CN101377555A - Sub-wave length embedded type grating structure polarizing sheet and manufacturing method thereof - Google Patents
Sub-wave length embedded type grating structure polarizing sheet and manufacturing method thereof Download PDFInfo
- Publication number
- CN101377555A CN101377555A CNA2008101567733A CN200810156773A CN101377555A CN 101377555 A CN101377555 A CN 101377555A CN A2008101567733 A CNA2008101567733 A CN A2008101567733A CN 200810156773 A CN200810156773 A CN 200810156773A CN 101377555 A CN101377555 A CN 101377555A
- Authority
- CN
- China
- Prior art keywords
- dielectric
- grating
- refractive index
- sub
- wave length
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title description 7
- 229910052751 metal Inorganic materials 0.000 claims abstract description 63
- 239000002184 metal Substances 0.000 claims abstract description 63
- 239000000758 substrate Substances 0.000 claims abstract description 19
- 238000000034 method Methods 0.000 claims abstract description 13
- 230000003287 optical effect Effects 0.000 claims description 50
- 238000002161 passivation Methods 0.000 claims description 25
- 239000011248 coating agent Substances 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 7
- 238000000671 immersion lithography Methods 0.000 claims description 6
- 238000012545 processing Methods 0.000 claims description 5
- 238000010276 construction Methods 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 4
- 229910004261 CaF 2 Inorganic materials 0.000 claims description 3
- 230000008021 deposition Effects 0.000 claims description 2
- 230000000737 periodic effect Effects 0.000 claims description 2
- 239000002985 plastic film Substances 0.000 claims description 2
- 229920006255 plastic film Polymers 0.000 claims description 2
- 238000004544 sputter deposition Methods 0.000 claims description 2
- 230000005540 biological transmission Effects 0.000 abstract description 44
- 230000008033 biological extinction Effects 0.000 abstract description 24
- 230000008569 process Effects 0.000 abstract description 6
- 230000010354 integration Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 41
- 230000010287 polarization Effects 0.000 description 14
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 11
- 239000004926 polymethyl methacrylate Substances 0.000 description 11
- 229920000728 polyester Polymers 0.000 description 9
- 229920003023 plastic Polymers 0.000 description 7
- 239000004033 plastic Substances 0.000 description 7
- 238000013461 design Methods 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 239000004743 Polypropylene Substances 0.000 description 4
- 239000004411 aluminium Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000011127 biaxially oriented polypropylene Substances 0.000 description 4
- 229920006378 biaxially oriented polypropylene Polymers 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 239000004417 polycarbonate Substances 0.000 description 4
- 229920000515 polycarbonate Polymers 0.000 description 4
- -1 polypropylene Polymers 0.000 description 4
- 229920001155 polypropylene Polymers 0.000 description 4
- 239000004800 polyvinyl chloride Substances 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004049 embossing Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 229910004541 SiN Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
Images
Landscapes
- Polarising Elements (AREA)
Abstract
本发明公开了一种亚波长埋入式光栅结构偏振片，包括透明基底、介质光栅、第一金属层、第二金属层，所述介质光栅具有周期性间隔设置的脊部和沟槽，所述第一金属层覆盖于介质光栅的脊部，所述第二金属层覆盖于介质光栅的沟槽中，介质光栅的周期小于入射光波长，其特征在于：在所述第一金属层和第二金属层的顶部上表面覆盖有介质覆盖层，在所述透明基底和介质光栅之间设有高折射率介质层，所述高折射率介质层的折射率在1.6至2.4之间。介质覆盖层既可以对偏振片的透射效率起调制作用，又可以起到保护金属层的作用，防止金属层被氧化和在集成过程中被破坏；在整个可见光波段，该偏振片具有高透射效率、高消光比、宽广的入射角度范围。
The invention discloses a polarizer with a sub-wavelength embedded grating structure, which comprises a transparent substrate, a dielectric grating, a first metal layer, and a second metal layer. The dielectric grating has ridges and grooves periodically arranged at intervals. The first metal layer covers the ridges of the dielectric grating, the second metal layer covers the grooves of the dielectric grating, and the period of the dielectric grating is smaller than the wavelength of the incident light. It is characterized in that: between the first metal layer and the second metal layer The top surfaces of the two metal layers are covered with a dielectric covering layer, and a high-refractive-index medium layer is arranged between the transparent base and the dielectric grating, and the high-refractive-index medium layer has a refractive index between 1.6 and 2.4. The dielectric cover layer can not only modulate the transmission efficiency of the polarizer, but also protect the metal layer, preventing the metal layer from being oxidized and damaged during the integration process; the polarizer has high transmission efficiency in the entire visible light band , High extinction ratio, wide incident angle range.
