CN101025579A - Composition for removing a resist - Google Patents
Composition for removing a resist Download PDFInfo
- Publication number
- CN101025579A CN101025579A CNA2007100007015A CN200710000701A CN101025579A CN 101025579 A CN101025579 A CN 101025579A CN A2007100007015 A CNA2007100007015 A CN A2007100007015A CN 200710000701 A CN200710000701 A CN 200710000701A CN 101025579 A CN101025579 A CN 101025579A
- Authority
- CN
- China
- Prior art keywords
- weight portion
- compound
- corrosion inhibitor
- chemical formula
- composition according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000000203 mixture Substances 0.000 title claims abstract description 125
- -1 carbonic acid compound Chemical class 0.000 claims abstract description 112
- 150000001875 compounds Chemical class 0.000 claims abstract description 89
- 230000007797 corrosion Effects 0.000 claims abstract description 73
- 238000005260 corrosion Methods 0.000 claims abstract description 73
- 150000001412 amines Chemical class 0.000 claims abstract description 57
- 150000007524 organic acids Chemical class 0.000 claims abstract description 57
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 78
- 239000002904 solvent Substances 0.000 claims description 65
- 239000000126 substance Substances 0.000 claims description 63
- 239000003112 inhibitor Substances 0.000 claims description 50
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical class OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 46
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 claims description 41
- 230000014509 gene expression Effects 0.000 claims description 20
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 claims description 18
- 235000012501 ammonium carbonate Nutrition 0.000 claims description 15
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 13
- 150000002596 lactones Chemical class 0.000 claims description 12
- REZQBEBOWJAQKS-UHFFFAOYSA-N triacontan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCCCCCCCCCCCCCO REZQBEBOWJAQKS-UHFFFAOYSA-N 0.000 claims description 12
- 125000000217 alkyl group Chemical group 0.000 claims description 11
- PRKQVKDSMLBJBJ-UHFFFAOYSA-N ammonium carbonate Chemical compound N.N.OC(O)=O PRKQVKDSMLBJBJ-UHFFFAOYSA-N 0.000 claims description 11
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 claims description 10
- AAQDYYFAFXGBFZ-UHFFFAOYSA-N Tetrahydrofurfuryl acetate Chemical compound CC(=O)OCC1CCCO1 AAQDYYFAFXGBFZ-UHFFFAOYSA-N 0.000 claims description 10
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 claims description 10
- GAEKPEKOJKCEMS-UHFFFAOYSA-N gamma-valerolactone Chemical compound CC1CCC(=O)O1 GAEKPEKOJKCEMS-UHFFFAOYSA-N 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 9
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 9
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 claims description 8
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 claims description 8
- 239000001099 ammonium carbonate Substances 0.000 claims description 8
- AQIXEPGDORPWBJ-UHFFFAOYSA-N pentan-3-ol Chemical compound CCC(O)CC AQIXEPGDORPWBJ-UHFFFAOYSA-N 0.000 claims description 7
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 claims description 6
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims description 6
- 229930188620 butyrolactone Natural products 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 6
- BJEPYKJPYRNKOW-UHFFFAOYSA-N malic acid Chemical compound OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 claims description 6
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 claims description 6
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 claims description 6
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 claims description 6
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 claims description 5
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims description 5
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 claims description 5
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 claims description 5
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims description 5
- 229940014800 succinic anhydride Drugs 0.000 claims description 5
- JPIGSMKDJQPHJC-UHFFFAOYSA-N 1-(2-aminoethoxy)ethanol Chemical compound CC(O)OCCN JPIGSMKDJQPHJC-UHFFFAOYSA-N 0.000 claims description 4
- WFCSWCVEJLETKA-UHFFFAOYSA-N 2-piperazin-1-ylethanol Chemical compound OCCN1CCNCC1 WFCSWCVEJLETKA-UHFFFAOYSA-N 0.000 claims description 4
- OZJPLYNZGCXSJM-UHFFFAOYSA-N 5-valerolactone Chemical compound O=C1CCCCO1 OZJPLYNZGCXSJM-UHFFFAOYSA-N 0.000 claims description 4
- 229910000013 Ammonium bicarbonate Inorganic materials 0.000 claims description 4
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 claims description 4
- OPKOKAMJFNKNAS-UHFFFAOYSA-N N-methylethanolamine Chemical compound CNCCO OPKOKAMJFNKNAS-UHFFFAOYSA-N 0.000 claims description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 4
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 4
- 235000012538 ammonium bicarbonate Nutrition 0.000 claims description 4
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclo-pentanone Natural products O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 claims description 4
- 229960002887 deanol Drugs 0.000 claims description 4
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims description 4
- 239000012972 dimethylethanolamine Substances 0.000 claims description 4
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- ZSSVGSJIAFEHDW-WYIOCLOVSA-N (4r,4ar,7s,7ar,12bs)-9-(3-aminopropoxy)-3-methyl-2,4,4a,7,7a,13-hexahydro-1h-4,12-methanobenzofuro[3,2-e]isoquinoline-7-ol Chemical compound O[C@H]([C@@H]1O2)C=C[C@H]3[C@]4([H])N(C)CC[C@]13C1=C2C(OCCCN)=CC=C1C4 ZSSVGSJIAFEHDW-WYIOCLOVSA-N 0.000 claims description 3
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 claims description 3
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 claims description 3
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 claims description 3
- QHTUMQYGZQYEOZ-UHFFFAOYSA-N 2-(4-methylpiperazin-1-yl)ethanol Chemical compound CN1CCN(CCO)CC1 QHTUMQYGZQYEOZ-UHFFFAOYSA-N 0.000 claims description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 claims description 3
- COBPKKZHLDDMTB-UHFFFAOYSA-N 2-[2-(2-butoxyethoxy)ethoxy]ethanol Chemical compound CCCCOCCOCCOCCO COBPKKZHLDDMTB-UHFFFAOYSA-N 0.000 claims description 3
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 claims description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 claims description 3
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 claims description 3
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 claims description 3
- FJKROLUGYXJWQN-UHFFFAOYSA-M 4-hydroxybenzoate Chemical compound OC1=CC=C(C([O-])=O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-M 0.000 claims description 3
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 claims description 3
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 claims description 3
- 239000005695 Ammonium acetate Substances 0.000 claims description 3
- 239000005711 Benzoic acid Substances 0.000 claims description 3
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 claims description 3
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 3
- UWHCKJMYHZGTIT-UHFFFAOYSA-N Tetraethylene glycol, Natural products OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 claims description 3
- 229960004050 aminobenzoic acid Drugs 0.000 claims description 3
- 229940043376 ammonium acetate Drugs 0.000 claims description 3
- 235000019257 ammonium acetate Nutrition 0.000 claims description 3
- VZTDIZULWFCMLS-UHFFFAOYSA-N ammonium formate Chemical compound [NH4+].[O-]C=O VZTDIZULWFCMLS-UHFFFAOYSA-N 0.000 claims description 3
- VBIXEXWLHSRNKB-UHFFFAOYSA-N ammonium oxalate Chemical compound [NH4+].[NH4+].[O-]C(=O)C([O-])=O VBIXEXWLHSRNKB-UHFFFAOYSA-N 0.000 claims description 3
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052921 ammonium sulfate Inorganic materials 0.000 claims description 3
- UYJXRRSPUVSSMN-UHFFFAOYSA-P ammonium sulfide Chemical compound [NH4+].[NH4+].[S-2] UYJXRRSPUVSSMN-UHFFFAOYSA-P 0.000 claims description 3
- 235000011130 ammonium sulphate Nutrition 0.000 claims description 3
- SOIFLUNRINLCBN-UHFFFAOYSA-N ammonium thiocyanate Chemical compound [NH4+].[S-]C#N SOIFLUNRINLCBN-UHFFFAOYSA-N 0.000 claims description 3
- 235000010233 benzoic acid Nutrition 0.000 claims description 3
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 claims description 3
- 229940078916 carbamide peroxide Drugs 0.000 claims description 3
- FFYPMLJYZAEMQB-UHFFFAOYSA-N diethyl pyrocarbonate Chemical compound CCOC(=O)OC(=O)OCC FFYPMLJYZAEMQB-UHFFFAOYSA-N 0.000 claims description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims description 3
- 239000011976 maleic acid Substances 0.000 claims description 3
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 claims description 3
- 235000006408 oxalic acid Nutrition 0.000 claims description 3
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 claims description 3
- 229960004889 salicylic acid Drugs 0.000 claims description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 3
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 claims description 3
- AQLJVWUFPCUVLO-UHFFFAOYSA-N urea hydrogen peroxide Chemical compound OO.NC(N)=O AQLJVWUFPCUVLO-UHFFFAOYSA-N 0.000 claims description 3
- PRBXPAHXMGDVNQ-UHFFFAOYSA-N 2-[2-(2-hydroxyethoxy)ethoxy]acetic acid Chemical compound OCCOCCOCC(O)=O PRBXPAHXMGDVNQ-UHFFFAOYSA-N 0.000 claims description 2
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical group C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 claims description 2
- RZTOWFMDBDPERY-UHFFFAOYSA-N Delta-Hexanolactone Chemical compound CC1CCCC(=O)O1 RZTOWFMDBDPERY-UHFFFAOYSA-N 0.000 claims description 2
- 125000005910 alkyl carbonate group Chemical group 0.000 claims description 2
- BGTOWKSIORTVQH-HOSYLAQJSA-N cyclopentanone Chemical group O=[13C]1CCCC1 BGTOWKSIORTVQH-HOSYLAQJSA-N 0.000 claims description 2
- FYTRVXSHONWYNE-UHFFFAOYSA-N delta-octanolide Chemical compound CCCC1CCCC(=O)O1 FYTRVXSHONWYNE-UHFFFAOYSA-N 0.000 claims description 2
- 125000006182 dimethyl benzyl group Chemical group 0.000 claims description 2
- JBFHTYHTHYHCDJ-UHFFFAOYSA-N gamma-caprolactone Chemical compound CCC1CCC(=O)O1 JBFHTYHTHYHCDJ-UHFFFAOYSA-N 0.000 claims description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N methyl alcohol Substances OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 2
