CN101082729A - Liquid crystal display board, colorful color filter and manufacturing method thereof - Google Patents
Liquid crystal display board, colorful color filter and manufacturing method thereof Download PDFInfo
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- CN101082729A CN101082729A CN 200710128493 CN200710128493A CN101082729A CN 101082729 A CN101082729 A CN 101082729A CN 200710128493 CN200710128493 CN 200710128493 CN 200710128493 A CN200710128493 A CN 200710128493A CN 101082729 A CN101082729 A CN 101082729A
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Abstract
The invention discloses a LCD panel, colorful filter piece and making method, which comprises the following steps: providing a base; forming a buffer material layer on the base; forming patterned lightproof layer on the buffer material layer; adopting patterned lightproof layer as lid to pattern the buffer material layer to form a patterned buffer layer; forming a separating piece through patterned lightproof layer and patterned buffer layer; making the separating piece form multiple pixel areas on the base; forming a colorful filter layer in each pixel area. The making method of colorful filter piece can avoid non-filling phenomenon of colorful dye at pixel area rim, which improves the quality of colorful filter piece. Otherwise, the colorful filter piece and LCD panel with the colorful filter piece are provided.
Description
Technical field
The present invention relates to a kind of display panel and assembly thereof and manufacture method, particularly relate to a kind of display panels, its colored filter and manufacturing method of color filters.
Background technology
The colored filter of general LCD is made flow process, be to adopt trichromatic colored photoresist (photo resist) through three road gold-tinted photoetching (photolithography) technological processes, three colored photoresist films are formed in the pixel on the substrate in regular turn, and form colored filter.Because the formation of colored photoresist film is that colored photoresist liquid is dropped on the substrate, then coat on the substrate uniformly in rotary manner, therefore most of colored photoresist can be wasted in the process of rotation, and the costing an arm and a leg of colored photoresist, such production method cost is higher.In addition, the gold-tinted photoetching process that is adopted needs to use a large amount of organic solvents, may cause environmental pollution.
In the recent period, a kind ofly utilize ink jet printing (inkjet printing, IJP) method that forms colored filter is developed.The trichromatic colored filter film of spray printing is in pixel simultaneously for ink jet printing method, and the gold-tinted photoetching process than traditional color filter adopts can reduce a large amount of making flow process and material cost.Therefore make that also ink-jet printing technology has the advantage that large tracts of land is made.
Known colored filter comprises the colored filter film of black matrix and three primary colors (red, green, blue).The formation of wherein black matrix 120 is that the resin type photoresist is coated on the substrate, again through soft roasting, exposure, develop to form and deceive matrix 120, shown in Figure 1A with hard roasting supervisor.Then, again the mode of color pigment photoresist with spray printing is formed among the pixel region P.In addition, be the mixed color phenomenon of avoiding color pigment to slop over and being caused during mutual union dyeing, generally can be after black matrix 120 forms, carrying out an ink-resistant handles, make the surface of black matrix 120 have ink-resistant character, so, color pigment just can't be attached on the black matrix 120, flows in the pixel region and position oneself.
Yet, black matrix 120 with the making of resin type photoresist, no matter be the mode that adopts liquid photoresist coating or dry film to fit, the resin type photoresist stays a little residue (scum) 122 at black matrix 120 with substrate 110 intersections easily after overexposure, development and hard baking.And after the follow-up ink-resistant of process is handled, residue itself also will have ink-resistant, and cause color pigment 130 after being received in black matrix 120, can deceive the situation that the generation of matrix 120 edges is not filled up, shown in Figure 1B.Like this, will cause the production acceptance rate of colored filter not high, the display quality of liquid crystal panel reduces.
Summary of the invention
The object of the present invention is to provide a kind of colored filter and manufacture method thereof, it can improve the problem that color pigment is difficult for filling up pixel region because of the residue influence of deceiving matrix.
Another object of the present invention is to provide a kind of display panels, the image of its demonstration has good color saturation.
