CN101163370A - Plasma guiding mechanism and plasma discharging device of using the mechanism - Google Patents
Plasma guiding mechanism and plasma discharging device of using the mechanism Download PDFInfo
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- CN101163370A CN101163370A CNA2006101496048A CN200610149604A CN101163370A CN 101163370 A CN101163370 A CN 101163370A CN A2006101496048 A CNA2006101496048 A CN A2006101496048A CN 200610149604 A CN200610149604 A CN 200610149604A CN 101163370 A CN101163370 A CN 101163370A
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Abstract
The invention discloses a plasma guidance mechanism and a plasma discharge device which applies the guidance mechanism. The plasma guidance mechanism comprises a hull which is mounted at the plasma discharge device and a first cavity and a second cavity which are defined by the plasma discharge device, wherein, the plasma discharge device produces ions inside the first cavity by arc discharge; the first cavity and the second cavity are communicated, and the lateral wall of the second cavity is provided with long narrow holes which are used for guiding the plasma to be sprayed out from the hull through the long narrow holes. Therefore, the plasma guidance mechanism provided by the invention has the advantages that the mechanism can increase the plasma spraying area of the plasma discharge device, prolong the service life and provide various plasma spraying angles.
Description
Technical field
The present invention relates to a kind of plasma guide mechanism, relate in particular to a kind of plasma guide mechanism that is applicable to plasma discharge apparatus.
Background technology
Isoionic composition includes electronics, ion and uncharged particle.The mode that its ionic medium produces, be that required gas is fed in the container, under a certain air pressure, add DC power supply, radio frequency (RadioFrequency) or microwave (Microwave) energy source, utilize condenser type (Capacitive), inductance type (Inductive) or particle and the interactive mode of ripple, make gas collapse (Breakdown) free, can apply to cut, the industry such as surface treatment of welding and various materials.
Plasma discharge apparatus, for example plasmatorch (Plasma Torch) is a kind of arc type atmospheric plasma electric discharge device, the plasma energy is accumulated in the little volume range, with the partly ionization of swirling flow working gas, make working gas produce priming reaction, the injection plasma of relative low temperature is provided under the condition of high power high-energy-density.Because arc type atmospheric plasma power-discharging density height, processing speed is fast, therefore is applicable to the surface treatment in various fields.Yet the arc type atmospheric plasma can't produce large-area arc discharge simultaneously, and the injection plasma of point-like only can be provided, and its application is restricted.
For head it off, United States Patent (USP) is numbered No. 6262386 and has been disclosed a kind of plasmatorch, and its external electrode has the oblique angle type swivel nozzle, when plasma is sprayed by the oblique angle type swivel nozzle of doing the circumference rotation, can increase the plasma spraying area, reach the effect that enlarges processing area.Yet, plasmatorch produces plasma by arc discharge, must be by the electric current that interior electrode discharge end is produced through external electrode in rotating and bearing beginning energy earth-continuity, but external electrode is under the state of high speed rotating, and the electric current that can make conducting is unstable and influence plasmatorch surface-treated efficient.Swivel bearing is easily because current flow heats causes temperature to rise and causes reduce useful life in addition.Again because the mechanism in the rotation is difficult for and the cooling device collocation, causes plasmatorch at high temperature to be worked for a long time and reduce its useful life.
United States Patent (USP) is numbered No. 6262356 and has been disclosed another kind of plasmatorch, will spray the narrow into strips hole nozzle of the isoionic open design of arc type, makes the plasma of ejection present wire, so as to big plasma spraying area is provided.Yet,, make nozzle Yin Gaore and be out of shape because this kind design electric current that arc discharge produced can heated nozzle.Because the plasma that sprays from the narrow hole of strip is dovetail shaped, be easy to generate the plasma spraying speed of narrow nose end point and the phenomenon of plasma density inequality again.And because isoionic opening is a strip-like design when processing has high low head surperficial, the problem that has the dead angle takes place.
Therefore, the plasma guiding device that a kind of plasma spraying area that improves plasma discharge apparatus and long service life need be provided and the multiple spray angle of plasma can be provided is arranged.
Summary of the invention
Technical problem to be solved by this invention is to provide a kind of plasma spraying area of plasma discharge apparatus, plasma guide mechanism that increases the service life and the multiple spray angle of plasma discharge apparatus is provided of improving.
