CN101413109A - Vacuum multifunctional continuous film coating apparatus - Google Patents
Vacuum multifunctional continuous film coating apparatus Download PDFInfo
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- CN101413109A CN101413109A CNA2008102335911A CN200810233591A CN101413109A CN 101413109 A CN101413109 A CN 101413109A CN A2008102335911 A CNA2008102335911 A CN A2008102335911A CN 200810233591 A CN200810233591 A CN 200810233591A CN 101413109 A CN101413109 A CN 101413109A
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Abstract
The invention belongs to the technical field of electronic mechanical technology and relates to a high-vacuum multifunctional ion beam sputtering and electron beam evaporation continuous film plating device. A vacuum film plating chamber of the device has a single chamber structure; a generator of an ion beam sputtering source and a generator of an electron beam evaporation plating source are arranged outside the vacuum film plating chamber; inlets of two generators conducting to the vacuum film plating chamber are correspondingly provided with an ion beam sputtering source baffle plate and an electron beam evaporation plating source baffle plate; constant tensile force can reverse a furling and stretching reel of a winding unit, follow a transition shaft and is fixed on a connecting and supporting device of the vacuum film plating chamber; and corresponding sensing, driving and controlling are arranged outside the vacuum film plating chamber. The device has a compact structure, various film plating and continuous film plating functions in the single vacuum chamber, can realize the auxiliary enhanced deposition of ion beams in the discontinuous or full film plating process, can improve the utilization rate of a sputtering target material by 60 to 100 percent, in particular a noble metal target material and a class of a target material which is difficult to machine, and can also obtain a coating-type composite film product with special functions through an inlaid-type target.
Description
Technical field
The invention belongs to the electric mechanical technical field, relate in particular to a kind of high vacuum multifunction ion beam sputtering and electron beam evaporation continuous coating apparatus.
Background technology
The composite membrane product that is coated with on the matrix bands such as flexible macromolecule and carbonaceous material ribbon, metal sheet band, of many uses at modern industry and high-tech sector.For example: widely used magnetic composite membrane in telecommunications, network devices, electromagnetic interference control (MEI) field, require under high vacuum environment, go up Fe, Ni, Zr, Cr, Co, Hf, Mo, Td, Si, B etc. and the compound film thereof that densification is coated with 2～8 layers, the composition of single thin film and thickness deviation＜5% at metal sheet band (10 μ m～25 μ m); For another example: the carried catalyst that generally adopts during hydrogen energy source is utilized normally under high vacuum environment, is coated with rare precious metal alloy catalyst composite membrane, the composition of film and thickness deviation＜5% on the carbonaceous material ribbon.
At first, process these multilayer films or composite membrane product, generally need be under high vacuum environment, adopt multiple technologies such as ion beam sputtering, magnetron sputtering, electron beam evaporation deposition, the device that the multiple film coating apparatus of many at present employings is coated with respectively or many vacuum chambers connect is finished plated film in regular turn, there is following defective: 1, the mode that is coated with respectively for multiple film coating apparatus, when changing device, intermediates frequently are exposed to atmospheric environment, destroyed middle film quality, frequent pump is taken out and the lifting temperature course simultaneously, and the technical process that extended has reduced working (machining) efficiency; 2, for the mode of many vacuum chambers coupling device, owing to be provided with a plurality of vacuum chambers, certainly will need in a plurality of vacuum chambers, be provided with that pump is taken out, gas circuit, detection, heated baking, unit such as automatically controlled, manufacturing cost is higher, also reduces the vacuum chamber volume utilization ratio.
Secondly, the carrier of these multilayer films or composite membrane product needs specific matrix band, as macromolecular material, graphite fiber cloth and metal thin strip etc.Because differential tension matrix band is in the continuous coating process of different winding speeds, need to guarantee to reach no oblique stretching, planeness and with the undamaged requirement of rete contact surface, and at present disclosedly the powder clutch of employing is arranged and set up photoelectricity or the tension force sensing shaft of radio detection etc. realizes automatic tension control, control accuracy needs when all being difficult to realize the wide tension range matrix band of wide cut (more than the fabric width 300mm), wide winding speed scope plated film and assurance film quality.
