths. The system and the method have the advantages of obtaining interference image with good contrast by utilizing the characteristics of long working distance and splitting optical path structure possessed by the Linnik micro interference structure while measuring the micro structure under the transparent encapsulating medium and realizing the accurate measurement of the surface topography.
Description
Technical field
The present invention relates to a kind of system for measuring surface appearance and method of micro-device under transparent encapsulation medium, belong to towards the geometric measurement technology of the photoelectricity noncontact method of MEMS (micro electro mechanical system).
Background technology
MEMS (micro electro mechanical system) (MEMS) is to grow up on the basis of microelectric technique, the integrated device or the system that form by electronics and mechanical organ, adopt with the mass disposal technology of integrated circuit compatibility and make, size arrives between the millimeter at micron, calculating, sensing and execution are combined together, thereby changed perception and the natural mode of control.Most of manufacturing process of MEMS (micro electro mechanical system) (MEMS) is compatible mutually with the processing technology of microelectronics technology, but a considerable amount of MEMS devices comprise the structure of deformable or motion, and this is to distinguish with the maximum of microelectronic component.
Optical test method is used widely in the MEMS field tests owing to its noncontact, quick, precision advantages of higher.The basis of measuring surface deformation and motion is not only in the measurement of micro-structure surface pattern, and is evaluation constitutes one of the manufacturing process of microstructure and key link of performance.Utilize the micro-optical interferometry method can record the surface topography of microstructure, and the distortion and the motion of evaluation microstructure, effective method is the variation that obtains the surface topography of its distortion or motion moment, and directly method is to adopt high-speed camera to carry out the interference image collection of transient motion state.Yet high-speed camera costs an arm and a leg, and is difficult to carry out large-scale application.Another solution is to adopt the stroboscopic imaging technique, and it is the common camera of tens frames that this technology can adopt the per second images acquired.Because the single stroboscopic can not obtain enough light intensity and carry out imaging, therefore need carry out the imaging of several times stroboscopic to same movement moment, the image that video camera obtains comes from the summation of light intensity under the several times stroboscopic illumination, and this also just requires tested microstructure to carry out the very high periodic motion of repeatability.Can obtain comprising microstructure distortion or the interference image of each moment of moving by high-speed camera or stroboscopic imaging method, by analyzing the surface topography that interference image just can obtain each moment, the variation of comparison each surface topography just can be estimated the distortion and the motion of microstructure moment.The distortion of microstructure or kinetic characteristic can calculate some characteristic of material mechanics of microstructure, thereby can be used for manufacturing process is estimated, if the distortion of microstructure or motion are to be used for realizing specific function, so its characteristic also can be used for estimating constitute the evaluation of micro element serviceability.By above-mentioned analysis, can find out that measuring surface form is the basis of a lot of feature measurements of microstructure.
Most micro elements must could normally use through encapsulation after completing, and the environment of micro element inside, encapsulation back may be vacuum or comprise specific gas.The measurement of micro-structure surface pattern is at present all carried out under atmosphere, constituting the residing environment of micro element when promptly testing is different with actual working environment, and the surface topography that surperficial gas-liquid absorption under atmospheric condition and air damping not only can influence microstructure, and can influence the distortion and the kinetic characteristic of microstructure, especially because the dwindling of size, the motion frequency of most microstructures is all than higher, generally at 50K～500KHz, in addition higher.
In order truly to measure microstructure performance under actual working state, must measure the microstructure after the encapsulation so.In this case, in order to make measuring method to implement, available transparent medium encapsulates microstructure, be that light beam can see through transparent encapsulation medium and shines by on the micro-measuring structure and implement to measure, even the encapsulated layer of micro element is lighttight during practical application, but when implement measuring, adopt transparent medium to encapsulate also to guarantee fully the environment of vacuum of living in the practical application or particular atmosphere.Yet the key of micro-interference surface measurements pattern is the distribution of optical path difference between measuring beam and the reference beam, and the variation that the insertion of transparent encapsulation medium can bring optical path difference to distribute, thereby causing recording surface topography exists certain deviation; Transparent encapsulation medium can cause the variation of optical length in addition, will cause the contrast of interference fringe in the interference image to descend like this, thus the accuracy that influence is measured, even may cause interference fringe to disappear, measure this moment and can't carry out.Therefore, the measurement of micro-structure surface pattern must solve transparent encapsulation medium and insert the caused change in optical path length in back in measuring light path under the transparent encapsulation medium.
