CN101117270B - The aluminium borosilicate glass of high elastic coefficient and application thereof - Google Patents
The aluminium borosilicate glass of high elastic coefficient and application thereof Download PDFInfo
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- CN101117270B CN101117270B CN200710054522.XA CN200710054522A CN101117270B CN 101117270 B CN101117270 B CN 101117270B CN 200710054522 A CN200710054522 A CN 200710054522A CN 101117270 B CN101117270 B CN 101117270B
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/11—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen
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Abstract
The present invention relates to a kind of aluminium borosilicate glass of high elastic coefficient, be prepared from as weight percents with following raw materials according: 55-63.5 SiO
2, 8-10.5 B
2o
3, 15-21 Al
2o
3, 0-3.5 MgO, 4-10 CaO, 0-5 SrO, 1-5.5 BaO, 0.001-4 Y
2o
3, 0-2.5 La
2o
3, 0-0.5 ZnO, 0-0.3 ZrO
2, 0.005-0.08 R
2o (R=Li, Na, K), has the advantage of high strain-point, low-expansion coefficient, high elastic coefficient, basic alkali-free, is suitable for flat-panel monitor, be particularly suitable for manufacturing TFT-LCD glass substrate.
Description
Technical field
The present invention relates to a kind of aluminium borosilicate glass with high strain-point, low-expansion coefficient, high elastic coefficient, the substantially high elastic coefficient of alkali-free, it is suitable for flat-panel monitor, is especially suitable for manufacturing TFT-LCD glass substrate; The invention still further relates to a kind of glass substrate for plane display device, it is produced according to a kind of aluminium borosilicate glass composition of high elastic coefficient of basic alkali-free, the invention still further relates to the application of this sheet glass in flat-panel monitor.
Background technology
Liquid-crystal display (LCD) is one of flat-panel screens main flow of current widespread use.According to the difference of control mode, passive matrix type LCD and active matrix LCD two kinds can be divided into, current application is active matrix LCD or active array type LCD (AMLCD) more widely, also TFT-LCD (ThinFilmTransistor-LCD) is claimed, TFT LCD is the built-in transistor of each pixel in picture, can make the apparent area that brightness is brighter, color is abundanter and broader.Active matrix TFT-LCD is divided into two kinds according to type of drive, and one adopts non-crystalline silicon a-Si (amorphousSilicon) thin film transistor as the liquid-crystal display of driven with active matrix mode; Another kind adopts polysilicon p-Si (polycrystallineSilicon) thin film transistor as the liquid-crystal display of driven with active matrix mode.
A slice LCD needs use two sheet glass substrate, is used separately as the base plate of bottom glass substrate and colored filter (ColorFilter).LCD glass substrate can be divided into alkali-containing glass and the large class of non-alkali glass two, and alkali-containing glass is for passive matrix type LCD such as TN and STNLCD; For the glass substrate of TFT-LCD, needs forming nesa coating, insulating film, semi-conductor (polysilicon, amorphous silicon etc.) film and metallic membrane at underlying substrate glass surface, then form various circuit and figure by photoetch (Photo-etching) technology by technology such as sputtering, chemical vapour depositions (CVD).
Usually, the glass as TFT type liquid crystal display substrate should meet following Property requirements:
(1) basic alkali-free metal oxide in glass, in high-temperature heat treatment process, alkalimetal ion can be diffused into semiconductor film, the performance of infringement semiconductor film.In fact, due to the alkali metal impurity that raw material is brought into, the basic metal in glass is unavoidable, general requirement alkali metal content <1000ppm.
(2) because base plate glass need through a large amount of reagent cleaning and etching, for avoiding becoming to analyze in glass, glass must have high chemical stability, particularly has the strong reagents performances such as strong resistance to hydrofluoric acid containing.
(3) glass has the coefficient of expansion matched with polysilicon and amorphous silicon material, requires the average coefficient of linear expansion α between 20-300 DEG C
20-300in 30-40 × 10
-7/ DEG C scope in.