Moreover, be coated with the ion beam sputtering technology that these multilayer films or composite membrane product are adopted, can arrive ratio in the accurately controlled down ions/atoms of low temperature (＜200 ℃), easily obtain the synthetic film of multiple different components and structure, all substrates there is good bonding force, controls the size and the distribution of ultramicron effectively.But because focusing of ion beam bundle spot energy density is bigger, the component and the structure control that are difficult to accurately to control the ions/atoms arrival ratio of mosaic target and then influence composite membrane; Focusing of ion beam bundle spot will shorten the work-ing life of target to the sputter of target fixed part, reduces the utilization ratio of target, for noble metal target and difficult processing class target, will significantly increase multilayer film or composite membrane production cost of products especially.And at present disclosed be 99243973.6 " sputtering target " as the patent No., the sputtering target material shape of cross section that adopts is a curved shape, can improve 40～80% target utilization, but variation along with the target composition, target actual consumption curve also can noticeable change, makes curved shape sputtering target material complete processing be tending towards complicated and increases difficulty of processing and cost.
Summary of the invention
The purpose of this invention is to provide a kind of high vacuum multifunction ion beam sputtering and electron beam evaporation continuous coating apparatus, it can not destroy under the high vacuum condition, in single vacuum chamber, have multiple plated film and continuous coating function, thereby can realize matrix or matrix band are carried out single or multiple, interruption or continuous coating, especially same matrix or matrix band are finished one or more coating process in ion beam sputtering deposition or the electron beam evaporation deposition continuously, and can realize being interrupted in the coating process or full-time Assisted by Ion Beam strengthens deposition; It can also can obtain the cladded type composite membrane product of specific function by the mosaic target with particularly noble metal target and difficult processing class target utilization raising 60%～100% of sputtering target material.
For achieving the above object, the present invention takes following design:
Vacuum film coating chamber is a single cell structure, and it is outdoor that the producer in ion beam sputtering source and electron beam evaporation plating source is arranged on vacuum plating, and the two inlet correspondence that feeds coating chamber is provided with ionic fluid and spatters the source and penetrate baffle plate and electron beam evaporation plating source baffle plate; The receiving/releasing spool of the reversible winder unit of permanent tension force and servo-actuated transition axis are fixed on the interior connection bracing or strutting arrangement of coating chamber, and corresponding sensing, driving, control are arranged on outside the coating chamber.That vacuum film coating chamber can adopt is horizontal, tubular (also can be other shape), button fly front, double-deck water-cooled, all steel structure.
The receiving/releasing spool of the reversible winder unit of permanent tension force is in transmission connection by moment sensing slicer and servomotor, the servo-actuated transition axis of the reversible winder unit of permanent tension force is connected with the speed governing encoder, moment sensing, servomotor and speed governing encoder all electricly connect with the PLC programmable logic controller, tension force, speed be can set respectively, and constant control tension force, speed in wide cut, the wide tension range realized; The unitary target position of ionic fluid sputter is connected with two-way runner assembly driven by stepper motors, this two-way runner assembly is connected again with by another stepper motor driven axial reciprocally swinging assembly, two groups of stepper-motors also electricly connect with the PLC programmable logic controller, improve the utilization ratio of noble metal target and difficult processing class target, significantly reduce multilayer film or composite membrane production cost of products.
Pump is taken out the unit and is positioned at frame platform rear portion and is connected with the metallic seal of vacuum film coating chamber rear portion; Recirculated cooling water stream alarm unit places rear portion in the frame platform, is electrically connected with the unit of each required recirculated cooling water, the required recirculated cooling water in other unit is provided and monitors flow.
At indoor vacuum measurement device and the baking heater of being mounted with of the vacuum plating of this device.
Vacuum film coating chamber is provided with Assisted by Ion Beam enhancing/irrigation source, and indoor correspondence is provided with ion beam assisted depositing/irrigation source baffle plate; Coating chamber is provided with swing/mobile sputter target platform, and indoor correspondence is provided with swing/mobile sputter target platform baffle plate; Coating chamber is provided with water-cooled/heating turntable, and indoor correspondence is provided with water-cooled/heating turntable baffle plate.By using each baffle plate, can in the coating chamber of single cell structure, finish different operations.
The target of ion beam sputtering source transmitting terminal on swing/mobile sputter target platform, target on emission high-energy ion bombardment swing/mobile sputter target platform makes the target material that sputters deposit to matrix band on the reversible two-way winder unit and the matrix surface on water-cooled/heating turntable and film forming; Assisted by Ion Beam enhancing/irrigation source transmitting terminal on the reversible winder unit of permanent tension force the matrix band and the matrix on water-cooled/heating turntable, realize cleaning function before the plated film of matrix, and realize the auxiliary enhancement function of matrix plated film, improve quality of forming film.
