CN101013795A - 模拟外腔激光器 - Google Patents

模拟外腔激光器 Download PDF

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Publication number
CN101013795A
CN101013795A CN 200610066359 CN200610066359A CN101013795A CN 101013795 A CN101013795 A CN 101013795A CN 200610066359 CN200610066359 CN 200610066359 CN 200610066359 A CN200610066359 A CN 200610066359A CN 101013795 A CN101013795 A CN 101013795A
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CN
China
Prior art keywords
ecl
external cavity
cavity laser
analog external
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN 200610066359
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English (en)
Chinese (zh)
Inventor
弗拉迪米尔·库珀尔施米特
弗兰斯·库斯纳迪
约翰·梅杰
萨贝尔·西亚拉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
K2 OPTRONICS A DELAWARE CORP
K2 Optronics Inc
Original Assignee
K2 OPTRONICS A DELAWARE CORP
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/097,745 external-priority patent/US20050281298A1/en
Application filed by K2 OPTRONICS A DELAWARE CORP filed Critical K2 OPTRONICS A DELAWARE CORP
Publication of CN101013795A publication Critical patent/CN101013795A/zh
Pending legal-status Critical Current

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CN 200610066359 2005-04-01 2006-03-30 模拟外腔激光器 Pending CN101013795A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/097,745 2005-04-01
US11/097,745 US20050281298A1 (en) 2004-04-02 2005-04-01 Analog external cavity laser

Publications (1)

Publication Number Publication Date
CN101013795A true CN101013795A (zh) 2007-08-08

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ID=37477299

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 200610066359 Pending CN101013795A (zh) 2005-04-01 2006-03-30 模拟外腔激光器

Country Status (2)

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JP (1) JP2006310863A (ja)
CN (1) CN101013795A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102906949A (zh) * 2012-08-07 2013-01-30 华为技术有限公司 外调制激光器、无源光通信设备及系统
CN106129806A (zh) * 2016-08-29 2016-11-16 中国科学院半导体研究所 基于外腔式窄线宽分布式布拉格反射半导体激光器

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8330489B2 (en) * 2009-04-28 2012-12-11 International Business Machines Corporation Universal inter-layer interconnect for multi-layer semiconductor stacks
JP5949384B2 (ja) * 2012-09-24 2016-07-06 株式会社島津製作所 レーザ装置の製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102906949A (zh) * 2012-08-07 2013-01-30 华为技术有限公司 外调制激光器、无源光通信设备及系统
WO2014022971A1 (zh) * 2012-08-07 2014-02-13 华为技术有限公司 外调制激光器、无源光通信设备及系统
CN102906949B (zh) * 2012-08-07 2016-09-28 华为技术有限公司 外调制激光器、无源光通信设备及系统
CN106129806A (zh) * 2016-08-29 2016-11-16 中国科学院半导体研究所 基于外腔式窄线宽分布式布拉格反射半导体激光器

Also Published As

Publication number Publication date
JP2006310863A (ja) 2006-11-09

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WD01 Invention patent application deemed withdrawn after publication

Open date: 20070808