CN100586882C - Method of producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method - Google Patents
Method of producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method Download PDFInfo
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- CN100586882C CN100586882C CN200710020783A CN200710020783A CN100586882C CN 100586882 C CN100586882 C CN 100586882C CN 200710020783 A CN200710020783 A CN 200710020783A CN 200710020783 A CN200710020783 A CN 200710020783A CN 100586882 C CN100586882 C CN 100586882C
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- melting furnace
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- quartz glass
- induction melting
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
- C03B17/04—Forming tubes or rods by drawing from stationary or rotating tools or from forming nozzles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/02—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in electric furnaces, e.g. by dielectric heating
- C03B5/027—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in electric furnaces, e.g. by dielectric heating by passing an electric current between electrodes immersed in the glass bath, i.e. by direct resistance heating
- C03B5/0275—Shaft furnaces
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/167—Means for preventing damage to equipment, e.g. by molten glass, hot gases, batches
- C03B5/1672—Use of materials therefor
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
A continuous method of manufacturing large aperture transparent quartz glass tube for integrated circuit, which is characterized in that high pure quartz sand of quartz glass material is added in a continuous melting furnace, through electric heating and fusing, fused quartz glass liquid is drew as large aperture transparent quartz glass tubes through a former, a material stage and a tube drawingmachine; the high pure quartz sand added in the continuous melting furnace, before heating and fusing, preheating the high pure quartz sand 120-180 minutes to 550-650 DEG C, then heating and fusing; the upper part of the continuous melting furnace tungsten-molybdenum crucible is a preheating section, the lower part is a fusing section, the preheating treatment is processed in the preheating section; the diameter of the tungsten-molybdenum crucible is 330-370 mm, height is 1450-1500 mm; the fusing temperature in the continuous melting furnace is 2050-2150 DEG C; the diameter of the former is 190-210 mm; the current passing through the continuous melting furnace for electric heating molybdenum electrode is 210-220 A, the voltage is 19-20 V. The method can manufacture quartz tubes with wide gauge and improve product quality.
Description
Technical field
The present invention relates to the method for a kind of production method of quartz glass tube, particularly a kind of producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method.
Background technology
The production method of quartz glass tube of the prior art can only be produced diameter and be about 80mm, wall thickness is the qualified quartz glass tube of 4mm, if will pull out the bigger slightly quartz glass tube of diameter by force, then the bubble gas line of the quartz glass tube of being pulled out is many, and its quality and specification all can not satisfy the integrated circuit technique requirement.
Summary of the invention
Technical problem to be solved by this invention is at the deficiencies in the prior art, and the method that provides a kind of new continuous smelting method to produce transparent quartz glass tube can be produced that suitable unicircuit is used, heavy caliber, quartz glass tube that bubble gas line is few with this method.
Technical problem to be solved by this invention is to realize by following technical scheme.The present invention is a kind of method of producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method, be characterized in, the raw material of quartz glass glass sand is dropped in the continuous induction melting furnace, by the electrically heated fusion, the silica glass liquid after the fusion is drawn into large diameter transparent quartz glass tube through former, material platform and tube drawing bench; The raw material glass sand carries out 120-180 minute thermal pretreatment to glass sand after dropping into continuous induction melting furnace, before the heating and melting, glass sand is preheated to 550-650 ℃, carries out heating and melting again; Described continuous induction melting furnace tungsten crucible top is preheating section, and the bottom is a melt zone, and thermal pretreatment is carried out in the preheating section of continuous induction melting furnace tungsten crucible; The diameter of described tungsten crucible is 330-370mm, highly is 1450-1500mm; Melt temperature in the continuous induction melting furnace is 2050-2150 ℃; The diameter of described former is 190-210mm; The material platform diameter of continuous induction melting furnace is 210-215mm; The electric current that melt zone feeds the electrically heated molybdenum electrode of continuous induction melting furnace is 210-220A, and voltage is 19-20V.
Technical problem to be solved by this invention can also further realize by following technical scheme.The method of above-described producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method is characterized in, the diameter of described tungsten crucible is 350mm, highly is 1500mm; Melt temperature in the continuous induction melting furnace is 2100 ℃; The diameter of former is 200mm; The material platform diameter of bore of continuous induction melting furnace is 212mm; The electric current that melt zone feeds the electrically heated molybdenum electrode is 215A, and voltage is 19V.
