CN101259768A - Resin coated metal foil, laminate, manufacturing method thereof, and printed wiring board using them - Google Patents
Resin coated metal foil, laminate, manufacturing method thereof, and printed wiring board using them Download PDFInfo
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- CN101259768A CN101259768A CNA2008100096691A CN200810009669A CN101259768A CN 101259768 A CN101259768 A CN 101259768A CN A2008100096691 A CNA2008100096691 A CN A2008100096691A CN 200810009669 A CN200810009669 A CN 200810009669A CN 101259768 A CN101259768 A CN 101259768A
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Abstract
The present invention provides a metal clad laminate or a resin coated metal foil having a metal foil whose both surfaces are not substantially roughening-treated and an insulating resin composition layer using generally used insulating resin, and a printed wiring board and a manufacturing method thereof, in which the metal clad laminate or the resin coated metal foil is used, the reliability and circuit formability are high, and the conductor loss is extremely low.
Description
Technical field
The present invention relates to attach metal forming, the bonding metal of resin laminate, use their Printed circuit board and manufacturing methods, particularly relate to this metal forming at the laminate of the bonding metal that forms on insualtion resin composition, to be connected with metal forming as feed layer, electroplate the technology that is suitable in the printed circuit board (PCB) that forms conductor circuit by carrying out pattern.
Background technology
In recent years, the demand of miniaturization, lightweight and the high speed of electronic equipment is raise, the densification of printed circuit board (PCB) makes progress, and the manufacture method of the printed circuit board (PCB) by having adopted the semi-additive process of electroplating gets most of the attention.This semi-additive process; disclose as shown in 11-186716 number as Japan Patent; it is after the resin surface that will form circuit is with the hole of formation such as laser as space interlayer hole (intersititial via hole); on resin, form several microns concavo-convex by chemical roughening or plasma treatment etc.; invest plumbous catalyst; and carry out chemical plating about 1 μ m to form the pattern electro-cladding; after electroplating the formation circuit by pattern; remove protective layer and be present in the method for the feed layer of the part beyond the circuit; the cancellation facture that it is bigger than side etching can form finer wiring.
And then, also have on the metal forming that attaches resin, form the method for circuit by semi-additive process.In recent years, for making the thickness attenuation of metal, disclose 13-140090 number and Japan Patent disclose as shown in 13-89892 number as Japan Patent, adopt the metal forming that on the support metal, is formed with 5 μ m or following thickness can peel-away type metal forming.Adopt this method, then need not implement chemical plating, can make the higher printed circuit board (PCB) of reliability on the surface of insualtion resin composition layer.
Like this, on attaching the metal forming of resin, carry out circuit when forming by semi-additive process, the thin more formation to fine wiring of metal forming is favourable more, but in fact, as shown in No. the 2927968th, Japan Patent, for obtaining the peel strength between metal forming and resin cured matter, metal forming is provided with several microns roughened layer, and this roughened layer can hinder the thin foilization of metal forming.And, in semi-additive process, need remove the existing feed layer of part beyond the circuit electroplating after etching, but since exist in the roughened layer concavo-convex, be easy to generate the etch residue of the reason that can become poor short circuit.Moreover because the concavo-convex resistance that can increase conductor circuit of roughened layer, the result can increase loss.Know that the increase of this resistance significantly can become high frequency to signal.In addition, if having roughened layer in the metal forming, then when forming conductor circuit, need unnecessary etching, and the conductor top width can be tiny than bottom width, therefore can not form good and fine circuit.
For solving above-mentioned problem, Japan Patent discloses and has disclosed in 8-309918 number by by not bestowing Copper Foil that roughening handles, being that coupling agent or mercaptan are the laminate plate of the bonded copper of the bonding bottom that constitutes of coupling agent and lamination as the peroxide cure resin combination of insulating barrier and silane.Thus, can not reduce the peel strength between Copper Foil and insulating barrier, can solve the aforesaid variety of problems that causes by roughening processing metal forming.
Yet, in above-mentioned method, need use the peroxide cure resin as insulating barrier, at this moment, use the laminate of the bonded copper in formation, contain this resin and the reliability of the printed circuit board (PCB) made may reduce.And, since the peroxide cure resin this as the higher material of danger, its operational processes aspect and preserve very difficulty, moreover owing to compare with common employed insulating resin, the price height is not practicality.
Summary of the invention
The object of the invention provides a kind of adaptation and the flatness that can take into account the interface between insualtion resin composition layer and metal forming, and the laminate of the bonding metal of relevant practical element or attach the metal forming of resin in the time of can also satisfying printed circuit board (PCB)s such as economy, operational processes and make, and then, its objective is the metal forming, reliability and the circuit that a kind of laminate that uses this bonding metal are provided or attach resin form the considerably less printed circuit board (PCB) of property excellence, conductor losses with and manufacture method.
That is, the present invention is the record of relevant following (1) to (40).
(1) a kind of metal forming that attaches resin, it has the insualtion resin composition layer and anchors at the one or both sides of insualtion resin composition layer and the metal forming that forms, it is characterized in that, at least the insualtion resin composition layer side of metal forming carried out surface treatment, and handle without roughening in fact on the two sides of metal forming.
(2) metal forming of the attaching resin of being put down in writing according to above-mentioned (1), wherein, for the surface roughness (Rz) of metal forming, the two sides is 2.0 μ m or following.
(3) metal forming of the attaching resin of being put down in writing according to above-mentioned (1) or (2), wherein, the thickness of metal forming is 3 μ m or following.
(4) according to the metal forming of each the attaching resin put down in writing in above-mentioned (1)～(3), wherein, the interface roughness between insualtion resin composition layer and metal forming (Rz) is 2.0 μ m or following.
(5) according to the metal forming of each the attaching resin put down in writing in above-mentioned (1)～(4), wherein, surface treatment is that antirust processing, chromate are handled, any or its combination of silane coupling in handling.
(6) metal forming of the attaching resin of being put down in writing according to above-mentioned (5), wherein, antirust processing is used any or its alloy in nickel, tin, zinc, chromium, molybdenum, the cobalt and is carried out.
(7) metal forming of the attaching resin of being put down in writing according to above-mentioned (5) or (6), wherein, insualtion resin composition contains cyanate ester resin, and by being that the metal of main component carries out antirust processing with nickel.
(8) according to the metal forming of each the attaching resin put down in writing in above-mentioned (5)～(7), wherein, not only implement antirust processing, and implement chromate and handle.
(9) according to the metal forming of each the attaching resin put down in writing in above-mentioned (5)～(8), wherein, implement the silane coupling at the outermost layer of metal forming and handle.
(10) according to the metal forming of each the attaching resin put down in writing in above-mentioned (5)～(9), wherein, the silane coupling agent that is used for silane coupling processing carries out chemical reaction by heating meeting and insualtion resin composition.
(11) according to the metal forming of each the attaching resin put down in writing in above-mentioned (5)～(10), wherein, insualtion resin composition contains epoxy resin, and is used for the silane coupling agent that the silane coupling handles and contains amino functional silane.
(12) according to the metal forming of each the attaching resin put down in writing in above-mentioned (1)～(11), wherein, insualtion resin composition contains heat-curing resin.
(13) according to the metal forming of each the attaching resin put down in writing in above-mentioned (1)～(12), wherein, it is liquid epoxy resin at normal temperatures that insualtion resin composition contains.
(14) according to the metal forming of each the attaching resin put down in writing in above-mentioned (1)～(13), wherein, insualtion resin composition contains the potentiality curing agent.
(15) according to the metal forming of each the attaching resin put down in writing in above-mentioned (1)～(14), wherein, the dielectric constant of the insualtion resin composition after the curing under 1GHz be 3.0 or below, perhaps dielectric dissipation factor be 0.01 or below.
(16) a kind of laminate of bonding metal, it has the insualtion resin composition layer and anchors at the one or both sides of insualtion resin composition layer and the metal forming that forms, it is characterized in that, at least the insualtion resin composition layer side of metal forming carried out surface treatment, and handle without roughening in fact on the two sides of metal forming.
(17) laminate of the bonding metal of being put down in writing according to above-mentioned (16) wherein, for the surface roughness (Rz) of metal forming, is 2.0 μ m or following on the two sides.
(18) laminate of the bonding metal of being put down in writing according to above-mentioned (16) or (17), wherein, the thickness of metal forming is 3 μ m or following.
(19) according to the laminate of above-mentioned (16)～bonding metal that (18) are put down in writing, wherein, the interface roughness between insualtion resin composition layer and metal forming (Rz) is 2.0 μ m or following.
(20) according to the laminate of each bonding metal of putting down in writing in above-mentioned (16)～(19), wherein, surface treatment is that antirust processing, chromate are handled, any or its combination of silane coupling in handling.
(21) laminate of the bonding metal of being put down in writing according to above-mentioned (20), wherein, antirust processing is used any or its alloy in nickel, tin, zinc, chromium, molybdenum, the cobalt and is carried out.
(22) laminate of the bonding metal of being put down in writing according to above-mentioned (20) or (21), wherein, insualtion resin composition contains cyanate ester resin, and by being that the metal of main component carries out antirust processing with nickel.
(23) according to the laminate of each bonding metal of putting down in writing in above-mentioned (20)～(22), wherein, not only implement antirust processing, and implement chromate and handle.
(24) according to the laminate of each bonding metal of putting down in writing of above-mentioned (20)～(23), wherein, implement the silane coupling at the outermost layer of metal forming and handle.
(25), wherein, be used for the silane coupling agent that the silane coupling handles and carry out chemical reaction by heating meeting and insualtion resin composition according to the laminate of each bonding metal of putting down in writing of above-mentioned (20)～(24).
