CN1982924A - Color optical filter and its production - Google Patents
Color optical filter and its production Download PDFInfo
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- CN1982924A CN1982924A CNA2005101321208A CN200510132120A CN1982924A CN 1982924 A CN1982924 A CN 1982924A CN A2005101321208 A CNA2005101321208 A CN A2005101321208A CN 200510132120 A CN200510132120 A CN 200510132120A CN 1982924 A CN1982924 A CN 1982924A
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Abstract
A color filtering plate is prepared as setting black matrix on base plate and defining out multiple sub-pixel region on base plate, setting height of black matrix at each sub-pixel region to be lower gradually from periphery of sub-pixel region to internal of sub-pixel region and setting color dyed patterns separately in sub-pixel regions.
Description
Technical field
The present invention relates to a kind of color filter (color filter) and manufacture method thereof, and be particularly related to a kind of color filter and manufacture method thereof with preferable flat surface.
Background technology
Along with the modern video development of technology, liquid crystal indicator has been used on the display screen of consumption electronic products such as mobile phone, notebook, personal computer and PDA(Personal Digital Assistant) in large quantities.The liquid crystal panel of liquid crystal indicator mainly is made up of array base palte, liquid crystal layer and color filter, wherein array base palte be with color filter to group, and liquid crystal layer is to be positioned at it between the two.The generation type of above-mentioned color filter for example is to form black matrix (Black Matrix) earlier, forms colored colored pattern afterwards, and then forms the rete of electrode layer or protective seam or the like.
The material of black matrix generally is to select the metal of the high shaded effects of tool such as chromium, lead for use, yet, along with the enhancing of environmental consciousness, make that this type of metal is disabled gradually, and replace the material that becomes black matrix with black resin (resin).But, therefore the shading efficient of black resin, must increase the effect of the thickness competence exertion shading of black resin far away from metal.
Figure 1A is the partial schematic diagram of known color filter.Please refer to Figure 1A, known color filter 100 comprises transparency carrier 110, black matrix 120 and a plurality of colored colored pattern 130.Black matrix 120 is arranged on the substrate 110, and defines pixel region 122 on substrate 110 a plurality of times.These colored colored patterns 130 also comprise a plurality of red colored patterns 132, green coloring pattern 134 and blue-colored pattern 136, and it is arranged at respectively in the corresponding inferior pixel region 122.Generally speaking, the periphery of above-mentioned these colored colored patterns 130 can with the subregion overlaid of deceiving matrix 120, to reduce mixed color phenomenon.
Figure 1B is the diagrammatic cross-section of Figure 1A along A-A '.Please refer to Figure 1B, because the material of black matrix 120 is the relatively poor black resin of shading efficient, therefore black matrix 120 needs the effect of higher thickness competence exertion shading.Yet the black matrix 120 of higher thickness can cause the thickness inequality of colored colored pattern 130, influences thick behaviour's degree on color filter 100 surfaces.Specifically, the problem of thickness inequality mainly is the overlapping that occurs in colored colored pattern 130 and black matrix 120, this is because the thickness of black matrix 120 is too thick, and makes the colored colored pattern 130 that is positioned at this overlapping can exceed the height of about d than other position when forming.
Accept above-mentioned, when carrying out subsequent technique with color filter 100 and array base palte (not shown) to group after because too slightly grasp on color filter 100 surfaces, cause the bad problem of liquid crystal layer (not shown) generation orientation easily.In addition, if (One Drop Filling when ODF) assembling color filter 100 is with array base palte, also produces the vestige under the liquid crystal drop easily because color filter 100 surfaces are smooth inadequately with the formula injection method that drips.What deserves to be mentioned is that known skill has the lap that proposes to reduce the thickness of black matrix 120 or reduce colored colored pattern 130 and black matrix 120 to increase the flatness on color filter 100 surfaces.Yet the thickness that reduces black matrix 120 can reduce the shading efficient of black matrix 120 and cause light leak, and the lap that reduces colored colored pattern 130 and black matrix 120 can increase mixed color phenomenon.Therefore, above-mentioned dual mode is neither is good solution.