Described swing/mobile sputter target platform can be realized the axial wobble and the two-way rotation of target position, and can satisfy the needs of individual event or multinomial plated film; When carrying out ion beam sputtering source plated film, swing/mobile sputter target platform can be moved into the axis place (axially starting position) of vacuum film coating chamber automatically, and the electron beam evaporation source baffle plate can be closed, and prevents to pollute coating materials in the evaporation crucible; When carrying out the electron beam evaporation source plated film, swing/mobile sputter target platform can be moved near the left side locular wall of vacuum film coating chamber automatically, and can close swing/mobile sputter target platform baffle plate, both avoided influencing the electron beam evaporation source plated film, can prevent that again the target on swing/mobile sputter target platform from being polluted, guarantee quality of forming film.
Water-cooled/heating turntable is to exchange structure, realizes the wide temperature controlling range of plated film matrix.Be provided with the film thickness monitoring unit at the indoor water-cooled of vacuum plating/heating turntable baffle plate place, can be manually or control water-cooled/heating turntable baffle plate automatically, realize setting the real-time monitoring of thickness.
The gas circuit unit adopts single gas circuit to connect ion beam sputtering source and ion beam assisted depositing/irrigation source air feed respectively; Adopt single gas circuit or two above gas circuits or feed the indoor even device of air of vacuum plating through mixing gas tank.Also have the interface that is connected with miscellaneous equipment on the vacuum film coating chamber.
Advantage of the present invention and effect:
1, compares with the vacuum coater of simple function and increased function, guaranteed middle film quality, shortened technical process, improved working (machining) efficiency.
2, compare with the multi-functional vacuum coater of many vacuum chambers, reduced the vacuum chamber number, reduced manufacturing cost, improved the vacuum chamber volume utilization ratio.
3, help continuous coating technology, control accuracy needs when helping to realize the wide tension range matrix band of wide cut (more than the fabric width 300mm), wide winding speed scope plated film and assurance film quality.
4, help to obtain the synthetic film of multiple different components and structure, all substrates are had good combination power, control the size and the distribution of ultramicron effectively.
5, the utilization ratio that realizes noble metal target and difficult processing class target improves 60%～100%, helps obtaining cladded type composite membrane product by the mosaic target, reduces the plated film production cost of products significantly.
6, realize the wide temperature controlling range of plated film matrix (10 ℃～800 ℃).
7, realize setting the real-time monitoring of thickness.
8, the interface of vacuum film coating chamber reservation cooperates swing/mobile sputter target platform, also can be used for follow-up excimer laser sputter (PLD) plated film.
Description of drawings
Embodiments of the invention are illustrated in conjunction with the accompanying drawings, wherein:
Fig. 1 is the structural representation of facing of the present invention;
Fig. 2 is a plan structure synoptic diagram of the present invention;
Fig. 3 is swing of the present invention/mobile sputter target platform modular construction synoptic diagram;
Fig. 4 is the reversible winder unit structural representation of permanent tension force of the present invention;
Fig. 5 is a gas circuit cell schematics of the present invention.
Among the figure: frame platform 1; Vacuum film coating chamber 2; Pump takes out 3; Vacuum measurement device 4; Swing/mobile sputter target platform 5, swing/mobile sputter target platform baffle plate 5 ', PLC programmable logic controller 5-1, connect bracing or strutting arrangement 5-2, stepper-motor 5-3,5-3 ', transmission decelerating device 5-4,5-4 ', the axial reciprocally swinging assembly of target position 5-5, the two-way runner assembly 5-6 of target position, target shaft assembly 5-7, target position 5-8, flange 5-9, output electric pulse 5-10,5-10 ', vacuum plating locular wall 5-11, screw mandrel 5-12, guide rail 5-13; Gas circuit unit 6, ion beam sputtering source gas circuit 6-1, ion beam assisted depositing/irrigation source gas circuit 6-2, reaction air feed road 6-3,6-4, mass flowmeter 6-5,6-6,6-7,6-8 mix gas tank 6-9; The reversible winder unit 7 of permanent tension force, DC servo motor 7-2,7-2 ', moment sensing slicer 7-3,7-3 ', transmission decelerating device 7-4,7-4 ', speed governing encoder 7-5,7-5 ' connect bracing or strutting arrangement 7-6, servo-actuated transition axis 7-7,7-7 ', receiving/releasing spool 7-8,7-8 ', plated film base station 7-9, output electric pulse 7-10,7-10 ', moment restricting signal 7-11,7-11 ', matrix band actual motion speed signal 7-12,7-12 ', vacuum plating locular wall 7-13; Ion beam sputtering source 8, ion beam sputtering source baffle plate 8 '; Assisted by Ion Beam enhancing/irrigation source 9, Assisted by Ion Beam enhancing/irrigation source baffle plate 9 '; Electron beam evaporation plating source 10, electron beam evaporation plating source baffle plate 10 '; Baking heater 11; Water-cooled/heating turntable 12, water-cooled/heating turntable baffle plate 12 '; Film thickness monitoring device 13; Recirculated cooling water stream alarm unit 14; Flange-interface 15; Blind plate 16; Feed-through collar 17.