To achieve these goals, the invention provides a kind of colored filter, it comprises a substrate, a separator and a plurality of chromatic filter layer.Separator comprises patterned buffer layer and patterning light shield layer, and separator is disposed on the substrate, to form a plurality of pixel regions on substrate.The patterning light shield layer is disposed on the patterned buffer layer, and wherein the material of patterning light shield layer comprises resin (resin).Chromatic filter layer then is disposed at respectively in the pixel region on the substrate.
In one embodiment of this invention, above-mentioned colored filter can further comprise ink-resistant (hydrophobic) layer, is formed on the surface of separator.
In one embodiment of this invention, the material of above-mentioned patterned buffer layer comprises photosensitive material, silicide, transparent conductive material or combinations thereof.Silicide comprises silicon nitride, amorphous silicon or silicon dioxide.Transparent conductive material comprises indium tin oxide, indium-zinc oxide or zinc oxide aluminum.
In one embodiment of this invention, the material of above-mentioned patterned buffer layer and light-shielding material layers eurymeric photoresist and negative photoresist each other.
In one embodiment of this invention, above-mentioned colored filter can comprise further that one shares electrode, and it is positioned on the separator.
To achieve these goals, the present invention also provides a kind of color filter making method, and it comprises the following steps: at first, and a substrate is provided, and forms a cushioned material layer on substrate.Then on cushioned material layer, form a patterning light shield layer.With the patterning light shield layer is that mask comes the patterning cushioned material layer to form a patterned buffer layer, make this patterning light shield layer and patterned buffer layer form a separator jointly, and separator forms a plurality of pixel regions on substrate.Then, in each pixel region, form a chromatic filter layer respectively.
In one embodiment of this invention, above-mentioned color filter making method can further be included in after the formation of patterning light shield layer, forms an ink-repellent layer on the patterning light shield layer.
In one embodiment of this invention, above-mentioned color filter making method can comprise further that a upgrading is carried out on the surface of light-shielding material layers to be handled.Wherein the upgrading processing can be to carry out a plasma modifying process flow process (plasma modified process).When carrying out this plasma modifying process flow process, can further comprise patterning cushioned material layer simultaneously.
In one embodiment of this invention, be included in formation one light-shielding material layers on the cushioned material layer in the method that forms the patterning light shield layer on the cushioned material layer.Then light-shielding material layers is carried out a photoetching process, so that light-shielding material layers is carried out patterning.The material of light-shielding material layers comprises a resin (resin).
In one embodiment of this invention, above-mentioned color filter making method is included in after the photoetching process, and the patterning light shield layer is carried out a prebake conditions technological process.The temperature of prebake conditions technology is about 90 degrees centigrade to 120 degrees centigrade.
In one embodiment of this invention, the method for patterning cushioned material layer comprises with the patterning light shield layer serving as that the cover curtain comes cushioned material layer is carried out a photoetching process.After photoetching process, and before forming chromatic filter layer, further cured pattern light shield layer and patterned buffer layer.In addition, after this photoetching process, and before forming chromatic filter layer, can further carry out a back baking process to the patterning light shield layer.The temperature of back baking process is about 200 degrees centigrade to 220 degrees centigrade.
In one embodiment of this invention, the method for patterning cushioned material layer comprises cushioned material layer is carried out a dry etch process or a wet etch process.
In one embodiment of this invention, the method for patterning cushioned material layer comprises cushioned material layer is carried out a wet etch process.Wet etch process can use oxalic acid as etching solution, and the temperature of wet etch process is about 25 degrees centigrade.In addition, before the patterning cushioned material layer, further cured pattern light shield layer and cushioned material layer.
In one embodiment of this invention, the method that forms chromatic filter layer comprises carries out an ink-jetting process, to insert a color pigment respectively in each pixel region.After color pigment is inserted, can further be cured color pigment.The temperature of curing chromatic pigment is about 200 degrees centigrade.
In one embodiment of this invention, above-mentioned color filter making method can comprise further that forming one shares electrode, is positioned on the separator.
To achieve these goals, the present invention also provides a kind of display panels, and it comprises array basal plate, a colored filter and a liquid crystal layer.Colored filter comprises a substrate, a separator, a plurality of chromatic filter layer and a shared electrode.Separator comprises a patterned buffer layer and a patterning light shield layer.Separator is to be disposed on the substrate, to form a plurality of pixel regions on substrate.The patterning light shield layer is to be disposed on the patterned buffer layer.The material of patterning light shield layer can be resin (resin).In addition, chromatic filter layer is in the pixel region that is disposed at respectively on the substrate.Liquid crystal layer is to be arranged between array base palte and the colored filter.