(4) glass should have high thermotolerance, prevents contraction and the distortion of sheet glass in heat treatment process, and (viscosity is 10 to its strain point
14.5the temperature of pool) 650 DEG C should be not less than, even higher.
(5) in visual appearance, base plate glass should have sufficiently high uniformity coefficient, planeness and non-nuclear density gauge.Performance Monitor manufacturing process comprises repeatedly precision photolithography, if TFT-LCD two substrates precision can not ensure, then two substrates spacing will produce local error, directly has influence on electric field and pixel, make the gray scale of indicating meter and color uneven.The substrate that planeness is low also can cause circuit to occur defect in a photolithographic process.
In recent years, flat-panel monitor keeps the large-scale development very fast.In TFT-LCD panel producer, after making multiple device on the glass substrate, each Device singulation cut off and becomes product, reaching the object of enhancing productivity, reducing costs thus.Therefore, correspondingly, the size of glass substrate also constantly increases, standard conventional at present develops into the 6th generation (1500 × 1800mm) and the 7th generation (1870 × 2200mm) by the 4th generation (680 × 880mm) several years ago and the 5th generation (1100 × 1250mm), even develops to higher generation.For the glass substrate producer, the consequent is had higher requirement to base plate glass character, for producing former of larger sized glass substrate, require the base plate glass composition selected, the various Property requirements that crystal liquid substrate quality and preparation technology propose can not only be met, also will be applicable to the production of former of sized rectangular glass substrate.
Along with glass substrate is to the propelling of maximization, slimming, sagging, rake angle that substrate produces due to deadweight have become great problem.For the glass substrate producer, the multiple links such as annealed after glass board material is shaping, cutting, processing, inspection, cleaning, impact is transported in the casing of glass and is loaded, takes out and the ability of separate glass sheets by large-size glass thin plate sagging between processing stand, counter plate manufacturers, similar problem exists equally.If when supporting substrate both sides, two ends, the maximum sag of chain (S) of glass substrate can use following formula subrepresentation:
In formula, K is constant, and ρ is density, and E is Young's modulus, and 1 for supporting interval, and t is thickness of glass substrate.When 1, t mono-timing, ρ diminishes after E strengthens can reduce sag of chain, and base plate glass therefore should be made to have as far as possible low density and as far as possible high Young's modulus.
Summary of the invention
The object of the present invention is to provide and a kind of there is high strain-point, low-expansion coefficient, high elastic coefficient, the aluminium borosilicate glass of high elastic coefficient of basic alkali-free and application thereof.
The object of the present invention is achieved like this: with following raw materials as weight percents (wt%) be prepared from: 55-63.5SiO
2, 8-10.5B
2o
3, 15-21Al
2o
3, 0-3.5MgO, 4-10CaO, 0-5SrO, 1-5.5BaO, 0.001-4Y
2o
3, 0-2.5La
2o
3, 0-0.5ZnO, 0-0.3ZrO
2, 0.005-0.08R
2o (R=Li, Na, K), wherein preferably MgO+CaO+SrO+BaO is 8-18, preferred SiO
2+ Al
2o
3be 70-80, wherein, preferred Al
2o
3content is 15-18.5, preferred Y
2o
3content is 0.1-4, and preferred content of MgO is 1-3, is more preferably 1.5-3, and preferred CaO content is 4-8.5, and preferred SrO content is 0-3, and preferred BaO content is 1-4, is more preferably 1-3, preferred R
2o content is 0.01-0.08, is also selected from the finings of following component containing at least one: 0-1.5As in glass
2o
3, 0-0.8Sb
2o
3, 0-1.5SnO
2, 0-0.5CeO
2, 0-2Cl.
The density of described glass is less than 2.55g/cm
3, be preferably not more than 2.50g/cm
3; The average coefficient of linear expansion of 20-300 DEG C of scopes is greater than 31 × 10
-7/ DEG C, be less than 39 × 10
-7/ DEG C, be preferably less than 38 × 10
-7/ DEG C; Strain point is greater than 650 DEG C, is preferably not less than 660 DEG C; Young's modulus is greater than 7.2kg/mm
2, preferably large 7.4kg/mm
2, more preferably greater than 7.5kg/mm
2, 25 DEG C of NH4F-HF buffered soln process 20 minutes by 10% intensity, its weight loss is less than 1mg/cm
2, this glass is particularly suitable for manufacturing flat panel display glass substrate.
