CN101367614A - Glaze rolling paint for resistive layer for side surface of nonlinear resistance slice and method of manufacturing the same - Google Patents

Glaze rolling paint for resistive layer for side surface of nonlinear resistance slice and method of manufacturing the same Download PDF

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Publication number
CN101367614A
CN101367614A CNA2008101509672A CN200810150967A CN101367614A CN 101367614 A CN101367614 A CN 101367614A CN A2008101509672 A CNA2008101509672 A CN A2008101509672A CN 200810150967 A CN200810150967 A CN 200810150967A CN 101367614 A CN101367614 A CN 101367614A
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percent
batching
weight
zno
tackiness agent
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CNA2008101509672A
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CN101367614B (en
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蒙晓记
谢青云
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China XD Electric Co Ltd
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China XD Electric Co Ltd
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Abstract

The invention relates to the manufacture field of nonlinear resistor cards, and provides glaze rolling painting used in a high resistive layer at the side surface of a nonlinear resistor card. The glaze rolling painting comprises adhesive and subsidiary ingredients; wherein, the subsidiary ingredients comprises the following compositions by weight: 28 percent to 30 percent of ZnO, 22 percent to 24 percent of Bi2O3, 21 percent to 23 percent of Sb2O3, 21 percent to 23 percent of SiO2, 0.1 percent to 0.2 percent of Li2CO3 and 1 percent to 5 percent of ZnCl2; the weight of the adhesive is 1 to 1.5 times of the total weight of the subsidiary ingredients; according to the weight ratio, ZnO, Bi2O3, Sb2O3, SiO2 and Li2CO3 are mixed to be dry ground for 12 hours and calcined for 1.5 to 2 hours at the temperature of 800 DCG C to 850 DEG C, and then ZnCl2 is added into the mixture to be ground into powder material; finally, the adhesive is weighted to be mixed and stirred well with the powder material to obtain the product.