- JCBPETKZIGVZRE-UHFFFAOYSA-N 2-aminobutan-1-ol Chemical compound CCC(N)CO JCBPETKZIGVZRE-UHFFFAOYSA-N 0.000 claims 2
- ZIXLDMFVRPABBX-UHFFFAOYSA-N 2-methylcyclopentan-1-one Chemical compound CC1CCCC1=O ZIXLDMFVRPABBX-UHFFFAOYSA-N 0.000 claims 2
- IMUDHTPIFIBORV-UHFFFAOYSA-N aminoethylpiperazine Chemical compound NCCN1CCNCC1 IMUDHTPIFIBORV-UHFFFAOYSA-N 0.000 claims 2
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 claims 2
- 230000000694 effects Effects 0.000 abstract description 12
- 230000008859 change Effects 0.000 abstract description 11
- 229910052751 metal Inorganic materials 0.000 abstract description 10
- 239000002184 metal Substances 0.000 abstract description 10
- 150000001923 cyclic compounds Chemical class 0.000 abstract 1
- 239000003814 drug Substances 0.000 abstract 1
- 229940079593 drug Drugs 0.000 abstract 1
- 150000002334 glycols Chemical class 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 239000007800 oxidant agent Substances 0.000 abstract 1
- 230000001590 oxidative effect Effects 0.000 abstract 1
- 238000012360 testing method Methods 0.000 description 36
- BSYVTEYKTMYBMK-UHFFFAOYSA-N tetrahydrofurfuryl alcohol Chemical compound OCC1CCCO1 BSYVTEYKTMYBMK-UHFFFAOYSA-N 0.000 description 23
- 239000000758 substrate Substances 0.000 description 22
- 238000000034 method Methods 0.000 description 21
- 238000000354 decomposition reaction Methods 0.000 description 19
- 238000002474 experimental method Methods 0.000 description 18
- 239000000243 solution Substances 0.000 description 14
- 150000003254 radicals Chemical class 0.000 description 12
- 238000005516 engineering process Methods 0.000 description 11
- 230000008569 process Effects 0.000 description 11
- 150000003863 ammonium salts Chemical class 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 239000000839 emulsion Substances 0.000 description 6
- 238000000206 photolithography Methods 0.000 description 6
- 239000002671 adjuvant Substances 0.000 description 5
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 229910001882 dioxygen Inorganic materials 0.000 description 4
- 235000014347 soups Nutrition 0.000 description 4
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 239000002798 polar solvent Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000001850 [(2R)-oxolan-2-yl]methyl acetate Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 2
- 229940043237 diethanolamine Drugs 0.000 description 2
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- BQJCRHHNABKAKU-KBQPJGBKSA-N morphine Chemical compound O([C@H]1[C@H](C=C[C@H]23)O)C4=C5[C@@]12CCN(C)[C@@H]3CC5=CC=C4O BQJCRHHNABKAKU-KBQPJGBKSA-N 0.000 description 2
- 239000012454 non-polar solvent Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- WFSMVVDJSNMRAR-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethanol Chemical compound CCOCCOCCOCCO WFSMVVDJSNMRAR-UHFFFAOYSA-N 0.000 description 1
- LSYBWANTZYUTGJ-UHFFFAOYSA-N 2-[2-(dimethylamino)ethyl-methylamino]ethanol Chemical compound CN(C)CCN(C)CCO LSYBWANTZYUTGJ-UHFFFAOYSA-N 0.000 description 1
- WPEQIYDZNFOMPS-UHFFFAOYSA-N 2-[2-hydroxyethyl(methyl)amino]ethanol Chemical compound OCCN(C)CCO.OCCN(C)CCO WPEQIYDZNFOMPS-UHFFFAOYSA-N 0.000 description 1
- VNRLFQGYFLCRMU-UHFFFAOYSA-N 2-piperazin-1-ylethanamine Chemical compound NCCN1CCNCC1.NCCN1CCNCC1 VNRLFQGYFLCRMU-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- DREMSAPUUZQYSK-UHFFFAOYSA-N CC1C(CCC1)=O.CC1C(CCC1)=O Chemical compound CC1C(CCC1)=O.CC1C(CCC1)=O DREMSAPUUZQYSK-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- UFLGIAIHIAPJJC-UHFFFAOYSA-N Tripelennamine Chemical compound C=1C=CC=NC=1N(CCN(C)C)CC1=CC=CC=C1 UFLGIAIHIAPJJC-UHFFFAOYSA-N 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- KVBCYCWRDBDGBG-UHFFFAOYSA-N azane;dihydrofluoride Chemical compound [NH4+].F.[F-] KVBCYCWRDBDGBG-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 101150047356 dec-1 gene Proteins 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000005194 fractionation Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229940087646 methanolamine Drugs 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229960005181 morphine Drugs 0.000 description 1
- ROTONRWJLXYJBD-UHFFFAOYSA-N oxan-2-ylmethanol Chemical compound OCC1CCCCO1 ROTONRWJLXYJBD-UHFFFAOYSA-N 0.000 description 1
- JMJRYTGVHCAYCT-UHFFFAOYSA-N oxan-4-one Chemical compound O=C1CCOCC1 JMJRYTGVHCAYCT-UHFFFAOYSA-N 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000009418 renovation Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000010023 transfer printing Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 238000013316 zoning Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/044—Hydroxides or bases
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2068—Ethers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- C11D2111/22—
Abstract
The invention relates to a resist removing composition, especially a resist removing composition of the compound selecting from cyclic compound with O=O bond, and glycol type compound and carbonic acid compound. The inventive resist removing composition further comprises lactone compound, amine or organic acid, oxidant or its mixture. The resist removing composition is used to remove the resist in the graphics of circuit or display element metal wiring and has a good removing effect to the residual resist on the graphics metal film and a little component change and drug liquid fatigue at high temperature, and can reduce the corrosion to the graphics metal film.
Description
Technical field
The present invention relates to a kind of composition that is used for peeling off the employed resist of lithoprinting (photo-lithography) technology, relate in particular to a kind of when peeling off the resist that is used to form the metal Butut, the corrosion of metal film can be reduced, and the outstanding corrosion inhibitor stripper composition of peeling off effect can be reached.
Background technology
Resist (photo-resist) is a requisite material in photolithography process, and photolithography process generally is applied in integrated circuit (integrated circuit, IC), large scale integrated circuit (large scale integration, LSI), (very largescale integration VLSI) waits in the manufacturing of semiconductor device and image display devices such as LCD, flat-panel monitor VLSI (very large scale integrated circuit).
Following simple declaration photolithography process.
At first, on predetermined substrate such as semiconductor substrate or glass substrate, form resist film.Aforesaid substrate can be before forming resist film without the substrate of any operation, but normally before forming resist film through the pre-treating technology of some operations and be formed with the substrate of understructure such as metal line.Therefore, above-mentioned resist film is formed in inside or top has on the substrate of predetermined understructure usually.Above-mentioned resist film can be formed on whole zone or some subregion above the substrate, but is coated in the whole surface of substrate usually.In follow-up graphical technology, peel off the resist film of presumptive area, with exposure substrate top, and stay other regional resist film, thereby by residual resist film protective substrate top.Have severally in the method for whole base plate surface applied resist film, but use spin-coating method usually.
Then, will be formed with the exposure mask of predetermined pattern, be close to the resist top that is formed at the whole surface of aforesaid substrate, perhaps be spaced apart on resist top with preset distance.Afterwards, above-mentioned mask is shone as high-energy actinic rays such as ultraviolet ray, electron beam, X ray, to carry out exposure technology comprehensively.Described mask pattern can be divided into two zones, the photic zone and the shading region of the photochemical ray of promptly above-mentioned high-energy.Therefore, see through the photochemical ray of above-mentioned high-energy of above-mentioned mask pattern photic zone, can arrive the resist film of its underpart.Arrive the photochemical ray of high-energy of above-mentioned resist film, will change the physical property of resist film.After finishing the irradiation of the photochemical ray of above-mentioned high-energy, above-mentioned resist film will be divided into and not change physical property zone and change the physical property zone.Whether change by the as above rerum natura of resist film and to come the pattern that formed by zoning,, therefore be commonly called " sub-image (latent) " of mask pattern because it is temporarily formed by mask.
Afterwards, the sub-image on the above-mentioned resist film is carried out video picture technology, to form resist pattern by the mask pattern transfer printing.Then, the resist pattern as etching mask, is carried out etching to substrate, thereby at the inner final predetermined pattern that forms of substrate.Afterwards, peel off the resist pattern that remains on the substrate with predetermined pattern, just can finish photolithography process.
Wherein, about corrosion inhibitor stripper composition in the past, Korean Patent discloses a kind of manufacture method of substrate organic coating for 2003-0033988 number, and its use contains the treating fluid of ethylene carbonate, carbonic allyl ester or its potpourri.In addition, United States Patent (USP) discloses the renovation process of a kind of ethylene carbonate, carbonic allyl ester etc. for 6.403.544 number.
Said method is employed to be carbonate compound, but when using ethylene carbonate, its fusing point is higher than normal temperature, therefore is difficult to use as peeling off solvent, and when using carbonic allyl ester, and peeling off solvent with other, to compare its stripping performance poor.In addition, said method is by distilling the method that lactone separates and regenerates with impurity respectively, and this compares with the method for real-time decomposition of the present invention and differs greatly, and also will reclaim the solvent that contains certain resist after use, and need carry out fractionation process separately, therefore increase the technology expenditure.
Summary of the invention
The present invention provides in view of the above problems, and its purpose is to provide a kind of and has excellent fissility, and the corrosion inhibitor stripper composition with less soup fatigue strength.
