CN100576104C - Form the mould of developer blade and the developer blade that forms with this mould - Google Patents
Form the mould of developer blade and the developer blade that forms with this mould Download PDFInfo
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- CN100576104C CN100576104C CN200610140575A CN200610140575A CN100576104C CN 100576104 C CN100576104 C CN 100576104C CN 200610140575 A CN200610140575 A CN 200610140575A CN 200610140575 A CN200610140575 A CN 200610140575A CN 100576104 C CN100576104 C CN 100576104C
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Abstract
This developer blade the invention provides a kind of mould of developer blade and developer blade that forms with this mould of forming, even also can provide the image of good quality and can improve demolding performace under the condition of low temperature and low humidity degree.The mould (10) that is used to form developer blade has the plate spatial accommodation (14) that holds sheet metal and the banded chamber (15) that be used to form elastic component adjacent with the plate spatial accommodation.At least a portion (20a) that limits the surface, chamber (20) in chamber (15) in the xsect that the Width along the chamber intercepts is polished to has the surfaceness Ry that is not more than 10 μ m.
Description
Technical field
The present invention relates to a kind of mould of the scraper plate of the amount of developer on the circumference of regulating the developer roll that uses in the image processing system and developer blade that this mould of a kind of usefulness forms of being used to form, relate more specifically to a kind ofly improve the picture quality that forms by image processing system and have the developer blade of good demolding performace.
Background technology
In order to show the sub-image that is formed on the photosensitive drums, use non-magnetic developer roll so that color toner (developer) to be provided usually as image processing systems such as color laser printers.Be schematically shown as Fig. 1, image processing system is constructed to the rotation by developer roll 92, is transferred to photosensitive drums 91 with the color toner 93 of catching on the circumference of the developer roll 92 of photosensitive drums 91 adjacent layouts from developer roll 92.
In order to obtain preferable image, it is very important that the toner on the developer roll circumference and electrostatic charge thereof are adjusted in the given range.For this reason, developer blade 94 is arranged to circumference near developer roll 92.Developer blade 94 is regulated the thickness of the toner layer 93 on developer roll 92 circumference and is given the speed of sending with control.In addition, developer blade 94 makes the toner frictional electrification and plays the effect of the electrostatic charge of regulating toner.The developer blade 94 of the type is held device sheet metal 96 that supports and the elastic component 97 that adheres to sheet metal 96 by a side and forms (referring to Japanese Patent Application Publication 2005-274646 communique).
Summary of the invention
Yet traditional developer blade 94 can not provide the image of good quality under low temperature and low humidity degree condition, therefore needs to improve.As the countermeasure that addresses this problem, once attempted improving picture quality, but should attempt also always not enough by optimizing the elastomeric surfaceness adjacent with developer roll.
Consider that these problems have finished the present invention, this developer blade the purpose of this invention is to provide a kind of mould of developer blade and developer blade that this mould of a kind of usefulness is made of being used to form, even also can provide the image of good quality and can improve demolding performace under the condition of low temperature and low humidity degree.
＜1〉the invention provides a kind of mould that is used to form developer blade, described developer blade has the strip metal plate and adheres to the elastic component of described sheet metal with being parallel to described sheet metal, wherein, described mould comprises the plate spatial accommodation that holds described sheet metal and the banded chamber that be used to form described elastic component adjacent with described plate spatial accommodation; The surface, at least a portion chamber that limits described chamber in the xsect that the Width along described chamber intercepts is polished to has the surfaceness Ry that is not more than 10 μ m; Suppose with the lip-deep set point in described chamber as the border, in the xsect that the Width along described chamber intercepts, surface, described chamber is divided into both sides, then the surface, chamber of a side is polished to and has the surfaceness Ry that is not more than 10 μ m, and the surface, chamber of opposite side is polished to has the surfaceness Ry that is not more than 1.5 μ m; Postulated point P is installed under the situation in the device on the described elastic component apart from the nearest point of developer roll in described developer blade, the lip-deep described set point as described border in then described chamber is arranged such that along in the xsect of described chamber Width intercepting, and the distance of the point corresponding with described some P is in the scope of 2mm on the surface, described chamber.