Technical problem to be solved by this invention can also further realize by following technical scheme.The method of above-described producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method is characterized in, the described thermal pretreatment time is 140-160 minute, and glass sand is preheated to 600 ℃.
Technical problem to be solved by this invention can also further realize by following technical scheme.The method of above-described producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method is characterized in, the height of the preheating section of tungsten crucible is 250-350mm.
Technical problem to be solved by this invention can also further realize by following technical scheme.The method of above-described producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method is characterized in, the heating element tungsten net height degree of tungsten crucible periphery is 850-950mm, and described tungsten net upwards is provided with from the beginning of tungsten crucible bottom.
Technical problem to be solved by this invention can also further realize by following technical scheme.The method of above-described producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method; be characterized in; the shielding gas that is charged in quartz continuous melting furnace during production is hydrogen and nitrogen; the proportioning of hydrogen and nitrogen is 4.5-5.5: 1.8-2.2, and hydrogen and nitrogen gas pressure are respectively 4.5-5.5mpa and 1.8-2.2mpa.Like this, help improving the transparency of finished product quartz glass tube, and protect tungsten crucible, tungsten net and molybdenum electrode well, anti-oxidation also plays combustion-supporting effect.
Technical problem to be solved by this invention can also further realize by following technical scheme.The method of above-described producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method is characterized in, the hydrogen that is charged into and the proportioning of nitrogen are 5: 2, and hydrogen and nitrogen gas pressure are respectively 5.0mpa and 2.0mpa.
Compared with prior art, the inventive method has the following advantages: increased pre-heating technique, improved the melting condition of raw material glass sand, improved the quality of product; Increased the pressure of shaping glass metal, strengthened the degassing function of silica glass liquid in shaping, reached optimization fusing, clarification, convection current homogenization process, reduced and eliminated bubble gas line; Can produce the quartz glass tube of big specification with the inventive method, its diameter can reach 140-180mm, and wall thickness reaches 4-8mm, is applicable to the requirement of integrated circuit manufacturing industry fully.
Embodiment
Further describe concrete technology implementation scheme of the present invention below, so that those skilled in the art further understand the present invention, but not limitation of the present invention.
Embodiment 1.A kind of method of producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method, the raw material of quartz glass glass sand is dropped in the continuous induction melting furnace, by the electrically heated fusion, the silica glass liquid after the fusion is drawn into large diameter transparent quartz glass tube through former, material platform and tube drawing bench; The raw material glass sand carries out 120 minutes thermal pretreatment to glass sand after dropping into continuous induction melting furnace, before the heating and melting, glass sand is preheated to 550 ℃, carries out heating and melting again; Described continuous induction melting furnace tungsten crucible top is preheating section, and the bottom is a melt zone, and thermal pretreatment is carried out in the preheating section of continuous induction melting furnace tungsten crucible; The diameter of described tungsten crucible is 330mm, highly is 1450mm; Melt temperature in the continuous induction melting furnace is 2050 ℃; The diameter of described former is 190mm; The material platform diameter of continuous induction melting furnace is 210mm; The electric current that melt zone feeds the electrically heated molybdenum electrode of continuous induction melting furnace is 210A, and voltage is 19V.The inventive method can draw and mold diameter is that 140-180mm, wall thickness are the large diameter transparent quartz glass tube of 4-8mm.
Embodiment 2.A kind of method of producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method, the raw material of quartz glass glass sand is dropped in the continuous induction melting furnace, by the electrically heated fusion, the silica glass liquid after the fusion is drawn into large diameter transparent quartz glass tube through former, material platform and tube drawing bench; The raw material glass sand carries out 180 minutes thermal pretreatment to glass sand after dropping into continuous induction melting furnace, before the heating and melting, glass sand is preheated to 650 ℃, carries out heating and melting again; Described continuous induction melting furnace tungsten crucible top is preheating section, and the bottom is a melt zone, and thermal pretreatment is carried out in the preheating section of continuous induction melting furnace tungsten crucible; The diameter of described tungsten crucible is 370mm, highly is 1500mm; Melt temperature in the continuous induction melting furnace is 2150 ℃; The diameter of described former is 210mm; The material platform diameter of continuous induction melting furnace is 215mm; The electric current that melt zone feeds the electrically heated molybdenum electrode of continuous induction melting furnace is 220A, and voltage is 20V.The inventive method can draw and mold diameter is that 140-180mm, wall thickness are the large diameter transparent quartz glass tube of 4-8mm.
