CN101207185A - Method for manufacturing organic electro photoluminescence display - Google Patents
Method for manufacturing organic electro photoluminescence display Download PDFInfo
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- CN101207185A CN101207185A CNA2006101578705A CN200610157870A CN101207185A CN 101207185 A CN101207185 A CN 101207185A CN A2006101578705 A CNA2006101578705 A CN A2006101578705A CN 200610157870 A CN200610157870 A CN 200610157870A CN 101207185 A CN101207185 A CN 101207185A
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Abstract
The invention relates to a manufacture method of an organic light-emitting diode. The invention comprises the following steps: a base plate is provided, and an anodic pattern is formed on the base plate; an electric hole injection layer is formed respectively on the base plate and the anodic pattern; an electric hole transmission layer is formed on the electric hole injection layer; a luminescent layer is formed on the electric hole transmission layer by adopting the auxiliary ink jet method of a mast process; an electronic transmission layer is formed on the luminescent layer; an electronic injection layer is formed on the electronic transmission layer, and a cathode electrode is formed on the electronic injection layer.
Description
Technical field
The present invention relates to a kind of manufacture method of organic electro-luminescent display.
Background technology
Develop rapidly along with science and technology, people are more and more higher to the requirement of display, make display develop to lighter, thinner, more power saving direction, thus produced organic electro-luminescent display (Organic Lighting Emitting Display, OLED).Because of organic electro-luminescent display is that self-luminous shows, compared to LCD, need not the bigger backlight module of energy consumption, and have that the visual angle is wide, response speed fast and low cost and other advantages, therefore obtained extensive use.
Organic electro-luminescent display generally includes multi-layer film structures such as electron injecting layer, electron transfer layer, luminescent layer, electric hole transport layer and electric hole implanted layer, and this multi-layer film structure adopts film build method to form.Industry mainly comprises two kinds of film build methods.A kind of is ink-jet (Ink-jetPrinting) method, is about to shower nozzle and is full of liquid material to be plated, pushes this liquid material by heating generation bubble or other method, it is sprayed onto on the substrate surface of desiring plated film forms thin film.Another kind method is a vacuum vapour deposition, promptly under vacuum condition deposition material is heated, and makes its fusion, evaporation then pass through the shower nozzle uniform deposition in the substrate of desiring plated film, and the cooling back forms thin film at this substrate surface.
Seeing also Fig. 1, is a kind of schematic diagram of prior art ink discharge device.This ink discharge device 10 comprises an ink jet unit 12 and one and the pedestal 13 that is oppositely arranged of this ink jet unit 12.This ink jet unit 12 is arranged in the vacuum cavity 11 with this pedestal 13.This ink jet unit 12 comprises an ink gun 121 and a plurality of jet orifice 1211.This pedestal 13 is used to place to be needed by the substrate 14 of ink-jet.For example solution concentration, droplet size etc. are different along with the pattern magnitude of required printing and the material character loaded for the size of ink jet unit 12 and shape.Employed alignment so also changes along with the required accuracy of pattern, and for example the alignment precision of mechanical registeration is more than 50 microns, and the alignment precision of optical alignment is more than 1 micron.The move mode of this ink discharge device 10 can take this ink jet unit 12 to maintain static and mode that this substrate 14 moves, also can take this substrate 14 to maintain static and mode that this ink jet unit 12 moves, the mode that can also take this substrate 14 and this ink jet unit 12 to move simultaneously.When carrying out the ink-jet step, this ink jet unit 12 is with pixel region (figure do not show) the direction ejection of ink from this jet orifice 1211 towards this substrate 14.
Yet, when this ink discharge device 10 is used to make the luminescent layer of organic electro-luminescent display, owing to the positioning accuracy of size that is subject to this jet orifice 1211 and ink gun 121 makes ink jet precision wayward, this ink discharge device 10 is confined to the application of low resolution.When this ink discharge device 10 was used to make the pixel of high-resolution, the anomaly of colour mixture appearred between the pixel easily.So ink ejecting method also is not suitable for the organic electro-luminescent display of making high-resolution.
Summary of the invention
In order to solve the problem that ink ejecting method is not suitable for the organic electro-luminescent display of making high-resolution, be necessary to provide a kind of manufacture method of organic electro-luminescent display of high-resolution.
A kind of manufacture method of organic electro-luminescent display, it may further comprise the steps: a substrate is provided, forms anode pattern on this substrate; On this substrate and anode pattern, form an electric hole implanted layer; On this electricity hole implanted layer, form an electric hole transport layer; Adopt the auxiliary ink ejecting method of masking process, on this electricity hole transport layer, form luminescent layer; On this luminescent layer, form an electron transfer layer; Form an electron injecting layer on this electron transfer layer and on this electron injecting layer, forming a negative electrode.
