CN100540258C - Film forming apparatus - Google Patents

Film forming apparatus Download PDF

Info

Publication number
CN100540258C
CN100540258C CNB2006101675118A CN200610167511A CN100540258C CN 100540258 C CN100540258 C CN 100540258C CN B2006101675118 A CNB2006101675118 A CN B2006101675118A CN 200610167511 A CN200610167511 A CN 200610167511A CN 100540258 C CN100540258 C CN 100540258C
Authority
CN
China
Prior art keywords
film forming
forming apparatus
casing
anger
described film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB2006101675118A
Other languages
Chinese (zh)
Other versions
CN1990209A (en
Inventor
陈栋梁
李庆
邓先模
熊成东
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chengdu Organic Chemicals Co Ltd of CAS
Original Assignee
Chengdu Organic Chemicals Co Ltd of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chengdu Organic Chemicals Co Ltd of CAS filed Critical Chengdu Organic Chemicals Co Ltd of CAS
Priority to CNB2006101675118A priority Critical patent/CN100540258C/en
Publication of CN1990209A publication Critical patent/CN1990209A/en
Application granted granted Critical
Publication of CN100540258C publication Critical patent/CN100540258C/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Abstract

The invention discloses and a kind ofly prepare the polymeric membrane film forming apparatus by The tape casting, comprise casing, air supply system, the system of giving vent to anger, the temperature control system of band door and place the interior filming rack of casing, filming rack mainly is made up of horizontal base (20), support column (14), fixed head (17) and leveling nut (18).Film forming apparatus of the present invention, simple in structure, easy to operate, thickness is thin evenly, smooth surface, cleaning.