(26) according to the laminate of each bonding metal of putting down in writing in above-mentioned (20)～(25), wherein, insualtion resin composition contains epoxy resin, and is used for the silane coupling agent that the silane coupling handles and contains amino functional silane.
(27) according to the laminate of each bonding metal of putting down in writing in above-mentioned (16)～(26), wherein, insualtion resin composition contains heat-curing resin.
(28) according to the laminate of each bonding metal of putting down in writing in above-mentioned (16)～(27), wherein, it is liquid epoxy resin at normal temperatures that insualtion resin composition contains.
(29) according to the laminate of each bonding metal of putting down in writing in above-mentioned (16)～(28), wherein, insualtion resin composition contains the potentiality curing agent.
(30) according to the laminate of each bonding metal of putting down in writing in above-mentioned (16)～(29), wherein, the dielectric constant of the insualtion resin composition after the curing under 1GHz be 3.0 or below, dielectric dissipation factor be 0.01 or below.
(31) a kind of printed circuit board (PCB) is characterized in that, uses the laminate of the metal forming of each the attaching resin put down in writing in above-mentioned (1)～(15) and/or each bonding metal of putting down in writing in above-mentioned (16)～(30) and makes.
(32) printed circuit board (PCB) of being put down in writing according to above-mentioned (31), wherein, the surface roughness of conductor circuit (Rz) is 2.0 μ m or following.
(33) printed circuit board (PCB) of being put down in writing according to above-mentioned (31) or (32), wherein, the peel strength between the conductor circuit of insualtion resin composition layer and width 1mm be 0.6kN/m or more than.
(34) according to each printed circuit board (PCB) put down in writing in above-mentioned (31)～(33), wherein, 150 ℃ down heating after 240 hours the insualtion resin composition layer and the peel strength between the conductor circuit of width 1mm be 0.4kN/m or more than.
(35) a kind of manufacture method of printed circuit board (PCB), it has by the metal forming of the laminate of the metal forming of each the attaching resin put down in writing in above-mentioned (1)～(15) and/or each bonding metal of putting down in writing in above-mentioned (16)～(30) is electroplated the operation of making conductor circuit as the pattern of feed layer.
(36) manufacture method of the printed circuit board (PCB) of being put down in writing according to above-mentioned (35) wherein, forms chemical deposit on metal forming.
(37) manufacture method of the printed circuit board (PCB) of being put down in writing according to above-mentioned (35) or (36), wherein, form conductor circuit after, when metal forming as feed layer is removed in etching, use the etching solution that constitutes chemical reaction rule speed (rate-dermining).
(38) manufacture method of the printed circuit board (PCB) of being put down in writing according to above-mentioned (37), wherein, etching solution contains the acid that do not contain halogen element and hydrogen peroxide as main component.
(39) manufacture method of the printed circuit board (PCB) of being put down in writing according to above-mentioned (38), wherein, the acid that does not contain halogen element is sulfuric acid.
(40) manufacture method of the printed circuit board (PCB) of being put down in writing according to above-mentioned (39), wherein, the concentration of sulfuric acid is that the concentration of 5～300g/L, hydrogen peroxide is 5～200g/L.
The application is according to the original Japanese patent application that proposes of applicant, promptly, special Willing 2002-58162 number (March 5 2002 applying date), special Willing 2002-91885 number (March 28 2002 applying date) and special Willing 2002-136052 number (May 10 2002 applying date) opinion priority, for the purpose of reference, its description is enrolled in this application.
Description of drawings
Fig. 1 is that expression uses the laminate of bonding metal of the present invention to make the profile of an example of the method for printed circuit board (PCB).
Fig. 2 is the profile of manufacture method of the substrate of the expression evaluation that is used for embodiment 1～15 and comparative example 1.
Fig. 3 is the profile of manufacture method of the substrate of the expression evaluation that is used for embodiment 16～30.
Fig. 4 is to use the photo of substrate circuit of resin combination 1 made of embodiment.
Fig. 5 is to use the photo of substrate circuit of resin combination 2 mades of embodiment.
Fig. 6 is to use the photo of substrate circuit of resin combination 3 mades of embodiment.
The specific embodiment
Below, the laminate of bonding metal of the present invention and the metal forming of attaching resin are elaborated.
The laminate of bonding metal of the present invention for example, shown in the 1st (a) figure, is the metal forming of handling without roughening in fact on integrated its two sides of the both sides of prepreg 1 lamination 2 and the laminate of the bonding metal that forms.
Prepreg forms the varnish of base material dipping or coating insualtion resin composition, as base material, can use the various material known that are used for electrically insulating material with laminate.As the example of the material of base material, can enumerate the inorganic matter fiber of E glass, D glass, S glass or Q glass etc., the organic fiber of polyimides, polyester or tetrafluoroethene etc., with and composition thereof etc.These base materials, for example have weave cotton cloth, shape such as nonwoven, rove, chopping single thread delustring fabric, burr expense light fabric, but, can select material and shape according to the be shaped purposes of thing and performance of target, can use as required separately or 2 kinds or above material and shape.Base material thickness is not particularly limited, but uses about 0.03～0.5mm usually.Carry out surface-treated or impose the base material that the mechanical type shredding is handled with silane coupling agent etc., suit from hear resistance, moisture-proof or processability aspect.In addition, be that 20～90 weight % come base material dipping or coating resin were heated the universe dry 1～30 minute then under 100～200 ℃ temperature after the universe is dry with its resin content usually, make semi-cured state (B stage condition) and can make prepreg.And then superimposed 1～20 prepreg in its two sides configuration metal forming, constitutes the heating pressurization with this more usually, carries out lamination, can make the laminate of the such bonding metal of the application.The thickness of multi-disc layer of prepreg is according to purposes and different, usually the thickness of preferred 0.1～5mm.As laminating method, can adopt the method for common laminate, for example use multistage to add press, multistage vacuum pressed machine, progressive forming, pressure cooker forming machine etc., usually under 100～250 ℃ of temperature, pressure 0.2～10MPa, the condition of 0.1～5 hour heat time heating time, carry out lamination, perhaps can use vacuum lamination apparatus under lamination is 50～150 ℃, the condition of 0.1～5Mpa, vacuum pressure 1.0～760mmHg, to carry out lamination.
The insulating resin that is used for insualtion resin composition of the present invention can use as the employed known general insulating resin of the insulating materials of printed circuit board (PCB), usually hear resistance, heat-curing resin that reagent resistance is good is used as substrate.As heat-curing resin, for example, can illustration (benzene) phenol resin, epoxy resin, cyanate ester resin, maleimide resin, isocyanate resin, benzocyclobutane olefine resin, vinyl etc., but be not limited thereto.Heat-curing resin can a kind uses separately, can also mix 2 kinds or above use.
In the above-mentioned heat-curing resin, because hear resistance, reagent resistance, the electrology characteristic excellence of epoxy resin, and comparatively cheap, be used as insulating resin widely, it is a particular importance.As epoxy resin, can the illustration bisphenol A type epoxy resin, bisphenol-type epoxy resin such as bisphenol f type epoxy resin, bisphenol-s epoxy resin, varnish type epoxy resin such as phenol varnish type epoxy resin, bisphenol-A varnish type epoxy resin, the 2-glycidyl etherificate thing of alicyclic epoxy resin, aliphatic chain epoxy resin, connection phenol, the 2-glycidyl etherificate thing of naphthalene glycol, the 2-glycidyl etherificate thing of phenol, the 2-glycidyl etherificate thing of alcohols, and their alkyl substituent, halide, hydrogenation thing etc.Epoxy resin can a kind uses separately, also can mix 2 kinds or above use.In addition, the curing agent with this epoxy resin uses as long as epoxy resin cure can not used with limiting, for example can use multifunctional phenols, multifunctional alcohols, amine, imidazolium compounds, acid anhydrides, organic phosphorus compound and halide thereof.This epoxy curing agent can a kind uses separately, also can mix 2 kinds of uses.
Above-mentioned cyanate ester resin be heating can to generate with three azine rings be the resin of the solidfied material of recurring unit because the dielectric property excellence of this solidfied material, especially situations that need to be used to high frequency characteristics more.As cyanate ester resin, for example, can exemplify 2, two (the 4-cyanato-phenyl) propane of 2-, two (4-cyanato-phenyl) ethane, 2, two (3, the 5-dimethyl-4-cyanato-phenyl) methane, 2 of 2-, two (the 4-cyanato-phenyl)-1 of 2-, 1,1,3,3,3-HFC-236fa, α, the cyanate carboxylate of α '-two (4-cyanato-phenyl)-diisopropyl benzene, phenol varnish and alkylphenol varnish etc.Wherein, 2, two (the 4-cyanato-phenyl) propane of 2-are because the balance of the dielectric property of solidfied material and curing property is good especially, and the cost cheapness, are preferred therefore.Cyanate ester resin as used herein can a kind uses separately, also can mix 2 kinds or above use.And, even a part of oligomericly turn to trimer or pentamer also it doesn't matter.
And then, can also mix curing catalysts, curing accelerator to above-mentioned cyanate ester resin.As curing catalysts, can use metal species such as manganese, iron, cobalt, nickel, copper, zinc, specifically, can make metal-organic complexs such as organic metal salt such as 2 ethyl hexanoic acid salt, naphthenate, caprylate and acetylacetonate complex and use.It can use separately, also can mix 2 kinds or above use.As curing accelerator, preferably use phenol, can use nonyl phenol, to two officials such as mono-functional phenols such as anisyl phenol, bisphenol-A, Bisphenol F, bisphenol S base phenol or multifunctional phenol such as phenol varnish, cresols varnish.It can use separately, also can mix 2 kinds or above use.