Another object of the present invention is to provide a kind of sheet glass formed by aluminium borosilicate glass, wherein said glass with following raw materials as weight percents (wt%) be prepared from: 55-63.5SiO
2, 8-10.5B
2o
3, 15-21Al
2o
3, 0-3.5MgO, 4-10CaO, 0-5SrO, 1-5.5BaO, 0.001-4Y
2o
3, 0-2.5La
2o
3, 0-0.5ZnO, 0-0.3ZrO
2, 0.005-0.08R
2o (R=Li, Na, K), wherein MgO+CaO+SrO+BaO is 8-18, SiO
2+ Al
2o
3be 70-80, wherein, preferred Al
2o
3content is 15-18.5, preferred Y
2o
3content is 0.1-4, and preferred content of MgO is 1-3, is more preferably 1.5-3, and preferred CaO content is 4-8.5, and preferred SrO content is 0-3, and preferred BaO content is 1-4, is more preferably 1-3, preferred R
2o content is 0.01-0.08, also containing at least planting the finings being selected from following component in glass: 0-1.5As
2o
3, O-0.8Sb
2o
3, 0-1.5SnO
2, 0-0.5CeO
2, 0-2Cl.
The density of described glass is less than 2.55g/cm
3, be preferably not more than 2.50g/cm
3; The average coefficient of linear expansion of 20-300 DEG C of scopes is greater than 31 × 10
-7/ DEG C, be less than 39 × 10
-7/ DEG C, be preferably less than 38 × 10
-7/ DEG C; Strain point is greater than 650 DEG C, is preferably not less than 660 DEG C; Young's modulus is greater than 7.2kg/mm
2, preferably large 7.4kg/mm
2, more preferably greater than 7.5kg/mm
2, 25 DEG C of NH4F-HF buffered soln process 20 minutes by 10% intensity, its weight loss is less than 1mg/cm
2, this glass is particularly suitable for manufacturing flat panel display glass substrate.The thickness of this sheet glass is less than 1.0mm, is better not more than 0.7mm, and this sheet glass is especially suitable for use as flat panel display glass substrate.
Positively effect of the present invention is as follows:
Utilize the glass formula in the present invention, use overflow down draw explained hereafter, do not need to carry out milled processed under normal circumstances, but, if use float glass process, the production technique such as slot draw method, or when during use overflow down draw explained hereafter flat thin glass, operation occurs abnormal, such as, under producing the situations such as scuffing, in order to ensure glass quality, guarantee the yield rate of product, just need to carry out milled processed to glass surface, general glass surface maximal roughness (Rmax) after milled processed can reach below 5nm, utilize cut-off bias (cutoff) be 0.8-8mm wavelength Flatness survey meter measure, the Flatness of glass surface is at below 0.1um.
According to the Property requirements of flat-panel monitor, particularly TFT-LCD indicating meter counter plate glass substrate used, preferred glass types is the aluminoborosilicate system of alkaline including earth metal oxide compound, such glass has low density, low-expansion feature, and has the character such as good thermotolerance, chemical resistant properties.
In the present invention, SiO
2weight percent be 55-63.5.SiO
2for main glass network formers, thermal expansivity and the density of glass can be reduced, improve strain point of glass, but increase glass melting point.SiO
2when content is lower than 55wt%, not easily obtain the glass of low bulk, low density and high strain-point, the chemical stabilities such as the acid resistance of glass can be reduced; SiO
2content is when more than 63.5wt%, and the high temperature viscosity of glass increases, and causes glass smelting temperature too high.
B
2o
3being glass network former, is again a kind of fusing assistant, and it can reduce glass viscosity and improve stability, glass, in the present invention, and B
2o
3weight percent be 8-10.5, B
2o
3content, lower than 8wt%, cannot play fluxing action, is unfavorable for reducing glass density, and the ability of anti-buffered hydrofluoric acid (BHF) solution of glass is poor simultaneously, B
2o
3when content is more than 10.5wt%, strain point of glass reduces too large, and reduces the resistance to acid of glass, makes the phase-splitting tendency of glass increase simultaneously, reduces stability, glass.
