CN101344729B - Method for measuring rotation degree of mask bench relative to workpiece bench - Google Patents

Method for measuring rotation degree of mask bench relative to workpiece bench Download PDF

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CN101344729B
CN101344729B CN2008100412631A CN200810041263A CN101344729B CN 101344729 B CN101344729 B CN 101344729B CN 2008100412631 A CN2008100412631 A CN 2008100412631A CN 200810041263 A CN200810041263 A CN 200810041263A CN 101344729 B CN101344729 B CN 101344729B
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mask
work stage
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swing
mask platform
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CN101344729A (en
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李煜芝
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Shanghai Micro Electronics Equipment Co Ltd
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Shanghai Micro Electronics Equipment Co Ltd
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Abstract

A method used for measuring the rotation degree of a mask table relative to a workpiece table mainly adopts an energy sensor of a lithography machine to carry out stepping search detection respectively for two groups of mark patterns on the mask. The rotation degree of the mask relative to the workpiece table and the rotation degree of the mask relative to the mask table all can be respectively obtained by computation according to the brightness-dark conversion positions of each group of image obtained through search, and finally the rotation degree of the mask table relative to the workpiece table can be obtained through computation. The invention needs no exposure operation and alignment measurement and overcomes the limit of the prior art that an alignment system is required to obtain a wider search range when the rotation degree of the mask table relative to the workpiece table is bigger.