＜2〉the present invention also provides a kind of according to project＜1〉the described mould that is used to form developer blade, wherein, handle polishing surface, described at least a portion chamber by texture.
Term used herein " texture processing " relates to a kind of processing that is used on the surface, chamber forming depression and projection, and it comprises with acidproof China ink draws the pattern on the basis of formation texture, selectively regulates the step of scratch-off surface with etched cavity defining surfaces such as acidic liquids, by sandblast or shot-peening on the defining surface of the chamber of mould.Can use various types of textures, include but not limited to leather texture (leather grain).
＜3〉the present invention also provides a kind of according to project＜1〉the described mould that is used to form developer blade, wherein, by texture processing or blasting treatment, polish surface, described at least a portion chamber by shot blast then.
Term used herein " blasting treatment " relates to a kind of surface treatment, wherein, is mainly sprayed by pressurized air by the sand-blast material of forming as inorganic material such as aluminium oxide and SiC.Term used herein " shot blast " relates to a kind of processing of adopting beaded glass as the shot-peening material.
＜4〉the present invention also provides a kind of according to project＜1 〉～＜3 in each described mould that is used to form developer blade, wherein, the polished surface of a described side has the surfaceness of 0.5～5.0 μ m.
＜5〉on the other hand, the invention provides a kind of using according to project＜1 〉～＜4 in developer blade of forming of each described mould that is used to form developer blade, wherein, the pattern transferring of described polished surface is molded over along on the surface that at least a portion of elastic component described in the xsect of described Width intercepting is exposed.
Description of drawings
Fig. 1 is the synoptic diagram that the installation site of developer blade is shown.
Fig. 2 a～Fig. 2 c is respectively stereographic map, front view and a sectional view of using the developer blade that forms according to mould of the present invention.
Fig. 3 a and Fig. 3 b are the sectional views according to mould of the present invention.
Fig. 4 is the stereographic map of using according to the developer blade of another mould formation according to the present invention.
Fig. 5 is the stereographic map of using according to the developer blade of another mould formation according to the present invention.
Fig. 6 is the stereographic map of using according to the developer blade of another mould formation according to the present invention.
Fig. 7 a and Fig. 7 b illustrate the surface profile by texture (texturing) or blasting treatment and the mould by the Combined Processing polishing respectively.
Embodiment
Hereinafter with reference to the description of drawings embodiments of the invention.Fig. 2 a～Fig. 2 c is respectively stereographic map, front view and a sectional view of using the developer blade that forms according to mould of the present invention.Developer blade 1 is made up of banded metal sheet 2 and the elastic component 3 that sticks to sheet metal 2 one sides.Can be by in the chamber of mould, placing the sheet metal be coated with bonding agent, cast as moulding material such as liquid silastic and make it be solidified to form developer blade 1.
As sheet metal 2, preferably the thickness that is become by aluminium, stainless steel or copper is the thin plate of 0.05～0.5mm.Such plate can satisfy the required flexibility of sheet metal 2 and the requirement of intensity.In the drawings, Reference numeral 7 expression being used to of forming is constrained to the section bar materials flow by the little teat portion of formation of mould and leaves the little teat that cast gate leads to the chamber.Reference numeral 8 expressions are used for developer blade is mounted to the mounting hole of the retainer of image processing system.Hereinafter, a side that is installed in the developer blade 1 on the retainer is called basic side, and opposite side is called the top side.
In Fig. 2 c as the sectional view of broad ways intercepting, some P is installed under the situation in the device apart from the nearest point of developer roll (following note is made " developer roll closest approach ") in developer blade 1.Shown in example in, it is on the crestal line between straight portion and the turn of bilge.The characteristic of some P near zone influences developer and electrostatic charge to a great extent, therefore needs the surface imperfection (blemish) that scrutiny should the zone.