In the present invention, Al
2o
3content is 15-21wt%.Al
2o
3strain point and the Young's modulus of glass can be significantly improved, increase the chemical stability of glass, can also stability, glass be increased, reduce the thermal expansivity of glass, Al
2o
3another advantage be to improve the Young's modulus of glass.Al
2o
3content, lower than 15wt%, not easily obtains the non-alkali glass of high strain-point, and chemical durability of glass is not enough, is unfavorable for the Young's modulus improving glass; Al
2o
3content is greater than the high temperature viscosity that 21wt% significantly can increase glass, and glass melting temperature is raised.
MgO has the effect reducing glass high temperature viscosity, increase low temperature viscosity, also can significantly improve the Young's modulus of glass.In the present invention, its content is limited to 0-3.5wt%, and content of MgO, higher than 3.5wt%, can reduce stability, glass, increases liquidus temperature, glass devitrification resistance ability is declined.For improving the Young's modulus of glass, preferred content of MgO is >1-3.5, is more preferably 1.5-3.5.
CaO has the effect reducing glass high temperature viscosity, increase low temperature viscosity equally, plays fusing assistant effect, and can increase glass acid resistance.In the present invention, CaO content is limited between 4-10wt%, and CaO content is greater than 10wt%, glass expansion coefficient can be made to increase excessive, and the anti-BHF solvent power of glass declines, and reduces stability, glass, and glass devitrification is inclined to be increased; CaO content is less than 4wt%, unfavorable with raising glass resistance to acid to reduction glass smelting temperature.
SrO and BaO all has the effect increasing chemical durability of glass and improve glass devitrification resistance, and can improve the anti-BHF solvent power of glass.In the present invention, the content of SrO is limited to 0-5wt% scope.SrO content is more than 5wt%, and significantly can increase density and the coefficient of expansion of glass, be unfavorable for obtaining low density and low-coefficient glass, preferred SrO content is 0-3.The content of BaO is limited to 1-5.5wt% scope, BaO content is greater than density and the coefficient of expansion that 5.5wt% significantly can increase glass, be unfavorable for obtaining high strain-point and high elastic coefficient, low-density glass, the content of BaO is unfavorable for lower than 1wt% the liquidus temperature reducing glass, preferred BaO content is 1-4, is more preferably 1-3.
SiO in the present invention
2+ Al
2o
3total amount be limited in 70-80wt%, be then unfavorable for obtaining low bulk, low density, high strain-point glass lower than 70wt%, the chemical stability of glass is not enough, too high more than the temperature of fusion of 80wt% then glass, and liquidus temperature increases.The total amount of MgO+CaO+SrO+BaO is limited in 8-18wt%, and be unfavorable for lower than 8wt% the temperature of fusion and the liquidus temperature that reduce glass, then cause the coefficient of expansion of glass to increase more than 18wt%, strain point declines, and liquidus temperature raises on the contrary simultaneously.
Rare-earth oxide Y
2o
3the Young's modulus of glass can be improved significantly, and the temperature of fusion of glass can be reduced, in the present invention, Y
2o
3content be 0.001-4wt%.Y
2o
3content more than 4wt% time, unfavorable to devitrification of glass stability, and too increase glass cost.Preferred Y
2o
3content is 0.1-4wt%.Rare-earth oxide La
2o
3with Y
2o
3the same, the Young's modulus of glass can be improved significantly, and the temperature of fusion of glass can be reduced, but greatly can increase the density of glass.In the present invention, La
2o
3content be 0-2.5wt%, content then increases glass density and cost greatly more than 2.5wt%, and reduces the crystallization stability of glass.
