CN101072894A - Method for deposition of metal layers from metal carbonyl precursors - Google Patents

Method for deposition of metal layers from metal carbonyl precursors Download PDF

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CN101072894A
CN101072894A CNA2005800401010A CN200580040101A CN101072894A CN 101072894 A CN101072894 A CN 101072894A CN A2005800401010 A CNA2005800401010 A CN A2005800401010A CN 200580040101 A CN200580040101 A CN 200580040101A CN 101072894 A CN101072894 A CN 101072894A
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gas
metal
substrate
carbonyl
treatment chamber
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CN101072894B (en
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铃木健二
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Tokyo Electron Ltd
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76841—Barrier, adhesion or liner layers
    • H01L21/76843—Barrier, adhesion or liner layers formed in openings in a dielectric
    • H01L21/76846—Layer combinations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/16—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal carbonyl compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
    • H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table
    • H01L21/28556—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table by chemical means, e.g. CVD, LPCVD, PECVD, laser CVD

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Abstract

A method and a deposition system for increasing deposition rates of metal layers from metal-carbonyl precursors using CO gas and a dilution gas. The method includes providing a substrate in a process chamber of a processing system, forming a process gas containing a metal-carbonyl precursor vapor and a CO gas, diluting the process gas in the process chamber, and exposing the substrate to the diluted process gas to deposit a metal layer on the substrate by a thermal chemical vapor deposition process. The deposition system contains a substrate holder configured for supporting and heating a substrate in a process chamber having a vapor distribution system, a precursor delivery system configured for forming a process gas containing a metal-carbonyl precursor vapor and a CO gas and for introducing the process gas to the vapor distribution system, a dilution gas source configured for adding a dilution gas to the process gas in the process chamber, and a controller configured for controlling the deposition system during exposure of the substrate to the diluted process gas to deposit a metal layer on the substrate by a thermal chemical vapor deposition process.

Description

Be used to utilize the method for metal-carbonyl precursor depositing metal layers
The cross reference of related application
The present invention and the U.S. Patent application No.10/996 that is entitled as " METHOD FOR INCREASINGDEPOSITION RATES OF METAL LAYERS FROM METAL-CARBONYLPRECURSORS " that submits on the same day with the present invention, 145 is relevant, and the full content of this application is incorporated herein by reference.Related application is not owned together.
Technical field
The present invention relates to semiconductor processes, more specifically, relate to the method and the depositing system that are used to increase by the speed of metal-carbonyl precursor depositing metal layers.
Background technology
Copper (Cu) metal is incorporated into the multiple-layer metallization scheme that is used for making unicircuit may uses barriers/liners, with the adhesion and the growth that promote the Cu layer and prevent that Cu is diffused in the dielectric materials.The barriers/liners that deposits on the dielectric materials can comprise refractive material, for example tungsten (W), molybdenum (Mo) and tantalum (Ta), and its right and wrong are reactive and immiscible with Cu, and low-resistivity can be provided.The current Integrated Solution of integrated Cu metallization and dielectric materials may require to carry out the barrier/liner depositing treatment under the underlayer temperature of (or lower) between about 400 ℃ and about 500 ℃.
For example, be used to be less than or equal to the current employing low-k of Cu Integrated Solution (low k) interlayer dielectric of the technology node of 130nm, then being physical vapor deposition (PVD) Ta layer or TaN/Ta blocking layer, then is that PVD Cu crystal seed layer and electrochemical deposition (ECD) Cu fills.In general, selecting the Ta layer is owing to its adhesive properties (that is, can stick to the ability on the low-k film), and selecting the Ta/TaN layer generally is because its barrier properties (that is, can prevent that Cu is diffused into the ability in the low-k film).
As mentioned above, carried out significant effort and studied and realize approaching transition metal layer as the Cu diffusion impervious layer, these researchs comprise the material such as chromium, tantalum, molybdenum and tungsten.In these materials each all shows the low compatibility with Cu.Recently, other materials, for example ruthenium (Ru) and rhodium (Rh) have been identified as the potential blocking layer, because people expect that its performance classes is similar to traditional refractory metal.Yet the use of Ru or Rh can allow only to use one deck blocking layer, rather than two-layer (for example Ta/TaN).This result is because the adhesion and the barrier properties of these materials cause.For example, a Ru layer can substitute the Ta/TaN blocking layer.And the current Ru layer that studies show that can also substitute the Cu crystal seed layer, and piece Cu weighting material can directly carry out after the Ru deposition.This result is because good adhesion between Cu and the Ru layer.
Traditionally, the Ru layer can form by the contain ruthenium presoma of thermolysis such as ruthenium-carbonyl precursor in thermal chemical vapor deposition (TCVD) technology.When underlayer temperature is reduced to when being lower than about 400 ℃, by metal-carbonyl precursor (Ru for example 3(CO) 12) the material properties of Ru layer of thermal decomposed deposition may worsen.As a result, the bonded result of CO byproduct of reaction in the Ru layer that the configuration of surface (for example, the formation of tuberculosis) of the increase of the resistivity of Ru layer and difference has been considered to increase in heat deposition under the low deposition temperature.These two kinds of effects can by be lower than under about 400 ℃ underlayer temperature from the thermolysis desorption CO speed of ruthenium-carbonyl precursor reduce explain.
In addition, the use of the metallic carbonyls such as ruthenium or rhenium carbonyl may cause low deposition rate, and this is because its low-steam pressure and transport issues associated therewith.Generally speaking, the contriver observes, and current depositing system speed is very low, thereby makes that the deposition of this metallic membrane is not too practical.
Summary of the invention
The invention provides a kind of method and depositing system that is used to increase by the speed of metal-carbonyl precursor depositing metal layers.The vaporization temperature that embodiments of the invention allow to increase the containing metal presoma to be increasing the vapour pressure of metal-carbonyl precursor, thus be strengthened to treatment chamber metal-carbonyl precursor vapor transmission and increase the sedimentation rate of metal on the substrate.According to embodiments of the invention, before substrate is exposed to metallic carbonyls steam, CO gas is mixed with metal-carbonyl precursor vapor to reduce the premature decomposition of metal-carbonyl precursor vapor.In addition, in treatment chamber, add diluent gas with control and reduce the dividing potential drop of by product and CO gas in the treatment chamber to handling gas.
Thereby, this method is included in the treatment chamber of depositing system substrate is provided, formation comprises the processing gas of metal-carbonyl precursor vapor and CO gas, to handle gas and introduce treatment chamber, in treatment chamber, add diluent gas forming diluted processing gas, and substrate is exposed to diluted processing gas with by thermal chemical vapor deposition process depositing metal layers on substrate to handling gas.