The zone 5 is parts of the exposing surface of broad ways elastic component 3, the pattern transfer that this zone 5 is formed on cavity surface by the processing that utilizes explanation after a while to the pattern transfer surface composition.Remaining area is polished to smooth surface.Border 6 between the zone 5 on pattern transfer surface and the zone of smooth surface is positioned near the developer roll closest approach P.For example shown in Figure 2, the zone 5 on pattern transfer surface is disposed in the top side with respect to the developer blade on border 6.
Fig. 3 a is the cross-sectional view that the single pattern (impression mold) that is used to form developer blade 1 when mould is in closure state is shown, and Fig. 3 b is the sectional view along the intercepting of the line b-b among Fig. 3 a.In the drawings, the die parting line of mould is expressed as PL.Upper die element 11 is positioned at the side of straight line PL, and lower die 12 is positioned at the opposite side of straight line PL.In lower die 12, the plate spatial accommodation 14 and the banded chamber 15 that are placed with sheet metal 2 are set.Have little teat formation portion 13 and chamber 15 adjacent layouts with the corresponding shape of little teat shape.Be used for being connected with little teat formation portion 13 to the cross gate 16 that send material.
As along among Fig. 3 a of the sectional view of chamber Width intercepting, be polished to and have the surfaceness Ry that is not more than 10 μ m as 21 at least one the surperficial 20a that has a little on the surface, chamber 20 on border.This can reach by for example texture processing, blasting treatment, shot blast and their combination.Can all handle the surface, chamber 20 that limits chamber 15 by this way, but preferred section processes.In this case, other the surperficial 20b about border 21 preferably is polished to the smooth surface with the surfaceness that is not more than 1.5 μ m.
The surfaceness Ry of processed surperficial 20a is preferably in the scope of 0.5～5.0 μ m.As the above-mentioned point (frontier point) 21 on border be disposed in elastic component 6 on surface, the corresponding chamber of developer roll closest approach P 20 on some Q near, apart from the distance of some Q preferably in the scope of-2mm～2mm.Like this, therefore the zone 5 on pattern transfer surface and the zone 4 of smooth surface all are positioned near the developer roll closest approach P, can improve near the P developing performance by the pattern transfer surface, wherein, when the toner characteristic was determined, near the developing performance the some P influenced the picture quality maximum.Simultaneously, the surface imperfection of checkpoint P near zone easily.As a result, can satisfy raising developing performance and convenient the inspection simultaneously.
Fig. 4 is a stereographic map of using the developer blade 1A of mould formation according to another embodiment of the present invention.Developer blade 1A also is made up of with the elastic component 3A that adheres to sheet metal 2 sheet metal 2.This sheet metal is with the sheet metal with reference to the developer blade 1 among the embodiment of Fig. 2 explanation is the same.Regional 5A by the pattern transfer surface forms on this point in the part with same cross-sectional shape and the surface that exposes, the elastic component 3A also elastic component 3 with the foregoing description is the same, but they the regional 5A on pattern transfer surface be disposed in respect to the developer blade base side of the border 6A of smooth surface area 4A on different on this point.In this case, the regional 5A on pattern transfer surface and smooth surface area 4A are positioned near the developer roll closest approach P equally, therefore can satisfy simultaneously and improve developing performance and convenient the inspection.
Fig. 5 is the stereographic map with the developer blade 1B of the mould formation different with the shape of cross section in the chamber of the above-mentioned mould that is used to form developer blade 1 and 1A of the shape of cross section with chamber.Developer blade 1B has the shape of cross section elastic component 3A different with 1A with developer blade 1.Yet in this case, the regional 5B on pattern transfer surface is disposed in the side with respect near the border 6B the developer roll closest approach that is positioned on the elastic component 3A, and the regional 4B of smooth surface is disposed in the opposite side with respect to border 6B.
Fig. 6 also is the stereographic map of the developer blade 1C that forms of the mould with the shape of cross section with chamber different with the shape of cross section in the chamber of the above-mentioned mould that is used to form developer blade 1,1A and 1B.In developer blade 1C, the cross sectional shape of elastic component 3C is different with the cross sectional shape of elastic component 3,3A and 3B, but the regional 5C on pattern transfer surface still is disposed in the side with respect near the border 6C the developer roll closest approach that is positioned on the elastic component 3C, and the regional 4C of smooth surface is disposed in the opposite side with respect to border 6C.