In the present invention, ZnO is functionality, but ZnO can reduce glass high temperature viscosity, the acid resistance increasing glass and resistance to BHF, and disadvantageously ZnO reduces strain point of glass and increases the thermal expansivity of glass, and in the present invention, the content of ZnO is 0-0.5wt%.ZrO
2effectively can improve the chemical stability of glass, reduce glass expansion coefficient and significantly improve the scratch resistance capability of glass, and effectively improve the Young's modulus of glass, but ZrO
2solubleness is in glass little, can increase the high temperature viscosity of glass and improve glass liquidus temperature, the tendency towards devitrification of glass is increased, in the present invention, and ZrO
2content be defined as 0-0.3wt%.
Alkalimetal oxide R containing trace in glass of the present invention
2o (R=Li, Na, K), primarily of Al
2o
3, CaCO
3introduce Deng raw material, wherein most importantly Na
2o.Alkalimetal oxide can reduce the temperature of fusion of glass significantly, the phase-splitting of glass can also be suppressed, thus improve the crystallization stability of glass, but in TFT panel manufacturing process, due to the performance of alkalimetal oxide infringement semiconductor film, its content is restricted.In the present invention, alkalimetal oxide R
2the content of O is no more than 0.08wt%, preferably no more than 0.06wt%; Due to the alkalimetal oxide R in glass
2o is unavoidable, and its content is not less than 0.001wt%, is usually not less than 0.01wt%.
The finings of following component is also selected from containing at least one: 0-1.5wt%As in glass of the present invention
2o
3, 0-0.8wt%Sb
2o
3, 0-1.5wt%SnO
2, 0-0.5wt%CeO
2, 0-2wt%Cl.Wherein As
2o
3can be used alone, or and Sb
2o
3be combined, SnO
2separately or and CeO
2or Cl is combined, the content of finings, mainly in order to improve the melting quality of glass, reduce the bubble in glass, but too much finings can cause stability, glass to decline, and also can cause adverse influence to other character of glass.Cl in glass by the muriate corresponding with oxide compound in glass ingredient, CaCl
2, MgCl
2, BaCl
2deng.
Embodiment
The invention provides a kind of aluminium borosilicate glass with high elastic coefficient, what this glass represented with weight percent consists of: 55-63.5SiO
2, 8-10.5B
2o
3, 15-21Al
2o
3, 0-3.5MgO, 4-10CaO, 0-5SrO, 1-5.5BaO, 0.001-4Y
2o
3, 0-2.5La
2o
3, 0-0.5ZnO, 0-0.3ZrO
2, 0.001-0.08R
2o (R=Li, Na, K),
Wherein preferably MgO+CaO+SrO+BaO is 8-18, preferred SiO
2+ Al
2o
3be 70-80, wherein, preferred Al
2o
3content is 15-18.5, preferred Y
2o
3content is 0.1-4, and preferred content of MgO is 1-3, is more preferably 1.5-3, and preferred CaO content is 4-8.5, and preferred SrO content is 0-3, and preferred BaO content is 1-4, is more preferably 1-3, preferred R
2o content is 0.01-0.06, is also selected from the finings of following component containing at least one: 0-1.5As in glass
2o
3, 0-0.8Sb
2o
3, 0-1.5SnO
2, 0-0.5CeO
2, 0-2Cl.
The density of described glass is less than 2.55g/cm
3, be preferably not more than 2.50g/cm
3; The average coefficient of linear expansion of 20-300 DEG C of scopes is greater than 31 × 10
-7/ DEG C, be less than 39 × 10
-7/ DEG C, be preferably less than 38 × 10
-7/ DEG C; Strain point is greater than 650 DEG C, is preferably not less than 660 DEG C; Young's modulus is greater than 7.2kg/mm
2, preferably large 7.4kg/mm
2, more preferably greater than 7.5kg/mm
2, 25 DEG C of NH4F-HF buffered soln process 20 minutes by 10% intensity, its weight loss is less than 1mg/cm
2, this glass is particularly suitable for manufacturing flat panel display glass substrate.
