CN101251472B - Device and method for online real-time measurement of optical film stress by double light beams - Google Patents
Device and method for online real-time measurement of optical film stress by double light beams Download PDFInfo
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- CN101251472B CN101251472B CN2008100348207A CN200810034820A CN101251472B CN 101251472 B CN101251472 B CN 101251472B CN 2008100348207 A CN2008100348207 A CN 2008100348207A CN 200810034820 A CN200810034820 A CN 200810034820A CN 101251472 B CN101251472 B CN 101251472B
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- 238000000034 method Methods 0.000 title claims abstract description 20
- 239000012788 optical film Substances 0.000 title abstract 4
- 238000005259 measurement Methods 0.000 title description 5
- 239000010408 film Substances 0.000 claims abstract description 61
- 239000000758 substrate Substances 0.000 claims abstract description 23
- 239000004065 semiconductor Substances 0.000 claims abstract description 15
- 239000000523 sample Substances 0.000 claims abstract description 11
- 230000008569 process Effects 0.000 claims abstract description 10
- 230000008859 change Effects 0.000 claims abstract description 6
- 239000010409 thin film Substances 0.000 claims description 36
- 230000003287 optical effect Effects 0.000 claims description 35
- 238000000576 coating method Methods 0.000 claims description 17
- 238000007747 plating Methods 0.000 claims description 16
- 238000006073 displacement reaction Methods 0.000 claims description 15
- 239000011248 coating agent Substances 0.000 claims description 12
- 230000003760 hair shine Effects 0.000 claims description 10
- 238000004062 sedimentation Methods 0.000 claims description 10
- 238000012545 processing Methods 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- 239000012528 membrane Substances 0.000 claims description 5
- 238000009877 rendering Methods 0.000 claims description 4
- 238000013480 data collection Methods 0.000 claims description 3
- 230000008021 deposition Effects 0.000 claims description 3
- 238000001514 detection method Methods 0.000 claims description 2
- 230000008676 import Effects 0.000 claims description 2
- 239000007888 film coating Substances 0.000 abstract description 5
- 238000009501 film coating Methods 0.000 abstract description 5
- 239000013078 crystal Substances 0.000 abstract 3
- 230000035882 stress Effects 0.000 description 40
- 238000010586 diagram Methods 0.000 description 6
- 238000010276 construction Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 230000008646 thermal stress Effects 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
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Abstract
A double-beam on-line real-time optical film stress measuring device and method includes a semiconductor laser, a double-beam splitter collimator, a crystal control instrument, a position sensitive photoelectric detector, an A/D collecting card and a computer set up outside a vacuum chamber of a film coating machine, a third reflector and a crystal control probe installed in the vacuum chamber. The semiconductor laser beam is divided into two beams of parallel light by the double-beam splitter, the two beams of parallel light enter the film coating chamber through the observation window of the film coating machine, the incident light is adjusted to irradiate on a substrate to be measured, the two beams of reflected light are emitted from the observation window after the direction of the reflected light is adjusted by the reflector and received by the position sensitive photoelectric detector, and the computer collects the signals of the position sensitive photoelectric detector and the information of the crystal control instrument about the thickness and the speed of the film in real time, processes data and displays the real-time change information of the stress of the optical film in real time. The invention has the characteristics of simple structure, convenient operation, compatibility and strong anti-interference capability, and can obtain the stress information of the optical film on line.
Description
Technical field
The present invention relates to optical thin film, is a kind of device and measuring method thereof of double beam on-line real-time optical thin film stress.
Background technology
All films nearly all are among certain stress, and its existence can cause the film be full of cracks, curls even come off, thereby have limited the stability and the function of membrane structure.The reason that produces stress is very complicated, mainly contains two kinds: the one, cause owing to the thermal expansion of film and substrate is different, and be called thermal stress; A kind of is that non-equilibrium property or the distinctive micromechanism of film in the thin film growth process causes, is called internal stress.In order to distinguish internal stress and thermal stress,, in the thin-film-coating process, measure stress in real time and be very important in order counter stress mechanism to obtain more deep research.
Before Shanghai Optics and Precision Mechanics institute, Chinese Academy of Sciences proposed real-time measuring device for high precision thin-film stress (application number: 2006101184328, publication number: 1971248), but this device still has weak point
And this device is than the improvement that three aspects have been arranged.At first be the principle of having utilized twin-beam, improved interference capability such as system's anti-vibration; The secondth, added brilliant control probe, can obtain the information of film thickness in real time, thereby realize that really stress measures in real time; Be at last on software systems, regulate by program and simplified the light path adjusting, user-friendly for operation, friendly interface, and function is also abundanter.
Summary of the invention
The present invention is the device and the measuring method thereof of a kind of double beam on-line real-time optical thin film stress of proposing for STRESS VARIATION in the deep research thin-film-coating process, this device has simple in structure, easy to operate, good with the coating machine compatibility, stability characteristics such as strong.
Technical solution of the present invention is as follows:
A kind of device of double beam on-line real-time optical thin film stress, be characterized in that this device comprises semiconductor laser, the twin-beam that is formed by beam splitter and first catoptron and second arrangement of mirrors divides beam collimator, the 3rd catoptron, crystalline substance control instrument with brilliant control probe, the quick photodetector in position, A/D capture card and computing machine, its position relation is as follows: described semiconductor laser is set outside coating machine, twin-beam divides beam collimator, brilliant control instrument, the quick photodetector in position, A/D capture card and computing machine, in vacuum chamber, install film plating substrate to be measured, described the 3rd catoptron and brilliant control probe, make the emergent light of described semiconductor laser after described twin-beam divides beam collimator, become two bundle directional lights, watch window by the coating machine vacuum chamber shines film plating substrate surface to be measured, its reflected light is through shining from described watch window after described the 3rd mirror reflects on the quick photodetector in position outside the vacuum chamber, and the reflected light displacement deflection amount that this quick photodetector is surveyed is input to computing machine by the A/D capture card; Simultaneously described brilliant control probe real time record is coated with the variation of film thickness and rate of sedimentation in the optical thin film process, imports described computing machine by described brilliant control instrument.
Utilize above-mentioned double beam on-line real-time optical thin film stress device to carry out the measuring method of optical thin film stress, comprise the following steps:
1. the position of each components and parts relation is installed each components and parts and film plating substrate to be measured in the above-mentioned double beam on-line real-time optical thin film stress device; Adjust light path, make the emergent light of described semiconductor laser after described twin-beam divides beam collimator, become two bundle directional lights, watch window by the coating machine vacuum chamber shines on the center symmetric position on film plating substrate surface to be measured, and its reflected light is through shining from described watch window after described the 3rd mirror reflects on the quick photodetector in position outside the vacuum chamber;
2. before plated film begins, on the software systems master interface of computing machine, click the initialization button earlier, set beamwidth, incident angle and the reflection light path of twin-beam of elastic modulus, Poisson ratio, thickness, the incident of described film plating substrate, the string slogan of brilliant control instrument is set simultaneously;
3. when plated film begins, click the start button at main interface, computing machine begins image data: one is the information by facula position on the position sensitive detector of USB interface acquisition, another is by the real-time thickness of crystalline substance control instrument upper film of serial ports acquisition and the information of coated film deposition speed, in whole coating process, computing machine carries out data processing according to following formula
And real-time rendering optical thin film stress change curve and displacement changing curve, preserve in real time and display beams yaw displacement, stress intensity, plated film time, film thickness and rate of sedimentation;
4. after plated film finishes, click the exit button on the software systems master interface, computing machine promptly stops data collection, and quits a program.
The software systems that comprise this device in the described computing machine, coding is realized real-time thickness of film and beam deflection displacement acquisition, the line data of going forward side by side is handled, draw the optical thin film stress change curve, preserve in real time and information such as display beams displacement, plated film time, film thickness and rate of sedimentation, so that be for further processing.
Technique effect of the present invention:
1, the present invention adopts the beam deflection method, utilizes the double-beam principle online in real time to measure optical thin film stress.Building structure is simple, and double-beam system stability had raising, and antijamming capability is strong.
2, the present invention adopts brilliant control instrument to gather the real-time information of film thickness and rate of sedimentation in the coating process, and passes to Computer Processing and preserve by RS-232 serial ports standard.The acquisition of thickness information is just really jumped out from the category of the total power of MEASUREMENTS OF THIN, has realized the measurement of membrane stress.
3, software systems of the present invention adopt Visual Basic6.0 language compilation, friendly interface, feature richness, provide each to need parameter initialization input, port numbers is provided with, USB mouth and serial communication, and real-time rendering beam deflection displacement curve and stress measurement curve are preserved information such as plated film time, the real-time thickness of film, rate of sedimentation, stress value simultaneously.Programming standardization simultaneously further expands the space.
4, major equipment of the present invention is convenient to build and safeguard in the coating chamber outside.And can build on arbitrary the coating machine, device is compatible good.
5, the present invention adopts the quick photodetector precision height in position, and the signal that obtains is handled easily.
Description of drawings
Fig. 1 is the device one-piece construction synoptic diagram of double beam on-line real-time optical thin film stress of the present invention.
Fig. 2 is the light path principle figure of the device of double beam on-line real-time optical thin film stress of the present invention.
Fig. 3 is the device software system flowchart of double beam on-line real-time optical thin film stress of the present invention.
Fig. 4 is the interface synoptic diagram of the device software system of double beam on-line real-time optical thin film stress of the present invention.
Embodiment
The invention will be further described below in conjunction with embodiment and accompanying drawing, but should not limit protection scope of the present invention with this.
See also Fig. 1 earlier, Fig. 1 is the device one-piece construction synoptic diagram of double beam on-line real-time optical thin film stress of the present invention.As seen from the figure, the device of double beam on-line real-time optical thin film stress of the present invention, comprise semiconductor laser 1, the twin-beam that is combined by beam splitter 2 and first catoptron 3 and second catoptron 4 divides beam collimator, the 3rd catoptron 5, crystalline substance control instrument 8 with brilliant control probe 7, the quick photodetector 11 in position, A/D capture card 10 and computing machine 9, its position relation is as follows: described semiconductor laser 1 is set outside coating machine, twin-beam divides beam collimator, brilliant control instrument 8, the quick photodetector 11 in position, A/D capture card 10 and computing machine 9, in vacuum chamber, install film plating substrate to be measured 6, described the 3rd catoptron 5 and brilliant control probe 7, make the emergent light of described semiconductor laser 1 after described twin-beam divides beam collimator, become two bundle directional lights, watch window by the coating machine vacuum chamber shines film plating substrate to be measured 6 surfaces, its reflected light is through described the 3rd catoptron 5 reflection back shines a quick photodetector 11 vacuum chamber outside from described watch window on, and the reflected light displacement deflection amount of these quick photodetector 11 detections is input to computing machine 9 by A/D capture card 10; Simultaneously described brilliant control probe 7 real time record are coated with the variation of film thickness and rate of sedimentation in the optical thin film process, by the described computing machine 9 of described brilliant control instrument 8 inputs.
Fig. 2 is the optical schematic diagram of the device of double beam on-line real-time optical thin film stress of the present invention.As shown in the figure, beamwidth is D
0Two bundle directional lights shine on the film plating substrate 6, along with substrate bends in coating process, cause the beamwidth of two parallel beams that reflect that variation has taken place, become D by diagram
0+ d.The incident angle of supposing two parallel beams is α, and the reflection light path is L, and the angle of two folded light beams is θ, and the radius-of-curvature of substrate bending is R, then:
And θ=d/L (2)
Thereby obtain:
If the elastic modulus of substrate is E
s, Poisson ratio is γ
s, substrate thickness is t
s, film thickness is t
f, then membrane stress σ can be determined by following formula:
Then
Obtain displacement deflection amount d by the quick photodetector 11 in position, this device adopts the PIN structure, when light beam incident puts in place in the photosurface of quick photodetector, produce electron-hole pair, reach of the electrode output of the charge carrier of P type layer by the device two ends, the size of its output current and light incident light electric position are inversely proportional to the distance of electrode, can calculate the accurate position d of light beam incident thus.This positional information is sent to computing machine 9 by A/D capture card 10 by USB interface.Pass through serial ports about the data of film thickness on the brilliant control instrument 8, gather by computing machine 9 according to rs-232 standard.
The software systems that comprise this device in the described computing machine, coding is realized real-time thickness of film and beam deflection displacement acquisition, the line data of going forward side by side is handled, draw the optical thin film stress change curve, preserve in real time and information such as display beams displacement, plated film time, film thickness and rate of sedimentation, so that be for further processing.
The software systems of this device have realized for the collection of above-mentioned two aspect data and real-time stress Calculation of optical thin film and curve plotting.The process flow diagram of this program is seen accompanying drawing 3.
Described laser instrument 1 is a semiconductor laser, includes a colimated light system, and laser beam divergent angle is little, and collimation is good.
Utilize described double beam on-line real-time optical thin film stress device to carry out the measuring method of optical thin film stress, comprise the following steps:
1. by the position relation of each components and parts in the described double beam on-line real-time optical thin film stress device each components and parts and film plating substrate 6 to be measured are installed; Adjust light path, make the emergent light of described semiconductor laser 1 after described twin-beam divides beam collimator, become two bundle directional lights, watch window by the coating machine vacuum chamber shines on the center symmetric position on film plating substrate to be measured 6 surfaces, and its reflected light is through described the 3rd catoptron 5 reflection back shines a quick photodetector 11 outside the vacuum chamber from described watch window on;
2. before plated film begins, on the software systems master interface of computing machine, click the initialization button earlier, set beamwidth, incident angle and the reflection light path of twin-beam of elastic modulus, Poisson ratio, thickness, the incident of described film plating substrate, the string slogan of brilliant control instrument 8 is set simultaneously;
3. when plated film begins, click the start button at main interface, computing machine 9 beginning image data: one is the information by facula position on the position sensitive detector 11 of USB interface acquisition, another is by the real-time thickness of crystalline substance control instrument 8 upper films of serial ports acquisition and the information of coated film deposition speed, in whole coating process, computing machine carries out data processing according to following formula
And real-time rendering optical thin film stress change curve and displacement changing curve, preserve in real time and display beams yaw displacement, stress intensity, plated film time, film thickness and rate of sedimentation;
4. after plated film finishes, click the exit button on the software systems master interface, computing machine 9 promptly stops data collection, and quits a program.
Described catoptron 5 is high-quality catoptrons that the surface has been coated with reflective film.It is fixed on the shelf that can regulate direction, places internal vacuum chamber, thereby the furnishing emergent ray shines on the quick photodetector 11 that puts in place.
Described brilliant control 7 and brilliant control instrument 8 are to be coated with the device that obtains film thickness information in the process in real time at optical thin film.Only obtain thickness information, could realize the on-line measurement of membrane stress.By serial ports film thickness is passed to computing machine 9 in real time.
Owing to added the program of handling facula position in the software systems, so need not make when regulating light path the outgoing hot spot shine the center of photosurface, reduced the difficulty of light path adjusting work, it is easier to operate.
Experiment shows that it is simple in structure, easy to operate that the present invention has, characteristics such as good stability, the variation of can online in real time measuring stress in being coated with the optical thin film process.
Claims (2)
1. the device of a double beam on-line real-time optical thin film stress, it is characterized in that this device comprises semiconductor laser (1), divide beam collimator by beam splitter (2) and the twin-beam that first catoptron (3) and second catoptron (4) combine, the 3rd catoptron (5), crystalline substance control instrument (8) with brilliant control probe (7), position quick photodetector (11), A/D capture card (10) and computing machine (9), its position relation is as follows: described semiconductor laser (1) is set outside coating machine, twin-beam divides beam collimator, brilliant control instrument (8), position quick photodetector (11), A/D capture card (10) and computing machine (9), in vacuum chamber, install film plating substrate to be measured (6), described the 3rd catoptron (5) and brilliant control probe (7), make the emergent light of described semiconductor laser (1) after described twin-beam divides beam collimator, become two bundle directional lights, watch window by the coating machine vacuum chamber shines film plating substrate to be measured (6) surface, its reflected light is through described the 3rd catoptron (5) reflection back shines a quick photodetector (11) vacuum chamber outside from described watch window on, and the reflected light displacement deflection amount of this quick photodetector (11) detection is input to computing machine (9) by A/D capture card (10); Simultaneously described brilliant control probe (7) real time record is coated with the variation of film thickness and rate of sedimentation in the optical thin film process, imports described computing machine (9) by described brilliant control instrument (8).
2. utilize the described double beam on-line real-time optical thin film stress of claim 1 device to carry out the method that optical thin film stress is measured, it is characterized in that comprising the following steps:
1. by the position relation of each components and parts in the described double beam on-line real-time optical thin film stress of claim 1 device each components and parts and film plating substrate (6) to be measured are installed; Adjust light path, make the emergent light of described semiconductor laser (1) after described twin-beam divides beam collimator, become two bundle directional lights, shone by the watch window of coating machine vacuum chamber on the center symmetric position on film plating substrate to be measured (6) surface, its reflected light is through described the 3rd catoptron (5) reflection back shines a quick photodetector (11) outside the vacuum chamber from described watch window on;
2. before plated film begins, on the software systems master interface of computing machine, click the initialization button earlier, set beamwidth, incident angle and the reflection light path of twin-beam of elastic modulus, Poisson ratio, thickness, the incident of described film plating substrate, the string slogan of brilliant control instrument (8) is set simultaneously;
3. when plated film begins, click the start button at main interface, computing machine (9) beginning image data: the information that goes up facula position by the quick photodetector in position (11) of USB interface acquisition, by the real-time thickness of crystalline substance control instrument (8) upper film of serial ports acquisition and the information of coated film deposition speed, in whole coating process, computing machine carries out data processing according to following formula, and real-time rendering optical thin film stress change curve and displacement changing curve, preserve in real time and display beams yaw displacement, stress intensity, plated film time, film thickness and rate of sedimentation
In the formula: σ is a membrane stress, D
0Be the width of light beam, d is the increment of the wide variety of light beam, and α is the incident angle of light beam, and L is reflection light path, E
sBe elastic modulus, γ
sBe Poisson ratio, t
sBe substrate thickness, t
fBe film thickness;
4. after plated film finishes, click the exit button on the software systems master interface, computing machine (9) promptly stops data collection, and quits a program.
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| US9921149B2 (en) * | 2015-04-24 | 2018-03-20 | Otsuka Electronics Co., Ltd. | Optical measurement apparatus and optical measurement method |
| CN106197295B (en) * | 2016-07-20 | 2017-10-24 | 华中科技大学 | A kind of laser thickness gauge |
| CN106383000B (en) * | 2016-09-01 | 2019-09-10 | 河北工业大学 | A kind of device of the double Electro-optical Modulation real-time measurement optical material microstresses of based single crystal body |
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| CN114396876B (en) * | 2022-01-24 | 2023-06-16 | 中国工程物理研究院机械制造工艺研究所 | Laser transmission repeated positioning precision detection device, system and detection method |
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