Embodiment 3.A kind of method of producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method, the raw material of quartz glass glass sand is dropped in the continuous induction melting furnace, by the electrically heated fusion, the silica glass liquid after the fusion is drawn into large diameter transparent quartz glass tube through former, material platform and tube drawing bench; The raw material glass sand carries out 150 minutes thermal pretreatment to glass sand after dropping into continuous induction melting furnace, before the heating and melting, glass sand is preheated to 600 ℃, carries out heating and melting again; Described continuous induction melting furnace tungsten crucible top is preheating section, and the bottom is a melt zone, and thermal pretreatment is carried out in the preheating section of continuous induction melting furnace tungsten crucible; The diameter of described tungsten crucible is 350mm, highly is 1500mm; Melt temperature in the continuous induction melting furnace is 2100 ℃; The diameter of described former is 200mm; The material platform diameter of continuous induction melting furnace is 212mm; The electric current that melt zone feeds the electrically heated molybdenum electrode of continuous induction melting furnace is 215A, and voltage is 19V.
Embodiment 4.A kind of method of producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method, the raw material of quartz glass glass sand is dropped in the continuous induction melting furnace, by the electrically heated fusion, the silica glass liquid after the fusion is drawn into large diameter transparent quartz glass tube through former, material platform and tube drawing bench; The raw material glass sand carries out 140 minutes thermal pretreatment to glass sand after dropping into continuous induction melting furnace, before the heating and melting, glass sand is preheated to 580 ℃, carries out heating and melting again; Described continuous induction melting furnace tungsten crucible top is preheating section, and the bottom is a melt zone, and thermal pretreatment is carried out in the preheating section of continuous induction melting furnace tungsten crucible; The diameter of described tungsten crucible is 340mm, highly is 1480mm; Melt temperature in the continuous induction melting furnace is 2080 ℃; The diameter of described former is 195mm; The material platform diameter of continuous induction melting furnace is 211mm; The electric current that melt zone feeds the electrically heated molybdenum electrode of continuous induction melting furnace is 212A, and voltage is 19V.
Embodiment 5.A kind of method of producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method, the raw material of quartz glass glass sand is dropped in the continuous induction melting furnace, by the electrically heated fusion, the silica glass liquid after the fusion is drawn into large diameter transparent quartz glass tube through former, material platform and tube drawing bench; The raw material glass sand carries out 160 minutes thermal pretreatment to glass sand after dropping into continuous induction melting furnace, before the heating and melting, glass sand is preheated to 620 ℃, carries out heating and melting again; Described continuous induction melting furnace tungsten crucible top is preheating section, and the bottom is a melt zone, and thermal pretreatment is carried out in the preheating section of continuous induction melting furnace tungsten crucible; The diameter of described tungsten crucible is 360mm, highly is 1490mm; Melt temperature in the continuous induction melting furnace is 2120 ℃; The diameter of described former is 205mm; The material platform diameter of continuous induction melting furnace is 214mm; The electric current that melt zone feeds the electrically heated molybdenum electrode of continuous induction melting furnace is 218A, and voltage is 20V.
Embodiment 6.A kind of method of producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method, the raw material of quartz glass glass sand is dropped in the continuous induction melting furnace, by the electrically heated fusion, the silica glass liquid after the fusion is drawn into large diameter transparent quartz glass tube through former, material platform and tube drawing bench; The raw material glass sand carries out 130 minutes thermal pretreatment to glass sand after dropping into continuous induction melting furnace, before the heating and melting, glass sand is preheated to 610 ℃, carries out heating and melting again; Described continuous induction melting furnace tungsten crucible top is preheating section, and the bottom is a melt zone, and thermal pretreatment is carried out in the preheating section of continuous induction melting furnace tungsten crucible; The diameter of described tungsten crucible is 355mm, highly is 1485mm; Melt temperature in the continuous induction melting furnace is 2140 ℃; The diameter of described former is 208mm; The material platform diameter of continuous induction melting furnace is 213mm; The electric current that melt zone feeds the electrically heated molybdenum electrode of continuous induction melting furnace is 216A, and voltage is 19.5V.
