CN101251721A - Developing spray nozzle structure and method for spraying developing solution - Google Patents
Developing spray nozzle structure and method for spraying developing solution Download PDFInfo
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- CN101251721A CN101251721A CNA2008100914017A CN200810091401A CN101251721A CN 101251721 A CN101251721 A CN 101251721A CN A2008100914017 A CNA2008100914017 A CN A2008100914017A CN 200810091401 A CN200810091401 A CN 200810091401A CN 101251721 A CN101251721 A CN 101251721A
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Abstract
The invention provides a developing nozzle structure and a method for spray coating developing solution. The developing nozzle structure comprises a nozzle cavity and a valve system, wherein, the nozzle cavity is provided with a first chamber, a second chamber which is positioned under the first chamber, an injection pipe which supplies the developing solution and injects the developing solution into the second chamber, and a spray coating pipe which is communicated with the second chamber and positioned under the second chamber; the valve system is arranged between the first chamber and the second chamber; when the valve system is opened, air bubbles in the developing solution enter into and concentrate in the first chamber; when the valve system is closed, the air bubbles in the first chamber are isolated from the developing solution in the second chamber, and the developing solution in the second chamber is sprayed out through the spray coating pipe. In this way, the air bubbles which are brought out to a panel along with the developing solution are greatly reduced, thereby the technological efficiency can be improved.
Description
Technical field
The invention relates to the method for a kind of developing nozzle structure and spraying developer solution, the particularly a kind of developing nozzle structure of semiconductor element making and method of spraying developer solution of applying to.
Background technology
General active-matrix film transistor type LCD (Active matrix thin filmtransistor liquid crystal display) promptly is to utilize thin film transistor (TFT) or similar active member (Activeelement) to produce electric field so that liquid crystal (LC) turns to, and then the travel direction of control light.The making of the type Thin Film Transistor-LCD approximately can be generalized into three sections main manufacturing process: liquid crystal born of the same parents (Cell) manufacturing process in the transistor array of leading portion (Array) manufacturing process, stage casing and the module structure of back segment dress (ModuleAssembly) manufacturing process, wherein transistor array (Array) manufacturing process be therein a substrate (as glass substrate) surface form several be thin film transistor (TFT)s that array (Array) arranges (Thin film transistor, TFT).If do further segmentation according to the order of automated manufacturing, this transistor array (Array) manufacturing process at least also comprises substrate film forming, photoresistance coating (Resist Coating), exposure (Exposure), develop (Development) and etching technologies such as (Etch), wherein expose and yellow light is used in the perform region of two manufacturing process of developing, therefore this exposure and two manufacturing process of developing generally can be loosely referred to as " gold-tinted section " or some wherein.Exposure technology is to utilize ultraviolet light to form on the photoresist layer of substrate via mask (Reticle) to cover the marking; Again via this developing process, be about to developer solution and evenly be sprayed on the photoresist layer of substrate, utilize developer solution remove by masking film or not by the portions of light resistance layer of masking film (according to just/the commissure characteristic decision of negative photoresist) be apparent on the photoresist layer of substrate with pattern mask.
A kind of known developer solution nozzle (Developer Nozzle) 10 shown in Figure 1A is used in the developing process of substrate 180 being carried out the gold-tinted section of transistor array manufacturing process.When developer solution 100 injects in the nozzle chamber 12 via each injection channel 14 of nozzle 10 tops, because nozzle chamber 12 inner and upper are a horizontal structure, many minute bubbles 102 that this developer solution 100 is produced when injecting can rise gradually, until accumulating and interspersing among nozzle chamber 12 inner and upper.The design of the known developer solution nozzle 10 of this kind, difficult bubble 102 is concentrated discharged smoothly from each vent port (Air Vent) 16 belows of nozzle chamber 12, but need wait until state shown in Figure 1B, promptly when being accumulated as large-scale or a large amount of bubble 102 in nozzle chamber 12 inside, just might discharge from vent port 16.In a single day accumulate a large amount of bubbles 102 in nozzle chamber 12, these bubbles 102 are easier of developer solution 100 is sprayed on the substrate 180 (shown in Fig. 1 C); Owing to may causing developing, these bubbles 102 not exclusively influence follow-up etching technics.That is, if nozzle 10 allows too much bubble 102 along with developer solution 100 is brought on the substrate 180, can cause poor visualization, have a strong impact on process yield, needing afterwards, heavy industry causes spending unnecessary time and cost.Get rid of bubble though known developer solution nozzle 10 can maintain by regular board, carry out because be mostly manual type, when many boards need maintain, both spended time took human cost again, and process efficiency is not good.