Embodiment
As shown in Figures 1 and 2, high vacuum multifunction ion beam sputtering of the present invention and electron beam evaporation continuous coating apparatus, by frame platform 1, vacuum film coating chamber 2, pump takes out 3, vacuum measurement 4, swing/mobile sputter target platform 5, swing/mobile sputter target platform baffle plate 5 ', gas circuit 6, the reversible coiling 7 of permanent tension force, ion beam sputtering source 8, ion beam sputtering source baffle plate 8 ', Assisted by Ion Beam enhancing/irrigation source 9, Assisted by Ion Beam enhancing/irrigation source baffle plate 9 ', electron beam evaporation plating source 10, electron beam evaporation plating source baffle plate 10 ', baking 11, water-cooled/heating turntable 12, water-cooled/heating turntable baffle plate 12 ' and control the automatically controlled of above-mentioned each unit power switch and (can adopt the split housing to control respectively, also can all electric control part branches be concentrated on whole housing by prior art) form, and be furnished with film thickness monitoring 13, recirculated cooling water stream reports to the police 14, flange-interface 15, blind plate 16, unit such as feed-through collar 17.
That vacuum multifunctional continuous film coating apparatus of the present invention is provided with is horizontal, the vacuum film coating chamber 2 of tubular (also can be other shape), button fly front, double-deck water-cooled, all steel structure, independent single chamber, be fixed on the frame platform 1, pump is taken out unit 3 and is positioned at frame platform 1 rear portion, and recirculated cooling water stream warning 14 places rear portion in the frame platform 1; Settle the reversible coiling 7 of persevering tension force, vacuum measurement 4 in the vacuum film coating chamber 2 and toast 11, and ion beam sputtering source 8, ion beam sputtering source baffle plate 8 ', Assisted by Ion Beam enhancing/irrigation source 9, Assisted by Ion Beam enhancing/irrigation source baffle plate 9 ', electron beam evaporation source 10, electron beam evaporation source baffle plate 10 ', swing/mobile sputter target platform 5, swing/mobile sputter target platform baffle plate 5 ', water-cooled/heating turntable 12, water-cooled/heating turntable baffle plate 12 '; Gas circuit unit 6 places frame platform 1 inside, inserts from vacuum film coating chamber 2 side lower parts; Flange-interface 15, blind plate 16, feed-through collar 17 place the sidepiece of vacuum film coating chamber 2.
The reversible coiling 7 of described permanent tension force, electron beam evaporation source 10, electron beam evaporation source baffle plate 10 ', swing/mobile sputter target platform 5, swing/mobile sputter target platform baffle plate 5 ', ion beam sputtering source 8, ion beam sputtering source baffle plate 8 ', ion beam assisted depositing/irrigation source 9, Assisted by Ion Beam enhancing/irrigation source baffle plate 9 ', water-cooled/heating turntable 12, water-cooled/heating turntable baffle plate 12 ' is equipped with power control switch, both can manually control, also can utilize computer technology to realize control automatically, as previously mentioned, can adopt the split housing independently to control, also can develop all-in-one control.
The upper side of described vacuum film coating chamber 2 has feed-through collar 17, also leaves easily detachable flange-interface 15 and is equipped with corresponding blind plate 16, is used for being connected with miscellaneous equipment.
Described ion beam sputtering source 8, ion beam sputtering source baffle plate 8 ' place vacuum film coating chamber 2 rear lowers, target on emission high-energy ion bombardment swing/mobile sputter target platform 5 makes the target material that sputters deposit to matrix band on the reversible coiling 7 of permanent tension force and the matrix surface on water-cooled/heating turntable 12 and film forming.