For achieving the above object, corrosion inhibitor stripper composition provided by the present invention comprises and is selected from the compound of being represented by following Chemical formula 1; Ring compound by Chemical formula 2, chemical formula 3 or chemical formula 4 expressions; And by at least a compound in the ethylene glycol compounds of chemical formula 5 expressions,
[Chemical formula 1] [Chemical formula 2]
[chemical formula 3] [chemical formula 4]
[chemical formula 5]
In the above-mentioned chemical formula, R, R ', R ", R represents the alkyl of hydrogen, hydroxyl, C1-C10, the chain triacontanol base of C1-C10 respectively, the perhaps alkyl acetate of C1-C10 (alkyl acetate group); R
3Expression hydroxyl, the alkyl of C1-C10 or the alkyl acetate (alkyl acetate group) of C1-C10, wherein, n represents the integer of 1-12.
Above-mentioned composition also can comprise amine or organic acid, oxygenant, by lactone solvent or its potpourri of following chemical formula 6 or chemical formula 7 expressions,
[chemical formula 6]
[chemical formula 7]
In the above-mentioned chemical formula, R represents the alkyl of hydrogen, hydroxyl, C1-C10, the chain triacontanol base of C1-C10, perhaps the alkyl acetate base of C1-C10.
In addition, the invention provides a kind of corrosion inhibitor stripper composition, it comprises carbonate compound, amine or organic acid, oxygenant of being represented by following chemical formula 8 and lactone solvent or its potpourri of being represented by above-mentioned chemical formula 6 or chemical formula 7,
[chemical formula 8]
In the above-mentioned chemical formula, R
1The alkyl acetate base of alkyl, benzyl ester, phenyl or the C1-C10 of expression C1-C10; R
2Alkyl, benzyl ester, phenyl, the alkyl acetate base of C1-C10 or the alkyl carbonate of C1-C10 of expression C1-C10.
Embodiment
Below, describe the present invention in detail.
The invention provides a kind of in photolithography process, form the resist pattern after, be used to peel off the remover combination that remains in the resist on the substrate.
In the present invention, in order to reduce the soup fatigue strength, the corrosion inhibitor stripper composition that will be grouped into by some one-tenth, the single solvent high as boiling point uses.Among the present invention,, preferably use polarity or non-polar solvent as the higher boiling single solvent.Wherein, polar solvent is because of its characteristic, and makes oxygenant too quick decomposition such as the ozone that can additionally add in the decomposition process of resist or aquae hydrogenii dioxidi maybe can not make it stable, therefore can reduce decomposition efficiency, but it has excellent stripping performance to resist.In addition, when using non-polar solvent, its stripping performance to resist is not so good as polar solvent, but can stablize oxygenants such as ozone or aquae hydrogenii dioxidi.In order to remedy the shortcoming of above-mentioned solvent, the present invention stablizes oxygenants such as ozone or aquae hydrogenii dioxidi by adding catalyzer or adjuvant, and promotes to decompose the generation of required free radical, perhaps adds amine, organic acid or other adjuvants and comes the up-stripping performance.
Particularly, as the single solvent of corrosion inhibitor stripper composition of the present invention, it is to be selected from the compound of being represented by following Chemical formula 1; Ring compound by Chemical formula 2, chemical formula 3 or chemical formula 4 expressions; By the compound in the ethylene glycol compounds of chemical formula 5 expression, and these compounds should be in oxygenants such as ozone or aquae hydrogenii dioxidi unlikely being decomposed, and its boiling point also will be higher than 120 degree, and at high temperature also should have less soup to reduce.In corrosion inhibitor stripper composition of the present invention, can comprise the above-claimed cpd of 100 weight portions, and play a role as the solvent in the composition.
[Chemical formula 1] [Chemical formula 2]
[chemical formula 3] [chemical formula 4]
[chemical formula 5]
In the above-mentioned chemical formula, R, R ', R ", R represents the alkyl of hydrogen, hydroxyl, C1-C10, the chain triacontanol base of C1-C10 or the alkyl acetate base of C1-C10 respectively; R
3Expression hydroxyl, the alkyl of C1-C10 or the alkyl acetate base of C1-C10; N represents the integer of 1-12.
At this moment, according to the present invention, the compound of being represented by above-mentioned chemical formula 8 that is selected from the carbonate compound also satisfies above-mentioned character, therefore can be used as independent solvent and uses.
In addition, reduce stripping performance in order to prevent that resist is contained in the soup, the present invention adopts the catalyzer can decompose resist resin and emulsion in the resist stripping technology and adjuvant etc., and adds specific adjuvant for the stripping performance that remedies because of using single solvent to descend.
Corrosion inhibitor stripper composition of the present invention, except comprising the compound or carbonate compound that is selected from above-mentioned ring compound and the ethylene glycol compounds, also can further comprise amine or organic acid, oxygenant, by lactone compound or its potpourri of above-mentioned chemical formula 6 or chemical formula 7 expressions.
Purpose of the present invention mainly is will use as solvent by selected compound from above-mentioned ring compound, ethylene glycol compounds or carbonate compound, and be used to decompose resist to wherein adding oxygenant.In addition, another object of the present invention is to, further add amine or organic acid and improve the resist stripping performance that solvent itself is lacked, improve the oxidation efficiency of oxygenant with this.At this,,, also be necessary perhaps further to activate the free radical that generates by oxygenant by heat by amine in the solvent or organic acid in order further to improve process efficiency even if use amine, organic acid or oxygenant.Certainly, amine or organic acid also can play a kind of effect of catalyzer to the generation that improves free radical, but showing more, its performance makes a kind of can the generation on the solvent environment of free radical according to condition, and show in the raising to the stripping performance of resist, in fact need a kind of can together the use, to improve catalyzer, adjuvant and its corresponding means of free radical formation efficiency with oxygenants such as ozone and aquae hydrogenii dioxidis.
In addition, according to the present invention, in the compound and oxygenant component in being selected from above-mentioned ring compound, ethylene glycol compounds or carbonic acid compounds, when adding amine or organic acid or lactone compound, can further improve resist stripping performance and resist decomposability.
This corrosion inhibitor stripper composition can be to comprise the compound in the above-mentioned ring compound of being selected from of 70-99.9 weight portion, the ethylene glycol compounds and the amine or the organic acid two-component composition of 0.1-30 weight portion.In addition, resist constituent of the present invention, can be comprise the 70-99.9 weight portion by the carbonate compound of above-mentioned chemical formula 3 expressions and the amine or the organic acid two-component composition of 0.1-30 weight portion.
In addition, corrosion inhibitor stripper composition of the present invention can be the two-component composition that comprises the oxygenant of compound in the above-mentioned ring compound of being selected from of 90-99.9 weight portion, the ethylene glycol compounds or carbonate compound and 0.01-10 weight portion.At this moment, corrosion inhibitor stripper composition of the present invention preferably comprises: the oxygenant outside the ozone that is selected from compound in above-mentioned ring compound and the ethylene glycol compounds or carbonate compound, 0.001-1 weight portion of 70-99.499 weight portion and the deozonize of 0.5-10 weight portion.
In addition, corrosion inhibitor stripper composition of the present invention can be compound or carbonate compound, the lactone compound of 10-50 weight portion and the amine or organic acid three components compositions of 0.1-30 weight portion that comprise in the above-mentioned ring compound of being selected from of 70-89.9 weight portion, the ethylene glycol compounds.
In addition, corrosion inhibitor stripper composition of the present invention can be three components compositions that comprise the oxygenant of the lactone compound of compound in the above-mentioned ring compound of being selected from of 90-89.9 weight portion, the ethylene glycol compounds or carbonate compound, 10-50 weight portion and 0.01-10 weight portion.At this moment, corrosion inhibitor stripper composition of the present invention preferably comprises: the 70-89.899 weight portion be selected from compound in above-mentioned ring compound, the ethylene glycol compounds or carbonate compound, the lactone compound of 10-50 weight portion, the ozone and the outer oxygenant of 0.1-10 weight portion deozonize of 0.001-1 weight portion.
In addition, corrosion inhibitor stripper composition of the present invention can be three components compositions that comprise the oxygenant of the amine of compound in the above-mentioned ring compound of being selected from of 70-98.99 weight portion, the ethylene glycol compounds or carbonate compound, 1-30 weight portion or organic acid and 0.01-10 weight portion.
In addition, corrosion inhibitor stripper composition of the present invention can be four components compositions of the oxygenant of the amine of the lactone compound that comprises compound in the above-mentioned ring compound of being selected from of 70-88.99 weight portion, the ethylene glycol compounds or carbonate compound, 10-50 weight portion, 1-30 weight portion or organic acid and 0.01-10 weight portion.
Among the present invention, the above-mentioned ring compound that can be used for the one-component composition, the preferred at least a compound that is selected from cyclopentanone (cyclopentanone), methyl-cyclopentanone (methyl cyclopentanone), tetrahydrofurfuryl acetate (Tetra hydro furfuryl acetate), tetrahydrochysene-4H-pyrans-4-ketone (Tetrahydro-4H-pyran-4-one) and the oxinane-2-methyl alcohol (tetrahydropyran-2-methanol) that uses.In addition, above-mentioned ethylene glycol compounds can preferably use and be selected from Ethylenimine (ethylene glycol), diglycol (diethylene glycol), triethylene glycol (triethylene glycol), tetraethylene glycol (tetraethylene glycol), ethylene glycol monomethyl ether (ethylene glycol methyl ether), ethylene glycol ethyl ether (ethylene glycolethyl ether), butyl glycol ether (ethylene glycol butyl ether), diethylene glycol methyl ether (diethylene glycol methyl ether), DGDE (diethylene glycolethyl ether), butyl carbitol (diethylene glycol butyl ether), triethylene glycol methyl ether (triethylene glycol methyl ether), triethylene glycol ether (triethylene glycolethyl ether), triethylene glycol butyl ether (triethylene glycol butyl ether), at least a compound in the diethylene glycol dimethyl ether (diethylene glycol dimethyl ether).Above-mentioned carbonate compound can preferably use at least a compound that is selected from dimethyl benzyl, diethyl carbonate (diethylcarbonate), the dicarbonic acid diethyl ester (diethyl dicarbonate).
