CN101142057A - Abrasive material and method of forming same - Google Patents
Abrasive material and method of forming same Download PDFInfo
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- CN101142057A CN101142057A CNA2005800239789A CN200580023978A CN101142057A CN 101142057 A CN101142057 A CN 101142057A CN A2005800239789 A CNA2005800239789 A CN A2005800239789A CN 200580023978 A CN200580023978 A CN 200580023978A CN 101142057 A CN101142057 A CN 101142057A
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- projection
- grinding
- photoresist
- pinnacle
- etching
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
- B24D11/001—Manufacture of flexible abrasive materials
- B24D11/003—Manufacture of flexible abrasive materials without embedded abrasive particles
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
The present invention provides an abrasive material comprising a base surface having a plurality of pyramidal shapes protruding therefrom the base surface and the protrusions being formed of the same material, each protrusion having a substantially triangular, square, or polygonal base and triangular sides which meet at an apex which substantially forms a point. The pyramidal shapes have apexes in at least two distinct planes with a portion of the pyramidal shapes extending further from the base surface than others, with the apexes of the protrusions providing intermixing cutting and planning edges in a pattern such that the material is capable of abrading independent of direction of use.
Description
Technical field
The present invention relates to by etch process production be suitable for polish or the grinding-material of level and smooth kinds of surface and the method that forms described grinding-material.
Background technology
Different lapped faces has for many years just been proposed.This surface comprise those wherein the abrasive grains as diamond dust, aluminium oxide, carborundum, zirconia and alpha-aluminium oxide monohydrate gravel, monocrystalline diamond or cubic boron nitride attached to the surface on the substrate.Know that also lapped face has indentation so that groove or punching to be provided, coming provides projection or burr around the hole to hole or opening.Wherein groove has been formed on the metallic plate as the steel plate, and the edge that coated surfaces or cutting are formed by groove also is known.The known metal abrasive sheet is to prepare like this, promptly electroplates raw sheet then to form sheet material by the former base plate of polyvinyl chloride that uses sand paper disc to form curing.
Using suitable resist also is known with the etching process that forms the expection pattern in metal substrate.In a kind of such technology, the resist pattern puts on thin plain plate with predetermined pattern, for example can be circular, microscler or polygonal equidimension point.Plate comes etching by the etchant as the iron chloride aqueous solution, with the metal of removing scheduled volume and form pattern element.The also whole variation of spray pattern on the books, the composition of etching solution and temperature, the side of the cutting element of projection and the angle between the original plate surface, and the edge below that etching will reach the protection pattern element is how far.Recommendation on improvement is on the etched side of plate or the parallel ridges of rhombus quadrangular forms tangentially or spirally is provided, in order to prevent the coiled sheet limit.
Another recommendation on improvement is the resist pattern, and its record provides the even mixing of quick work sharp point and level and smooth horizontal edge.Cutting teeth forms triangle or square, and it is still sharp-pointed after etching process, and because resist pattern and can using, and etched pattern has been strengthened angle point and eliminated following cutting to the upper surface of cutting teeth.Upper flat surface of each tooth carrying, and can solidify by heat treatment, excessive fragility do not had simultaneously because of toothing.The upper flat surface record of each tooth is typically about 3 mils (mils), and the width of substrate and the height of tooth are about twices of upper flat surface.
Produce the process of blanking punch, especially use as dicing tape to disclose, wherein used a plurality of etching steps with the process that forms label.Resist corresponding to the profile of label to be formed is formed on the steel plate, and implements first etching step, forms the bossing of expection height by this.Implement second etching step, the resist that extends from the both sides at the top of bossing is removed by this, and steel plate stands further etching.This second etching step can repeatedly be implemented.The resist that is retained in the top of bossing is removed then.
The metal grinding agent of having described has the full and uniform pyramidal projections of extending from substrate surface, and its etching by metallic sheet material forms.
Summary of the invention
One aspect of the present invention provides a kind of grinding-material, comprise a substrate surface, described substrate surface has from its outstanding a plurality of conical in shape, described substrate surface and described projection are formed by same material, each projection has triangle substantially, square or polygon substrate, and triangle side, intersect on the pinnacle that forms a bit substantially described substrate and side, described conical in shape has the pinnacle at least two different planes, the part of described conical in shape is compared with other parts and is extended fartherly from described substrate surface, the pinnacle of described projection provides cutting and scabbled the edge on pattern mixing makes the described material to be independent of service orientation and grinds.
