CN100529848C - Liquid crystal display device, electro-optical device - Google Patents

Abstract

The subject of the present invention is to provide a liquid crystal display device that requires no functional components to be out-connected with the peripheral external areas of the liquid crystal display panel and can realize high functions through the installation of functional components. The liquid crystal display device of the present invention is provided with a plurality of pixels that are arranged in a matrix shape and drive components that are used for driving the pixels. The liquid crystal display device and the pixels of the matrix shape are arranged in the same plane; and the device also has a plurality of functional components that have different functions from the drive components. Simultaneously, the area of the pixels is different from the area of the functional components.

Description

Liquid crystal indicator and electro-optical device

The application is dividing an application of application number is 03120647.6, the applying date is on March 18th, 2003 original bill application, and the first of this original bill application is JP2002-279102 in first to file, and formerly the applying date is on September 25th, 2002.

Technical field

The present invention relates to liquid crystal indicator, electro-optical device and manufacture method thereof, electronic installation.

Background technology

Liquid crystal indicator is by constituting with the lower part: pixel electrode and TFT (thin film transistor (TFT)) on-off element of etc.ing used of this pixel electrode of control are configured in and cross one another into the device substrate of arranging formation between rectangular many data lines and the sweep trace; Formed counter substrate with pixel electrode opposite electrode in opposite directions; And the display panels (display part) that constitutes by the liquid crystal that is filled between these two substrates.Be connected to above-mentioned on-off element electric conductivity the above-mentioned data line of supplying with picture signal and apply successively on the above-mentioned sweep trace of sweep signal.In addition, in the peripheral exterior lateral area of display panels, be provided with the switching of the above-mentioned on-off element of control or the scan line drive circuit and the data line drive circuit of liquid crystal display.

In addition, in liquid crystal indicator, in the peripheral exterior lateral area of above-mentioned display panels above-mentioned scan line drive circuit and above-mentioned data line drive circuit have been installed not only, but also by element and various circuit various function element such as (IC) such as external various sensors, carried out specially installing (for example, patent documentation 1).

[patent documentation 1]

Te Kaiping 5-80314 communique (the 6th page, Fig. 1)

; if various members are installed in the outside of display panels with external form; then do not increase the peripheral installation region of contribution as the demonstration of substrate when watching; multifunction by the liquid crystal indicator in the substrate of specific limited is restricted, owing to the external integrated difficulty of bringing of giving liquid crystal indicator.

In addition, function element also can only be installed in the member of the kind that the peripheral exterior lateral area of display panels can install, for example, function element be can be matrix configuration, equably under the situation of the such member of the same function of two-dimensional arrangement or the situation of the member of the big domain type of occupied area inferior, this function element can not be installed, and the function that can install is restricted.

In addition, under situation about with external form function element being installed on the above-mentioned display panels, because display panels is different members with function element, so be necessary to make respectively the technology of display panels and the technology of functional elements, so process number increases, process is elongated, causes cost to increase.

The present invention finishes in view of the above fact, its purpose is to provide a kind of the needs that function element is connected in the peripheral exterior lateral area of display panels outward, comprise that the member that can not be installed in the kind in the exterior lateral area comes the installation function element, highly integrated and multifunction can be sought, and liquid crystal indicator, electro-optical device and manufacture method thereof and electronic installation that cost increases can be reduced.

In order to achieve the above object, first kind of liquid crystal indicator of the present invention is to have to be arranged in rectangular a plurality of pixels and the liquid crystal indicator that drives the driving element of this pixel, it is characterized in that: in the zone (so-called image display area) that constitutes by above-mentioned a plurality of pixels, disposed function element with function different with the function of above-mentioned driving element for demonstration.

If adopt first kind of liquid crystal indicator of the invention described above, then constitute owing to function element being assembled in the intra-zone that constitutes by a plurality of pixels that constitutes liquid crystal indicator for showing, so various functions can be built in for the intra-zone that shows, can seek multifunction, highly integrated.

In addition, in order to achieve the above object, second kind of liquid crystal indicator of the present invention have be arranged in rectangular a plurality of pixels and by the driving element that drives this pixel and drive that wiring lines layer that above-mentioned pixel uses constitutes for the zone that shows, this liquid crystal indicator is characterised in that: in above-mentioned zone for demonstration, disposed the function element with function different with the function of above-mentioned driving element on to above-mentioned driving element or above-mentioned wiring layer position overlapped.