Embodiments of the invention comprise having formula M x(CO) yVarious metal-carbonyl precursor.Metallic carbonyls includes but not limited to W (CO) 6, Ni (CO) 4, Mo (CO) 6, Co 2(CO) 8, Rh 4(CO) 12, Re 2(CO) 10, Cr (CO) 6, Ru 3(CO) 12, and Os 3(CO) 12
According to embodiments of the invention, a kind of method that is used for deposition Ru metal level on patterned substrate is provided, comprise: provide patterned substrate in the treatment chamber of depositing system, wherein " patterning " refers to comprise the substrate of one or more via holes or groove or its combination; Utilize Ru 3(CO) 12Precursor vapor and CO gas form handles gas; To handle gas and introduce treatment chamber; Add diluent gas to form diluted processing gas to handling gas; And patterned substrate is exposed to diluted processing gas to deposit the Ru metal level by thermal chemical vapor deposition process on patterned substrate.
According to embodiments of the invention, provide a kind of depositing system that is used for depositing metal layers on substrate.This depositing system comprises substrate holder, precursor delivery system, source of diluent gas and controller, wherein substrate holder is arranged in having the treatment chamber of steam distributing system and supports and heated substrate, precursor delivery system is arranged to and forms the processing gas that comprises metal-carbonyl precursor vapor and CO gas and will handle gas introducing steam distributing system, source of diluent gas is arranged in treatment chamber adds diluent gas to handling gas, controller be arranged to substrate is exposed to diluted processing gas with by thermal chemical vapor deposition process during depositing metal layers on the substrate, control depositing system.
Description of drawings
In the accompanying drawings:
Fig. 1 shows the synoptic diagram according to the depositing system of the embodiment of the invention;
Fig. 2 shows the synoptic diagram of depositing system according to another embodiment of the present invention;
Fig. 3 illustrates the method for depositing metal layers on substrate according to the embodiment of the invention; And
Fig. 4 A-4C schematically shows the formation according to metal level on the patterned substrate of the embodiment of the invention.
Embodiment
In the following description, for help complete understanding of the present invention and for explanation unrestricted purpose, provided detail, for example the description of the geometry in particular of depositing system and various assemblies.Yet, should be appreciated that in other embodiment that break away from these details and also can implement the present invention.
With reference now to accompanying drawing,, label similar in the accompanying drawing is in identical or corresponding part of institute's drawings attached middle finger generation, and Fig. 1 illustrates the depositing system 1 that is used to utilize metal-carbonyl precursor depositing metal layers on substrate according to an embodiment.Depositing system 1 comprises the treatment chamber 10 with substrate holder 20, and substrate holder 20 is configured to support the substrate 25 that forms metal level thereon.Treatment chamber 10 is coupled to metal precursor evaporation system 50 via vapor precursor delivery system 40.
Treatment chamber 10 also is coupled to vacuum pump system 38 by conduit 36, and wherein pump system 38 is configured to treatment chamber 10, vapor precursor delivery system 40 and metal precursor evaporation system 50 are evacuated to the pressure that is suitable for forming metal level on substrate 25 and is suitable for the evaporation of metal-carbonyl precursor 52 in the metal precursor evaporation system 50.
Still with reference to figure 1, metal precursor evaporation system 50 is configured to store metal-carbonyl precursor 52, and metal-carbonyl precursor 52 is heated to the temperature that is enough to make metal-carbonyl precursor 52 evaporations, simultaneously metal-carbonyl precursor vapor is incorporated into vapor precursor delivery system 40.Metal-carbonyl precursor 52 can be a solid under selected heating condition in metal precursor evaporation system 50.Perhaps, metal-carbonyl precursor 52 can be a liquid.Below, although used solid metal-carbonyl precursor 52 to be described, one of skill in the art will appreciate that also can use under selected heating condition, to be liquid metal-carbonyl precursor, and do not depart from the scope of the present invention.For example, metal-carbonyl precursor can have formula M x(CO) y, and can comprise tungsten carbonyl, molybdenum carbonyl, cobalt-carbonyl, rhodium carbonyl, rhenium carbonyl, chromium carbonyl or osmium carbonyl or wherein both combinations.These metallic carbonylss include but not limited to W (CO) 6, Ni (CO) 4, Mo (CO) 6, Co 2(CO) 8, Rh 4(CO) 12, Re 2(CO) 10, Cr (CO) 6, Ru 3(CO) 12, or Os 3(CO) 12Or wherein both or more persons' combination.
In order to obtain to be used to make the preferred temperature of metal-carbonyl precursor 52 evaporations (or making solid metal-carbonyl precursor 52 distillations), metal precursor evaporation system 50 is coupled to the vaporization temperature Controlling System 54 that is configured to control vaporization temperature.For example, the temperature of metal-carbonyl precursor 52 generally is lifted to about 40-45 ℃ in legacy system, so that ruthenium Ru 3(CO) 12Distillation.Under this temperature, Ru 3(CO) 12Vapor pressure ranges for example from about 1 to about 3mTorr.Cause evaporation (or distillation) along with metal-carbonyl precursor is heated to, carrier gas can be transmitted through metal-carbonyl precursor 52 tops, perhaps passes metal-carbonyl precursor 52, perhaps its arbitrary combination.Carrier gas can for example comprise such as rare gas element of rare gas (that is, He, Ne, Ar, Kr or Xe) and so on or wherein both or more persons' combination.Perhaps, other embodiment expect and have omitted carrier gas.
According to embodiments of the invention, CO gas can be added to carrier gas.Perhaps, other embodiment expect with the carrier gas of CO gas instead.For example, gas supply system 60 is coupled to metal precursor evaporation system 50, and it for example is configured to provide carrier gas, CO gas or its mixture via feed line 61 below metal-carbonyl precursor 52, or provides carrier gas, CO gas or its mixture via feed line 62 above metal-carbonyl precursor 52.In addition (or or), gas supply system 60 is coupled to the vapor precursor delivery system 40 in metal precursor evaporation system 50 downstreams, provides gas via feed line 63 to the steam of metal-carbonyl precursor 52 when entering vapor precursor delivery system 40 with the steam in metal-carbonyl precursor 52 or after entering.Although not shown, gas supply system 60 can comprise carrier gas source, CO gas source, one or more control valve, one or more strainer and mass flow controller.For example, the flow rate of carrier gas can be between about 0.1 per minute standard cubic centimeter (sccm) and about 1000sccm.Perhaps, the flow rate of carrier gas can be between about 10sccm and about 500sccm.Perhaps, the flow rate of carrier gas can be between about 50sccm and about 200sccm.According to embodiments of the invention, the flow rate range of CO gas can be from about 0.1sccm to about 1000sccm.Perhaps, the flow rate of CO gas can be between about 1sccm and about 100sccm.