For achieving the above object, plasma guide mechanism provided by the present invention comprises: be socketed on the housing on the plasma discharge apparatus, define first chamber, second chamber by housing and plasma discharge apparatus, wherein plasma discharge apparatus is given birth to plasma by arc discharge in first chamber, first chamber and the second chamber UNICOM, and the sidewall of second chamber has microscler narrow hole, is used for guiding electricity and sprays this outside by microscler narrow hole.The plasma guide mechanism is preferable in addition comprises that also a plurality of projections are positioned among the chamber, and protrudes on the inside side walls of housing.
Another object of the present invention is exactly that a kind of the have higher plasma spraying area and the plasma discharge apparatus in useful life are being provided.
For achieving the above object, the invention provides a plasma discharge device, comprising: external electrode, insulating barrier, interior electrode and plasma guide mechanism with shell portion.Insulating barrier is positioned on the inside side walls of shell portion.Interior electrode is located in the shell portion, produces plasma ejection shell portion by interior electrode and external electrode arc discharge.The plasma guide mechanism comprises the housing that is socketed in this shell portion, define one first chamber and one second chamber by housing and this shell portion, wherein first chamber is used for holding plasma, and first chamber and the second chamber UNICOM, the sidewall of second chamber has microscler narrow hole, is used for guiding plasma by microscler narrow hole ejection outside.Its middle shell and shell portion are preferably integrally formed.
Another purpose of the present invention is exactly to provide a kind of the arrangement by a plurality of above-mentioned plasma discharge apparatus to assemble, can provide the plane to spray isoionic plasma discharge apparatus.
According to above-described preferred embodiment, feature of the present invention adopts the plasma guide mechanism and the plasma discharge apparatus of Improvement type to combine, be used for defining two chambers that interconnect with the plasma generation device, can hold and guide plasma by an elongated narrow hole ejection, so as to being provided, uniform linear sprays plasma, can improve the problem of prior art plasma density inequality, and increase the plasma spraying area.Arranging in pairs or groups in addition is positioned at a plurality of washers in the outside, the narrow hole of elongated again, can provide the wire plasma to have multiple different spray angle, jet width, intensity and distance at different parts.Be fixed mechanism owing to plasma guide mechanism provided by the present invention again, and simple structure, the cooling system of can arranging in pairs or groups is used for reducing plasma discharge apparatus and sprays isoionic temperature, so as to prolonging the useful life of plasma discharge apparatus.
Therefore, plasma guide mechanism provided by the present invention has the plasma spraying area that improves plasma discharge apparatus, the advantage that increases the service life and various plasma spraying angle is provided really.
Description of drawings
A kind of generalized section of being furnished with the plasma discharge apparatus of plasma guide mechanism of the present invention that Figure 1A is illustrated for first preferred embodiment according to the present invention;
Figure 1B is another section of structure of vertical Figure 1A;
Fig. 1 C is the bottom view of the plasma guide mechanism that first preferred embodiment is illustrated according to the present invention;
A kind of generalized section of being furnished with the plasma discharge apparatus of plasma guide mechanism of the present invention that Fig. 2 is illustrated for second preferred embodiment according to the present invention;
The bottom view of the plasma guide mechanism that Fig. 3 A and Fig. 3 B are illustrated according to the of the present invention second and the 3rd preferred embodiment respectively;
A kind of collocation that Fig. 4 A is illustrated for the 4th preferred embodiment according to the present invention has the generalized section of the plasma discharge apparatus of plasma guide mechanism of the present invention;
Fig. 4 B is another section of structure of vertical view 4A;
A kind of section of structure that plasma discharge apparatus was together in series that the plasma guide mechanism is arranged by a plurality of collocation that Fig. 5 is illustrated for the 5th preferred embodiment according to the present invention;
A kind of generalized section of being furnished with the plasma discharge apparatus of plasma guide mechanism of the present invention that Fig. 6 is illustrated for the 6th preferred embodiment according to the present invention;
Fig. 7 A is illustrated for the 7th preferred embodiment according to the present invention has the generalized section of the plasmatorch 70 of plasma guide mechanism of the present invention in a kind of;
Fig. 7 B illustrates another section of structure of vertical view 7A.