If adopt second kind of liquid crystal indicator of the invention described above, then owing to be the position that can not influence the grade when showing in demonstration any of demonstration, reflective-mode to wiring layer or driving element position overlapped at transmission mode, so by utilizing this position, in for the zone that shows, form function element, the build-in function element, multifunction can be sought, the demonstration grade can be do not reduced again.

In addition, in order to achieve the above object, the third liquid crystal indicator of the present invention is to have each pixel to be spaced into rectangular a plurality of pixels and the liquid crystal indicator that drives the driving element of this pixel with regulation, it is characterized in that: with above-mentioned be arranged in rectangular a plurality of pixels for the one side in, be provided with a plurality of a plurality of function element, make this a plurality of function element interval each other different simultaneously with the above-mentioned interval that is arranged in rectangular pixel with function different with the function of above-mentioned driving element.

If adopt the third liquid crystal indicator of the invention described above, then owing in same plane, form a plurality of pixels and a plurality of function element, interval difference between interval between a plurality of function element and a plurality of pixel, so reduce as far as possible cause by a plurality of function element to light transmissive obstruction in, can also the assembling function element, can in same manufacturing process, form the manufacturing process of pixel and the manufacturing process of functional elements, and can seek multifunction, and do not reduce the demonstration grade.

In the liquid crystal indicator of said structure, the interval between the function element is increased.

If adopt this structure, then the configurable number quantitative change of the function element in the image display area is few, has reduced the zone of occupying on the plane of function element, can enlarge formation to making the contributive zone of light transmissive demonstration, what make numerical aperture reduces to reach Min., can prevent to show the decline of grade.

In addition, about the collocation method of function element, also function element can be configured in a pair of substrate of holding liquid crystal with a substrate another substrate in opposite directions that forms above-mentioned driving element and above-mentioned wiring layer on.In the case, energy will be configured in above-mentioned driving element locational light shield layer in opposite directions and be arranged on above-mentioned another substrate, and function element is arranged between above-mentioned light shield layer and above-mentioned another substrate.Perhaps, also can be at the side formation function element of above-mentioned light shield layer towards above-mentioned liquid crystal.Perhaps, also can form function element on above-mentioned another substrate with on the face of the opposite side of a side of above-mentioned liquid crystal.In addition, also function element can be configured on the substrate that forms above-mentioned driving element and above-mentioned wiring layer in a pair of substrate of holding liquid crystal.

In addition, in order to achieve the above object, the 4th kind of liquid crystal indicator of the present invention is to have each pixel to be spaced into rectangular a plurality of pixels and the liquid crystal indicator that drives the driving element of this pixel with regulation, it is characterized in that: with above-mentioned be arranged in rectangular a plurality of pixels for the one side in, be provided with a plurality of function element with function different with the function of above-mentioned driving element, make a plurality of function element interval each other different simultaneously with the above-mentioned interval that is arranged in rectangular pixel with first function, and, make with the nonoverlapping position of a plurality of function element with above-mentioned first function on have different with a plurality of function element interval each other of the difference in functionality of above-mentioned first function with the above-mentioned interval that is arranged in rectangular pixel.

If adopt the 4th kind of liquid crystal indicator of the present invention, then because at least two kinds of function element of difference in functionality can be installed, make the configuration space of these function element different simultaneously with pixel separation, so reduce as far as possible owing to be provided with that a plurality of function element cause to light transmissive obstruction in, can also the assembling function element.

In addition, in order to achieve the above object, the 5th kind of liquid crystal indicator of the present invention is to have to be arranged in rectangular a plurality of pixels and the liquid crystal indicator that drives the driving element of this pixel, it is characterized in that: with above-mentioned be arranged in rectangular a plurality of pixels for the one side in, be provided with a plurality of function element, make the area of above-mentioned pixel different simultaneously with the area of function element with function different with the function of above-mentioned driving element.In the case, the area of above-mentioned pixel is increased.

If adopt the 5th kind of liquid crystal indicator of the present invention, then owing to setting area mutually independently with the occupied area of pixel, so the degree of freedom of design increases according to the function or the performance of function element.In addition, under the situation that the area of pixel increases, can suppress because of the decline of the demonstration grade that function element causes is set.