When the present invention is 2 to 4 components compositions, be selected from the compound in above-mentioned ring compound and the ethylene glycol compounds or the content of carbonate compound, can be according to the compound that is added and difference.Preferably, when its when comprising amine or organic acid two-component composition, based on total composition 100 weight portions, can use compound or carbonate compound in above-mentioned ring compound of being selected from of 70-99.9 weight portion and the ethylene glycol compounds.In addition, when it is when containing the two-component composition of oxygenant,, can use the compound or the carbonate compound in ring compound and the ethylene glycol compounds of being selected from of 90-99.99 weight portion based on total composition 100 weight portions.During oxygenant outside it contains ozone and deozonize,, can use the compound or the carbonate compound in ring compound and the ethylene glycol compounds of being selected from of 70-99.499 weight portion based on total composition 100 weight portions.In addition, when its when comprising lactone compound and amine or organic acid three components compositions, based on total composition 100 weight portions, can use the compound or the carbonate compound in ring compound and the ethylene glycol compounds of being selected from of 70-89.9 weight portion.In addition, when it is when comprising three components compositions of lactone and oxygenant,, can use the compound or the carbonate compound in ring compound and the ethylene glycol compounds of being selected from of 90-89.99 weight portion based on total composition 100 weight portions.When oxygenant outside it comprises ozone and deozonize and lactone compound,, can use the compound or the carbonate compound in ring compound and the ethylene glycol compounds of being selected from of 70-89.899 weight portion based on total composition 100 weight portions.In above-mentioned situation, be lower than its lower limit if be selected from the compound in above-mentioned cyclic amine compound and the ethylene glycol compounds or the content of carbonate compound, will cause the corrosion of metal line and the reduction of resist charge stripping efficiency because oxygenant, amine or organic acid weight portion increase relatively; Otherwise if be higher than its higher limit, the generation that will cause free radical because oxygenant, amine or organic acid weight portion relatively reduce is not enough and be difficult to decompose resist.
Itself also helps peeling off of resist amine that the present invention utilized or organic acid, and the photosensitive compounds in the resist component (PAC, photoactive compound) is had oxidation.Described photosensitive compounds, because it is present between the macromolecule, therefore oxidized photosensitive compounds, dissolving are selected from the compound or carbonate compound in ring compound and the ethylene glycol compounds in the present invention, and its gaussian chain becomes loose and is the state of Yi Rong.Amine or organic acid are in single solvent, not only can play complementary effect to the resist stripping performance that this single solvent lacked, can also adjust acidity by the pH value of adjusting solvent, to form the activity that to adjust oxygenant for oxygenant is easy to form the condition of free radical in solvent.For example, when the pH value is 7.5 when above, will be easy to form hydroxy radical; And the pH value is 7.5 when following, can make the oxygenant in the solvent be stable shape.
At this moment, amine can be by improving the pH value of solvent, the decomposition efficiency of oxygenants such as the ozone of sustainable supply under high pH value condition or aquae hydrogenii dioxidi is improved, and formation is easy to generate the condition of high response hydroxy radical.This hydroxy radical can react with the resist composition in the solvent and makes it to decompose, and also helps to peel off the resist that is coated on the substrate simultaneously.Above-mentioned amine is one-level preferably, secondary, three grades of streptamines or cyclic amine, can be to be selected from monoethanolamine (monoethanol amine) particularly, Mono Isopropylamine (monoisopropylamine), amino ethoxy ethanol (Aminoethoxyethanol), methylethanolamine (methyl ethanol amine), diethanolamine (diethanol amine), triethanolamine (triethanolamine), dimethylethanolamine (Dimethylethanol amine), diethyl carbinol amine (diethyl methanol amine), methyldiethanolamine (Methyl diethanolamine), 1-(2-hydroxyethyl)-4-methyl piperazine (1-(2-Hydroxyethyl)-4-piperazine), N-methyl-N (n, n-dimethylaminoethyl)-ethylaminoethanol
(N-methyl-N (n, n-Dimethylaminoethyl)-aminoethanol), N-methyl-N (n, n-dimethylaminoethyl)-amino butanol
(N-methyl-N (n, n-Dimethylaminoethyl)-aminobuthanol), 1-(n, n-dimethyl) 2-(2-hydroxyl-oxethyl) ethamine
(1-(N, N-Dimethyl)-2-(2-hydroxyEthoxy) ethylamine), hydroxyethyl piperazine
At least a amine in (Hydroxyethyl piperazine), aminoethyl piperazine (Aminoethyl piperazine) and the aminopropyl morphine (aminoPyrophy morphine).
Above-mentioned organic acid can reduce the pH value of solvent, thereby oxygenants such as ozone or aquae hydrogenii dioxidi are limited in ormal weight, and make it stably to be present in the solvent, and makes it stably resolve into hydroxy radical or oxygen radical.Above-mentioned organic acid preferably can be selected carboxylic acid, dicarboxylic acid or its acid anhydrides for use, can use particularly to be selected from least a in benzoic acid, methyl benzoic acid, hydroxybenzoic acid, aminobenzoic acid, citric acid, succinic acid, hydroxysuccinic acid, maleic acid, salicylic acid, oxalic acid, phthalic acid, itaconic acid, succinic anhydride, phthalic anhydride, the itaconic anhydride.
Among the present invention, when it is bi-component or three components compositions,, preferably use the amine or the organic acid of 0.1-30 weight portion based on total composition 100 weight portions.If amine or organic acid content are lower than 0.1 weight portion, will make through process such as dry-etching and the stripping performance of the resist of modification descends, and the difficult build environment that forms free radical by the pH value of adjusting solvent; Otherwise,, will reduce the high molecular dissolving power of solation, thereby reduce the resist stripping performance on the whole if surpass 30 weight portions.
Oxygenant in the present composition, the preferred use is selected from least a in ozone, hydrogen peroxide, tributyl hydrogen peroxide, hydrogen peroxide benzoyl, carbamide peroxide, ammonium nitrate, ammonium formate, hartshorn salt, ammonium bicarbonate (ammonium Bicarbonate), ammonium acetate, ammonium bifluoride (ammonium hydrogendifluoride), ammonium thiocyanate (ammonium thiocyanite), ammonium sulfate, ammonium sulfide, ammonium oxalate, the ATS (Ammonium thiosulphate), and preferably uses ozone.When using ozone, preferably use more than one oxygenants outside the deozonize simultaneously.At this moment, oxygenant preferably uses the compound that is selected from aquae hydrogenii dioxidi and the ammonium salt, and when adding oxygenant such as aquae hydrogenii dioxidi or ammonium salt, it is dissolved in the water, so just can take effect.When using ozone and aquae hydrogenii dioxidi simultaneously, its decomposability to resist can be double; When using ozone and ammonium salt simultaneously, can increase the resist decomposability, and the rotten resist that can be easy to peel off behind cineration technics and produced.When in being selected from above-mentioned ring compound, ethylene glycol compounds, carbonate compound, adding aquae hydrogenii dioxidi or ammonium salt, and when not comprising ozone, also can confirm capacity of decomposition to resist, but can find to compare when using ozone, its capacity of decomposition to resin in the resist composition descends to some extent, and identical to the decomposability of emulsion.Therefore, can mix among the present invention and use more than one oxygenants, and preferably use ozone separately, and can use different oxygenants according to required technology.
The aquae hydrogenii dioxidi that uses as oxygenant, ozone, ammonium salt etc., can be under given conditions, generation hydroxy radical, oxygen radical, ammonium free radical decompose the photosensitive compounds in the resist composition, directly reduce resist content in the solvent with this, moreover, also can improve the stripping performance that solvent itself is lacked to resist.
At this moment, ozone as the oxygenant use, should carry out real-time feed by ozone generator, and be dissolved in the resist in the solvent and be coated in resist on the substrate in order to decompose or to peel off, should be dissolved with the ozone about 50-100ppm in the solvent, minimum also should comprising can be helpful to the stripping performance of resist more than the 30ppm.For ozone is dissolved in the solvent effectively, need at ozone generator and be equipped with between the container of solvent contactor is set.The decomposition efficiency of this ozone in solvent is high more, and be just high more to the charge stripping efficiency of resist; And temperature is high more and the content of oxyhydroxide is many more, and its decomposition rate is also just fast more.
In the composition of bi-component to four component of the present invention,, can use the oxygenant of 0.01-10 weight portion based on total amount 100 weight portions of every kind of composition.If the content of oxygenant is lower than 0.01 weight portion, will be difficult to decompose resist because of the free radical deficiency that is generated; If surpass 10 weight portions, will cause the corrosion of metal line.When in composition of the present invention, comprising ozone, the ozone of 0.001-1 weight portion can be used, and when comprising oxygenant outside the deozonize, the oxygenant of 0.1-10 weight portion can be used.
By the lactone compound of above-mentioned chemical formula 6 or chemical formula 7 expressions, can be to be selected from gamma-butyrolacton, γ-methylene gamma-butyrolacton, the Alpha-Methyl gamma-butyrolacton, the alpha-methylene gamma-butyrolacton, the 2-aceto butyrolactone, γ-hexanol lactone (gamma-hexanolactone), δ-hexanol lactone (delta-hexanolactone), γ-nonyl alcohol lactone (gamma-nonanol lactone), δ-octanol lactone (delta-octanolactone), gamma-valerolactone (gamma-valerolactone), δ-Wu Neizhi (delta-valerolactone), δ-hexanol lactone (delta-hexanonelactone).
When the present invention is three components or four components compositions,, can use the lactone compound of 10-50 weight portion based on total composition 100 weight portions.If its content is lower than 10 weight portions, oxygenant and amine or organic acid weight portion are relatively increased and causes the corrosion of metal line and the reduction of resist stripping performance; If surpass 50 weight portions, oxygenant and amine or organic acid weight portion are descended relatively and because the generation deficiency of free radical is difficult to decompose resist.