Described Assisted by Ion Beam enhancing/irrigation source 9, Assisted by Ion Beam enhancing/irrigation source baffle plate 9 ' place vacuum film coating chamber 2 sidepieces, matrix band on the reversible coiling 7 of the permanent tension force of emission high-energy ion bombardment and the matrix on water-cooled/heating turntable 12, realize the preceding cleaning function of plated film of matrix, and the auxiliary enhancement function of realization matrix plated film, improve quality of forming film.
Described water-cooled/heating turntable 12 exchanges manually, the matrix on the turntable can be heated to up to 800 ℃, realizes the control of plated film matrix wide temperature range.
Be provided with the film thickness monitoring unit in the described vacuum film coating chamber 2, both can manually control, also can control water-cooled/heating turntable baffle plate 12 ' automatically, realize setting the real-time monitoring of thickness.
Be provided with vacuum measurement Unit 4 in the described vacuum film coating chamber 2 and toast Unit 11, baking 11 can be heated to up to 500 ℃ the matrix band on the reversible coiling 7 of permanent tension force.
The present invention can satisfy the needs of individual event or multinomial plated film.When carrying out ion beam sputtering source 8 plated films, swing/mobile sputter target platform 5 can be moved into the axis place (axially starting position) of vacuum film coating chamber 2 automatically, and electron beam evaporation source baffle plate 10 ' can be closed, and prevents to pollute coating materials in the evaporation crucible; When carrying out electron beam evaporation source 10 plated films, swing/mobile sputter target platform 5 can be moved near the left side locular wall of vacuum film coating chamber 2 automatically, and can close swing/mobile sputter target platform baffle plate 5 ', both avoided influencing electron beam evaporation source 10 plated films, can prevent again that the target on swing/mobile sputter target platform 5 from being polluted.
As shown in Figure 3, swing of the present invention/mobile sputter target platform 5 places vacuum film coating chamber 2 outsides, is made up of PLC programmable logic controller 5-1, connection bracing or strutting arrangement 5-2, stepper-motor 5-3,5-3 ', transmission decelerating device 5-4,5-4 ', target position axial wobble assembly 5-5, the two-way runner assembly 5-6 of target position, target shaft assembly 5-7, target position 5-8, flange 5-9, output electric pulse 5-10,5-10 '.Can realize the axial wobble and the two-way rotation of target position, improve the utilization ratio 60%～100% of noble metal target and difficult processing class target, help obtaining cladded type composite membrane product, reduce the plated film production cost of products significantly by the mosaic target.
Described stepper-motor 5-3 drives with transmission decelerating device 5-4 and is connected, and transmission decelerating device 5-4 connects control target position axial wobble assembly 5-5 by screw mandrel, all is fixed in to connect on the bracing or strutting arrangement 5-2.Stepper-motor 5-3 ', transmission decelerating device 5-4 ', the two-way runner assembly 5-6 of target position are fixed on the target position axial wobble assembly 5-5, stepper-motor 5-3 ' drives with transmission decelerating device 5-4 ' and is connected, after transmission decelerating device 5-4 ' controls the two-way runner assembly 5-6 of target position by direct connection, and and then control target shaft assembly 5-7 and target position 5-8.
Described PLC programmable logic controller 5-1 (contains: the angle [alpha] of the two-way rotation of target position 5-8 according to the processing parameter that writes
JustAnd α
ContraryAnd frequency f) output electric pulse 5-10 ', control step motor 5-3 ', drive target shaft assembly 5-7 by transmission decelerating device 5-4 ' and the two-way runner assembly 5-6 of target position, realize that target position 5-8 is in the two-way rotation of setting under rotational angle α and the frequency f situation, after closing the two-way runner assembly 5-6 of target position, by identical controlled step, realize that the angle between target position 5-8 surface and the focused ion beam medullary ray returns to original design angle (promptly resetting in turning to starting position) rapidly.
Equally, described PLC programmable logic controller 5-1 also (contains: the swinging distance L of target position 5-8 axial wobble according to the processing parameter that writes
JustAnd L
ContraryAnd speed v) output electric pulse 5-10, control step motor 5-3, behind the target position axial wobble assembly 5-5 on the transmission decelerating device 5-4 driving connection bracing or strutting arrangement 5-2, and then the target shaft assembly 5-7 on the control target position axial wobble assembly 5-5, realize that simultaneously target position 5-8 is in the axial wobble of setting under swinging distance L and the speed v situation, after closing target position axial wobble assembly 5-5, by identical controlled step, realize that target position 5-8 center overlaps (promptly resetting in axial starting position) rapidly with focusing of ion beam bundle spot center.
