CN101251720A - Automatic developing apparatus and method - Google Patents
Automatic developing apparatus and method Download PDFInfo
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- CN101251720A CN101251720A CNA2008100811453A CN200810081145A CN101251720A CN 101251720 A CN101251720 A CN 101251720A CN A2008100811453 A CNA2008100811453 A CN A2008100811453A CN 200810081145 A CN200810081145 A CN 200810081145A CN 101251720 A CN101251720 A CN 101251720A
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Abstract
The invention provides an automatic developing device, which at least comprises a developing solution input unit, a developing unit and a roller wheel substrate transfer unit, wherein, the developing solution input unit is provided with a developing solution input pipe and a developing solution flow measurement unit and a developing solution flow adjustment unit which are connected with the developing solution input pipe; the developing unit is born by a first balancing pedestal and a second balancing pedestal. The automatic developing device also comprises a narrow strip fluid input pipe, a gradually extended fluid nozzle, a compressed air input pipe, an air pressure measuring unit, an air pressure adjusting unit, and a computer control unit, wherein, the fluid input pipe consists of the first balancing pedestal and the second balancing pedestal and is connected with the developing solution input pipe; the compressed air input pipe is connected with the fluid input pipe; the air pressure measuring unit and the air pressure adjusting unit are connected with the compressed air input pipe; the computer control unit is connected with the air pressure measuring unit, the air pressure adjusting unit, the developing solution flow measurement unit and the developing solution flow adjustment unit.
Description
Technical field
The present invention relates to a kind of developing apparatus and developing method, particularly a kind of automatic developing device and automatic developing method.
Background technology
The photoetching process of LCD and semiconductor device manufacturing is: go up coating photoresist (resist working procedure of coating) at processed substrate (glass substrate, semiconductor chip), after processing mask pattern (exposure process) on the resist, make the photographic department or the non-photographic department of resist in developer solution, dissolve (developing procedure) selectively, form the resist pattern at substrate surface.
Referring to Figure 1A, existing developing apparatus is the double-developing designs of nozzles, developing nozzle 13 ' and back developing nozzle 14 ' before comprising, and these two nozzles will spill from the developer solution of pipeline 16 on the substrate 11 to the delivery roller 12.Referring to Figure 1B, existing developing apparatus nozzle is by left balance bearing 23 ' and the 24 ' supporting of right balance bearing, nozzle interior is used flow blocking piece 22 ', this flow blocking piece 22 ' is used to avoid in the future, and the developer solution of autography liquid intake line 25 ' directly flow to glass substrate in a large number, cause some zone of substrate inequality of may developing, but because the developer solution viscosity coefficient is very high, therefore may stopping owing to flow blocking piece 22, and at the inner bubble that forms of developing apparatus, cause to produce the development air blister defect on the substrate, the subregional resist of baseplate part can't be dissolved.
Chinese patent application number discloses a kind of developing method and developing apparatus of photoresist for CN200510082200.7, and it utilizes developer solution to mix with gas and generates vaporific developer solution, but this device still is easy to cause the development air blister defect on substrate.
Summary of the invention
For solving the existing in prior technology defective, the invention provides a kind of automatic developing device and automatic developing method.
The present invention solves its technical matters and realizes by the following technical solutions.
A kind of automatic developing device, at least comprise developer solution input block, developing cell and roller substrate transferring unit, the developer solution input block has developer solution intake line and the developer solution flow measurement unit and the developer solution flow regulating unit that are connected with this developer solution intake line, developing cell is by the first balance bearing and the second balance bearing support, described automatic developing device also comprises: by narrow strip fluid input tube road and flaring shape fluid tip that the first balance bearing and the second balance bearing constitute, this fluid input tube road is connected with the developer solution intake line; The pressurized air intake line that is connected with this fluid input tube road; The gas pressure measurement unit and the gas pressure regulating unit that are connected with this pressurized air intake line; And with described gas pressure measurement unit, gaseous tension regulon, developer solution flow measurement unit, the computer control unit that is connected with the developer solution flow regulating unit.
The described first balance bearing and the second balance bearing are symmetrical structure.
The present invention provides a kind of automatic developing method simultaneously, comprises the steps:
The roller substrate transferring unit is sent to computer control unit with the signal that substrate sensor senses;
Computer control unit output preset value is to developer solution flow regulating unit and gas pressure regulating unit, with the flow and the compressed-air actuated gaseous tension of the developer solution of control intake line;
Developer solution flow measurement unit and gas pressure measurement cell are measured the flow and the air pressure of the developer solution of importing respectively, and the value that will record is sent to computer control unit;
The computer control unit record also refreshes above-mentioned data, and calculate pressure difference value and flow difference in the certain hour, and computer control unit is sent to developer solution flow regulating unit and gas pressure regulating unit with this pressure difference value and flow difference;
Developer solution flow regulating unit and gas pressure regulating unit increase or reduce the flow and the compressed-air actuated gaseous tension of developer solution according to the data that computer control unit transmitted.