Description

Measure the method for mask platform with respect to the work stage swing
Technical field
The present invention relates in a kind of microelectronic component manufacture process the measuring method of mask platform with respect to the worktable swing.
Background technology
When the litho machine complete machine is integrated finish after, mask platform has certain anglec of rotation with respect to work stage, when carrying out scan exposure, will make image have distortion distortion.U.S. Pat 6008880 has disclosed a kind of can the measurement and the exposure device and the method for correcting distortion choppy, utilize this apparatus and method, the distortion deformation pattern is carried out can calculating the rotation angle value that exists between mask platform and the work stage to locating tab assembly.But when mask platform is big with respect to the anglec of rotation of work stage, may detect alignment mark for guaranteeing alignment system, when using above method, alignment system need have bigger hunting zone.
Summary of the invention
In view of this, how to overcome in the prior art when mask platform is big with respect to the anglec of rotation of work stage, must make alignment system have the bigger defective of searching plain scope, it is technical matters to be solved by this invention, for this reason, the object of the present invention is to provide a kind of method of measuring mask platform with respect to the work stage swing.
Technical scheme of the present invention is as follows:
According to a kind of method of measuring mask platform with respect to the work stage swing of the present invention, the litho machine system of use comprises: luminous source system, projection objective imaging system, mask platform, work stage and the energy sensor that is positioned on the work stage; Described mask platform supports and permanent mask, described work head supports and fixing silicon chip; Have the marker graphic A and the figure A ' that arrange along X-direction on the described mask, and the marker graphic B and the figure B ' that arrange along Y direction, described method comprises the steps:
1) by the litho machine system, make marker graphic A and figure A ' projection imaging on the mask, carry out luminosity sampling n time in the ideal image position of marker graphic A and figure A ' respectively by energy sensor, the average intensity sampled value as maximum with reference to light intensity, energy sensor begins Y from the ideal image position of marker graphic A and figure A ' respectively and surveys to step-searching, when energy sensor detects when transforming the target light intensity intensity of position corresponding to light and shade, write down current work stage position (S A x, S A y) and (S A ' x, S A ' y), the work stage position calculation that is obtained by two places record obtains the swing R of mask with respect to work stage R_RS
2) the travelling workpiece platform makes energy sensor be positioned at zero-bit, energy sensor carries out n sampling, the average intensity sampled value as maximum with reference to light intensity, mask platform along Y to moving, make marker graphic B and figure B ' projection imaging on the mask respectively, energy sensor begins X from the ideal image position zero-bit of marker graphic B and figure B ' respectively to be surveyed to step-searching, when energy sensor detects when transforming the target light intensity intensity of position corresponding to light and shade, writes down current work stage position (S B x, S B y) and (S B ' x, S B ' y), the work stage position calculation that is obtained by two places record obtains the swing R of mask with respect to mask platform R_RS
3) calculate mask platform swing with respect to work stage with respect to the swing of work stage and mask with respect to the swing of mask platform by mask.
Further, marker graphic A on the described mask and the center of figure A ' lay respectively on the mask X-axis ± a position, the center of marker graphic B and figure B ' lays respectively on the mask Y-axis ± the b position, wherein, the value of a is greater than 0, less than slit open mode maximum length value in the illuminator; Marker graphic A on the described mask, figure A ', figure B and figure B ' are shaped as rectangle, and the length of the width of figure A and figure A ' and figure B and figure B ' is all less than slit open mode breadth extreme value in the illuminator.
Further, the image space of described ideal image position for directly calculating by mark graph position on the mask; Described n sampling, n is the integer more than or equal to 1; Described X is to surveying to step-searching with Y, and its step-searching detection direction can be that the forward step-searching is surveyed, and also can be that oppositely step-searching is surveyed, but X to or Y to twice step-searching detection direction must be consistent.
Further, the described target light intensity intensitometer operator expression formula that transforms the position corresponding to light and shade is: target light intensity=(maximum with reference to light intensity-minimum with reference to light intensity) * I, and wherein, I represent target light intensity and maximum, the minimum ratio with reference to the difference of light intensity; Described step-searching is surveyed, and for surveying according to certain step distance up to detecting the target light intensity, also can be binary search lookup method or other method for fast searching.Particularly, in the described target light intensity intensitometer operator expression formula, described minimum reference light value of taking by force is 0; Described I, its span is [0,1], and I is provided with different numerical value according to different light illumination modes.
The described work stage position calculation that is obtained by two places records obtains mask: R R _ WS ≈ S A ′ y - S A y S A ′ x - S A x [ rad ] ; The described work stage position calculation that is obtained by two places record obtains the swing of mask with respect to mask platform, and computing formula is: R R _ RS ≈ S B ′ x - S B x M ( b - ( - b ) ) [ rad ] ; Describedly calculate mask platform swing with respect to work stage with respect to the swing of work stage and mask with respect to the swing of mask platform by mask, computing formula is: R RD_WS=R R_WS-R R_RS