Description

A kind of crawling coating that is used for non-linear resistor side high-resistance layer and preparation method thereof
Technical field
The present invention relates to non-linear resistor and make the field, relate in particular to a kind of crawling coating that is used for non-linear resistor side high-resistance layer and preparation method thereof.
Background technology
In the manufacturing processed of zinc oxide resistance sheet, three kinds of methods that improve the resistor-piece side insulation intensity are arranged, be respectively organic insulation glaze, inorganic resistive formation and unorganic glass glaze, wherein the most normal employing be inorganic resistive formation.
Traditional inorganic resistive formation adopts and soaks glaze technology.With what soak that glaze technology matches is to burn till technology in advance, has only the resistor disc base substrate of pre-burning, just can soak glaze.So just brought a problem, that soaks glaze technology exactly compares with other technologies, have more a procedure.This procedure needs the such equipment of continuous tunnel furnace to support, and has increased energy consumption.So the resistive formation coating process of not pre-burning---crawling technology has just been arisen at the historic moment.
Crawling technology is because with short production cycle, and advantages such as working efficiency height are often adopted by manufacturer.But traditional resistive formation prescription is directly used in crawling technology, because not pre-burning of resistor disc, the resistor disc blank density behind the binder removal is less, the easier infiltration of coating, Li +Depth of penetration want dark than the bad body of pre-burning, thereby cause the flow area of resistor disc to reduce, residual voltage ratio increases, and influences the over-all properties of resistor disc.
Summary of the invention
One object of the present invention is to provide a kind of crawling coating that is used for non-linear resistor side high-resistance layer, and it can improve the qualification rate of non-linear resistor, reduces residual voltage ratio.
Another object of the present invention is to provide the above-mentioned preparation method who is used for the crawling coating of non-linear resistor side high-resistance layer.
To achieve these goals, the present invention is achieved by the following technical solutions:
(1) a kind of crawling coating that is used for non-linear resistor side high-resistance layer comprises tackiness agent and batching, and described batching comprises following components in part by weight: 28~30% ZnO, 22~24% Bi 2O 3, 21~23% Sb 2O 3, 21~23% SiO 2, 0.1~0.2% Li 2CO 3It is characterized in that described batching also comprises 1~5% ZnCl 2Described tackiness agent is 1~1.5 times of the batching gross weight.
The preferred 2.8%PVA solution of described tackiness agent.
(2) be used for the preparation method of the crawling coating of non-linear resistor side high-resistance layer, it is characterized in that, take by weighing each component according to above-mentioned weight ratio, as batching, with ZnO, Bi 2O 3, Sb 2O 3, SiO 2, Li 2CO 3Mix back dry grinding 12 hours,, add ZnCl then 800~850 ℃ of calcinings 1.5~2 hours 2Grind and be powder; At last, take by weighing 1~1.5 times tackiness agent of weight, above-mentioned powder is mixed with tackiness agent, stirs evenly and get final product for the batching gross weight.
In traditional resistive formation, mainly by Li 2CO 3Improve resistivity.Because Li +Ratio of ionic radii Zn 2+Radius little, can enter in the ZnO crystal grain, and ZnO is the n N-type semiconductorN Li +Introducing, reduced the concentration of current carrier, thereby improved the resistivity of ZnO.And the resistivity of ZnO is the important factor that influences residual voltage ratio.Work as Li +Introducing exceed certain limit, will make the residual voltage ratio variation of resistor disc.The present invention reduces Li +Concentration, and introduce Cl -, do not enter ZnO crystal grain, just, increase number of grain boundaries, thereby improve the side resistivity of resistor disc by the sintering of prevention zinc oxide, because the not increase of the resistivity of ZnO, thereby can not increase residual voltage ratio.
Embodiment
Embodiment 1
According to weight percent be: 30%, 24%, 22.8%, 23%, 0.2%, take by weighing ZnO, Bi respectively 2O 3, Sb 2O 3, SiO 2, Li 2CO 3As batching, standby;
With ZnO, Bi 2O 3, Sb 2O 3, SiO 2, Li 2CO 3Mix back dry grinding 12 hours, 800 ℃ of calcinings 2 hours, standby as the resistive formation powder.
Make sample: see sample table 1.
Take by weighing 50g resistive formation powder, with 50g concentration be that 2.8% PVA solution mixes, sample is numbered 0 as a comparison;
Take by weighing 49.5g resistive formation powder, 0.5gZnCl 2, with 50g concentration be that 2.8% PVA solution mixes, be numbered 1;
Take by weighing 49g resistive formation powder, 1gZnCl 2, with 50g concentration be that 2.8% PVA solution mixes, be numbered 2;
Take by weighing 47.5g resistive formation powder, 2.5gZnCl 2, with 50g concentration be that 2.8% PVA solution mixes, be numbered 3.
Sample table 1
Numbering Resistive formation powder (g) ZnCl 2(g) 2.8%PVA solution (g)
1 49.5 0.5 50
2 49 1 50
3 47.5 2.5 50
Above sample is even with grinding the alms bowl mill respectively, and manual brushing is in the side of the D8.5 valve block of arranging glue then, and brushes twice, is numbered according to sample.Carry out then follow-up burning till, operation such as thermal treatment, jet electrode, finish the making of resistor disc.
The resistor disc that completes carries out U respectively 1mA, U 10kAAnd the square wave screening, the result is shown in electrical property table 1.
Electrical property table 1
Numbering U 10kA(KV) U 1mA(KV) k Square wave sifts out rate %
0 7.9 4.77 1.66 10
1 7.6 4.65 1.63 0
2 7.8 4.86 1.60 0
3 7.5 4.75 1.58 0
Annotate: the data in the table are statistical average value.
U in the table 10kABe the residual voltage at resistor disc two ends during by the 10kA electric current, U 1mABe the residual voltage at resistor disc two ends when flowing through the 1mA electric current, k=U 10kA/ U 1mA, being called protection ratio (being residual voltage ratio), the k value is more little, and protection ratio is good more.The square wave screening is to reject defective resistor disc in the resistor disc, and the rate of sifting out is low more, and product percent of pass is just high more.Under the normal circumstances, the defect resistance sheet of in the square wave screening, rejecting, 80% defective concentrates in edge, side (inboard and the outside) 0~1.5mm scope.Resistive formation can also change current path by improving the resistivity in the resistor-piece side 1mm scope except improving lateral insulation strength, comes " remedying " defective, reduces square wave and sifts out rate.
From electrical property table 1 data as can be seen, along with the prescription in ZnCl 2Introducing, the residual voltage pressure ratio of resistor disc is better than original summary, it is low that square wave sifts out rate, the product percent of pass height.In addition, great current impact test is the result show, sample of the present invention is the tolerance by 100kA all.
Embodiment 2
According to weight percent be: 30%, 24%, 22.8%, 23%, 0.2%, take by weighing ZnO, Bi respectively 2O 3, Sb 2O 3, Si0 2, Li 2CO 3As batching, standby;
With ZnO, Bi 2O 3, Sb 2O 3, SiO 2, Li 2CO 3Mix back dry grinding 12 hours, 850 ℃ of calcinings 1.5 hours, standby as the resistive formation powder.
Make sample: see sample table 2.
Take by weighing 50g resistive formation powder, with 75g concentration be that 2.8% PVA solution mixes, sample is numbered 0 as a comparison;
Take by weighing 49.5g resistive formation powder, 0.5gZnCl 2, with 75g concentration be that 2.8% PVA solution mixes, be numbered 1;
Take by weighing 49g resistive formation powder, 1gZnCl 2, with 75 concentration be that 2.8% PVA solution mixes, be numbered 2;
Take by weighing 47.5g resistive formation powder, 2.5gZnCl 2, with 75g concentration be that 2.8% PVA solution mixes, be numbered 3.
Sample table 2
Numbering Resistive formation powder (g) ZnCl 2(g) 2.8%PVA solution (g)
0 50 0 75
1 49.5 0.5 75
2 49 1 75
3 47.5 2.5 75
Above sample is even with grinding the alms bowl mill respectively, and manual brushing is in the side of the D8.5 valve block of arranging glue then, and brushes twice, is numbered according to sample.Carry out then follow-up burning till, operation such as thermal treatment, jet electrode, finish the making of resistor disc.
The resistor disc that completes carries out U respectively 1mA, U 10kAAnd the square wave screening, the result is shown in electrical property table 2.
Electrical property table 2
Numbering U 10kA(KV) U 1mA(KV) k Square wave sifts out rate %
0 7.9 4.78 1.66 9.8
1 7.6 4.67 1.63 0
2 7.78 4.80 1.62 0
3 7.5 4.70 1.60 0
Annotate: the data in the table are statistical average value.
From electrical property table 2 data as can be seen, along with the prescription in ZnCl 2Introducing, the residual voltage ratio of resistor disc is better than original summary, it is low that square wave sifts out rate, the product percent of pass height.In addition, great current impact test is the result show, sample of the present invention is the tolerance by 100kA all.