The present invention earlier forms cushioned material layer on substrate before black matrix forms, therefore, after forming black matrix, and when removing the partial buffer material layer, can remove the residue that is positioned at black matrix edge simultaneously.Thus, when pixel region was inserted color pigment, color pigment can intactly fill up pixel region, and then improved the quality and the production acceptance rate of colored filter.On the other hand, the display panels of using this colored filter also has display quality preferably.
Describe the present invention below in conjunction with the drawings and specific embodiments, but not as a limitation of the invention.
Description of drawings
Figure 1A is that known black rectangular is formed in the synoptic diagram on the substrate;
Figure 1B is the synoptic diagram of the pixel of known colored filter;
Fig. 2 A is the making schematic flow sheet of the colored filter of first embodiment of the invention to Fig. 2 G;
Fig. 3 A is the making schematic flow sheet of the colored filter of second embodiment of the invention to Fig. 3 C;
Fig. 4 A is the making schematic flow sheet of the colored filter of second embodiment of the invention to Fig. 4 D;
Fig. 5 is the synoptic diagram of the colored filter of one embodiment of the invention;
Fig. 6 is the synoptic diagram of the display panels of one embodiment of the invention.
Wherein, Reference numeral:
110,210,510: substrate
122: residue
120: black matrix
130: color pigment
200,500: colored filter
220,320,420,520: cushioned material layer
232a, 532a: patterning light shield layer
232b, 332b, 432b, 532b: patterned buffer layer
232,332,432,532: separator
234,534: ink-repellent layer
240a: color pigment
240,540: chromatic filter layer
250: ink gun
260,560: shared electrode
S210, S410: upgrading is handled
S220: photoetching process
S310: upgrading is handled and dry etch process
600: display panels
P: pixel region
Embodiment
Because known color filter technology has the edge that residue is created in black matrix after forming black matrix, and influences the coating of follow-up color pigment, so the present invention's proposition formed a cushioned material layer earlier on substrate before forming black matrix.So, even can produce residue when black matrix forms, these residues also can be along with the partial buffer material layer is removed together in the subsequent technique flow process.Therefore, technology proposed by the invention can effectively overcome because of residue influences makes color pigment can't fill up the problem of pixel region, make colored filter have preferable quality and production acceptance rate, and further allow the display panels of using this colored filter have picture display quality than high-quality.Below will lift several color filter making method technology contents of the present invention will be described.
First embodiment, Fig. 2 A are the making schematic flow sheet of the colored filter of first embodiment of the invention to Fig. 2 G.At first please refer to Fig. 2 A, a substrate 210 is provided, the material of this substrate 210 for example is the substrate 210 of printing opacities such as glass, quartz or plastics.Then on substrate, form a cushioned material layer 220.In the present embodiment, the material of cushioned material layer 220 for example is a photosensitive material.Form a patterning light shield layer 232a then on cushioned material layer 220.Specifically, the method that forms patterning light shield layer 230a on cushioned material layer 220 comprises, form a light-shielding material layers (not shown) on cushioned material layer 220, again the light-shielding material layers (not shown) is carried out photoetching process, with patterning light-shielding material layers (not shown).In the present embodiment, the material of light-shielding material layers comprises resin, and it has usually that logical light rate is low, reflection coefficient is little and characteristics such as sensitization character.In addition, after photoetching process, can further carry out a prebake conditions technology, and the temperature of prebake conditions technology is about 90 degrees centigrade to 120 degrees centigrade to patterning light shield layer 232a.Like this, can be preliminary patterning light shield layer 232a be solidified.
Please refer to Fig. 2 B, then a upgrading treatment S 210 is carried out on the surface of patterning light shield layer 232a.In one embodiment, upgrading treatment S 210 can be that patterning light shield layer 230a is carried out the plasma modifying process.The plasma modifying process can be to use fluorine-containing plasma that the surface of patterning light shield layer 232a is handled, and makes the surface of patterning light shield layer 232a become ink-repellent layer 234 or the ink-resistant surface with ink-resistant characteristic.Producing the fluorine-containing employed gas of plasma, for example is carbon tetrafluoride (CF
4) or sulfur hexafluoride (SF
6).