The present invention does not do special qualification to as above corrosion inhibitor stripper preparation of compositions method, can cooperate by conventional method, and use it for and peel off employed resist in the Butut of circuit or display element.
Below, further describe the present invention by embodiment and comparative example.Embodiment just is used for illustrating the present invention, and is not to be used to limit the present invention.In addition, in the following embodiments, if there are not other explanations, percentage when mixing ratio just is benchmark with weight.
[embodiment]
Embodiment 1 to embodiment 7 is used for inquiring into each composition peeling off and the experiment of decomposability resist.
As the test piece of participating in the experiment of resist stripping performance, in coating DTFR-3650B on glass (company of Dong Jin Shi-Mei Ken Co., Ltd, positive corrosion-resisting agent) afterwards, under the temperature of 140 ℃ and 150 ℃, carry out 10 minutes cure to handle respectively and make test piece 1 and test piece 2, afterwards it is measured the resist splitting time, and the test piece size is 2cm * 4cm.
In order to understand the resist decomposability, to adding the DTFR-3650B (company of Dong Jin Shi-Mei Ken Co., Ltd of 3 weight portions in each composition by force, positive corrosion-resisting agent), and when using ozone, adopt ozone generator, remain on more than the 60ppm with the ozone content of regulating in the solvent, and after making resist in each test group react more than 6 hours with ozone, the decomposition situation of observation resist.The mechanism of ozone generator is broadly divided into electric discharge, photochemical reaction method, electrolytic process etc., and in this experiment by adopting electric discharge-promptly to insert dielectric at two between with top electrode, and the method that oxygen is converted to ozone in discharge space is come in the container of and sealing big at surface area the contact of micro-bubble shape ozone and is dissolved in the solvent.
The decomposition situation of resist is to observe by the detection of ultraviolet absorptivity.Each test group is detected absorbance under 280nm, 350nm, 550nm wavelength respectively, and represent decomposition situation with respect to benchmark with %.
Be used to inquire into when being applicable to engineering test piece, prepare by following mode to the corrosion situation of metal line.That is, on glass substrate, form the coating of 200 , 2000 thickness successively by molybdenum and aluminium, form wiring pattern by DTFR-3650B afterwards after, carry out etching by wet etching, make test piece 3, and the size of test piece is 2cm * 4cm.Test piece flooded 30 minutes in keeping each composition of 70 ℃ of temperature after, clean, observe the membranous corrosion situation of lower floor by SEM afterwards with pure water.
Embodiment 1
In the present embodiment, estimate ethylene glycol compounds or carbonate compound itself stripping performance to resist.
Use each solvent in the table 1, estimate the membranous stripping ability of above-mentioned first test piece.Particularly in order to observe to the stripping performance of resist situation of change with volatilization, under the forced exhaust state, each stripping solution is continued to maintain 70 ℃ temperature, to estimate stripping performance to each test piece, and detecting the time of peeling off fully, its result is illustrated in the table 1.
Table 1
| Distinguish | Solvent | Test findings | |
| 140℃ | 150℃ | ||
| 1 | DEC | 1 minute | 14 minutes |
| 2 | THFA | 1 minute | 14 minutes |
| 3 | TEG | 1 minute | 15 minutes |
| 4 | BDG | 1 minute | 12 minutes |
| 5 | DMDG | 40 seconds | 10 minutes |
In the table 1, DEC: diethyl carbonate, THFA: tetrahydrofurfuryl acetate, TEG: triethylene glycol, BDG: butyl carbitol, DMDG: diethylene glycol dimethyl ether.
Can find out that from table 1 when using ethylene glycol compounds of the present invention or carbonate compound (experiment 1 is to experiment 5), its resist stripping ability is equally matched.And when the thermmohardening temperature be more than 150 ℃ the time, perhaps during the resist modification, can not use above-mentioned solvent separately, but the thermmohardening temperature is below 140 ℃ the time by dry-etching because the resist stripping performance is outstanding, can be useful in effectively in the various technologies.
Embodiment 2
In the present embodiment, estimate the two-component composition formed by ring compound, ethylene glycol compounds or carbonate compound and amine or organic acid stripping performance and the corrosion situation membranous to lower floor to resist.
Adopt in the following table 2 experiment 1 to the composition of experiment 7, estimate above-mentioned test piece 1 membranous stripping ability and corrosion situation to the test piece 3.Particularly in order to observe to the variation of the stripping performance of resist with volatilization, under the forced exhaust state, stripping solution is maintained 70 ℃ temperature, and estimate stripping performance each test piece, measure the time of peeling off resist fully, and its result is illustrated in the table 2.
Table 2
| Distinguish | Solvent | Amine or organic acid | Experimental result | ||||
| Type | Content (wt%) | Type | Content (wt%) | The corrosion situation | Stripping ability | ||
| 140℃ | 150℃ | ||||||
| 1 | DEC | 99 | PhAA | 1 | X | 30 seconds | 10 minutes |
| 2 | THFA | 99 | SAA | 1 | X | 25 seconds | 10 minutes |
| 3 | TEG | 99 | SAA | 1 | X | 25 seconds | 10 minutes |
| 4 | BDG | 99 | SAA | 1 | X | 25 seconds | 9 minutes |
| 5 | DMDG | 99 | SAA | 1 | X | 20 seconds | 8 minutes |
| 6 | TEG | 99.9 | MEA | 0.1 | X | 20 seconds | 7 minutes |
| 7 | BDG | 99.9 | MEA | 0.1 | X | 15 seconds | 6 minutes |
| 8 | DEC | 99 | MDAEAE | 1 | X | 20 seconds | 7 minutes |
In the above-mentioned table 2, DEC: diethyl carbonate, THFA: tetrahydrofurfuryl acetate, TEG: triethylene glycol, BDG: butyl carbitol, DMDG: diethylene glycol dimethyl ether, PhAA: phthalic anhydride, SAA: succinic anhydride, MEA: monoethanolamine, MDAEA:N-methyl-N (n, n-dimethylaminoethyl)-ethylaminoethanol.
As can be known, when containing amine or organic acid in above-mentioned each solvent, compare with single solvent, its resist stripping performance has had raising, and according to the type of solvent, its stripping performance has less difference.In addition, even add amine or organic acid, can not cause the corrosion membranous to lower floor yet.
Embodiment 3
In the present embodiment, estimate three components compositions formed by ring compound or ethylene glycol compounds, lactone compound and amine or organic acid stripping performance and the corrosion situation membranous to lower floor to resist.
Adopt in the following table 3 experiment 1 to the composition of experiment 6, estimate above-mentioned test piece 1 membranous stripping ability and corrosion situation to the test piece 3.Particularly in order to observe to the stripping performance of resist situation of change with volatilization, under the forced exhaust state, stripping solution is maintained 70 ℃ of temperature, and estimate stripping performance each test piece, measure the time of peeling off resist fully, and its result is illustrated in the table 3.
Table 3
| Distinguish | Solvent | The lactone solvent | Amine or organic acid | Test findings | |||||
| Type | Content (wt%) | Type | Content (wt%) | Type | Content (wt%) | The corrosion situation | Stripping ability | ||
| 140℃ | 150℃ | ||||||||
| 1 | THFA | 79 | GBL | 30 | PhAA | 1 | X | 15 seconds | 7 minutes |
| 2 | THFA | 79 | ABL | 30 | SAA | 1 | X | 15 seconds | 7 minutes |
| 3 | BDG | 79 | GBL | 30 | SAA | 1 | X | 15 seconds | 6.5 divide |
| 4 | BDG | 79 | ABL | 30 | SAA | 1 | X | 15 seconds | 6.5 divide |
| 5 | DMDG | 79 | GBL | 30 | SAA | 1 | X | 10 seconds | 5 minutes |
| 6 | DMDG | 79 | ABL | 30 | SAA | 1 | X | 10 seconds | 5 minutes |
| 7 | DEC | 79 | GBL | 30 | MDAEAE | 1 | X | 10 seconds | 5 minutes |
In the above-mentioned table 3, DEC: diethyl carbonate, THFA: tetrahydrofurfuryl acetate, BDG: butyl carbitol, DMDG: diethylene glycol dimethyl ether, PhAA: phthalic anhydride, SAA: succinic anhydride, GBL: gamma-butyrolacton, ABL:2-aceto butyrolactone, MDAEA:N-methyl-N (n, n-dimethylaminoethyl)-ethylaminoethanol.
As can be known, when containing amine or organic acid in above-mentioned each solvent, compare with single solvent, its resist stripping performance has raising, and according to the type of solvent, its stripping performance has less difference.In addition, even add amine or organic acid, can not cause the corrosion membranous to lower floor yet.Among the present invention, when using lactone compound, why can improve the resist stripping performance, be because lactone compound is the high polarity solvent that polarity concentrates on the dioxygen key.This polar solvent not only helps peeling off of resist, can also reduce the viscosity of peeling off solvent simultaneously.
Embodiment 4
In the present embodiment, estimate the two-component composition formed by oxygenants such as ethylene glycol compounds or carbonate compound and aquae hydrogenii dioxidi, ozone, ammonium salts to the stripping performance of resist and decomposability, the corrosion situation membranous to lower floor.
Adopt in the following table 4 experiment 1 to the composition of experiment 11, estimate above-mentioned test piece 1 membranous stripping ability to the test piece 3.In order to observe the situation of change of resist stripping performance, under the forced exhaust state, each stripping solution is maintained under 70 ℃ of temperature, and evaluation is measured the time of peeling off resist fully to the stripping performance of each test piece.In addition, in order to observe decomposability, under the forced exhaust state to resist, each stripping solution is maintained 70 ℃ temperature, and gather initial and after 6 hours later each peel off solvent, detect ultraviolet absorptivity, with the expression resolution ratio, and its result is illustrated in the table 4.
