CN101110181A - Plasma display and method of mfg. the same - Google Patents
Plasma display and method of mfg. the same Download PDFInfo
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- CN101110181A CN101110181A CNA2006100860249A CN200610086024A CN101110181A CN 101110181 A CN101110181 A CN 101110181A CN A2006100860249 A CNA2006100860249 A CN A2006100860249A CN 200610086024 A CN200610086024 A CN 200610086024A CN 101110181 A CN101110181 A CN 101110181A
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- Prior art keywords
- grid
- plasma display
- grate
- discharge space
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
Abstract
The invention relates to a plasma display and its manufacturing method, in particular to a plasma display and its manufacturing method, comprising a plasma display grate. The invention comprises a first grate etched on a glass basal plate at rear section, a second grate extruded from a discharge space between the first grates; an addressing electrode is formed on the second grate; a third grate is formed at the upper section of the first grate, so as to maximize the area of fluorophor layer applied in unit discharge space and enhance the luminance and efficiency. Meanwhile, because the addressing electrode and the discharge space are near to each other, the driving performance can be improved. The invention comprises the first grate, the second grate and the third grate; the second grate extruded in the discharge space between the first grates is formed on the glass basal plate at the rear section, so that the addressing electrode is formed on the second grate and the third grate is formed at the upper section of the first grate.
Description
Technical field
The present invention relates to a kind of structure of plasma display, relate in particular to the plasma display that substrate in front is provided with dielectric layer.
Background technology
In general, plasma display (Plasma Display Panel: hereinafter to be referred as: " PDP ") is that the ultraviolet ray of the 147nm that produced by by the inert mixed gas discharge of He+Xe or Ne+Xe the time makes light-emitting phosphor, thereby the image that comprises literal or chart is shown.Such PDP not only realizes ultra-thinization and maximization easily, also can provide the image quality of significantly improving by means of nearest technological development.
Especially concerning three-electrode surface discharge type AC-PDP, assemble the wall electric charge during discharge on the surface, and, therefore have long characteristics of low voltage drive and service time from the sputter guard electrode that discharge is produced.
Fig. 1 is the generalized schematic of structure of the plasma display of prior art.As shown in the figure, PDP100 is the header board 10 and the parallel at certain intervals be combined into of the back plate 20 that constitutes the back by the display surface of show image.
Keep electrode 11 and be limited discharge current, and played dielectric layer 12 coverings of insulating effect between the electrode group, become easier, form the protective seams 13 of foliation magnesium oxide (Mgo) above the dielectric layer 12 in order to make discharging condition.
The upper side of back plate 20 produces at R, the G, the B fluorophor 23 that show the visible rays of drawing a portrait when having smeared the address discharge.
In addition, because of the stitching engineering of front glass substrate 10 and back glass substrate 20, encapsulant-frit (Frit Glass) with plasticity bonding after, operation exhaust engineering is intended to eliminate the inner impurity of panel.
Discharging efficiency when improving plasma discharge, the panel that finishes the exhaust engineering has the inert gas of helium (He), neon (Ne), xenon (Xe) and so on to be injected into plasma display inside.
After prior art discharge with this structure is keeping 11 at electrode and carrying out the address discharge of the addressing electrode 22 of back glass substrate 20 and front glass substrate 10, continue to carry out successional demonstration discharge to selected cell.Simultaneously, during discharge, the excited by vacuum ultraviolet fluorophor of generation makes it emit visible light, obtains desired image with this.
Prior art plasma display with this spline structure roughly forms by glass substrate manufacturing engineering, front substrate manufacturing engineering, back substrate manufacturing engineering, packing engineering.
Back plate manufacturing engineering in the above-mentioned plasma display manufacturing engineering will be described below.
Fig. 2 is the engineering drawing of plate manufacturing engineering order behind the prior art plasma display.As shown in Figure 2, cell structure is to form through following engineering.
At first, in (a) step, will have a Fixed width and high addressing electrode 222 is formed on glass substrate top, back 220; In (b) step, dielectric layer 213b is formed at addressing electrode 222 tops.
Afterwards in (c) step, with grid material 221 ' be formed on dielectric layer 213b top; In (d) step, photoresist 230 is spread upon grid material 221 tops.