In metal precursor evaporation system 50 downstreams, the processing gas stream that comprises metal-carbonyl precursor vapor enters treatment chamber 10 up to it via the steam distributing system 30 that is coupled to treatment chamber 10 through vapor precursor delivery system 40.Vapor precursor delivery system 40 can be coupled to vapor line temperature Controlling System 42, to control vapor line temperature and to prevent the decomposition of metal-carbonyl precursor and the condensation of metal-carbonyl precursor vapor.
Refer again to Fig. 1, the steam distributing system 30 that forms the part of treatment chamber 10 and be coupled to treatment chamber 10 comprises vapor distribution space 32, and steam is through steam-distribution plate 34 and dispersion vapor distribution space 32 in before entering treatment zone 33 above the substrate 25.In addition, steam-distribution plate 34 can be coupled to the distribution plate temperature controlling system 35 of the temperature that is configured to control steam-distribution plate 34.
According to embodiments of the invention, source of diluent gas 37 is coupled to treatment chamber 10, and is configured to add diluent gas comprises metal-carbonyl precursor vapor and CO gas with dilution processing gas.As shown in Figure 1, source of diluent gas 37 can be coupled to steam distributing system 30 via feed line 37a, and is configured to add diluent gas to handling gas in vapor distribution space 32 before processing gas enters treatment zone 33 through steam-distribution plate 34.Perhaps, source of diluent gas 37 can be coupled to treatment chamber 10 via feed line 37b, and is configured to add diluent gas to handling gas in the treatment zone 33 above substrate 25 after handling gas process steam-distribution plate 34.Or source of diluent gas 37 can be coupled to steam distributing system 30 via feed line 37c, and is configured to add diluent gas to handling gas in distribution plate 34.As skilled in the art will be aware of, diluent gas can be added to processing gas in any other position in steam distributing system 30 and treatment chamber 10, and does not depart from the scope of the present invention.
In case comprise the treatment zone 33 that the processing gas of metal-carbonyl precursor vapor has entered treatment chamber 10, thermolysis takes place in the temperature that metal-carbonyl precursor vapor will raise owing to substrate 25 when being adsorbed on substrate surface, and forms metallic membrane on substrate 25.Substrate holder 20 is configured to utilize the temperature of the substrate temperature control system 22 rising substrates 25 that are coupled to substrate holder 20.For example, substrate temperature control system 22 can be configured to the temperature of substrate 25 is risen to up to about 500 ℃.In addition, treatment chamber 10 can be coupled to the room temperature Controlling System 12 of the temperature that is configured to control locular wall.
For example, as mentioned above, legacy system is considered for Ru 3(CO) 12, metal precursor evaporation system 50 and vapor precursor delivery system 40 are operated in the temperature range that is about 40 ℃-45 ℃, with the decomposition that prevents to take place under comparatively high temps.For example, Ru 3(CO) 12Can under comparatively high temps, decompose to form by product, for example those shown in the following formula:
Ru 3(CO) 12(ad)  Ru 3(CO) x(ad)+(12-x) CO (g) (1) or
Ru 3(CO) x(ad)3Ru(s)+xCO(g) (2)
Wherein these by products can adsorb (ad), promptly are condensate on the internal surface of depositing system 1.Material can cause the problem such as process repeatability between substrate and the substrate in these lip-deep accumulations.Perhaps, for example, Ru 3(CO) 12Can condensation on the internal surface of depositing system 1, promptly
Ru 3(CO) 12(g)Ru 3(CO) 12(ad) (3)
Generally speaking, some metal-carbonyl precursor (for example, Ru 3(CO) 12) low-steam pressure and the small process window sedimentation rate that causes low-down metal level on substrate 25.
The related U.S. patent application No.10/996 that is entitled as " METHOD FOR INCREASINGDEPOSITION RATES OF METAL LAYERS FROM METAL-CARBONYLPRECURSORS " that submits on the same day with the present invention, 145 contriver (these contrivers comprise the present inventor) recognizes, adds the problems referred to above that CO gas can alleviate the transmission of the metal-carbonyl precursor that has limited substrate to metal-carbonyl precursor vapor.Thereby, according to embodiments of the invention, CO gas is added to metal-carbonyl precursor vapor, reducing the disassociation of metal-carbonyl precursor vapor in the gas tube, thereby make balance in the equation (1) be moved to the left and reduce the premature decomposition of the metal-carbonyl precursor in vapor precursor delivery system 40 before metal-carbonyl precursor is transferred to treatment chamber 10.The contriver believes, adds CO gas to metal-carbonyl precursor vapor and allows vaporization temperature is increased to about 150 ℃ (or higher) from about 40 ℃.The rising of temperature has increased the vapour pressure of metal-carbonyl precursor, causes the transmission of the metal-carbonyl precursor of treatment chamber to strengthen, thereby has increased the sedimentation rate of metal on the substrate 25.In addition, the contriver visually observes, and the mixture flow that makes Ar and CO gas is through the metal-carbonyl precursor top or pass the premature decomposition that metal-carbonyl precursor has reduced metal-carbonyl precursor.
According to embodiments of the invention, to Ru 3(CO) 12Precursor vapor is added CO gas and is allowed Ru 3(CO) 12The presoma vaporization temperature maintain from about 40 ℃ in about 150 ℃ scope.Perhaps, vaporization temperature can be maintained at about 60 ℃ in about 90 ℃ scope.
Subsequent metal deposition on the thermolysis of metal-carbonyl precursor and the substrate 25 is considered to mainly to be the cancellation by CO and to carry out from the desorption of the CO by product of substrate 25.The combination of CO by product may come from the incomplete removal from metal level of the incomplete decomposing, CO by product of metal-carbonyl precursor in the metal level between depositional stage, and the again absorption of CO by product on from treatment chamber 10 to metal level.
The contriver believes, the combination of CO causes occurring in the metal level surface irregularity of tuberculosis (nodule) form in the metal level between depositional stage, and the growth of tuberculosis is attached to more in the metal level along with the CO by product and is strengthened.The number of tuberculosis is considered to increase along with the increase of metal layer thickness.In addition, the combination of CO by product has increased the resistivity of metal level in metal level.