Be used for insualtion resin composition of the present invention, considering dielectric property, resistance to impact, processing film etc., can the fusion thermoplastic resin.As thermoplastic resin, can the illustration fluororesin, polyhenylene ether, modified polyphenylene ether, polyphenylene sulfide, Merlon, PEI, polyketone ether, polyarylate, polyamide, polyamidoimide, polybutadiene etc., but be not to be defined in this.Thermoplastic resin can a kind uses separately, also can mix 2 kinds of uses.
In the above-mentioned thermoplastic resin,,, be effective therefore owing to can improve the dielectric property of solidfied material as mixing polyhenylene ether and modified polyphenylene ether.As polyhenylene ether and modified polyphenylene ether; for example; can enumerate poly-(2; 6-dimethyl-1; the 4-penylene) ether; poly-(2; 6-dimethyl-1; the 4-penylene) the aroylation polymer of ether and polystyrene; the aroylation polymer of poly-(2,6-dimethyl-1,4-penylene) ether and SB; poly-(2; 6-dimethyl-1; the 4-penylene) the aroylation polymer of ether and styrene-maleic anhydride copolymer; the aroylation polymer of poly-(2,4-dimethyl-1,4-penylene) ether and polyamide; poly-(2; 6-dimethyl-1,4-penylene) aroylation polymer of ether and styrene-butadiene-acrylonitrile compolymer compound etc.In addition, for investing polyhenylene ether reactivity, polymerism, can perhaps import functional groups such as amino, epoxy radicals, carboxyl, styryl, methylpropenyl functional groups such as the terminal importing of polymer chain amino, epoxy radicals, carboxyl, styryl, methylpropenyls at the polymer chain side chain.
In addition, in above-mentioned thermoplastic resin because polyamide-imide resin, remove hear resistance, moisture-proof superior, also good to the cementability of metal, so be effective.In the raw material of polyamidoimide, as sour composition, can the illustration trimellitic anhydride, the monochlor(in)ate trimellitic anhydride; As amine component, can the illustration m-phenylene diamine (MPD), p-phenylenediamine (PPD), 4,4 '-diaminodiphenyl ether, 4,4 '-MDA, two [4-(amino-benzene oxygen) phenyl] sulfone, 2,2 '-two [4-(4-amino-benzene oxygen) phenyl] propane etc., but be not limited thereto.For improving the dry property of the universe, available silicon is siloxane modified, at this moment, uses siloxane diamine in amino component.As consider processing film, preferably using molecular weight is 50,000 or above.
Being used for insualtion resin composition of the present invention, can mix inorganic filler.As inorganic filler, can exemplify aluminium oxide, aluminium hydroxide, magnesium hydroxide, clay, talcum, antimony trioxide, antimony pentaoxide, zinc oxide, fused silica, glass dust, silica flour, fine mesopore glass etc.These inorganic fillers can use separately, also can mix 2 kinds or above use.
Be used for insualtion resin composition of the present invention and can contain organic solvent.As organic solvent, for example, can exemplify benzene,toluene,xylene, the such aromatic hydrocarbon solvent of trimethylbenzene; Acetone, MEK, the such ketones solvent of methylisobutylketone; The ether solvent that oxolane is such; Isopropyl alcohol, the such alcohols solvent of butanols; 2-methyl cellosolve, the such ether alcohol kind solvent of butoxy ethanol; N-methyl pyrrolidone, N, N-dimethylformaldehyde, N, the amide solvent that the N-dimethylacetylamide is such etc., it can use separately, also can 2 kinds or above shared.Quantity of solvent when making prepreg in the varnish of used insualtion resin composition is preferably the scope of 40～80 weight %.In addition, the viscosity of insualtion resin composition varnish under 25 ℃ is preferably the scope of 20～100cP.
Be used for insualtion resin composition of the present invention, can mix fire retardant.As fire retardant, for example, can use bromides such as decabrominated dipheny base ether, tetrabromobisphenol A, tetrabromophthalic anhydride, tribromophenol, phosphorus compounds such as triphenyl phosphate, phosphoric acid trimethylbenzene phenolic ester, triphenyl phosphate, tricresyl phosphate phenol diphenyl ester, metal hydroxides such as magnesium hydroxide, aluminium hydroxide, red phosphorus and modifier thereof, antimonial such as antimony trichloride, antimony pentaoxide, melamine, cyanuric acid, known fire retardants such as three azines such as trimerization cyanato-melamine.
In addition, be used for insualtion resin composition of the present invention, can also add various additives or fillers such as curing agent, curing accelerator, thermoplastic particles, colouring agent, antiultraviolet penetrating agent, antioxidant, reducing agent as required.
As insualtion resin composition of the present invention, if use to solidify the dielectric constant of back under 1GHz 3.0 or following or dielectric dissipation factor 0.01 or following material, then can reduce the dielectric absorption in the wiring, and can form the littler circuit of loss.As the resin of such dielectric property excellence, can illustration polyhenylene ether resin or cyanate ester resin.When polyhenylene ether is used for the wiring plate material, for improving hear resistance and reagent resistance, need invest Thermocurable, as its example, the method that fusion epoxy resin, cyanate ester resin, three azines-heat-curing resins such as bimaleimide resin in polyhenylene ether are arranged, the method for the polymerizable functional groups of two keys of importing or epoxy radicals etc. in the strand of polyhenylene ether.
Be used for metal forming of the present invention, can not implement the formation that the electricity of warty thing (it is gold-plated to be commonly called as sintering: please refer to Japan Patent and disclose 8-21618 number) in fact, or oxidation processes, reduction are handled, handle by the roughening of etching etc. on the surface.This " in fact " this term be meant in the past through roughening can not obtain enough peel strengths metal forming, still can use, the preferred use do not implemented the metal forming that roughening is handled fully.Therefore, the surface roughness that is used for metal forming of the present invention is preferably on 10 mean roughness (Rz) two sides shown in the JIS B0601 all at 2.0 μ m or following, and more preferably 1.5 μ m or following are preferably 1.0 μ m or following especially.
As being used for metal forming of the present invention, for example, can using Copper Foil, nickel foil, aluminium foil etc., but use Copper Foil usually.As the manufacture method that is used for Copper Foil of the present invention, be not particularly limited, for example, when manufacturing has the peelable release Copper Foil of carrier, on the carrier foils of thickness 10～50 μ m, become the metal oxide or the organic matter layer of peel ply, if adopt copper sulphate to bathe, can be by sulfuric acid 50～100g/L, copper 30～100g/L, 20 ℃～80 ℃ of fluid temperatures, current density 0.5～100A/dm
2The condition manufacturing, if adopt synthesized copper pyrophosphate bath, then can be by potassium pyrophosphate 100～700g/L, copper 10～50g/L, 30 ℃～60 ℃ of fluid temperatures, pH8～12, current density 1～10A/dm
2The condition manufacturing, consider the rerum natura and the flatness of Copper Foil, also can mix various additives sometimes.In addition, peelable release metal forming is meant the metal forming with carrier, and carrier is the metal forming that can peel off.
Thickness as being used for metal forming of the present invention is not particularly limited, and is preferably 3 μ m or following.When use has the peelable release metal forming of carrier, be preferably that metal forming is 3 μ m or following after peeling off carrier.When using such metal forming, then can obtain the good printed circuit board (PCB) of the described wiring in back formation property as feed layer.
In addition, be used for the layer of the insualtion resin composition at least side of metal forming of the present invention, for make metal forming and the adaptation of crossing the insualtion resin composition interlayer reach practical level or more than, it is implemented surface treatment.As the surface treatment on the metal forming, can enumerate that antirust processing, chromate are handled, any or its combination of silane coupling agent in handling, no matter implement which kind of surface treatment, form the resin of layer and study aptly at being used for insulating resin to good.
Above-mentioned antirust processing for example can be by sputter or plating, chemical nickel plating, tin, zinc, chromium, molybdenum, cobalt etc. any or its alloy, forms film and implement on metal forming.From cost, be preferably plating.For metal ion is separated out easily, also can add complexing agents such as a certain amount of citrate, tartrate, amidosulfonic acid.Electroplate liquid uses in acid range usually, carries out under the temperature of room temperature～80 ℃.Plating is generally current density 0.1～10A/dm
2, in 1～60 second of conduction time, preferably suitably select from the scope in 1～30 second.The amount of antirust processing metal is according to the kind of metal and different, but is aggregated in 10～2000 μ g/dm
2Suit.If antirust processing is blocked up, then can cause the reduction of etching obstruction and electrology characteristic, and if thin excessively, then may become peel strength main reasons for decrease with resin.
In addition, when containing cyanate ester resin in insualtion resin composition, preferred antirust processing is undertaken by the metal that contains nickel.During for its combination of employing, then the reduction of the peel strength in heat-resisting deterioration test or moisture-proof deterioration test is less, is effective therefore.
Handle the preferred aqueous solution that contains hexavalent chromium that uses as above-mentioned chromate.It can be simple impregnation process that chromate is handled, but preferably carries out with cathode treatment.Preferably in sodium dichromate 0.1～50g/L, pH1～13, bathe temperature 0～60 ℃, current density 0.1～5A/dm
2, 0.1～100 second of electrolysis time condition carry out.Also can replace sodium dichromate and use chromic acid or potassium bichromate to carry out.And above-mentioned chromate is handled and preferably is applied in the above-mentioned antirust processing, can further improve the adaptation between insualtion resin composition layer and metal forming like this.
