CN101320216A - Reshaping structure of micro-photoetching illumination iris - Google Patents
Reshaping structure of micro-photoetching illumination iris Download PDFInfo
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- CN101320216A CN101320216A CNA2008100391508A CN200810039150A CN101320216A CN 101320216 A CN101320216 A CN 101320216A CN A2008100391508 A CNA2008100391508 A CN A2008100391508A CN 200810039150 A CN200810039150 A CN 200810039150A CN 101320216 A CN101320216 A CN 101320216A
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Abstract
The invention provides a shaping structure for a microlithography lighting pupil, which comprises a diffractive optical element, a continuous magnification lens group and a pupil regulator which is connected with the continuous magnification lens group and consists of two convex conical microscopes; the diffractive optical element, the continuous magnification lens group and the pupil regulator are orderly and optically connected. The invention has the advantages of easy processing and convenient mechanical clamping; rubbing the optical filming layer of the optical coating film can be avoided in the course of operation.
Description
Technical field
The present invention relates to a kind of micro-lithography parts of making semiconductor devices, specifically, is about a kind of continuous adjustable illumination iris reshaping structure.
Background technology
Photoetching process (also claiming the micro-lithography method) is used for producing the semiconductor devices.Photoetching process is used electromagnetic radiation, as ultraviolet (UV), dark UV or visible light, produces meticulous figure in semiconductor device design.Many kinds of semiconductor devices, as diode, triode and integrated circuit, all the available light lithography is made.
Silicon chip and silicon chip alignment tool that the photolithographic exposure system generally includes illuminator, contains the mask of circuit diagram, optical projection system and be used to apply photoresist.Illuminator irradiation mask circuit diagram is earlier the picture of mask circuit diagram field of illumination to be projected on the described silicon chip by optical projection system.Progress along with the semiconductor devices manufacturing technology, it is more and more difficult that size reduction becomes, in order further to reduce the figure live width, current advanced photoetching process requires to use the off-axis illumination technology, comprise ring illumination, bipolar illumination, quadrupole illuminating etc., this just requires illuminator to have adjustable pupil.The pupil shape that is complementary by choose reasonable and exposing patterns can improve process window to greatest extent.
In lithography illuminating system, a kind of typical pupil generation device of Nikon company invention is (patent publication No. CN1407408) as shown in Figure 1, it inserts difform baffle plate 6 at the illumination iris face, is used for blocking out difform pupil, thereby produces required light illumination mode.The shortcoming of this method is that light illumination mode can not continuously change, shutter heaviness particularly, and block and can cause bigger optical energy loss, reduced the efficient of optical system.
A kind of improved mode (see figure 3) of ASML company invention is to adopt diffraction plate 101 to add the illumination iris (patent publication No. CN1474235) that axicon 104 that variable focus lens package 102 adds a pair of concavo-convex complementation produces continuous variable.This method can not lost luminous energy, efficient height when changing the illumination iris shape.After but shortcoming is to have adopted diffraction optical element, be difficult to usually can produce 0 very high order diffraction spot of brightness at the center of pupil with avoiding, influence the homogeneity of pupil, destroy the rete of element simultaneously easily.
For this reason, it is the patent of CN101006556 that Nikon company has proposed patent publication No., has added little light barrier and block 0 order diffraction spot on the awl point of a pair of concavo-convex complementary axicon.This is a kind of very effective solution.The principle that a pair of concavo-convex complementary axicon changes illumination iris is: when the circular pupils of needs (traditional lighting), concavo-convex complementary axicon closes up (sees Fig. 4 a), when needs annular pupils (ring illumination), concavo-convex complementary axicon draws back (seeing Fig. 4 b).Yet like this, will bring a problem, when needing circular pupil, a pair of concavo-convex complementary axicon touches together easily, and is unfavorable to the optical film on surface.
Summary of the invention
In sum, how the continuous adjustable illumination iris that is produced is regulated, made it to form easily various required pupil shape, and under any circumstance the optical adjustment element can not contact, these are technical matters to be solved by this invention.For this reason; the object of the present invention is to provide a kind of improved micro-photoetching illumination iris reshaping structure, it can avoid potential contact friction danger, the optical coating of protecting component effectively; improve the reliability of illuminator, also possess the processing of being easy to, mechanical grip advantage easily simultaneously.