The combination of CO by product can alleviate by (1) reduction processing pressure and (2) increase underlayer temperature in the metal level.The inventor has recognized that, the problems referred to above can also be by adding diluent gas to the processing gas that comprises metal-carbonyl precursor vapor and CO gas in treatment chamber 10, with control and reduce that the dividing potential drop of by product and CO gas alleviates in the treatment chamber.Thereby, according to embodiments of the invention, be added to processing gas from the diluent gas of source of diluent gas 37, with control and reduce the dividing potential drop of CO by product on the metal level and treatment chamber 10 in the dividing potential drop of CO, thereby form level and smooth metal level.Diluent gas can for example comprise such as rare gas element of rare gas (that is, He, Ne, Ar, Kr or Xe) and so on or both or more persons' mixture wherein.Diluent gas also can comprise reducing gas to improve the material properties of metal level, for example resistivity.Reducing gas can for example comprise H 2, silicon-containing gas (for example, SiH 4, Si 2H 6Or SiCl 2H 2), boron-containing gas (BH 3, B 2H 6Or B 3H 9) or nitrogenous gas (for example, NH 3).According to embodiments of the invention, chamber pressure can be between about 0.1mTorr and about 200mTorr.Perhaps, chamber pressure can be between about 1mTorr and about 100mTorr.Or chamber pressure can be between about 2mTorr and about 50mTorr.
Owing to add the thermostability that CO gas has increased metal-carbonyl precursor vapor, therefore handle metal-carbonyl precursor vapor in the gas relative concentration of CO gas be can be used for being controlled under a certain underlayer temperature rate of decomposition of metal-carbonyl precursor on the substrate 25 to metal-carbonyl precursor vapor.In addition, underlayer temperature can be used for controlling the rate of decomposition (thereby control sedimentation rate) of metal on the substrate 25.As skilled in the art will be aware of, the amount of CO gas and underlayer temperature can be easy to change, with expectation vaporization temperature that realizes metal-carbonyl precursor and the expectation sedimentation rate that realizes metal-carbonyl precursor on the substrate 25.
In addition, the amount of CO gas can be selected such that metal-carbonyl precursor occurs under the kinetic-limited temperature regime in the metal deposition on the substrate 25 in the processing gas.For example, handling in the gas amount of CO gas can be increased up to observing under kinetic-limited temperature regime metal deposition process takes place.Kinetic-limited temperature regime refers to that the sedimentation rate of chemical vapor deposition method is subject to the scope of dynamic (dynamical) mode of deposition of substrate surface place chemical reaction, generally is characterized in that the strong correlation of sedimentation rate to temperature.Different with kinetic-limited temperature regime, the mass transport restriction scheme is observed under higher underlayer temperature usually, and comprises that sedimentation rate is subject to the mode of deposition scope of flux of the chemical reactant of substrate surface.The mass transport restriction scheme is characterised in that the strong correlation of sedimentation rate to the metal-carbonyl precursor flow rate, and irrelevant with depositing temperature.Metal deposition in the kinetic-limited regime causes metal level excellent step spreadability and good conformality on patterned substrate usually.Conformality is generally defined as the thick of the thinnest part of metal level on the sidewall of feature on the patterned substrate divided by metal level on the sidewall.Step coverage is generally defined as sidewall spreadability (metal layer thickness on the sidewall is divided by the metal layer thickness away from feature) divided by bottom spreadability (metal layer thickness on the feature bottom is divided by the metal layer thickness away from feature).
Still with reference to figure 1, depositing system 1 also can comprise the Controlling System 80 of the operation that is configured to move and control depositing system 1.Controlling System 80 is coupled to treatment chamber 10, substrate holder 20, substrate temperature control system 22, room temperature Controlling System 12, steam distributing system 30, vapor precursor delivery system 40, metal precursor evaporation system 50, source of diluent gas 37 and gas supply system 60.
In another embodiment, Fig. 2 illustrates the depositing system 100 that is used for the metallic membrane of deposition such as ruthenium (Ru) on substrate.Depositing system 100 comprises the treatment chamber with substrate holder 120, and substrate holder 120 is configured to support the substrate 125 that forms metal level thereon.Treatment chamber 110 is coupled to precursor delivery system 105, and precursor delivery system system 105 has the vapor precursor delivery system 140 that is configured to the metal precursor evaporation system of storing metal-carbonyl precursor 152 and making its evaporation 150 and is configured to metal-carbonyl precursor 152 is transported to treatment chamber 110.
Treatment chamber 110 comprises upper chamber portion 111, bottom section 112 and exhaust chest 113.Opening 114 is formed in the bottom section 112, and bottom 112 is coupled at this and exhaust chest 113.
Still with reference to figure 2, substrate holder 120 provides support the horizontal surface of pending substrate (or wafer) 125.Substrate holder 120 can be supported by cylindrical support member 122, and bracing member 122 extends upward from the bottom of exhaust chest 113.In addition, substrate holder 120 comprises the well heater 126 that is coupled to substrate holder temperature controlling system 128.Well heater 126 can for example comprise one or more resistance heating elements.Perhaps, well heater 126 can for example comprise radiation heating system, for example tungsten-halogen lamp.Substrate holder temperature controlling system 128 can comprise be used for to one or more heating units provide power power source, be used to measure underlayer temperature or substrate holder temperature or the two one or more temperature sensors and be configured to execution monitoring, adjusting or the controller of at least a operation of the temperature of control substrate or substrate holder.
During handling, heated substrate 125 can the thermolysis metal-carbonyl precursor vapor, thus on substrate 125 depositing metal layers.According to an embodiment, metal-carbonyl precursor 152 can be ruthenium-carbonyl precursor, for example Ru 3(CO) 12The technician in thermal chemical vapor deposition field will recognize, also can use other ruthenium-carbonyl precursor, and not depart from the scope of the present invention.Substrate holder 120 is heated to a certain predetermined temperature, this temperature be suitable for will the expectation the Ru metal level or other layer metal depositions to substrate 125.In addition, the well heater (not shown) that is coupled to room temperature Controlling System 121 can be embedded in the wall of treatment chamber 110 so that locular wall is heated to preset temperature.Well heater the wall temperature of treatment chamber 110 can be maintained from about 40 ℃ in about 150 ℃ scope, perhaps from about 40 ℃ in about 80 ℃ scope.The pressure warning unit (not shown) is used to measure chamber pressure.According to embodiments of the invention, chamber pressure can be between about 0.1mTorr and about 200mTorr.Perhaps, chamber pressure can be between about 1mTorr and about 100mTorr.Or chamber pressure can be between about 2mTorr and about 50mTorr.