Summary of the invention
For solving the shortcoming of aforementioned prior art, the object of the present invention is to provide the method for a kind of developing nozzle structure and spraying developer solution, can in developing process, reduce the number of bubbles that is sprayed to panel with developer solution, and can be immediately and reduce the process loss that produces because of bubble on one's own initiative and promote process efficiency, need not will regularly to carry out board with manual type and maintain and get rid of bubble as the known nozzle structure.
For reaching the foregoing invention purpose, the present invention discloses a kind of developing nozzle structure, comprising: nozzle chamber, ascending pipe, spray pipe and valve system.Is separated into two parts up and down by valve system in this nozzle chamber, promptly one first Room and be positioned at first Room under one second Room.This ascending pipe is positioned at nozzle chamber top, is used to provide developer solution to inject that this is second indoor.This spray pipe is positioned at this below, second Room to be communicated with this second Room.This valve system, be arranged between this first Room and this second Room, when this valve system is opened, bubble in the developer solution can enter and concentrate on that this is first indoor via valve system, but when this valve system is closed, the bubble of this first Room and the developer solution of second Room can be isolated, and the developer solution of second Room outwards sprays via this spray pipe.And the said nozzle structure can cooperate bubble delivery pipe and the auxilliary ascending pipe that is communicated with first Room, utilizes auxilliary ascending pipe supply developer solution to inject first Room, and the bubble of first Room is outwards discharged via the bubble delivery pipe.Concentrated by bubble and to be taken to the first indoor and isolate of the nozzle chamber first half with second Room, can guarantee when developer solution injects second Room that the bubble of first Room can not run helter-skelter and be brought to second Room, but discharge smoothly, so can reduce bubble along with developer solution is taken out of to panel via the bubble delivery pipe.
In addition, the present invention also discloses a kind of method that sprays developer solution, apply to a developing nozzle, and this developing nozzle has one first Room, in one second Room under it, below this second Room and a spray pipe that is communicated with this second Room and a valve system be arranged between first Room and second Room, this method comprises the following steps:
Making developer solution be full of this first Room and this second Room and control this valve system is opening, makes the bubble of this second indoor developer solution enter and concentrate on this first Room;
When sensing a panel, close this valve system;
The control developer solution injects this second Room, and the bubble in the developer solution of this second Room and this first Room is isolated; And
The developer solution of controlling this second Room outwards sprays this panel from this spray pipe, and when the developer solution spraying was finished, the control developer solution stopped to inject this second Room.Inject this first Room to discharge the bubble of this first Room and when the control developer solution injects this second Room, go back the may command developer solution.
By this, can significantly reduce bubble along with developer solution is taken out of to panel, so can promote process efficiency.
In order to make above-mentioned and other purposes of the present invention, feature and advantage more obvious, inventive embodiment cited below particularly, and cooperate appended diagram, be described below in detail.
Description of drawings
Figure 1A, Figure 1B and Fig. 1 C figure are the structural representations that shows known developing nozzle.
Fig. 2 A figure shows a kind of synoptic diagram of the developing nozzle structure according to the first embodiment of the present invention, shows that wherein valve system is a closed condition.
Fig. 2 B figure shows according to the synoptic diagram of the developing nozzle structure of the first embodiment of the present invention, shows that wherein valve system is an opening.
Fig. 3 figure shows the synoptic diagram according to the developing nozzle structure of the second embodiment of the present invention, shows that wherein valve system is an opening.
Fig. 4 shows the method flow diagram of a kind of foundation spraying developer solution of the present invention.
Drawing reference numeral:
20,50 developing nozzle structures, 22 nozzle chambers
24 bubble delivery pipes, 26 ascending pipes
27 auxilliary ascending pipe 28 spray pipes
30,52 valve systems, 40,41,42 solenoid valves
200 panels, 210 developer solutions
212,512 bubbles Room 221,521 first
Room 223,523 second 522 semilune guidance parts
524 triangle guidance parts, 2231,5231 baffle plates
S600, S602, S604, S606, S608, S610 is all method step
Embodiment
At first shown in Fig. 2 A and Fig. 2 B, developing nozzle structure 20 for the preferred embodiment of the present invention of a kind of foundation, it is applicable to the developing process of film transistor type panel of LCD 200 with the gold-tinted section of execution transistor array technology, and this developing nozzle structure 20 mainly comprises: nozzle chamber 22, several bubble delivery pipes 24, several ascending pipes 26, one auxilliary ascending pipe 27, several spray pipes 28 and several valve systems 30.