Wherein, Reference numeral:
10: plasma discharge apparatus 100: the plasma guide mechanism
102a: shell portion 103: plasma opening
104: insulating barrier 105a: plasma
105b: spray plasma 106: interior electrode
107: socket 108: housing
109: microscler narrow hole 110a: projection
110b: 111: the second chambers of projection
112a: cooling water pipe 113: plasma channel
115: steam vent 116a: washer
116b: washer 117: exhaust passage
119: passage adjuster 119a: stop part
120: control hole 20: plasma discharge apparatus
200: 201: the first chambers of plasma guide mechanism
202: external electrode 202a: shell portion
203: plasma opening 204: insulating barrier
205a: plasma 205b: spray plasma
206: interior electrode 207: socket
208: housing 209: microscler narrow hole
210a: 211: the second chambers of projection
212b: cooling water pipe 213: plasma channel
215: steam vent 216a: washer
217: exhaust passage 219: the passage adjuster
300: plasma discharge apparatus 300 ': plasma discharge apparatus
316a: washer 316b: washer
316a ': washer 316b ': washer
40: plasma discharge apparatus 400: the plasma guide mechanism
402a: shell portion 403: plasma opening
404: insulating barrier 405a: plasma
405b: spray plasma 406: interior electrode
407: socket 408: housing
409: microscler narrow hole 410a: projection
410b: 411: the second chambers of projection
412a: cooling water pipe 413: plasma channel
415: steam vent 416a: washer
416b: washer 416c: oblique angle
417: exhaust passage 419: the passage adjuster
419a: stop part 420: control hole
50a: plasma discharge apparatus 50b: plasma discharge apparatus
50c: plasma discharge apparatus 500: plasma guide mechanism
60: plasma discharge apparatus 600: the plasma guide mechanism
602a: shell portion 603: plasma opening
604: insulating barrier 605a: plasma
605b: spray plasma 606: interior electrode
607: socket 608: housing
609: microscler narrow hole 610a: piece
610b: 611: the second chambers of projection
612a: cooling water pipe 613: plasma channel
614: radiating fin 615: steam vent
616a: washer 616b: washer
617: exhaust passage 619: the passage adjuster
619a: stop part 620: control hole
70: 701: the first chambers of plasma discharge apparatus
702: external electrode 703: the plasma opening
704: insulating barrier 705a: plasma
705b: spray plasma 706: interior electrode
709: microscler narrow hole 710a: projection
710b: 711: the second chambers of projection
712a: cooling water pipe 713: plasma channel
715: steam vent 716a: washer
716b: washer 717: exhaust passage
719: passage adjuster 719a: stop part
720: control hole
X1: spray angle X2: spray angle
Embodiment
For above and other objects of the present invention, feature and advantage can be become apparent, a kind of collocation cited below particularly has the plasma discharge apparatus (plasmatorch) of plasma guide mechanism of the present invention as preferred embodiment, and cooperates appended graphic being described in detail below.It is not in order to restriction the present invention but it should be noted that this preferred embodiment.
With reference to Figure 1A and Figure 1B, a kind of generalized section of being furnished with the plasma discharge apparatus (plasmatorch) of plasma guide mechanism of the present invention that Figure 1A is illustrated for first preferred embodiment according to the present invention.Figure 1B illustrates another section of structure of vertical Figure 1A.Among first preferred embodiment of the present invention, plasma discharge apparatus 10 comprises: external electrode 102, insulating barrier 104, interior electrode 106 and plasma guide mechanism 100.
Microscler narrow hole 109 is positioned on the sidewall of second chamber 111, and among present embodiment, it is parallel that microscler narrow hole 109 and plasma are opened 103 opening direction essence.Among other embodiment of the present invention, microscler narrow hole 109 and plasma are opened 103 both opening directions and are accompanied a special angle (not illustrating).
And a plurality of projections, for example projection 110a and 110b are positioned among second chamber 111, and on the inside side walls of outstanding housing 108, are used for guiding plasma 105a, make plasma 105a by 109 ejection housings, 108 outsides, microscler narrow hole.Among present embodiment, projection 110a and 110b extend to the inboard in microscler narrow hole 109 in second chamber 111, so as in second chamber 111, defining at least one plasma channel 113, be used for guiding plasma 105a by microscler narrow hole 109 ejections, form uniform linear and spray plasma 105b.Wherein, the width of plasma channel 113 is broadened toward second chamber, 111 inside gradually by this microscler narrow hole 109.But among other embodiment, plasma channel 113 essence are parallel with microscler narrow hole 109.