As being used for the silane coupling agent that above-mentioned silane coupling is handled, for example, can use the 3-glycidoxypropyltrime,hoxysilane, 2-(3, the 4-epoxycyclohexyl) epoxy functional silane such as ethyl trimethoxy silane, the 3-TSL 8330, N-2-(amino-ethyl) 3-TSL 8330, amino functional silane such as N-2-(amino-ethyl) 3 one aminopropyl methyl dimethoxysilanes, vinyltrimethoxy silane, the ethenylphenyl trimethoxy silane, alkene functional silanes such as vinyl three (2-methoxyethoxy) silane, acrylic functional silanes such as 3-propenyloxy group propyl trimethoxy silicane, methacrylic acid functional silanes such as 3-methyl allyl acyloxypropyl trimethoxysilane, Mercaptofunctional silane such as 3-sulfydryl propyl trimethoxy silicane etc.It can use separately, also can mix multiple use.These coupling agents with the concentration dissolving of 0.1～15g/L, are coated on the metal forming under the temperature of room temperature～50 ℃ or make its electrode deposition in the solvent of water etc., to adsorb.These silane coupling agents combine and form diaphragm by carrying out condensation with the hydroxyl of the antirust processing metal of metal foil surface.After the silane coupling is handled, form stable key by heating, ultraviolet ray irradiation etc.If by heating, the universe dry 2～60 seconds under 100～200 ℃ temperature then.If by the ultraviolet ray irradiation, then at 200～400nm, 200～2500mJ/cm
2Scope carry out.In addition, silane coupling processing is preferably carried out the outermost layer of metal forming.
As being used for the silane coupling agent that the silane coupling is handled, be preferably by 60～200 ℃, particularly 80～150 ℃ heating can be carried out chemical reaction with above-mentioned insualtion resin composition.Like this, the functional group in the insualtion resin composition and the functional group of silane coupling agent carry out chemical reaction, and can make more excellent adaptation.For example, to containing the insualtion resin composition of epoxy radicals, the preferred silane coupling agent that contains amino functional silane that uses.This is because by heat, epoxy radicals forms firm chemical bond easily with amino, and this key is very stable to heat or moisture content.As the combination that can form such chemical bond, can exemplify epoxy radicals-amino, epoxy radicals-epoxy radicals, epoxy radicals-sulfydryl, epoxy radicals-hydroxyl, epoxy radicals-carboxyl, epoxy radicals-cyanato, amino-aminoacyl etc.
As the insulating resin that is used for insualtion resin composition of the present invention, the preferred normal temperature that uses is liquid epoxy resin down, at this moment, because the viscosity during fusion can descend significantly, wettability at bonding interface can improve, thereby carry out the chemical reaction between epoxy resin and silane coupling agent easily, consequently, can obtain firm peel strength.Particularly, bisphenol A type epoxy resin, bisphenol f type epoxy resin, the phenol varnish type epoxy resin of preferred epoxide equivalent about 200.
When insualtion resin composition contains curing agent,, especially preferably use heat-curing type potentiality curing agent as curing agent.Promptly, when the functional group in insualtion resin composition and the functional group of silane coupling agent carry out chemical reaction, preferably select curing agent than the low mode of temperature of the curing reaction of beginning insualtion resin composition according to the functional group in the insualtion resin composition and the functional group's of silane coupling agent reaction temperature.Thus, the reaction meeting between the sense in the insualtion resin composition and the functional group of silane coupling agent preferentially, selectively carry out, thereby the adaptation between metal forming and insualtion resin composition will be higher.As with the corresponding thermohardening type potentiality of the insualtion resin composition that contains epoxy resin curing agent, can enumerate solid dispersed-heating and melting type curing agent such as dicyandiamide, dihydrazide compound, imidazolium compounds, amine-epoxy adduct or carbamide compound, salt, boron chloride, amine salt class, block carboxylic acid compound isoreactivity base block type solidfied material.
To contain insualtion resin composition as above prepreg, handle and implemented above-mentioned surface-treated metal forming in fact without roughening with its surface, it is integrated to carry out lamination by said method, can make the laminate of the bonding metal of the present invention shown in Fig. 1 (a).
In addition, the metal forming of attaching resin of the present invention can be coated on also heating on the above-mentioned metal forming, dry making by the varnish with above-mentioned insualtion resin composition.As coating process, for example can use roller to scrape coating machine, roll coater, comma coating machine etc. carries out, and heat, drying condition is preferably and carried out under 100～200 ℃ temperature 1～30 minute, and heat, the residual solvent amount in the dried insualtion resin composition is preferably about 0.2～10%.And the quantity of solvent in the insualtion resin composition varnish when making the metal forming that attaches resin is preferably 30～70 weight %, and the viscosity of the varnish under 25 ℃ is preferably the scope of 100～500cP.In addition, also the insualtion resin composition of film shape can be laminated to the metal forming of making attaching resin of the present invention on the metal forming, at this moment, with 50～150 ℃, the condition of 0.1～5MP a, it is suitable that resin film is laminated on the metal forming.
The insualtion resin composition layer of the metal forming of the laminate of bonding metal of the present invention or attaching resin and the interface roughness (Rz) of metal forming are preferably at 2.0 μ m or following, more preferably 1.5 μ m or following.In addition, among the present invention, the interface roughness between insualtion resin composition layer and metal forming is meant the laminate of bonding metal, the metal forming that attaches resin or the conductor metal of printed circuit board (PCB) are applied etching, according to JIS-B-0601, measure the numerical value of the roughness of the resin face that is presented.
Then, an example of the laminate that uses the prepared bonding metal of the present invention of aforesaid way being made the method for printed circuit board (PCB) describes.
At first, what form in the laminate of the bonding metal of Fig. 1 (a) that interlayer connects usefulness runs through through hole 3, and on metal forming 2 and through hole 3 inside invest catalyst core (as Fig. 1 (b)).If through-hole diameter 100 μ m or more than, then be fit to use the processing of drilling machine, and if through-hole diameter at 100 μ m or following, then be fit to use CO
2Or the solid state laser of the gas laser of CO, Ai Kesima etc. or YAG (yttrium-aluminium-garnet) etc.In addition, when investing catalyst core, use heavy metal ion or palladium colloid.
Then, shown in Fig. 1 (C), on the metal forming 2 that has invested catalyst core, reach through hole 3 inside, form thin chemical deposit 4.For this chemical plating, can use CUST2000 ((Hitachi Chemical Co., Ltd. makes, trade name) or CUST201 (commercially available electroless coppers such as (Hitachi change into industrial Industrial Co., Ltd and makes, trade name).This electroless copper is to be main component with copper sulphate, formalin, complexing agent, NaOH.As long as the thickness that the thickness of electroplating can carry out ensuing plating is enough about 0.1～1 μ m.
Secondly, shown in Fig. 1 (d), after chemical plating, form protective layer 5.The conductor thickness that the thickness of electro-cladding is made and then electroplated suits with degree or thicker thickness.The resin that can be used for electro-cladding; PMER P-LA900PM is arranged, and (Tokyo should be changed Co., Ltd. and make; trade name) so liquid protective layer; perhaps (Hitachi Chemical Co., Ltd. makes HW-425; trade name), RY-3025 dry films such as (Hitachi Chemical Co., Ltd. make, trade name).On through hole, then do not form electro-cladding with the place that should constitute conductor circuit.
Then, shown in Fig. 1 (e), form circuit pattern 6 by electroplating.Electroplate at the employed copper sulphate of printed circuit board (PCB) for electroplating to use usually.As the thickness of electroplating, use as long as can be used as circuit conductor, be preferably scope, more preferably the scope of 5～50 μ m at 1～100 μ m.
Secondly, use alkaline stripper, sulfuric acid or commercially available protective layer stripper to carry out peeling off of protective layer, remove pattern part copper (Fig. 1 (f)) in addition with etching.As being used for etching solution of the present invention, be not particularly limited, still, when using the etching solution of diffusion law speed type in the past, because how no matter the fine part of wiring done, fluid exchange is variation always, and its result tends to the deterioration of circuit formation property.Therefore, the reaction of preferably copper and etching solution is not a diffusion law speed, but restrains the etching solution of fast type of carrying out with reaction.If the reaction of copper and etching solution is a reaction rule speed, even then strengthen diffusion again, its etching speed can not change yet.That is it is poor, can not produce the etching speed in good place of fluid exchange and relatively poor place.Restrain fast etching solution as such reaction, can exemplify and reach the acid that does not contain halogen element with hydrogen peroxide is the etching solution of main component.Owing to use hydrogen peroxide as oxidant, therefore can carry out strict etching speed control by controlling its concentration.In addition, if be mixed with halogen element in the etching solution, then solubilizing reaction becomes diffusion law speed easily.As the acid that does not contain halogen element, can use nitric acid, sulfuric acid, organic acid etc., but because cheap, sulfuric acid is preferred.Moreover, during as main component,, preferably make concentration be respectively 5～300g/L and 5～200g/L with sulfuric acid and hydrogen peroxide from the stable aspect of etching speed, liquid.
Then, with above-mentioned Fig. 1 (f) as the internal layer circuit substrate, at the laminate of its both sides lamination single face bonding metal or attach the metal forming (as Fig. 1 (g)) of resin.At the laminate of this used single face bonding metal or attach the metal forming of resin, be same preferably with the laminate of aforesaid bonding metal of the present invention or the metal forming that attaches resin.And at this, the thickness of insulating barrier 7 is preferably 10～100 μ m, more preferably 20～60 μ m.In addition, the thickness of metal forming 8 is preferably 0.3～3 μ m.