Description
Technical field
The present invention relates to a kind of polaroid that is applicable to visible light wave range, be specifically related to a kind of sub-wave length embedded type grating structure polarizing sheet, can be applicable to fields such as liquid crystal display, optical communication.
Background technology
Polaroid is a kind of very important optical module in the systems such as liquid crystal display, optical measurement, optical communication, has boundless market.Require polaroid to have the incident angle scope of High Extinction Ratio, broadness and very compact volume in these systems.Traditional excessive, complex manufacturing process of polaroid volume, and only in less wavelength coverage, have big extinction ratio, can not satisfy demonstration industry light-type, ultrathin type, requirement cheaply.Therefore, how the project organization compactness, be easy to process, polaroid that cost performance is high, become the trend of this area research development.
Discover that metal grating structure has unique polarization property.The reason that metal grating structure has a polarization property is perpendicular to grating vector (TE polarization) different with the boundary condition that is parallel to grating vector (TM polarization) polarized light, and its equivalent refractive index is also different.Accompanying drawing 1 is the structural drawing of one dimension rectangular metal grating and the schematic diagram that produces polarization property.Wherein, 11 is transparent substrates, and 12 is metal grating, and the cycle of metal grating is P, and spine's width is W, highly is H, and 13 is light source.The nonpolarized light (comprising TM polarized light and TE polarized light) that is produced by light source 13 incides this polaroid with incident angle θ.TE polarization (claiming the s polarization again) excites the electronics of metal wire and produces electric current, make the polarized light of this direction reflect, and TM polarization (claiming the p polarization) is owing to having the clearance that metal wire is isolated on this direction and can't cause electric current, light wave meeting this moment transmissive.So just realize the separation of mutually perpendicular two polarization state p, s of direction of vibration in the incident light, shown strong polarization characteristic.
Because the sub-wave length metal grating volume is little, it is integrated to be easy to, polarization characteristic good, a lot of scientific research personnel further investigate its its corresponding theory analysis, structural design, manufacture craft etc.
U.S. Pat 7158302 discloses a kind of double-metal layer polaroid, and in the 500-700nm wavelength coverage, TM optical transmission efficient major part is more than 70%, but when the 400nm wavelength, TM optical transmission efficient is 63%, and TM optical transmission efficient has much room for improvement; In this patent, the upper surface that discloses at metal level covers layer protective layer to avoid the oxidized technical scheme of metal, and protective seam is SiO
2, SiN or SiON, but do not provide the concrete thickness of protective seam, and protective seam is to the transmission of polaroid and the influence of Extinction Characteristic.
Discover that the cycle of metal grating structure polarizer that is used for visible light wave range is very little, the cycle is generally less than 180nm.Process-cycle is little grating so, can adopt electron beam lithography and ion etching technology, and the subject matter of existence is: make efficiency is low, area is little (several centimetres), cost is too high, can't be used for industrial applications at present.
Summary of the invention
The purpose of this invention is to provide a kind of novel sub-wave length embedded type grating structure polarizing sheet, making this polaroid be applicable to visible light wave range, when having broad incident angle scope, high efficiency of transmission and High Extinction Ratio, prolong its serviceable life, simplify its manufacture craft.