In second kind of liquid crystal indicator of the invention described above, also can constitute like this: above-mentioned wiring layer constitutes many data lines and the multi-strip scanning line that crosses one another, have and be separately positioned on the pixel electrode of using by the liquid crystal drive in above-mentioned data line and the above-mentioned sweep trace area surrounded, function element has pair of electrodes simultaneously, and above-mentioned pair of electrodes is separately positioned on a pair of substrate of holding liquid crystal along the plane with crossing one another.This structure is the example that the function element with the liquid crystal indicator of active array type and passive matrix combines.

Perhaps, it is that a kind of having is arranged in a plurality of scan electrodes that rectangular a plurality of pixels, liquid crystal drive use and is the liquid crystal indicator of a plurality of data electrodes of crossing on the same level with above-mentioned a plurality of scan electrodes, also can constitute like this: in for the zone that shows, disposed and electric conductivity is arranged be connected many data lines crossing one another and the function element of the function element usefulness electrode on the multi-strip scanning line.This structure is the example that the function element with the liquid crystal indicator of passive matrix and active array type combines.Perhaps, also can constitute like this: dispose the function element of function element with electrode in for the zone that shows, liquid crystal drive is with electrode double as function element electrode.

And function element also can comprise multiple building blocks of function.

First kind of electro-optical device of the present invention is to have to be arranged in rectangular a plurality of pixels and the electro-optical device that drives the driving element of this pixel, it is characterized in that: in the zone that constitutes by above-mentioned a plurality of pixels, disposed function element with function different with the function of above-mentioned driving element for demonstration.

More than, though as liquid crystal indicator the present invention has been described, the device that has this function element is not limited to liquid crystal indicator, also can apply the present invention to pixel drive other electro-optical devices with element.In the case, can obtain the same effect of situation with above-mentioned liquid crystal indicator.

Second kind of electro-optical device of the present invention is to have to be arranged in rectangular a plurality of pixels and by the driving element that drives this pixel and drive the electro-optical device for the zone that shows that wiring lines layer that above-mentioned pixel uses constitutes, it is characterized in that: in above-mentioned zone, on to above-mentioned driving element or above-mentioned wiring layer position overlapped, disposed function element with function different with the function of above-mentioned driving element for demonstration.

The third electro-optical device of the present invention is to have each pixel to be spaced into rectangular a plurality of pixels and the electro-optical device that drives the driving element of this pixel with regulation, it is characterized in that: with above-mentioned be arranged in rectangular a plurality of pixels for the one side in, be provided with a plurality of function element, make this a plurality of function element interval each other different simultaneously with the above-mentioned interval that is arranged in rectangular pixel with function different with the function of above-mentioned driving element.

The 4th kind of electro-optical device of the present invention is to have each pixel to be spaced into rectangular a plurality of pixels and the electro-optical device that drives the driving element of this pixel with regulation, it is characterized in that: with above-mentioned be arranged in rectangular a plurality of pixels for the one side in, be provided with a plurality of a plurality of function element with function different with the function of above-mentioned driving element, make a plurality of function element interval each other different simultaneously with the above-mentioned interval that is arranged in rectangular pixel with above-mentioned first function, and, make with the nonoverlapping position of a plurality of function element with above-mentioned first function on have a function different with above-mentioned first function a plurality of function element interval each other different with the above-mentioned interval that is arranged in rectangular pixel.

The 5th kind of electro-optical device of the present invention is to have to be arranged in rectangular a plurality of pixels and the electro-optical device that drives the driving element of this pixel, it is characterized in that: with above-mentioned be arranged in rectangular a plurality of pixels for the one side in, be provided with a plurality of function element, make the area of above-mentioned pixel different simultaneously with the area of function element with function different with the function of above-mentioned driving element.

The manufacture method of first kind of electro-optical device of the present invention is the manufacture method that has the electro-optical device of the driving element that is arranged in rectangular a plurality of pixels and drives this pixel, it is characterized in that: in the zone that constitutes by above-mentioned a plurality of pixels, form function element with function different with the function of above-mentioned driving element for demonstration.

The manufacture method of second kind of electro-optical device of the present invention is to have to be arranged in rectangular a plurality of pixels and by the driving element that drives this pixel and the manufacture method for the electro-optical device in the zone that shows that drives that wiring lines layer that above-mentioned pixel uses constitutes, it is characterized in that: in above-mentioned zone, on to above-mentioned driving element or above-mentioned wiring layer position overlapped, form function element with function different with the function of above-mentioned driving element for demonstration.