In addition, swing/mobile sputter target platform 5 and swing/mobile sputter target platform baffle plate 5 ' can be designed to: when carrying out ion beam sputtering source 8 plated films, swing/mobile sputter target platform 5 can be moved into the axis place (axially starting position) of vacuum film coating chamber 2 automatically, electron beam evaporation source baffle plate 10 ' can be closed, and prevents to pollute coating materials in the evaporation crucible; When carrying out electron beam evaporation source 10 plated films, swing/mobile sputter target platform 5 can be moved near the left side locular wall of vacuum film coating chamber 2 automatically, and can close swing/mobile sputter target platform baffle plate 5 ', electron beam evaporation source 10 plated films had both been avoided influencing, can prevent that again the target on swing/mobile sputter target platform 5 from being polluted, guarantee quality of forming film.
As shown in Figure 4, the reversible coiling of permanent tension force of the present invention Unit 7 are symmetrically placed in vacuum film coating chamber 2 tops, are made up of PLC programmable logic controller 5-1, DC servo motor 7-2,7-2 ', moment sensing slicer 7-3,7-3 ', transmission decelerating device 7-4,7-4 ', speed governing encoder 7-5,7-5 ', connection bracing or strutting arrangement 7-6, servo-actuated transition axis 7-7,7-7 ', folding and unfolding spool 7-8,7-8 ', plated film base station 7-9, output electric pulse 7-10,7-10 ', moment restricting signal 7-11,7-11 ', matrix band actual motion speed signal 7-12,7-12 '.Can realize simultaneously in the matrix tape wrapping process setting under the tension force under the reversible bi-directional constant control of setting speed and the setting speed to setting the constant control of tensile.
Described folding and unfolding spool 7-8,7-8 ' and servo-actuated transition axis 7-7,7-7 ' are fixed in and connect on the bracing or strutting arrangement 7-6, folding and unfolding spool 7-8,7-8 ' are positioned at plated film base station 7-9 both sides, two servo-actuated transition axis 7-7,7-7 ' lay respectively between folding and unfolding spool 7-8,7-8 ' and the plated film base station 7-9, and speed governing encoder 7-5,7-5 ' are set on it.DC servo motor 7-2,7-2 ' by PLC programmable logic controller 5-1 control are connected with transmission decelerating device 7-4,7-4 ' driving, and place vacuum film coating chamber 2 rear portions, transmission decelerating device 7-4,7-4 ' drive the folding and unfolding spool 7-8, the 7-8 ' that connect on the bracing or strutting arrangement 7-6 and realize reversible two-way rotation synchronously, drive the synchronous reversible bidirectional-movement of matrix band.PLC programmable logic controller 5-1 obtains matrix band actual motion speed signal 7-12, the 7-12 ' and the difference of setting the movement velocity value that servo-actuated transition axis 7-7,7-7 ' go up speed governing encoder 7-5,7-5 ' output, also obtain simultaneously the torque sensor signal, according to write-in program, output electric pulse 7-10,7-10 ' and moment restricting signal 7-11,7-11 ' control DC servo motor 7-2,7-2 ' and limiter of moment 7-3,7-3 ' respectively in real time, drive folding and unfolding spool 7-8, the 7-8 ' that connects on the bracing or strutting arrangement 7-6 by transmission decelerating device 7-4,7-4 '.Reach and set tension force, speed respectively, and the purpose of constant control tension force, speed.
As shown in Figure 5, gas circuit of the present invention Unit 6 adopt single gas circuit 6-1,6-2 and mass flowmeter 6-5,6-6 respectively to ion beam sputtering source 8 and ion beam assisted depositing/irrigation source 9 air feed, and adopt single gas circuit 6-3,6-4 and mass flowmeter 6-7,6-8 or two above gas circuits or feed in the vacuum film coating chamber 2 through mixing gas tank 6-9.
The present invention is used on the long matrix band and is coated with synthetic film, cladded type composite membrane and multilayer film, equally also can be coated with synthetic film, cladded type composite membrane and multilayer film on short and small matrix or static matrix.Its working process is: the matrix band that will intend plated film twines and is put in (matrix that maybe will intend plated film is fixed on water-cooled/heating turntable 12) on the reversible coiling of permanent tension force Unit 7, vacuumize, start the reversible coiling 7 unit tape transports of permanent tension force (or opening water-cooled/heating turntable 12 rotations), open the power control switch (by predefined scheme sequencing) of control ion beam sputtering source 8 and swing/mobile sputter target platform 5, or the power control switch of electron beam evaporation source 10 (by predefined scheme sequencing), so that carry out the plated film of related film system.Under matrix band walking states or matrix uniform rotation state, the thickness deviation is less than 5% when ion beam sputtering or electron beam evaporation.