For achieving the above object, the technical solution used in the present invention is: a kind of sub-wave length embedded type grating structure polarizing sheet, comprise transparent substrates, dielectric grating, the first metal layer, second metal level, described dielectric grating has spine and the groove that periodic intervals is provided with, described the first metal layer is covered in the spine of dielectric grating, described second metal level is covered in the groove of dielectric grating, the cycle of dielectric grating is less than lambda1-wavelength, top upper surface at the described the first metal layer and second metal level is coated with dielectric passivation, be provided with the high refractive index medium layer between described transparent substrates and dielectric grating, the refractive index of described high refractive index medium layer is between 1.6 to 2.4.
Above, described transparent substrates is glass or plastic basis material, and plastic basis material can adopt polycarbonate (PC), Polyvinylchloride (PVC), polyester (PET), polymethylmethacrylate (PMMA) or polypropylene (BOPP).Described metal level is gold, silver, copper, aluminium lamination.Described dielectric grating can adopt polycarbonate (PC), Polyvinylchloride (PVC), polyester (PET), polymethylmethacrylate (PMMA) or polypropylene materials such as (BOPP).
Dielectric passivation both can play modulating action to the efficiency of transmission of polaroid, can play the effect of protection metal level again, prevented that metal level is oxidized and destroyed in integrating process.Described dielectric passivation is selected from CaF
2Coating, plastic film layers or resinous coat.The thickness of described dielectric passivation is 10～200nm.
In the technique scheme, the cycle of described dielectric grating is smaller or equal to 250nm; The ratio in spine's width and cycle is 0.3～0.6; The described the first metal layer and second metal layer thickness are 50～100nm; Spine's thickness of described dielectric grating is greater than metal layer thickness.
The thickness of described high refractive index medium layer is 10～200nm.
Described transparent substrate thickness is 12～150um.
The method for making of sub-wave length embedded type grating structure polarizing sheet of the present invention comprises the following steps:
(1) deposition high refractive index medium layer on transparent substrates, the refractive index of described high refractive index medium layer is between 1.6 to 2.4;
(2) coating one deck dielectric layer on the high refractive index medium layer;
(3) form the periodical media optical grating construction with optical grating mold plate on the dielectric layer surface;
(4) utilize physical sputtering method depositing metal layers on periodical media optical grating construction surface;
(5) at the top coating dielectric passivation of the first metal layer and second metal level, promptly obtain required sub-wave length embedded type grating structure polarizing sheet.
Wherein, in the described step (3), optical grating mold plate takes immersion lithography to process, and the dielectric grating structure can adopt nano-imprinting method to make and form, thereby realizes the quick manufacturing of large format polaroid.
Because the technique scheme utilization, the present invention compared with prior art has following advantage:
1. the present invention is at the top coating dielectric passivation of the first metal layer and second metal level; dielectric passivation both can play modulating action to the efficiency of transmission of polaroid; can play the effect of protection metal level again, prevent that metal level is oxidized and destroyed in integrating process.
2. the present invention is provided with the high refractive index medium layer, and the polaroid of acquisition is at whole visible light wave range (400nm-700nm), have high efficiency of transmission, High Extinction Ratio; The incident angle of incident light has broad incident angle scope in 0 degree～60 degree range.
3. on technology, adopt immersion lithography to combine with nanometer embossing, can realize the quick manufacturing of large format polaroid, its manufacturing process is easy, does not need etching technics, has reduced processing cost.
4. different with traditional polaroid, parameters such as the thickness of the refractive index of the refractive index of the present invention by adjusting dielectric passivation, thickness, high refractive index medium layer, thickness, dielectric grating, spine's width, cycle, metal layer thickness can obtain high TM light transmission efficiencies and High Extinction Ratio, design more flexible.
Description of drawings
Fig. 1 is the structural drawing of one dimension rectangular metal grating and the schematic diagram that produces polarization property.
Fig. 2 is the structural representation of the sub-wave length embedded type grating structure polarizing sheet that designs in the embodiment of the invention.
Fig. 3 is the TM optical transmission efficient of sub-wave length embedded type grating structure polarizing sheet in the embodiment of the invention one and the graph of a relation of incident wavelength.