Can make its pinnacle wearing and tearing from the pinnacle that the described substrate surface that keeps its pinnacle extends the described conical in shape of less distance and do not form substantially a bit, described pinnacle forms a little after using a period of time substantially, and described during this period conical in shape is extended farther distance from described base material.This reservation of extending the pinnacle of less distance from described base material of those conical in shape provides the grinding-material with longer life and efficient.
Preferably, extend the described conical in shape of less distance, compare, extend at least about 10%, more preferably at least about 20%, most preferably at least about 30% with the pinnacle of extending longer-distance conical in shape from described base material from described base material.
The conical in shape of grinding-material of the present invention is can shape identical or different.Give an example, multiple conical in shape can have different underlying structures, just the inclined-plane of the side of varying number and/or different angles.
Optionally the performance enhanced surface treatment can impose on described projection and/or described substrate surface, to improve nonferromagnetic substance, owing to the lubricated of some coating helps not loading characteristic, and has reduced surface porosity.
Preferably, the triangle side of described pyramidal projections has inside actuate slopes.Owing to do not need to load and treat that lost material, this inclined-plane provide the longer life-span of grinding-material.The invention provides material is removed from workpiece, and on workpiece, stay smooth surface.
Grinding-material of the present invention can have projection on two surfaces of described base material, curls when the material attenuation time preventing.As selection, in order to prevent curling of thin material, just reduce internal pressure or tension force, projection can be located on the surface and facing surfaces can be etched simply.
Further aspect of the present invention provides the method that forms a kind of grinding-material, comprises step:
(a) provide base material;
(b) apply the photoresist coating at least one surface of described base material;
(c) mask is set on described photoresist, described mask has triangle, square or the polygon pattern of random direction thereon, and each element that forms described pattern has at least two different surface areas;
(d) will there be the photoresist of masked covering to solidify;
(e) remove described mask and unexposed photoresist;
(f) apply time of the etchant abundance that is suitable for the described base material of etching, so that a plurality of pyramidal projections to be provided on described substrate surface, each projection has triangle, square or polygon substrate and triangle side substantially, intersect on the pinnacle that forms a bit substantially described substrate and side, described conical in shape has the pinnacle at least two different planes, and the part of described conical in shape is compared with other parts and extended fartherly from described substrate surface.
The surface of described projection and described substrate surface can optionally have performance and strengthen coating or processing, to improve nonferromagnetic substance, owing to the lubricated of some coating helps not loading characteristic, and have reduced surface porosity.Can use and electroplate the surface that this enhancing is provided.As known to the skilled person, described surface can heat treatment or metallurgical modification thin on the surface of described substrate surface, to form than hard formation and projection, to improve hardness.It also is operable that other performances strengthen processing, and for example diamond surface is handled.U.S. Patent number 5620754 has been described and has been used the useful especially diamond surface of laser technology to handle.
Description of drawings
Figure 1A, 1B and 1C are the perspective views of useful pyramidal projections of the present invention.
Fig. 2 is the perspective view with preferred pyramidal projections of inside arcuate triangular sides of the present invention.
Fig. 3 is the vertical view with preferred pyramidal projections of inside arcuate triangular sides of the present invention.
Fig. 4 A is the vertical view that is suitable for being used for producing the photoresist mask of grinding-material of the present invention.
Fig. 4 B is the vertical view that is suitable for being used for producing the another kind of photoresist mask of grinding-material of the present invention.
Fig. 4 C is the vertical view that is suitable for being used for producing the another kind of photoresist mask of grinding-material of the present invention.
Fig. 5 has the side view that performance strengthens the pyramidal projections that the present invention of coating uses on it.
Fig. 6 is the partial section that each surface all has the grinding-material of the present invention of pyramidal projections.
The specific embodiment
Grinding-material of the present invention can be formed by any easy etched material, for example comprises stainless steel, carbon steel, aluminium alloy, iron-nickel-chromium and titanium; Fill boron elastomer, silicon synthetic, fluoro carbon materials, graphite alloy, plastics and analog.