Summary of the invention
The object of the present invention is to provide a kind of system for measuring surface appearance and method of micro-device under transparent encapsulation medium, described simple in measurement system structure, measuring method is simple, suitable, reliable.
The present invention is realized by following technical proposals, a kind of system for measuring surface appearance of micro-device under transparent encapsulation medium, this measuring system comprises: be used to finish the collection of interference image, handle and the device of analyzing, the three-dimensional automatically controlled displacement platform of Lin Nike phase shift microinterferometer and placement micro-device under transparent encapsulation medium, the collection of described interference image, handle with the device of analyzing and comprise: control computer, the output terminal of control computer connects the nanometer positioning instrument controller in the Lin Nike phase shift microinterferometer, the control computer input end is linking number word image capture card and digital camera successively, it is characterized in that: Lin Nike phase shift microinterferometer comprises: LED pointolite or LASER Light Source, on the projecting light path of light source light, set gradually the beam-expanding collimation lens combination, diaphragm and Amici prism, be provided with respectively at the output terminal of two light of Amici prism and measure object lens and reference objective lens, measure object lens irradiation micro element, set gradually optical path compensation plate and the plane reference mirror that is arranged on the nanometer positioning instrument on the light projecting light path of reference objective lens, the nanometer positioning instrument connects nanometer positioning instrument controller.
Adopt above-mentioned measuring system, measure the method for the surface topography of micro-device under transparent encapsulation medium, it is characterized in that may further comprise the steps:
(1) plane mirror is placed under the measurement object lens, focuses on and blur-free imaging, utilize the phase shift interference method to calculate the surface topography of plane mirror by the automatically controlled displacement platform of three-dimensional;
(2) to calculate the surface topography of plane mirror will not be the plane to step (1), and its deviation then is the distribution of measuring optical path difference between light path and the reference path, preserves these data to be used for the compensation of follow-up other measurand measuring surface form data;
(3) micro element under the transparent encapsulation medium being placed on the measurement object lens focuses on down and accurately;
(4) between reference objective lens and plane mirror, insert optical path compensation flat board close with transparent encapsulation medium thickness and that have nothing in common with each other successively, the interference image under the record different-thickness optical path compensation plate;
(5) interference image under the different-thickness optical path compensation plate that step (4) is obtained compares, and selects the optical path compensation plate when dark fringe is with bright fringes gray scale difference maximum in the interference image to be used for follow-up measuring surface form;
(6) utilize the phase shift interference method to calculate the surface topography of tested micro element, and carry out compensation data and obtain the real surface topography of tested micro element with the optical path difference distributed data that step (2) obtains;
(7) if when further improving the accuracy of measurement of micro element surface topography, then to consider between the transparent encapsulation medium that inserts and the compensate for optical flat board difference influence of the upper phase of interference image is eliminated this influence and is realized by following steps:
(7-1) before micro element is encapsulated, the transparent enclosure plate is placed under the measurement object lens, place a standard flat catoptron below the transparent enclosure plate again, adjust the spacing between transparent enclosure plate and the standard flat catoptron, spacing feasible and that micro element encapsulates between back measured surface and the transparent enclosure plate is basic identical;
(7-2) select the optical path compensation plate of respective thickness according to step (4) and (5);
(7-3) distribution that obtains measuring optical path difference between light path and the reference path according to step (1) and (2);
(7-4) the transparent enclosure plate that uses with above-mentioned steps (3) encapsulates micro element, and obtains truly and accurate surface pattern more according to the optical path difference distribution that step (6) and step (7-3) obtain.