Summary of the invention
In view of the foregoing, the present invention's purpose provides a kind of color filter, and it has more smooth surface.
Another object of the present invention provides a kind of manufacture method of color filter, can obtain the color filter of preferable flat surfaces.
For reaching above-mentioned or other purpose, the present invention proposes a kind of color filter, and it comprises substrate, black matrix and a plurality of colored colored pattern.Black matrix is to be arranged on the substrate, and defines pixel region on substrate a plurality of times, and wherein, the height of black matrix can be by the inside of the peripheral previous pixel region of inferior pixel region step-down gradually in pixel region each time.These colored colored patterns are arranged at respectively in time pixel region.
In one of the present invention embodiment, substrate can be a transparency carrier.
In one of the present invention embodiment, the material of black matrix can be a black resin.
In one of the present invention embodiment, colored colored pattern can be made up of a plurality of red colored patterns, a plurality of green coloring patterns and a plurality of blue-colored pattern.
In one of the present invention embodiment, color filter also can comprise electrode layer, and electrode layer is to be covered on black matrix and the colored colored pattern, and wherein the material of electrode layer can be tin indium oxide (ITO) or indium zinc oxide (IZO).
For reaching above-mentioned or other purpose, the present invention proposes a kind of colorized optical filtering board fabrication method in addition, comprises the following steps: to provide substrate; Form photographic layer on substrate; GTG photo etched mask (graymask) is set in the substrate top, so that photographic layer is carried out exposure technology, wherein, the GTG photo etched mask has photic zone, non-photic zone and at least one semi-opaque region; Carry out developing process, form black matrix with the patterning photographic layer, wherein, black matrix defines pixel region a plurality of times on substrate, and height that should black matrix in pixel region each time can be by the inside of the peripheral previous pixel region of inferior pixel region step-down gradually; And form a plurality of colored colored patterns in above-mentioned these times pixel region.
In one of the present invention embodiment, substrate can be a transparency carrier.
In one of the present invention embodiment, the material of black matrix can be a black resin.
In one of the present invention embodiment, colored colored pattern can be made up of a plurality of red colored patterns, a plurality of green coloring patterns and a plurality of blue-colored pattern.
In one of the present invention embodiment, color filter also can comprise electrode layer, and electrode layer is to be covered on black matrix and the colored colored pattern, and wherein the material of electrode layer can be tin indium oxide or indium zinc oxide.
In one of the present invention embodiment, the GTG photo etched mask can be shadow tone photo etched mask (halftonemask).
In one of the present invention embodiment, the GTG photo etched mask can comprise a plurality of logical light site, and logical light site is to be positioned at semi-opaque region.
In one of the present invention embodiment, the mode that forms these colored colored patterns can be pigment dispersing method, dry film reprint method or color lump ink-jet method.
In sum, in the present invention's color filter, because the height of black matrix can be by the inside of the peripheral previous pixel region of inferior pixel region step-down gradually, make the difference in height of its each interlayer all less than the difference in height between black matrix and the substrate in the known skill, therefore then can form more smooth colored colored pattern.So the present invention's color filter promptly has more smooth surface, in order to follow-up assembling process.In addition, the present invention replaces general photo etched mask with the GTG photo etched mask to form in the black matrix altitude response of step-down gradually, therefore need not increase the cost that photo etched mask additionally is set.
State with other purpose, feature and advantage and can become apparent on the present invention for allowing, embodiment cited below particularly, and join accompanying drawing, be described in detail below.
Description of drawings
Figure 1A is the partial schematic diagram of known color filter.
Figure 1B is the diagrammatic cross-section of Figure 1A along A-A '.
Fig. 2 A is the partial schematic diagram according to the color filter of one of the present invention embodiment.
Fig. 2 B is the diagrammatic cross-section of Fig. 2 A along A-A '.
Fig. 3 A～Fig. 3 D is the diagrammatic cross-section of the forming process of the present invention's color filter.
Fig. 4 is the partial schematic diagram according to the GTG photo etched mask of one of the present invention embodiment.