In the present invention, stainless steel is particularly preferred base material, because its intrinsic material corrosion resistance, good high-temperature and excellent low temperature intensity and toughness, other non-magnetic characteristic of austenite level and aesthstic outward appearance in wide temperature range very.Stainless steel also can easily repeat to be etched with formation grinding-material of the present invention.
The thickness of material is not particularly limited, but after etching, should have suitable flexibility when it is used on the roller, perhaps should have suitable rigidity when being used as flat grinding agent.Certainly, if necessary can provide rigidity, for example metallic plate or synthetic resin board with suitable rigidity by the additional rigidity substrate.
Include but not limited to nickel or the plating that chromium is electroplated or diamond plates or combine boron nitride and diamond sand for the especially preferred exemplary surface treatment of stainless steel-based bottom material.Substrate and pyramidal projections can be exposed to heat treatment or metallurgical modification (metalluricalalteration), and for example surface sclerosis for example influences case hardness with what approach by formation on substrate surface and projection than hard formation, to improve performance.
With reference to the accompanying drawings, identical reference number is used to represent identical parts.Figure 1A, 1B and 1C show the different possible embodiment of the pyramidal projections of grinding-material of the present invention, and wherein the substrate of pyramidal projections is respectively triangle, square and pentagon.Certainly, other polygons also can use.In Figure 1A, show projection 10a and have triangular base 12a, triangle side 14a and pinnacle 16a.In Figure 1B, show projection 10b and have square base 12b, square sides 14b and pinnacle 16b.In Fig. 1 C, show projection 10c and have polygon substrate 12c, triangle side 14c and pinnacle 16c.
The pinnacle of each projection does not need to form real cusp shown in the drawings, although this is a preferred construction.The pinnacle of projection can have fillet or flat a little.Yet this part on pinnacle preferably should be wider than 20% of edge L, more preferably is to be not more than 10% of edge L, and edge L is shown in Figure 5.
The degree of depth of the inside actuate slopes on the triangle side of pyramidal projections of Fa Xianing can be from very little in a preferred embodiment of the invention, and for example 1 μ m arrives maximum about 175 μ m.This actuate slopes can find out easily in Fig. 2 and Fig. 3 that wherein projection 20 has actuate slopes 22.The size of projection is big more, and the inside actuate slopes that can form is dark more.
Preferably, the height H apart from etched surfaces of pyramidal projections can be at about 25 μ m between the 1.5mm scope, higher pyramidal projections is used for conventional coarse grinding, just from about 125 μ m to 375 μ m, and lower pyramidal projections is used for fine gtinding, just from about 75 μ m to 125 μ m.The length of the edge L of substrate depends on the height of projection.Preferably, projection between about 1: 1 to 1: 5, more preferably is apart from the length ratio of the height of etched surfaces and basal edge between about 1: 2 to 1: 4, most preferably is about 1: 3.The thickness B of residual substrate material can vary widely very much, and is unessential, and thin base material is used for more flexible grinding-material, and thicker base material is used for harder grinding-material, just as is known to the person skilled in the art.These sizes have illustrated in the guide wire of alternative shape of hard coated abrasive material, see the cross section among Fig. 5.
The interval S of pyramidal projections also can very broadly change, from the center to center measurement of pyramidal projections is to 30mm from about 0.75mm, be used for coarse grinding than large-spacing, just 2 to 10mm or greater distance, and be used for the more closely-spaced of fine gtinding, just at interval from about 0.75 to 1.5mm.
The length of the height that the meticulous or roughness of grinding-material also can be by keeping projection and the substrate of projection and the size of adjusting resist pattern are adjusted.Bigger interval provides more coarse grinding-material between the projection, and less interval provides than the fine gtinding material between the projection simultaneously.
The Etching mask that is suitable for the fine gtinding sand grains has been shown among Fig. 4 A.The Etching mask of abrasive grit in the middle of being suitable for has been shown among Fig. 4 B.Fig. 4 C shows the Etching mask that is suitable for producing coarse gravel.
Importantly, pyramidal projections just is oriented to and makes the cut edge of each projection locate in different directions, so that the ability of the grinding that is independent of service orientation to be provided.Pyramidal projections is random orientation in different directions, and for example the stochastic programming device by the basis that uses a computer comes the design etched mask, perhaps etching mask can Butut to guarantee the known random position of those skilled in the art.The example of random position pattern has been shown among Fig. 4 A, 4B, the 4C.