These nozzle chamber 22 inside are separated into two parts up and down by these several side by side valve system 30, i.e. one first Room 221 and be positioned at one second Room 223 under first Room 221, the purpose of its separation is utilize liquid and gas density different, make gas up floating, so the bubble 212 that produces when developer solution 210 injects will rise and concentrate in first Room 221 of these nozzle chamber 22 first halves, afterwards can closed shutter device 30 with separation bubble 212 in first Room 221 in and can when developer solution 210 injects, not have bubble 212 to run helter-skelter (shown in Figure 1A, to treat the back detailed description) in second Room 223.In addition, in these 223 inside, second Room, contiguous each ascending pipe 26 outlet part, several landscape configuration that distributed and the baffle plate of separating mutually 2231, the developer solution 210 that is used to prevent second Room 223 bubble in the developer solution 210 when the outside sprayed panel 200 of spray pipe 28 directly is brought to panel 200.
These several ascending pipes 26 are formed at nozzle chamber 22 tops, and wherein an end is from the cavity 22 outside developer solutions 210 that inject, and another opposite end extends into this second Room 223 via this first Room 221 and stores developer solution 210 for this second Room 223.These several bubble delivery pipes 24 are to be communicated with this first Room 221 to discharge the bubble 212 that accumulates in this first Room 221 to cavity 22 outsides.
Should assist ascending pipe 27, be formed at nozzle chamber 22 sides, and be communicated with this first Room 221, and assist the bubble 212 of these bubble delivery pipe these first Room 221 of discharging 24 with in supply developer solution these first Room 221 of injection 210.This is because valve system 30 when closing, first Room 221 can become a confined space, so needs and should inject developer solutions 210 by auxilliary ascending pipe 27, allows first Room, 221 interior air discharge smoothly, avoiding first Room 221 to produce vacuum states, and bubble 212 can't be discharged.
These several spray pipes 28 are formed at 223 belows, second Room of this cavity 22 and are communicated with this second Room 223, are used to allow second Room, the 223 interior developer solutions 210 that store be sprayed into the upper surface of panel 200.
This valve system 30 is arranged between first Room 221 and this second Room 223 of this nozzle chamber 22.Shown in Fig. 2 B, when these valve system 30 controlled unlatchings, developer solution 210 injects first Room 221 and injects second Room 223 via this ascending pipe 26 via this auxilliary ascending pipe 27 respectively, may produce some bubbles 212 this moment, and these bubbles 212 can enter and concentrate on this first Room, 221 inner and upper via the valve system of opening 30; Shown in Fig. 2 A, when these valve system 30 controlled closing, the bubble 212 of these 221 inside, first Room and the developer solution 210 of second Room 223 can be isolated, do not circulated mutually in this two Room 221 and 223, and the developer solution 210 in second Room 223 is sprayed at panel 200 upper surfaces via this spray pipe 28, utilize this auxilliary ascending pipe 27 with the developer solution 210 that injects simultaneously, with the bubble 212 in this first Room 221 via this bubble delivery pipe 24 to outside drain.Concentrated by bubble 212 in first Room 221 of taking nozzle chamber 22 first halves to and isolated with second Room 223, can guarantee that so developer solution 210 does not have bubble 212 when injecting second Room 223 and runs helter-skelter, but discharge smoothly, so can reduce bubble 212 along with developer solution 210 is taken out of to the chance of panel 200 via bubble delivery pipe 24.
Shown in Fig. 2 A and Fig. 2 B, this ascending pipe 26 of relevant controlling, auxilliary ascending pipe 27 injects respectively or stops to inject developer solution 210 to this second Room 223 and this first Room 221, this bubble delivery pipe 24 outwards discharges or stops to discharge bubble 212, the keying of this valve system 30 all has its sequencing and relevance, similarly be that valve system 30 is when closing, this ascending pipe 26 needs to open and injects developer solution Room 223 210 to second in order to spray pipe 28 spraying developer solutions 210, auxilliary ascending pipe 27 need to open inject developer solution 210 to this first Room 221 and this bubble delivery pipe 24 open outwards discharging bubble 212, but before spray pipe 28 is finished the sprinkling of developing (is 20 seconds as the development spraying time), this bubble delivery pipe 24 needs to close earlier outside discharging bubble 212 (only establishing 5 seconds as discharging the bubble time) again, and this a succession of start all can utilize existing Automatic Control Component to be carried out.For example can utilize solenoid valve 40,41 and aforementioned each element 24 of 42 controls, 26 and 27 keying, and valve system 30 itself promptly can be considered a solenoid valve, and utilize Programmable Logic Controller (PLC) to arrange the keying sequential of each solenoid valve 40,41 and 42 according to default parameter, but this only is the embodiment of one of them, does not therefore limit scope of the present invention.
