CN101424758B - Negative refraction artificial material based on iron-clad - Google Patents
Negative refraction artificial material based on iron-clad Download PDFInfo
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- CN101424758B CN101424758B CN2008102270298A CN200810227029A CN101424758B CN 101424758 B CN101424758 B CN 101424758B CN 2008102270298 A CN2008102270298 A CN 2008102270298A CN 200810227029 A CN200810227029 A CN 200810227029A CN 101424758 B CN101424758 B CN 101424758B
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Abstract
The invention relates to a negative refraction artificial material based on a metal covering layer, which comprises the following steps that (1) a quartz basal piece is selected, the surface of the quartz basal piece is polished, and then, a high-purity SiO2 film is evaporated and plated on the surface of the quartz basal piece; (2) the surface of a high-purity SiO2 film is evaporated and plated with a chrome film, and a layer of photoresist is evenly coated on the high-purity SiO2 film; (3) an electron beam photoetching method is adopted, and a medium grating structure is prepared on the photoresist; (4) a wet etching technology is adopted, the photoresist is used as a mask, and the exposed chrome film is etched; (5) a dry etching technology is adopted, the chrome film is used as the mask, the medium grating structure is etched on the high-purity SiO2 film, and the chrome film is removed; (6) a vacuum evaporation technology is adopted, a metal layer is evaporated and plated on the SiO2 grating structure, the thickness of the metal layer is h, and the negative refraction artificial material based on the metal covering layer is completely prepared. The invention has the advantages of convenient preparation, little single-layer consumption and signal-layer normal incidence and has a wide application prospect in the fields of magnetic resonance, near field optics, stealth materials, and the like.
Description
Technical field
The present invention relates to a kind of electromagnetic property of utilizing the metal cladding on the grating, realize the negative refraction of visible light frequency band and the closely design and the making of the artificial composite structure material of zero refracting characteristic.
Technical background
Effective refractive index is that material is with the interactional important parameter of external electromagnetic field, and a requirement of the realization of effective negative refraction or zero refractive index is exactly negative Effective permeability to occur at the wave band or the frequency place of design, at present, existing way is: the near infrared especially negative magnetoconductivity artificial composite material of visible light wave range utilizes the nonmagnetic cellular construction of the nanometer scale that the cycle arranges, form resonance with the external drive electromagnetic wave, can realize adjustment to the Effective permeability of material, even the Effective permeability that obtains bearing.The artificial composite material that possesses negative magnetoconductivity has broad prospect of application in the electromagnetism field, for example, metal has the characteristic of negative specific inductive capacity near infrared and visible light wave range, when negative magnetic permeability and negative specific inductive capacity in conjunction with the time, material can be realized negative refraction to incident light; The negative refraction characteristic of this material can be applied in aspects such as super-resolution imaging, stealth material.
The cellular construction that generally is used at present realizing the magnetic resonance of nonmagnetic substance mainly is that split ring structure and metal broken string are to structure, when split ring or metal broken string is vertically passed in external drive magnetic field to the plane, place, can inspire maximum magnetic resonance effect, but the present magnetic resonance material that is made of the split ring structure all belongs to the planar structure type, incident electromagnetic wave must keep certain included angle with plane, material place, could form enough strong magnetic resonance and regulate the Effective permeability of material, can not use normal incidence is a big shortcoming of such material; Though and the magnetic resonance material that structure is made of the metal broken string can adopt normal incidence, what its resonance unit adopted is the three-decker of metal one dielectric one metal, and this three-decker needs three deposition process, makes more complicated.
Summary of the invention
The problem to be solved in the present invention is: at the existing weak point that realizes the artificial composite material of magnetic resonance, propose a kind of electromagnetic property of utilizing the metal cladding on the grating, realize the negative refraction of visible light frequency band and the method for nearly zero refraction.