Fig. 4 is the TM optical transmission efficient of sub-wave length embedded type grating structure polarizing sheet in the embodiment of the invention two and the graph of a relation of incident wavelength.
Fig. 5 is the thickness h 4 of the dielectric passivation of sub-wave length embedded type grating structure polarizing sheet in the embodiment of the invention three and the graph of a relation between the TM optical transmission efficient.
Fig. 6 is the thickness h 4 of the dielectric passivation of sub-wave length embedded type grating structure polarizing sheet in the embodiment of the invention three and the graph of a relation between the extinction ratio.
Fig. 7 is the thickness h 1 of high refractive index medium layer of sub-wave length embedded type grating structure polarizing sheet in the embodiment of the invention four and the graph of a relation between the TM optical transmission efficient.
Fig. 8 is the thickness h 1 of high refractive index medium layer of sub-wave length embedded type grating structure polarizing sheet in the embodiment of the invention four and the graph of a relation between the extinction ratio.
Fig. 9 is the TM optical transmission efficient of sub-wave length embedded type grating structure polarizing sheet in the embodiment of the invention five and the graph of a relation of incident wavelength.
Figure 10 is the TM optical transmission efficient of sub-wave length embedded type grating structure polarizing sheet in the embodiment of the invention six and the graph of a relation of incident angle.
Figure 11 is the TM optical transmission efficient of sub-wave length embedded type grating structure polarizing sheet in the embodiment of the invention seven and the graph of a relation of incident wavelength.
Figure 12 is the graph of a relation of the extinction ratio and the incident wavelength of sub-wave length embedded type grating structure polarizing sheet in the embodiment of the invention seven.
Figure 13 is an index path of taking immersion lithography processing optical grating mold plate.
Embodiment
Below in conjunction with drawings and Examples the present invention is further described:
Embodiment one:
Referring to accompanying drawing 2, be the synoptic diagram of sub-wave length embedded type grating structure polarizing sheet.
The refractive index of high refractive index medium layer 23 is greater than the refractive index of substrate.
High refractive index medium layer 23 can be TiO
2, Ta
2O
5, ZnS or the like.
Wherein, the period p of dielectric grating is smaller or equal to 250nm;
The width w of spine of dielectric grating and the ratio F of period p are 0.3-0.6;
The refractive index N:1.6 of high refractive index medium layer-2.4;
The thickness h 1 scope 10-200nm of high refractive index medium layer;
The thickness h 2 of dielectric grating is greater than metal layer thickness h3;
Metal layer thickness h3 scope 50-100nm;
The thickness h 4 scope 10-200nm of dielectric passivation.
As seen from the figure, be provided with dielectric passivation, between substrate and dielectric grating, be provided with the high refractive index medium layer at the top of metal level.Incident light 21 is a visible light, and wavelength is 400nm-700nm, and incident angle is 0 degree; Substrate 22 is a glass, and refractive index is 1.52; The refractive index of high refractive index medium layer 23 is 1.7; Metal level 24 is an aluminium; Dielectric grating 25 is PMMA, and refractive index is 1.48; Dielectric passivation 26 is PMMA.The structural parameters of polaroid are as follows: substrate thickness is 100um, high refractive index medium layer thickness h1 is 0.08um, the height h2=0.1um of dielectric grating, the height h3=0.08um of metal level, the height h4=0.1um of dielectric passivation, period p=the 0.1um of dielectric grating, the width w=0.05um of spine.With this understanding, the relation of TM optical transmission efficient and wavelength as shown in Figure 3.At wavelength is that 400nm, 470nm, 550nm, 610nm, the TM of 700nm place optical transmission efficient, TE optical transmission efficient, extinction ratio are as shown in table 1.
As can be seen from Table 1, at whole visible light wave range, the polaroid of the present invention's design has good transmission and polarization property (TM optical transmission efficient is greater than 79%, and extinction ratio is greater than 9.1E4).