Vacuum multifunctional continuous film coating apparatus of the present invention is mainly used in exploitation laminated film of nanometer particle size and compound function film and can prepares continuously simultaneously, improves working (machining) efficiency.
Be applicable to the matrix band of the specific embodiment of the invention, comprise polymer flexible materials, graphite fiber cloth and metal thin strip etc., having necessarily can degree of coiling and possess certain tensile strength.
This device also can be used for other function film---as: the development of metal and alloy firm, sull, semiconductor film, ceramic membrane, dielectric film, ferromagnetic thin film, magneticthin film and optical thin film etc.
Claims (9)
1, a kind of vacuum multifunctional continuous film coating apparatus, it is characterized in that: vacuum film coating chamber is a single cell structure, it is outdoor that the producer in ion beam sputtering source and electron beam evaporation plating source is arranged on vacuum plating, and the two inlet correspondence that feeds coating chamber is provided with ion beam sputtering source baffle plate and electron beam evaporation plating source baffle plate; The receiving/releasing spool of the reversible winder unit of permanent tension force and servo-actuated transition axis are fixed on the interior connection bracing or strutting arrangement of coating chamber, and corresponding sensing, driving, control are arranged on outside the coating chamber.
2, vacuum multifunctional continuous film coating apparatus according to claim 1, it is characterized in that: the receiving/releasing spool of the reversible winder unit of permanent tension force is in transmission connection by moment sensing slicer and servomotor, the servo-actuated transition axis of the reversible winder unit of permanent tension force is connected with the speed governing encoder, and moment sensing, servomotor and speed governing encoder all electricly connect with the PLC programmable logic controller; The unitary target position of ionic fluid sputter is connected with two-way runner assembly driven by stepper motors, and this two-way runner assembly is connected again with by another stepper motor driven axial reciprocally swinging assembly, and two groups of stepper-motors also electricly connect with the PLC programmable logic controller.
3, vacuum multifunctional continuous film coating apparatus according to claim 2 is characterized in that: pump is taken out the unit and is positioned at frame platform rear portion and is connected with the metallic seal of vacuum film coating chamber rear portion; Recirculated cooling water stream alarm unit places rear portion in the frame platform, is electrically connected with the unit of each required recirculated cooling water.
4, vacuum multifunctional continuous film coating apparatus according to claim 2 is characterized in that: indoor vacuum measurement device and the baking heater of being mounted with of described vacuum plating.
5, vacuum multifunctional continuous film coating apparatus according to claim 2 is characterized in that: vacuum film coating chamber is provided with Assisted by Ion Beam enhancing/irrigation source, and indoor correspondence is provided with ion beam assisted depositing/irrigation source baffle plate; Coating chamber is provided with swing/mobile sputter target platform, and indoor correspondence is provided with swing/mobile sputter target platform baffle plate; Coating chamber is provided with water-cooled/heating turntable, and indoor correspondence is provided with water-cooled/heating turntable baffle plate.
6, vacuum multifunctional continuous film coating apparatus according to claim 2 is characterized in that: the target of ion beam sputtering source transmitting terminal on swing/mobile sputter target platform; Assisted by Ion Beam enhancing/irrigation source transmitting terminal on the reversible winder unit of permanent tension force the matrix band and the matrix on water-cooled/heating turntable.
7, vacuum multifunctional continuous film coating apparatus according to claim 2 is characterized in that: water-cooled/heating turntable is to exchange structure, is provided with the film thickness monitoring unit at the indoor water-cooled of vacuum plating/heating turntable baffle plate place.
8, vacuum multifunctional continuous film coating apparatus according to claim 1 is characterized in that: the gas circuit unit adopts single gas circuit to connect ion beam sputtering source and ion beam assisted depositing/irrigation source air feed respectively; Adopt single gas circuit or two above gas circuits or feed the indoor even device of air of vacuum plating through mixing gas tank.
9, vacuum multifunctional continuous film coating apparatus according to claim 2 is characterized in that: also have the interface that is connected with miscellaneous equipment on the vacuum film coating chamber.