Described preset value has several; The signal that described substrate sensor senses not simultaneously, it is also different that computer control unit exports the preset value of developer solution flow regulating unit and gas pressure regulating unit to.
The present invention has the fluid tip of fillet shape fluid input tube road and gradual-enlargement type shape fluid tip by employing, for substrate provides uniform ultra micro vaporific drop; Adopt computer control and backfeed loop connected mode, not only can improve the precision of measurement, and can prevent the variation that external interference brings for flow and pressure.
Description of drawings
Figure 1A, Figure 1B show the structural representation of existing developing apparatus.
Fig. 2 shows the structural representation of the developing apparatus of utilization preferred embodiment according to the present invention.
Fig. 3 shows the process of the developing apparatus output developer solution of the preferred embodiment according to the present invention;
Fig. 4 shows that the signal flow of toning system of developing apparatus of utilization preferred embodiment according to the present invention is to synoptic diagram.
Embodiment
Can become apparent about foregoing of the present invention for allowing, a preferred embodiment cited below particularly, and cooperate appended graphicly, elaborate.
Among the figure, 11. developer solution intake lines, 12. developer solution flow measurement unit, 13. developer solution flow regulating unit, 14. the pressurized air intake line, 15. gas pressure measurement unit, 16. gaseous tension regulons, 17. computer control unit, 200. developing cell 21. fluid input tube roads, 22. fluid tips, 25. first balance bearings, 25. the first balance bearing, 300. substrate transferring units
Preferred embodiment
Referring to Fig. 2, developing apparatus of the present invention comprises: developer solution intake line 11, developing cell 200, roller substrate transferring unit 300, developer solution flow measurement unit 12, developer solution flow regulating unit 13, pressurized air intake line 14, gas pressure measurement unit 15, gaseous tension regulon 16 and computer control unit 17.Developing cell 200 has the first balance bearing 25 and narrow strip fluid input tube road 21 and the flaring shape fluid tip 22 of the second balance bearing 26 to constitute that is symmetrical structure, wherein this fluid input tube road 21 is connected with developer solution intake line 11, and flaring shape fluid tip 22 is used to erupt developer solution and pressurized air.Developer solution flow measurement unit 12 connects this developer solution intake line 11 and is used to measure the developer solution flow.Developer solution flow regulating unit 13 connects this developer solution intake line 11 and is used to regulate the developer solution flow.Pressurized air intake line 14 is connected to this fluid input tube road 11.Gas pressure measurement unit 15 connects pressurized air intake line 14 and is used for measurement gas pressure.Gaseous tension regulon 16 connects pressurized air intake line 14 and is used for adjustments of gas pressure.Computer control unit 17 connections are also controlled described gas pressure measurement unit 15, gaseous tension regulon 16, developer solution flow measurement unit 12 and developer solution flow regulating unit 13.Described roller substrate transferring unit 300 is by a turnover that transmits substrate sensor (not shown) notice computer control unit 17 substrates.
In the said process, developer solution of being exported and pressurized air enter in the fluid tip 22 after mixing in developer solution intake line 10 and fluid input tube road 21.The fluid input tube road 21 of fillet shape and the fluid tip of gradual-enlargement type shape, and compressed-air actuated existence, when making developer solution and compressed-air actuated potpourri enter fluid tip, just form the vaporific drop of ultra micro that mix, that do not contain bubble, and then help on substrate, to form uniform developing regional.
During work, referring to Fig. 3, when the transmission substrate sensor has sensed substrate arrival fluid tip 22 belows, just a signal is sent to computer control unit 17, computer control unit 17 (is for example exported the first developer solution flow value V1 and the first gas pressure value P1 with initial parameter, P1=400KPa is V1=27L/min) to developer solution regulating device 13 and gas pressure regulating unit 16; When the transmission substrate sensor senses substrate arrival fluid tip below, the signal that is fed back to by developer solution flow sensor 12 gentle pressure sensing body devices 15, computer control unit 17 (for example is adjusted into the second developer solution flow value V2 and the second gas pressure value P2 with the first developer solution flow value V1 and the first gas pressure value P1 gradually, P2=1MPa is V2=3L/min) to developer solution regulating device 13 and gas pressure regulating unit 16; Then, if it is continuous advance that the transmission substrate sensor senses substrate, pre-defined this condition is T0=11 second, and then computer control unit 17 continues the second developer solution flow value V2 and the second gas pressure value P2 are sent to developer solution regulating device 13 and gas pressure regulating unit 16; Otherwise to sense substrate be the discontinuous sheet that advances if transmit substrate sensor, and then computer control unit 17 transmits the 3rd developer solution flow value V3 and the 3rd gas pressure value P3 (V3=0 is P3=0) to developer solution regulating device 13 and gas pressure regulating unit 16.After the transmission substrate sensor senses substrate signal, repeat above-mentioned steps.