The present invention provides again a kind of sheet glass formed by aluminium borosilicate glass, and what wherein said glass represented with weight percent consists of: 55-63.5SiO
2, 8-10.5B
2o
3, 15-21Al
2o
3, 0-3.5MgO, 4-10CaO, 0-5SrO, 1-5.5BaO, 0.001-4Y
2o
3, 0-2.5La
2o
3, 0-0.5ZnO, 0-0.3ZrO
2, 0.001-0.08R
2o (R=Li, Na, K),
Wherein preferably MgO+CaO+SrO+BaO is 8-18, preferred SiO
2+ Al
20
3be 70-80, wherein, preferred Al
20
3content is 15-18.5, preferred Y
2o
3content is 0.1-4, and preferred content of MgO is 1-3, is more preferably 1.5-3, and preferred CaO content is 4-8.5, and preferred SrO content is 0-3, and preferred BaO content is 1-4, is more preferably 1-3, preferred R
20 content is 0.01-0.06, is also selected from the finings of following component containing at least one: 0-1.5As in glass
20
3, 0-0.8Sb
2o
3, 0-1.5SnO
2, 0-0.5CeO
2, 0-2Cl.
The density of described glass is less than 2.55g/cm
3, be preferably not more than 2.50g/cm
3; The average coefficient of linear expansion of 20-300 DEG C of scopes is greater than 31 × 10
-7/ DEG C, be less than 39 × 10
-7/ DEG C, be preferably less than 38 × 10
-7/ DEG C; Strain point is greater than 650 DEG C, is preferably not less than 660 DEG C; Young's modulus is greater than 7.2kg/mm
2, preferably large 7.4kg/mm
2, more preferably greater than 7.5kg/mm
2, 25 DEG C of NH4F-HF buffered soln process 20 minutes by 10% intensity, its weight loss is less than 1mg/cm
2, this glass is particularly suitable for manufacturing flat panel display glass substrate.The thickness of this sheet glass is less than 1.Omm, is better not more than 0.7mm, and this sheet glass is especially suitable for use as flat panel display glass substrate.
In order to further illustrate the present invention, shown below is some embodiments that can reflect feature of the present invention, but these embodiments only for illustration of, any restriction is not formed to the present invention.
Table 1-2 are a few thing embodiment of the present invention, and these work embodiments reflect the impact of each component different content combination on glass property in the present invention, and these work embodiments also form the foundation of claim of the present invention simultaneously.
According to composition listed in table 1-2 batching, by 500g preparing glass charge, glass batch is contained in platinum-rhodium crucible, and with founding 4h in high temperature silicon molybdenum rod furnace, glass melting temperature 1600 DEG C, the glass pouring melted forms block and anneals.Glass is processed to various required sample for property detection.Oxide compound composition (% by weight) and the glass property of embodiment is listed in detail in table 1-table 2:
(1) density p [g/cm
3];
The mean thermal expansion coefficients α of (2) 20-300 DEG C
20/300[10
-7/ K];
(3) strain point T
s[DEG C], viscosity is 10
14.5temperature during pool;
(4) annealing point T
a[DEG C], viscosity is 10
13temperature during pool;
(5) working point T
w[DEG C], viscosity is 10
4temperature during pool;
(6) temperature T
2.5[DEG C], viscosity is 10
2.5temperature during pool;
(7) Young's modulus (also claiming Young's modulus) E [kg/mm
2];
(8) hydrofluoric acid resistant damping fluid corrodibility BHF [mg/cm
2], the glass of 6 mirror polish at 25 DEG C, with the NH of 10% intensity
4the F-HF buffered soln process weight loss of 20 minutes.
Wherein, the density p of glass adopts Archimedes method to measure; The thermal expansivity of 20-300 DEG C adopts dilatometer to measure, and represents with average coefficient of expansion; The strain point of glass and annealing point adopt the camber beam method of ASTMC598 defined to measure; The high temperature viscosity of glass adopts rotating cylinder viscometer to press ASTMC965-96 method and measures, calculate working point T by Fulcher formula (also referred to as VFT formula)
wand T
2.5.