Afterwards,, the photomask 232 that forms certain pattern (Pattern) is placed photoresist 230 tops, irradiation light, sclerosis photoresist 230 in (e) step.Such engineering engineering of exposing exactly.
Afterwards, by (f) development engineering, washing (g) does not move etching after having the photoresist 230 of sclerosis on the step.
Then, in (h) step, will eliminate photoresist 230, and after drying, burn till, form the grid 221 that is intended to prevent crosstalking between adjacent unit (Crosstalk) phenomenon with this.
Afterwards,, smear luminescent coating 223, burn till, just can form back glass substrate 20 if give between the grid 221 in (i) step.
But as above-mentioned plasma display manufacture method, board fabrication method is less because of the application area of fluorophor after the prior art shown in Figure 2, has brightness and inefficiency, the problem that drive characteristic also descends.Simultaneously, because of the distance between addressing electrode and the discharge is bigger, its drive characteristic also descends.
Summary of the invention
The present invention proposes for addressing the above problem, be identically formed the second outstanding grid of discharge space between etched first grid and first grid on the glass substrate of back, addressing electrode is formed at the second grid top, the 3rd grid is formed at the first grid top, make the fluorophor application area maximum on the cell discharge space, improve brightness and efficient.In addition, the close together because of between addressing electrode and the discharge can improve drive characteristic.
To achieve these goals, the present invention is as comprising the plasma display of grid, it is characterized in that, grid comprises first grid and second grid and the 3rd grid, form the second outstanding grid of discharge space between etched first grid and first grid in the back on the glass substrate, form addressing electrode on the second grid top, form the 3rd grid on the first grid top.
In addition, second height of grid is less than or equal to first height of grid.
In addition, comprise following several steps: in order to form the second outstanding grid of cell discharge space between first grid and first grid, the step of etching back glass substrate;
The step of addressing electrode is formed at the second grid top;
Make above-mentioned addressing electrode capping unit discharge space, form the step of dielectric layer;
The step of the 3rd grid is formed at the first grid top;
The step of smearing luminescent coating for the cell discharge space.
In addition, it is feature that etching engineering is to use the blasting treatment method.
Second height of grid is less than or equal to first height of grid.
The 3rd grid is to utilize silk screen print method to form.
As mentioned above, the present invention such as plasma display and manufacture method thereof form etched first grid and second grid in the back on the glass substrate, form the 3rd grid on the first grid top, make the area of smearing to the luminescent coating in cell discharge space reach maximum, improve brightness and efficient.Simultaneously, the close together because of between addressing electrode and the discharge also can improve drive characteristic.
Description of drawings
Fig. 1 is the synoptic diagram of the three-electrode surface discharge type AC-PDP structure of prior art.
Fig. 2 is the engineering drawing of plate manufacturing engineering order behind the prior art plasma display.
Fig. 3 a is the synoptic diagram of plasma display back plate structure of the present invention.
Fig. 3 b is the engineering drawing of plate manufacturing engineering order behind the plasma display of the present invention.
The reference numeral explanation
313: dielectric layer 320: the back glass substrate
321a: the first grid 321b: second grid
321c: the 3rd grid 321c ': the 3rd grid material
322: addressing electrode 323: luminescent coating
330: photoresist 332: photomask
H1: the first height of grid H2: second height of grid
Embodiment
Below, with reference to the accompanying drawings the embodiment of the invention is described in detail.
Fig. 3 a is the synoptic diagram of plasma display back plate structure of the present invention.Shown in Fig. 3 a, form the second outstanding grid 321b of discharge space between the etched first grid 321a and first grid on the back glass substrate 320.
At this moment, the second grid 321b top forms addressing electrode 322, the first grid 321a tops and forms the 3rd grid 321c.
At this moment, the second grid 321b height H 2 is less than or equal to the height H 1 of the first grid 321a.But the second grid 321b height H 2 should equal the height H 1 of the first grid 321a.
As mentioned above, be identically formed the second outstanding grid of discharge space between etched first grid and first grid on the glass substrate of back, addressing electrode is formed at the second grid top, the 3rd grid is formed at the first grid top, make the area of smearing to the luminescent coating in cell discharge space reach maximum, improve brightness and efficient.Simultaneously, because of the close together between addressing electrode and the discharge, also can improve drive characteristic.
Fig. 3 b is the engineering drawing of plate manufacturing engineering order behind the plasma display of the present invention.Shown in Fig. 3 a, cell structure is by down routine engineering formation.