The manufacture method of the third electro-optical device of the present invention is to have the manufacture method of electro-optical device that be spaced into rectangular a plurality of pixels and drive the driving element of this pixel of each pixel with regulation, it is characterized in that: with above-mentioned be arranged in rectangular a plurality of pixels for the one side in, form a plurality of function element, make this a plurality of function element interval each other different simultaneously with the above-mentioned interval that is arranged in rectangular pixel with function different with the function of above-mentioned driving element.

The manufacture method of the 4th kind of electro-optical device of the present invention is to have the manufacture method of electro-optical device that be spaced into rectangular a plurality of pixels and drive the driving element of this pixel of each pixel with regulation, it is characterized in that: with above-mentioned be arranged in rectangular a plurality of pixels for the one side in, form a plurality of a plurality of function element with function different with the function of above-mentioned driving element, make a plurality of function element interval each other different simultaneously with the above-mentioned interval that is arranged in rectangular pixel with first function, and, make with the nonoverlapping position of a plurality of function element with above-mentioned first function on have a function different with above-mentioned first function a plurality of function element interval each other different with the above-mentioned interval that is arranged in rectangular pixel.

The manufacture method of the 5th kind of electro-optical device of the present invention is the manufacture method that has the electro-optical device of the driving element that is arranged in rectangular a plurality of pixels and drives this pixel, it is characterized in that: with above-mentioned be arranged in rectangular a plurality of pixels for the one side in, a plurality of function element with function different with the function of above-mentioned driving element are set, make the area of above-mentioned pixel different simultaneously with the area of function element.

Electronic installation of the present invention is characterised in that: the electro-optical device that has the invention described above.If employing the present invention, the electronic installation of the multiple functions such as demonstration calibration function that then can realize showing the grade excellence, have membrane keyboard, be undertaken by temperature.

Description of drawings

Fig. 1 is the brief strabismus map of an example of overall schematic structure of the liquid crystal indicator of expression one embodiment of the present of invention.

Fig. 2 is the planimetric map in zone of the part of the liquid crystal indicator in the presentation graphs 1.

Fig. 3 is to showing contributive zone and the key diagram to showing that the non-display area that do not have contribution is used in the planar structure of explanation liquid crystal indicator shown in Figure 2.

Fig. 4 (A) is the sectional view of the D-D section of the liquid crystal indicator in the presentation graphs 2, and Fig. 4 (E) is the sectional view of the E-E section of the liquid crystal indicator in the presentation graphs 2.

Fig. 5 is the planimetric map of an example of structure of the liquid crystal indicator of expression another embodiment of the present invention.

Fig. 6 is to showing contributive zone and the key diagram to showing that the non-display area that do not have contribution is used in the planar structure of explanation liquid crystal indicator shown in Figure 5.

Fig. 7 is the sectional view of the F-F section of the liquid crystal indicator in the presentation graphs 5.

Fig. 8 (A), (B) are the planimetric maps of an example of structure of the liquid crystal indicator of expression another embodiment of the present invention.

Fig. 9 is the sectional view of an example of structure of the liquid crystal indicator of expression another embodiment of the present invention.

Figure 10 is the sectional view of an example of structure of the liquid crystal indicator of expression another embodiment of the present invention.

Figure 11 is the equivalent circuit diagram of the liquid crystal indicator of the first embodiment of the present invention.

Figure 12 is the change example of configuration of function element of the liquid crystal indicator of embodiments of the invention.

Figure 13 be its another become example.

Figure 14 is the equivalent circuit diagram of an example of the liquid crystal indicator of expression another embodiment of the present invention.

Figure 15 is the summary construction diagram of this liquid crystal indicator.

Figure 16 is the equivalent circuit diagram of an example of the liquid crystal indicator of expression another embodiment of the present invention.

Embodiment

Below, specifically describe the example of the preferred embodiments of the present invention with reference to accompanying drawing.

[first embodiment]

(general structure of liquid crystal indicator)

The overall schematic structure of the liquid crystal indicator of the first embodiment of the present invention at first, is described with reference to Fig. 1.Fig. 1 is the brief strabismus map of an example of the overall schematic structure of expression liquid crystal indicator.

As shown in Figure 1, the liquid crystal indicator 1 of present embodiment for example is the display panels of active array type, by constituting: forming the device substrate 20 that is rectangular on-off element that forms (driving element) (though not shown in Fig. 1, the back will describe in detail) and pixel electrode 11 on the one side with the lower part; The counter substrate 30 that disposes in opposite directions with said elements substrate 20; And by liquid crystal being enclosed the liquid crystal layer 40 that forms between these device substrates 20 and the counter substrate 30.In addition, at four peripheries of counter substrate 30, form not shown encapsulant, utilize the encapsulant on this four limit can enclose liquid crystal at the periphery of the above-mentioned counter substrate 30 in device substrate 20 upper edges.