In more detail, referring to Fig. 4, developer solution flow measurement unit 12 transmits the first developer solution data on flows to computer control unit 17, gas pressure measurement unit 15 also transmits first gas pressure data to computer control unit 17, and then, developer solution flow measurement unit 12 transmits the second developer solution data on flows to computer control unit 17, and gas pressure measurement unit 15 transmits second gas pressure data to computer control unit 17; Computer control unit 17 calculates the difference of the first developer solution data on flows and the second developer solution data on flows, as the fluctuations in discharge value, and give developer solution flow regulating unit 13 according to this fluctuations in discharge value output order, developer solution flow regulating unit 13 is regulated the flow of developer solution according to this instruction; Computer control unit 17 calculates the difference of first gas pressure data and second gas pressure data, as change value of pressure, and give gaseous tension regulon 16 according to this gas pressure change value output order, gaseous tension regulon 16 is according to the pressure of above-mentioned change value of pressure adjustments of gas; Repeat above-mentioned steps, until obtaining needed developer solution flow value and gas pressure value.This process comprises above-mentioned steps, but can carry out not according to said sequence.Adopt control of aforementioned calculation machine and backfeed loop connected mode, not only can improve the precision of measurement, and can prevent the variation that external interference brings for flow and pressure.
In sum; though the present invention discloses as above with preferred embodiment; but this preferred embodiment is not in order to restriction the present invention; the those of ordinary skill in this field; without departing from the spirit and scope of the present invention; all can do various changes and retouching, so protection scope of the present invention is as the criterion with the scope that claim defines.
Claims (5)
1. automatic developing device, at least comprise developer solution intake line and developing cell, it is characterized in that: developing cell has one first balance bearing and the second balance bearing constituting narrow strip fluid input tube road and be connected the developer solution intake line and flaring shape fluid tip is used to erupt developer solution and pressurized air, and described automatic developing device also comprises:
Developer solution flow measurement unit connects this developer solution intake line and is used to measure the developer solution flow;
The developer solution flow regulating unit connects this developer solution intake line and is used to regulate the developer solution flow;
The pressurized air intake line is connected to this fluid input tube road;
The gas pressure measurement unit connects the pressurized air intake line and is used for measurement gas pressure;
The gaseous tension regulon connects the pressurized air intake line and is used for adjustments of gas pressure; And
The computer control unit connection is also controlled described gas pressure measurement unit, gaseous tension regulon, developer solution flow measurement unit and developer solution flow regulating unit.
2. automatic developing method according to claim 1 is characterized in that: the described first balance bearing and the second balance bearing are symmetrical structure.
3. an automatic developing method is characterized in that: comprise the steps:
The roller substrate transferring unit is sent to computer control unit with the signal that substrate sensor senses;
Computer control unit output preset value is to developer solution flow regulating unit and gas pressure regulating unit, with the flow and the compressed-air actuated gaseous tension of the developer solution of control intake line;
Developer solution flow measurement unit and gas pressure measurement cell are measured the flow and the air pressure of the developer solution of importing respectively, and the value that will record is sent to computer control unit;
The computer control unit record also refreshes above-mentioned data, and calculate pressure difference value and flow difference in the certain hour, and computer control unit is sent to developer solution flow regulating unit and gas pressure regulating unit with this pressure difference value and flow difference;
Developer solution flow regulating unit and gas pressure regulating unit increase or reduce the flow and the compressed-air actuated gaseous tension of developer solution according to the data that computer control unit transmitted.
4. automatic developing method according to claim 2 is characterized in that: described preset value has several.
5. automatic developing method according to claim 3 is characterized in that: the signal that described substrate sensor senses not simultaneously, it is also different that computer control unit exports the preset value of developer solution flow regulating unit and gas pressure regulating unit to.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2008100811453A CN101251720A (en) | 2008-03-12 | 2008-03-12 | Automatic developing apparatus and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2008100811453A CN101251720A (en) | 2008-03-12 | 2008-03-12 | Automatic developing apparatus and method |
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| Publication Number | Publication Date |
|---|---|
| CN101251720A true CN101251720A (en) | 2008-08-27 |
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| Application Number | Title | Priority Date | Filing Date |
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| CNA2008100811453A Pending CN101251720A (en) | 2008-03-12 | 2008-03-12 | Automatic developing apparatus and method |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103019047A (en) * | 2012-12-07 | 2013-04-03 | 京东方科技集团股份有限公司 | Developing solution spraying device and spraying method |
| CN108345187A (en) * | 2018-02-02 | 2018-07-31 | 武汉华星光电技术有限公司 | Develop chamber and its spray assemblies, developing method |
-
2008
- 2008-03-12 CN CNA2008100811453A patent/CN101251720A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103019047A (en) * | 2012-12-07 | 2013-04-03 | 京东方科技集团股份有限公司 | Developing solution spraying device and spraying method |
| CN108345187A (en) * | 2018-02-02 | 2018-07-31 | 武汉华星光电技术有限公司 | Develop chamber and its spray assemblies, developing method |
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Open date: 20080827 |