The invention has the advantages that: adopt Lin Nike phase shift micro-interference structure, the operating distance of measuring depends on the operating distance of microcobjective fully, longer relatively, little to the restriction of distance between encapsulated layer and the measured surface like this, improved the flexibility ratio of encapsulation, Lin Nike phase shift micro-interference structure can be inserted different optical path compensation plates easily in reference path, the transparent encapsulation medium of different-thickness all can be selected corresponding optical path compensation plate and implement the accurate surface topography measurement like this.
Description of drawings
The system for measuring surface appearance block diagram of Fig. 1 micro-device under transparent encapsulation medium;
The interference fringe of low contrast in the interference image of Fig. 2 micro-device under transparent encapsulation medium;
Fig. 3 implements high-contrast interference fringe in the interference image of the micro-device under transparent encapsulation medium behind the optical path compensation;
Fig. 4 Lin Nike micro-interference is measured the result of little step;
The interference image of little ledge surface when Fig. 5 Mirau micro-interference is measured;
The surface topography of little step that Fig. 6 Mirau micro-interference is measured;
The result of Fig. 7 Lin Nike micro-interference measurement plane mirror surface pattern;
Fig. 8 implements the result that optical path difference distribution compensation back Lin Nike micro-interference is measured little step.
Embodiment
The block diagram of the system for measuring surface appearance of micro-device under transparent encapsulation medium as shown in Figure 1, this system comprises LED pointolite or LASER Light Source, the beam-expanding collimation lens combination, diaphragm, Amici prism, measure object lens, reference objective lens, the plane reference mirror, the optical path compensation plate, nanometer positioning instrument (PI S303, displacement resolution is better than 1nm), nanometer positioning instrument controller (PI 624), digital camera (CV-M4+CL, 10bits, 1392 * 1040), the optical imagery camera lens, the digital image acquisition card (Dalsa, X64-CLiPro100), three-dimensional automatically controlled displacement platform, data processing and control computer.LED pointolite or LASER Light Source, beam-expanding collimation lens combination, diaphragm, Amici prism, measurement object lens, reference objective lens, plane reference mirror, nanometer positioning instrument, nanometer positioning instrument controller constitute Lin Nike phase shift micro-interference structure.Light sends from LED pointolite or LASER Light Source, through being transformed into a certain size directional light after the beam-expanding collimation lens combination, incide Amici prism at the process diaphragm and be divided into measuring beam and reference beam, measuring beam is through measuring object lens focusing to tested micro element surface, Amici prism is got back to by measuring object lens in the reflection back, reference beam focuses on the plane reference mirror through reference objective lens, Amici prism is also got back to by reference objective lens in the reflection back, and the reflected light of measuring beam and reference beam produces at the Amici prism place interferes.For distributing mutually, the position that obtains to interfere obtains surface topography information, the nanometer positioning instrument drives the plane reference mirror and moves forward and backward along optical axis under the control of nanometer positioning instrument controller, obtain the out of phase amount of movement, thereby make surface topography from several have the interference image of different phase-shift phases, to find the solution out.Optical interference process optical imagery camera lens imaging and digitizing on digital camera in that Amici prism goes out to produce are transferred in data processing and the control computer by the digital picture card and analyze.The XY in-plane displancement control of three-dimensional automatically controlled displacement platform is used to seek measured zone, Z controls a kind of situation to displacement and is used for the focusing that above-mentioned phase shift interference is measured measured surface, and another kind of situation can be implemented measuring surface form based on the white light scanning interferometer during for white light at led light source.The optical path difference that the transparent encapsulation medium that is used for existing between compensating measure object lens and the tested micro element at the optical path compensation plate between reference objective lens and the plane reference mirror is introduced.
One little ledge structure placed measure under the object lens, place a thickness between the two again and be 0.5 millimeter optical flat, to be equivalent to transparent encapsulation medium, Fig. 2 is the interference image of this moment, can find out that the contrast of interference fringe is lower, and the signal to noise ratio (S/N ratio) of measurement is low; Increase the thickness of optical flat gradually, the contrast of interference fringe will be more and more lower, last interference fringe complete obiteration.Between reference objective lens and plane reference mirror, insert the optical flat of a same thickness, to insert the change in optical path length that optical flat brings in the compensating measure light path, Fig. 3 inserts optical compensation plate interference image afterwards, the contrast that can find out interference image has obtained significant raising, implements the resolution height of measuring this moment.