In one embodiment of the invention, adopt and to carry out texture processing or blasting treatment, carry out a part of chamber that the Combined Processing of shot blast is polished the elastic component that is used to form mould then, wherein, this mould is used to form developer blade.As a result, obtain also only to utilize the good image that texture is handled or blasting treatment obtains, in addition, obtain good demolding performace and improve glossiness, the convenient inspection.Fig. 7 a and Fig. 7 b show the surface profile by texture processing or blasting treatment and the mould by the Combined Processing polishing respectively.Shown in Fig. 7 a, under the situation of any in carrying out texture or blasting treatment, can see recessed-convex pattern that projection and depression alternately occur.On the contrary, shown in Fig. 7 b, under the situation of carrying out Combined Processing, the projection of recessed-convex pattern is ground off, and therefore only can see depression.As a result, estimation can obtain good demolding performace and glossiness.The particle diameter of the globule that uses in the blasting treatment is preferably in the scope of 10～500 μ m, more preferably in the scope of 30～100 μ m.
Example
(example 1 and 2)
Preparation has the mould of shape of cross section shown in Figure 3.Handle a part of cavity surface of polishing by texture.Make the developer blade of example 1 with this mould.Then, scraper plate is installed on the image processing system.The surface imperfection that the image that assessment is printed, visual examination elastic component broad ways and developer roll closest approach P intersect is to draw the verification and measurement ratio of this surface imperfection.The result is shown in the table 1.
All printed the paper that visual examination then prints with paper and come evaluate image with solid black or game of shuttlecocks.In table, acceptable value note work " A ", obvious unacceptable grade note is made " C ", the good but still unacceptable grade note work " B " than " C ".
By the detected surface imperfection quantity of visual examination divided by by coming the verification and measurement ratio of gauging surface defective with the accurate detected surface imperfection quantity of microscope and surface roughometer.In table 1, make " A " greater than 90% verification and measurement ratio note, make " C " less than 10% verification and measurement ratio note, the verification and measurement ratio note between 10% and 90% is made " B ".
Polish the surface, whole chamber the mould manufacturing the same of the developer blade of example 2 with example 1 except that handling by texture.Except that surface, whole chamber is to have the surfaceness Ry that is not more than 0.2 μ m by mirror polish, the mould manufacturing the same of the developer blade of Comparative Examples 1 with example 1.Except that surface, whole chamber is to have the surfaceness Ry of 0.2～1.5 μ m by mechanical buffing, the mould manufacturing the same of the developer blade of Comparative Examples 2 with example 1.For the developer blade of example 2 and Comparative Examples 1 and 2, carry out the calculating of image evaluation and verification and measurement ratio in the mode identical with example 1.The result also is shown in Table 1.
Example 1 and 2 and the developer blade of Comparative Examples 1 and 2 in, sheet metal is made and is had the thickness of 0.1mm by SUS, elastic component is made by silicon rubber and is had the thickness of 1.5mm and the width of 4mm.Each developer blade is installed on the printer to carry out image evaluation as shown in Figure 1.
Table 1
In this table, L/L condition (low temperature and low humidity degree condition) is that temperature is that 10 ℃ and humidity are 15% condition.H/H condition (hot and humid degree condition) is that temperature is that 28 ℃ and humidity are 85% condition.It is to whether occurring the assessment of stain on the sub-image of estimating paper is white in color fully that solid white is printed assessment, and it is to whether occurring the assessment of white point on the sub-image of estimating to make paper be black fully that solid black is printed assessment.
As can be seen from Table 1, even the developer blade of example 1 and 2 also has the preferable image assessment result under the L/L condition.These examples and Comparative Examples 1 and 2 are compared, and this as can be seen result can make it to become the pattern transfer surface and provide the surfaceness Ry of 10 μ m to realize by polishing at least a portion mould.In addition, because having, the developer blade of example 1 is positioned near the smooth surface area of developer roll closest approach, so even also can be come out by visual examination with the higher detection rate in the situation lower surface defective of 3 μ m depth, this is more preferably.