Secondly, shown in Fig. 1 (h), above metal forming 8, behind insulating barrier 7 formation space interlayer holes, remove its inner gum residue again.As the method that forms the space interlayer hole, preferably use laser instrument.As at this available laser instrument, CO is arranged
2, solid state laser such as gas laser such as CO or Ai Kesima or YAG.Because CO
2Laser instrument obtains easily big output, is suitable for the processing of φ 50 μ m or above through hole.If when processing φ 50 μ m or following fine through hole, the more preferable YAG laser instrument of short wavelength and optically focused is more suitable.As the oxidant of the removal that is used for gum residue, can exemplify oxidants such as permanganate, chromate, chromic acid.
Then, on metal forming 8, reach interlayer hole inside, space and invest catalyst core, on metal forming 8, reach the inner chemical deposit 10 that approaches that forms of space interlayer hole.For investing catalyst core, can use heavy metal ion or palladium colloid.For chemical plating, can use CUST2000 (Hitachi Chemical Co., Ltd. makes, trade name) or CUST201 commercially available electroless coppers such as (Hitachi Chemical Co., Ltd. make, trade name).These electroless coppers are main component with copper sulphate, formalin, complexing agent, NaOH.The thickness of electroplating be so long as can carry out the thickness of ensuing plating and get final product, about 0.1～1 μ m enough.
Secondly, shown in Fig. 1 (j), form chemical deposit 10, form electro-cladding 11 again.The thickness of electro-cladding, preferably with the thickness of the conductor of then electroplating with degree or thicker thickness.The resin that can be used for electro-cladding has PMER P-LA900PM, and (Tokyo should be changed Co., Ltd. and make; trade name) (Hitachi Chemical Co., Ltd. makes for so liquid protective layer or HW-425; trade name), RY-3025 dry films such as (Hitachi Chemical Co., Ltd. make, trade name).On the through hole and the place that should constitute conductor circuit does not then form electro-cladding.
Then, shown in Fig. 1 (k), form conductor circuit pattern 12 by electroplating.For plating, can use usually and electroplate at the employed copper sulphate of printed circuit board (PCB).As long as the thickness of electroplating can use as circuit conductor, and be preferably scope, more preferably in the scope of 5～50 μ m at 1～100 μ m.
Secondly.Use alkaline etching liquid, sulfuric acid or commercially available protective layer stripper to carry out peeling off of protective layer, remove conductor circuit pattern part copper in addition with the aforementioned etching solution that belongs to reaction rule speed, form circuit (Fig. 1 (1)) by preferred
Moreover, can also on the conductor circuit of the substrate of Fig. 1 (1), carry out gold-plated.As gold-plated method, it can be known method in the past, be not particularly limited, for example have: (Hitachi Chemical Co., Ltd. makes to use SA-100, trade name) so active treatment fluid carries out the activity of conductor boundary to be handled, (Hitachi Chemical Co., Ltd. makes with NIPS-100, trade name) such chemical nickel plating carries out about 1～10 μ m, (Hitachi Chemical Co., Ltd. makes with HGS-100, trade name) after carrying out about 0.01～0.1 μ m, such immersion gold plating carries out the method for grade about such chemical gilding 0.1～1 μ m of HGS-2000 (Hitachi Chemical Co., Ltd. makes, trade name) again.
As mentioned above, the laminate of the bonding metal of the application of the invention, the metal forming of according to circumstances shared attaching resin, promptly can provide a kind of reliability and circuit form the considerably less printed circuit board (PCB) of property excellence and conductor losses with and manufacture method.Certainly, only use the metal forming that attaches resin, also can make printed circuit board (PCB) of the present invention.And, because the adaptation between the metal forming of insualtion resin composition layer and formation conductor circuit reaches the practical satisfied numerical value of, in the manufacture process of printed circuit board (PCB), peel off caused bad also few because of electric wire.In printed circuit board (PCB) of the present invention, the peel strength between the conductor circuit of insualtion resin composition layer and width 1mm be preferably 0.6kN/m or more than, more preferably 0.8kN/m or more than.And then, 150 ℃ of heating after 240 hours the insualtion resin composition layer and the peel strength between the conductor circuit of width 1mm be preferably 0.4kN/m or more than, more preferably 0.6kN/m or more than.
Below, illustrate in greater detail the present invention by embodiment.But the present invention is not limited thereto.
The making of metal forming 1
The glassy surface of the electrolytic copper foil (carrier copper foil) of width 510mm, thickness 35 μ m is carried out chromium continuously in following condition electroplate, to form 1.0mg/dm
2The chromium coating (peel ply) of thickness.Surface roughness Rz=0.5 μ m after chromium plating forms.In addition, surface roughness is measured according to JIS-B-0601.
The chromium plating condition
Liquid is formed: chromium trioxide 250g/L, sulfuric acid 2.5g/L
Bathe temperature: 25 ℃
Anode: lead
Current density: 20A/dm
2
Then, carry out the electro-coppering of 1.0 μ m by the gloss plating condition shown in following.Metal foil surface roughness Rz=0.6 μ m after electro-coppering stops.
Copper sulphate is electroplated condition
Liquid is formed: copper sulfate pentahydrate 100g/L, sulfuric acid 150g/L, chloride ion 30ppm
Bathe temperature: 25 ℃
Anode: lead
Current density: 10A/dm
2
Then, carry out the antirust processing of zinc as mode shown in following by plating.
Liquid is formed: zinc 20g/L, sulfuric acid 70g/L
Bathe temperature: 40 ℃
Anode: lead
Current density: 15A/dm
2
Electrolysis time: 10 seconds
Secondly, carrying out the chromate shown in following handles.
Liquid is formed: chromic acid 5.0g/L
·pH：11.5
Bathe temperature: 55 ℃
Anode: lead
Dip time: 5 seconds
Then, carrying out the silane coupling shown in following handles.
Liquid is formed: 3-aminopropyl trimethoxy silane 50g/L
Bathe temperature: 25 ℃
Dip time: 10 seconds
The silane coupling makes coupling agent be adsorbed on metal foil surface after 120 ℃ of dry metal formings after handling.The metal foil surface roughness Rz=0.6 μ m of this moment.
The making of metal forming 2
Carry out the antirust processing with the electronickelling shown in following except that the antirust processing of zinc that replaces metal forming 1, with metal forming 1 same making metal forming.The metal foil surface roughness of this moment is Rz=0.6 μ m.
Electronickelling
Liquid is formed: zinc 20g/L, sulfuric acid 70g/L
Bathe temperature: 40 ℃
Anode: lead
Current density: 15A/dm
2
Electrolysis time: 10 seconds
The making of metal forming 3
Except that γ-glycidoxy propyl group trimethoxy silane being used for the silane coupling agent of metal forming 1, with the metal forming 1 same metal forming of making.The metal foil surface roughness of this moment is Rz=0.6 μ m.
The making of metal forming 4
Except that γ-glycidoxy propyl group trimethoxy silane being used for the silane coupling agent of metal forming 2, with the metal forming 2 same metal formings of making, the metal foil surface roughness of this moment is Rz=0.6 μ m.
The making of metal forming 5
Except that the chromate of not implementing metal forming 1 is handled, with the metal forming 1 same metal forming of making.The metal foil surface roughness Rz=0.6 μ m of this moment.
The making of metal forming 6
Except that the coupling agent that does not carry out metal forming 1 is handled, with the metal forming 1 same metal forming of making.The metal foil surface roughness Rz=0.6 μ m of this moment.
The making of metal forming 7
Except that the antirust processing of zinc of not carrying out metal forming 1, with the metal forming 1 same metal forming of making.The metal foil surface roughness Rz=0.6 μ m of this moment.
The making of metal forming 8
Except that carrying out with the yellowing plating condition shown in following after the gloss copper facing the electro-coppering of thickness 2.0 μ m, with the metal forming 1 same metal forming of making.The metal foil surface roughness Rz=2.7 μ m of this moment.
Condition is electroplated in yellowing
Liquid is formed: copper sulfate pentahydrate 50g/L, sulfuric acid 100g/L, chloride ion 30ppm
Bathe temperature: 25 ℃
Anode: lead
Current density: 10A/dm
2
The making of insualtion resin composition 1
Be liquid bisphenol A type epoxy resin (Ai Bikete 828EL while stirring under the normal temperature of heating 30 weight % under 80 ℃, oiling Xie Er Co., Ltd. makes, trade name), (dust is than Cologne N-673 for the cresols varnish type epoxy resin of 30 weight %, Japanese ink Co., Ltd. makes, trade name), and the brominated bisphenol a type epoxy resin (YDB-500 of 30 weight %, Toto Kasei KK makes, trade name), it is dissolved in the MEK, to its add 40 weight % for the potentiality epoxy hardener 2,4-diaminourea-6-(2-methyl isophthalic acid-imidazole radicals ethyl)-1,3,5-three azine fulminuric acid addition products, and the broken silica of the micro mist of 2 weight %, the antimony trioxide of 4 weight % is to make epoxies insualtion resin composition varnish.
The making of insualtion resin composition 2
In toluene at the polyhenylene ether resin (PKN4752 of 80 ℃ of heating for dissolving, 20 weight %, lucky her the plastic cement Co., Ltd. of Japan makes, trade name), 2 of 40 weight %, two (4-cyanato-phenyl) propane (the Arocy B-10 of 2-, rising sun Qi Ba Co., Ltd. makes, trade name), phosphorous oxybenzene compound (the HCA-HQ of 8 weight %, three photochemistry Co., Ltd. make, trade name), 0.1 the manganese naphthenate of weight % (Mn content=6 weight %, the chemical Industry Co., Ltd of Japan makes), 2 of 32 weight %, two (the 4-glycidol phenyl) propane (DER331L of 2-, Tao Yu chemicals Amada Co., Ltd. makes, trade name), to make polyhenylene ether-cyanate insualtion resin composition varnish.