And, in liquid crystal indicator shown in Figure 11, constitute the exterior lateral area A of the periphery of counter substrate 30; And in constitute for the zone that shows by a plurality of pixels 10, the image display area B that can carry out the image demonstration that counter substrate 30 in, constitutes by same profile roughly.In the exterior lateral area A of the periphery of counter substrate 30, on device substrate 20, be provided with the switching of above-mentioned on-off element or show data line drive circuit 3 and the scan line drive circuit 4 of controlling usefulness, limit along device substrate 20 is provided with data line drive circuit 3, one side along adjacent with this limit scan line drive circuit 4 that is provided with.

In addition, here, constitute in the rectangular a plurality of pixels 10 of forming of above-mentioned image display area B, pixel 10 is to comprise the pixel that makes the entire infrastructure key element that a pixel job uses, it is the pixel that comprises pixel electrode, selects on-off element that pixel electrode uses, keeps electric capacity, current potential is supplied with the space of sweep trace that pixel electrode uses and data line (all not shown in Fig. 1, but the back will describe in detail), liquid crystal layer 40 etc.In addition, the rectangular area of being distinguished by sweep trace and data line in the plane is called a pixel.But under the situation of the described in the back liquid crystal indicator that the uveal color filter that comprises R (red), G (green), B (indigo plant) different colours arranged, above-mentioned pixel becomes a point, constitutes a pixel by R, G, three points of B.

And, in the present embodiment, in any space in above-mentioned image display area B, also be provided with arbitrarily the function element 18 that has with above-mentioned on-off element difference in functionality.That is, be configured in the space of image display area B be configured in member among the exterior lateral area A etc. in the past.Below, illustrate in greater detail the allocation position of the function element in the cross-section structure of the allocation position of the function element in the planar structure of liquid crystal indicator and liquid crystal indicator.

(planar structure of liquid crystal indicator)

The planar structure of liquid crystal indicator 1 at first, is described with reference to Fig. 2.Fig. 2 is by in the part that forms the image display area that rectangular a plurality of pixels constitute in the liquid crystal indicator of present embodiment, see the planimetric map of device substrate from counter substrate one side (the C1 direction Fig. 1), show the various elements, wiring layer, pixel electrode of a plurality of pixel groups adjacent etc. with device substrate together with each inscape that on it, forms (among Fig. 1 C2 part).

As shown in Figure 2, comprise on the device substrate 20 of liquid crystal indicator 1: be arranged in rectangular a plurality of pixel electrodes 11; With pixel electrodes 11 be arranged in accordingly rectangular, the current potential of regulation is supplied with a plurality of on-off elements 12 that can carry out switch drive (being called " driving element " among the present invention) of these pixel electrode 11 usefulness; Selection is arranged in the multi-strip scanning line 13a as wiring layer of rectangular a plurality of above-mentioned on-off element 12 usefulness; According to the sweep signal of this sweep trace 13a, by the on-off element 12 that is conducting state, to many data line 14a as wiring layer of pixel electrode 11 energising usefulness; Constitute the electric capacity line 13b that electric capacity is used that accumulates that the voltage prevent to remain on the regulation in the liquid crystal layer 40 sews as wiring layer; And in the zone that should dispose pixel electrode 11, replace pixel electrode 11 and dispose, have function element 18 with the function difference in functionality of above-mentioned on-off element 12.

Here, function element 18 is identical with pixel electrode 11, is configured in by in sweep trace 13a, electric capacity line 13b, data line 14a, the 14b area surrounded.That is,,, come configuration feature element 18 by changing pixel electrode 11 into function element 18 to formed the zone of pixel electrode 11 in the past.In addition, replacing which pixel electrode 11 in a plurality of pixel electrodes 11 to come configuration feature element 18 is arbitrarily.

In addition, in the present embodiment, as the wiring that makes function element 18 work usefulness, " sweep trace that function element is used " that the sweep trace 13a that selects above-mentioned on-off element 12 usefulness is also used as selection function element 18 usefulness, on the other hand, different with the data line 14a of selector switch element 12 usefulness, be provided with the data line 14b that function element is used.Above-mentioned sweep trace 13a is connected on the above-mentioned scan line drive circuit shown in Figure 14, and above-mentioned data line 14a, 14b are connected on the above-mentioned data line drive circuit shown in Figure 13.