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| CN2008102335911A CN101413109B (en) | 2008-11-18 | 2008-11-18 | Vacuum multifunctional continuous film coating apparatus |
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| CN2008102335911A CN101413109B (en) | 2008-11-18 | 2008-11-18 | Vacuum multifunctional continuous film coating apparatus |
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| CN101413109B CN101413109B (en) | 2010-12-08 |
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101798681A (en) * | 2010-03-30 | 2010-08-11 | 袁惠芬 | Winding-type vacuum coater |
| CN101994096A (en) * | 2009-08-14 | 2011-03-30 | 鸿富锦精密工业（深圳）有限公司 | Vacuum film coater |
| CN102877026A (en) * | 2012-09-27 | 2013-01-16 | 中国科学院长春光学精密机械与物理研究所 | Vacuum depositing device for multilayer film devices |
| CN103397300A (en) * | 2013-08-06 | 2013-11-20 | 中国钢研科技集团有限公司 | Multifunctional experiment device and method for deposition of zinc alloy coating |
| CN106917070A (en) * | 2017-04-27 | 2017-07-04 | 广州市中昊装饰材料有限公司 | A kind of vacuum web plasma coating system |
| CN110541156A (en) * | 2019-10-10 | 2019-12-06 | 中国科学院自动化研究所 | Device for preparing continuous conductive film by coating apparatus |
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| CN112095087A (en) * | 2019-12-13 | 2020-12-18 | 深圳市中欧新材料有限公司 | Coating equipment with air isolation structure for production of conductive film |
| CN116162907A (en) * | 2023-04-21 | 2023-05-26 | 无锡邑文电子科技有限公司 | PLD coating device special for semiconductor device |
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| CN101994096A (en) * | 2009-08-14 | 2011-03-30 | 鸿富锦精密工业（深圳）有限公司 | Vacuum film coater |
| CN101994096B (en) * | 2009-08-14 | 2013-03-20 | 鸿富锦精密工业（深圳）有限公司 | Vacuum film coater |
| CN101798681A (en) * | 2010-03-30 | 2010-08-11 | 袁惠芬 | Winding-type vacuum coater |
| CN101798681B (en) * | 2010-03-30 | 2011-10-26 | 袁惠芬 | Winding-type vacuum coater |
| CN102877026A (en) * | 2012-09-27 | 2013-01-16 | 中国科学院长春光学精密机械与物理研究所 | Vacuum depositing device for multilayer film devices |
| CN102877026B (en) * | 2012-09-27 | 2014-12-24 | 中国科学院长春光学精密机械与物理研究所 | Vacuum depositing device for multilayer film devices |
| CN103397300A (en) * | 2013-08-06 | 2013-11-20 | 中国钢研科技集团有限公司 | Multifunctional experiment device and method for deposition of zinc alloy coating |
| CN103397300B (en) * | 2013-08-06 | 2016-01-20 | 中国钢研科技集团有限公司 | A kind of deposition zinc alloy layer multifunction experiment apparatus and method thereof |
| CN106917070A (en) * | 2017-04-27 | 2017-07-04 | 广州市中昊装饰材料有限公司 | A kind of vacuum web plasma coating system |
| CN110541156A (en) * | 2019-10-10 | 2019-12-06 | 中国科学院自动化研究所 | Device for preparing continuous conductive film by coating apparatus |
| CN110541156B (en) * | 2019-10-10 | 2020-07-28 | 中国科学院自动化研究所 | Device for preparing continuous conductive film by coating apparatus |
| CN110592547A (en) * | 2019-10-22 | 2019-12-20 | 武汉奥亿特科技有限公司 | Controllable magnetron sputtering coating device of directionality |
| CN112095087A (en) * | 2019-12-13 | 2020-12-18 | 深圳市中欧新材料有限公司 | Coating equipment with air isolation structure for production of conductive film |
| CN112095087B (en) * | 2019-12-13 | 2022-06-14 | 深圳市中欧新材料有限公司 | Coating equipment with air isolation structure for production of conductive film |
| CN116162907A (en) * | 2023-04-21 | 2023-05-26 | 无锡邑文电子科技有限公司 | PLD coating device special for semiconductor device |
| CN118086842A (en) * | 2023-07-27 | 2024-05-28 | 上海超导科技股份有限公司 | Coating system for ion beam assisted deposition coating device |
| CN118086842B (en) * | 2023-07-27 | 2024-09-24 | 上海超导科技股份有限公司 | Coating system for ion beam assisted deposition coating device |
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