The main element description of symbols
100: color filter
110: transparency carrier
120: black matrix
122: inferior pixel region
130: colored colored pattern
132: red colored pattern
134: the green coloring pattern
136: blue-colored pattern
200: color filter
210: substrate
220: black matrix
220a: photographic layer 222: inferior pixel region
224: interior zone
226: fringe region
230: colored colored pattern
232: red colored pattern
234: the green coloring pattern
234a: photoresist layer
236: blue-colored pattern
310: the GTG photo etched mask
312: photic zone
314: non-photic zone
316: semi-opaque region
316a: logical light site
A-A ': profile line
Embodiment
Fig. 2 A is the partial schematic diagram according to the color filter of one of the present invention embodiment, and Fig. 2 B is the diagrammatic cross-section of Fig. 2 A along A-A '.Please refer to Fig. 2 A and Fig. 2 B, the present invention's color filter 200 comprises substrate 210, black matrix 220 and a plurality of colored colored pattern 230.Black matrix 220 is to be arranged on the substrate 210, and defines pixel region 222 on substrate 210 a plurality of times.When color filter and array base palte (not shown) during to group, these times pixel region 222 can corresponding one by one array base palte more than a time pixel region (not shown).In addition, black matrix 220 mainly is to be used for shading, and the zone of the plain conductor that it can corresponding array base palte, thin film transistor (TFT) or the like is to stop the veiling glare that comes from above-mentioned zone.
Accept above-mentioned, in pixel region 222 each time, the height of black matrix 220 can be by the inside of the peripheral previous pixel region 222 of inferior pixel region 222 step-down gradually, that is the height of the interior zone 224 of black matrix 220 can be higher than the height of the fringe region 226 of black matrix 220.In addition, colored colored pattern 230 is to be arranged in time pixel region 222, and the periphery of colored colored pattern 230 can with the subregion overlaid of deceiving matrix 220.Because black matrix 220 is a step-down gradually at the height with the lap of colored colored pattern 230, make the difference in height of each interlayer have only the difference in height of simple layer less than known black matrix 120 (shown in Figure 1B), therefore can then form more smooth colored colored pattern 230, in order to follow-up assembling process.
It should be noted that the present invention does not reduce the whole height of black matrix 220, therefore black matrix 220 is still possessed the characteristic of height shading.In addition, the present invention does not need to reduce colored colored pattern 230 can have more smooth colored colored pattern 230 with black matrix 220 equitant zones, therefore can reduce mixed color phenomenon.
Referring again to Fig. 2 B, in the present embodiment, black matrix 220 for example is to have two kinds of height, and with the mode of two ladders step-down gradually.Yet the height that the present invention does not limit black matrix 220 is with which kind of form step-down gradually.For example, black matrix 220 for example is to have a n kind height, and with the mode of n ladder step-down gradually.Certainly, when the n value is very big, the then similar hillside of height of black matrix 220 and level and smooth decline.In addition, substrate 210 can be a transparency carrier, and particularly, it can be transparent glass substrate or clear flexible substrate.
Accept above-mentionedly, in the present embodiment, colored colored pattern 230 comprises a plurality of red colored patterns 232, a plurality of green coloring pattern 234 and a plurality of blue-colored pattern 236, and it is arranged at respectively in the corresponding inferior pixel region 222.When light passes red colored pattern 232, green coloring pattern 234 and blue-colored pattern 236, can be filtered into ruddiness, green glow and blue light respectively, cooperate array base palte to adjust the light intensity size of these light, and then can form image.What deserves to be mentioned is that colored colored pattern 230 of the present invention does not limit the colored pattern that can only use these three kinds of colors, it can adopt the colored pattern of several different colours to reach required effect according to different demands.
In addition, the present invention's color filter 200 also can comprise electrode layer (not shown) or protective seam (not shown), and it is covered on black matrix 220 and the colored colored pattern 230, and wherein the material of electrode layer for example is tin indium oxide or indium zinc oxide.Below, conjunction with figs. is described in detail the manufacture method of the present invention's color filter 200.