Pixel electrode 11 is formed by transparent conducting films such as for example ITO (tin indium oxide) films, is connected with the semiconductor layer 12a electric conductivity ground that becomes the transistorized channel region that constitutes on-off element 12 by contact hole 12c.

In addition, in the present embodiment, the wiring layer of imagination pixel electrode 11 and sweep trace 13a, data line 14a, data line 14b, electric capacity line 13b etc. disposes the situation of pixel electrodes 11 overlappingly in plan view, therefore, constitute showing the profile of contributive regional P and pixel electrode 11 about equally.In addition, no matter whether form on one deck, still on different layers, form wiring layer and pixel electrode can.

For example use TFT (thin film transistor (TFT)) etc. to form on-off element 12, be formed on the part as the semiconductor layer 12a of transistorized channel region.Be connected with sweep trace 13a electric conductivity ground by the grid film, be connected with data line 14a electric conductivity ground by contact hole 12b simultaneously.

In addition, the semiconductor layer 12a that constitutes on-off element 12 is connected with pixel electrode 11 electric conductivity ground by contact hole 12c, thereby can make on-off element 12 and pixel electrode 11 conductings.

Sweep trace 13a be for example according to the order of line and sequential according to the rules with impulse form apply successively sweep signal G1, G2 ... with wiring layer, be connected to electric conductivity on the on-off element 12, also be connected on the function element 18 to electric conductivity simultaneously.

Data line 14a be for example according to the order of line supply with successively picture signal S1, S2 ... with wiring layer, be connected with on-off element 12 electric conductivity ground.Thus, by utilize sweep signal G1, G2 ..., only during constant, on-off element 12 is opened, sequential according to the rules write the picture signal S1, the S2 that supply with from data line 14 ...

Data line 14b is used for supplying with or read output signal S1 ' ..., be connected with function element 18 electric conductivity ground.Thus, by utilize sweep signal G1, G2 ..., only during constant with the switch opens of function element 18, read or the information of write-in functions element 18 from data line 14.In the present embodiment, constitute the data line 14b that data line 14a that pixel electrode uses and function element are used, can image signal S1, S1 ', S2 ... supply with like that, read.

Here, be provided with under the situation that function element 18 replaces pixel electrode 11, wiring method as " sweep trace that function element is used " and " data line that function element is used ", also can be the sweep trace 13a that disposes pixel electrode 11 and the data line 14a of pixel electrode 11 with overlapping respectively form three-dimensionally, but in order not make operation oversize, data line 14b best and pixel electrode 11 only is provided with the data line 14b of function element 18 independently, and the sweep trace 13a of function element utilizes and selects the sweep trace 13a of the on-off element 12 of pixel electrode 11 is the sweep trace of the same line.

Electric capacity line 13b be and semiconductor layer 12a between form the wiring that electric capacity is used, be for will by pixel electrode 11 be written into the specified level in the liquid crystal layer 40 picture signal S1, S2 ... maintain in during constant, prevent that maintained picture signal from sewing, and constitute the electric capacity line of accumulating electric capacity.

Function element 18 so also can be the element of all kinds if having various elements, various member, the various semiconductor circuit of the function different with on-off element 12.For example, can enumerate: detect to utilize show touch panel etc. (the being two-dimensional arrangement) sensor, photodiode, the feedback circuit of pixel, the temperature correction circuit that can carry out the temperature correction of each pixel, various computing circuit, various memory element, various imaging apparatuss of the variation of the current potential that the electrode of usefulness keeps etc.

In addition,, but, the thickness of this member is increased, make the zone of occupying on the plane reach Min. for example about the above-mentioned member that occupies the zone increase even the zone of occupying on the plane of function element 18 becomes along with the difference of its kind.

The function element 18 of present embodiment is for example formed by sensor etc., comprise sensor with electrode 18a and be used to select the sensor with the sensor of electrode 18a with on-off element as the semiconductor layer 19a of channel region and constitute.In addition, in forming the zone of sensor, extend to form electric capacity line 13b with electrode 18a.

Sensor is connected with the semiconductor layer 19a electric conductivity ground that the formation sensor is used with on-off element by contact hole 19c with electrode 18a.In addition, constitute semiconductor layer 19a that sensor uses with on-off element by contact hole 19b and data line 14b electric conductivity be connected.Therefore, data line 14b and sensor can the conductings by constituting above-mentioned semiconductor layer 19a that sensor uses with on-off element with electrode 18a.