Among present embodiment, projection 110a and 110b and housing 108 are integrally formed in addition.But among other embodiment, projection can not be fixed on the inside side walls of housing 108 by a plurality of retaining elements (illustrating).
And the flow of the plasma 105a that is discharged by steam vent 115 is controlled by a kind of channel adjustment device 119 that is convexly set in the exhaust channel 117.Among present embodiment, button is adjusted in 119 1 exhausts of passage adjuster, have a stop part 119a can by run through housing 108 to the exhaust passage 117 control hole 120, stretch into and protrude among the exhaust passage 117, by stopping plasma 105a flowing in exhaust passage 117, to control the air displacement at second chamber, 111 edges, make injection plasma 105b have concentration uniformly.Wherein control mode that stop part 119a establishes with direct connector and spiral shell and stretch into and protrude in the exhaust passage 117, mode of its control flow comprises that directly pushing exhaust adjusts button or rotate exhaust and adjust button and adjust it and stretch into size in the exhaust passage 117.But it should be noted that said structure only in order to architectural feature of the present invention to be described, the displacement or the improvement of other similar structure, material or part do not break away from spiritual scope of the present invention.
Among present embodiment, plasma guide mechanism 100 also comprises at least one washer that is installed on 109 outsides, microscler narrow hole, for example washer 116a and 116b.Among present embodiment, washer 116a and 116b and housing 108 are integrally formed, but among other embodiment, washer is fixed on the housing 108 by at least one retaining element (not illustrating).
The width in wherein narrow hole 109 is controlled by washer 116a and 116b, can cooperate the design of plasma channel 113 that plasma is evenly sprayed by microscler narrow hole 109.Among present embodiment, microscler narrow hole 109 has uniform exit width (referring to Fig. 1 C), makes the injection plasma 105b that is sprayed by the narrow hole 109 of elongated have uniform single jet width.But among other embodiment, microscler narrow hole 109 can cooperate the design of different plasma channels, and have different a plurality of exit widths at different positions, make the injection plasma 105b that is sprayed by the narrow hole 109 of elongated have different jet widths at different parts.For example, referring to Fig. 3 A and Fig. 3 B, the bottom view of the plasma guide mechanism that Fig. 3 A and Fig. 3 B are illustrated according to the of the present invention second and the 3rd preferred embodiment respectively.In the second and the 3rd preferred embodiment, washer 316a and 316b and washer 316a ' and 316b ' are different in the formed outlet of diverse location, and have different exit widths at diverse location, spray the linear speed of plasma 305b at microscler narrow hole 309 diverse locations so as to the control wire.
With reference to Fig. 4 A and Fig. 4 B, Fig. 4 A is the section of structure that a kind of collocation that the 4th preferred embodiment according to the present invention is illustrated has the plasma discharge apparatus of plasma guide mechanism.Fig. 4 B illustrates another section of structure of vertical view 4A.Illustrate as Fig. 4 A, the diverse location of washer 416a in microscler narrow hole 409 of plasma guide mechanism 400 has different thickness, the integral thickness of washer 416b is again than the thickness of washer 416a big (illustrating as Fig. 4 B) in addition, and has a specific bevel angle 416c.By the varied in thickness of same washer 416a at different parts, and the thickness disparity of different washer 416a and 416b and oblique angle design, can adjust microscler narrow hole 409 makes it have at least a exit angle at least, make and spray the different parts generation different spray angle of plasma 405b in microscler narrow hole 409, for example spray angle X1 and X2 (illustrating) as Fig. 4 A.The injection plasma 405b that wherein has different angles can be used to handle a kind of surperficial dead angle with given shape and high low head.
It should be noted that in addition, if a plurality of collocation there is the plasma discharge apparatus of plasma guide mechanism 500, for example plasma discharge apparatus 50a, 50b and 50c are arranged assembling, can make the length and the width that spray plasma 505b infinitely extend (illustrating as Fig. 5).Wherein, each plasma discharge apparatus, for example 50a, 50b or 50c provide the injection plasma of a wire.If more plasma discharge apparatus is arranged assembling (not illustrating), can provide the plane to spray plasma.