Because the present invention does not need to carry out exposing operation and to locating tab assembly, only use the energy sensor that is used to survey light intensity intensity in the litho machine of the present invention system to measure, so when mask platform is big with respect to the work stage anglec of rotation, the alignment system hunting zone is not required.
Description of drawings
Fig. 1 is used projection mask aligner structural representation among the present invention;
Fig. 2 is for used marker graphic shape among the present invention and be positioned at position view on the mask;
Number in the figure: 1, lighting source; 2, mask; 3, mask platform; 4, projection objective; 5, energy sensor; 6, work stage.
Embodiment
Provide a preferred embodiment of the present invention according to Fig. 1 and Fig. 2 below, and described in detail, so that those skilled in the art is easier to understand the present invention rather than is used for limiting scope of the present invention.
The present invention is by measuring mask with respect to the swing of mask platform and the mask swing with respect to work stage, and then obtains the swing of mask platform with respect to work stage.
The present invention mainly utilizes energy sensor in the litho machine system, respectively two group echo figures on the mask being carried out step-searching surveys, by the light and shade transition position that each block graphics search is obtained, can calculate respectively mask with respect to the swing of work stage and mask with respect to the swing of mask platform, calculate the swing of mask platform at last with respect to work stage.
Figure 1 shows that the present invention is used in the litho machine system of scanning survey, comprise: illuminator 1, carry the mask platform 3 of mask 2, be used for the projection objective 4 and the energy sensor 5 that is positioned on the work stage 6 of mask imaging, energy sensor 5 is used for the detection to light intensity intensity.
Slit is opened maximum rating in the illuminator of using in the specific embodiment of the invention 1: 22mm*8mm.
Light illumination mode is the traditional lighting pattern in the illuminator of using in the specific embodiment of the invention 1.
Use two group echo figures on the mask, figure A, A ', figure B, B ' in the specific embodiment of the invention.4 graphics shapes and be positioned on the mask the position as shown in Figure 2, figure A and figure A ' are the rectangle mark of 8mm*6mm size, figure B and figure B ' are 6mm*8mm rectangle mark.Figure A and figure A ' lay respectively on the mask X-axis ± a position, and figure B and figure B ' lay respectively on the mask Y-axis ± the b position.
At first measure the swing of mask with respect to work stage:
Mobile mask platform is positioned at zero-bit;
The travelling workpiece platform makes energy sensor be positioned at figure A imaging center position, and energy sensor carries out n sampling and obtains current position average sample light intensity value, and this value is set at maximum with reference to light intensity maxE, and setting minimum is 0 with reference to light intensity; Work stage is carried out Y to the forward stepping from the current position, the stepping range size is 8mm, in work stage stepping scope, utilize the binary search lookup method, energy sensor is by surveying light intensity intensity, search obtains light and shade dislocation, promptly searches to obtain the position of light intensity intensity for (maxE-minE) * 0.5 record light and shade dislocation place work stage position (S A x, S A y);
Then the travelling workpiece platform makes energy sensor be positioned at figure A ' imaging center position, and energy sensor carries out n sampling and obtains current position average sample light intensity value, and this value is set at maximum with reference to light intensity maxE, and setting minimum is 0 with reference to light intensity; Work stage is carried out Y to the forward stepping from the current position, the stepping range size is 8mm, in work stage stepping scope, utilize the binary search lookup method, energy sensor is by surveying light intensity intensity, search obtains light and shade dislocation, promptly searches to obtain the position of light intensity intensity for (maxE-minE) * 0.5 record light and shade dislocation place work stage position (S A ' x, S A ' y).
Can calculate the swing R of mask thus with respect to work stage R_WS:
R R _ WS ≈ S A ′ y - S A y S A ′ x - S A x [ rad ] ;
Measure the swing of mask then with respect to mask platform:
The travelling workpiece platform makes energy sensor be positioned at zero-bit, and energy sensor carries out n sampling and obtains current position average sample light intensity value, and this value is set at maximum with reference to light intensity maxE, and setting minimum is 0 with reference to light intensity;
Mask platform moves-the b distance along the Y direction, figure B on the mask is placed in the exposure field, work stage is carried out X to the forward stepping from current location (energy sensor is in zero-bit), the stepping range size is 8mm, in work stage stepping scope, utilizes the binary search lookup method, energy sensor is by surveying light intensity intensity, search obtains light and shade dislocation, promptly searches to obtain the position of light intensity intensity for (maxE-minE) * 0.5 record light and shade dislocation place work stage position (S B x, S B y);
Then, mask platform moves the 2b distance along the Y direction again, figure B ' on the mask is placed in the exposure field, and work stage (beginning in zero-bit from energy sensor) is carried out X to the forward stepping, and the stepping range size is 8mm, in work stage stepping scope, utilize the binary search lookup method, energy sensor obtains light and shade dislocation by surveying light intensity intensity, searching, promptly search and obtain the position of light intensity intensity, record light and shade dislocation place work stage position (S for (maxE-minE) * 0.5 B ' x, S B ' y).
Can calculate the swing R of mask thus with respect to mask platform RR_RS:
R R _ RS ≈ S B ′ x - S B x M ( b - ( - b ) ) [ rad ] ;
Wherein M is the scaling 1/4 of projection objective 4 in the litho machine system among the present invention.Mask platform is with respect to the swing R of work stage RS_WSFor: R RS_WS=R R_WS-R R_RS