As shown in Figure 2, steam distributing system 130 is coupled to the upper chamber portion 111 of treatment chamber 110.Steam distributing system 130 comprises steam-distribution plate 131, and steam-distribution plate 131 is configured to precursor vapor is incorporated into through one or more holes 134 from vapor distribution space 132 treatment zone 133 of substrate 125 tops.
According to embodiments of the invention, source of diluent gas 137 is coupled to treatment chamber 110, and is configured to utilize feed line 137a, 137b and/or 137c, valve 197, one or more strainer (not shown) and mass flow controller (not shown) to add diluent gas comprises metal-carbonyl precursor vapor and CO gas with dilution processing gas.As shown in Figure 1, source of diluent gas 137 can be coupled to the steam distributing system 130 of treatment chamber 110, and be configured to add diluent gas to handling gas via feed line 137a in vapor distribution space 132 enter treatment zone 133 above the substrate 125 through steam-distribution plate 131 before handling gas, perhaps source of diluent gas 137 can be configured to add diluent gas in steam-distribution plate 131 inside to handling gas via feed line 137c.Perhaps, source of diluent gas 137 can be coupled to treatment chamber 110, and is configured to handling gas through adding diluent gas to handling gas via feed line 137b in treatment zone 133 after the steam-distribution plate 131.As skilled in the art will be aware of, diluent gas can be added to processing gas in any other position in treatment chamber 10, and does not depart from the scope of the present invention.
In addition, in upper chamber portion 111, provide opening 135, be used for the metal-carbonyl precursor vapor from vapor precursor delivery system 140 is incorporated into vapor distribution space 132.And, temperature control component 136 is provided, for example be configured to make be cooled or the concentric fluid channel of heating fluid mobile, it is used to control the temperature of steam distributing system 130, thereby prevents the decomposition or the condensation of metal-carbonyl precursor in the steam distributing system 130.For example, the fluid such as water can be offered the fluid channel from steam distribution temperature controlling system 138.Steam distribution temperature controlling system 138 can comprise fluid source, heat exchanger, be used to measure fluid temperature (F.T.) or steam distribution plate temperature or the two one or more temperature sensors and be configured to temperature with steam-distribution plate 131 be controlled at from about 20 ℃ to about 150 ℃ controller.
As shown in Figure 2, metal precursor evaporation system 150 is configured to preserve metal-carbonyl precursor 152 and the temperature by the rising metal-carbonyl precursor makes metal-carbonyl precursor 152 evaporations (or distillation).Precursor heater 154 is provided for heating metal-carbonyl precursor 152 with under the temperature that metal-carbonyl precursor 152 is maintained the expectation vapour pressure that produces metal-carbonyl precursor 152.Precursor heater 154 is coupled to the vaporization temperature Controlling System 156 of the temperature that is configured to control metal-carbonyl precursor 152.For example, precursor heater 154 can be configured to the temperature regulation of metal-carbonyl precursor 152 from about 40 ℃ in about 150 ℃ scope, perhaps from about 60 ℃ in about 90 ℃ scope.
Cause evaporation (or distillation) along with metal-carbonyl precursor 152 is heated to, carrier gas can be transmitted through metal-carbonyl precursor 152 tops, perhaps passes metal-carbonyl precursor 152, or its arbitrary combination.Carrier gas can for example comprise the rare gas element such as rare gas (that is, He, Ne, Ar, Kr, Xe) and so on.Perhaps, other embodiment have expected the omission carrier gas.According to embodiments of the invention, CO gas can be added to carrier gas.Perhaps, other embodiment expect with the carrier gas of CO gas instead.For example, gas supply system 160 is coupled to metal precursor evaporation system 150, and it for example is configured to make flow through metal-carbonyl precursor 152 tops or pass metal-carbonyl precursor 152 of carrier gas, CO gas or the two.Although it is not shown in Figure 2, but gas supply system 160 is all right, or or, the steam to metal precursor 152 provides carrier gas and/or CO gas when being coupled to vapor precursor delivery system 140 and entering vapor precursor delivery system 140 with the steam in metal precursor 152 or after entering.Gas supply system 160 can comprise gas source 161, one or more control valve 162, one or more strainer 164 and the mass flow controller 165 that comprises carrier gas, CO gas or its mixture.For example, the mass flow rate scope of carrier gas or CO gas can be from about 0.1sccm to about 1000sccm.
In addition, transmitter 166 is provided for the total gas stream of measurement from metal precursor evaporation system 150.Transmitter 166 can for example comprise mass flow controller, and the amount that is transferred to the metal-carbonyl precursor vapor of treatment chamber 110 can utilize transmitter 166 and mass flow controller 165 to determine.Perhaps, transmitter 166 can comprise the light absorption sensor of measurement in the concentration of the metal-carbonyl precursor in the gas stream of treatment chamber 110.
By-pass line 167 can be positioned at transmitter 166 downstreams, and it can be connected to vent line 116 with vapour delivery system 140.By-pass line 167 is provided for the vapor precursor delivery system 140 of finding time, and is stabilized to the supply of the metal-carbonyl precursor of treatment chamber 110.In addition, on by-pass line 167, provide the by-pass valve 168 in the ramose downstream that is positioned at vapor precursor delivery system 140.
Still with reference to figure 2, vapor precursor delivery system 140 comprises the high conductance vapor line that has first and second valves 141 and 142 respectively.In addition, vapor precursor delivery system 140 also can comprise the vapor line temperature Controlling System 143 that is configured to via well heater (not shown) heating steam precursor delivery system 140.The temperature of vapour line can be controlled as the temperature of avoiding the condensation of metal-carbonyl precursor in the vapour line.The temperature of vapour line can be controlled in from about 20 ℃ in about 100 ℃ scope, perhaps from about 40 ℃ in about 90 ℃ scope.
And, can provide CO gas from gas supply system 190.For example, gas supply system 190 is coupled to vapor precursor delivery system 140, and it for example is configured in vapor precursor delivery system 140 downstream of valve 141 (for example) CO gas is mixed with metal-carbonyl precursor vapor.Gas supply system 190 can comprise CO gas source 191, one or more control valve 192, one or more strainer 194 and mass flow controller 195.For example, the mass flow rate scope of CO gas can be from about 0.1sccm (per minute standard cubic centimeter) to about 1000sccm.
Mass flow controller 165 and 195 and valve 162,192,168,141 and 142 by controller 196 control, supply, the cut-out of controller 196 control carrier gas, CO gas and metal-carbonyl precursor vapor and flowing.Transmitter 166 also is connected to controller 196, and based on the output of transmitter 166, controller 196 can be controlled the carrier gas stream through mass flow controller 165, to acquire the expectation metal-carbonyl precursor stream of treatment chamber 110.