Description

Film forming apparatus
Technical field
The present invention relates to the device of the processing film forming of a kind of device that is used for the processing of high molecular material film forming, particularly Polymer Solution or melt.
Background technology
Solution or liquation curtain coating legal system film often run in production and scientific research, especially at the medical high polymer manufacture field, require the very thin thickness of film, even reach between several microns to tens microns, and require that thickness is thin evenly, smooth surface, cleaning (especially bacterial content is few) and solvent is low, impurity (especially dust) content few and the yield rate height, requirement like this is difficult to reach with general equipment, and its yield rate is very low.The method that existing production and scientific research are used all adopts vacuum drying chamber or general drying box to transform the heating evaporation solvent easily, curtain coating system film on culture dish or general glass plate.But this is difficult to reach requirement, can't solve pollution-free in thickness evenness, surface smoothness and the film-forming process of film.
Summary of the invention
The purpose of this invention is to provide a kind of film forming apparatus, prepare polymeric membrane by The tape casting.Film forming apparatus of the present invention, simple in structure, easy to operate, thickness is thin evenly, smooth surface, cleaning.
Film forming apparatus of the present invention comprises casing, air supply system, the system of giving vent to anger, temperature control system and place filming rack in the casing, and filming rack mainly is made up of horizontal base, pillar, fixed head and leveling nut.
In the film forming apparatus of the present invention, support column has fine thread, and several 3 of support column is isosceles triangle or equilateral triangle.
In the film forming apparatus of the present invention, the leveling nut is closely buckled on the support column, lays respectively at the leveling nut of 3 support columns, forms a level course.When a plurality of leveling nut is arranged on each support column, can form multilayer.
Air supply system mainly is made up of air inlet connector, gas control valve and the gas flowmeter, the Pressure gauge that place casing, can also add the inlet air filtration film.
In the film forming apparatus of the present invention, place the air inlet flare shape in the casing, can the air admission hole of flare shape be separated into the leg-of-mutton flat mouthful of air inlet of multilayer by dividing plate.
In the film forming apparatus of the present invention, place gas outlet and air inlet in the casing to be the horn shape of symmetry, also can the air admission hole of flare shape be separated into the air inlet of the leg-of-mutton flat mouth of multilayer by dividing plate.
Description of drawings
The present invention is further detailed explanation below in conjunction with the drawings and specific embodiments.
Fig. 1 is a casing schematic diagram of the present invention.
Fig. 2 is a body structure schematic diagram of the present invention.
Fig. 3 is a filming rack structural representation of the present invention.
The specific embodiment
The middle part of system film box body is the space of using for the placement filming rack, and this space can be a cuboid, also can be square.Sealing is closed with the door 6 that has silastic sealing strip in the front in space.On the door form is arranged, can observe film forming procedure in the cavity.
The casing of system film case is three layers, and skin is a metal level shell 11, and the intermediate layer is a heat-insulation layer 12, is made up of insulation material and heating tape 8, and internal layer is a stainless steel layer 10.
Casing left end design has gas handling system, and (air horn 9 is formed in 0.1MPa~0.1MPa), steel cylinder air inlet connector 5, the casing by gas control valve and gas flowmeter 4, Pressure gauge 1.In addition, gas handling system can install filter membrane additional, and the inlet air filtration film also can adopt glass sand filter.If can also drying device be installed at air inlet when atmospheric humidity is had requirement, the humidity of air inlet is regulated.Also can adopt the hot gas heating according to concrete operating position.
The right-hand member design system of giving vent to anger, the system of giving vent to anger comprise that placing the horn mouth 9 of giving vent to anger in casing outer give vent to anger connector 7 and the casing, the connector 7 of giving vent to anger is the interfaces that can be connected with vacuum system with solvent recovery unit.Solvent recovery unit is a condenser, and this condenser can carry out condensation to common solvent at normal temperatures and reclaim.Be connected the right side of casing.
The lower end design has temperature control system device, temperature control system device to comprise and has conventional accurate temperature controller 2, switch element, heating alarm and power switch 3.And heating tape 8 four sides or five heating that heating element heater is formed in the casing.Temperature control system adopts temperature programming.It is room temperature~250 ℃ that casing is subjected to heat rating.
Box cavity left and right sides sidewall is the air inlet and the horn mouth 9 of giving vent to anger, bilateral symmetry, and the dividing plate that is respectively equipped with layered arrangement in the horn mouth is to form flat mouthful of leg-of-mutton turnover gas.Distance between flat mouthful of quantity and the flat mouth depends on the number of plies and the interlamellar spacing in the filming rack.Every sheaf space in each flat mouthful corresponding filming rack, ordinary circumstance are that flat mouthful position is a little less than the bottom of the last layer in every sheaf space in the filming rack.Flat mouthful the length of side is greater than the length of side of system film glass mould 19.
Place the filming rack in the box cavity to form by horizontal base 20, support column 14, fixed head 17 and leveling nut 18.All materials all are stainless steel or other inert material.Horizontal base 20 by the corrosion resistant plate more than 1 centimetre, three can regulate the screw 15 of lifting, three cylinder spill bases 16 are formed.Except being used for installing the hole that three of regulating lifting screw become isosceles triangle or equilateral triangle, also have three holes that also are into isosceles triangle or equilateral triangle on the corrosion resistant plate, be used to install support column.Support column is the stainless steel pillar with fine thread, and quantity is three.Pillar is fixed on the corrosion resistant plate of base by hexagon stainless steel nut 13, and the upper end adds that with triangle fixed head 17 hold-down nut 21 is fixing.Leveling nut 18 resembles " mushroom " shape, the top flat-top is circle and level and smooth, cylinder is cylindrical or prismatic, link closely with hexagon stainless steel nut and to be fixed on the suitable height of pillar, provide three strong points according to 3 theories of determining a plane to level board, be used to be placed to film glass mould 19.
Embodiment
1. the assembling of filming rack and level are regulated
A. be through on three closely-pitched screw rods by a setscrew nut and a leveling nut (" mushroom " shape) matching method.
B. three closely-pitched screw rods are fixed on the base plate.
C. after loading onto three adjustment screws on the base plate, whole parts are placed three spill bases.
D. the triangle fixed head is fixed on the top of three screw rods.
E. with the base level of precision at the above precision level adjusting of 0.02mM/M film forming frame.
F. behind fixing a pair of setscrew nut and leveling nut, place the float glass plate of level,, fix other two pairs of setscrew nuts and leveling nut successively by level meter.This layer of horizontal level just determined.
G. after determining certain height, repeat the F step, determine the horizontal level of all the other each layers successively.
2. equipment operating process
A. the filming rack that will regulate places the cavity of system film case, the level of regulating the filming rack base once more.
B. after placing the film-forming plates that fills the metering film forming liquid, close the door of casing, static a period of time.
C. open condenser system, condensation temperature is set.
D. open intake valve, start vacuum system, regulate certain gas flow rate, determine certain vacuum.Perhaps adopt the steel cylinder air inlet, regulate certain gas flow rate, determine certain tank pressure.
E. start heating system, design certain heating rate, determine certain heating gradient.
F. carry out the solvent evaporation by imposing a condition.
G. close intake valve, close condenser system, constant temperature vacuum drying certain hour.
H. close heating system and vacuum system, cool naturally.
I. open the steel cylinder air inlet, the malleation taking-up level board that opens the door is got film.
3. specific embodiment
Preparing thickness with solution casting method is 20 microns polylactic acid film
Start condenser system.The PLA ethyl acetate solution that has prepared is poured in the marginate level board made from glass plate, level board is placed on the film forming frame that has regulated, close cabinet door.After static half an hour, open intake valve, by G3 glass sand filter, adopt the atmosphere air inlet, start vacuum system, the adjustments of gas flow is 2.0M 3/ second, the vacuum of casing is reached-0.3MPa.Start heating system, adopt 5 ℃/minute the rate of heat addition to be warmed up to 50 ℃.Constant parameter kept 2 hours.Close condenser system and air supply system, be warmed up to 80 ℃, continuation vacuum drying 4 hours with 0.5 ℃/minute.Close heating system and vacuum system, cool naturally.During to room temperature, open intake valve and enter the filtration atmosphere, behind the maintenance normal pressure, the taking-up level board that opens the door takes out polylactic acid membrane.Area through measuring effective district is 90%, in the effective coverage, cuts a film and tests its thickness, and its thickness is within 18~22 micrometer ranges.The rate of recovery of ethyl acetate solvent is 91%.Adhere to specification.
The invention has the advantages that:
1. the even thickness of film mainly is to be caused by the horizontality of level board and the horizontality of placement, according to This situation selects float glass plate, polyfluortetraethylene plate etc. as level board, and filming rack provides placement Horizontality, thereby solve the even thickness of film.
2. the profile pattern of film mainly is too fast by the solvent evaporation, and the solvent drop is fallen into, in the film casing processed The factors such as the gas disturbance is excessive cause, thereby cause the surface of film that ripple, the situation such as uneven are arranged. Logical Cross air inlet and take away fast solvent, solve the solvent drop and fall into; Air inlet by one fen multilayer is set and The gas flow rate control valve is to reduce the casing air inlet to the disturbance of film forming; By temperature control adopt temperature programming or Use hot gas, to reach the purpose of solvent evaporation appropriateness.
3. the cleaning of film mainly is that the reasons such as the dust brought into by gas, bacterium cause. By at air feed being Filter membrane (especially particularly effective at the use atmosphere) is set in the system or uses special cyclinder gas, make The cleannes of air inlet can reach the standard of 100,000 grades or ten thousand grades. Condenser is adopted in the recovery of solvent, subtracts Lacked environmental pollution.
The present invention is a kind of simple in structure, easy to operate, film device processed that yield rate is high, and it is of many uses, The practical value height.