The technical solution adopted for the present invention to solve the technical problems is:
A kind of method of making based on the negative refraction artificial material of metal cladding may further comprise the steps:
(1) select quartz substrate, and with its surface finish; Then at its surperficial evaporation one deck SiO
2Film;
(2) at SiO
2The film surface is evaporation chromium film once more, evenly applies electron beam resist then;
(3) method of employing beamwriter lithography is prepared the dielectric grating structure on photoresist;
(4) adopt the wet etching technology, photoresist as mask, is eroded exposed chromium film;
(5) adopt the dry etching technology, with the chromium film as mask, at SiO
2Etch the dielectric grating structure on the film, remove the chromium film;
(6) adopt vacuum evaporation technology, at SiO
2Evaporation thickness is the metal level of h on the optical grating construction, and the negative refraction metal grating completes;
Wherein said SiO
2The thickness of film is that 70 nanometers are to 80 nanometers;
The cycle of described dielectric grating structure be 255 nanometers to 265 nanometers, dutycycle is 1.35: 1.2～1.45: 1.2; The heavy evaporation thickness h of described metal level is 28 nanometer to 32 nanometers.
Chromium film thickness in the described step (2) is 25 nanometer to 30 nanometers.
Photoresist in the described step (2) is the PMMA photoresist that is used for electron beam lithography, and its thickness is 40 nanometer to 60 nanometers.
Dry etching technology in the described step (5) is a plasma auxiliary etch technology, and etching gas is CF3.
Metal in the described step (6) is with a kind of metal.
The present invention with compare the advantage that is had with the artificial material of traditional realization magnetic resonance: the present invention adopts wet etching and dry etching in conjunction with SiO
2Dielectric grating is produced on the polishing quartz substrate, utilizes the forward deposition technique, has realized at SiO
2Produce shape metal cladding structure on the dielectric grating with special electromagnetic property.The present invention is simple for production, and the individual layer loss is little, and the characteristic of individual layer normal incidence in fields such as magnetic resonance, near field optic, stealth materials, has the meaning of enlightenment and very big application prospect.
Description of drawings
Fig. 1 is based on the making synoptic diagram of the first step of the negative refraction artificial material of metal cladding;
Fig. 2 is based on the second making synoptic diagram that goes on foot of the negative refraction artificial material of metal cladding;
Fig. 3 is based on the 3rd making synoptic diagram that goes on foot of the negative refraction artificial material of metal cladding;
Fig. 4 is based on the 4th making synoptic diagram that goes on foot of the negative refraction artificial material of metal cladding;
Fig. 5 is based on the 5th making synoptic diagram that goes on foot of the negative refraction artificial material of metal cladding;
Fig. 6 is based on the 6th making synoptic diagram that goes on foot of the negative refraction artificial material of metal cladding;
Fig. 7 is the structural representation of making based on the negative refraction artificial material of metal cladding;
Among the figure: 1 for the quartz substrate of surface finish; 2 is the SiO of evaporation
2Film; 3 is the chromium film of evaporation; 4 for the PMMA electron beam resist of spin coating; 5 metals for deposition.
Embodiment
Introduce the present invention in detail below in conjunction with the drawings and the specific embodiments.But following embodiment only limits to explain the present invention, and protection scope of the present invention should comprise the full content of claim, and by following examples, those skilled in the art promptly can realize the full content of claim of the present invention.
As shown in Figure 1, the making synoptic diagram of the present embodiment first step is at first selected quartz substrate 1, and with its surface finish; Be the high-purity Si O of 70 nanometers at its surperficial evaporation one layer thickness then
2 Film 2;
As shown in Figure 2, the making synoptic diagram in second step of present embodiment is at high-purity Si O
2Film surface evaporation thickness once more is 30 nanometer chromium films 3, and evenly coating thickness is the PMMA photoresist 4 of 50 nanometers then;
As shown in Figure 3, the making synoptic diagram in the 3rd step of present embodiment, the method for employing beamwriter lithography is prepared cycles 260 nanometer on photoresist 4, and dutycycle is 1.2: 1.4 a dielectric grating structure;
As shown in Figure 4, the making synoptic diagram in the 4th step of present embodiment adopts the wet etching technology, and photoresist as mask, is eroded exposed chromium film;
As shown in Figure 5, the making synoptic diagram in the 5th step of present embodiment adopts plasma auxiliary etch technology, as mask, is etching gas with CHF3, at high-purity Si O with the chromium film
2Etching thickness on the film is the dielectric grating structure of 70 nanometers, utilizes the liquid that dechromises to remove the chromium film;
As shown in Figure 6, the making synoptic diagram in the 6th step of present embodiment adopts vacuum evaporation technology, at SiO
2Evaporation thickness is the metal level of 30 nanometers on the optical grating construction, and the negative refraction metal grating completes; The front view of artificial structure's compound substance of gained, as shown in Figure 7.