As previously described, electroplate as nickel or chromium; The diamond plating; Perhaps nickel that combines with diamond grain or teflon (Teflon), tungsten, carbide or boron nitride particle or chromium are electroplated the surface that such coating can be applied to grinding-material as shown in Figure 5, wherein, grinding-material 59 part has projection 52, residual substrate material 54 and coating 56.
Etch process can use the against corrosion and etching material and the technology that are widely known by the people to implement.Before photoresist is applied to base material, preferably implement the cleaning of base material.If base material is a stainless steel, this cleaning can comprise the cleaning and the drying of carrying out with deionized water.As selection, perhaps except this cleaning, stainless steel surfaces also can be subjected to float stone shampooing or Passivation Treatment.If have, free iron contaminants is realized by iron chloride well known by persons skilled in the art, nitric acid or other solution usually together with the passivation that other pollutants remove.
Etch-resistant coating can use that for example hot-roll lamination, serigraphy, photogravure, dip coated and similar fashion are used.When resist put on stainless steel-based bottom material with the polymer thin film form, base material preferably was preheated and film uses fully heat and pressure to use, and is good bonding to guarantee.In processing procedure this must be avoided the curing of resist constantly.
The mask that is used to provide the abrasive pattern surface of expection is placed on the base material that is covered by resist then.Need the good contact between resist coating and the mask, closely contact just is to obtain the pattern of expection on base material when the photoresist that does not have masked covering is cured.
Curing or imaging realize the resist of interlinkage polymerization just by being exposed in the light that is enough to solidify.Mask removes from base material/photoresist/mask synthetic then, and uncured photoresist uses developer solution or developer to remove from base material.The composition of photoresist is depended in the selection of developer.If expectation, the photoresist that is retained in then on the base material can imaging once more before etching, is bonded on the base material well at photoresist during the etching further guaranteeing.
Those of base material are not subjected to the part of photoresist protection to be implemented etching then.Give an example, when substrate was stainless steel, carbon steel or analog, suitable etchant comprised the mixture of iron chloride, hydrochloric acid, nitric acid, these acid and NaOH; For aluminum or aluminum alloy, suitable etchant comprises NaOH; For titanium, suitable etchant comprises hydrochloric acid; And plastics can use multiple acid to come etching usually.The etching degree can be adjusted by the concentration and the temperature that change etching solution, and implementation method is that those skilled in the art are known.Give an example, when these base materials or substrate when being stainless, can use the aqueous ferric solution of about 37 ° to 42 ° Baume degrees (Baume), solution concentration is low more, usually the inclined-plane of outstanding sidepiece bow action more just.
After being etched with, any remaining photoresist can randomly remove by well known to a person skilled in the art technology.Under the situation of some mask pattern and etching parameter, much these photoresists are removed in etching process.Removing of residue photoresist is normally preferred, is particularly electroplated and photoresist when can be used as platedresist when pyramidal projections.
As selection, resist can be retained on the surface of grinding-material of generation, is retained in the non-abrasive side of material when particularly ought have only a side crested and pattern etched, and this can prevent crimping.The proper method that prevents crimping comprises the both sides of etching base material as shown in Figure 6, and wherein, grinding-material 60 has projection 62a, the 62b that extends from residual substrate material 64 on each surface 61,63.
Purpose of the present invention and advantage are further set forth by following example, but special material and the quantity quoted in these examples, and other conditions and details should not constitute the unsuitable restriction to the present invention.Except as otherwise noted, all parts and percentage are as the criterion with weight.
Example
Example 1
Height stretching corrosion resistant plate 301 with about 0.02000 inch thickness used the ferric chloride solution float stone shampooing of 40 ° of Baume degrees and passivation 30 seconds.Can stick on the passivation stainless steel from 0.0013 inch thick EM213 type light actuating resisting corrosion film that E.I.Du Pont Company obtains, and the mask with pattern shown in Fig. 4 C is applied on the photoresist.
Stainless steel/photoresist/mask synthetic is exposed under the light of 60 millijoules to begin the imaging of photoresist effectively.Uncrosslinked photoresist cleans by 1% aqueous carbonic acid potassium developer solution of pH value 10.5.The stainless steel that has the photoresist pattern on it is exposed to once more under the light of 100 millijoules guaranteeing and adheres on the stainless steel at photoresist during the etching.