Table 4
| Distinguish | Solvent | Oxygenant | Test findings | |||||
| Type | Content (wt%) | Type | Content (wt%) | Resolution ratio (%) | Corrosion | Stripping ability | ||
| 140℃ | 150℃ | |||||||
| 1 | DEC | 99.99 | Ozone | 0.01 | 62 | X | 50 seconds | 12 minutes |
| 2 | THFA | 99.99 | Ozone | 0.01 | 63 | X | 50 seconds | 12 minutes |
| 3 | TEG | 99.99 | Ozone | 0.01 | 74 | X | 50 seconds | 13 minutes |
| 4 | BDG | 99.99 | Ozone | 0.01 | 72 | X | 50 seconds | 10 minutes |
| 5 | DMDG | 99.99 | Ozone | 0.01 | 69 | X | 30 seconds | 9 minutes |
| 6 | DEC | 99.99 | Aquae hydrogenii dioxidi | 10 | 62 | X | 1 minute | 14 minutes |
| 7 | THFA | 99.99 | Aquae hydrogenii dioxidi | 10 | 50 | X | 1 minute | 14 minutes |
| 8 | TEG | 90 | Aquae hydrogenii dioxidi | 10 | 72 | X | 1 minute | 15 minutes |
| 9 | BDG | 90 | Aquae hydrogenii dioxidi | 10 | 70 | X | 1 minute | 12 minutes |
| 10 | DMDG | 90 | Aquae hydrogenii dioxidi | 10 | 67 | X | 40 seconds | 10 minutes |
| 11 | BDG | 90 | Hartshorn salt | 10 | 20 | X | 50 seconds | 12 minutes |
In the above-mentioned table 4, DEC: diethyl carbonate, THFA: tetrahydrofurfuryl acetate, TEG: triethylene glycol, BDG: butyl carbitol, DMDG: diethylene glycol dimethyl ether, aquae hydrogenii dioxidi: 35%H
2O
2Aqueous solution, hartshorn salt: 10% ammonium carbonate solution.
In this experiment, ozone passes through the ozone generator sustainable supply, and keeps the concentration of 60ppm in solvent all the time; And aquae hydrogenii dioxidi and ammonium salt do not have sustainable supply, and consume under the effect of heat or decomposition.
As a result, when use ozone, because it obtains lasting supply, compare during therefore with other oxygenants of use, its decomposition efficiency is good, and presents outstanding effect in specific solvent.This ozone, aquae hydrogenii dioxidi and ammonium salt can generate free radical in solvent, and mainly are to be used for decomposing emulsion (PAC), and its decomposition efficiency to resin in the resist composition is lower than the decomposition efficiency to emulsion.Therefore can observe, As time goes on, under the effect of emulsion, the color of composition becomes transparent yellow color gradually by opaque redness.
Ozone is compared with amine or organic acid, equally also can bring the effect that improves the resist stripping performance, but its effect is not as amine or organic acid.Can judge that thus the ozone of sustainable supply arrives behind the substrate and through emulsion in the thermally-denatured resist composition and reacts, and helps to improve the resist stripping performance.
Embodiment 5
In the present embodiment, estimate three components compositions formed by the ring compound with dioxygen key, ethylene glycol compounds or carbonate compound, lactone solvent and oxygenant stripping performance and corrosion situation to resist.
Adopt in the following table 5 experiment 1 to the composition of experiment 13, estimate above-mentioned test piece 1 membranous stripping ability and corrosion situation to the test piece 3.Particularly in order to observe to the stripping performance of resist situation of change with volatilization, under the forced exhaust state, stripping solution is maintained 70 ℃ of temperature, and estimate stripping performance each test piece, measure the time of peeling off resist fully, and its result is illustrated in the table 5.
Table 5
| Distinguish | Solvent | The lactone solvent | Amine or organic acid | Test findings | ||||||
| Type | Content (wt%) | Type | Content (wt%) | Type | Content (wt%) | Resolution ratio (%) | Corrosion | Stripping ability | ||
| 140℃ | 150℃ | |||||||||
| 1 | THFA | 69.99 | GBL | 30 | Ozone | 0.01 | 70 | X | 40 seconds | 11 minutes |
| 2 | THFA | 69.9 | ABL | 30 | Ozone | 0.01 | 69 | X | 40 seconds | 11 minutes |
| 3 | BDG | 69.99 | GBL | 30 | Ozone | 0.01 | 82 | X | 40 seconds | 10 minutes |
| 4 | BDG | 69.99 | ABL | 30 | Ozone | 0.01 | 83 | X | 40 seconds | 10 minutes |
| 5 | DMDG | 69.99 | GBL | 30 | Ozone | 0.01 | 75 | X | 25 seconds | 9 minutes |
| 6 | DMDG | 69.99 | ABL | 30 | Ozone | 0.01 | 76 | X | 25 seconds | 9 minutes |
| 7 | THFA | 60 | GBL | 30 | Aquae hydrogenii dioxidi | 10 | 65 | X | 50 seconds | 12 minutes |
| 8 | THFA | 60 | ABL | 30 | Aquae hydrogenii dioxidi | 10 | 67 | X | 50 seconds | 12 minutes |
| 9 | BDG | 60 | GBL | 30 | Aquae hydrogenii dioxidi | 10 | 79 | X | 50 seconds | 11 minutes |
| 10 | BDG | 60 | ABL | 30 | Aquae hydrogenii dioxidi | 10 | 78 | X | 50 seconds | 11 minutes |
| 11 | DMDG | 60 | GBL | 30 | Aquae hydrogenii dioxidi | 10 | 73 | X | 30 seconds | 10 minutes |
| 12 | DMDG | 60 | ABL | 30 | Aquae hydrogenii dioxidi | 10 | 72 | X | 30 seconds | 10 minutes |
| 13 | BDG | 60 | GBL | 30 | Hartshorn salt | 10 | 54 | X | 40 seconds | 11 minutes |
In the above-mentioned table 5, THFA: tetrahydrofurfuryl acetate, BDG: butyl carbitol, DMDG: diethylene glycol dimethyl ether, GBL: gamma-butyrolacton, ABL:2-aceto butyrolactone, aquae hydrogenii dioxidi: 35%H
2O
2Aqueous solution, hartshorn salt: 10% ammonium carbonate solution.
Can find out from The above results, in solvent, behind the adding lactone compound, can improve resist stripping performance and decomposition efficiency.
Embodiment 6
In the present embodiment, estimate three components compositions formed by oxygenants such as the ring compound with dioxygen key, ethylene glycol compounds or carbonate compound, amine or organic acid and aquae hydrogenii dioxidi, ozone, ammonium salts to the stripping performance of resist, corrosion situation and to the decomposability of resist.
Adopt in the following table 6 experiment 1 to the composition of experiment 12, estimate above-mentioned test piece 1 membranous stripping ability to the test piece 3.In order to observe the situation of change of resist stripping performance, under the forced exhaust state, each stripping solution is maintained under 70 ℃ of temperature, and evaluation is measured the time of peeling off resist fully to the stripping performance of each test piece.In addition, in order to observe decomposability, under the forced exhaust state to resist, each stripping solution is maintained 70 ℃ temperature, and gather initial and after 6 hours later each peel off solvent, detect ultraviolet absorptivity, with the expression resolution ratio, and its result is illustrated in the table 6.
Table 6
| Distinguish | Solvent | Amine or organic acid | Oxygenant | Test findings | |||||
| Type | Content | Type | Content | Type | Content | Resolution ratio | Rotten | Stripping ability | |
| (wt％) | (wt％) | (wt％) | (％) | Erosion | 140℃ | 150℃ | ||||
| 1 | DEC | 98.99 | PhAA | 1 | Ozone | 0.01 | 77 | X | 25 seconds | 9 minutes |
| 2 | THFA | 98.99 | SAA | 1 | Ozone | 0.01 | 78 | X | 20 seconds | 9 minutes |
| 3 | TEG | 99.89 | MEA | 0.1 | Ozone | 0.01 | 81 | X | 15 seconds | 8 minutes |
| 4 | BDG | 99.89 | MEA | 0.1 | Ozone | 0.01 | 89 | X | 15 seconds | 6 minutes |
| 5 | BDG | 99.89 | MDAEAE | 0.1 | Ozone | 0.01 | 79 | X | 15 seconds | 5 minutes |
| 6 | DMDG | 98.99 | SAA | 1 | Ozone | 0.01 | 82 | X | 15 seconds | 7 minutes |
| 7 | DEC | 89 | SAA | 1 | Aquae hydrogenii dioxidi | 0.01 | 76 | X | 30 seconds | 10 minutes |
| 8 | THFA | 89 | SAA | 1 | Aquae hydrogenii dioxidi | 0.01 | 75 | X | 25 seconds | 10 minutes |
| 9 | TEG | 89 | SAA | 1 | Aquae hydrogenii dioxidi | 10 | 80 | X | 25 seconds | 10 minutes |
| 10 | BDG | 89 | SAA | 1 | Aquae hydrogenii dioxidi | 10 | 87 | X | 20 seconds | 9 minutes |
| 11 | DMDG | 89 | SAA | 1 | Aquae hydrogenii dioxidi | 10 | 80 | X | 20 seconds | 8 minutes |
| 12 | BDG | 89 | SAA | 1 | Hartshorn salt | 10 | 56 | X | 25 seconds | 10 minutes |
| 13 | BDG | 89.99 | - | - | Aquae hydrogenii dioxidi | 10 | 92 | X | 50 seconds | 14 minutes |
| Ozone | 0.01 |
In the above-mentioned table 6, DEC: diethyl carbonate, THFA: tetrahydrofurfuryl acetate, TEG: triethylene glycol, BDG: butyl carbitol, DMDG: diethylene glycol dimethyl ether, aquae hydrogenii dioxidi: 35%H
2O
2Aqueous solution, hartshorn salt: 10% ammonium carbonate solution, MDAEA:N-methyl-N (n, n-dimethylaminoethyl)-ethylaminoethanol.