In addition, except patterning light shield layer 232a is carried out the upgrading treatment S 210, also can be after forming patterning light shield layer 232a, form an ink-repellent layer 234 on patterning light shield layer 232a, ink-repellent layer 234 can only be positioned on the upper surface of patterning light shield layer 232a or be positioned at simultaneously on the upper surface and side surface of patterning light shield layer 232a, shown in Fig. 2 C.Has identical ink-resistant character at this ink-repellent layer of mentioning 234 with above-mentioned ink-resistant surface 234 of carrying out the upgrading processing.
Then the step of Fig. 2 B please refer to Fig. 2 D, is that mask carries out photoetching process S220 to cushioned material layer 220 with patterning light shield layer 232a, to form patterned buffer layer 232b, shown in Fig. 2 E.It should be noted that then light-shielding material layers should be selected negative photoresist for use if the material of cushioned material layer 220 is eurymeric photoresists.So, because the sensitization incompatibility of cushioned material layer 220 and light-shielding material layers, when light-shielding material layers was carried out photoetching process, cushioned material layer 220 can't because of exposure or not have exposure influenced.Same, if the material negative photoresist of cushioned material layer 220, light-shielding material layers then should be selected the eurymeric photoresist for use.
Please refer to Fig. 2 E, at this moment, patterning light shield layer 232a and patterned buffer layer 232b are common to form a separator 232, and separator 232 forms a plurality of pixel region P on substrate 210.Then, after photoetching process S220, can further be cured patterning light shield layer 232a and patterned buffer layer 232b.The mode of solidifying for example is to carry out a back baking process, and the temperature of back baking is about 200 degrees centigrade to 220 degrees centigrade.
Please refer to Fig. 2 F, after forming separator 232, in each pixel region P, form chromatic filter layer 240 respectively.Specifically, the mode that forms chromatic filter layer 240 for example be with ink gun 250 in the mode of spray printing in regular turn or simultaneously with the color pigment 240a spray printing of different colours such as red, green, blue in the pixel region P of correspondence.In addition, after forming chromatic filter layer 240, can further be cured color pigment 240a in regular turn or simultaneously, and make in the chromatic filter layer 240 contained a large amount of solvent evaporates.The temperature of its curing is about 200 degrees centigrade.
Please refer to Fig. 2 G, after chromatic filter layer 240 forms, can further form one and share electrode 260 on separator 232.Specifically, the material of shared electrode 260 can be indium tin oxide (ITO), indium-zinc oxide (IZO) or zinc oxide aluminum transparent conductive materials such as (ZAO), and it is by physical vapour deposition (PVD) (Physical Vapor Deposition) or the mode of sputter (Sputtering) is formed on the separator 232.So far, finish the making of colored filter 200 haply.Alternative is provided with insulation course or protective seam between shared electrode 260 and the chromatic filter layer 240, in order to the interface between planarization or homogenising shared electrode 260 and the chromatic filter layer 240 or satisfy other demand.
Second embodiment, Fig. 3 A are the making schematic flow sheet of the colored filter of second embodiment of the invention to Fig. 3 C.The present embodiment and first embodiment are similar, be different from the foregoing description be with photosensitive material as cushioned material layer, present embodiment is to adopt silicide as cushioned material layer.Present embodiment is only done explanation at the making step that forms separator, and all the other members are identical with first embodiment with label, no longer repeat at this.
At first please refer to Fig. 3 A, a substrate 210 is provided, then on substrate 210, form a cushioned material layer 320.Present embodiment is to adopt the material of silicide as cushioned material layer 320.Silicide can be silicon nitride, amorphous silicon or silicon dioxide.Form a patterning light shield layer 232a then on cushioned material layer 320.