Table 1
Embodiment two:
Referring to Fig. 2, change the refractive index of high refractive index medium layer among the embodiment one, the refractive index of dielectric passivation, the height of metal level.The refractive index of high refractive index medium layer 23 is 2.2, and dielectric passivation 26 is CaF2, and refractive index is 1.4, the height h3=0.07um of metal level.Incident light 21 is a visible light, and wavelength is 400nm-700nm, and incident angle is 0 degree; Substrate 22 is mylar (PET), and refractive index is 1.48; Metal level 24 is an aluminium; Dielectric grating 25 is PMMA, and refractive index is 1.48.Other structural parameters of polaroid are as follows: substrate thickness is 1000um, high refractive index medium layer thickness h1 is 0.05um, the height h2=0.1um of dielectric grating, the thickness h 4=0.1um of dielectric passivation, period p=the 0.1um of dielectric grating, the width w=0.05um of spine.
With this understanding, the relation of TM optical transmission efficient and wavelength as shown in Figure 4.At whole visible light wave range, TM optical transmission efficiency range 73%～79%, TE optical transmission efficiency range 1.1E-5～4.1E-5, extinction ratio is greater than 1.78E4.
Embodiment three:
Change the tectal thickness h 4 of embodiment one medium, other parameter constants.When incident wavelength is 400nm, 4 pairs of TM optical transmissions of thickness h efficient of dielectric passivation, influence such as Fig. 5, shown in Figure 6 of extinction ratio.Along with the increase of h4, TM optical transmission efficient is in 87.0%～91.6% scope cyclical variation, and extinction ratio is in 4.0E4～10.0E4 scope cyclical variation.As can be seen, dielectric passivation can play modulating action to the efficiency of transmission of polaroid.
The thickness of considering dielectric passivation is too thick, can increase the thickness of polaroid, thereby increases polaroid and the integrated difficulty of other optical device, the thickness of the dielectric passivation of correspondence when generally selecting TM optical transmission efficient peak value to occur for the first time.
Embodiment four:
Change the thickness h 1 of high refractive index medium layer among the embodiment one, other parameter constants.When incident wavelength is 460nm, 1 pair of TM optical transmission of thickness h efficient of high refractive index medium layer, influence such as Fig. 7, shown in Figure 8 of extinction ratio.Along with the increase of h1, TM optical transmission efficient is in 71.0%-78.5% scope cyclical variation, and extinction ratio is in 1.18E5～1.4E5 scope cyclical variation.
In order to reduce to plate the difficulty of high refractive index medium layer, increase the firmness of plating high refractive index medium layer, by optimizing refractive index and these two parameters of thickness of high refractive index medium layer, the polaroid that can easily be processed with high efficiency of transmission, High Extinction Ratio.
Embodiment five:
Incident angle is 45 degree among the change embodiment one, other parameter constants.Incident light 21 is a visible light, and wavelength is 400nm-700nm.With this understanding, the relation of TM optical transmission efficient and incident wavelength as shown in Figure 9.At 400nm wavelength place, TM optical transmission efficient is 85%, and TE optical transmission efficient is 6.4E-6, and extinction ratio is 1.33E5.At whole visible light wave range, during 45 degree oblique incidences, polaroid has high efficiency of transmission, High Extinction Ratio (efficiency of transmission is greater than 85%, and extinction ratio is greater than 1.33E5).
Embodiment six:
With the lambda1-wavelength is that 400nm is an example.Change the incident angle among the embodiment one, other parameter constants, the incident angle of incident light are to the influence of TM optical transmission efficient as shown in figure 10.Along with the increase of incident angle, TM optical transmission efficient remains unchanged earlier substantially, and the back reduces.Incident angle is spent to 60 degree scopes 0, and TM optical transmission efficient is greater than 75%, and extinction ratio illustrates that greater than 1.81E5 the polaroid of the present invention's design has broad incident angle scope.
Embodiment seven:
Changing the width w of spine of embodiment one medium grating and the ratio F of period p is 0.4, other parameter constants.Period p=the 0.1um of dielectric grating, width w=0.04um.