Claims (14)

1. method of measuring mask platform with respect to the work stage swing, the litho machine system of use comprises: luminous source system, projection objective imaging system, mask platform, work stage and be positioned at energy sensor on the work stage; Described mask platform supports and permanent mask, described work head supports and fixing silicon chip; Have the marker graphic A and the figure A ' that arrange along X-direction on the described mask, and, it is characterized in that described method comprises the steps: along marker graphic B and figure B ' that Y direction is arranged
1) by the litho machine system, make marker graphic A and figure A ' projection imaging on the mask, carry out luminosity sampling n time in the ideal image position of marker graphic A and figure A ' respectively by energy sensor, the average intensity sampled value as maximum with reference to light intensity, energy sensor begins Y from the ideal image position of marker graphic A and figure A ' respectively and surveys to step-searching, when energy sensor detects when transforming the target light intensity intensity of position corresponding to light and shade, write down current work stage position (S A x, S A y) and (S A ' x, S A ' y), the work stage position calculation that is obtained by two places record obtains the swing R of mask with respect to work stage R_WS
2) the travelling workpiece platform makes energy sensor be positioned at zero-bit, energy sensor carries out n sampling, the average intensity sampled value as maximum with reference to light intensity, mask platform along Y to moving, make marker graphic B and figure B ' projection imaging on the mask respectively, energy sensor begins X from the ideal image position zero-bit of marker graphic B and figure B ' respectively to be surveyed to step-searching, when energy sensor detects when transforming the target light intensity intensity of position corresponding to light and shade, writes down current work stage position (S B x, S B y) and (S B ' x, S B ' y), the work stage position calculation that is obtained by two places record obtains the swing R of mask with respect to mask platform R_RS
3) calculate mask platform swing with respect to work stage with respect to the swing of work stage and mask with respect to the swing of mask platform by mask.
2. measurement mask platform as claimed in claim 1 is with respect to the method for work stage swing, it is characterized in that, marker graphic A on the described mask and the center of figure A ' lay respectively on the mask X-axis ± a position, the center of marker graphic B and figure B ' lays respectively on the mask Y-axis ± the b position, wherein, the value of a is greater than 0, less than slit open mode maximum length value in the illuminator.
3. measurement mask platform as claimed in claim 1 is with respect to the method for work stage swing, it is characterized in that, marker graphic A on the described mask, figure A ', figure B and figure B ' are shaped as rectangle, and the length of the width of figure A and figure A ' and figure B and figure B ' is all less than slit open mode breadth extreme value in the illuminator.
4. measurement mask platform as claimed in claim 1 is characterized in that with respect to the method for work stage swing, the image space of described ideal image position for directly being calculated by mark graph position on the mask.
5. measurement mask platform as claimed in claim 1 is characterized in that with respect to the method for work stage swing, described n sampling, and n is the integer more than or equal to 1.
6. measurement mask platform as claimed in claim 1 is with respect to the method for work stage swing, it is characterized in that, described X is to surveying to step-searching with Y, its step-searching detection direction is surveyed for the forward step-searching, perhaps be that reverse step-searching is surveyed, but X to or Y to twice step-searching detection direction must be consistent.
7. measurement mask platform as claimed in claim 1 is with respect to the method for work stage swing, it is characterized in that, the described target light intensity intensitometer operator expression formula that transforms the position corresponding to light and shade is: target light intensity=(maximum with reference to light intensity-minimum with reference to light intensity) * I, wherein, I represents the ratio of target light intensity and maximum, minimum difference with reference to light intensity.
8. measurement mask platform as claimed in claim 7 is characterized in that with respect to the method for work stage swing in the described target light intensity intensitometer operator expression formula, described minimum reference light value of taking by force is 0.
9. measurement mask platform as claimed in claim 7 is characterized in that with respect to the method for work stage swing, in the described target light intensity intensitometer operator expression formula, and described I, its span is [0,1], and I is provided with different numerical value according to different light illumination modes.
10. measurement mask platform as claimed in claim 1 is characterized in that with respect to the method for work stage swing described step-searching is surveyed, for surveying according to certain step distance, up to detecting the target light intensity.
11. measurement mask platform as claimed in claim 1 is characterized in that with respect to the method for work stage swing described step-searching is surveyed, and is the binary search lookup method.
12. measurement mask platform as claimed in claim 1 is characterized in that with respect to the method for work stage swing the described work stage position calculation that is obtained by two places record obtains the swing of mask with respect to work stage, computing formula is as follows:
Figure FA20184227200810041263101C00021
13. measurement mask platform as claimed in claim 2 is characterized in that with respect to the method for work stage swing the described work stage position calculation that is obtained by two places record obtains the swing of mask with respect to mask platform, computing formula is as follows:
Figure FA20184227200810041263101C00031
Wherein M is the scaling of projection objective in the litho machine system.
14. measurement mask platform as claimed in claim 1 is with respect to the method for work stage swing, it is characterized in that, describedly calculate mask platform swing with respect to work stage with respect to the swing of work stage and mask with respect to the swing of mask platform by mask, computing formula is R RS_WS=R R_WS-R R_RS
CN2008100412631A 2008-07-31 2008-07-31 Method for measuring rotation degree of mask bench relative to workpiece bench Active CN101344729B (en)

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Publication number Priority date Publication date Assignee Title
CN102540783B (en) * 2010-12-31 2014-11-12 上海微电子装备有限公司 Automatic calibration device and method for abbe cosine error of interferometer
CN102589686B (en) * 2011-01-07 2014-04-16 上海微电子装备有限公司 Calibration method of energy sensors
CN103454862B (en) * 2012-06-05 2015-11-18 上海微电子装备有限公司 For the workpiece table position error compensation method of lithographic equipment
CN103926798B (en) * 2013-01-11 2016-06-01 上海微电子装备有限公司 A kind of method eliminated guide surface shape and alignment deviation is affected
CN104678720B (en) * 2013-12-03 2017-01-04 上海微电子装备有限公司 Utilize the method that mask alignment system carries out work stage datum plate rotated detection
CN105159037B (en) * 2015-09-30 2017-06-30 合肥芯碁微电子装备有限公司 A kind of angle calibration method of direct-write type lithography machine pattern generator
CN108941942B (en) * 2018-09-06 2023-09-22 广西中科蓝谷半导体科技有限公司 Use method of small workpiece fixture of photoetching machine

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