(example 3 and 4)
Except that mould by the Combined Processing polishing, the developer blade of example 3 uses the mode the same with example 1 to make.Except that surface, whole chamber by the Combined Processing polishing, the mould manufacturing the same of the developer blade of example 4 with example 3.Except that surface, whole chamber is to have the surfaceness Ry that is not more than 0.2 μ m by mirror polish, the mould manufacturing the same of the developer blade of Comparative Examples 3 with example 3.Except that surface, whole chamber is to have the surfaceness Ry of 0.2～1.5 μ m by mechanical buffing, the mould manufacturing the same of the developer blade of Comparative Examples 4 with example 3.For example 3 and 4 and the developer blade of Comparative Examples 3 and 4, carry out image evaluation and verification and measurement ratio calculates in the mode identical with example 1.The result also is shown in table 2.
In addition, also assess the demolding performace of developer blade.In this table, assessment result is represented with " A " (good), " B " (some problem) or " C " (unacceptable).
Example 3 and 4 and the developer blade of Comparative Examples 3 and 4 in, sheet metal is made and is had the thickness of 0.1mm by SUS, elastic component is made by silicon rubber and is had the thickness of 1.5mm and the width of 4mm.Each developer blade is installed on the printer to carry out image evaluation as shown in Figure 1.
Table 2
As can be seen from Table 2, even the developer blade of example 3 and 4 also has the preferable image assessment result under the L/L condition.These examples and Comparative Examples 3 and 4 are compared, and this as can be seen result can make it to become the pattern transfer surface and provide the surfaceness Ry of 10 μ m to realize by polishing at least a portion mould.In addition, because having, the developer blade of example 3 is positioned near the smooth surface area of developer roll closest approach, so even also can be come out by visual examination with the higher detection rate in the situation lower surface defective of 3 μ m depth, this is more preferably.In addition, the developer blade that it can also be seen that example 3 and 4 has better demolding performace.
Industrial applicability
Even developer blade according to the present invention also can provide under low temperature and low humidity degree condition Good image and good demolding performace, and can improve glossiness with convenient inspection, because of This its can be applicable to the image processing system of various sizes.
Claims (5)
1. mould that is used to form developer blade, described developer blade has the strip metal plate and adheres to the elastic component of described sheet metal with being parallel to described sheet metal, wherein, described mould comprises the plate spatial accommodation that holds described sheet metal and the banded chamber that be used to form described elastic component adjacent with described plate spatial accommodation; The surface, at least a portion chamber that limits described chamber in the xsect that the Width along described chamber intercepts is polished to has the surfaceness Ry that is not more than 10 μ m;
Suppose with the lip-deep set point in described chamber as the border, in the xsect that the Width along described chamber intercepts, surface, described chamber is divided into both sides, then the surface, chamber of a side is polished to and has the surfaceness Ry that is not more than 10 μ m, and the surface, chamber of opposite side is polished to has the surfaceness Ry that is not more than 1.5 μ m; Postulated point P is installed under the situation in the device on the described elastic component apart from the nearest point of developer roll in described developer blade, the lip-deep described set point as described border in then described chamber is arranged such that along in the xsect of described chamber Width intercepting, and the distance of the point corresponding with described some P is in the scope of 2mm on the surface, described chamber.
2. the mould that is used to form developer blade according to claim 1 is characterized in that, handles polishing surface, described at least a portion chamber by texture.
3. the mould that is used to form developer blade according to claim 1 is characterized in that, by texture processing or blasting treatment, polish surface, described at least a portion chamber by shot blast then.
4. according to each described mould that is used to form developer blade in the claim 1～3, it is characterized in that the polished surface of a described side has the surfaceness of 0.5～5.0 μ m.