Stainless steel uses the ferric chloride solution of 40 ° of Baume degrees to be etched to about 0.011 inch degree of depth.The etched plate water that is produced cleans, and the potassium hydroxide aqueous release solution of remaining photoresist use 15% removes.
Pyramidal projections has triangular base.It is top to be to be about 0.004 inch apart from base material apart from the height of the projection of maximum.The sheet material that is produced with mode like the xalsonte stationery in excellent performance, but the typical reinforced problem that does not have to exist in the sand paper.
Example 2
Can as example 1, use the ferric chloride solution float stone of 40 ° of Baume degrees to shampoo and passivation 30 seconds from the fully hard corrosion resistant plate 302 that the Ulbrich in California obtains with about 0.006 inch thickness.Light actuating resisting corrosion film sticks on the passivation stainless steel, and the mask with pattern shown in Fig. 4 A is applied on the photoresist.Stainless steel uses the ferric chloride solution of 40 ° of Baume degrees to be etched to about 0.0040+0.0005 inch degree of depth through about 4 minutes cycle.The etched plate water that is produced cleans, and the potassium hydroxide aqueous release solution of remaining photoresist use 15% removes.
Pyramidal projections has triangular base.It is top to be to be about 0.004 inch apart from base material apart from the height of the projection of maximum.The grinding-material that is produced has with meticulous sand paper similar performance, but effective more significantly and more long-lived more than standard sand paper.
Example 3
Height stretching corrosion resistant plate 301 with about 0.013 inch thickness uses the shampooing of acid solution float stone and the passivation of iron chloride to clean 30 seconds.Can stick on the passivation stainless steel from 0.0015 inch thick light actuating resisting corrosion film of E1215 type that McDermid obtains, and the mask with pattern shown in Fig. 4 C is applied on the photoresist.Stainless steel/photoresist/mask synthetic imaging as example 1.
Stainless steel uses the ferric chloride solution of 40 ° of Baume degrees to etch into about 0.008 inch degree of depth.The etched plate water that is produced cleans, and the potassium hydroxide aqueous release solution of remaining photoresist use 15% removes.
Pyramidal projections has triangular base.It is top to be to be about 0.007 inch apart from base material apart from the height of the projection of maximum.The sheet material that is produced has and excellent properties like the xalsonte stationery, but can not produce the typical problem that exists in the sand paper.
Example 4
Fully hard corrosion resistant plate 304 with about 0.010 inch thickness cleans as example 3.Light actuating resisting corrosion film sticks on the passivation stainless steel, and the mask with pattern shown in Fig. 4 A is applied on the photoresist.Stainless steel uses the ferric chloride solution of 40 ° of Baume degrees to etch into about 0.0050 inch degree of depth through about 4 minute cycle.Etched plate water that is produced and 15% potassium hydroxide aqueous release solution clean.
Pyramidal projections has triangular base.It is top to be to be about 0.005 inch apart from base material apart from the height of the projection of maximum.The grinding-material that is produced has with meticulous sand paper similar performance, but effective more significantly and more long-lived more than standard sand paper.
For those skilled in the art, under situation about not departing from the scope of the present invention with spirit, numerous modifications and variations of the present invention are conspicuous, and should be appreciated that, the present invention is not the embodiment that excessively is limited to the illustrative that proposes here.