Fig. 3 A～Fig. 3 D is the diagrammatic cross-section of the forming process of the present invention's color filter.Please earlier with reference to Fig. 3 A, at first provide substrate 210 as described above, and form photographic layer 220a on substrate 210, wherein photographic layer 220a can be photoresist layer, and is had the effect of shading by the pattern that is defined behind the exposure imaging.GTG photo etched mask 310 then is set in substrate 210 tops, wherein GTG photo etched mask 310 has photic zone 312, non-photic zone 314 and at least one semi-opaque region 316.When photographic layer 220a was carried out exposure technology, light source 320 can pass completely through photic zone 312, and the photographic layer 220a of irradiation under the photic zone 312, and light source can't pass non-photic zone 314, and can't shine the photographic layer 220a under the non-photic zone 312.In addition, semi-opaque region 316 is suitable for only allowing the light source 320 of part pass through, and makes the photographic layer 220a under the light source 320 irradiation semi-opaque region 316 of this part.
Please continue B with reference to Fig. 3, then carry out developing process, the formation black matrix 220 as described above with patterning photographic layer 220, wherein black matrix 220 defines pixel region 222 a plurality of times on substrate 210, and in pixel region 222 each time, the height of black matrix 220 can be by the inside of the peripheral previous pixel region 222 of inferior pixel region 222 step-down gradually, that is the height of the interior zone 224 of black matrix 220 can be higher than the height of the fringe region 226 of black matrix 220.
Fig. 4 is the partial schematic diagram according to the GTG photo etched mask of one of the present invention embodiment.Please refer to Fig. 4, in the present embodiment, GTG photo etched mask 310 can be shadow tone photo etched mask (halftonemask), and its light tight district 314 can be the shading material that plates on quartz base plate as chromium, and photic zone 312 does not then plate any shading material.In addition, semi-opaque region 316 can be made up of a plurality of logical light site 316a, the exposure live width that the size grades of wherein logical light site 316a must can be resolved less than minimum.Generally speaking, the printing opacity degree of semi-opaque region 316 can be determined by density or the size of logical light site 316a.Higher and size is bigger when the density of logical light site 316a, then the printing opacity degree of semi-opaque region 316 is just higher.
In the present embodiment, semi-opaque region 316 is that the logical light site 316a by equal densities and size is constituted, thereby the matrix 220 of deceiving of formation is to have two kinds of height, and with the mode of two ladders step-down gradually.Certainly, if semi-opaque region 316 further has the logical light site 316a of two kinds of different densities, nature can form the black matrix with three kinds of height, and black matrix is with the mode of three ladders step-down gradually.That is heal when high when the shade of gray of semi-opaque region 316, promptly can form the black matrix of multiple height, and the difference in height of each interlayer can be littler.The situation that the person of ordinary skill in the field can push away is above-mentionedly voluntarily no longer represented with accompanying drawing herein.
It should be noted that, the present invention does not limit with the GTG photo etched mask 310 of which kind of kind to form the present invention's black matrix 320, for example, GTG photo etched mask 310 can also be thin film deposition photo etched mask (thin layer coating mask) or glass GTG photo etched mask etc., wherein glass GTG photo etched mask can be divided into electron beam again with manufacture method and makes (High Energy Beam Sensitive, HEBS) and laser beam make (Laser Direct Write, LDW).
Referring again to Fig. 3 B, so far step has been finished the manufacturing of black matrix 220, then only needs to form in inferior pixel region 222 manufacturing that a plurality of colored colored patterns 230 (shown in Fig. 2 B) are promptly finished the present invention's color filter.Generally speaking, the mode that forms colored colored pattern has pigment dispersing method, dry film reprint method and color lump ink-jet method, serves as the main flow made from the pigment dispersing method again wherein.Below, with the manufacture of collocation accompanying drawing detailed description pigment dispersing method.