Embodiment 7.In the method for the described any producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method of embodiment 1-6, the height of the preheating section of tungsten crucible is 300mm.
Embodiment 8.In the method for the described any producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method of embodiment 1-6, the heating element tungsten net height degree of tungsten crucible periphery is 900mm, and described tungsten net upwards is provided with from the beginning of tungsten crucible bottom.
Embodiment 9.In the method for the described any producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method of embodiment 1-6; the shielding gas that is charged in quartz continuous melting furnace during production is hydrogen and nitrogen; the proportioning of hydrogen and nitrogen is 5: 2, and hydrogen and nitrogen gas pressure are respectively 5.0mpa and 2.0mpa.
Embodiment 10.In the method for the described any producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method of embodiment 1-6; the shielding gas that is charged in quartz continuous melting furnace during production is hydrogen and nitrogen; the proportioning of hydrogen and nitrogen is 4.5: 1.8, and hydrogen and nitrogen gas pressure are respectively 4.5mpa and 1.8mpa.
Embodiment 11.In the method for the described any producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method of embodiment 1-6; the shielding gas that is charged in quartz continuous melting furnace during production is hydrogen and nitrogen; the proportioning of hydrogen and nitrogen is 5.5: 2.2, and hydrogen and nitrogen gas pressure are respectively 5.5mpa and 2.2mpa.
Embodiment 12.In the method for the described any producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method of embodiment 1-6, the height of the preheating section of tungsten crucible is 250mm; The heating element tungsten net height degree of tungsten crucible periphery is 850mm, and described tungsten net upwards is provided with from the beginning of tungsten crucible bottom; The shielding gas that is charged in quartz continuous melting furnace during production is hydrogen and nitrogen, and the proportioning of hydrogen and nitrogen is 4.5: 1.8, and hydrogen and nitrogen gas pressure are respectively 4.5mpa and 1.8mpa.
Embodiment 13.In the method for the described any producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method of embodiment 1-6, the height of the preheating section of tungsten crucible is 350mm; The heating element tungsten net height degree of tungsten crucible periphery is 950mm, and described tungsten net upwards is provided with from the beginning of tungsten crucible bottom; The shielding gas that is charged in quartz continuous melting furnace during production is hydrogen and nitrogen, and the proportioning of hydrogen and nitrogen is 5.5: 2.2, and hydrogen and nitrogen gas pressure are respectively 5.5mpa and 2.2mpa.
Embodiment 14.In the method for the described any producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method of embodiment 1-6, the height of the preheating section of tungsten crucible is 280mm; The heating element tungsten net height degree of tungsten crucible periphery is 880mm, and described tungsten net upwards is provided with from the beginning of tungsten crucible bottom; The shielding gas that is charged in quartz continuous melting furnace during production is hydrogen and nitrogen, and the proportioning of hydrogen and nitrogen is 4.8: 1.9, and hydrogen and nitrogen gas pressure are respectively 4.8mpa and 1.9mpa.
Embodiment 15.In the method for the described any producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method of embodiment 1-6, the height of the preheating section of tungsten crucible is 320mm; The heating element tungsten net height degree of tungsten crucible periphery is 920mm, and described tungsten net upwards is provided with from the beginning of tungsten crucible bottom; The shielding gas that is charged in quartz continuous melting furnace during production is hydrogen and nitrogen, and the proportioning of hydrogen and nitrogen is 5.4: 2.1, and hydrogen and nitrogen gas pressure are respectively 5.4mpa and 2.1mpa.
Embodiment 16.In the method for the described any producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method of embodiment 1-6, the height of the preheating section of tungsten crucible is 300mm; The heating element tungsten net height degree of tungsten crucible periphery is 900mm, and described tungsten net upwards is provided with from the beginning of tungsten crucible bottom; The shielding gas that is charged in quartz continuous melting furnace during production is hydrogen and nitrogen, and the hydrogen that is charged into and the proportioning of nitrogen are 5: 2, and hydrogen and nitrogen gas pressure are respectively 5.0mpa and 2.0mpa.