A kind of manufacture method of organic electro-luminescent display, it may further comprise the steps: a substrate is provided, forms anode pattern on this substrate; Adopt the auxiliary ink ejecting method of masking process, on this anode pattern, form luminescent layer; On this luminescent layer, form a negative electrode.
The manufacture method of above-mentioned organic electro-luminescent display is owing to adopt traditional ink ejecting method auxiliary with masking process, can break through the accuracy limitations of traditional ink-jet (Ink-jet Printing) method, thereby produce organic electro-luminescent display with high-resolution.
Description of drawings
Fig. 1 is a kind of schematic diagram of prior art ink discharge device.
Fig. 2 to Figure 11 is the schematic diagram of each step of manufacture method of organic electro-luminescent display of the present invention.
Figure 12 is the floor map of the organic electro-luminescent display luminescent layer that produces to manufacture method shown in Figure 11 with Fig. 2.
Embodiment
Seeing also Fig. 2 to Figure 11, is the schematic diagram of each step of manufacture method of organic electro-luminescent display of the present invention.The manufacture method of this organic electro-luminescent display comprises the steps:
Step S01: see also Fig. 2, one substrate 20 is provided, adopt physical vaporous deposition or chemical vapour deposition technique, deposition one metal-oxide film on this substrate 20, tin indium oxide (Indium Tin Oxide for example, ITO) or indium zinc oxide (Indium Zinc Oxide IZO), and applies one first photoresist layer on this film.One first mask pattern is provided, this first photoresist layer is carried out exposure imaging and this tin indium oxide of etching or indium zinc oxide film form a plurality of anode pattern 21.These a plurality of anode pattern 21 define a plurality of first anode patterns 211, a plurality of second plate pattern 212 and a plurality of third anode pattern 213 respectively.This first anode pattern 211, this second plate pattern 212 and this third anode pattern 213 are alternately arranged in regular turn.This first this substrate 20 can be transparent insulation materials such as glass, quartz or plastics.
Step S02: see also Fig. 3, adopt spin coating method or vacuum vapour deposition, on this substrate 20 and this anode pattern 21, form an electric hole implanted layer 22 and one electric hole transport layer 23 successively.The material of this electricity hole transport layer 23 generally is an aromatic amine based high molecular compound, polyaniline (Polyacrylonitrile for example, PAn) or bromination myristyl benzyl dimethyl ammonium (1,1-bis (4-di-p-tolylaminophenyl)-4-phenylcyclohexane, TPAC), amine derivative (4 how, 4 '-bis[N-naphthyl-N-phenylamino] biphenyl, α-NPD) or an array of stars formula polyamine (4,4 ', 4 " tris (3-methylphenylphenylamino) triphenylamine, m-MTDATA) etc.
Step S03: see also Fig. 4, adopt spin coating method, on this electricity hole transport layer 23, apply one second photoresist layer 241.One second mask pattern is provided, this second photoresist layer 241 is carried out exposure imaging and etching forms a plurality of first color pixel zones 251.The position in this first color pixel zone 251 is corresponding to this first anode pattern 211.
Step S04: see also Fig. 5, adopt ink ejecting method that the first look luminescent material is sprayed to this a plurality of first color pixel zones 251, form a plurality of first look luminescent layers 261.The material of this first look luminescent layer 261 is high-molecular luminous materials, p-phenylene vinylene (Para-phenylenevinylene, PPV) series or lycid alkene (Rubrene) or the methyl-2-tert-butyl group-6-(1,1 for example, 7, the 7-tetramethyl is coughed up Ding Ji-9-thiazolinyl for a long time)-4H-pyrans (DCJTB) etc.
Step S05: see also Fig. 6, after suitable sclerosis, remove the remaining second photoresist layer 241, adopt spin coating method, on this electricity hole transport layer 23, apply one the 3rd photoresist layer 242.One the 3rd mask pattern is provided, the 3rd photoresist layer is carried out exposure imaging and etching forms a plurality of second color pixel zones 252.The position in this second color pixel zone 252 is corresponding to this second plate pattern 212.
Step S06: see also Fig. 7, adopt ink ejecting method that the second look luminescent material is sprayed to this a plurality of second color pixel zones 252, form a plurality of second look luminescent layers 262.The material of this second look luminescent layer 262 is high-molecular luminous materials, p-phenylene vinylene (Para-phenylenevinylene for example, PPV) series or aluminium complex compound (Aluminum-quinoline Complex, AlQ3) or the Kui acridone (Quinacridone, QA) etc.