5. one kind with the developer blade that forms according to each described mould that is used to form developer blade in the claim 1～4, wherein, the pattern transferring of described polished surface is molded over along on the surface that at least a portion of elastic component described in the xsect of described Width intercepting is exposed.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005301868A JP2007106080A (en) | 2005-10-17 | 2005-10-17 | Mold for forming developer quantity regulating blade, and developer quantity regulating blade formed by using it |
| JP2005301868 | 2005-10-17 | ||
| JP2006122984 | 2006-04-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1952805A CN1952805A (en) | 2007-04-25 |
| CN100576104C true CN100576104C (en) | 2009-12-30 |
Family
ID=38032317
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200610140575A Expired - Fee Related CN100576104C (en) | 2005-10-17 | 2006-10-17 | Form the mould of developer blade and the developer blade that forms with this mould |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP2007106080A (en) |
| CN (1) | CN100576104C (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101893842A (en) * | 2010-06-21 | 2010-11-24 | 珠海天威飞马打印耗材有限公司 | Method for recovering scrapers of laser printer processing cartridge |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4863757B2 (en) * | 2006-04-27 | 2012-01-25 | 株式会社ブリヂストン | Development blade forming mold and development blade using the same |
| JP4594909B2 (en) * | 2006-08-02 | 2010-12-08 | バンドー化学株式会社 | Blade having a rough surface, manufacturing method thereof, and manufacturing apparatus |
| GB2444829B (en) * | 2006-12-15 | 2011-08-03 | Fujikura Rubber Ltd | Developing blade and its manufacturing method |
| JP5044245B2 (en) * | 2006-12-15 | 2012-10-10 | 藤倉ゴム工業株式会社 | Developing blade and manufacturing method thereof |
| JP5368689B2 (en) * | 2007-10-24 | 2013-12-18 | 株式会社ブリヂストン | Manufacturing method of blade for mounting OA equipment |
| JP4799532B2 (en) * | 2007-11-14 | 2011-10-26 | 株式会社ブリヂストン | Development blade mold and development blade manufacturing method |
| JP5222694B2 (en) * | 2008-11-05 | 2013-06-26 | 株式会社ブリヂストン | OA blade mold |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1225458A (en) * | 1997-12-05 | 1999-08-11 | 夏普公司 | Developing apparatus using one-component toner |
| US6528158B1 (en) * | 1999-07-29 | 2003-03-04 | Canon Kabushiki Kaisha | Developer regulating member and method of molding the same |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0455872A (en) * | 1990-06-26 | 1992-02-24 | Canon Inc | Developing device |
| JPH11231647A (en) * | 1998-02-19 | 1999-08-27 | Canon Inc | Blade member for regulating developer, its production and die device |
| JP3726873B2 (en) * | 1999-10-18 | 2005-12-14 | セイコーエプソン株式会社 | Development device |
| JP5243678B2 (en) * | 2001-04-13 | 2013-07-24 | キヤノン化成株式会社 | Manufacturing method of developer amount regulating blade |
| JP2002372885A (en) * | 2001-06-18 | 2002-12-26 | Ricoh Co Ltd | Liquid applicator and image forming device |
| JP2004117919A (en) * | 2002-09-26 | 2004-04-15 | Canon Finetech Inc | Developing apparatus |
| JP2005274646A (en) * | 2004-03-23 | 2005-10-06 | Bridgestone Corp | Developer quantity control blade |
-
2005
- 2005-10-17 JP JP2005301868A patent/JP2007106080A/en active Pending
-
2006
- 2006-10-17 CN CN200610140575A patent/CN100576104C/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1225458A (en) * | 1997-12-05 | 1999-08-11 | 夏普公司 | Developing apparatus using one-component toner |
| US6528158B1 (en) * | 1999-07-29 | 2003-03-04 | Canon Kabushiki Kaisha | Developer regulating member and method of molding the same |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101893842A (en) * | 2010-06-21 | 2010-11-24 | 珠海天威飞马打印耗材有限公司 | Method for recovering scrapers of laser printer processing cartridge |
| CN101893842B (en) * | 2010-06-21 | 2011-10-26 | 珠海天威飞马打印耗材有限公司 | Method for recovering scrapers of laser printer processing cartridge |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1952805A (en) | 2007-04-25 |
| JP2007106080A (en) | 2007-04-26 |
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