CN100550434C - The flexible CIGS thin-film solar cell preparation method - Google Patents
The flexible CIGS thin-film solar cell preparation method Download PDFInfo
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- CN100550434C CN100550434C CNB2006100161827A CN200610016182A CN100550434C CN 100550434 C CN100550434 C CN 100550434C CN B2006100161827 A CNB2006100161827 A CN B2006100161827A CN 200610016182 A CN200610016182 A CN 200610016182A CN 100550434 C CN100550434 C CN 100550434C
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- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
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Abstract
The present invention relates to a kind of flexible CIGS thin-film solar cell preparation method.The invention belongs to technical field of solar cells.A kind of flexible CIGS thin-film solar cell preparation method, comprise the preparation of substrate, hearth electrode, absorbed layer, resilient coating, Window layer, antireflective coating and top electrode, be characterized in: substrate is flexible metallic material titanium foil, stainless steel foil or polyimides, and substrate processing thickness is 10-100 μ m; Clean substrate, substrate is inserted in the vacuum, carry out aura and handle; Aura is handled back magnetron sputtering deposition hearth electrode Mo, at first under vacuum degree 0.1-10Pa, underlayer temperature 80-200 ℃ condition, and Mo target sputter 2-8min; Control vacuum degree 0.005-0.05Pa then, Mo target sputter 2-8min obtains the thick duplicature hearth electrode Mo of 0.5-1.5 μ m.Battery of the present invention is not afraid of bending, high-photoelectric transformation efficiency and high-quality specific power, and method for making is simple unique, be easy to volume to volume large tracts of land, large-scale continuous production, has wide range of applications.
Description
Technical field
The invention belongs to technical field of solar cells, particularly relate to a kind of flexible CIGS thin-film solar cell preparation method.
Background technology
Existing CIGS thin-film solar cell is the novel solar cell that later development comes out in the eighties in 20th century, and typical structure is following multi-layer film structure: substrate/hearth electrode/absorbed layer/resilient coating/Window layer/antireflective coating/top electrode.
It is substrate that CIGS thin-film solar cell adopts glass, directly prepares hearth electrode Mo on glass with sputtering method.Though it is lower to adopt glass to be that the CIGS thin-film solar cell of substrate has material cost, the ripe advantage of technology owing to glass is rigid substrate, has limited the application of CIGS thin-film solar cell at present.
The general magnetron sputtering method that adopts prepares the Mo hearth electrode on glass substrate, and it is bad at the hearth electrode Mo of preparation on glass with combining of glass substrate, especially in the chemical bath method preparation process of the selenizing of the preparation process that is higher than 550 ℃ of temperature of absorbed layer metal preformed layer, absorbed layer or sulfidation and resilient coating the Mo hearth electrode peel off easily, blistering, influence the preparation and the performance thereof of CIGS thin-film solar cell.
Summary of the invention
The present invention provides a kind of preparation method of flexible CIGS thin-film solar cell for solving the problem that prior art exists.
The purpose of this invention is to provide the preparation method that a kind of safety and stability, technical process are simple, be convenient to adopt volume to volume large tracts of land, large-scale production flexible CIGS thin-film solar cell.
CIGS thin-film solar cell of the present invention with flexible materials such as flexible metal (titanium foil, stainless steel foil) or polyimide films as substrate, the method for preparing duplicature with magnetron sputtering method or increase the metal/metal oxide transition zone on flexible substrate prepares hearth electrode Mo, what make flexible CIGS thin-film solar cell thus both had good combination with substrate, had the hearth electrode that high conductance property improves the photoelectric conversion efficiency of solar cell again.
CIGS thin-film solar cell is made of substrate, hearth electrode, absorbed layer, resilient coating, Window layer, antireflective coating and top electrode.The present invention adopts flexible substrate, comprises flexible metal (titanium foil/stainless steel) or polyimides.Aspect the preparation of hearth electrode, the present invention proposes to increase metal or metal oxide transition zone and Mo on flexible substrate double membrane structure improves the associativity and the electric property of hearth electrode and substrate.
