CN101169550A - Colorful filter substrate and pattern mask - Google Patents
Colorful filter substrate and pattern mask Download PDFInfo
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- CN101169550A CN101169550A CNA2007101964979A CN200710196497A CN101169550A CN 101169550 A CN101169550 A CN 101169550A CN A2007101964979 A CNA2007101964979 A CN A2007101964979A CN 200710196497 A CN200710196497 A CN 200710196497A CN 101169550 A CN101169550 A CN 101169550A
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- trapezoidal
- recess
- protuberance
- filter substrate
- pattern mask
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Abstract
The invention discloses a colorful filter-sheet substrate and a patterning mask. The colorful filter-sheet substrate comprises a shading layer and a filter material layer; wherein, the shading layer is provided with a penetrating opening, and the filter material layer at least covers the penetrating opening. The filter material layer is provided with a trapezoidal raised part, a long penetrating edge of which is corresponding to the penetrating opening and covers a part of the shading layer.
Description
[technical field]
The invention relates to a kind of colored filter substrate and pattern mask, and particularly relevant for a kind of colored filter substrate and pattern mask that reduces the mask atomizating phenomenon.
[background technology]
Display panels has that volume is little, image quality is high and advantage such as the life-span is long, makes display panels be widely used in the various electronic installation.Display panels mainly is made up of backlight module, thin film transistor base plate and colored filter substrate.In the process of making thin film transistor base plate and colored filter substrate, lithographic process is a common fabrication steps.
With regard to colored filter, in the lithographic process of patterning filter layer, be as shielding, and with the light beam filter layer that exposes with a mask.
Yet in the process of filter layer exposure, light beam will excite the light initiator of filter layer, and excites pollutant.During the pollutant volatilization, will be attached on the mask, and cause the mask atomizing.The mask of atomizing will influence the precision of light beam.At this moment, production line must be changed mask, could produce again.Thus, not only influence product quality, more reduce production capacity.Therefore, how to improve that the situation of mask atomizing is real to be an important directions of present research and development.
[summary of the invention]
The invention relates to a kind of colored filter substrate and pattern mask, the structure that it utilizes trapezoidal protuberance and trapezoidal recess changes the scattering path of segment beam.Can avoid receiving too much light beam, to reduce the volatile quantity of pollutant at the same place of filter layer.
According to an aspect of the present invention, propose a kind of colored filter substrate, comprise a light shield layer and a filter layer.Light shield layer has a light openings.The filter series of strata cover light openings at least.The filter layer has a trapezoidal protuberance.Trapezoidal protuberance is the light shield layer corresponding to long limit of a printing opacity of light openings and covering part branch.
According to a further aspect in the invention, a kind of pattern mask is proposed, in order to patterning one filter layer.The filter series of strata are formed on the colored optical filtering substrates.Pattern mask comprises a transparent substrates and a shielding pattern layer.The light-shielding pattern series of strata are formed on the transparent substrates.Shielding pattern layer has an exposure opening, and the exposure opening has a trapezoidal recess.Trapezoidal recess is the long limit of an exposure that is positioned at the exposure opening.
For foregoing of the present invention can be become apparent, preferred embodiment cited below particularly, and cooperate appended graphicly, be described in detail below:
[description of drawings]
Fig. 1 illustrates the synoptic diagram according to the colored rate mating plate substrate (Color FilterSubstrate) of first embodiment of the invention;
Fig. 2 illustrates the manufacturing flow chart of the colored filter substrate of Fig. 1;
Fig. 3 A~3H illustrates the synoptic diagram according to each step of Fig. 2;
Fig. 4 illustrates the synoptic diagram according to the colored filter substrate of second embodiment of the invention;
Fig. 5 illustrates the synoptic diagram according to the pattern mask of second embodiment of the invention;
Fig. 6 illustrates the synoptic diagram according to the colored filter substrate of third embodiment of the invention; And
Fig. 7 illustrates the synoptic diagram according to the pattern mask of third embodiment of the invention.
[embodiment]
First embodiment
Please refer to Fig. 1, it illustrates the synoptic diagram according to the colored rate mating plate substrate (ColorFilter Substrate) 100 of first embodiment of the invention.Colored filter substrate 100 comprises a light shield layer 110 and a filter layer 120.Light shield layer 110 (being called black matrix" (Black Matrix) again) has a light openings 111 (zone shown in dotted line).Filter layer 120 is to cover light openings 111 at least, in the present embodiment, and filter layer 120 complete covering light openings 111 and a part of light shield layer 110.Filter layer 120 has a trapezoidal protuberance 121, and trapezoidal protuberance 121 is the light shield layer 110 corresponding to long limit 111a of one first printing opacity of light openings 111 and covering part branch.As shown in Figure 1, filter layer 120 is not to be a straight line at 111a place, the long limit of first printing opacity, but outwards protrudes with trapezoidal protuberance 121.