In the liquid crystal indicator 1 that above-mentioned such structure is arranged, scan line drive circuit 4 is by sweep trace 13a, with sweep signal G1, G2 ... be added on the on-off element 12, make this on-off element 12 be conducting state, by data line 14a, will corresponding to picture signal S1, the S2 of the voltage of gray scale ... be added on the pixel electrodes 11, thereby will be added on this liquid crystal layer 40, show corresponding to the electric field of the voltage of picture signal.

On the other hand, function element 18 utilizes sweep trace 13a, data line 14b to carry out work by the drive controlling of scan line drive circuit 4 and data line drive circuit 3.For example, if function element 18 is sensors, then become the state that can detect.

Like this, in the planar structure of above-mentioned liquid crystal indicator, as shown in Figure 2, be the wiring layer that lattice-shaped forms data line 14, sweep trace 13a, electric capacity line 13b etc., by pixel electrode 11 or function element 18 are laid respectively in the gap of the grid that is made of these wiring layers, function element 18 can be configured in image display area inside.

Figure 11 is the equivalent circuit diagram of the liquid crystal indicator of present embodiment.On-off element 12 and pixel electrode 11 be set in four zones to showing among contributive three regional P, comprise that sensor is set at showing among the regional O that does not have contribution with the function element 18 of electrode 18a.Sweep trace 13a is connected on the scan line drive circuit 4, and on the other hand, data line 14a is connected on the data line drive circuit 3.In addition, the data line 14b that is connected with function element 18 electric conductivity ground is connected on the testing circuit 51, the variation of the electric charge by generation in the data line 14b read out function element 18 etc.In addition, scan line drive circuit 4, data line drive circuit 3 are set and are connected controller 52 on the testing circuit 51, utilize the effect of controller 52, function element 18 can not only be carried out reading of data, and can also carry out writing of data.

(cross-section structure of liquid crystal indicator)

Secondly, the cross-section structure of above-mentioned liquid crystal indicator is described with Fig. 4 (A), (B).Fig. 4 (A) is the D-D sectional view of Fig. 2, and Fig. 4 (B) is the E-E sectional view of Fig. 2.

Shown in Fig. 4 (A), in the cross-section structure in the zone of the on-off element 12 that forms above-mentioned liquid crystal indicator, comprise: the device substrate 20 that has constituted pixel electrodes 11, on-off element 12, sweep trace 12a and data line 14 etc. as tft array substrate; Formed counter substrate 30 with pixel electrode 11 opposite electrode 32 in opposite directions; And be filled in liquid crystal layer 40 between these device substrates 20 and the counter substrate 30.

At least one is transparency carrier in a pair of substrate, and device substrate 20 is for example formed by glass substrate or quartz base plate, Si substrate etc., and another counter substrate 30 is for example by being formed by transparent components such as glass substrate or quartz base plates.Constituting on the device substrate 20: be configured in the semiconductor layer 12a on the device substrate 20; The dielectric film 16 that comprises the gate insulating film that makes sweep trace 13a and semiconductor layer 12a insulation; On above-mentioned dielectric film 16, separate sweep trace 13a and the electric capacity line 13b that forms respectively; Be covered with first interlayer insulating film 21 of above-mentioned sweep trace 13a, electric capacity line 13b, dielectric film 16, device substrate 20 formation; Be configured in the data line 14a in the zone of the above-mentioned semiconductor layer 12a of formation on above-mentioned first interlayer insulating film 21; Second interlayer insulating film 22 that spreads all over the zone formation that is covered with the above-mentioned data line 14a and first interlayer insulating film 21; And the pixel electrode 11 that in above-mentioned second interlayer insulating film 22, forms.

In addition, form to connect the contact hole 12b of first interlayer insulating film 21 and dielectric film 16, make data line 14a and semiconductor layer 12a electric conductivity be connected to become possibility.In addition, form to connect the contact hole 12c of second interlayer insulating film 22, first interlayer insulating film 21 and dielectric film 16, make pixel electrode 11 and semiconductor layer 12a electric conductivity be connected to become possibility.