On flexible substrate, adopt sputtering method to prepare hearth electrode Mo, if preparation metal M o layer under higher ar pressure, then can obtain combining good hearth electrode with substrate, but resistance is higher, be 50-250 μ Ω cm, can not satisfy thin film solar cell well the electricity of hearth electrode is led the conversion efficiency that requirement can influence solar cell; If preparation metal M o layer under lower ar pressure, the hearth electrode resistance that then obtains is little, is 10-15 μ Ω cm, but poor with combining of substrate, peels off easily, blistering.Therefore, the present invention adopts double membrane structure, and there at first at close substrate employing sputter Mo under higher ar pressure itself and substrate are had to be well attached, and sputter Mo under lower ar pressure makes it have high conductivity again, satisfies the requirement of thin film solar cell.
Before sputter hearth electrode Mo on the CIGS thin-film solar cell that adopts flexible substrate, at first between hearth electrode and substrate, prepare metal (as Cr) or metal oxide (as Al
2O
3) transition zone, Mo hearth electrode and substrate are had good adhered to and forms good interface with absorbed layer, and can significantly improve fill factor, curve factor, open circuit voltage, short circuit current and the photoelectric conversion efficiency of thin film solar cell, improved battery performance.
Flexible CIGS thin-film solar cell preparation method of the present invention adopts following technical scheme:
A kind of flexible CIGS thin-film solar cell preparation method, comprise the preparation of substrate, hearth electrode, absorbed layer, resilient coating, Window layer, antireflective coating and top electrode, be characterized in: substrate is flexible metallic material titanium foil, stainless steel foil or polyimides, and substrate processing thickness is 10-100 μ m; Clean substrate, substrate is inserted in the vacuum, carry out aura and handle; Aura is handled back magnetron sputtering deposition hearth electrode Mo, at first under vacuum degree 0.1-10Pa, underlayer temperature 80-200 ℃ condition, and Mo target sputter 2-8min; Control vacuum degree 0.005-0.05Pa then, Mo target sputter 2-8min obtains the thick duplicature hearth electrode Mo of 0.5-1.5 μ m.
Advantage that the present invention has and good effect:
It is substrate preparation Copper Indium Gallium Selenide flexible thin-film solar cell that the present invention adopts thick flexible metal of 10-100 μ m (titanium, stainless steel) and polyimide film, make CIGS thin-film solar cell have the bending of not being afraid of, be easy to advantages such as the production continuously of volume to volume large tracts of land, high-photoelectric transformation efficiency and high-quality specific power, in light weight for making, space and ground provide possibility with solar battery array cheaply.Therefore after CIGS thin-film solar cell adopts flexible substrate, not only expanded the application of CIGS thin-film solar cell greatly, because it is not afraid of bending, can be applied to fields such as dirigible, integrated fighting uniform, life vest, knapsack, the helmet, tent, portable charger; On the other hand, after adopting flexible substrate, can improve the thin film solar cell quality and can adopt the large-area production technology of volume to volume (roll-to-roll), help large-scale production than the weight while of power, reduction solar battery array, easy to carry and transport, expand range of application.
Description of drawings
Fig. 1 is the flexible CIGS thin-film solar cell structural representation.
Among the figure, 1-top electrode, 2-antireflective coating, 3-Window layer, 4-resilient coating, 5-absorbed layer, 6-hearth electrode, 7-substrate.
Embodiment
For further disclosing summary of the invention of the present invention, characteristics and effect, also be elaborated as follows in conjunction with the accompanying drawings especially exemplified by following example.
With reference to accompanying drawing 1.
Flexible CIGS thin-film solar cell, be multi-layer film structure, comprise substrate 7, hearth electrode 6, absorbed layer 5, resilient coating 4, Window layer 3, antireflective coating 2 and top electrode 1, its substrate is the flexible metallic material titanium foil for 7 layers, substrate 7 is thick to be 10-100 μ m, and duplicature hearth electrode Mo is arranged on the substrate 7.
