CN100590533C - 检测梯度滤波器光强分布的方法及提高线宽一致性的方法 - Google Patents
检测梯度滤波器光强分布的方法及提高线宽一致性的方法 Download PDFInfo
- Publication number
- CN100590533C CN100590533C CN200710044801A CN200710044801A CN100590533C CN 100590533 C CN100590533 C CN 100590533C CN 200710044801 A CN200710044801 A CN 200710044801A CN 200710044801 A CN200710044801 A CN 200710044801A CN 100590533 C CN100590533 C CN 100590533C
- Authority
- CN
- China
- Prior art keywords
- light distribution
- mask plate
- gradient filter
- live width
- semiconductor substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
Abstract
Description
Claims (14)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200710044801A CN100590533C (zh) | 2007-08-09 | 2007-08-09 | 检测梯度滤波器光强分布的方法及提高线宽一致性的方法 |
US12/172,959 US20090042145A1 (en) | 2007-08-09 | 2008-07-14 | Method for Detecting Light Intensity Distribution for Gradient Filter and Method for Improving Line Width Consistency |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200710044801A CN100590533C (zh) | 2007-08-09 | 2007-08-09 | 检测梯度滤波器光强分布的方法及提高线宽一致性的方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101364047A CN101364047A (zh) | 2009-02-11 |
CN100590533C true CN100590533C (zh) | 2010-02-17 |
Family
ID=40346869
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200710044801A Expired - Fee Related CN100590533C (zh) | 2007-08-09 | 2007-08-09 | 检测梯度滤波器光强分布的方法及提高线宽一致性的方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US20090042145A1 (zh) |
CN (1) | CN100590533C (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102543684A (zh) * | 2011-11-11 | 2012-07-04 | 上海华力微电子有限公司 | 集线宽和套刻精度测量的图形结构设计 |
TW201537304A (zh) * | 2014-03-28 | 2015-10-01 | Nuvoton Technology Corp | 曝光方法、光罩及晶片基板 |
CN105116690B (zh) * | 2015-09-15 | 2017-07-14 | 上海和辉光电有限公司 | 一种显示屏阵列基板加工工艺 |
CN106597732A (zh) * | 2017-02-05 | 2017-04-26 | 武汉华星光电技术有限公司 | 液晶面板及其光阻图案形成方法 |
CN109491197A (zh) * | 2018-11-30 | 2019-03-19 | 上海华力微电子有限公司 | 一种掩膜版及镜头照明均一性的检测方法 |
CN109799398B (zh) * | 2018-11-30 | 2020-10-02 | 无锡市好达电子股份有限公司 | 一种滤波器探针测试方法 |
CN110429047B (zh) * | 2019-06-28 | 2021-06-18 | 福建省福联集成电路有限公司 | 一种砷化镓集成电路制造黄光区自动化系统和装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6552776B1 (en) * | 1998-10-30 | 2003-04-22 | Advanced Micro Devices, Inc. | Photolithographic system including light filter that compensates for lens error |
US8189195B2 (en) * | 2007-05-09 | 2012-05-29 | Asml Netherlands B.V. | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
-
2007
- 2007-08-09 CN CN200710044801A patent/CN100590533C/zh not_active Expired - Fee Related
-
2008
- 2008-07-14 US US12/172,959 patent/US20090042145A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
CN101364047A (zh) | 2009-02-11 |
US20090042145A1 (en) | 2009-02-12 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Effective date: 20111123 |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20111123 Address after: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Co-patentee after: Semiconductor Manufacturing International (Beijing) Corporation Patentee after: Semiconductor Manufacturing International (Shanghai) Corporation Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100217 Termination date: 20180809 |
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CF01 | Termination of patent right due to non-payment of annual fee |