With reference to Figure 1A and Figure 1B, among preferred embodiments more of the present invention, plasma guide mechanism 100 comprises that also water cooling plant is installed among the sidewall of housing 108.For example be embedded at (being illustrated) among the side ancient piece of jade, round, flat and with a hole in its centre of housing 108 as Figure 1A and Figure 1B with cooling water pipe 112a.Perhaps, be sheathed on housing 108 outsides (being illustrated) with cooling water pipe 212b as Fig. 2.The installation of water cooling plant not only can reduce the temperature of plasma guide mechanism 100 itself, and can reduce the outlet temperature of spraying plasma 105b, makes it be fit to handle the more sensitive material of temperature.Water cooling plant in addition, routine cooling water pipe or its sheet that dispels the heat also can be installed in external electrode 102 peripheries or inner.
Among the external some embodiments of the present invention of water cooling plant, plasma guide mechanism 600 also comprises at least one radiating fin 614, is arranged at and protrudes in housing 608 outsides, to replace or to strengthen the radiating effect (being illustrated as Fig. 6) of water cooling plant.Radiating fin 614 also can be installed in external electrode 602 peripheries, to strengthen the radiating effect of external electrode 602.
Among some preferred embodiments, the plasma guide mechanism that the present invention carried, be built on the plasma discharge apparatus (plasmatorch) in can be directly, with reference to Fig. 7 A and Fig. 7 B, Fig. 7 A is illustrated for the 7th preferred embodiment according to the present invention has the generalized section of the plasmatorch 70 of plasma guide mechanism of the present invention in a kind of.Fig. 7 B illustrates another section of structure of vertical view 7A.
Fig. 7 A is roughly similar to the plasma discharge apparatus 10 that Figure 1A and Figure 1B are illustrated with the structure of the plasmatorch 70 that Fig. 7 B is illustrated, yet maximum difference is, plasmatorch 70 directly with a kind of conductive shell 108 as external electrode, that is to say that housing 708 is integrally formed with the shell portion of external electrode.
By above-described embodiment, technical characterictic of the present invention as can be known adopts, the plasma guide mechanism and the plasma discharge apparatus of Improvement type combine, define first chamber and second chamber that interconnects by plasma guide mechanism and plasma discharge apparatus, hold the plasma that electric installation is produced with first chamber, again by protruding in a plurality of projection guiding plasmas of second chamber sidewall, make plasma energy equably by microscler narrow hole ejection, spray plasma so as to uniform linear is provided.If will increase in addition permutation and combination of plasma discharge apparatus that collocation has a plasma guide mechanism, can also increase the plasma spraying area.In addition, because plasma guiding device provided by the present invention and plasma discharge apparatus simple structure, the cooling system of can arranging in pairs or groups reduces the temperature of plasma discharge apparatus, prolongs the useful life of plasma discharge apparatus.Add, be equipped with the relative position arrangement of the washer outside microscler narrow hole and the width that shaped design is controlled microscler narrow hole, can make the injection plasma have various spray angle, suitable processing has the surface at multiple high low head and dead angle.
Therefore, plasma guide provided by the present invention not only can improve the plasma spraying area and the spray angle of plasma discharge apparatus, also can improve the problem of prior art plasma density inequality, can prolong the useful life of plasma discharge apparatus simultaneously.
Certainly; the present invention also can have other various embodiments; under the situation that does not deviate from spirit of the present invention and essence thereof; being familiar with those of ordinary skill in the art ought can make various corresponding changes and distortion according to the present invention, but these corresponding changes and distortion all should belong to the protection range of the appended claim of the present invention.
Claims (16)
1. a plasma guide mechanism is characterized in that, comprising:
One housing, be socketed on the plasma discharge device, so as to defining one first chamber and one second chamber with this plasma discharge device, wherein this plasma discharge device is given birth to a plasma by arc discharge in this first chamber, this first chamber and this second chamber UNICOM, and the sidewall of this second chamber has a microscler narrow hole, is used for holding and guides this plasma and spray this outside by this microscler narrow hole.
2. plasma guide mechanism according to claim 1 is characterized in that, this plasma discharge device comprises:
One external electrode has a shell portion, with this housing socket, defines this first chamber and this second chamber by this shell portion and this housing;
One insulating barrier is positioned on the inside side walls of this first chamber; And
Electrode in one is located in this first chamber, produces this slurry by electrode in this and this external electrode arc discharge and sprays into this second chamber.
3. plasma guide mechanism according to claim 2 is characterized in that, this housing and this shell portion are integrally formed.