With this understanding, the relation of TM optical transmission efficient, extinction ratio and wavelength such as Figure 11, shown in Figure 12.At whole visible light wave range, TM optical transmission efficiency range 75%～91%, extinction ratio is greater than 1.0E5.At whole visible light wave range, this polaroid has good transmission and eliminate optical property.
Embodiment eight:
The present invention adopts immersion lithography and nanometer embossing (referring to the patent of having applied for: 200810123710.8) the combine processing of the polaroid that carries out the present invention's design.
Figure 13 is an index path of taking immersion lithography processing optical grating mold plate.Phase grating 134 is beamed into multi-level diffraction light with light beam: 0, ± 1, ± 2.Lens combination 133 is with beam splitting optical alignment and focusing (perhaps adopting symmetrical catoptron will divide light beams to close bundle), 132 couplings are radiated on the substrate of glass 131 that scribbles photoresist through prism again, form interference optical field, immersing between prism and photoresist dry plate has coupling liquid.
If the cycle of phase grating 134 is d, normal incident light is through behind the optical grating diffraction, and the angle of the diffraction light of formation is: Sin θ=m λ/d.M is that the order of diffraction is inferior in the formula, and λ is for using wavelength.In Figure 13, when adopting positive and negative level time diffraction light symmetry to interfere, the cycle of the interference fringe of formation is:
D＝λ/(2nSinθ)＝d/(2nm)
Wherein, n is the immersion liquid refractive index between prism and the photoresist dry plate.Like this, when m=1, the cycle of the interference fringe in the luminous point is 1/ (2n) in a phase beam-splitting optical grating cycle.If get θ=90 degree, during λ=263nm (DPSSL frequency tripling Ultra-Violet Laser), the cycle of interference fringe is 124nm.
After photoetching is finished, also need to carry out electroforming process, the nanoscale embossment structure on the photoresist is translated into metallic nickel version template, be used for carrying out nano impression again.
Claims (8)
1. sub-wave length embedded type grating structure polarizing sheet, comprise transparent substrates, dielectric grating, the first metal layer, second metal level, described dielectric grating has spine and the groove that periodic intervals is provided with, described the first metal layer is covered in the spine of dielectric grating, described second metal level is covered in the groove of dielectric grating, the cycle of dielectric grating is less than lambda1-wavelength, it is characterized in that: the top upper surface at the described the first metal layer and second metal level is coated with dielectric passivation, be provided with the high refractive index medium layer between described transparent substrates and dielectric grating, the refractive index of described high refractive index medium layer is between 1.6 to 2.4.
2. sub-wave length embedded type grating structure polarizing sheet according to claim 1 is characterized in that: described dielectric passivation is selected from CaF
2Coating, plastic film layers or resinous coat.
3. sub-wave length embedded type grating structure polarizing sheet according to claim 2 is characterized in that: the thickness of described dielectric passivation is 10～200nm.
4. sub-wave length embedded type grating structure polarizing sheet according to claim 1 is characterized in that: the cycle of described dielectric grating is smaller or equal to 250nm; The ratio in spine's width and cycle is 0.3～0.6; The described the first metal layer and second metal layer thickness are 50～100nm; Spine's thickness of described dielectric grating is greater than metal layer thickness.
5. sub-wave length embedded type grating structure polarizing sheet according to claim 1 is characterized in that: the thickness of described high refractive index medium layer is 10～200nm.
6. sub-wave length embedded type grating structure polarizing sheet according to claim 1 is characterized in that: described transparent substrate thickness is 12～150um.
7. the method for making of a sub-wave length embedded type grating structure polarizing sheet is characterized in that, comprises the following steps:
(1) deposition high refractive index medium layer on transparent substrates, the refractive index of described high refractive index medium layer is between 1.6 to 2.4;
(2) coating one deck dielectric layer on the high refractive index medium layer;
(3) form the periodical media optical grating construction with optical grating mold plate on the dielectric layer surface;
(4) utilize physical sputtering method depositing metal layers on periodical media optical grating construction surface;
(5) at the top coating dielectric passivation of the first metal layer and second metal level, promptly obtain required sub-wave length embedded type grating structure polarizing sheet.