According to 2 flint glass F compositions in embodiment, melting in test melting furnaces, shaping by overflow downdraw, a kind of thickness produced is the sheet glass of 0.7mm, in sheet glass without obvious inclusion as bubble, calculus etc., the index such as Flatness, warpage of sheet glass reaches the requirement of LCD glass substrate.Be of a size of 680 × 880mm when making, thickness is when being the sheet glass of 0.7mm, support two long limit and a minor face, the maximum sag of chain not supporting minor face is only about 20.5mm.The physics of described sheet glass, chemistry and mechanical properties (table 1) all can meet the needs of LCD glass substrate, and this sheet glass is suitable for panel of LCD, particularly TFT liquid-crystalline glasses panel.
Utilize the glass that the component in this invention is produced, adopt glass outer surface that overflow method is produced owing to not contacting other any materials besides air, so the roughness of glass surface generally all exists
arrive
left and right, need not grind and may be used in the body product of liquid crystal panel and other flat-panel display panels producing TFT, but, in process of production, due to a variety of causes, particularly glass surface can because of reasons such as operations, inevitably as defects such as scuffings, in order to improve glass quality, enhancing productivity, generally needing to carry out milled processed.In addition, when component in this invention uses floating process shaping, glass surface can produce the ripple because drawing causes, and can glue the tin of floating trace in the one side near tin face, this, to being all disadvantageous with formation liquid crystal panel and other display pannels, being only had and just can be eliminated by Ginding process.In glass grinding process, need the rough grinding through 1-2 times, and then carry out the roughness of the needs that fine grainding (also can be referred to as polishing) glass surface obtains.In addition, the component of this invention also utilizes notch method to test, and equally through the rough grinding of 1-2 times, and then carries out the roughness of the needs that fine grainding (also can be referred to as polishing) glass surface obtains.The glass of three kinds of processing methodes after milled processed utilizes AFM surfaceness equipment to measure, glass surface maximal roughness (Rmax) can reach below 5nm, in addition, in order to eliminate the external waviness that drawing in floating process causes, to the glassy product after grinding, the SurfCom surface flatness survey meter utilizing Japan to produce is measured, in measurement, be 0.8-8mm wavelength by cut-off bias (cutoff), the Flatness of glass surface is all at below 0.1um.
Should be understood that, the various embodiments of glass of the present invention composition all go for the method for making of its application of the present invention, base plate glass and base plate glass, and can combine with their various embodiments.Especially, it should be noted that, can arbitrary combination between various embodiments of the present invention, and be not limited only to certain and specifically combine.
Table 1
Glass property
Table 2
Glass property
Claims (5)
1. an aluminium borosilicate glass for high elastic coefficient, is characterized in that: with following raw materials as weight percents (wt%) be prepared from density and be less than 2.55g/cm
3, glass is 31-38 × 10 at the average coefficient of linear expansion of 20-300 DEG C of scope
-7dEG C, strain point higher than 650 DEG C, Young's modulus is greater than 7.2kg/mm
2glass, this glass is used for thickness and is no more than the sheet glass of the flat-panel monitor of 1mm, and its glass surface after grinding is coarse is not more than 0.55nm, the Flatness of glass surface below 0.1 μm,
2. the aluminium borosilicate glass of high elastic coefficient as claimed in claim 1, is characterized in that: have the following each raw material optimized to be prepared from as weight percents:
3. the aluminium borosilicate glass of high elastic coefficient as claimed in claim 1 or 2, is characterized in that: described glass contains the Y of 0.1-4wt%
2o
3.
4. the aluminium borosilicate glass of high elastic coefficient as claimed in claim 3, is characterized in that: described glass contains the alkalimetal oxide R of 0.01-0.08wt%
2o.
5. the sheet glass for flat-panel monitor, it is characterized in that: adopt the glass material that one of claim 1-4 is described, its thickness is no more than 1mm, and the glass surface roughness after grinding is not more than 0.55nm, and the Flatness of glass surface is below 0.1 μm.
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| CN200710054522.XA CN101117270B (en) | 2007-06-07 | 2007-06-07 | The aluminium borosilicate glass of high elastic coefficient and application thereof |
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| CN108929035A (en) * | 2018-07-02 | 2018-12-04 | 芜湖东旭光电装备技术有限公司 | Glass composition and high tenacity glass and its preparation method and application |
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