Claims (1)
1. grinding-material, comprise a substrate surface, described substrate surface has a plurality of conical in shape outstanding from this surface, described substrate surface and described projection are formed by same material, each projection has triangle substantially, square or polygon substrate, and triangle side, intersect on the pinnacle that forms a bit substantially described substrate and side, described conical in shape has the pinnacle at least two different planes, the part of described conical in shape is compared with other parts and is extended fartherly from described substrate surface, the pinnacle of described projection provides cutting and scabbled the edge on pattern mixing makes the described material to be independent of service orientation and grinds.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/847,902 US20050255801A1 (en) | 2004-05-17 | 2004-05-17 | Abrasive material and method of forming same |
| US10/847,902 | 2004-05-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101142057A true CN101142057A (en) | 2008-03-12 |
| CN100577364C CN100577364C (en) | 2010-01-06 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200580023978A Expired - Fee Related CN100577364C (en) | 2004-05-17 | 2005-05-17 | Grinding-material |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20050255801A1 (en) |
| EP (1) | EP1750903A4 (en) |
| JP (1) | JP2007537892A (en) |
| CN (1) | CN100577364C (en) |
| CA (1) | CA2566854A1 (en) |
| WO (1) | WO2005113197A2 (en) |
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| CA3118239A1 (en) | 2015-06-11 | 2016-12-15 | Saint-Gobain Ceramics & Plastics, Inc. | Abrasive article including shaped abrasive particles |
| KR102313436B1 (en) | 2016-05-10 | 2021-10-19 | 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 | Abrasive particles and method of forming the same |
| SI3455321T1 (en) | 2016-05-10 | 2022-10-28 | Saint-Gobain Ceramics & Plastics, Inc. | Methods of forming abrasive particles |
| US11230653B2 (en) | 2016-09-29 | 2022-01-25 | Saint-Gobain Abrasives, Inc. | Fixed abrasive articles and methods of forming same |
| US10563105B2 (en) | 2017-01-31 | 2020-02-18 | Saint-Gobain Ceramics & Plastics, Inc. | Abrasive article including shaped abrasive particles |
| US10759024B2 (en) | 2017-01-31 | 2020-09-01 | Saint-Gobain Ceramics & Plastics, Inc. | Abrasive article including shaped abrasive particles |
| US10865148B2 (en) | 2017-06-21 | 2020-12-15 | Saint-Gobain Ceramics & Plastics, Inc. | Particulate materials and methods of forming same |
| DE102018222444A1 (en) | 2018-12-20 | 2020-06-25 | Robert Bosch Gmbh | Shaped ceramic abrasive grain and process for producing a shaped ceramic abrasive grain |
| WO2021133901A1 (en) | 2019-12-27 | 2021-07-01 | Saint-Gobain Ceramics & Plastics, Inc. | Abrasive articles and methods of forming same |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5489235A (en) * | 1993-09-13 | 1996-02-06 | Minnesota Mining And Manufacturing Company | Abrasive article and method of making same |
| WO1996027189A1 (en) * | 1995-03-02 | 1996-09-06 | Minnesota Mining And Manufacturing Company | Method of texturing a substrate using a structured abrasive article |
| US5888119A (en) * | 1997-03-07 | 1999-03-30 | Minnesota Mining And Manufacturing Company | Method for providing a clear surface finish on glass |
| EP0980307A1 (en) * | 1998-02-27 | 2000-02-23 | Anthony Pollasky | Abrasive material and method of forming same |
| US6773475B2 (en) * | 1999-12-21 | 2004-08-10 | 3M Innovative Properties Company | Abrasive material having abrasive layer of three-dimensional structure |
| US6776699B2 (en) * | 2000-08-14 | 2004-08-17 | 3M Innovative Properties Company | Abrasive pad for CMP |
| US6821189B1 (en) * | 2000-10-13 | 2004-11-23 | 3M Innovative Properties Company | Abrasive article comprising a structured diamond-like carbon coating and method of using same to mechanically treat a substrate |
-
2004
- 2004-05-17 US US10/847,902 patent/US20050255801A1/en not_active Abandoned
-
2005
- 2005-05-17 CN CN200580023978A patent/CN100577364C/en not_active Expired - Fee Related
- 2005-05-17 CA CA002566854A patent/CA2566854A1/en not_active Abandoned
- 2005-05-17 WO PCT/US2005/017998 patent/WO2005113197A2/en active Application Filing
- 2005-05-17 EP EP05754972A patent/EP1750903A4/en not_active Withdrawn
- 2005-05-17 JP JP2007527541A patent/JP2007537892A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| EP1750903A2 (en) | 2007-02-14 |
| JP2007537892A (en) | 2007-12-27 |
| US20050255801A1 (en) | 2005-11-17 |
| EP1750903A4 (en) | 2010-10-13 |
| WO2005113197A3 (en) | 2006-04-27 |
| CN100577364C (en) | 2010-01-06 |
| CA2566854A1 (en) | 2005-12-01 |
| WO2005113197A2 (en) | 2005-12-01 |
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