8. the method for making of sub-wave length embedded type grating structure polarizing sheet according to claim 7 is characterized in that: in the described step (3), described optical grating mold plate adopts the processing of immersion lithography method to obtain.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008101567733A CN101377555B (en) | 2008-09-26 | 2008-09-26 | Sub-wave length embedded type grating structure polarizing sheet and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008101567733A CN101377555B (en) | 2008-09-26 | 2008-09-26 | Sub-wave length embedded type grating structure polarizing sheet and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101377555A true CN101377555A (en) | 2009-03-04 |
| CN101377555B CN101377555B (en) | 2011-05-04 |
Family
ID=40421185
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008101567733A Active CN101377555B (en) | 2008-09-26 | 2008-09-26 | Sub-wave length embedded type grating structure polarizing sheet and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101377555B (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102401922A (en) * | 2011-11-25 | 2012-04-04 | 天津科技大学 | Sub-wavelength metal-dielectric grating reflective polarized light change film and manufacture method |
| CN102540299A (en) * | 2012-02-10 | 2012-07-04 | 昆山龙腾光电有限公司 | Grating polarizer |
| CN102681078A (en) * | 2012-06-06 | 2012-09-19 | 昆山龙腾光电有限公司 | Grating polarizer |
| CN102879849A (en) * | 2012-10-26 | 2013-01-16 | 苏州大学 | Sub-wavelength grating structure polarizer |
| CN103941319A (en) * | 2014-04-17 | 2014-07-23 | 苏州大学 | Motherboard of holographic concave blazed grating and manufacturing method of motherboard |
| CN104880755A (en) * | 2015-06-02 | 2015-09-02 | 中国科学院上海技术物理研究所 | Sub-wavelength metal grating polarizing film monolithically integrated on high-refractive-index substrate |
| CN107300802A (en) * | 2017-08-01 | 2017-10-27 | 深圳市华星光电技术有限公司 | Mirror face display equipment |
| CN108181678A (en) * | 2017-12-29 | 2018-06-19 | 深圳市华星光电技术有限公司 | Metal polaroid and the display device for including the metal polaroid |
| CN111089612A (en) * | 2014-09-24 | 2020-05-01 | 原相科技股份有限公司 | Optical sensors and optical sensing systems |
-
2008
- 2008-09-26 CN CN2008101567733A patent/CN101377555B/en active Active
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102401922A (en) * | 2011-11-25 | 2012-04-04 | 天津科技大学 | Sub-wavelength metal-dielectric grating reflective polarized light change film and manufacture method |
| CN102540299A (en) * | 2012-02-10 | 2012-07-04 | 昆山龙腾光电有限公司 | Grating polarizer |
| CN102681078B (en) * | 2012-06-06 | 2014-09-24 | 昆山龙腾光电有限公司 | Grating polarizer |
| CN102681078A (en) * | 2012-06-06 | 2012-09-19 | 昆山龙腾光电有限公司 | Grating polarizer |
| CN102879849B (en) * | 2012-10-26 | 2015-04-15 | 苏州大学 | Sub-wavelength grating structure polarizer |
| CN102879849A (en) * | 2012-10-26 | 2013-01-16 | 苏州大学 | Sub-wavelength grating structure polarizer |
| CN103941319A (en) * | 2014-04-17 | 2014-07-23 | 苏州大学 | Motherboard of holographic concave blazed grating and manufacturing method of motherboard |
| CN103941319B (en) * | 2014-04-17 | 2016-05-11 | 苏州大学 | Motherboard of a kind of holographic concave surface balzed grating, and preparation method thereof |
| CN111089612A (en) * | 2014-09-24 | 2020-05-01 | 原相科技股份有限公司 | Optical sensors and optical sensing systems |
| CN104880755A (en) * | 2015-06-02 | 2015-09-02 | 中国科学院上海技术物理研究所 | Sub-wavelength metal grating polarizing film monolithically integrated on high-refractive-index substrate |
| CN104880755B (en) * | 2015-06-02 | 2017-08-25 | 中国科学院上海技术物理研究所 | A kind of sub-wave length metal grating polarizer for being monolithically integrated in high index of refraction substrate |