Please refer to B, the surface of patterning light shield layer 232a is carried out-upgrading treatment S 310 according to Fig. 3.In one embodiment, upgrading treatment S 310 is that the patterning light shield layer is carried out the plasma modifying process.The plasma modifying process can be to use fluorine-containing plasma that the surface of patterning light shield layer is handled, and makes the surface of patterning light shield layer become the ink-resistant surface 234 with ink-resistant characteristic.And produce the employed gas of fluorine-containing plasma for example is carbon tetrafluoride (CF
4) or sulfur hexafluoride (SF
6).The ink-resistant film for example is fluorine-containing resin.
Specifically, because present embodiment adopts silicide to make cushioned material layer 320, produce the fluorine-containing employed gas of plasma and can chemical reaction take place with cushioned material layer 320, therefore fluorine-containing plasma can carry out dry-etching to cushioned material layer 320 patterning light shield layer 232a being carried out surface-treated simultaneously.That is to say that fluorine-containing plasma can serve as that the cover curtain removes partial buffer material layer 320 with patterning light shield layer 232a simultaneously, formation patterned buffer layer 332b when patterning light shield layer 232a being carried out the upgrading processing.At this moment, patterning light shield layer 232a and patterned buffer layer 332b are common to form a separator 332, and separator 332 forms a plurality of pixel region P on substrate 210, shown in Fig. 3 C.So, just can simplify processing step, and reduce cost of manufacture.
The 3rd embodiment, Fig. 4 A are the making schematic flow sheet of the colored filter of third embodiment of the invention to Fig. 4 C.Be different from the foregoing description and be with photosensitive material or silicide as cushioned material layer, present embodiment is to adopt transparent conductive material as cushioned material layer.Present embodiment only explains at the step that forms separator, and all the other members are identical with first embodiment with label, no longer repeat at this.
Please refer to Fig. 4 A, a substrate 210 is provided, then on substrate 210, form a cushioned material layer 420.Material in the cushioned material layer 420 that present embodiment adopted is a transparent conductive material.Transparent conductive material can be indium tin oxide, indium-zinc oxide or zinc oxide aluminum.On cushioned material layer 420, form patterning light shield layer 232a then.
Please then refer to Fig. 4 B, a upgrading treatment S 410 is carried out on the surface of patterning light shield layer 232a.In one embodiment, upgrading treatment S 410 can be that patterning light shield layer 232a is carried out the plasma modifying process.The plasma modifying process can be to use fluorine-containing plasma that the surface of patterning light shield layer 232a is handled, and makes the surface of patterning light shield layer 232a become the ink-repellent layer 234 with ink-resistant characteristic.And produce the employed gas of fluorine-containing plasma for example is carbon tetrafluoride (CF
4) or sulfur hexafluoride (SF
6).The ink-resistant film for example is fluorine-containing resin.
In addition, except patterning light shield layer 232a is carried out the upgrading treatment S 410, also can be after forming patterning light shield layer 232a, form an ink-repellent layer 234 on patterning light shield layer 232a, shown in Fig. 4 C, ink-repellent layer 234 can only be positioned on the upper surface of patterning light shield layer 232a or be positioned at simultaneously on the upper surface and side surface of patterning light shield layer 232a.Has identical ink-resistant character at this ink-repellent layer of mentioning 234 with above-mentioned ink-resistant surface 234 of carrying out upgrading treatment S 410.
Follow the step of Fig. 4 B; please refer to Fig. 4 D; with patterning light shield layer 232a is that mask carries out wet etch process to cushioned material layer 420, removes part and is not subjected to the cushioned material layer 420 that patterning light shield layer 432a protects, to form patterned buffer layer 432b.In one embodiment, wet etch process can be to use oxalic acid as etching solution, and the technological temperature that it adopted is about 25 degrees centigrade.In addition, before patterning cushioned material layer 420, can further be cured patterning light shield layer 232a and cushioned material layer 432b.At this moment, patterning light shield layer 232a and patterned buffer layer 432b form separator 432 jointly, and separator 432 forms a plurality of pixel region P on substrate 210.
Above-mentioned three embodiment adopt photosensitive material, silicide and transparent conductive material to make cushioned material layer respectively, the residue that all can be effectively will remain in black matrix edge together by the step of patterning cushioned material layer removes, and can't fill up the problem of pixel region to avoid color pigment.