At first,, make the second outstanding grid 321b of cell discharge space between the first grid 321a and the first grid 321a be formed on back glass substrate 320, carry out etching with the blasting treatment method in (a) step.
At this moment, the second grid 321b height H 2 is less than or equal to height H 1 formation of the first grid 321a.But the second grid 321b height H 2 should equal the height H 1 of the first grid 321a.
Afterwards, in (b) step, addressing electrode 322 is formed at the second grid 321b top.
At this moment, if addressing electrode 322 is formed at the second grid 321b top, therefore close together between the discharge will improve driving feature.
In (c) step, make addressing electrode 322 capping unit discharge spaces, form dielectric layer 313.
In (d) step, the 3rd grid material 321c ' layer is formed at the first grid 321a top afterwards; In (e) step, smear photoresist 330 for the 3rd grid material 321c ' top.
Afterwards,, the photomask that forms certain pattern is placed on photoresist 330 tops, irradiation light, sclerosis photoresist 330 in (f) step.This process is called the exposure engineering.
Afterwards, in (g) step, by the development engineering, washing does not have the photoresist 330 of sclerosis, (h) moves etching on the step.
Then, in (i) step, will eliminate photoresist 330, and after drying, burn till, and form the 3rd grid 321c with this, at this moment the 3rd grid 321c utilizes silk screen print method to form.
Afterwards,,, burn till, just can form back glass substrate 320 if smear luminescent coating 323 for the cell discharge space in (j) step.At this moment, smear the area maximum of luminescent coating 323, improve brightness and efficient.
As mentioned above, second grid that discharge space on the glass substrate of back between etched first grid of identical formation and first grid is outstanding, addressing electrode is formed at the second grid top, the 3rd grid is formed at the first grid top, make the area of smearing to the luminescent coating of the discharge space of unit reach maximum, improve brightness and efficient.Simultaneously, the close together because of between addressing electrode and the discharge also can improve drive characteristic.
As mentioned above, the person skilled of the technical field of the invention can be carried out the change of other concrete form fully to embodiments of the invention under the prerequisite that does not depart from this invention technical conceive and necessary characteristics.Therefore, above-described embodiment launches with the purpose of example in all respects, not limited thereto, compared with above-mentioned detailed description, scope of the present invention more is embodied in the claim scope, and all changes of deriving according to the thought of claim and scope and equivalent concepts thereof or the form of variation should belong to scope of the present invention.
Claims (6)
1. a plasma display that comprises grid is characterized in that,
Described grid comprises first grid and second grid and the 3rd grid,
Forming the second outstanding grid of discharge space between etched first grid and above-mentioned first grid on the glass substrate,
Form addressing electrode on the above-mentioned second grid top,
Form the 3rd grid on the above-mentioned first grid top.
2. plasma display as claimed in claim 1 is characterized in that,
The height of described second grid is less than or equal to above-mentioned first height of grid.
3. manufacturing method for plasma displays is characterized in that may further comprise the steps:
In order to form the second outstanding grid of cell discharge space between first grid and first grid, the step of etching glass substrate;
The step of addressing electrode is formed at the above-mentioned second grid top;
Make above-mentioned addressing electrode capping unit discharge space, form the step of dielectric layer;
The step of the 3rd grid is formed at the first grid top;
The step of smearing luminescent coating for the said units discharge space.
4. plasma display manufacture method as claimed in claim 3 is characterized in that, described etching engineering is to use the blasting treatment method.
5. plasma display manufacture method as claimed in claim 3 is characterized in that, described second height of grid is less than or equal to above-mentioned first height of grid.
6. plasma display manufacture method as claimed in claim 3 is characterized in that, described the 3rd grid uses silk screen print method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2006100860249A CN101110181A (en) | 2006-07-20 | 2006-07-20 | Plasma display and method of mfg. the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2006100860249A CN101110181A (en) | 2006-07-20 | 2006-07-20 | Plasma display and method of mfg. the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101110181A true CN101110181A (en) | 2008-01-23 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2006100860249A Pending CN101110181A (en) | 2006-07-20 | 2006-07-20 | Plasma display and method of mfg. the same |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101110181A (en) |
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2006
- 2006-07-20 CN CNA2006100860249A patent/CN101110181A/en active Pending
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