CN101191564A - Control valve for exhaust apparatus, exhaust apparatus and exhaust method - Google Patents
Control valve for exhaust apparatus, exhaust apparatus and exhaust method Download PDFInfo
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- CN101191564A CN101191564A CNA2006101187805A CN200610118780A CN101191564A CN 101191564 A CN101191564 A CN 101191564A CN A2006101187805 A CNA2006101187805 A CN A2006101187805A CN 200610118780 A CN200610118780 A CN 200610118780A CN 101191564 A CN101191564 A CN 101191564A
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- cavity
- bellows
- sealing cover
- control valve
- gas appliance
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Abstract
The invention discloses a control valve for exhaust apparatus. The control valve (1) is provided inside with an cavity (10) which comprises: a corrugated pipe (11) capable of telescoping elastically arranged in the cavity (10), a seal cover (12) which is fixedly connected with the corrugated pipe (11) and is capable of telescoping elastically, an air admission cavity (13) communicated with the seal cover (12), and exhaust cavities (14) which are respectively arranged in the vertical directions of the corrugated pipe (11) and the seal cover (12) and are communicated with each other. The invention also discloses an exhaust apparatus with the control valve structure. In addition, the invention further discloses an exhaust method applied to the exhaust apparatus. The invention can be applicable to equipment with exhaust apparatus, in particular to semiconductor device manufacture industry.
Description
Technical field
The present invention relates to a kind of control valve that is used for the venting gas appliance of fabrication of semiconductor device; The invention still further relates to venting gas appliance; The invention still further relates to the method for exhausting that is used for above-mentioned venting gas appliance in addition.
Background technique
At present, the structure of existing venting gas appliance and control valve thereof as shown in Figure 3, control valve 3 mainly comprise bellows 30, with bellows 30 interconnect and do elastic telescopic sealing cover 31, be arranged to length direction vertical and air inlet cavity 32 that is interconnected and the exhaust cavity 33 that is interconnected with sealing cover 31 end faces with bellows 30 and sealing cover 31.Be not difficult to find out in the said structure, the air-flow that enters big flow high temperature from air inlet cavity 32 directly impacts bellows 30, especially in process for fabrication of semiconductor device, this gas flow temperature is very high and impact force is big, sometimes the normal elasticity that influences bellows 30 is flexible, sometimes the cracking that causes bellows 30 damages, and work will be changed bellows 30 less than 2 years.The venting gas appliance of for example existing MAS8220 board, also adopt the air inlet cavity perpendicular to the bellows setting, make the air-flow of big flow high temperature directly impact bellows, the bellows in about 2 years of general use just ftractures, have a strong impact on the manufacture process of semiconductor devices, maintenance load increases, and manufacture cost also improves.
Summary of the invention
At the above-mentioned deficiency of prior art, one of technical problem to be solved by this invention provides a kind of air-flow of avoiding and directly impacts the ripple tube outer surface, can improve bellows working life, thereby can effectively reduce the control valve of the venting gas appliance of maintenance load.
Two of technical problem to be solved by this invention is to propose a kind of venting gas appliance that possesses above-mentioned control valve.
Three of technical problem to be solved by this invention is to propose a kind of method for exhausting that is applied to be exclusively used in the fabrication of semiconductor device above-mentioned venting gas appliance.
In order one of to solve the problems of the technologies described above, the control valve of the venting gas appliance that the present invention proposes, comprise cavity, this cavity has: but be located at the bellows of end in the cavity and elastic telescopic, fixedly connected and make the sealing cover of elastic telescopic, the air inlet cavity that communicates with the end face of described sealing cover and at the vertical exhaust cavity that is provided with and is interconnected of length direction of described bellows and described sealing cover with described bellows.Above-mentioned bellows and sealing cover preferably adopt metallic material.
For solve the problems of the technologies described above two, inflation mechanism and above-mentioned control valve that the venting gas appliance that the present invention proposes comprises the working room, is interconnected with described working room, cavity one end and the described working room of control valve inside are interconnected, and the other end is connected with vacuum pump.