Can find out that from table 6 amine in each composition or organic acid can improve the build environment of free radical by the pH value of adjusting solvent, with about the decomposition efficiency 15-20% that improves resist, tangible improvement have been arranged on the resist stripping performance especially.
In addition, use ozone and aquae hydrogenii dioxidi at the same time, and when not using amine or organic acid, compare when using amine or organic acid, have higher decomposition efficiency.As can be known, because the interaction of aquae hydrogenii dioxidi and ozone has the very strong effect that multiplies each other.
Embodiment 7
In the present embodiment, estimate four components compositions formed by oxygenants such as the ring compound with dioxygen key, ethylene glycol compounds or carbonate compound and lactone compound, amine or organic acid and aquae hydrogenii dioxidi, ozone, ammonium salts to the stripping performance of resist, corrosion situation and to the decomposability of resist.
Adopt in the following table 7 experiment 1 to the composition of experiment 12, estimate above-mentioned test piece 1 membranous stripping ability to the test piece 3.In order to observe the situation of change of resist stripping performance, under the forced exhaust state, each stripping solution is maintained 70 ℃ of temperature, and estimate stripping performance each test piece, measure the time of peeling off resist fully.In addition, in order to observe decomposability, under the forced exhaust state to resist, each stripping solution is maintained 70 ℃ temperature, and gather initial and after 6 hours later each peel off solvent, detect ultraviolet absorptivity, with the expression resolution ratio, and its result is illustrated in the table 7.
Table 7
| Distinguish | Solvent | Lactone compound | Amine or organic acid | Oxygenant | ||||
| Type | Content (wt%) | Type | Content (wt%) | Type | Content (wt%) | Type | Content (wt%) | |
| 1 | THFA | 68.99 | GBL | 30 | PhAA | 1 | Ozone | 0.01 |
| 2 | THFA | 68.99 | ABL | 30 | SAA | 1 | Ozone | 0.01 |
| 3 | BDG | 68.99 | GBL | 30 | SAA | 1 | Ozone | 0.01 |
| 4 | BDG | 68.99 | ABL | 30 | SAA | 1 | Ozone | 0.01 |
| 5 | DMDG | 68.99 | GBL | 30 | SAA | 1 | Ozone | 0.01 |
| 6 | DMDG | 68.99 | ABL | 30 | SAA | 1 | Ozone | 0.01 |
| 7 | BDG | 68.99 | GBL | 30 | MDAEAE | 1 | Ozone | 0.01 |
| 8 | THFA | 59 | GBL | 30 | SAA | 1 | Aquae hydrogenii dioxidi | 10 |
| 9 | THFA | 59 | ABL | 30 | PhAA | 1 | Aquae hydrogenii dioxidi | 10 |
| 10 | BDG | 59 | GBL | 30 | PhAA | 1 | Aquae hydrogenii dioxidi | 10 |
| 11 | BDG | 59 | ABL | 30 | PhAA | 1 | Aquae hydrogenii dioxidi | 10 |
| 12 | DMDG | 59 | GBL | 30 | PhAA | 1 | Aquae hydrogenii dioxidi | 10 |
| 13 | DMDG | 59 | ABL | 30 | PhAA | 1 | Aquae hydrogenii dioxidi | 10 |
| 14 | BDG | 59 | GBL | 30 | PhAA | 1 | Hartshorn salt | 10 |
| 15 | BDG | 59.99 | GBL | 30 | Aquae hydrogenii dioxidi | 10 | Ozone | 0.01 |
In the above-mentioned table 7, THFA: tetrahydrofurfuryl acetate, BDG: butyl carbitol, DMDG: diethylene glycol dimethyl ether, GBL: gamma-butyrolacton, ABL:2-aceto butyrolactone, aquae hydrogenii dioxidi: 35%H
2O
2Aqueous solution, hartshorn salt: 10% ammonium carbonate solution.
Table 8
| Distinguish | Test findings | |||
| Resolution ratio (%) | Corrosion | Stripping ability | ||
| 140℃ | 150℃ | |||
| 1 | 85 | X | 10 seconds | 6 minutes |
| 2 | 83 | X | 10 seconds | 6 minutes |
| 3 | 93 | X | 10 seconds | 6 minutes |
| 4 | 95 | X | 10 seconds | 6 minutes |
| 5 | 88 | X | 5 seconds | 4.5 divide |
| 6 | 87 | X | 5 seconds | 4.5 divide |
| 7 | 83 | X | 15 seconds | 7 minutes |
| 8 | 81 | X | 10 seconds | 6 minutes |
| 9 | 83 | X | 15 seconds | 7 minutes |
| 10 | 92 | X | 15 seconds | 6.5 divide |
| 11 | 91 | X | 15 seconds | 6.5 divide |
| 12 | 85 | X | 10 seconds | 5 minutes |
| 13 | 84 | X | 10 seconds | 5 minutes |
| 14 | 60 | X | 15 seconds | 6.5 divide |
| 15 | 98 | X | 40 seconds | 10 minutes |
To sum up, corrosion inhibitor stripper composition of the present invention has outstanding peeling off and decomposability to resist in the technology, and substrate is had outstanding clean effect.
Claims (30)
1. corrosion inhibitor stripper composition, it comprises, is selected from the compound of being represented by following Chemical formula 1; Ring compound by Chemical formula 2, chemical formula 3 or chemical formula 4 expressions; By at least a compound in the ethylene glycol compounds of chemical formula 5 expressions,
[Chemical formula 1] [Chemical formula 2]
[chemical formula 3] [chemical formula 4]
[chemical formula 5]
In the above-mentioned chemical formula, R, R ', R ", R represents the alkyl of hydrogen, hydroxyl, C1-C10, the chain triacontanol base of C1-C10 respectively, perhaps the alkyl acetate of C1-C10 (alkyl acetate group); R
3Expression hydroxyl, the alkyl of C1-C10 or the alkyl acetate (alkyl acetate group) of C1-C10, wherein, n represents the integer of 1-12.
2. corrosion inhibitor stripper composition according to claim 1 is characterized in that:
Described ring compound is at least a compound that is selected from cyclopentanone, methyl-cyclopentanone, tetrahydrofurfuryl acetate, tetrahydrochysene-4H-pyrans-4-ketone and the oxinane-2-methyl alcohol.
3. corrosion inhibitor stripper composition according to claim 1 is characterized in that:
Above-mentioned ethylene glycol compounds is at least a compound that is selected from Ethylenimine, diglycol, triethylene glycol, tetraethylene glycol, ethylene glycol monomethyl ether, ethylene glycol ethyl ether, butyl glycol ether, diethylene glycol methyl ether, DGDE, butyl carbitol, triethylene glycol methyl ether, triethylene glycol ether, triethylene glycol butyl ether and the diethylene glycol dimethyl ether.
4. corrosion inhibitor stripper composition according to claim 1 is characterized in that, also comprises:
Amine or organic acid; Oxygenant; Lactone solvent by chemical formula 6 or chemical formula 7 expressions; Perhaps its potpourri,
[chemical formula 6]
[chemical formula 7]
In the above-mentioned chemical formula, R represents the alkyl of hydrogen, hydroxyl, C1-C10, the chain triacontanol base of C1-C10 or the alkyl acetate base of C1-C10 respectively.
5. corrosion inhibitor stripper composition according to claim 4, it is characterized in that: be in weight portion, based on total composition 100 weight portions, what contain the 70-99.9 weight portion is selected from the compound in ring compound and the ethylene glycol compounds and the amine or the organic acid of 0.1-30 weight portion.
6. corrosion inhibitor stripper composition according to claim 4, it is characterized in that: be in weight portion, based on total composition 100 weight portions, what contain the 90-99.99 weight portion is selected from the compound in ring compound and the ethylene glycol compounds and the oxygenant of 0.01-10 weight portion.
7. corrosion inhibitor stripper composition according to claim 6, it is characterized in that: be in weight portion, based on total composition 100 weight portions, contain the compound that is selected from ring compound and ethylene glycol compounds and the ozone of 0.001-1 weight portion and the outer oxygenant of deozonize of 0.5-10 weight portion of 90-99.499 weight portion.
8. corrosion inhibitor stripper composition according to claim 4, it is characterized in that: be in weight portion, based on total composition 100 weight portions, what contain the 70-98.99 weight portion is selected from the compound in ring compound and the ethylene glycol compounds, the amine of 1-30 weight portion or the oxygenant of organic acid and 0.01-10 weight portion.
9. corrosion inhibitor stripper composition according to claim 4, it is characterized in that: be in weight portion, based on total composition 100 weight portions, contain the compound that is selected from ring compound and ethylene glycol compounds of 70-89.9 weight portion, the lactone compound of 10-50 weight portion and the amine or the organic acid of 0.1-30 weight portion.
10. corrosion inhibitor stripper composition according to claim 4, it is characterized in that: be in weight portion, based on total composition 100 weight portions, contain the compound that is selected from ring compound and ethylene glycol compounds of 70-89.99 weight portion, the lactone compound of 10-50 weight portion and the oxygenant of 0.01-10 weight portion.
11. corrosion inhibitor stripper composition according to claim 4, it is characterized in that: be in weight portion, based on total composition 100 weight portions, contain the compound that is selected from ring compound and ethylene glycol compounds of 70-88.99 weight portion, the lactone compound of 10-50 weight portion, the amine of 1-30 weight portion or the oxygenant of organic acid and 0.01-10 weight portion.
12. corrosion inhibitor stripper composition according to claim 11, it is characterized in that: be in weight portion, based on total composition 100 weight portions, contain the oxygenant outside the deozonize of the ozone of lactone compound, 0.01-1 weight portion of the compound that is selected from ring compound and ethylene glycol compounds, the 10-50 weight portion of 70-89.899 weight portion and 0.5-10 weight portion.