Interference fringe is annular in the interference image shown in Figure 3, and the surface topography that solves can be found out the small stair that superposeed as shown in Figure 4 on a large curved surface, and this is diverse with real situation.Fig. 5 is the interference image that obtains under Mirau micro-interference object lens, can find out the inclination of little ledge structure and make the parallel distribution of interference fringe, these equidistantly parallel interference fringes also show the real surface pattern of little ledge structure be in one plane projection a step, the step upper surface also is a plane, parallel with lower surface, Fig. 6 is the surface topography that records.Therefore, owing to used two object lens in the Lin Nike micro-interference structure, the optical path difference distribution of measuring between light path and the reference path is difficult to guarantee homogeneous, and the optical flat that inserts also can be introduced some influences.Restrain the heterogeneity of optical path difference in the micro-interference structure for the compensation planting Buddhist nun, before measuring concrete micro element surface topography, survey the plane of a standard earlier, Fig. 7 is the result who records, because tested plane is very desirable, therefore can think that Fig. 7 is that the heterogeneity of measuring light path between light path and reference path in the Lin Nike micro-interference structure distributes, the data of Fig. 7 are compensated the real surface pattern that has just obtained little step to the data of Fig. 4, as shown in Figure 8.
Claims (1)
1. the surface topography measuring method of a micro-device under transparent encapsulation medium, the measuring system that this measuring method adopts comprises: be used to finish the collection of interference image, the device of handling and analyzing, the three-dimensional automatically controlled displacement platform of Lin Nike phase shift microinterferometer and placement micro-device under transparent encapsulation medium, in order to improve the accuracy of measurement of micro element surface topography, consider between the transparent encapsulation medium that inserts and the compensate for optical flat board difference influence of the upper phase of interference image be is characterized in that may further comprise the steps:
(1) before micro element is encapsulated, the transparent enclosure plate is placed under the measurement object lens, place a standard flat catoptron below the transparent enclosure plate again, adjust the spacing between transparent enclosure plate and the standard flat catoptron, spacing feasible and that micro element encapsulates between back measured surface and the transparent enclosure plate is basic identical;
(2) between reference objective lens and plane reference mirror, insert optical path compensation flat board close with transparent encapsulation medium thickness and that have nothing in common with each other successively, the interference image under the record different-thickness optical path compensation plate;
(3) interference image under the different-thickness optical path compensation plate that step (2) is obtained compares, and selects the optical path compensation plate when dark fringe is with bright fringes gray scale difference maximum in the interference image to be used for follow-up measuring surface form;
(4) will be placed on and measure that the standard flat catoptron focuses on and blur-free imaging by the automatically controlled displacement platform of three-dimensional under the object lens, utilize the phase shift interference method to calculate the surface topography of standard flat catoptron, the surface topography that calculates the standard flat catoptron will not be the plane, its deviation then is the distribution of measuring optical path difference between light path and the reference path, preserves these data to be used for the compensation of follow-up other measurand measuring surface form data;
(5) the transparent enclosure plate that uses with above-mentioned steps encapsulates micro element, micro element under the transparent encapsulation medium is placed on the measurement object lens to be focused on down and accurately, utilize the phase shift interference method to calculate the surface topography of tested micro element, and carry out compensation data and obtain the real surface topography of tested micro element with the optical path difference distributed data that step (4) obtains.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102679907A (en) * | 2012-06-01 | 2012-09-19 | 哈尔滨工业大学深圳研究生院 | High-precision differential interference measuring system and method based on LED light source |
| CN102679907B (en) * | 2012-06-01 | 2015-04-22 | 哈尔滨工业大学深圳研究生院 | High-precision differential interference measuring system and method based on LED light source |
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