For solve the problems of the technologies described above three, the method for exhausting that the present invention proposes, be used for above-mentioned venting gas appliance, comprise following steps: after flowing into the end face of described sealing cover to the air-flow high temperature impact formula in the air inlet cavity, under the situation that described bellows and described sealing cover shrink, with the steps of exhausting of described air-flow from described exhaust cavity discharge; When inflated described working room, described bellows and described sealing cover were the isolation step of described vacuum pump isolation at described inflation mechanism; Close described inflation mechanism when the inflation of described working room, described vacuum pump vacuumizes step to what described working room vacuumized; And in the step of continuous operation incessantly of control valve described in the fabrication of semiconductor device.
Now for prior art, the control valve of venting gas appliance of the present invention makes big flow high temperature gas flow impact on firm sealing cover end face by the air inlet cavity, and discharge from the exhaust cavity, avoided air-flow directly to impact the ripple tube outer surface and made the problem of bellows bursts easily, thus the working life that reduces maintenance load, improved venting gas appliance.Control valve of the present invention can be applicable to have the equipment of venting gas appliance, is particularly useful for the semiconductor devices manufacturing industry.
When inflated the working room, bellows and sealing cover played the effect that vacuum pump is kept apart to venting gas appliance of the present invention at inflation mechanism, stopped the operation that vacuum pump vacuumizes to the working room, just finished the operation requirement that semiconductor devices is made.Adopt venting gas appliance of the present invention and method for exhausting thereof, prevent the splintering problem of bellows effectively,, can bring up to 3 years its working life, reduced maintenance cost to 4 years from present practical situation.
Description of drawings
Fig. 1 is the structural representation of the control valve of venting gas appliance of the present invention;
Fig. 2 is the structural representation of venting gas appliance of the present invention;
Fig. 3 is the structural representation of existing venting gas appliance.
In the accompanying drawing: the 1-control valve; The 10-cavity; The 11-bellows; The 12-sealing cover; 13-air inlet cavity; 14-exhaust cavity; The 20-working room; The 21-inflation mechanism; The 22-vacuum pump; The 3-control valve; The 30-bellows; The 31-sealing cover; 32-air inlet cavity; 33-exhaust cavity.
Embodiment
The present invention is further detailed explanation below in conjunction with drawings and Examples.
Embodiment 1
As shown in Figure 1, the control valve 1 of the venting gas appliance that a preferred embodiment of the present invention proposes, in be provided with cavity 10; Cavity 10 be included in be provided with in cavity 10 1 ends have as elasticity stretch out with the bellows 11 that shrinks, with bellows 11 fixedly connected and as elasticity stretch out with the sealing cover 12 that shrinks, the air inlet cavity 13 that communicates with sealing cover 12 and with the vertical exhaust cavity 14 that is provided with and is interconnected of bellows 11 with sealing cover 12 length directions.Bellows 11 and sealing cover 12 adopt metallic material.Its structure needing can be used for exhaust and air-breathing device; Especially be fit to the manufacturing process that semiconductor devices is made.
Embodiment 2
As shown in Figure 2, the venting gas appliance of a preferred embodiment of the present invention proposition comprises:
Make the working room 20 of semiconductor devices;
The inflation mechanism 21 that is interconnected with working room 20;
The control valve 1 that is interconnected with working room 20;
The other end of control valve 1 connects the vacuum pump 22 that vacuumizes;
Be provided with cavity 10 in the control valve 1, cavity 10 comprises: in cavity 10 1 ends, be provided with have as elasticity stretch out with the bellows 11 that shrinks, with bellows 11 fixedly connected and as elasticity stretch out the air inlet cavity 13 that is interconnected with the sealing cover 12 that shrinks, with sealing cover 12 and with the vertical exhaust cavity 14 that is provided with and is interconnected of bellows 11 with sealing cover 12 length directions.Bellows 11 and sealing cover 12 all can adopt metallic material.
The venting gas appliance of present embodiment is applied to the semiconductor devices manufacturing industry, also can be applicable to have the equipment of venting gas appliance.