13. corrosion inhibitor stripper composition according to claim 4 is characterized in that:
Described amine is to be selected from monoethanolamine, Mono Isopropylamine, amino ethoxy ethanol, methylethanolamine, diethanolamine, triethanolamine, dimethylethanolamine, diethyl carbinol amine, methyldiethanolamine 1,1-(2-hydroxyethyl)-4-methyl piperazine, N-methyl-N (n, the n-dimethylaminoethyl)-ethylaminoethanol, N-methyl-N (n, the n-dimethylaminoethyl)-at least a in amino butanol, 1-(n, n-dimethyl) 2-(2-hydroxyl-oxethyl) ethamine, hydroxyethyl piperazine, aminoethyl piperazine and the aminopropyl morphine.
14. corrosion inhibitor stripper composition according to claim 4 is characterized in that:
Described organic acid is to be selected from least a in benzoic acid, methyl benzoic acid, hydroxybenzoic acid, aminobenzoic acid, citric acid, succinic acid, hydroxysuccinic acid, maleic acid, salicylic acid, oxalic acid, phthalic acid, itaconic acid, succinic anhydride, phthalic anhydride and the itaconic anhydride.
15. corrosion inhibitor stripper composition according to claim 4 is characterized in that:
Above-mentioned oxygenant is to be selected from least a in ozone, aquae hydrogenii dioxidi, tributyl hydrogen peroxide, hydrogen peroxide benzoyl, carbamide peroxide, ammonium nitrate, ammonium formate, hartshorn salt, ammonium bicarbonate, ammonium acetate, ammonium bifluoride, ammonium thiocyanate, ammonium sulfate, ammonium sulfide, ammonium oxalate, the ATS (Ammonium thiosulphate).
16. corrosion inhibitor stripper composition according to claim 4 is characterized in that:
Above-mentioned lactone compound is to be selected from gamma-butyrolacton, γ-methylene gamma-butyrolacton, the Alpha-Methyl gamma-butyrolacton, the alpha-methylene gamma-butyrolacton, the 2-aceto butyrolactone, γ-hexanol lactone (gamma-hexanolactone), δ-hexanol lactone (delta-hexanolactone), γ-nonyl alcohol lactone (gamma-nonanol lactone), δ-octanol lactone (delta-octanolactone), gamma-valerolactone (gamma-valerolactone), at least a in δ-Wu Neizhi (delta-valerolactone) and δ-hexanol lactone (delta-hexanonelactone).
17. a corrosion inhibitor stripper composition, it comprises;
Carbonate compound by following chemical formula 8 expressions; And
Amine or organic acid, oxygenant, by lactone solvent or its potpourri of following chemical formula 6 or chemical formula 7 expressions,
[chemical formula 8]
In the described chemical formula 8, R
1The alkyl acetate base of alkyl, benzyl ester, phenyl or the C1-C10 of expression C1-C10, R
2Alkyl, benzyl ester, phenyl, the alkyl acetate base of C1-C10 or the alkyl carbonate of C1-C10 of expression C1-C10.
[chemical formula 6]
[chemical formula 7]
In described chemical formula 6, the chemical formula 7, R represents the alkyl of hydrogen, hydroxyl, C1-C10, the chain triacontanol base of C1-C10 or the alkyl acetate base of C1-C10 respectively.
18. corrosion inhibitor stripper composition according to claim 17 is characterized in that: be, to contain the carbonate compound of 70-99.9 weight portion and the amine or the organic acid of 0.1-30 weight portion in weight portion based on total composition 100 weight portions.
19. corrosion inhibitor stripper composition according to claim 17 is characterized in that: be, to contain the carbonate compound of 90-99.99 weight portion and the oxygenant of 0.01-10 weight portion in weight portion based on total composition 100 weight portions.
20. corrosion inhibitor stripper composition according to claim 19, it is characterized in that: be in weight portion, based on total composition 100 weight portions, contain the oxygenant outside the deozonize of the ozone of carbonate compound, 0.001-1 weight portion of 90-99.499 weight portion and 0.5-10 weight portion.
21. corrosion inhibitor stripper composition according to claim 17, it is characterized in that: be in weight portion, based on total composition 100 weight portions, contain the carbonate compound of 70-98.99 weight portion, the amine of 1-30 weight portion or the oxygenant of organic acid and 0.01-10 weight portion.
22. corrosion inhibitor stripper composition according to claim 17, it is characterized in that: be in weight portion, based on total composition 100 weight portions, contain the carbonate compound of 70-89.9 weight portion, the lactone compound of 10-50 weight portion and the amine or the organic acid of 0.1-30 weight portion.
23. corrosion inhibitor stripper composition according to claim 17, it is characterized in that: be in weight portion, based on total composition 100 weight portions, contain the compound that is selected from ring compound and ethylene glycol compounds of 70-89.99 weight portion, the lactone compound of 10-50 weight portion and the oxygenant of 0.01-10 weight portion.
24. corrosion inhibitor stripper composition according to claim 17, it is characterized in that: be in weight portion, based on total composition 100 weight portions, contain the carbonate compound of 70-88.99 weight portion, the lactone compound of 10-50 weight portion, the amine of 1-30 weight portion or the oxygenant of organic acid and 0.01-10 weight portion.
25. corrosion inhibitor stripper composition according to claim 17, it is characterized in that: be in weight portion, based on total composition 100 weight portions, contain the oxygenant outside the deozonize of the ozone of lactone compound, 0.01-1 weight portion of carbonate compound, the 10-50 weight portion of 70-89.899 weight portion and 0.5-10 weight portion.
26. corrosion inhibitor stripper composition according to claim 17 is characterized in that:
Described carbonate compound is to be selected from least a in dimethyl benzyl, diethyl carbonate, the dicarbonic acid diethyl ester.
27. corrosion inhibitor stripper composition according to claim 17 is characterized in that:
Described amine is to be selected from monoethanolamine, Mono Isopropylamine, amino ethoxy ethanol, methylethanolamine, diethanolamine, triethanolamine, dimethylethanolamine, diethyl carbinol amine, methyldiethanolamine, 1-(2-hydroxyethyl)-4-methyl piperazine, N-methyl-N (n, the n-dimethylaminoethyl)-ethylaminoethanol, N-methyl-N (n, the n-dimethylaminoethyl)-at least a in amino butanol, 1-(n, n-dimethyl) 2-(2-hydroxyl-oxethyl) ethamine, hydroxyethyl piperazine, aminoethyl piperazine and the aminopropyl morphine.
28. corrosion inhibitor stripper composition according to claim 17 is characterized in that:
Described organic acid is to be selected from least a in benzoic acid, methyl benzoic acid, hydroxybenzoic acid, aminobenzoic acid, citric acid, succinic acid, hydroxysuccinic acid, maleic acid, salicylic acid, oxalic acid, phthalic acid, itaconic acid, succinic anhydride, phthalic anhydride and the itaconic anhydride.
29. corrosion inhibitor stripper composition according to claim 17 is characterized in that:
Above-mentioned oxygenant is to be selected from least a in ozone, hydrogen peroxide, tributyl hydrogen peroxide, hydrogen peroxide benzoyl, carbamide peroxide, ammonium nitrate, ammonium formate, hartshorn salt, ammonium bicarbonate, ammonium acetate, ammonium bifluoride, ammonium thiocyanate, ammonium sulfate, ammonium sulfide, ammonium oxalate, the ATS (Ammonium thiosulphate).
30. corrosion inhibitor stripper composition according to claim 17 is characterized in that:
Above-mentioned lactone compound is to be selected from least a in gamma-butyrolacton, γ-methylene gamma-butyrolacton, Alpha-Methyl gamma-butyrolacton, alpha-methylene gamma-butyrolacton, 2-aceto butyrolactone, δ-hexanol lactone, γ-nonyl alcohol lactone, δ-octanol lactone, gamma-valerolactone, δ-Wu Neizhi and the δ-hexanol lactone.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020060002683 | 2006-01-10 | ||
| KR1020060002683A KR20070074746A (en) | 2006-01-10 | 2006-01-10 | Composition for removing a (photo)resist |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101025579A true CN101025579A (en) | 2007-08-29 |
Family
ID=38343247
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2007100007015A Pending CN101025579A (en) | 2006-01-10 | 2007-01-10 | Composition for removing a resist |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2007188077A (en) |
| KR (1) | KR20070074746A (en) |
| CN (1) | CN101025579A (en) |
| TW (1) | TW200727092A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115418647A (en) * | 2022-08-19 | 2022-12-02 | 广东红日星实业有限公司 | Wax removing water and preparation method and application thereof |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101668063B1 (en) * | 2013-05-07 | 2016-10-20 | 주식회사 엘지화학 | Stripper composition for removing photoresist and stripping mthod of photoresist using the same |
| BR112016024205B1 (en) * | 2014-04-16 | 2023-10-17 | Ecolab Inc. | CLEANING COMPOSITIONS AND METHOD FOR REMOVING AN ACRYLIC-BASED POLYMER MATERIAL FROM TABLET COATINGS |
| KR102317153B1 (en) * | 2016-06-15 | 2021-10-26 | 동우 화인켐 주식회사 | Resist stripper composition |
| KR102446132B1 (en) * | 2016-09-16 | 2022-09-22 | 닛산 가가쿠 가부시키가이샤 | protective film forming composition |
-
2006
- 2006-01-10 KR KR1020060002683A patent/KR20070074746A/en not_active Application Discontinuation
-
2007
- 2007-01-09 JP JP2007001604A patent/JP2007188077A/en not_active Withdrawn
- 2007-01-10 CN CNA2007100007015A patent/CN101025579A/en active Pending
- 2007-01-10 TW TW096100978A patent/TW200727092A/en unknown
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115418647A (en) * | 2022-08-19 | 2022-12-02 | 广东红日星实业有限公司 | Wax removing water and preparation method and application thereof |
| CN115418647B (en) * | 2022-08-19 | 2024-01-05 | 广东红日星实业有限公司 | Wax removing water and preparation method and application thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200727092A (en) | 2007-07-16 |
| JP2007188077A (en) | 2007-07-26 |
| KR20070074746A (en) | 2007-07-18 |
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Open date: 20070829 |