Technical scheme of the present invention is as follows:
Reshaping structure according to a kind of micro-photoetching illumination iris of the present invention, comprise the diffraction optical element, the continuous magnification lens group that link with optics successively, be characterized in, also comprise the pupil regulator of forming by the dome axicon lens by two, connect described continuous magnification lens group thereafter.
Further, described two dome axicon lens have similar physical dimension; The bus of described two dome axicon lens has identical slope, and perhaps the bus slope of the back dome axicon lens in two dome axicon lens is lower than the bus slope of previous dome axicon lens slightly, like this, outgoing beam is more collimated; Described two dome axicon lens, its incident beam is dispersed then through earlier inside deviation behind first dome axicon lens, again by the outgoing of second dome axicon lens collimation; Described two dome axicon lens when producing circular pupil cross section, need not can keep certain distance near contact; Described diffraction optical element is used to produce specific light illumination mode (circular, annular, bipolar, four utmost points etc.); Described continuous magnification lens group is used to change the size in illuminator pupil cross section; The pupil regulator that described two dome axicon lens are formed is used to regulate the size of pupil cross section upper inner ring.
Advantage of the present invention is as follows:
1, the present invention has adopted a kind of new device to produce continuous adjustable illumination iris, is characterized in utilizing variable focus lens package to add two dome axicon lens and realizes the pupil adjusting, can form various required pupil shape easily.
2, the present invention adopts two dome axicon lens, avoided the bigger recessed conscope of manufacture difficulty, those skilled in the art know, the recessed conscope difficulty of the recessed conscope of high precision in processing and manufacturing that particularly the bus slope is bigger is bigger, and the dome axicon lens processing on than being easier to realize high precision.
3, two dome axicon lens of the present invention remain certain distance, under any circumstance all need not contact, have avoided potential friction danger, have protected the optical coating of element effectively, have improved the reliability of illuminator.In addition, need not to lean on very closely just because of two dome axicon lens, so the design of eyeglass clamping device is simplified.
4, of the present invention simple in structure, when solving reliability, do not increase the complicacy of any system, system's implementation is flexible.
Description of drawings
Fig. 1 is that Nikon house journal publication number is the illuminator synoptic diagram of CN1407408, and it blocks the pupil cross section that difform shutter blocks out required form on the rotating disk 6 by pupil.
Fig. 2 is the synoptic diagram that the disclosed pupil of Nikon company blocks runner, and this runner is positioned at the pupil place of Fig. 1 illuminator, and a lot of difform passing through plate are arranged above.Obtain specific light illumination mode, only need to change pairing shadow shield over to light path and get final product.
Fig. 3 is that the patent publication No. of ASML company is the illuminator synoptic diagram of CN1474235, and pupil Shaping Module has wherein adopted 101 diffraction plates (DOE1) to add the axicon 104 that variable focus lens package 102 adds a pair of concavo-convex complementation and realized.
Fig. 4 a and Fig. 4 b are that the publication number of Nikon company is the disclosed concavo-convex complementary axicon synoptic diagram of patent of CN101006556, different with CN1474235 is, it blocks the 0 order diffraction light that diffraction plate produces at the shutter A3 that the awl point of axicon A2 has added small size.
Fig. 5 a and Fig. 5 b are embodiment of the present invention synoptic diagram, adopt two dome axicon lens B3, B4 to change beam cross section.
Fig. 6 is a specific embodiment synoptic diagram of the present invention, and diffraction plate B1 and varifocal mirror group B2 use with two dome axicon lens B3, B4, can produce the required pupil of off-axis illumination of continuous variable.
Embodiment
Embodiment 1
Shown in Fig. 5 a and Fig. 5 b, specific embodiments of the invention are utilized two dome tapered lenss, can produce illumination cross section circular and annular.Its benefit is that when producing the circular illumination cross section, two axicon lens B3 need not to contact with B4, have protected the superficial film of element.Above-mentioned two conical lens mentioning have similar physical dimension, and all are the dome axicon lens.The bus of first conical lens B3 and second conical lens B4 can have identical slope, also can be slightly variant.In fact, emulation and experiment be proof all, if the bus slope of second conical lens B4 a little less than the bus slope of first conical lens B3, can make outgoing beam more collimate.