A preferred embodiment of the present invention provide method for exhausting, as depicted in figs. 1 and 2, the venting gas appliance that is used for embodiment 2, the method includes the steps of: after air-flow flow into the end face of sealing cover 12 with entering air inlet cavity 13 and impact type, under the situation of bellows 11 and sealing cover 12 contractions, has the steps of exhausting that said flow is discharged from exhaust cavity 14; Inflation mechanism 21 is when working room's 20 inflations, and bellows 11 and sealing cover 12 play the isolation step of the effect that vacuum pump 22 is isolated; Close inflation mechanism 21 when working room 20 inflation, have vacuum pump 22 and vacuumize step to what working room 20 vacuumized; Control valve 1 has the step of continuous operation incessantly in fabrication of semiconductor device.
The method for exhausting of present embodiment is avoided bellows to be subjected to the impact force of air-flow, thereby has been improved the working life of venting gas appliance.
Claims (4)
1. the control valve of a venting gas appliance, comprise cavity (10), it is characterized in that, described cavity (10) have be located at cavity (10) but in an end and the bellows (11) of elastic telescopic, fixedly connected and make the sealing cover (12) of elastic telescopic, the air inlet cavity (13) that communicates with the end face of described sealing cover (12) and at the vertical exhaust cavity (14) that is provided with and is interconnected of length direction of described bellows (11) and described sealing cover (12) with described bellows (11).
2. according to the venting gas appliance described in the claim 1, it is characterized in that described bellows (11) adopts metallic material, described sealing cover (12) also adopts metallic material.
3. venting gas appliance, it is characterized in that, inflation mechanism (21) and claim 1 or 2 described control valves (1) that this device comprises working room (20), is interconnected with described working room (20), inner cavity (10) one ends and described working room (20) of control valve (1) are interconnected, and the other end is connected with vacuum pump (22).
4. a method for exhausting is characterized in that, is used for the venting gas appliance described in the claim 3, and this method comprises following steps:
After flowing into the end face of described sealing cover (12) to air-flow high temperature impact formula in the air inlet cavity (13), under the situation that described bellows (11) and described sealing cover (12) shrink, with the steps of exhausting of described air-flow from described exhaust cavity (14) discharge;
When inflated described working room (20), described bellows (11) and described sealing cover (12) were the isolation step of described vacuum pump (22) isolation at described inflation mechanism (21);
Close described inflation mechanism (21) when inflate described working room (20), described vacuum pump (22) vacuumizes step to what described working room (20) vacuumized; And
In control valve described in the fabrication of semiconductor device (1) step of continuous operation incessantly.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2006101187805A CN101191564A (en) | 2006-11-27 | 2006-11-27 | Control valve for exhaust apparatus, exhaust apparatus and exhaust method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2006101187805A CN101191564A (en) | 2006-11-27 | 2006-11-27 | Control valve for exhaust apparatus, exhaust apparatus and exhaust method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101191564A true CN101191564A (en) | 2008-06-04 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2006101187805A Pending CN101191564A (en) | 2006-11-27 | 2006-11-27 | Control valve for exhaust apparatus, exhaust apparatus and exhaust method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101191564A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102374315A (en) * | 2010-08-23 | 2012-03-14 | 无锡华润上华半导体有限公司 | One-way control valve, vacuum device for chip manufacture procedure and gas recoil preventing method |
| CN106024677A (en) * | 2016-05-30 | 2016-10-12 | 上海华力微电子有限公司 | System for preventing reverse flow in exhaust pipe and process chamber |
-
2006
- 2006-11-27 CN CNA2006101187805A patent/CN101191564A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102374315A (en) * | 2010-08-23 | 2012-03-14 | 无锡华润上华半导体有限公司 | One-way control valve, vacuum device for chip manufacture procedure and gas recoil preventing method |
| CN106024677A (en) * | 2016-05-30 | 2016-10-12 | 上海华力微电子有限公司 | System for preventing reverse flow in exhaust pipe and process chamber |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
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| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Open date: 20080604 |