The material of filter layer 120 is the light transmissive material with certain primary colors, for example is red light transmissive material, green light transmissive material or blue light transmissive material.Generally speaking, between two adjacent picture elements, two filter layers 120 are to separate with light shield layer 110, can not pollute mutually to guarantee two adjacent picture elements, and improve the contrast of color.
Though trapezoidal protuberance 121 is outside protrusion, trapezoidal protuberance 121 still is positioned at the scope of light shield layer 110, does not exceed the scope to another picture element.As shown in Figure 1, the protuberance height 121d of trapezoidal protuberance 121 is less than the space D 120 of adjacent two filter layers 120.Therefore, between two adjacent picture elements, still do good separating with light shield layer 110.
The trapezoidal protuberance 121 of present embodiment is an isosceles trapezium structure.So two protuberance hypotenuse 121c of trapezoidal protuberance 121 equate with two angle theta 121 protruding minister limit 121b.
Please be simultaneously with reference to Fig. 2 and Fig. 3 A~3H, Fig. 2 illustrates the manufacturing flow chart of the colored filter substrate 100 of Fig. 1, and Fig. 3 A~3H illustrates the synoptic diagram according to each step of Fig. 2.At first, please refer to Fig. 3 A, in step S102, provide a transparent substrates 130.
Then, please refer to Fig. 3 B, in step S104, form a light screening material 110 ' on transparent substrates 130.
Then, please refer to Fig. 3 C, in step S106, patterning light shield layer 110 is to form several light openings 111.
Then, please refer to Fig. 3 D, in step S108, formation has a filter layer 120 of certain primary colors on transparent substrates 130.
Then, please refer to Fig. 3 E, in step S110, provide a pattern mask 200.Pattern mask 200 comprises a transparent substrates 210 and a shielding pattern layer 220.Shielding pattern layer 220 is to be formed on the transparent substrates 210.Shielding pattern layer 220 has an exposure opening 230.Above-mentioned filter layer 120 is a kind of minus photoresistance, and filter layer 120 sees through 230 exposures of exposure opening and through behind the developing liquid developing, the filter layer 120 that has exposed will stay.That is to say that the shape system of exposure opening 230 is corresponding to the shape of the exposing material layer of desiring to stay 120.
In more detail, please be simultaneously with reference to Fig. 1 and Fig. 3 E.Exposure opening 230 has a trapezoidal recess 231.Trapezoidal recess 231 is the trapezoidal protuberance 121 with respect to exposing material layer 120.Trapezoidal recess 231 is the long limit 230a of one first exposure that is positioned at exposure opening 230.So exposure opening 230 is not to be a straight line at 230a place, the long limit of first exposure, but with the retraction laterally of trapezoidal recess 231.
The trapezoidal recess 231 of present embodiment is an isosceles trapezium structure.So two recess hypotenuse 231c of trapezoidal recess 231 equate with two angle theta 231 of the long limit 231b of recess.
Then, please refer to Fig. 3 F, in step S112, is shielding with pattern mask 200, and above-mentioned filter layer 120 exposes.
Then, please refer to Fig. 3 G and 3H, in step S114, the filter layer 120 that has exposed with developing liquid developing.Wherein Fig. 3 G is the sectional view of the colored filter substrate 100 of the pattern mask 200 of Fig. 3 E and Fig. 1 along section line G-G ', and Fig. 3 H is the sectional view of the colored filter substrate 100 of the pattern mask 200 of Fig. 3 E and Fig. 1 along section line H-H '.Shown in Fig. 3 H, the trapezoidal recess 231 of pattern mask 200 is the trapezoidal protuberance 121 corresponding to colored filter substrate 100.So trapezoidal recess 231 is the subregion corresponding to the light shield layer 110 of colored filter substrate 100, do not exceed the scope of light shield layer 110.Therefore, the filter layer 120 that stays does not exceed the scope to another picture element.
So, promptly form a picture element with above-mentioned primary colors.Remaining picture element can also form the picture element with other primary colors by step S108 to step S114.For example repeat the picture element that three step S108 and step S110 can form three kinds of primary colors (red, green and blue).
In above-mentioned step of exposure, the trapezoidal recess 231 of exposure opening 230 has changed the scattering path of segment beam, has therefore reduced the chance of beam excitation filter layer 120.Make the volatile quantity of pollutant significantly reduce, more reduce the situation of pattern mask 200 atomizings.