The making of insualtion resin composition 3
In NMP (N-methyl pyrrolidone) with 80 ℃ the dissolving 80 weight % silicone-modified polyamide-imide resin (KS-6600, Hitachi Chemical Co., Ltd. makes, trade name), the cresols varnish type epoxy resin (YDCN-703 of 20 weight %, Toto Kasei KK makes, trade name), to make silicone-modified polyamideimides insualtion resin composition varnish.
The varnish impregnation that makes insualtion resin composition 1 is at the thick glass cloth of 0.2mm (cloth Unit Weight 210g/m
2) in, drying is 5 minutes under 120 ℃, makes prepreg.With 4 these prepregs at laminated metal foil 1 up and down, with 170 ℃, the condition press molding of 2.45MPa 1 hour, peel off carrier copper foil then, make the laminate of the bonding metal that forms by insulating barrier 13 and Copper Foil 14 shown in Fig. 2 (a).
Shown in Fig. 2 (b), (Sumitomo Heavy Industries, Ltd makes to use carbon dioxide to impact laser instrument drilling machine L-500 from metal forming, trade name), that wears out diameter 80 μ m runs through through hole 15, under 70 ℃ of fluid temperatures, be immersed in the mixed aqueous solution of potassinm permanganate 65g/L and NaOH 40g/L 20 minutes, to carry out the removal of dirty bits.
Then, (Hitachi Chemical Co., Ltd. makes to be immersed in palladium Solution H S-202B under 25 ℃, trade name) in 15 minute, after investing catalyst, use CUST-201 (Hitachi Chemical Co., Ltd. makes, trade name), carry out electroless copper with 25 ℃ of fluid temperatures, 30 minutes condition, shown in Fig. 2 (c), form the chemical plating copper layer 16 of thickness 0.3 μ m.
Shown in Fig. 2 (d); (Hitachi Chemical Co., Ltd. makes with dry film protective layer RY-3025; trade name) is laminated on the surface of chemical plating copper layer 16, and, forms electro-cladding 17 after the video picture by having sheltered the ultraviolet ray that exposes of the light shield of electroplating copper-plated place.
Shown in Fig. 2 (e), use copper sulphate to bathe, with 25 ℃ of fluid temperatures, current density 1.0A/dm
2Condition electroplate the about 20 μ m of copper facing, and by minimum circuit conductor width/circuit conductor at interval the mode of (L/S)=25/15 μ m form pattern electro-coppering 18.
Secondly, shown in Fig. 2 (f), after use protective layer stripper HTO (Ni Jige Morton Co., Ltd. makes, trade name) removes dry film, use the H of 20g/L
2SO
4, 10g/L H
2O
2The etching solution of forming is removed drafting department copper in addition with etching.During etching, be single face 1dm with substrate cut
2Small pieces after put into the beaker of 1L, use magnetic stirrer 40 ℃ of following etchings 5 minutes.
At last, with the condition shown in the table 1, on conductor circuit, form nickel coating 19 and Gold plated Layer 20 (as Fig. 2 (g)).Minimum circuit conductor width after circuit forms/circuit conductor is (L/S)=20/20 μ m (bottom width) at interval.
Table 1
| Activation processing | SA-100 | |
|
| Chemical nickel plating | NIPS-100 | 85 ℃ 20 minutes ( |
|
| Washing | | RT | 1 minute |
| Replace gold-plated | HGS-100 | 85 ℃ 10 minutes (thickness 0.02 μ m) | |
| Replace gold-plated | HGS-2000 | 65 ℃ 40 minutes (thickness 0.5 μ m) |
The varnish impregnation that makes insualtion resin composition 1 is to the thick glass cloth of 0.2mm (weight per unit area 210g/m
2) in, made prepreg down in dry 5 minutes at 120 ℃.Remove 4 these prepregs at laminated metal foil 2 up and down, carried out extrusion forming 1 hour, make beyond the laminate of the bonded copper shown in Fig. 2 (a), make substrate similarly to Example 1 with 170 ℃, the condition of 2.45MPa.
The varnish impregnation that makes insualtion resin composition 2 is at the thick glass cloth of 0.2mm (weight per unit area 210g/m
2) in, made prepreg down in dry 5 minutes at 160 ℃.Remove 4 these prepregs at laminated metal foil 2 up and down,, make beyond the laminate of the bonded copper shown in Fig. 2 (a), make substrate similarly to Example 1 with 170 ℃, the condition extrusion forming of 2.45MPa 1 hour.
The varnish impregnation that makes insualtion resin composition 2 is at the thick glass cloth of 0.2mm (weight per unit area 210g/m
2) in, made prepreg down in dry 5 minutes at 160 ℃.Remove 4 these prepregs at laminated metal foil 4 up and down, carried out extrusion forming 1 hour, make beyond the laminate of the bonded copper shown in Fig. 2 (a), make substrate similarly to Example 1 with 170 ℃, the condition of 2.45MPa.
The varnish impregnation that makes insualtion resin composition 3 is at the thick glass cloth of 0.2mm (weight per unit area 210g/m
2) in, made prepreg down in dry 5 minutes at 160 ℃.Remove 4 these prepregs at laminated metal foil 1 up and down, carried out extrusion forming 1 hour, make beyond the laminate of the bonded copper shown in Fig. 2 (a), make substrate similarly to Example 1 with 170 ℃, the condition of 2.45MPa.
The varnish impregnation that makes insualtion resin composition 3 is at the thick glass cloth of 0.2mm (weight per unit area 210g/m
2) in, descend dry 5 minutes to make prepreg at 160 ℃.Remove 4 these prepregs at laminated metal foil 2 up and down, carried out extrusion forming 1 hour, make beyond the laminate of the bonded copper shown in Fig. 2 (a), make substrate similarly to Example 1 with 170 ℃, the condition of 2.45MPa.
Embodiment 7
The varnish impregnation that makes insualtion resin composition 3 is at the thick glass cloth of 0.2mm (weight per unit area 210g/m
2) in, made prepreg down in dry 5 minutes at 160 ℃.Remove 4 these prepregs at laminated metal foil 3 up and down, carried out extrusion forming 1 hour, make beyond the laminate of the bonded copper shown in Fig. 2 (a), make substrate similarly to Example 1 with 170 ℃, the condition of 2.45MPa.
Embodiment 8
The varnish impregnation that makes insualtion resin composition 3 is at the thick glass cloth of 0.2mm (weight per unit area 210g/m
2) in, made prepreg down in dry 5 minutes at 160 ℃.Remove 4 these prepregs at laminated metal foil 4 up and down, carried out extrusion forming 1 hour, make beyond the laminate of the bonded copper shown in Fig. 2 (a), make substrate similarly to Example 1 with 170 ℃, the condition of 2.45MPa.
The varnish impregnation that makes insualtion resin composition 1 is at the thick glass cloth of 0.2mm (weight per unit area 210g/m
2) in, made prepreg down in dry 5 minutes at 120 ℃.Remove 4 these prepregs at laminated metal foil 3 up and down, carried out extrusion forming 1 hour, make beyond the laminate of the bonded copper shown in Fig. 2 (a), make substrate similarly to Example 1 with 170 ℃, the condition of 2.45MPa.
The varnish impregnation that makes insualtion resin composition 1 is at the thick glass cloth of 0.2mm (weight per unit area 210g/m
2) in, made prepreg down in dry 5 minutes at 120 ℃.Remove 4 these prepregs at laminated metal foil 4 up and down, carried out extrusion forming 1 hour, make beyond the laminate of the bonded copper shown in Fig. 2 (a), make substrate similarly to Example 1 with 170 ℃, the condition of 2.45MPa.
The varnish impregnation that makes insualtion resin composition 2 is at the thick glass cloth of 0.2mm (weight per unit area 210g/m
2) in, made prepreg down in dry 5 minutes at 160 ℃.Remove 4 these prepregs at laminated metal foil 1 up and down, carried out extrusion forming 1 hour, make beyond the laminate of the bonded copper shown in Fig. 2 (a), make substrate similarly to Example 1 with 170 ℃, the condition of 2.45MPa.
The varnish impregnation that makes insualtion resin composition 2 is at the thick glass cloth of 0.2mm (weight per unit area 210g/m
2) in, made prepreg down in dry 5 minutes at 160 ℃.Remove 4 these prepregs at laminated metal foil 3 up and down, carried out extrusion forming 1 hour, beyond the laminate of making the bonded copper shown in Fig. 2 (a), make substrate similarly to Example 1 with 170 ℃, the condition of 2.45MPa.
The varnish impregnation that makes insualtion resin composition 3 is at the thick glass cloth of 0.2mm (weight per unit area 210g/m
2) in, made prepreg in dry 5 minutes at 160 ℃ of following universes.Remove 4 these prepregs at laminated metal foil 5 up and down, carried out extrusion forming 1 hour, make beyond the laminate of the bonded copper shown in Fig. 2 (a), make substrate similarly to Example 1 with 170 ℃, the condition of 2.45MPa.
The varnish impregnation that makes insualtion resin composition 3 is at the thick glass cloth of 0.2mm (weight per unit area 210g/m
2) in, made prepreg down in dry 5 minutes at 160 ℃.Remove 4 these prepregs at laminated metal foil 6 up and down, carried out extrusion forming 1 hour, make beyond the laminate of the bonded copper shown in Fig. 2 (a), make substrate similarly to Example 1 with 170 ℃, the condition of 2.45MPa.