Flexible CIGS thin-film solar cell, substrate layer is the polyimide film of thick 25 μ m, and the thick Metal Cr of 0.3 μ m is arranged on the substrate, and hearth electrode Mo is arranged on the Metal Cr layer.Other structures are with embodiment 1.
Flexible CIGS thin-film solar cell, substrate layer is the stainless steel foil of thick 40 μ m, and the thick Al of 2 μ m is arranged on the substrate
2O
3Transition zone, Al
2O
3Hearth electrode Mo is arranged on the transition zone.Other structures are with embodiment 1.
The flexible CIGS thin-film solar cell preparation method comprises the preparation of substrate, hearth electrode, absorbed layer, resilient coating, Window layer, antireflective coating and top electrode, its substrate flexible metal titanium foil.Put into vacuum chamber after titanium foil cleaned and carry out after aura handles, sputtering sedimentation Mo hearth electrode is 5Pa, 120 ℃ of conditions of underlayer temperature sputter of following time 6min in vacuum degree at first, obtain 0.4 μ m thick combine good Mo with substrate; Argon flow amount is reduced, sputter 5min when making vacuum degree reach 0.02Pa obtains the thick Mo layer with less resistive of one deck 0.3 μ m, thereby obtains the double membrane structure of Mo again.So can improve the photoelectric conversion efficiency of solar cell.
The flexible CIGS thin-film solar cell preparation method substitutes the titanium foil substrate with polyimide film, and other are identical with embodiment 4, promptly makes on the polyimide substrate and must get double membrane structure by hearth electrode Mo.
The flexible CIGS thin-film solar cell preparation method is the Metal Cr transition zone of 1.^5 μ m with Cr target sputter one layer thickness earlier on polyimide substrate, uses Mo target sputter hearth electrode Mo more thereon, can improve the associativity of hearth electrode and substrate.
The flexible CIGS thin-film solar cell preparation method uses Al earlier on stainless steel foil
2O
3Target prepares the metal oxide Al that a layer thickness is 3 μ m
2O
3, use Mo target sputter hearth electrode Mo more thereon, not only can improve the associativity of hearth electrode and substrate, and can significantly improve fill factor, curve factor, open circuit voltage, short circuit current and photoelectric conversion efficiency, photoelectric conversion efficiency is promoted about 50-90%.
Embodiment 8
The flexible CIGS thin-film solar cell preparation method substitutes stainless steel foil with polyimide film, and other are identical with embodiment 7.With do not add comparing of transition zone, the photoelectric conversion efficiency of solar cell has improved about 30-50%.
Embodiment 9
The flexible CIGS thin-film solar cell preparation method substitutes stainless steel foil with titanium foil, and other are identical with embodiment 7.With do not add comparing of transition zone, the photoelectric conversion efficiency of solar cell has improved about 5%.
Claims (1)
1. flexible CIGS thin-film solar cell preparation method, comprise the preparation of substrate, hearth electrode, absorbed layer, resilient coating, Window layer, antireflective coating and top electrode, it is characterized in that: substrate is flexible metallic material titanium foil, stainless steel foil or polyimides, and substrate processing thickness is 10-100 μ m; Clean substrate, substrate is inserted in the vacuum, carry out aura and handle; Aura is handled back magnetron sputtering deposition hearth electrode Mo, at first under vacuum degree 0.1-10Pa, underlayer temperature 80-200 ℃ condition, and Mo target sputter 2-8min; Control vacuum degree 0.005-0.05Pa then, Mo target sputter 2-8min obtains the thick duplicature hearth electrode Mo of 0.5-1.5 μ m.