Please continue C, then on substrate 210 and black matrix 220, form photoresist layer 234a, and for example comprise green colouring material among the photoresist layer 234a with reference to Fig. 3.Please refer to Fig. 3 D, then photoresist layer 234a is carried out exposure imaging technology to define green coloring pattern 234 as described above.Since black matrix 220 with green coloring pattern 234 overlapping areas in, the height of black matrix 220 is step-downs and make that its difference in height is more not obvious gradually, therefore can form more smooth green coloring pattern 234.Repeat technology, form the photoresist layer that comprises orchil, blue dyes respectively, to define red colored pattern 232 (shown in Fig. 2 B) and blue-colored pattern 236 (shown in Fig. 2 B) respectively as Fig. 3 C and Fig. 3 D.So far promptly finish the color filter 200 shown in Fig. 2 B.What deserves to be mentioned is that the present invention does not limit the sequencing that aforementioned each colored pattern forms, certainly, also do not limit the quantity and the color of colored pattern.
In addition, utilizing the dry film reprint method is to utilize the plastics batching (Blanket) of offset printing to roll on black mud (Ink) in ad-hoc location in the mode that forms colored colored pattern, then black mud is transferred to time pixel region and can forms colored colored pattern.In addition, utilizing the color lump ink-jet method is to utilize pressurized nozzles directly with in the extremely inferior pixel region of dye injection in the mode that forms colored colored pattern, and then dyestuff is baked into color lump promptly forms colored colored pattern.Certainly, the mode that forms colored colored pattern still has decoration method, electricity the mode that is fit to of method or the like, promptly seldom give unnecessary details at this.What deserves to be mentioned is that the present invention then can also form electrode layer (not shown) or protective seam (not shown) on black matrix and colored colored pattern, wherein the material of electrode layer for example is tin indium oxide or indium zinc oxide.
In sum, in the present invention's color filter and manufacture method thereof, have following advantage at least:
1. because the height of black matrix is a step-down gradually, so the difference in height of its each interlayer is less, so can form more smooth colored colored pattern, in order to follow-up assembling process.Particularly with the formula injection method assembling color filter that drips during,, thereby be difficult for vestige under the generation liquid crystal drop because color filter has more smooth surface with array base palte.
2. because the present invention need not reduce the whole height of black matrix, therefore black matrix still has the characteristic of height shading.In addition, the present invention does not also need to reduce colored colored pattern and the equitant zone of black matrix, therefore can reduce mixed color phenomenon.
3. the present invention replaces general photo etched mask with the GTG photo etched mask to form in the black matrix altitude response of step-down gradually, therefore need not increase the cost that photo etched mask additionally is set, and also need not change manufacturing process.
Though the present invention discloses as above with preferred embodiment; right its is not in order to limit the present invention; any person of ordinary skill in the field; without departing from the spirit and scope of the invention; when can doing a little change and improvement, so the present invention's protection domain is as the criterion when looking the claim person of defining.
Claims (17)
1. color filter is characterized in that comprising:
Substrate;
Black matrix is arranged on this substrate, and defines pixel region a plurality of times on this substrate, wherein, height that should black matrix in pixel region each time can by the periphery of this time pixel region toward the inside of this time pixel region step-down gradually; And
A plurality of colored colored patterns are arranged at respectively in above-mentioned these times pixel region.
2. color filter according to claim 1 is characterized in that this substrate comprises transparency carrier.
3. color filter according to claim 1 is characterized in that the material of this black matrix comprises black resin.
4. color filter according to claim 1 is characterized in that above-mentioned these colored colored patterns comprise a plurality of red colored patterns, a plurality of green coloring pattern and a plurality of blue-colored pattern.
5. color filter according to claim 1 is characterized in that also comprising electrode layer, is covered on this black matrix and above-mentioned these colored colored patterns.
6. color filter according to claim 5 is characterized in that the material of this electrode layer comprises tin indium oxide or indium zinc oxide.