As shown in Figure 2, vent line 116 is connected to pump system 118 with exhaust chest 113.Vacuum pump 119 is used to treatment chamber 110 is evacuated to the vacuum tightness of expectation, and removes gaseous matter during handling from treatment chamber 110.Automatically pressure controller (APC) 115 and trap 117 use of can connecting with vacuum pump 119.Vacuum pump 119 can comprise that pump speed can be up to the turbomolecular pump (TMP) of 500 liters of per seconds (and bigger).Perhaps, vacuum pump 119 can comprise dry roughing vacuum pump.During handling, handle gas and can be introduced in the treatment chamber 110, and constant pressure can be regulated by APC 115 by force.APC 115 can comprise the butterfly valve or the family of power and influence.Trap 117 can be collected from the unreacted metal-carbonyl precursor material and the by product of treatment chamber 110.
Turn back to the substrate holder 120 in the treatment chamber 110, as shown in Figure 2, three substrate lift pins 127 (only showing two) are provided for maintenance, promote and reduce substrate 125.Substrate lift pins 127 is coupled to plate 123, and can be lowered to the upper surface that is lower than substrate holder 120.For example adopt the driving mechanism 129 of inflator that the device that is used to promote and reduce plate 123 is provided.Substrate 125 can and shift out treatment chamber 110 via the robotic transfer (not shown) process family of power and influence 200 and 202 immigrations of chamber feedthrough path, and is received by substrate lift pins 127.In case receive substrate 125 from transfer system, just can it be reduced to the upper surface of substrate holder 120 by reducing substrate lift pins 127.
Refer again to Fig. 2, controller 180 comprises microprocessor, storer and digital I/O port, and digital I/O port can generate and be enough to transmit and be activated to the input of treatment system 100 and monitor control voltage from the output of treatment system 100.And treatment system controller 180 is coupled to treatment chamber 110; The precursor delivery system 105 that comprises controller 196, vapor line temperature Controlling System 143 and vaporization temperature Controlling System 156; Steam distribution temperature controlling system 138; Vacuum pump system 118; And substrate holder temperature controlling system 128, and with these systems exchange information.In vacuum pump system 118, controller 180 is coupled to the automatic pressure controller 115 of the pressure that is used for controlling treatment chamber 110 and exchange message with it.The program in the storer of being stored in is used to the aforementioned components according to the process program control depositing system 100 of storage.An example of treatment system controller 180 is can be from Texas, the DELL PRECISIONWORKSTATION 610 that the Dell Corporation of Dallas obtains TM Controller 180 can also be embodied as multi-purpose computer, digital signal processor or the like.
Controller 180 can be positioned at depositing system 100 this locality, perhaps can be positioned at depositing system 100 at a distance, via Internet or Intranet communication.Thereby controller 180 can utilize at least a and depositing system 100 swap datas in direct connection, Intranet or the Internet.Controller 180 can be coupled to the Intranet that Customer Location (that is, element manufacturing person etc.) is located, and perhaps is coupled to the Intranet that supplier position (that is equipment manufacturers) is located.In addition, another computer (that is, controller, server etc.) can be via at least a access controller 180 in direct connection, Intranet or the Internet with swap data.
Fig. 3 illustrates the method for depositing metal layers on substrate according to the embodiment of the invention.Method 300 comprises, 302, provides substrate in the treatment chamber of depositing system.For example, depositing system can comprise the depositing system among above-mentioned Fig. 1 and 2.Substrate can for example be the Si substrate.The Si substrate can be n type or p type, and this depends on the type of the device of formation.Substrate can be a virtually any size, for example 200mm substrate, 300mm substrate or even bigger substrate.According to embodiments of the invention, substrate can be the patterned substrate that comprises one or more via holes or groove or its combination.304, form the processing gas that comprises metal-carbonyl precursor vapor and CO gas.Handle gas and also can comprise carrier gas.As mentioned above, according to an embodiment, metal-carbonyl precursor can be ruthenium-carbonyl precursor, for example Ru 3(CO) 12Add the vaporization temperature that CO gas allows to increase metal-carbonyl precursor to metal-carbonyl precursor vapor.The rising of temperature has increased the vapour pressure of metal-carbonyl precursor, causes the transmission of the metal-carbonyl precursor of treatment chamber to strengthen, thereby has increased the sedimentation rate of metal on the substrate.
According to embodiments of the invention, handling gas can form to form metal-carbonyl precursor vapor and CO gas mixed with metal-carbonyl precursor vapor by the heating metal-carbonyl precursor.According to embodiments of the invention, CO gas can mix with metal-carbonyl precursor vapor in the downstream of metal-carbonyl precursor.According to another embodiment of the present invention, can be by making the CO gas stream through metal-carbonyl precursor top or pass metal-carbonyl precursor CO gas is mixed with metal-carbonyl precursor vapor.According to still another embodiment of the invention, handling gas can be by additionally making carrier gas stream through the solid metal-carbonyl precursor top or pass solid metal-carbonyl precursor and form.
306, diluent gas is added in treatment chamber handles gas to form diluted processing gas.Described in Fig. 1 and 2, diluent gas can be added to processing gas in vapor distribution space before the treatment zone processing gas enters substrate through steam-distribution plate above.Perhaps, diluent gas can be added to processing gas at the processing gas stream in the treatment zone above substrate after steam-distribution plate.Or diluent gas can be added to processing gas in steam-distribution plate.
308, substrate is exposed to diluted processing gas with by thermal chemical vapor deposition process depositing metal layers on substrate.According to embodiments of the invention, metal level can be in the underlayer temperature deposit between about 50 ℃ and about 500 ℃.Perhaps, underlayer temperature can be between about 300 ℃ and about 400 ℃.
As skilled in the art will be aware of, each step in the schema of Fig. 3 or each stage can comprise one or more independent processes and/or operation.Therefore, in 302,304,306,308, only put down in writing four the step be not appreciated that with method of the present invention be restricted to have only four the step or four-stages.And each exemplary steps or stage 302,304,306,308 are not appreciated that and only limit to single technology.
Fig. 4 A-4C schematically shows the formation according to metal level on the patterned substrate of the embodiment of the invention.Those skilled in the art will be easy to recognize that embodiments of the invention can be applied to comprise the patterned substrate of one or more via holes or groove or its combination.Fig. 4 A schematically shows according to the embodiment of the invention metal level 440 is deposited to situation on the pattern structure 400.Pattern structure 400 comprises the first metal layer 410 and contains the patterned layer 420 of opening 430.Patterned layer 420 can for example be a dielectric materials.Opening 430 can for example be via hole or groove, and metal level 440 can for example comprise the Ru metal.