Though in the colored filter substrate 100 and pattern mask 200 of the foregoing description, filter layer 120 is to be that example explains with a trapezoidal protuberance 121, exposure opening 230 is to be that example explains with a trapezoidal recess 231.Yet the quantity of trapezoidal protuberance 121 and trapezoidal recess 231 is not that the quantity system of for example trapezoidal protuberance 121 and trapezoidal recess 231 can be two, three even a plurality of in order to qualification the present invention.Deviser system can select the right quantity of trapezoidal protuberance 121 and trapezoidal recess 231 according to product demand and process conditions for use.In order to clearly demonstrate various enforcement aspects, below more be described as follows with second embodiment and the 3rd embodiment.
Second embodiment
Please refer to Fig. 4, it illustrates the synoptic diagram according to the colored filter substrate 300 of second embodiment of the invention.The colored filter substrate 300 of present embodiment and the colored filter substrate of first embodiment 100 are different be in: the filter layer 320 of present embodiment has two trapezoidal protuberances, and all the other are identical locates no longer to repeat.
As shown in Figure 4, filter layer 320 has long limit 111a of first printing opacity and the long limit 111b of second printing opacity that the first trapezoidal protuberance 321 and second trapezoidal protuberance 322, the first trapezoidal protuberances 321 and the second trapezoidal protuberance 322 correspond respectively to light openings 111.The first trapezoidal protuberance 321 and the second trapezoidal protuberance 322 are staggered.The first trapezoidal protuberance 321 is positioned at 1/3rd places of the long limit 111a of first printing opacity, and the second trapezoidal protuberance 322 is positioned at 2/3rds places of the long limit 111b of second printing opacity.
The first trapezoidal protuberance 321 of present embodiment and the second trapezoidal protuberance 322 are similar to trapezoidal protuberance 121 shapes of first embodiment in fact, no longer repeat at this.And the area of the first trapezoidal protuberance 32 1 equals the area of the second trapezoidal protuberance 322 in fact.
In addition, the colored filter substrate 300 pairing pattern masks 400 of present embodiment also have corresponding structure.Please refer to Fig. 5, it illustrates the synoptic diagram according to the pattern mask 400 of second embodiment.Pattern mask 200 differences of the pattern mask 400 of present embodiment and first embodiment are: the exposure opening 430 of present embodiment has two trapezoid-shaped openings, and all the other something in common no longer repeat.
As shown in Figure 5, exposure opening 430 has first trapezoid-shaped openings 431 and second trapezoid-shaped openings 432.The first trapezoidal recess 321 and the second trapezoidal recess 432 lay respectively at the relative long limit 230a of first exposure and the long limit 230b of second exposure of exposure opening 430.The first trapezoidal recess 431 and the second trapezoidal recess 432 are staggered.The first trapezoidal recess 431 is positioned at 1/3rd places of the long limit 230a of first exposure, and the second trapezoidal recess 432 is positioned at 2/3rds places of the long limit 230b of second exposure.
The first trapezoidal recess 431 of present embodiment and the second trapezoidal recess 432 are similar to trapezoidal recess 231 shapes of first embodiment in fact, no longer repeat at this.And the area of the first trapezoidal recess 431 equals the area of the second trapezoidal recess 432 in fact.
As mentioned above, the long limit 230a of first exposure of exposure opening 430 and 230b place, the long limit of second exposure all can see through the scattering path that the first trapezoidal recess 431 and the second trapezoidal recess 432 change segment beam respectively.Thus, can avoid receiving too much light beam, to reduce the volatile quantity of pollutant at the same place of filter layer 320.
The 3rd embodiment
Please refer to Fig. 6, it illustrates the synoptic diagram according to the colored filter substrate 500 of third embodiment of the invention.The colored filter substrate 500 of present embodiment and the colored filter substrate of first embodiment 100 are different be in: the filter layer 520 of present embodiment has three trapezoidal protuberances, and all the other are identical locates no longer to repeat.
As shown in Figure 6, filter layer 520 has one first trapezoidal protuberance 521, one second trapezoidal protuberance 522 and one the 3rd trapezoidal protuberance 523.First trapezoidal protuberance 521, the second trapezoidal protuberance 522 and the 3rd trapezoidal protuberance 523 are to be staggered.The first trapezoidal protuberance 521 is the midpoint corresponding to the long limit 111a of first printing opacity of light openings 111, and the second trapezoidal protuberance 522 and the 3rd trapezoidal protuberance 523 correspond respectively to 1/4th and 3/4ths places of the long limit 111b of second printing opacity of light openings 111.