Step S07: see also Fig. 8, after suitable sclerosis, remove remaining the 3rd photoresist layer 242.Adopt spin coating method, on this electricity hole transport layer 23, apply one the 4th photoresist layer 243.One the 4th mask pattern is provided, the 4th photoresist layer 243 is carried out exposure imaging and etching forms a plurality of the 3rd color pixel zones 253.The position in the 3rd color pixel zone 253 is corresponding to this third anode pattern 213.
Step S08: see also Fig. 9, adopt ink ejecting method that the three-colour light-emitting material is sprayed to this a plurality of the 3rd color pixel zones 253, form a plurality of three-colour light-emitting layers 263.After suitable sclerosis, remove remaining the 4th photoresist layer.The material of this three-colour light-emitting layer 263 is high-molecular luminous materials, for example the p-phenylene vinylene (Para-phenylenevinylene, PPV) series or bismuth complex compound (Bis (10-hydroxybenzo[h] quinolinato) Beryllium, BeBq2) etc.This first luminescent layer 261, this second look luminescent layer 262 and this three-colour light-emitting layer 263 constitute a luminescent layer 26.
Step S09: see also Figure 10, adopt spin coating method or vacuum vapour deposition, on this luminescent layer 26, form an electron transfer layer 27 and an electron injecting layer 28 successively.The material of this electron transfer layer 27 and this electron injecting layer 28 is the aromatic compounds etc. with big conjugate planes.
Step S10: see also Figure 11, adopt physical vaporous deposition or chemical vapour deposition technique, on this electron injecting layer 28, form a negative electrode 29, thereby finish the manufacturing of this organic electro-luminescent display.The material of this negative electrode can be the alloy of silver (Ag), magnesium (Mg), indium (In), aluminium metals such as (Al) or magnesium and silver etc.
Seeing also Figure 12, is the floor map of the luminescent layer 26 of the organic electro-luminescent display that produces with said method.R represents this first look luminescent layer 261, and G represents this second look luminescent layer 262, and B represents this three-colour light-emitting layer 263.The arrangement of this R, G and B is a rectangular, and each row is whole-colored luminescent layers, and each row is that RGB three-colour light-emitting layer is alternately arranged in regular turn.
The manufacture method of organic electro-luminescent display of the present invention is owing to adopt the auxiliary traditional ink ejecting method of masking process, can break through the restriction of traditional ink-jet (Ink-jet Printing) size of method jet orifice and the positioning accuracy of ink gun, thereby produce organic electro-luminescent display with high-resolution.
It is described that the manufacture method of organic electro-luminescent display of the present invention is not limited to above-mentioned execution mode, and for example the material of each of this organic electro-luminescent display layer can also be other high-molecular luminous material.In addition, the manufacture method of this organic electro-luminescent display can be omitted the step that forms this electricity hole implanted layer and this electron injecting layer.The manufacture method of this organic electro-luminescent display can also further be omitted the step that forms this electricity hole transport layer and this electron transfer layer.
Claims (10)
1. the manufacture method of an organic electro-luminescent display, it may further comprise the steps:
One substrate is provided, on this substrate, forms anode pattern;
On this substrate and anode pattern, form an electric hole implanted layer;
On this electricity hole implanted layer, form an electric hole transport layer;
On this electricity hole transport layer, form a luminescent layer;
On this luminescent layer, form an electron transfer layer;
On this electron transfer layer, form an electron injecting layer; And
On this electron injecting layer, form a negative electrode;
It is characterized in that: forming a luminescent layer on this electricity hole transport layer is to adopt the auxiliary ink ejecting method of masking process.
2. the manufacture method of organic electro-luminescent display as claimed in claim 1, it is characterized in that: adopt the auxiliary ink ejecting method of masking process, comprise in the step that forms luminescent layer on this electricity hole transport layer: on this electricity hole transport layer, form a photoresist layer, adopt a mask pattern, this photoresist layer exposure imaging and etching are formed a plurality of first color pixel zones; Adopt ink ejecting method to form the first look luminescent layer in this first color pixel zone; Remove the residue photoresist; On this electricity hole transport layer, form another photoresist layer, adopt a mask pattern, this another photoresist layer exposure imaging and etching are formed a plurality of second color pixel zones; Adopt ink ejecting method to form the second look luminescent layer in this second color pixel zone; Remove the residue photoresist; On this electricity hole transport layer, form another photoresist layer, adopt a mask pattern, this another photoresist layer exposure imaging and etching are formed a plurality of the 3rd color pixel zones; Adopt ink ejecting method to form the three-colour light-emitting layer in the 3rd color pixel zone; Remove the residue photoresist.