Fig. 4 B schematically shows according to another embodiment of the present invention metal level 460 is deposited to situation on the pattern structure 402.Pattern structure 402 comprises the first metal layer 410 and contains the patterned layer 420 of opening 430.Blocking layer 450 is deposited on the pattern structure 402, and metal level 460 is deposited on the blocking layer 450.Blocking layer 450 can for example comprise and contain tantalum material (for example, Ta, TaN or TaCN or wherein both or more persons' combination) or tungsten material (for example, W, WN).Patterned layer 420 can for example be a dielectric materials.Opening 430 can for example be via hole or groove, and metal level 460 can for example comprise the Ru metal.Fig. 4 C schematically shows the situation of deposition Cu in the opening 430 of Fig. 4 B.
Although top is described in detail some exemplary embodiment of the present invention, those skilled in the art will be easy to recognize, and can make many modifications in the exemplary embodiment, and not break away from novel teachings of the present invention and advantage in fact.Therefore, all such modifications all should comprise within the scope of the invention.

Claims (64)

1. the method for a depositing metal layers on substrate, this method comprises:
In the treatment chamber of depositing system, provide substrate;
Formation comprises the processing gas of metal-carbonyl precursor vapor and CO gas;
Described processing gas is introduced in the described treatment chamber;
In described treatment chamber, add diluent gas to form diluted processing gas to described processing gas; And
Described substrate is exposed to described diluted processing gas with by thermal chemical vapor deposition process depositing metal layers on described substrate.
2. the method for claim 1, wherein said formation step comprises:
The heating metal-carbonyl precursor is to form described metal-carbonyl precursor vapor; And
Described CO gas is mixed with described metal-carbonyl precursor vapor.
3. method as claimed in claim 2, wherein said mixing step comprises:
In described metal-carbonyl precursor downstream described CO gas is mixed with described metal-carbonyl precursor vapor.
4. method as claimed in claim 2, wherein said mixing step comprises:
Make described CO gas stream through described metal-carbonyl precursor top or pass described metal-carbonyl precursor.
5. method as claimed in claim 2, the flow rate of wherein said CO gas is between about 0.1sccm and about 1000sccm.
6. method as claimed in claim 2, the flow rate of wherein said CO gas is between about 1sccm and about 100sccm.
7. method as claimed in claim 2, wherein said formation step also comprises:
Make carrier gas stream through described metal-carbonyl precursor top or pass described metal-carbonyl precursor.
8. method as claimed in claim 7, wherein said carrier gas comprises rare gas.
9. method as claimed in claim 7, the flow rate of wherein said carrier gas is between about 0.1sccm and about 1000sccm.
10. the method for claim 1, wherein said metal-carbonyl precursor vapor comprise tungsten carbonyl, molybdenum carbonyl, cobalt-carbonyl, rhodium carbonyl, rhenium carbonyl, chromium carbonyl, ruthenium or osmium carbonyl or wherein both or more persons' combination.
11. the method for claim 1, wherein said metal-carbonyl precursor vapor comprise W (CO) 6, Mo (CO) 6, Co 2(CO) 8, Rh 4(CO) 12, Re 2(CO) 10, Cr (CO) 6, Ru 3(CO) 12, or Os 3(CO) 12Or wherein both or more persons' combination.
12. the method for claim 1 also is included between described exposure period under the temperature that described substrate is maintained between about 50 ℃ and about 500 ℃.
13. the method for claim 1 also is included between described exposure period under the temperature that described substrate is maintained between about 300 ℃ and about 400 ℃.
14. the method for claim 1 also is included between described exposure period under the pressure that described treatment chamber is maintained between about 0.1mTorr and the about 200mTorr.
15. the method for claim 1 also is included between described exposure period under the pressure that described treatment chamber is maintained between about 1mTorr and the about 100mTorr.
16. the method for claim 1 also is included between described exposure period under the pressure that described treatment chamber is maintained between about 2mTorr and the about 50mTorr.
17. the method for claim 1, wherein said interpolation step comprises:
Add described diluent gas to described processing gas in the vapor distribution space of the steam distributing system that is coupled to described treatment chamber above described substrate; And
Make described diluted processing gas stream arrive treatment zone between described steam distributing system and the described substrate through the steam-distribution plate of described steam distributing system.
18. the method for claim 1, wherein said interpolation step comprises:
After described steam-distribution plate, to described processing gas add described diluent gas in the treatment zone between the steam-distribution plate of the steam distributing system that is coupled to described treatment chamber above described substrate and described substrate at described processing gas stream.
19. the method for claim 1, wherein said interpolation step comprises:
The steam distribution intralamellar part of the steam distributing system that is coupled to described treatment chamber above described substrate adds described diluent gas to described processing gas.
20. the method for claim 1, wherein said diluent gas comprises rare gas.
21. method as claimed in claim 20, wherein said diluent gas also comprises reducing gas.
22. method as claimed in claim 21, wherein said reducing gas comprises H 2, silicon-containing gas, boron-containing gas or nitrogenous gas or wherein both or more persons' combination.
23. the method for claim 1, wherein said substrate are the patterned substrate that comprises one or more via holes or groove or its combination.
24. the method for claim 1, wherein said formation step also comprises:
Utilize described metal-carbonyl precursor vapor the relative concentration of described CO gas to be controlled the rate of decomposition of described the above metal-carbonyl precursor of substrate.
25. the method for claim 1, wherein said exposing step also comprises:
Under kinetic-limited temperature regime, carry out described thermal chemical vapor deposition process.
26. the method for a deposition Ru metal level on patterned substrate, this method comprises:
Provide patterned substrate in the treatment chamber of depositing system, wherein said patterned substrate comprises one or more via holes or groove or its combination;
Formation comprises Ru 3(CO) 12The processing gas of precursor vapor and CO gas;
Described processing gas is introduced in the described treatment chamber;
In described treatment chamber, add diluent gas to form diluted processing gas to described processing gas; And
Described patterned substrate is exposed to described diluted processing gas to deposit the Ru metal level by thermal chemical vapor deposition process on described patterned substrate.
27. method as claimed in claim 26, wherein said formation step comprises:
Heating Ru 3(CO) 12Presoma is to form described Ru 3(CO) 12Precursor vapor; And
With described CO gas and described Ru 3(CO) 12Precursor vapor is mixed.
28. method as claimed in claim 27, wherein said mixing step comprises:
At described Ru 3(CO) 12The downstream of presoma is with described CO gas and described Ru 3(CO) 12Precursor vapor is mixed.