4. plasma guide mechanism according to claim 2 is characterized in that, also includes at least one water cooling plant and is sheathed on this hull outside or is embedded among the side ancient piece of jade, round, flat and with a hole in its centre of this housing.
5. plasma guide mechanism according to claim 1 is characterized in that, also comprises at least one projection position, among this chamber and protrude in the inside side walls of this second chamber, is used for guiding this plasma and sprays this outside via this microscler narrow hole.
6. plasma guide mechanism according to claim 5, it is characterized in that, this projection at least one by extending to this inboard, microscler narrow hole in this second chamber, so as to defining at least one plasma channel, be used for guiding this plasma and evenly spray by this microscler narrow hole.
7. plasma guide mechanism according to claim 6 is characterized in that, this plasma channel has a width in parallel this microscler narrow hole, or has a width that is broadened gradually toward this chamber interior by this microscler narrow hole.
8. plasma guide mechanism according to claim 5 is characterized in that, this projection and this housing is integrally formed or be fixed in this second chamber inboard by a plurality of retaining elements.
9. plasma guide mechanism according to claim 1, it is characterized in that, comprise that also at least one washer is arranged at this outside, microscler narrow hole, by the relative position and the shape of this washer, provides at least one exit width of this plasma and at least one exit angle by the narrow hole ejection of this elongated.
10. plasma guide mechanism according to claim 2 is characterized in that, also comprises at least one radiating fin, and wherein this radiating fin is arranged at this hull outside.
11. plasma guide mechanism according to claim 1, it is characterized in that, this housing has a steam vent in abutting connection with the narrow hole of this elongated, and runs through this housing and form an exhaust passage, is used for guiding this a part of plasma and discharges this outside by this steam vent.
12. plasma guide mechanism according to claim 1 is characterized in that, also comprises a passage adjuster, is convexly set among this exhaust passage, is used for controlling the flow of this plasma of being discharged by this steam vent.
13. plasma discharge apparatus is planted by factory, it is characterized in that, comprising:
One external electrode has a shell portion;
One insulating barrier is positioned on the inside side walls of this shell portion;
Electrode in one is located in this shell portion, produces a plasma by electrode in this and this external electrode arc discharge and sprays this shell portion; And
First-class ion guides mechanism, these ion guides mechanisms comprise:
One housing, be socketed in this shell portion, so as to defining one first chamber and one second chamber with this shell portion, wherein this first chamber is used for holding this plasma, and this first chamber and this second chamber UNICOM, the sidewall of this second chamber has a microscler narrow hole, is used for guiding this plasma and sprays this outside by this microscler narrow hole.
14. plasma discharge apparatus according to claim 13 is characterized in that, this housing and shell portion are integrally formed.
15. plasma discharge apparatus according to claim 13, it is characterized in that, this housing has a steam vent in abutting connection with the narrow hole of this elongated, and runs through this housing and form an exhaust passage, is used for guiding this a part of plasma and discharges this outside by this steam vent.
16. plasma discharge apparatus according to claim 15 is characterized in that, also comprises a channel adjustment device, is convexly set among this exhaust passage, is used for controlling the flow of this plasma of being discharged by this steam vent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2006101496048A CN101163370A (en) | 2006-10-10 | 2006-10-10 | Plasma guiding mechanism and plasma discharging device of using the mechanism |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2006101496048A CN101163370A (en) | 2006-10-10 | 2006-10-10 | Plasma guiding mechanism and plasma discharging device of using the mechanism |
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| CN101163370A true CN101163370A (en) | 2008-04-16 |
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| CNA2006101496048A Pending CN101163370A (en) | 2006-10-10 | 2006-10-10 | Plasma guiding mechanism and plasma discharging device of using the mechanism |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101754562B (en) * | 2008-12-01 | 2012-05-09 | 财团法人工业技术研究院 | Atmospheric plasma generating device with function of electric arc control |
| CN108342713A (en) * | 2017-01-25 | 2018-07-31 | 馗鼎奈米科技股份有限公司 | Normal pressure plasma coating device |
-
2006
- 2006-10-10 CN CNA2006101496048A patent/CN101163370A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101754562B (en) * | 2008-12-01 | 2012-05-09 | 财团法人工业技术研究院 | Atmospheric plasma generating device with function of electric arc control |
| CN108342713A (en) * | 2017-01-25 | 2018-07-31 | 馗鼎奈米科技股份有限公司 | Normal pressure plasma coating device |
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Open date: 20080416 |