The varnish impregnation that makes insualtion resin composition 3 is at the thick glass cloth of 0.2mm (weight per unit area 210g/m
2) in, made prepreg down in dry 5 minutes at 160 ℃.Remove 4 these prepregs at laminated metal foil 7 up and down, carried out extrusion forming 1 hour, make beyond the laminate of the bonded copper shown in Fig. 2 (a), make substrate similarly to Example 1 with 170 ℃, the condition of 2.45MPa.
Comparative example 1
Except that using metal forming 8, make substrate similarly to Example 1.
On metal forming 1 surface, using roll coater is the mode coating resin composition 1 of 50 μ m by dried thickness, makes the metal forming of the attaching resin that has carrier shown in Fig. 3 (a).
On the other hand, shown in Fig. 3 (b), (Hitachi Chemical Co., Ltd. makes will to be bonded with the laminate MCL-E-679 of glass cloth base material epoxy bonded copper of thickness 0.2mm of metal forming of thickness 18 μ m on the two sides, trade name) is used for insulating substrate, etching is removed it does not need local metal forming, pass through to form through hole 26 then with formation inner conductor circuit 24, thereby make inner layer circuit board 25.
Use MEC etch BOND CA-8100 (Merck Co., Ltd. makes, trade name) to press the condition of 0.15MP, to the processing of the inner conductor circuit 24 of this inner layer circuit board 25 processing of spraying with 35 ℃ of fluid temperatures, spraying.Then, make concavo-convex about copper surface asperities making roughness 3 μ m.Use MEC etch BOND CA-8300 (Merck Co., Ltd. makes, trade name) with 25 ℃ of fluid temperatures, the dip time condition dipping in 20 seconds, antirust processing is implemented on the copper surface.
Shown in Fig. 3 (c), will be by the metal forming of the attaching resin that has carrier of Fig. 3 (a) made, with 170 ℃, 30kgf/cm
2Condition heating pressurization lamination after, peel off Copper Foil as carrier.
Shown in Fig. 3 (d), (Sumitomo Heavy Industries, Ltd makes to use carbon dioxide to impact punch L-500 from Copper Foil, trade name), wear out the non-through hole 27 of diameter 80 μ m, under 70 ℃ of fluid temperatures, be immersed in the mixed aqueous solution of potassinm permanganate 65g/L and NaOH 40g/L 20 minutes, and carry out the removal of dirty bits.
Then, (Hitachi Chemical Co., Ltd. makes at palladium Solution H S-202B, trade name) in, flooded 15 minutes down at 25 ℃, after investing catalyst, use CUST-201 (Hitachi Chemical Co., Ltd. makes, trade name), carry out electroless copper with 25 ℃ of fluid temperatures, 30 minutes condition, shown in Fig. 3 (e), form the chemical plating copper layer 28 of thickness 0.3 μ m.
Shown in Fig. 3 (f); (Hitachi Chemical Co., Ltd. makes at chemical deposit 28 surface laminated dry film protective layer RY-3025; and, form electro-cladding 29 after the video picture trade name), by having sheltered the ultraviolet ray that exposes of the light shield of electroplating copper-plated place.
Shown in Fig. 3 (g), use copper sulphate to bathe, with 25 ℃ of liquid temperature, current density 1.0A/dm
2Condition electroplate the about 20 μ m of copper facing, by minimum circuit conductor width/circuit conductor at interval the mode of (L/S)=25/15 μ m form pattern and electroplate 30.
Secondly, shown in Fig. 3 (h), after use protective layer stripper HTO (Ni Jige Morton Co., Ltd. makes, trade name) removes dry film, use the H of 20g/L
2SO
4, 10g/L H
2O
2The etching solution of forming is removed pattern part copper in addition with etching.During etching, be single face 1dm with substrate cut
2Small pieces after, put into the beaker of 1L, use magnetic stirrer to implement etchings 5 minutes down at 40 ℃.At last, with the condition shown in the above-mentioned table 1 conductor circuit is implemented gold-plated 31 (as Fig. 3 (i)).Minimum circuit conductor width/circuit conductor is (L/S)=20/20 μ m at interval.
Remove metal forming 2 surperficial coating resin compositions 1, make beyond the metal forming of the attaching resin that has carrier, make substrate similarly to Example 16.
Remove metal forming 2 surperficial coating resin compositions 2, make beyond the metal forming of the attaching resin that has carrier, make substrate similarly to Example 16.
Remove metal forming 4 surperficial coating resin compositions 2, make beyond the metal forming of the attaching resin that has carrier, make substrate similarly to Example 16.
Remove metal forming 1 surperficial coating resin composition 3, make beyond the metal forming of the attaching resin that has carrier, make substrate similarly to Example 16.
Remove metal forming 2 surperficial coating resin compositions 3, make beyond the metal forming of the attaching resin that has carrier, make substrate similarly to Example 16.
Remove metal forming 3 surperficial coating resin compositions 3, make beyond the metal forming of the attaching resin that has carrier, make substrate similarly to Example 16.
Remove metal forming 4 surperficial coating resin compositions 3, make beyond the metal forming of the attaching resin of having carrier, make substrate similarly to Example 16.
Remove metal forming 3 surperficial coating resin compositions 1, make beyond the metal forming of the attaching resin that has carrier, make substrate similarly to Example 16.
Remove metal forming 4 surperficial coating resin compositions 1, make beyond the metal forming of the attaching resin that has carrier, make substrate similarly to Example 16.
Remove metal forming 1 surperficial coating resin composition 2, make beyond the metal forming of the attaching resin that has carrier, make substrate similarly to Example 16.
Remove metal forming 3 surperficial coating resin compositions 2, make beyond the metal forming of the attaching resin that has carrier, make substrate similarly to Example 16.
Remove metal forming 5 surperficial coating resin compositions 3, make beyond the metal forming of the attaching resin that has carrier, make substrate similarly to Example 16.
Remove metal forming 6 surperficial coating resin compositions 3, make beyond the metal forming of the attaching resin that has carrier, make substrate similarly to Example 16.
Remove metal forming 1 surperficial coating resin composition 2, make beyond the metal forming of the attaching resin that has carrier, make substrate similarly to Example 16.
Condition determination
(1) conductive surface roughness
According to JIS-B-0601, measure conductive surface roughness with the substrate of embodiment and comparative example gained.
(2) peel strength
To peel off width be the 1mm except that making, and measures the peel strength of conductor circuit of the substrate of embodiment and comparative example gained according to the condition of JIS-C-6481.Respectively behind the substrate manufacture, after 150 ℃ of heat runs, carry out 3 times behind the PCT (pressure cooker testing) and measure.Attenuate if will peel off width, then tend to take place easily the moisture absorption deterioration, peel strength is lower than what measured with the 10mm width.
150 ℃ of heat run samples
Embodiment and comparative example gained substrate were placed 240 hours 150 ℃ of following gas phases.
Pressure cooker testing (PCT test)
With embodiment and comparative example gained substrate under 121 ℃, placed 72 hours under the condition of 2 atmospheric pressure, humidity 100%.
(3) dielectric constant, dielectric dissipation factor
Make the solidfied material of insualtion resin composition 1～3, estimate dielectric property.Sample uses the superimposed and cure under pressure of resin side with the metal forming of the attaching resin of gained among the embodiment 16,18,20, then metal forming is given etched laminate.Pressurized conditions is decided to be 5 ℃/min of programming rate, 180 ℃ of solidification temperatures, 90 minutes hardening times, pressure 2.0MPa.The impedance material analyzer HP4291B that uses elegant Lie Tepaike Co., Ltd. to make measures dielectric constant and the dielectric dissipation factor under the 1GHz of resin cured matter of gained.
(4) conductor top width, interval width
Circuit conductor width/circuit conductor after the circuit that uses light microscope to take the substrate of embodiment and comparative example gained from top forms is (L/S) at interval, based on the data of handling through image, measures 20 points arbitrarily, calculates mean value.
The result
The result of conductive surface roughness, dielectric constant, dielectric dissipation factor, peel strength, conductor top width and the interval width of the substrate of expression embodiment 1～15 and comparative example 1 gained in the table 2.In addition, in the table 3 expression equally in the result of conductive surface roughness, dielectric constant, dielectric dissipation factor, peel strength, conductor top width and the interval width of the substrate of embodiment 16～30 gained.
From table 2 and table 3 as can be known, the conductor top width and the interval width of the substrate of embodiment 1～30 gained are roughly the same, form good circuit.Fig. 4,5 and 6 is the resin combinations 1,2 and 3 that use embodiment respectively, SEM (scanning type electron microscope) photo of the circuit of the substrate made of mode similarly to Example 1, can know in any of L/S=20/20 μ m, 25/25 μ m, 30/30 μ m circuit form be good.And particularly the initial stage peel strength of the substrate of making in embodiment 1～14,16～29 and flatness are all excellent, and then for embodiment 1～8,11,12,16～23,26,27, the peel strength after the heating is also excellent; For embodiment 1～8,16～23, the peel strength after the moisture absorption is also excellent.In addition, for embodiment 3,4,11,12,18,19,26 and 27, dielectric constant and dielectric dissipation factor are low, be suitable for the signal of telecommunication and need low-loss purposes, particularly, for embodiment 3,4,18 and 19, dielectric constant, dielectric dissipation factor and peel strength are very excellent.
On the other hand, owing on the metal forming roughened layer is arranged, need too much etching so that conductor napex width to attenuate, and conductive surface is coarse in the comparative example 1, also not preferred aspect electrical characteristics.