First trapezoidal protuberance 521, the second trapezoidal protuberance 522 of present embodiment is similar to trapezoidal protuberance 121 shapes of first embodiment in fact to the 3rd trapezoidal protuberance 523, no longer repeats at this.Wherein the area of the first trapezoidal protuberance 521 is greater than the area of the second trapezoidal protuberance 522, and the area of the second trapezoidal protuberance 522 equals the area of the 3rd trapezoidal protuberance 523.
In addition, the colored filter substrate 500 pairing pattern masks 600 of present embodiment also have corresponding structure.Please refer to Fig. 7, it illustrates the synoptic diagram according to the pattern mask 600 of third embodiment of the invention.The pattern mask 600 of present embodiment and the pattern mask of first embodiment 200 are different is in 630 3 trapezoid-shaped openings of the exposure opening of present embodiment, and all the other are identical locates no longer to repeat.
As shown in Figure 7, exposure opening 630 has one first trapezoidal recess 631, one second trapezoidal recess 632 and one the 3rd trapezoidal recess 633.The first trapezoidal recess 631 is the midpoint that is positioned at the long limit 230a of first exposure of exposure opening 630, and the second trapezoidal recess 632 and the 3rd trapezoidal recess 633 are 1/4th and 3/4ths places that are positioned at the long limit 230b of second exposure of exposure opening 630.
First trapezoidal recess 631, the second trapezoidal recess 632 of present embodiment is similar to trapezoidal recess 230 shapes of first embodiment in fact to the 3rd trapezoidal recess 633, no longer repeats at this.Wherein the area of the first trapezoidal recess 631 is greater than the area of the second trapezoidal recess 632, and the area of the second trapezoidal recess 632 equals the area of the 3rd trapezoidal recess 633.
As mentioned above, the long limit 230a of first exposure of exposure opening 630 and 230b place, the long limit of second exposure all can see through the scattering path that first trapezoidal recess 631, the second trapezoidal recess 632 and the 3rd trapezoidal recess 633 change segment beam respectively.Thus, can avoid receiving too much light beam, to reduce the volatile quantity of pollutant at the same place of filter layer 520.
In sum, though the present invention discloses as above with preferred embodiment, so it is not in order to limit the present invention.The persond having ordinary knowledge in the technical field of the present invention, without departing from the spirit and scope of the present invention, when being used for a variety of modifications and variations.Therefore, protection scope of the present invention is as the criterion when looking accompanying the claim person of defining.
Claims (16)
1. a colored filter substrate (Color Filter Substrate) comprising:
One light shield layer has a light openings; And
One filter layer is to cover this light openings at least, and this filter layer has one first trapezoidal protuberance, and this first trapezoidal protuberance is this light shield layer corresponding to long limit of one first printing opacity of this light openings and covering part branch.
2. colored filter substrate according to claim 1, it is characterized in that, this filter layer has more one second trapezoidal protuberance, and this first trapezoidal protuberance and this second trapezoidal protuberance are grown limit and the long limit of one second printing opacity corresponding to this relative first printing opacity of this light openings respectively.
3. colored filter substrate according to claim 1, it is characterized in that, this filter layer has more one second trapezoidal protuberance and one the 3rd trapezoidal protuberance, this first trapezoidal protuberance is a midpoint of growing the limit corresponding to this first printing opacity of this light openings, and this second trapezoidal protuberance and the 3rd trapezoidal protuberance are grown 1/4th places and 3/4ths places on limit respectively corresponding to one second printing opacity of this light openings.
4. colored filter substrate according to claim 3 is characterized in that, the area of this first trapezoidal protuberance is greater than the area of this second trapezoidal protuberance, and the area of this second trapezoidal protuberance equals the area of the 3rd trapezoidal protuberance.
5. colored filter substrate according to claim 1 is characterized in that, this first trapezoidal protuberance has a protuberance minor face and and protrudes the minister limit, and this protuberance minor face system is positioned at the outside on this protrusion minister limit.
6. colored filter substrate according to claim 5 is characterized in that, this first trapezoidal protuberance has a protuberance hypotenuse, and this protuberance hypotenuse and this protrude the angle on minister limit greater than 30 degree.
7. colored filter substrate according to claim 1 is characterized in that, this first trapezoidal protuberance is an isosceles trapezium structure.
8. colored filter substrate according to claim 1 is characterized in that, this first trapezoidal protuberance is the scope that is positioned at this light shield layer.