Fig. 5 is the synoptic diagram of the colored filter of one embodiment of the invention.Colored filter 500 comprises substrate 510, separator 532 and chromatic filter layer 540.Separator 532 is disposed on the substrate 510, and defines a plurality of pixel region P on substrate 510.Separator 532 comprises patterned buffer layer 532b and patterning light shield layer 532a.Patterning light shield layer 532a is disposed on the patterned buffer layer 532b, and the material of patterning light shield layer 532a can be a resin.540 of chromatic filter layers are in the pixel region P that is disposed on the substrate 510.The colored filter 500 of present embodiment for example is to adopt the described method of above-mentioned a plurality of embodiment to make, or can adjust the material and the processing step thereof of patterned buffer layer according to actual state, and the present invention does not do qualification to it.It is all that to form cushion earlier before forming black matrix all be protection domain of the presently claimed invention with the production method of avoiding the residue problem.
Fig. 6 is the synoptic diagram of the display panels of one embodiment of the invention.Please refer to Fig. 6, display panels 600 comprises array base palte 610, colored filter 620 and liquid crystal layer 630.Colored filter 620 and the configuration of array base palte 610 subtends, liquid crystal layer 630 then is disposed between array base palte 610 and the colored filter 620.The colored filter 620 that adopt in this place can be the above-mentioned or disclosed colored filter of other embodiment of the present invention.Use above-mentioned colored filter and preparation method thereof, this display panels 600 can have preferable image displaying quality.
In sum, the present invention is mainly before forming the patterning light shield layer, on substrate, form a cushioned material layer earlier, and after the patterning light shield layer forms, the mode of utilizing etching or photoetching removes the cushioned material layer of pixel region with the residue that may form, known incident residue can not residued on the substrate.Therefore, after handling, can effectively overcome the problem that color pigment can't fill up pixel region, further promote the quality and the production acceptance rate of colored filter through follow-up upgrading.In addition, the display panels of using colored filter of the present invention also has good display quality.
Certainly; the present invention also can have other various embodiments; under the situation that does not deviate from spirit of the present invention and essence thereof; those of ordinary skill in the art can make various corresponding changes and distortion according to the present invention, but these corresponding changes and distortion all should belong to the protection domain of the appended claim of the present invention.
Claims (20)
1, a kind of colored filter is characterized in that, comprising:
One substrate;
One separator is disposed on this substrate, and to form a plurality of pixel regions on this substrate, wherein this separator comprises:
One patterned buffer layer;
One patterning light shield layer is disposed on this patterned buffer layer, and wherein the material of this patterning light shield layer comprises a resin; And
A plurality of chromatic filter layers are disposed at respectively in these pixel regions on this substrate.
2, colored filter according to claim 1 is characterized in that, also comprises an ink-repellent layer, is formed on the surface of this separator.
3, colored filter according to claim 1 is characterized in that, the material of this patterned buffer layer comprises photosensitive material, silicide, transparent conductive material or combinations thereof.
4, colored filter according to claim 1 is characterized in that, the material of this patterned buffer layer comprises an eurymeric photoresist, and this resin comprises a negative photoresist.
5, colored filter according to claim 1 is characterized in that, the material of this patterned buffer layer comprises a negative photoresist, and this resin comprises an eurymeric photoresist.
6, colored filter according to claim 1 is characterized in that, comprises that also a shared electrode is formed on this separator.
7, a kind of color filter making method is characterized in that, comprising:
One substrate is provided;
Form a cushioned material layer on this substrate;
Form a patterning light shield layer on this cushioned material layer;
With this patterning light shield layer is that mask comes this cushioned material layer of patterning to form a patterned buffer layer, make this patterning light shield layer and this patterned buffer layer form a separator jointly, and this separator forms a plurality of pixel regions on this substrate; And
Form a chromatic filter layer respectively in each pixel region.
8, color filter making method according to claim 7 is characterized in that, also is included in to form after this patterning light shield layer, forms an ink-repellent layer on this patterning light shield layer.
9, color filter making method according to claim 7 is characterized in that, comprises that also a upgrading is carried out on the surface of this light-shielding material layers to be handled, and wherein this upgrading is handled and comprised and carry out a plasma modifying process.