Below as can be known, the present invention can provide adaptation and the flatness of taking into account the interface between insualtion resin composition layer and metal forming, and the laminate of the bonding metal of relevant practical element in the time of can satisfying printed circuit board (PCB)s such as economy or operational processes and make, perhaps attach the metal forming of resin, moreover, can provide the laminate that uses this bonding metal or the metal forming that attaches resin, reliability and circuit form the few printed circuit board (PCB) of property excellence, conductor losses with and manufacture method.
Those skilled in the art should know that content noted earlier is a preferred forms of the present invention, can carry out a lot of changes and modification without prejudice to purport of the present invention and scope.
Claims (36)
1. metal forming that attaches resin, it has the insualtion resin composition layer and anchors at the one or both sides of described insualtion resin composition layer and the metal forming that forms, it is characterized in that, described insualtion resin composition layer is made of the insualtion resin composition that contains epoxy resin and potentiality curing agent, at least the insualtion resin composition layer side of described metal forming carried out surface treatment, and handle without roughening in fact on the two sides of described metal forming.
2. the metal forming of the attaching resin of putting down in writing according to claim 1, wherein, for the surface roughness Rz of described metal forming, the two sides is 2.0 μ m or following.
3. the metal forming of the attaching resin of being put down in writing according to claim 1 or 2, wherein, the thickness of described metal forming is 3 μ m or following.
4. the metal forming of the attaching resin of putting down in writing according to claim 1, wherein, the interface roughness Rz between described insualtion resin composition layer and described metal forming is 2.0 μ m or following.
5. the metal forming of the attaching resin of putting down in writing according to claim 1, wherein, described surface treatment is that antirust processing, chromate are handled, any or its combination of silane coupling in handling.
6. the metal forming of the attaching resin of putting down in writing according to claim 5, wherein, described antirust processing is used any or its alloy in nickel, tin, zinc, chromium, molybdenum, the cobalt and is carried out.
7. the metal forming of the attaching resin of putting down in writing according to claim 5, wherein, by being that the metal of main component carries out described antirust processing with nickel.
8. the metal forming of the attaching resin of putting down in writing according to claim 5 wherein, is not only implemented described antirust processing, and implements chromate and handle.
9. the metal forming of the attaching resin of putting down in writing according to claim 5 wherein, is implemented described silane coupling at the outermost layer of described metal forming and is handled.
10. the metal forming of the attaching resin of putting down in writing according to claim 5 wherein, is used for the silane coupling agent that described silane coupling handles and carries out chemical reaction by heating meeting and described insualtion resin composition.
11. the metal forming of the attaching resin of putting down in writing according to claim 5 wherein, is used for the silane coupling agent that described silane coupling handles and contains amino functional silane.
12. the metal forming of the attaching resin of putting down in writing according to claim 1, wherein, described epoxy resin contains and is liquid epoxy resin at normal temperatures.
13. the metal forming of the attaching resin of putting down in writing according to claim 1, wherein, the dielectric constant of described insualtion resin composition under 1GHz after the curing be 3.0 or below, perhaps dielectric dissipation factor be 0.01 or below.
14. the laminate of a bonding metal, it has the insualtion resin composition layer and anchors at the one or both sides of described insualtion resin composition layer and the metal forming that forms, it is characterized in that, described insualtion resin composition layer is to form by flooding on base material or being coated with the insualtion resin composition that contains epoxy resin and potentiality curing agent, at least the insualtion resin composition layer side of described metal forming carried out surface treatment, and handle without roughening in fact on the two sides of described metal forming.
15. the laminate of the bonding metal of putting down in writing according to claim 14, wherein, for the surface roughness Rz of described metal forming, the two sides is 2.0 μ m or following.
16. according to the laminate of claim 14 or 15 bonding metals of being put down in writing, wherein, the thickness of described metal forming is 3 μ m or following.
17. the laminate of the bonding metal of putting down in writing according to claim 14, wherein, the interface roughness Rz between described insualtion resin composition layer and described metal forming is 2.0 μ m or following.
18. the laminate of the bonding metal of putting down in writing according to claim 14, wherein, described surface treatment is that antirust processing, chromate are handled, any or its combination of silane coupling in handling.
19. the laminate of the bonding metal of putting down in writing according to claim 18, wherein, described antirust processing is used any or its alloy in nickel, tin, zinc, chromium, molybdenum, the cobalt and is carried out.
20. the laminate of the bonding metal of putting down in writing according to claim 18, wherein, by being that the metal of main component carries out described antirust processing with nickel.
21. the laminate of the bonding metal of putting down in writing according to claim 18 wherein, is not only implemented antirust processing, and implements chromate and handle.
22. the laminate of the bonding metal of putting down in writing according to claim 18 wherein, is implemented described silane coupling at the outermost layer of described metal forming and is handled.
23. the laminate of the bonding metal of putting down in writing according to claim 18 wherein, is used for the silane coupling agent that described silane coupling handles and carries out chemical reaction by heating meeting and described insualtion resin composition.
24. the laminate of the bonding metal of putting down in writing according to claim 18 wherein, is used for the silane coupling agent that described silane coupling handles and contains amino functional silane.
25. according to the laminate of each bonding metal of putting down in writing in the claim 14～24, wherein, it is liquid epoxy resin at normal temperatures that described epoxy resin contains.
26. the laminate of the bonding metal of putting down in writing according to claim 14, wherein, the dielectric constant of described insualtion resin composition under 1GHz after the curing be 3.0 or below, perhaps dielectric dissipation factor be 0.01 or below.
27. a printed circuit board (PCB) is characterized in that, uses the laminate of the metal forming of the attaching resin that claim 1 puts down in writing and/or the bonding metal that claim 14 is put down in writing and makes.
28. according to the printed circuit board (PCB) that claim 27 is put down in writing, wherein, the surface roughness Rz of conductor circuit is 2.0 μ m or following.
29. according to claim 27 or 28 printed circuit board (PCB)s of being put down in writing, wherein, the peel strength between the conductor circuit of described insualtion resin composition layer and width 1mm be 0.6kN/m or more than.
30. the printed circuit board (PCB) of putting down in writing according to claim 27, wherein, 150 ℃ down heating after 240 hours described insualtion resin composition layer and the peel strength between the conductor circuit of width 1mm be 0.4kN/m or more than.
31. the manufacture method of a printed circuit board (PCB), its metal forming with laminate of the bonding metal of putting down in writing by the metal forming of the attaching resin that claim 1 is put down in writing and/or claim 14 is electroplated the operation of making conductor circuit as the pattern of feed layer.
32. the manufacture method of the printed circuit board (PCB) of putting down in writing according to claim 31 wherein, forms chemical deposit on described metal forming.
33. the manufacture method of the printed circuit board (PCB) of putting down in writing according to claim 31, wherein, form conductor circuit after, when described metal forming as feed layer is removed in etching, use the etching solution that constitutes chemical reaction rule speed.
34. the manufacture method of the printed circuit board (PCB) of putting down in writing according to claim 33, wherein, described etching solution contains the acid that do not contain halogen element and hydrogen peroxide as main component.
35. the manufacture method of the printed circuit board (PCB) of putting down in writing according to claim 34, wherein, the described acid that does not contain halogen element is sulfuric acid.
36. the manufacture method of the printed circuit board (PCB) of putting down in writing according to claim 35, wherein, the concentration of described sulfuric acid is that the concentration of 5～300g/L, described hydrogen peroxide is 5～200g/L.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002058162 | 2002-03-05 | ||
| JP2002058162 | 2002-03-05 | ||
| JP2002091885 | 2002-03-28 | ||
| JP2002136052 | 2002-05-10 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB038051885A Division CN100488766C (en) | 2002-03-05 | 2003-03-05 | Metal foil with resin and metal-clad laminate, and printed wiring board using the same and method for production thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101259768A true CN101259768A (en) | 2008-09-10 |
Family
ID=37596766
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2008100096704A Pending CN101259769A (en) | 2002-03-05 | 2003-03-05 | Resin coated metal foil, laminate, manufacturing method thereof, and printed wiring board using them |
| CN 200610101802 Pending CN1891453A (en) | 2002-03-05 | 2003-03-05 | Resin coated metal foil, metal-clad laminate, printed wiring board using the same, and its manufacturing process |
| CNA2008100096691A Pending CN101259768A (en) | 2002-03-05 | 2003-03-05 | Resin coated metal foil, laminate, manufacturing method thereof, and printed wiring board using them |
Family Applications Before (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2008100096704A Pending CN101259769A (en) | 2002-03-05 | 2003-03-05 | Resin coated metal foil, laminate, manufacturing method thereof, and printed wiring board using them |
| CN 200610101802 Pending CN1891453A (en) | 2002-03-05 | 2003-03-05 | Resin coated metal foil, metal-clad laminate, printed wiring board using the same, and its manufacturing process |
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| CN (3) | CN101259769A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102794948A (en) * | 2011-05-27 | 2012-11-28 | 洋盟国际股份有限公司 | Method for forming complex of plastics and metal and finished product of complex of plastics and metal |
| CN105393647A (en) * | 2013-05-31 | 2016-03-09 | 住友电气工业株式会社 | High-frequency printed circuit board and wiring material |
| JP6601675B2 (en) | 2016-01-14 | 2019-11-06 | パナソニックＩｐマネジメント株式会社 | Metal-clad laminate and resin-coated metal foil |
-
2003
- 2003-03-05 CN CNA2008100096704A patent/CN101259769A/en active Pending
- 2003-03-05 CN CN 200610101802 patent/CN1891453A/en active Pending
- 2003-03-05 CN CNA2008100096691A patent/CN101259768A/en active Pending
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| Publication number | Publication date |
|---|---|
| CN1891453A (en) | 2007-01-10 |
| CN101259769A (en) | 2008-09-10 |
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Application publication date: 20080910 |