Claims (9)

1. film forming apparatus, comprise casing, gas handling system, the system of giving vent to anger, the temperature control system of band door and place the interior filming rack of casing, it is characterized in that: filming rack mainly is made up of horizontal base (20), support column (14), fixed head (17) and leveling nut (18).
2. according to the described film forming apparatus of claim 1, it is characterized in that: support column (14) has fine thread, and several 3 of support column is isosceles triangle or equilateral triangle.
3. according to the described film forming apparatus of claim 1, it is characterized in that: leveling nut (18) is closely buckled on the support column (14), lays respectively at the corresponding leveling nut (18) of 3 support columns, forms a level course.
4. according to the described film forming apparatus of claim 1, it is characterized in that: gas handling system comprises air horn (9) in the air inlet connector (5) that places outside the casing and the gas control valve that links to each other and gas flowmeter (4), Pressure gauge (1) and the casing.
5. according to the described film forming apparatus of claim 4, it is characterized in that: air supply system also comprises the inlet air filtration film.
6. according to the described film forming apparatus of claim 4, it is characterized in that: air horn (9) is equipped with the flat mouth of leg-of-mutton air inlet of layered arrangement in the described casing.
7. according to the described film forming apparatus of claim 1, it is characterized in that: the system of giving vent to anger comprises and places the horn mouth (9) of giving vent to anger in outer connector of giving vent to anger (7) of casing and the casing.
8. according to the described film forming apparatus of claim 7, it is characterized in that: the horn mouth of giving vent to anger in the described casing is equipped with the leg-of-mutton of layered arrangement and gives vent to anger flat mouthful.
9. according to the described film forming apparatus of claim 1, it is characterized in that: described casing is three layers, and skin is metal level (11), and the intermediate layer is heat-insulation layer (12), and internal layer is stainless steel layer (10).
CNB2006101675118A 2005-12-26 2006-12-25 Film forming apparatus Expired - Fee Related CN100540258C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNB2006101675118A CN100540258C (en) 2005-12-26 2006-12-25 Film forming apparatus