7. colorized optical filtering board fabrication method is characterized in that comprising:
Substrate is provided;
Form photographic layer on this substrate;
The GTG photo etched mask is set in this substrate top, so that this photographic layer is carried out exposure technology, wherein, this GTG photo etched mask has photic zone, non-photic zone and at least one semi-opaque region;
Carry out developing process, form black matrix with this photographic layer of patterning, wherein, this black matrix defines a plurality of times pixel region on this substrate, height that should black matrix in pixel region each time can by the periphery of this time pixel region toward the inside of this time pixel region step-down gradually; And
Form a plurality of colored colored patterns in above-mentioned these times pixel region.
8. colorized optical filtering board fabrication method according to claim 7 is characterized in that this substrate comprises transparency carrier.
9. colorized optical filtering board fabrication method according to claim 7 is characterized in that the material of this light shield layer comprises black resin.
10. colorized optical filtering board fabrication method according to claim 7 is characterized in that this colour colored pattern comprises red colored pattern, green coloring pattern and blue-colored pattern.
11. colorized optical filtering board fabrication method according to claim 7 is characterized in that also comprising the formation electrode layer after forming this colour colored pattern, is covered on this black matrix and above-mentioned these colored colored patterns.
12. colorized optical filtering board fabrication method according to claim 11 is characterized in that the material of this electrode layer comprises tin indium oxide or indium zinc oxide.
13. colorized optical filtering board fabrication method according to claim 7 is characterized in that this GTG photo etched mask is the shadow tone photo etched mask.
14. colorized optical filtering board fabrication method according to claim 7 is characterized in that this GTG photo etched mask comprises a plurality of logical light site, is positioned at this semi-opaque region.
15. colorized optical filtering board fabrication method according to claim 7, the mode that it is characterized in that forming a plurality of colored colored patterns is the pigment dispersing method.
16. colorized optical filtering board fabrication method according to claim 7, the mode that it is characterized in that forming a plurality of colored colored patterns is the dry film reprint method.
17. colorized optical filtering board fabrication method according to claim 7, the mode that it is characterized in that forming a plurality of colored colored patterns is the color lump ink-jet method.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2005101321208A CN1982924A (en) | 2005-12-16 | 2005-12-16 | Color optical filter and its production |
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|---|---|---|---|
| CNA2005101321208A CN1982924A (en) | 2005-12-16 | 2005-12-16 | Color optical filter and its production |
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| CN1982924A true CN1982924A (en) | 2007-06-20 |
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| CN100465672C (en) * | 2006-09-01 | 2009-03-04 | 北京京东方光电科技有限公司 | Colorful optical filter structure and method of manufacturing the same |
| CN102629016A (en) * | 2011-05-19 | 2012-08-08 | 京东方科技集团股份有限公司 | Color film structure, manufacturing method of color film structure and liquid crystal display applying color film structure |
| CN102707352A (en) * | 2011-04-19 | 2012-10-03 | 京东方科技集团股份有限公司 | Color filter and method for manufacturing same |
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| CN102830456A (en) * | 2011-06-15 | 2012-12-19 | 上海天马微电子有限公司 | Color filter and forming method thereof |
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| CN102866532A (en) * | 2012-09-29 | 2013-01-09 | 深圳市华星光电技术有限公司 | Color filter substrate and relevant manufacturing method thereof |
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| CN104375311A (en) * | 2014-11-03 | 2015-02-25 | 深圳市华星光电技术有限公司 | Display panel and display device |
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| CN104375311B (en) * | 2014-11-03 | 2018-05-18 | 深圳市华星光电技术有限公司 | Display panel and display device |
| CN104459861A (en) * | 2014-12-31 | 2015-03-25 | 深圳市华星光电技术有限公司 | Color filter and manufacturing method thereof |
| CN105204220A (en) * | 2015-10-27 | 2015-12-30 | 深圳市华星光电技术有限公司 | Liquid crystal display device and color optical filter thereof |
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| CN107728374A (en) * | 2017-11-29 | 2018-02-23 | 深圳市华星光电半导体显示技术有限公司 | A kind of colorized optical filtering ilm substrate and preparation method thereof |
| CN107728374B (en) * | 2017-11-29 | 2021-01-29 | 深圳市华星光电半导体显示技术有限公司 | Color filter film substrate and preparation method thereof |
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