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| CNB2006100161827A CN100550434C (en) | 2006-10-19 | 2006-10-19 | The flexible CIGS thin-film solar cell preparation method |
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| CNB2006100161827A CN100550434C (en) | 2006-10-19 | 2006-10-19 | The flexible CIGS thin-film solar cell preparation method |
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| CN100550434C true CN100550434C (en) | 2009-10-14 |
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Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101459200B (en) * | 2007-12-14 | 2011-07-20 | 中国电子科技集团公司第十八研究所 | Preparation method of flexible CIGS thin-film solar cell and absorption layer |
| CN101673777B (en) * | 2009-10-13 | 2011-04-27 | 华东师范大学 | Solar battery with soft copper, indium, gallium and selenium film |
| CN101719534B (en) * | 2009-11-13 | 2011-10-05 | 彩虹集团公司 | Preparing method of organic thin film solar cell |
| CN101859812B (en) * | 2010-04-30 | 2012-01-04 | 浙江大学 | Method for preparing flexible copper indium gallium selenide thin-film solar cell |
| CN102479869B (en) * | 2010-11-25 | 2013-08-14 | 中国电子科技集团公司第十八研究所 | Preparation method of nano-structured solar cell with flexible membrane |
| CN102110732B (en) * | 2010-11-30 | 2014-03-26 | 苏州新区科兴威尔电子有限公司 | Flexible thin-film solar photoelectric cell and large-scale continuous automatic production method thereof |
| KR101283072B1 (en) | 2011-10-18 | 2013-07-05 | 엘지이노텍 주식회사 | Solar cell apparatus and method of fabricating the same |
| CN102354711B (en) * | 2011-10-26 | 2013-09-04 | 香港中文大学 | Solar battery assembly of copper-indium-gallium-selenium thin film and preparation method of light absorption layer thereof |
| CN102437237A (en) * | 2011-11-29 | 2012-05-02 | 福建钧石能源有限公司 | Chalcopyrite type thin film solar cell and manufacturing method thereof |
| CN103258896A (en) * | 2012-02-17 | 2013-08-21 | 任丘市永基光电太阳能有限公司 | Manufacturing technology of soft CIGS thin film solar cell absorbing layer |
| CN103296128A (en) * | 2012-03-05 | 2013-09-11 | 任丘市永基光电太阳能有限公司 | Flexible CIGS thin film solar cell window layer preparation technology |
| CN102828152A (en) * | 2012-09-20 | 2012-12-19 | 成都欣源光伏科技有限公司 | Preparation method of Mo film with low resistance rate |
| CN102943238A (en) * | 2012-11-16 | 2013-02-27 | 中国电子科技集团公司第十八研究所 | Preparation method of thin-film solar cell |
| CN104319305A (en) * | 2014-10-30 | 2015-01-28 | 上海科慧太阳能技术有限公司 | Method for preparing CIGS film and CIGS film |
| CN104393064A (en) * | 2014-10-31 | 2015-03-04 | 徐东 | Back electrode Mo thin film of solar cell and preparation method thereof |
| CN105742374B (en) * | 2014-12-09 | 2017-12-05 | 中国科学院苏州纳米技术与纳米仿生研究所 | photovoltaic device and preparation method thereof |
| CN109560144B (en) * | 2018-11-26 | 2021-06-29 | 深圳先进技术研究院 | CIGS thin-film solar cell and preparation method thereof |
| CN111430485B (en) * | 2020-04-29 | 2022-09-09 | 中国电子科技集团公司第十八研究所 | Preparation method of high-adhesion barrier layer for stainless steel substrate copper indium gallium selenide solar cell |
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2006
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| CN101165923A (en) | 2008-04-23 |
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Assignee: Tianjin Blue Sky Sun Technology Co., Ltd. Assignor: No.18 Inst., China Electronic Sci-Tech Group Corp. Contract record no.: 2010120000114 Denomination of invention: A kind of flexible CIGS thin-film solar cell preparation method Granted publication date: 20091014 License type: Exclusive License Open date: 20080423 Record date: 20100831 |
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Effective date of registration: 20120222 Address after: Chuang-tzu 300381 Tianjin city Nankai District liqizhuang Ling Road No. 18 Co-patentee after: Tianjin Blue Sky Sun Technology Co., Ltd. Patentee after: No.18 Inst., China Electronic Sci-Tech Group Corp. Address before: Chuang-tzu 300381 Tianjin city Nankai District liqizhuang Ling Road No. 18 Patentee before: No.18 Inst., China Electronic Sci-Tech Group Corp. |
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