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN200510022399.4 2005-12-26
CN200510022399 2005-12-26
CNB2006101675118A CN100540258C (en) 2005-12-26 2006-12-25 Film forming apparatus

Publications (2)

Publication Number Publication Date
CN1990209A CN1990209A (en) 2007-07-04
CN100540258C true CN100540258C (en) 2009-09-16

Family

ID=38212855

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2006101675118A Expired - Fee Related CN100540258C (en) 2005-12-26 2006-12-25 Film forming apparatus

Country Status (1)

Country Link
CN (1) CN100540258C (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103272738B (en) * 2013-06-17 2015-08-19 哈尔滨工业大学 Quick coating device and method in a kind of laboratory
CN107857889A (en) * 2017-12-08 2018-03-30 北京金能世纪科技有限公司 A kind of solution casts big film device and method
CN111793229B (en) * 2019-04-09 2022-10-11 辽宁格瑞帕洛孚新能源有限公司 Solution film forming apparatus and method

Also Published As

Publication number Publication date
CN1990209A (en) 2007-07-04

Similar Documents

Publication Publication Date Title
CN100540258C (en) Film forming apparatus
WO2001057289B1 (en) Device and method for depositing one or more layers onto a substrate
DE102011083245B4 (en) Method and device for depositing an epitaxial layer of silicon on a semiconductor wafer of monocrystalline silicon by vapor deposition in a process chamber
TW593939B (en) Flowrate feedback control method and apparatus for fan filter unit
CN205077131U (en) High flux composite material chip precursor deposition equipment
CN111288699B (en) Device and method for preparing borneol for whole aircraft engine ice swallowing test
CN201046596Y (en) Film making device
CN102051580A (en) Vapor plating device and vapour plating method
TW201908514A (en) Solid composition sublimer apparatus, systems, and methods of using same
CN108917310A (en) A kind of use for laboratory Multifunctional oven
CN101339967A (en) Two-chamber alternative amorphous silicon photovoltaic film chemical vapour deposition equipment
CN203992411U (en) A kind of device of preparing glassy metal particle
CN108467190A (en) A kind of glass plate thickness detection adjustment system and its application method
CN208800134U (en) A kind of multifunctional electro-heating convection oven
CN109289530A (en) A kind of anti-determination method for cleaning the crash time of ceramic membrane
CN107649225A (en) Mask plate, mould and micro-fluidic chip and preparation method and purposes
CN208279495U (en) A kind of glass plate thickness detection adjustment system
CN112551875A (en) Toughened glass production line air inlet system
CN216760805U (en) Gravity-flow membrane device
CN111850511A (en) Novel pyrolytic graphite vapor deposition device and process
CN206318924U (en) Thin polymer film casting method preparation facilities
LU504044B1 (en) The sintering device for the production of piezoelectric ceramics containing volatile elements
CN215480933U (en) Mould incubator instrument for pharmacy
CN111180371A (en) Atomic deposition storage frame and atomic deposition equipment
CN205443440U (en) Real empty room temperature automatic control device of coating machine

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C56 Change in the name or address of the patentee
CP03 Change of name, title or address

Address after: Hi tech building, East Road, hi tech Zone, Chengdu, Sichuan

Patentee after: Chengdu Organic Chemicals Co., Ltd., Chinese Academy of Sciences

Address before: No. four, South Renmin Road, Sichuan, Chengdu Province nine

Patentee before: Chengdu Organic Chemicals Co., Ltd., Chinese Academy of Sciences

C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20090916

Termination date: 20111225