Fig. 5 a is the synoptic diagram that produces circular illumination pupil (traditional lighting) with two dome tapered lenss, incident light is the very little directional light of the field angle of outgoing from previous stage module (diffraction plate B1 and varifocal mirror group B2) (the previous stage module adopts the variable focus lens package of big focal length usually), produces the circular illumination pupil by two dome tapered lens B3, B4 separated by a distance.
Fig. 5 b is the synoptic diagram that produces ring illumination pupil (ring illumination) with two dome tapered lenss, incident light is the very little directional light of the field angle of outgoing from previous stage module B1, B2 (usually the previous stage module adopts the variable focus lens package of big focal length), as two dome tapered lens B3, can produce annular pupil when B4 draws back certain distance.
Fig. 6 is an alternative embodiment of the invention, and it is an illumination iris apparatus for shaping, and it utilizes diffraction plate B1, continuous magnification lens group B2, two male conical lens B3 and B4 to produce the pupil of the various required forms of illumination.
Three movable lens are wherein arranged in the variable focus lens package--202,203 and 204 in order to realize zoom, male conical lens B4 can move along optical axis in addition, by moving of this four eyeglasses altogether, just can produce illumination iris shape arbitrarily: diffraction optical element is used to produce specific light illumination mode (circular, annular, bipolar, four utmost points etc.), continuous magnification lens group B2 is used to change the size in illuminator pupil cross section, and the pupil regulator of two male conical lens B3, B4 compositions is used to regulate the size of pupil cross section upper inner ring.
In the present embodiment; though variable focus lens package has adopted three movable lens here; but those skilled in the art should know; the selection of movable lens can be a slice, two or more according to actual needs in the variable focus lens package; the eyeglass number that variable focus lens package is total and wherein the quantity of movable lens be not feature of the present invention, the essence of the present invention protection is that variable focus lens package adds the unitized construction that two dome tapered lenss produce variable pupils.
Claims (10)
1, a kind of reshaping structure of micro-photoetching illumination iris comprises successively the diffraction optical element, the continuous magnification lens group that link with optics, it is characterized in that: the pupil regulator of being made up of two dome axicon lens that is connected to described continuous magnification lens group after also comprising.
2, the reshaping structure of micro-photoetching illumination iris according to claim 1 is characterized in that: described two dome axicon lens have similar physical dimension.
3, the reshaping structure of micro-photoetching illumination iris according to claim 1 is characterized in that: the bus of described two dome axicon lens has identical slope.
4, the reshaping structure of micro-photoetching illumination iris according to claim 1 is characterized in that: described two dome axicon lens, the bus slope of a dome axicon lens is lower than the bus slope of previous dome axicon lens slightly thereafter.
5, the reshaping structure of micro-photoetching illumination iris according to claim 1 is characterized in that: earlier inside deviation behind first dome axicon lens in described two the dome axicon lens of incident beam process, disperse then, again by the outgoing of second dome axicon lens collimation.
6, the reshaping structure of micro-photoetching illumination iris according to claim 1 is characterized in that: when producing circular pupil cross section, described two dome axicon lens remain certain distance.
7, the reshaping structure of micro-photoetching illumination iris according to claim 1 is characterized in that: described diffraction optical element is used to produce specific light illumination mode.
8, the reshaping structure of micro-photoetching illumination iris according to claim 7 is characterized in that: described specific light illumination mode comprises circle, annular, bipolar or four utmost point patterns.
9, the reshaping structure of micro-photoetching illumination iris according to claim 1 is characterized in that: described continuous magnification lens group is used to change the size in pupil cross section.