Claims (3)

1. a crawling coating that is used for non-linear resistor side high-resistance layer comprises tackiness agent and batching, and described batching comprises following components in part by weight: 28~30% ZnO, 22~24% Bi 2O 3, 21~23% Sb 2O 3, 21~23% SiO 2, 0.1~0.2% Li 2CO 3It is characterized in that described batching also comprises 1~5% ZnCl 2Described tackiness agent is 1~1.5 times of the batching gross weight.
2. a kind of crawling coating that is used for non-linear resistor side high-resistance layer according to claim 1 is characterized in that, the preferred 2.8%PVA solution of described tackiness agent.
3. a preparation method who is used for the crawling coating of non-linear resistor side high-resistance layer is characterized in that, takes by weighing each component according to the described weight ratio of claim 1, as batching, with ZnO, Bi 2O 3, Sb 2O 3, SiO 2, Li 2CO 3Mix back dry grinding 12 hours,, add ZnCl then 800~850 ℃ of calcinings 1.5~2 hours 2Grind and be powder; At last, take by weighing 1~1.5 times tackiness agent of weight, above-mentioned powder is mixed with tackiness agent, stirs evenly and get final product for the batching gross weight.
CN2008101509672A 2008-09-12 2008-09-12 Glaze rolling paint for resistive layer for side surface of nonlinear resistance slice and method of manufacturing the same Active CN101367614B (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101714439B (en) * 2009-12-22 2012-06-13 中国科学院宁波材料技术与工程研究所 Zinc oxide resistance piece and preparation method thereof
CN112694348A (en) * 2020-12-16 2021-04-23 嘉兴瑞嘉电气股份有限公司 Preparation method of inorganic insulating coating based on cooperative matching of inorganic high-resistance layer and low-temperature glass glaze
CN113045203A (en) * 2021-01-11 2021-06-29 四川大学 Formula of side glaze of lightning arrester resistor

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5366935A (en) * 1994-03-14 1994-11-22 Hubbell Incorporated Passivating coating for metal oxide varistors

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101714439B (en) * 2009-12-22 2012-06-13 中国科学院宁波材料技术与工程研究所 Zinc oxide resistance piece and preparation method thereof
CN112694348A (en) * 2020-12-16 2021-04-23 嘉兴瑞嘉电气股份有限公司 Preparation method of inorganic insulating coating based on cooperative matching of inorganic high-resistance layer and low-temperature glass glaze
CN113045203A (en) * 2021-01-11 2021-06-29 四川大学 Formula of side glaze of lightning arrester resistor

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Assignee: XI'AN XD ARRESTER CO., LTD.

Assignor: China XD Electronic Corporation

Contract record no.: 2012610000075

Denomination of invention: Glaze rolling paint for resistive layer for side surface of nonlinear resistance slice and method of manufacturing the same

Granted publication date: 20110504

License type: Exclusive License

Open date: 20090218

Record date: 20120530