9. pattern mask, in order to patterning one filter layer, these filter series of strata are formed on the colored optical filtering substrates, and this pattern mask comprises:
One transparent substrates; And
One shielding pattern layer is to be formed on this transparent substrates, and this shielding pattern layer has an exposure opening, and this exposure opening has one first trapezoidal recess, and this first trapezoidal recess is the long limit of one first exposure that is positioned at this exposure opening.
10. pattern mask according to claim 9, it is characterized in that, this exposure opening more comprises one second trapezoidal recess, and this first trapezoidal recess and this second trapezoidal recess lay respectively at relative this long limit of first exposure and the long limit of one second exposure of this exposure opening.
11. pattern mask according to claim 9, it is characterized in that, this exposure opening has more one second trapezoidal recess and one the 3rd trapezoidal recess, this first trapezoidal recess is the midpoint that is positioned at this long limit of first exposure of this exposure opening, and this second trapezoidal recess and the 3rd trapezoidal recess are 1/4th places and 3/4ths places that are positioned at one second exposure length limit of this exposure opening.
12. pattern mask according to claim 11 is characterized in that, the area of this first trapezoidal recess is greater than the area of this second trapezoidal recess, and the area of this second trapezoidal recess equals the area of the 3rd trapezoidal recess.
13. pattern mask according to claim 9 is characterized in that, this first trapezoidal recess has a recess minor face and the long limit of a recess, and this recess minor face system is positioned at the outside on the long limit of this recess.
14. pattern mask according to claim 13 is characterized in that, this first trapezoidal recess has a recess hypotenuse, and the angle on the long limit of this recess hypotenuse and this recess is greater than 30 degree.
15. pattern mask according to claim 9 is characterized in that, this first trapezoidal recess comprises an isosceles trapezium structure.
16. pattern mask according to claim 9 is characterized in that, in this first trapezoidal recess system scope corresponding to a light shield layer of this colored filter substrate.
Priority Applications (1)
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CN2007101964979A CN101169550B (en) | 2007-12-04 | 2007-12-04 | Colorful filter substrate and pattern mask |
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CN2007101964979A CN101169550B (en) | 2007-12-04 | 2007-12-04 | Colorful filter substrate and pattern mask |
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CNA2009101455624A Division CN101587200A (en) | 2007-12-04 | 2007-12-04 | Colored filter substrate and pattern mask |
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CN101169550B CN101169550B (en) | 2010-06-02 |
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Cited By (5)
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CN106707609A (en) * | 2017-03-24 | 2017-05-24 | 京东方科技集团股份有限公司 | Colored film baseplate, manufacturing method thereof and display panel |
WO2018068383A1 (en) * | 2016-10-12 | 2018-04-19 | 深圳市华星光电技术有限公司 | Thin film transistor array substrate and preparation method therefor, and liquid crystal display panel |
CN110058487A (en) * | 2014-02-10 | 2019-07-26 | 爱思开海力士有限公司 | For inhibiting the photomask base plate and photomask of heat absorption |
CN111929993A (en) * | 2020-08-20 | 2020-11-13 | 深圳市爱普拓思科技有限公司 | Exposure device |
US11656492B2 (en) | 2019-01-07 | 2023-05-23 | Innolux Corporation | Electronic device |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4401806B2 (en) * | 2003-02-18 | 2010-01-20 | シャープ株式会社 | Composite film manufacturing method, composite film, color filter, and display device including color filter |
JP3962801B2 (en) * | 2003-08-06 | 2007-08-22 | Nec液晶テクノロジー株式会社 | Color filter substrate, liquid crystal display device, and method of manufacturing color filter substrate |
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2007
- 2007-12-04 CN CN2007101964979A patent/CN101169550B/en not_active Expired - Fee Related
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
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CN110058487A (en) * | 2014-02-10 | 2019-07-26 | 爱思开海力士有限公司 | For inhibiting the photomask base plate and photomask of heat absorption |
WO2018068383A1 (en) * | 2016-10-12 | 2018-04-19 | 深圳市华星光电技术有限公司 | Thin film transistor array substrate and preparation method therefor, and liquid crystal display panel |
CN106707609A (en) * | 2017-03-24 | 2017-05-24 | 京东方科技集团股份有限公司 | Colored film baseplate, manufacturing method thereof and display panel |
US10481426B2 (en) | 2017-03-24 | 2019-11-19 | Boe Technology Group Co., Ltd. | Method for manufacturing color filter substrate, color filter substrate and display panel |
US11656492B2 (en) | 2019-01-07 | 2023-05-23 | Innolux Corporation | Electronic device |
CN111929993A (en) * | 2020-08-20 | 2020-11-13 | 深圳市爱普拓思科技有限公司 | Exposure device |
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