10, the reshaping structure of micro-photoetching illumination iris according to claim 1 is characterized in that: the pupil regulator of being made up of described two dome axicon lens is used to regulate the size of pupil cross section upper inner ring.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008100391508A CN101320216B (en) | 2008-06-18 | 2008-06-18 | Reshaping structure of micro-photoetching illumination iris |
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| CN2008100391508A CN101320216B (en) | 2008-06-18 | 2008-06-18 | Reshaping structure of micro-photoetching illumination iris |
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| CN101320216A true CN101320216A (en) | 2008-12-10 |
| CN101320216B CN101320216B (en) | 2010-06-09 |
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102356353B (en) * | 2009-03-19 | 2014-06-11 | 卡尔蔡司Smt有限责任公司 | Illumination system of microlithographic projection exposure apparatus |
| CN104054024A (en) * | 2012-01-17 | 2014-09-17 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
| CN104094091A (en) * | 2012-03-27 | 2014-10-08 | 日本先锋公司 | Measuring apparatus for semiconductor light emitting element |
| CN105301790A (en) * | 2015-10-20 | 2016-02-03 | 浙江科技学院 | Optical system capable of eliminating central light spots and illumination divergence angle regulating method |
| CN106168711A (en) * | 2016-08-17 | 2016-11-30 | 中国原子能科学研究院 | A kind of axicon lens ring type laser irradiating device |
| CN106198490A (en) * | 2016-08-17 | 2016-12-07 | 中国原子能科学研究院 | A kind of spatial deviation Raman spectroscopic detection system |
| CN106970471A (en) * | 2017-05-26 | 2017-07-21 | 北京华岸科技有限公司 | Optical beam transformation device and laser aid |
| CN107589547A (en) * | 2016-07-08 | 2018-01-16 | 中国科学院大连化学物理研究所 | A kind of converting means of solid light beam and annular beam |
| CN118348751A (en) * | 2024-06-17 | 2024-07-16 | 浙江大学杭州国际科创中心 | Method for adjusting lithography annular pupil illumination system |
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| US4255021A (en) * | 1979-04-20 | 1981-03-10 | The United States Of America As Represented By The United States Department Of Energy | Optical device with conical input and output prism faces |
| TW554411B (en) * | 2001-08-23 | 2003-09-21 | Nikon Corp | Exposure apparatus |
| US6813003B2 (en) * | 2002-06-11 | 2004-11-02 | Mark Oskotsky | Advanced illumination system for use in microlithography |
| NO320941B1 (en) * | 2003-09-12 | 2006-02-13 | Kongsberg Defence & Aerospace | Optical transformer |
| JPWO2005062350A1 (en) * | 2003-12-19 | 2008-04-17 | 株式会社ニコン | Light flux conversion element, exposure apparatus, illumination optical system, and exposure method |
| JP4535260B2 (en) * | 2004-10-19 | 2010-09-01 | 株式会社ニコン | Illumination optical apparatus, exposure apparatus, and exposure method |
| CN100559277C (en) * | 2006-11-03 | 2009-11-11 | 上海微电子装备有限公司 | A kind of lithography illuminating system |
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2008
- 2008-06-18 CN CN2008100391508A patent/CN101320216B/en active Active
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102356353B (en) * | 2009-03-19 | 2014-06-11 | 卡尔蔡司Smt有限责任公司 | Illumination system of microlithographic projection exposure apparatus |
| US9568831B2 (en) | 2012-01-17 | 2017-02-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN104054024A (en) * | 2012-01-17 | 2014-09-17 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
| CN104094091A (en) * | 2012-03-27 | 2014-10-08 | 日本先锋公司 | Measuring apparatus for semiconductor light emitting element |
| CN104094091B (en) * | 2012-03-27 | 2016-08-24 | 日本先锋公司 | Semiconductor light-emitting elements determinator and semiconductor light-emitting elements assay method |
| CN105301790A (en) * | 2015-10-20 | 2016-02-03 | 浙江科技学院 | Optical system capable of eliminating central light spots and illumination divergence angle regulating method |
| CN105301790B (en) * | 2015-10-20 | 2018-09-11 | 浙江科技学院 | The optical system and its illumination angle of divergence adjusting method of central bright spot can be eliminated |
| CN107589547A (en) * | 2016-07-08 | 2018-01-16 | 中国科学院大连化学物理研究所 | A kind of converting means of solid light beam and annular beam |
| CN106198490A (en) * | 2016-08-17 | 2016-12-07 | 中国原子能科学研究院 | A kind of spatial deviation Raman spectroscopic detection system |
| CN106168711A (en) * | 2016-08-17 | 2016-11-30 | 中国原子能科学研究院 | A kind of axicon lens ring type laser irradiating device |
| CN106970471A (en) * | 2017-05-26 | 2017-07-21 | 北京华岸科技有限公司 | Optical beam transformation device and laser aid |
| CN118348751A (en) * | 2024-06-17 | 2024-07-16 | 浙江大学杭州国际科创中心 | Method for adjusting lithography annular pupil illumination system |
| CN118348751B (en) * | 2024-06-17 | 2024-08-30 | 浙江大学杭州国际科创中心 | Method for adjusting lithography annular pupil illumination system |
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| CN101320216B (en) | 2010-06-09 |
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Address after: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |