CN101234282A - Processing equipment and method for waste gases in semiconductor production process - Google Patents
Processing equipment and method for waste gases in semiconductor production process Download PDFInfo
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- CN101234282A CN101234282A CNA2007100025634A CN200710002563A CN101234282A CN 101234282 A CN101234282 A CN 101234282A CN A2007100025634 A CNA2007100025634 A CN A2007100025634A CN 200710002563 A CN200710002563 A CN 200710002563A CN 101234282 A CN101234282 A CN 101234282A
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Abstract
The invention discloses a novel device used for treating silane by using a coal stove and a method thereof, which can be applied to a process of semiconductor production. The method of the invention is as follows: perforated lump coals in the coal stove are replaced and added regularly. The waste gas discharged by a coating enters a burning area, and the materials containing silicon is heat-deposited on the surface of the burning coal, or reacted with oxygen to generate silicon dioxide to gather on the surface of the coals. The novel device and the method provided by the invention are characterized mainly in that waste gas can be processed effectively and reliably for a vacuum coating system with incomparable low cost.
Description
Technical field
Treatment of waste gas Apparatus and method in semiconductor production process is described in this invention, the silane (SiH that particularly a kind of processing produces in making based on the electronics of silicon and photoelectric device process
4) utensil and the method for waste gas, be equipment and method about the silicone hydride waste gas that produces in the process of the extensive vacuum processing of the safe and efficient processing of the quite low cost of a kind of usefulness based on the electronics of silicon and optoelectronic device.
Background technology
Vacuum processing apparatus is widely used in making on a large scale in the semiconductor devices process based on silicon, and image set becomes circuit and solar cell, comprises large tracts of land photocell assembly based on silicon thin film etc.Chemical vapor deposition (CVD) and chemical gaseous phase etching are the popular technological means of current making indication product.For example, polysilicon in the integrated circuit or silicon dioxide layer can pass through SiH
4Gas or other similar gas precipitate through chemical vapour deposition technique.In the another one example, silane is used to the plasma enhanced chemical vapor deposition process and produces based on the amorphous silicon hydride of silicon fiml and the solar cell of nano amorphous silicon.After chemical vapor deposition processes, unnecessary gas is trapped among the chemical gas-phase deposition system, and gas extraction system can be discharged into reacting gas in the middle of the atmosphere afterwards.Yet, since silane can be in air automatic combustion, so, can not directly be discharged into it in the atmosphere for safety with to the purpose of environmental protection.Generally speaking, the unnecessary reacting gas that contains silane in the vacuum processing apparatus must be handled through exhaust scrubber, in order to avoid harmful polluter is discharged in the environment.Therefore, in the equipment of discharging reacting gas, exhaust scrubber is an indispensable part.
Silane must filter out or change into from waste gas stream with similar gas can be by the synthetic of safe disposal.Usually the method that silane is changed into synthetic is burnt it in one so-called " combustion box ".Generally be to be fuel, at this moment SiH in combustion box with the natural gas
4Change into SiO through reaction
2, its chemical reaction is: 2SiH
4+ 2O
2→ 2SiO
2+ 4H
2Yet if system breaks down suddenly, combustion box just has the danger that becomes burning things which may cause a fire disaster.Such as, if the out of order word of waste treatment system, SiH
4Residual will in combustion box, the gathering, probably cause uncontrollable burning.The another one major issue is, because the oxide powder dust of silicon deposition, combustion box is easy to get clogged, and therefore frequent cleaning and maintenance is very important, but this can stop over the normal operation of equipment.Handle in time in combustion box and pipeline in free silica dust (a kind of yellow powder) great difficulty that operated, and cause environmental pollution.Exhaust-gas treatment program and equipment about combustion box have been described in the U.S. Patent number 6174349,6126906 and 5183646.
Wet washer and other treatment facility also are employed.U.S. Patent number 6174349 just provides a kind of moist washer in conjunction with combustion box for people.U.S. Patent number 5955037 provides a kind of processing method of oxidation.Use a kind of slaine that generates the hydrogen aluminium compound to remove silane in the U.S. Patent number 5320817.U.S. Patent number 6949234 has been described a kind of wet washing device based on water, but this washer is more valuable, is difficult to be applied to the processing of a large amount of silicone hydride waste gas.The wet washing device of other type is based on wet chemical reaction, allows silane and the vaporific oxide as NaHO react, this method efficient height, and treating capacity is big, but process and equipment are very complicated, are out of order easily.
Another method of handling silane is a dry chemical reaction treatment method, the method for using haptoreaction and burning to combine under hot conditions.This equipment price costliness needs very high electric power, running stores cost also very high (reaction box needs frequent replacement).In addition, can not as full-scale plant is desired, handle the high speed silane air-flow that flow velocity surpasses per minute one standard liter (SLPM) as " gas reaction post ".
The technology that another one is handled silane is by so-called " dry-cure device " high-density plasma of low pressure to be applied among the exhaust-gas mixture that contains silane, silane is decomposed and is deposited on (surface area is very big) above the multi-layered electrode, and electrode is cleared up termly and changed.This method is not very reliable, because the existence of the synthetic of the continuous variation of gas pipeline pressure and mix waste gas often causes the disappearance of plasma.In addition, the treatment effeciency of 95%-99% can not reach safety and the environmental protection regulations and the requirement of the strictness of government organs' formulation.
All multifactor restrictions such as in a word, existing silane treatment method all is subjected to equipment cost and operating cost costliness, and maintenance and maintenance require high, produce the liquid or solid pollutant, have operational hazards, and it is bigger perhaps to take up space.Simultaneously, they need be as the support of infrastructure such as water, electricity, compressed air.The sometimes non-constant of the usefulness of this class treatment facility.In addition, the performance of traditional waste treatment system depends on the type of gas in the mixed waste to a great extent.Each exhaust-gas mixture all needs a kind of specific " reaction box " or chemical method well to neutralize.There is not a kind of processing method to dispose all waste gas by enough same chemical vapour deposition reaction heaps.Traditional silane treatment equipment be not suitable for low-cost and large batch of production based on the device of silicon, comprise large-area photoelectric device based on the silicon thin film material.
Summary of the invention
Based on above-mentioned consideration, the applicant has worked out primary and foremost purpose of the present invention: for the equipment of efficient a, high yield is provided based on the silane treatment in the device production process of silicon.
The further purpose of the present invention is to provide both safe and reliable for handling silane, again effectively, the equipment and the method for high yield.
It is low that the 3rd purpose of the present invention provides an equipment cost, the silane treatment system that operating cost is low.
In order to reach the foregoing invention purpose, treatment of waste gas Apparatus and method in the semiconductor production process of the present invention provides a new silane treatment equipment and a method.The reaction of high-temperature gas in silicone hydride waste gas and fire coal and the coal stove generates siliceous deposits thing and silica precipitate (sand and dust), and attached to the surface of coal.The silicide of coal ash and solid cleans out coal stove with being timed together.If be that promptly fixed silane gas flow velocity is selected suitable coal stove model, the treatment effeciency of this system almost is 100%.
Description of drawings
The present invention will be further described below in conjunction with drawings and Examples.
Fig. 1 shows an exhaust treatment system that comprises coal furnace.
Fig. 2 has shown the relation between silicon fiml process equipment and the exhaust treatment system.
The specific embodiment
As shown in fig. 1, the core of this invention is a coal furnace system 6, and it comprises furnace wall 60, exhaust gas inlet 17 and air intlet 67, the device that comprises bottom door 65 of 68, one dischargings of air exit and collection coal ash.Coal charge 66 is equipped with in 60 the insides, furnace wall, the briquette of porous preferably, and briquet or honeycomb briquette can make the combustion zone of gas by high temperature like this.Interval between the equally distributed passage in the coal charge (such as the hole in the briquet) can not be too wide, and the waste gas that passes through is hindered in too wide meeting and the coal of burning fully contacts and complete reaction.Coal ash at first forms in the bottom of coal stove, because the gravity of coal charge 66 is pushed downwards.Air intlet 67 can provide an adjustable opening to control the flow of the air that is applied to the combustion zone, so just can control the reaction speed in the coal stove.Air cleaner is equipped with at air exit 68 places, and the particulate that is discharged in the atmosphere is minimized.
In the operating process of coal furnace 6, silicone hydride waste gas is introduced in the furnace wall 60 by exhaust gas inlet 17.The silane gas passage in the coal charge 66 of burning of flowing through, in this process, silane is directly decomposed (SiH under the hot conditions on coal charge surface
4=Si+2H
2), perhaps generate sulfur dioxide and precipitate with oxygen reaction, and then condense in the surface of coal charge.At last, the coal ash waste material that contains solid silicon is eliminated the furnace chamber that produces coal when filling out new coal charge.There is a setting can guarantee under the situation that does not interrupt the processing operation, constantly new coal charge (not to be shown) from a storage compartment here here and inserts coal-fired chamber.In the example of Fig. 1, the bottom of coal charge 66 after-flame at first becomes dust, because herein from fresh air nearest (air intlet 67), oxygen content is the highest.Therefore, fresh briquet should be added the top that is placed on coal stove.Along with burning of coal, briquet can move down, and lowermost briquet will become coal ash.
What Fig. 2 demonstrated is when making the device relevant with silicon with vacuum processing apparatus, the allocation method of coal stove exhaust treatment system.Admixture of gas 53 flows to filming equipment 10 by entering the mouth, and exhaust-gas mixture is discharged by filming equipment 10, and the pipeline 16 of flowing through is extracted out by one group of vavuum pump 30 then.The gas that vavuum pump 30 is extracted out enters the furnace wall 60 of coal stove coal furnace 6 through air inlet exhaust gas inlet 17.Through the processing of coal stove coal furnace 6, not siliceous gas is discharged in the atmosphere by air exit 68.
Design will consider that it can hold the polylith briquet during furnace wall, is in order to make the unified burning of the stable speed of briquet like this.These briquets have equally distributed passage or hole to allow waste gas to pass through.The temperature in coal combustion zone (coal-fired surface temperature) can be easy to above 1000 degrees centigrade.Major applications all can be decomposed under hot conditions in the molecule of the reacting gas of chemical vapor deposition processes, and deposits on the briquet inner passage.In fact, because the existence of high temperature air, most of escaping gas all can form the deposition of solid with air reaction on the briquet surface.Because briquet is regularly to replace, solid deposits also just and coal ash cleaned out coal stove together, can not produce any influence substantially to waste gas treatment process.Required unique raw material is exactly the suitable coal charge of getting ready, in addition without any need for auxiliary equipment.This coal stove functional processor is many, compactness, and the efficient height, cost is low, and maintenance is easily.Since volume compact, simplicity of design, handling safety, it is easy to combine with any chemical gas-phase deposition system.By single or multiple gas-phase deposition systems or reactor, it can handle the waste gas of big flow (high flow rate).Also just significantly reduced the downtime of equipment.
Coal stove can be handled silane efficiently.Because there is certain length the coal stove furnace wall, add in the coal charge of burning long passage is arranged, silane molecule just is forced to process from the passage of high temperature, is having under the condition of oxygen directly and the surface of the coal of burning contacts and reacts, perhaps with air reaction generation silica.No matter be which kind of mode, can not allow any residual silane gas be released among the atmosphere.
Just as commercial and resident with Stove heating with cook, this coal stove can be worked incessantly.Can not produce other solid or liquid wastes in this process, so need not be careful especially when handling dust.
A spot of alloy in the mix waste gas is as phosphine (PH
3) and borine (B
2H
6) also processedly in this process fallen.
This coal stove is very reliable, because it does not rely on as water, and electricity, auxiliary equipment such as natural gas are not so can shut down because of the fault of these facilities.
Compare with other silane treatment system on the current market, the cost of keeping and handle this coal furnace has reduced a magnitude at least.For the silane treatment system provides low-cost coal furnace, help the large-scale production low cost really, large-area thin film silicon photovoltaic module.
Because coal furnace is cheap, modular exhaust treatment system can be the processing that various vacuum coating process provide silicone hydride waste gas.
Claims (6)
1. exhaust treatment system is characterized in that comprising following part:
A) the coal stove furnace wall of the sealing of metal or metal alloy;
B) coal charge, indication coal charge are placed in the indication furnace wall, in the middle of the indication coal charge hole that communicates are arranged, and gas can circulate from whole indication coal charge;
C) exhaust gas inlet that is installed on the indication furnace wall;
D) adjustable air intlet of opening that is installed on the indication furnace wall allows the indication coal charge to burn in this furnace wall;
E) constantly change the mechanism of replenishing coal charge;
F) mechanism of collection and cleaning coal ash;
G) air exit that is installed on the indication furnace wall is separated by the indication coal charge between this outlet and the indication exhaust gas inlet.
2. exhaust treatment system according to claim 1 is handled the method for silane gas, it is characterized in that: the enforcement of this method is made of the following step:
A) open the indication air intlet, air and indication coal charge are contacted;
B) light the indication coal charge with igniter;
C) regulate the indication air intake, to reach needed burning of coal speed;
D) with the indication exhaust gas inlet silane is imported in the indication exhaust treatment system;
E) collect the coal ash that comprises the solid silicide;
F) constantly change interpolation indication coal charge for the indication exhaust treatment system.
3. according to claim 1 described exhaust treatment system, it is characterized in that: the coal charge in the described system be in the middle of briquette, briquet or the honeycomb briquette of punching, the centre has multiple support channels to allow the gas whole coal charge of flowing through.
4. according to claim 1 described exhaust treatment system, it is characterized in that: described exhaust treatment system is placed in the multistage exhaust treatment system that is in series by a plurality of exhaust treatment systems, the air exit of upper level and the exhaust gas inlet of next stage link, and a plurality of systems of indication can synchronous operation.
5. according to claim 1 described exhaust treatment system, it is characterized in that: described exhaust treatment system is placed in an exhaust treatment system that is formed in parallel by a plurality of exhaust treatment systems, and a plurality of systems can synchronous operation.
6. according to the method for claim 2 described processing silane gas, it is characterized in that: wherein the indication silane gas contains volume ratio and is no more than 6% phosphide or boride.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2007100025634A CN101234282A (en) | 2007-01-29 | 2007-01-29 | Processing equipment and method for waste gases in semiconductor production process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2007100025634A CN101234282A (en) | 2007-01-29 | 2007-01-29 | Processing equipment and method for waste gases in semiconductor production process |
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|---|---|
| CN101234282A true CN101234282A (en) | 2008-08-06 |
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ID=39918341
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|---|---|---|---|
| CNA2007100025634A Pending CN101234282A (en) | 2007-01-29 | 2007-01-29 | Processing equipment and method for waste gases in semiconductor production process |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102049183A (en) * | 2010-12-02 | 2011-05-11 | 昆山科技大学 | Device for treating pyrophoric gas by combining reaction with cyclone separating equipment |
| CN101554562B (en) * | 2008-04-11 | 2013-01-23 | 福建钧石能源有限公司 | System and method for processing waste gas |
| CN105003928A (en) * | 2015-06-14 | 2015-10-28 | 黄志强 | Waste gas processing device suitable for semiconductor manufacturing process |
-
2007
- 2007-01-29 CN CNA2007100025634A patent/CN101234282A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101554562B (en) * | 2008-04-11 | 2013-01-23 | 福建钧石能源有限公司 | System and method for processing waste gas |
| CN102049183A (en) * | 2010-12-02 | 2011-05-11 | 昆山科技大学 | Device for treating pyrophoric gas by combining reaction with cyclone separating equipment |
| CN105003928A (en) * | 2015-06-14 | 2015-10-28 | 黄志强 | Waste gas processing device suitable for semiconductor manufacturing process |
| CN105003928B (en) * | 2015-06-14 | 2017-10-24 | 安徽富芯微电子有限公司 | A kind of emission-control equipment suitable for semiconductor fabrication process |
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Open date: 20080806 |