Other please refer to Fig. 3, it is developing nozzle structure 50 for the foundation second embodiment of the present invention, itself and the first embodiment difference are: the below of the valve system 52 of the developing nozzle structure 50 of second embodiment forms a semilune guidance part 522 or a triangle guidance part 524, the bubble 512 that is used for quickening guiding second Room 523 is isolated to concentrate to enter in first Room 521 by the valve system of opening 52, and the baffle plate 5231 of arranging in pairs or groups by this is to prevent that the bubble in the developer solution from directly being taken on the panel.Because of all the other elements of second embodiment are all identical with first embodiment, so do not repeat them here.
In addition, as shown in Figure 4, the present invention also discloses a kind of method that sprays developer solution, is convenient and understands, and please cooperate with reference to the developing nozzle 20 shown in figure 2A and Fig. 2 B to understand following each step:
Step S600, control ascending pipe 26 injects developer solution 210, be opening (shown in Fig. 2 B) so that developer solution 210 is full of this second Room 223 and controls this valve system 30, make the bubble 212 of developer solution 210 in this second Room 223 enter and concentrate on this first Room 221 via this valve system 30;
Step S602 when sensing a panel 200 and enter, begins to prepare to develop;
Step S604 closes this valve system 30 (shown in Fig. 2 A), and the developer solution 210 and the bubble 212 in this first Room 221 of this second Room 223 are isolated;
Step S606, control ascending pipe 26 inject developer solutions 210 to this second Room 223, the auxilliary ascending pipe 27 of control inject developer solutions 210 to this first Room 221, control bubble delivery pipe 24 opens so that the bubble 212 of this first Room 221 outwards discharge via this bubble delivery pipe 24, and the developer solution 210 of controlling this second Room 223 outwards sprays these panels 200 from this spray pipe 28;
Step S608, before spray pipe 28 spraying developer solutions 210 were finished, according to the default time, control bubble delivery pipe 24 was closed and is controlled to assist into pipe 27 and stops to inject developer solution 210 to this first Room 221; And
Step S610, when spray pipe 28 spraying developer solutions 210 were finished, control ascending pipe 26 stopped to inject developer solution 210 to this second Room 223; Then get back to step S600, to wait for that the next panel 200 enters.
In sum, the method of developing nozzle structure of the present invention and spraying developer solution, can in developing process, reduce the number of bubbles that is sprayed to panel with developer solution, and can be immediately and reduce the process loss that produces because of bubble on one's own initiative, promoting process efficiency, maintain and get rid of bubble so need not regularly to carry out board with manual type as the known nozzle structure.
The above only is a better embodiment of the present invention, and the equivalence that all those skilled in the art do according to spirit of the present invention is modified or changed, and all is covered by in the claim scope.
Claims (16)
1. a developing nozzle structure is characterized in that, described developing nozzle structure comprises:
One nozzle chamber has one first Room, is positioned at one second Room under it, ascending pipe supply developer solution injects described second indoorly, and is communicated with described second Room and is positioned at a spray pipe below described second Room; And
One valve system, be arranged between described first Room and described second Room, when described valve system is opened, bubble in the developer solution enters and concentrates on described first Room, when described valve system is closed, the developer solution of the bubble of described first Room and second Room is isolated, and the developer solution of second Room outwards sprays via described spray pipe.
2. developing nozzle structure as claimed in claim 1, it is characterized in that described developing nozzle structure also comprises a bubble delivery pipe, it is communicated with described first Room, when described valve system was closed, the bubble in described first Room outwards discharged via described bubble delivery pipe.
3. developing nozzle structure as claimed in claim 2 is characterized in that, described developing nozzle structure also comprises an auxilliary ascending pipe, and it is communicated with described first Room and supplies developer solution and inject described first Room, to assist the bubble of described first Room of discharging.
4. developing nozzle structure as claimed in claim 1 is characterized in that, an end of described ascending pipe extends into described second Room with the supply developer solution via described first Room.
5. developing nozzle structure as claimed in claim 3 is characterized in that, the open and close of described ascending pipe, described auxilliary ascending pipe and described bubble delivery pipe are to utilize solenoid control.