3. the manufacture method of organic electro-luminescent display as claimed in claim 2, it is characterized in that: the material of this first look luminescent layer is p-phenylene vinylene's series or lycid alkene or the methyl-2-tert-butyl group-6-(1,1,7, the 7-tetramethyl is coughed up Ding Ji-9-thiazolinyl for a long time)-the 4H-pyrans.
4. the manufacture method of organic electro-luminescent display as claimed in claim 2, it is characterized in that: the material of this second look luminescent layer is p-phenylene vinylene's series or aluminium complex compound or Kui acridone.
5. the manufacture method of organic electro-luminescent display as claimed in claim 2, it is characterized in that: the material of this three-colour light-emitting layer is p-phenylene vinylene's series or bismuth complex compound.
6. the manufacture method of organic electro-luminescent display as claimed in claim 1 is characterized in that: this electricity hole implanted layer is to adopt spin coating method or vacuum vapour deposition to form.
7. the manufacture method of organic electro-luminescent display as claimed in claim 1 is characterized in that: this electron injecting layer is to adopt spin coating method or vacuum vapour deposition to form.
8. the manufacture method of organic electro-luminescent display as claimed in claim 1 is characterized in that: this electricity hole transport layer is to adopt spin coating method or vacuum vapour deposition to form.
9. the manufacture method of an organic electro-luminescent display, it may further comprise the steps:
One substrate is provided, on this substrate, forms anode pattern;
On this anode pattern, form luminescent layer; And
On this luminescent layer, form a negative electrode;
It is characterized in that: forming a luminescent layer on this anode pattern is to adopt the auxiliary ink ejecting method of masking process.
10. the manufacture method of organic electro-luminescent display as claimed in claim 9, it is characterized in that: adopt the auxiliary ink ejecting method of masking process, comprise in the step that forms luminescent layer on this anode pattern: on this anode pattern, form a photoresist layer, adopt a mask pattern, this photoresist layer exposure imaging and etching are formed a plurality of first color pixel zones; Adopt ink ejecting method to form the first look luminescent layer in this first color pixel zone; Remove the residue photoresist; On this anode pattern, form another photoresist layer, adopt a mask pattern, this another photoresist layer exposure imaging and etching are formed a plurality of second color pixel zones; Adopt ink ejecting method to form the second look luminescent layer in this second color pixel zone; Remove the residue photoresist; On this anode pattern, form another photoresist layer, adopt a mask pattern, this another photoresist layer exposure imaging and etching are formed a plurality of the 3rd color pixel zones; Adopt ink ejecting method to form the three-colour light-emitting layer in the 3rd color pixel zone; Remove the residue photoresist.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CNA2006101578705A CN101207185A (en) | 2006-12-22 | 2006-12-22 | Method for manufacturing organic electro photoluminescence display |
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| CNA2006101578705A CN101207185A (en) | 2006-12-22 | 2006-12-22 | Method for manufacturing organic electro photoluminescence display |
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| CN101207185A true CN101207185A (en) | 2008-06-25 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103805957A (en) * | 2012-11-14 | 2014-05-21 | 三星显示有限公司 | Device for depositing organic material |
| WO2018036542A1 (en) * | 2016-08-26 | 2018-03-01 | 纳晶科技股份有限公司 | Manufacturing method for light emitting device, light emitting device, and hybrid light emitting device |
| WO2019075797A1 (en) * | 2017-10-20 | 2019-04-25 | 东莞理工学院 | Method for preparing printed oled display screen |
-
2006
- 2006-12-22 CN CNA2006101578705A patent/CN101207185A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103805957A (en) * | 2012-11-14 | 2014-05-21 | 三星显示有限公司 | Device for depositing organic material |
| WO2018036542A1 (en) * | 2016-08-26 | 2018-03-01 | 纳晶科技股份有限公司 | Manufacturing method for light emitting device, light emitting device, and hybrid light emitting device |
| US10943781B2 (en) | 2016-08-26 | 2021-03-09 | Najing Technology Corporation Limited | Manufacturing method for light emitting device, light emitting device, and hybrid light emitting device |
| WO2019075797A1 (en) * | 2017-10-20 | 2019-04-25 | 东莞理工学院 | Method for preparing printed oled display screen |
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