29. method as claimed in claim 27, wherein said mixing step comprises:
Make described CO gas stream through described Ru 3(CO) 12Presoma top or pass described Ru 3(CO) 12Presoma.
30. method as claimed in claim 27, the flow rate of wherein said CO gas is between about 0.1sccm and about 1000sccm.
31. method as claimed in claim 27, the flow rate of wherein said CO gas is between about 1sccm and about 100sccm.
32. method as claimed in claim 27, wherein said formation step also comprises:
Make carrier gas stream through described Ru 3(CO) 12Presoma top or pass described Ru 3(CO) 12Presoma.
33. method as claimed in claim 32, wherein said carrier gas comprises rare gas.
34. method as claimed in claim 32, the flow rate of wherein said carrier gas is between about 0.1sccm and about 1000sccm.
35. method as claimed in claim 27, wherein said heating steps comprises described Ru 3(CO) 12Presoma maintains under the temperature between about 40 ℃ and about 150 ℃.
36. method as claimed in claim 27, wherein said heating steps comprises described Ru 3(CO) 12Presoma maintains under the temperature between about 60 ℃ and about 90 ℃.
37. method as claimed in claim 26 also is included between described exposure period under the temperature that described substrate is maintained between about 50 ℃ and about 500 ℃.
38. method as claimed in claim 26 also is included between described exposure period under the temperature that described substrate is maintained between about 300 ℃ and about 400 ℃.
39. method as claimed in claim 26 also is included between described exposure period under the pressure that described treatment chamber is maintained between about 0.1mTorr and the about 200mTorr.
40. method as claimed in claim 26 also is included between described exposure period under the pressure that described treatment chamber is maintained between about 1mTorr and the about 100mTorr.
41. method as claimed in claim 26 also is included between described exposure period under the pressure that described treatment chamber is maintained between about 2mTorr and the about 50mTorr.
42. method as claimed in claim 26, wherein said interpolation step comprises:
Add described diluent gas to described processing gas in the vapor distribution space of the steam distributing system that is coupled to described treatment chamber above described substrate; And
Make described diluted processing gas stream arrive treatment zone between described steam distributing system and the described substrate through the steam-distribution plate of described steam distributing system.
43. method as claimed in claim 26, wherein said interpolation step comprises:
After described steam-distribution plate, to described processing gas add described diluent gas in the treatment zone between the steam-distribution plate of the steam distributing system that is coupled to described treatment chamber above described substrate and described substrate at described processing gas stream.
44. method as claimed in claim 26, wherein said interpolation step comprises:
The steam distribution intralamellar part of the steam distributing system that is coupled to described treatment chamber above described substrate adds described diluent gas to described processing gas.
45. method as claimed in claim 26, wherein said diluent gas comprises rare gas.
46. method as claimed in claim 26, wherein said diluent gas also comprises reducing gas.
47. method as claimed in claim 46, wherein said reducing gas comprises H 2, silicon-containing gas, boron-containing gas or nitrogenous gas or wherein both or more persons' combination.
48. method as claimed in claim 26, wherein said patterned substrate also comprise formation blocking layer thereon, described Ru metal level is deposited on the described blocking layer.
49. comprising, method as claimed in claim 48, wherein said blocking layer deposit containing tantalum layer or containing tungsten layer of described Ru metal level thereon.
50. method as claimed in claim 26, wherein said formation step also comprises:
Utilize described Ru 3(CO) 12Precursor vapor is controlled the above Ru of described substrate to the relative concentration of described CO gas 3(CO) 12The rate of decomposition of presoma.
51. method as claimed in claim 26, wherein said exposing step also comprises:
Under kinetic-limited temperature regime, carry out described thermal chemical vapor deposition process.
52. a depositing system comprises:
Treatment chamber with steam distributing system;
Be arranged in the substrate holder of described treatment chamber below described steam distributing system, it is arranged to and supports and heated substrate;
Precursor delivery system, it is arranged to form and comprises the processing gas of metal-carbonyl precursor vapor and CO gas and described processing gas is introduced described steam distributing system;
Be coupled to the source of diluent gas of described treatment chamber, it is arranged in described treatment chamber and adds described diluent gas to form diluted processing gas to described processing gas; And
Controller, its be arranged to described substrate is exposed to described diluted processing gas with by thermal chemical vapor deposition process during depositing metal layers on the described substrate, control described depositing system.
53. comprising, depositing system as claimed in claim 52, wherein said precursor delivery system be arranged to the heating metal-carbonyl precursor with the metal precursor evaporation system that forms described metal-carbonyl precursor vapor and be arranged to described CO gas and described metal-carbonyl precursor vapor blended CO gas source.
54. depositing system as claimed in claim 53, wherein said CO gas source are arranged in described metal-carbonyl precursor downstream described CO gas are mixed with described metal-carbonyl precursor vapor.
55. depositing system as claimed in claim 53, wherein said CO gas source are arranged to by making described CO gas stream through described metal-carbonyl precursor top or pass described metal-carbonyl precursor and described CO gas is mixed with described metal-carbonyl precursor vapor.
56. depositing system as claimed in claim 53, wherein said precursor delivery system are configured to make described CO gas to flow with the specific gas flow rate between about 0.1sccm and the about 1000sccm.
57. depositing system as claimed in claim 53, wherein said precursor delivery system are configured to make described CO gas to flow with the specific gas flow rate between about 1sccm and the about 100sccm.
58. also being arranged to, depositing system as claimed in claim 52, wherein said precursor delivery system make carrier gas stream through described metal-carbonyl precursor top or pass described metal-carbonyl precursor.
59. depositing system as claimed in claim 58, wherein said precursor delivery system are configured to make described carrier gas to flow with the specific gas flow rate between about 0.1sccm and the about 1000sccm.
60. depositing system as claimed in claim 52, wherein said substrate holder are configured to described substrate is heated to underlayer temperature between about 50 ℃ and about 500 ℃.
61. depositing system as claimed in claim 52, wherein said controller are configured to described treatment chamber is maintained under the pressure between about 0.1mTorr and the about 200mTorr.
62. being arranged in the vapor distribution space of described steam distributing system, depositing system as claimed in claim 52, wherein said source of diluent gas add described diluent gas to described processing gas.
63. being arranged between described steam distributing system and described substrate, depositing system as claimed in claim 52, wherein said source of diluent gas add described diluent gas to described processing gas.
64. the steam distribution intralamellar part that depositing system as claimed in claim 52, wherein said source of diluent gas are arranged in described steam distributing system adds described diluent gas to described processing gas.
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