6. developing nozzle structure as claimed in claim 1 is characterized in that, described valve system is solenoid valve or mechanism's valve.
7. as claim 5 or 6 described developing nozzle structures, it is characterized in that the keying sequential system of described solenoid valve utilizes control element able to programme according to default parameter control.
8. developing nozzle structure as claimed in claim 1 is characterized in that, described second chamber interior further has a plurality of baffle plates and be used to prevent that the developer solution of second Room from taking the bubble in the developer solution out of in the lump when spray pipe outwards sprays.
9. method that sprays developer solution, apply to a developing nozzle, and described developing nozzle has one first Room, in one second Room under it, below described second Room and a spray pipe that is communicated with described second Room and a valve system be arranged between first Room and second Room, it is characterized in that described method comprises the following steps:
Making developer solution be full of described first Room and described second Room and make described valve system is opening, makes the bubble of the described second indoor developer solution enter and concentrate on described first Room;
When sensing a panel, close described valve system;
The control developer solution injects described second Room, and the bubble in the developer solution of described second Room and described first Room is isolated; And
The developer solution of controlling described second Room outwards sprays described panel from described spray pipe, and when the developer solution spraying was finished, the control developer solution stopped to inject described second Room.
10. method as claimed in claim 9 is characterized in that, described method comprises utilizes a bubble delivery pipe that the bubble in described first Room is outwards discharged via described bubble delivery pipe.
11. method as claimed in claim 10 is characterized in that, described bubble delivery pipe is to utilize solenoid control with outside discharging bubble or stop to discharge bubble.
12. method as claimed in claim 9 is characterized in that, described control developer solution injects or stops to inject described first Room and described second Room is to utilize solenoid control.
13. method as claimed in claim 9 is characterized in that, described valve system is solenoid valve or mechanism's valve.
14., it is characterized in that the keying sequential of described each solenoid valve is to utilize control element able to programme to control according to default parameter as claim 11,12 or 13 described methods.
15. method as claimed in claim 9 is characterized in that, comprises also that when the control developer solution injects described second Room control developer solution injects described first Room to discharge the bubble of described first Room.
16. method as claimed in claim 15 is characterized in that, comprises also that before the developer solution spraying is finished the control developer solution stops to inject described first Room.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008100914017A CN101251721B (en) | 2008-04-14 | 2008-04-14 | Developing spray nozzle structure and method for spraying developing solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008100914017A CN101251721B (en) | 2008-04-14 | 2008-04-14 | Developing spray nozzle structure and method for spraying developing solution |
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| Publication Number | Publication Date |
|---|---|
| CN101251721A true CN101251721A (en) | 2008-08-27 |
| CN101251721B CN101251721B (en) | 2010-09-01 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008100914017A Expired - Fee Related CN101251721B (en) | 2008-04-14 | 2008-04-14 | Developing spray nozzle structure and method for spraying developing solution |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103698986A (en) * | 2013-12-23 | 2014-04-02 | 清华大学深圳研究生院 | Sharp nozzle slit type technical nozzle of outflow structure |
| CN106842832A (en) * | 2017-02-16 | 2017-06-13 | 深圳市华星光电技术有限公司 | Fumer and gold-tinted processing procedure developing apparatus for developing apparatus |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5429912A (en) * | 1993-08-02 | 1995-07-04 | Chartered Semiconductor Manufacturing Pte Ltd. | Method of dispensing fluid onto a wafer |
| JP4627681B2 (en) * | 2005-04-20 | 2011-02-09 | 芝浦メカトロニクス株式会社 | Substrate processing apparatus and processing method |
-
2008
- 2008-04-14 CN CN2008100914017A patent/CN101251721B/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103698986A (en) * | 2013-12-23 | 2014-04-02 | 清华大学深圳研究生院 | Sharp nozzle slit type technical nozzle of outflow structure |
| CN103698986B (en) * | 2013-12-23 | 2016-04-27 | 清华大学深圳研究生院 | A kind of sharp mouth slit goes out flow structure technique nozzle |
| CN106842832A (en) * | 2017-02-16 | 2017-06-13 | 深圳市华星光电技术有限公司 | Fumer and gold-tinted processing procedure developing apparatus for developing apparatus |
| CN106842832B (en) * | 2017-02-16 | 2020-04-10 | 深圳市华星光电技术有限公司 | Exhaust box for developing equipment and yellow light process developing equipment |
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| Publication number | Publication date |
|---|---|
| CN101251721B (en) | 2010-09-01 |
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