Claims (4)
1, a kind of method of producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method, it is characterized in that, the raw material of quartz glass glass sand is dropped in the continuous induction melting furnace, by the electrically heated fusion, the silica glass liquid after the fusion is drawn into large diameter transparent quartz glass tube through former, material platform and tube drawing bench; The raw material glass sand carries out 120-180 minute thermal pretreatment to glass sand after dropping into continuous induction melting furnace, before the heating and melting, glass sand is preheated to 550-650 ℃, carries out heating and melting again; Described continuous induction melting furnace tungsten crucible top is preheating section, and the bottom is a melt zone, and thermal pretreatment is carried out in the preheating section of continuous induction melting furnace tungsten crucible; The diameter of described tungsten crucible is 330-370mm, highly is 1450-1500mm; Melt temperature in the continuous induction melting furnace is 2050-2150 ℃; The diameter of described former is 190-210mm; The material platform diameter of continuous induction melting furnace is 210-215mm; The electric current that melt zone feeds the electrically heated molybdenum electrode of continuous induction melting furnace is 210-220A, and voltage is 19-20V; The height of the preheating section of tungsten crucible is 250-350mm; The heating element tungsten net height degree of tungsten crucible periphery is 850-950mm, and described tungsten net upwards is provided with from the beginning of tungsten crucible bottom; The shielding gas that is charged in quartz continuous melting furnace during production is hydrogen and nitrogen, and the proportioning of hydrogen and nitrogen is 4.5-5.5: 1.8-2.2, and hydrogen and nitrogen gas pressure are respectively 4.5-5.5MPa and 1.8-2.2MPa.
2, method according to claim 1 is characterized in that, the diameter of described tungsten crucible is 350mm, highly is 1500mm; Melt temperature in the continuous induction melting furnace is 2100 ℃; The diameter of former is 200mm; The material platform diameter of continuous induction melting furnace is 212mm; The electric current that melt zone feeds the electrically heated molybdenum electrode is 215A, and voltage is 19V.
3, method according to claim 1 and 2 is characterized in that, the described thermal pretreatment time is 140-160 minute, and glass sand is preheated to 600 ℃.
4, method according to claim 1 and 2 is characterized in that, the hydrogen that is charged into and the proportioning of nitrogen are 5: 2, and hydrogen and nitrogen gas pressure are respectively 5.0MPa and 2.0MPa.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200710020783A CN100586882C (en) | 2007-03-28 | 2007-03-28 | Method of producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method |
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| Application Number | Priority Date | Filing Date | Title |
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| CN200710020783A CN100586882C (en) | 2007-03-28 | 2007-03-28 | Method of producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method |
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| CN101054261A CN101054261A (en) | 2007-10-17 |
| CN100586882C true CN100586882C (en) | 2010-02-03 |
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| CN200710020783A Expired - Fee Related CN100586882C (en) | 2007-03-28 | 2007-03-28 | Method of producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method |
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| CN102718400B (en) * | 2011-03-30 | 2015-09-02 | 连云港福东正佑照明电器有限公司 | The preparation method of gallium arsenide crystal growth quartz glass tube |
| CN112520987B (en) * | 2020-12-03 | 2022-01-28 | 东海县奥兰石英科技有限公司 | Preparation method for producing large-diameter quartz tube by multi-stage continuous melting integration method |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4923497A (en) * | 1988-05-10 | 1990-05-08 | Heraeus Quarschmelze Gmbh | Method for the continuous production of a tube or rod of vitreous fused silica |
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Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4923497A (en) * | 1988-05-10 | 1990-05-08 | Heraeus Quarschmelze Gmbh | Method for the continuous production of a tube or rod of vitreous fused silica |
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| CN101054261A (en) | 2007-10-17 |
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Assignee: Donghai County Baosheng Quartz Product Co., Ltd. Assignor: Xu Shengli Contract record no.: 2011320000904 Denomination of invention: Method of producing large diameter transparent quartz glass tube for integrated circuit by continuous melting method Granted publication date: 20100203 License type: Exclusive License Open date: 20071017 Record date: 20110701 |
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