| CN107300802A (en) * | 2017-08-01 | 2017-10-27 | 深圳市华星光电技术有限公司 | Mirror face display equipment |
| CN107300802B (en) * | 2017-08-01 | 2020-09-01 | 深圳市华星光电技术有限公司 | Mirror display device |
| CN108181678A (en) * | 2017-12-29 | 2018-06-19 | 深圳市华星光电技术有限公司 | Metal polaroid and the display device for including the metal polaroid |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101377555B (en) | 2011-05-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101377555A (en) | Sub-wave length embedded type grating structure polarizing sheet and manufacturing method thereof | |
| US8165436B2 (en) | Highly efficient optical gratings with reduced thickness requirements and impedance-matching layers | |
| KR100623026B1 (en) | Line lattice polarizer and its manufacturing method | |
| CN101290371A (en) | A sub-wavelength grating structure polarizer and its manufacturing method | |
| CN102879849B (en) | Sub-wavelength grating structure polarizer | |
| JP2008107720A (en) | Polarizer and its manufacturing method | |
| CA2480350A1 (en) | Diffraction grating element, production method of diffraction grating element, and method of designing diffraction grating element | |
| WO2008018247A1 (en) | Transmission type polarizing element, and complex polarizing plate using the element | |
| CN114265130B (en) | Transreflective light modulation and control device based on all-dielectric super-surface and working method thereof | |
| JP2003329823A (en) | Optical element using one-dimensional photonic crystal and spectroscopic system using the same | |
| JPWO2017150568A1 (en) | Optical element | |
| CN103620451A (en) | IR reflectors for solar light management | |
| JP2003215362A (en) | Optical element | |
| CN110320670A (en) | All dielectric reflection-type efficiency super-thin beam splitter and the preparation method and application thereof | |
| JP3979146B2 (en) | Optical element using one-dimensional photonic crystal and optical apparatus using the same | |
| CN110989061A (en) | All-dielectric polarization-independent total internal reflection grating and manufacturing method thereof | |
| JP2003344855A (en) | Light guide plate for front light | |
| CN101271169A (en) | Deep Etched Triangular Groove Quartz Transmission Polarization Beamsplitter Grating | |
| CN101907735A (en) | Sandwich Fused Silica Transmission 1×2 Beamsplitter Grating | |
| CN115291387B (en) | Optical waveguide structure and optical waveguide module | |
| JP3913765B1 (en) | Polarization phase difference plate | |
| CN116719114A (en) | Wire grid circular polaroid based on nano-imprinting | |
| JP2007101859A (en) | Polarized beam splitter and method of manufacturing same | |
| CN100340877C (en) | 632.8 nm wavelength back incidence type quartz reflection polarization beam splitting grating | |
| CN1588135A (en) | Back incidence type high density quartz reflection grating |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee | ||
| CP02 | Change in the address of a patent holder |
Address after: Suzhou City, Jiangsu province 215137 Xiangcheng District Ji Road No. 8 Patentee after: Soochow University Patentee after: SVG Optronics, Co., Ltd. Address before: 215123 Suzhou City, Suzhou Province Industrial Park, No. love road, No. 199 Patentee before: Soochow University Patentee before: SVG Optronics, Co., Ltd. |
|
| CP01 | Change in the name or title of a patent holder | ||
| CP01 | Change in the name or title of a patent holder |
Address after: Suzhou City, Jiangsu province 215137 Xiangcheng District Ji Road No. 8 Co-patentee after: SUZHOU SUDAVIG SCIENCE AND TECHNOLOGY GROUP Co.,Ltd. Patentee after: Suzhou University Address before: Suzhou City, Jiangsu province 215137 Xiangcheng District Ji Road No. 8 Co-patentee before: SVG OPTRONICS, Co.,Ltd. Patentee before: Suzhou University |