10, color filter making method according to claim 9 is characterized in that, when carrying out this plasma modifying process, also comprises this cushioned material layer of patterning simultaneously.
11, color filter making method according to claim 7 is characterized in that, forms the method for this patterning light shield layer on this cushioned material layer and comprises:
Form a light-shielding material layers on this cushioned material layer, wherein the material of this light-shielding material layers comprises a resin; And
This light-shielding material layers is carried out a photolithography process, with this light-shielding material layers of patterning.
12, color filter making method according to claim 11 is characterized in that, also is included in after this photoetching process, and this patterning light shield layer is carried out a prebake conditions technology, and wherein the temperature of this prebake conditions technology is about 90 degrees centigrade to 120 degrees centigrade.
13, color filter making method according to claim 7 is characterized in that, it is that mask comes this cushioned material layer is carried out a photolithography process that the method for this cushioned material layer of patterning comprises with this patterning light shield layer.
14, color filter making method according to claim 13 is characterized in that, also is included in after this photoetching process, and before forming these chromatic filter layers, solidifies this patterning light shield layer and this patterned buffer layer.
15, color filter making method according to claim 13, it is characterized in that, also be included in after this photoetching process, and before forming these chromatic filter layers, this patterning light shield layer is carried out a back baking process, and wherein the temperature of this back baking process is about 200 degrees centigrade to 220 degrees centigrade.
16, color filter making method according to claim 7 is characterized in that, the method for this cushioned material layer of patterning comprises carries out a dry etch process or a wet etch process to this cushioned material layer.
17, color filter making method according to claim 16 is characterized in that, also is included in before this cushioned material layer of patterning, solidifies this patterning light shield layer and this cushioned material layer.
18, color filter making method according to claim 7 is characterized in that, the method that forms these chromatic filter layers comprises carries out an ink-jetting process, to insert a color pigment respectively in each pixel region.
19, color filter making method according to claim 18 is characterized in that, also comprises solidifying this color pigment, and wherein the temperature of this this color pigment of curing is about 200 degrees centigrade.
20, color filter making method according to claim 7 is characterized in that, comprises that also forming one shares electrode on this separator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200710128493 CN101082729A (en) | 2007-07-26 | 2007-07-26 | Liquid crystal display board, colorful color filter and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200710128493 CN101082729A (en) | 2007-07-26 | 2007-07-26 | Liquid crystal display board, colorful color filter and manufacturing method thereof |
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| Publication Number | Publication Date |
|---|---|
| CN101082729A true CN101082729A (en) | 2007-12-05 |
Family
ID=38912371
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|---|---|---|---|
| CN 200710128493 Pending CN101082729A (en) | 2007-07-26 | 2007-07-26 | Liquid crystal display board, colorful color filter and manufacturing method thereof |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102736310A (en) * | 2012-05-30 | 2012-10-17 | 深圳市华星光电技术有限公司 | Method for manufacturing color filter |
| WO2012145940A1 (en) * | 2011-04-28 | 2012-11-01 | 深圳市华星光电技术有限公司 | Method of manufacturing filter |
-
2007
- 2007-07-26 CN CN 200710128493 patent/CN101082729A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012145940A1 (en) * | 2011-04-28 | 2012-11-01 | 深圳市华星光电技术有限公司 | Method of manufacturing filter |
| CN102959433A (en) * | 2011-04-28 | 2013-03-06 | 深圳市华星光电技术有限公司 | Method of manufacturing filter |
| US8715773B2 (en) | 2011-04-28 | 2014-05-06 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Method of making a filter |
| CN102959433B (en) * | 2011-04-28 | 2015-01-21 | 深圳市华星光电技术有限公司 | Method of manufacturing filter |
| CN102736310A (en) * | 2012-05-30 | 2012-10-17 | 深圳市华星光电技术有限公司 | Method for manufacturing color filter |
| WO2013177821A1 (en) * | 2012-05-30 | 2013-12-05 | 深圳市华星光电技术有限公司 | Method for manufacturing color filter |
| CN102736310B (en) * | 2012-05-30 | 2015-04-22 | 深圳市华星光电技术有限公司 | Method for manufacturing color filter |
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