Negative refraction artificial material by above method made based on metal cladding, by the forward evaporation, metal level is covered on the dielectric grating, utilize the electromagnetic property of the metal level on the grating, be implemented in visible light frequency band the electromagnetic parameter of material is regulated, and then regulate effective refractive index.Simulation result shows by Effective permeability and effective dielectric constant to material to be regulated, and can realize negative index and nearly zero refractive index; Artificial material with traditional realization negative refraction is compared, this negative refraction metal grating is the artificial material that has the negative refraction characteristic of minimal wave length at present, have simple for production simultaneously, the individual layer loss is little, the characteristic of individual layer normal incidence, in fields such as magnetic resonance, near field optic, stealth materials, have the meaning of enlightenment and very big application prospect.
Claims (5)
1. a making is based on the method for the negative refraction artificial material of metal cladding, and its feature may further comprise the steps:
(1) select quartz substrate, and with its surface finish; Then at its surperficial evaporation one deck SiO
2Film;
(2) at SiO
2Film surface evaporation one deck chromium film evenly applies one deck photoresist then on the chromium film;
(3) method of employing beamwriter lithography is prepared the dielectric grating structure on photoresist;
(4) adopt the wet etching technology, photoresist as mask, is eroded exposed chromium film;
(5) adopt the dry etching technology, with the chromium film as mask, at SiO
2Etch the dielectric grating structure on the film, remove the chromium film;
(6) adopt vacuum evaporation technology, at SiO
2Evaporation thickness is the metal level of h on the optical grating construction, and a kind of negative refraction artificial material based on metal cladding completes;
Wherein said SiO
2The thickness of film is that 70 nanometers are to 80 nanometers;
The cycle of described dielectric grating structure be 255 nanometers to 265 nanometers, dutycycle is 1.35: 1.2～1.45: 1.2; The evaporation thickness h of described metal level is 28 nanometer to 32 nanometers.
2. a kind of method of making based on the negative refraction artificial material of metal cladding according to claim 1, it is characterized in that: the chromium film thickness in the described step (2) is 25 nanometer to 30 nanometers.
3. a kind of method of making according to claim 1 based on the negative refraction artificial material of metal cladding, it is characterized in that: the photoresist in the described step (2) is the PMMA photoresist that is used for electron beam lithography, its thickness is 40 nanometer to 60 nanometers.
4. a kind of method of making based on the negative refraction artificial material of metal cladding according to claim 1, it is characterized in that: the dry etching technology in the described step (5) is a plasma auxiliary etch technology, and etching gas is CF
3
5. a kind of method of making based on the negative refraction artificial material of metal cladding according to claim 1 is characterized in that: the metal in the described step (6) is with a kind of metal.
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| CN2008102270298A CN101424758B (en) | 2008-11-19 | 2008-11-19 | Negative refraction artificial material based on iron-clad |
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| CN2008102270298A CN101424758B (en) | 2008-11-19 | 2008-11-19 | Negative refraction artificial material based on iron-clad |
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| CN101424758B true CN101424758B (en) | 2010-10-13 |
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Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102346269B (en) * | 2011-11-09 | 2014-08-13 | 苏州大学 | Reflective color filter |
| CN103293581A (en) * | 2013-06-28 | 2013-09-11 | 南京理工大学 | Laser and intermediate and far infrared compatible invisible membrane structure |
| CN104459854B (en) * | 2013-09-22 | 2017-12-01 | 清华大学 | The preparation method of metal grating |
| CN104459853B (en) | 2013-09-22 | 2017-08-04 | 清华大学 | Metal grating |
| CN109901363A (en) * | 2017-12-11 | 2019-06-18 | 中国科学院光电技术研究所 | Negative refraction imaging and photo-etching method and equipment |
| CN111552075B (en) * | 2020-04-30 | 2022-10-28 | 南京邮电大学 | High-diffraction-efficiency negative refraction grating plano-concave mirror and design method thereof |
| CN111580205B (en) * | 2020-06-02 | 2021-07-27 | 中国科学院上海光学精密机械研究所 | Wide-spectrum pulse width compression grating for 54-62 degree incidence |
| CN114114481B (en) * | 2021-12-15 | 2023-05-26 | 中国科学院光电技术研究所 | Preparation method and application of super-resolution lens based on metal-medium strip array |
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