Opposite electrode 32 is identical with pixel electrode 11 on the device substrate 20, form by transparent conducting films such as ITO films, constituting on the counter substrate 30: on the surface of liquid crystal layer 40 1 sides of above-mentioned counter substrate 30 with device substrate 20 on data line 14, sweep trace 13a, on-off element 12 in opposite directions zone, formation zone, be the light shield layer 33 that forms among the non-display area O of each pixel; And be covered with above-mentioned light shield layer 33, spread all over the opposite electrode 32 (common electrode) that whole surface forms.

Light shield layer 33 has the function of the colour mixture that improves contrast, prevent color material etc., has the function as so-called black matrix.In addition, light shield layer 33 is used for blocking the incident light from counter substrate 30 1 sides, prevents that light from injecting the channel region of semiconductor layer 12a of device substrate 20 or low concentration source region, low concentration drain region and delaying work of causing.

In addition, liquid crystal indicator 1 is provided with the alignment films that illustrates among the figure along the whole surface of device substrate 20 and counter substrate 30.

These device substrates 20 and counter substrate 30 dispose opposite to each other with pixel electrode 11 and opposite electrode 32, and liquid crystal is enclosed in the space that is surrounded by these substrates, forms liquid crystal layer 40.

Here, Fig. 4 (A) is the D-D sectional view of Fig. 2, and Fig. 4 (B) is the E-E sectional view of Fig. 2, in this Fig. 4 (A), forms pixel electrode in section, but in Fig. 4 (B), forms function element in section.That is, the cross-section structure of the part of formation pixel electrode is different with the cross-section structure of the part that forms function element.

Function element 18 is for example formed by sensor etc., shown in Fig. 4 (B), is configured on the device substrate 20.In the zone of this function element 18 of configuration, constituting on the device substrate 20: being used to form the transistorized channel region that is configured in the on-off element that the sensor on this device substrate 20 uses is semiconductor layer 19a; The dielectric film 19d that comprises gate insulating film; The electric capacity line 13b that on above-mentioned dielectric film 19d, extends to form; Be covered with first interlayer insulating film 21 of electric capacity line 13b, dielectric film 16, device substrate 20 formation; Second interlayer insulating film 22 that spreads all over the zone formation that covers above-mentioned first interlayer insulating film 21; And the sensor electrode 18a that on above-mentioned second interlayer insulating film 22, forms.

In addition, form to connect the contact hole 19c of second interlayer insulating film 22, first interlayer insulating film 21 and dielectric film 19d, make the be connected to become possibility of sensor with the electric conductivity of electrode 18a and semiconductor layer 19a.Thus, be used to form the transistorized semiconductor layer 19a as channel region that constitutes the on-off element that function element uses by utilization, the sensor of selection function element 18 electrode 18a can carry out the detection of information.

In addition, in the regional O of formation on-off element 12 shown in Fig. 4 (A) or wiring layer, form light shield layer 32, pixel electrode 11 to showing among the contributive regional P, basically be the structure that does not form light shield layer 32, but shown in Fig. 4 (B), in the regional P ' of configuration feature element 18, also can form light shield layer 32 as required.

In the liquid crystal indicator 1 that constitutes by above-mentioned such planar structure and cross-section structure, shown in Fig. 2 and Fig. 4 (A), form pixel electrode 11 to showing contributive regional P; And by the wiring layer of sweep trace 13a, data line 14a, data line 14b, electric capacity line 13b etc. and transistor unit 12 constitute to showing the non-display area O that does not have contribution, sacrifice to constitute some in the pixel electrode 11 that shows contributive regional P, function element 18 is set replaces pixel electrodes 11.

That is, in planar structure, form as shown in Figure 3 because of pixel electrode 11 to showing contributive regional P and, utilizing this to showing the regional P ' that comprises among the regional O that does not have contribution, configuration feature element 18 to show there not being the regional O of contribution.

At this moment, for example the light from counter substrate 32 incidents sees through among regional P, does not see through in regional O, P '.

And though the regional P ' of configuration feature element 18 also becomes show there not being the zone of contribution, under situation about seeing from the entire image viewing area, imagination can be ignored the situation to the influence of demonstration by function element 18 generations.Under these circumstances, irrelevant with above-mentioned regional P, O, perhaps be not limited to the shape of regular property, can at random constitute function element 18.

Like this, can use the broad regions that is called image display area, to the member that in peripheral exterior lateral area, disposed, the function element such as member that maybe can't dispose (for example function element of all function such as circuit beyond the Presentation Function or the sensor) function beyond additional the demonstration in the past, can seek effective utilization of image display area, display space, add various new functions, seeking multifunction, be favourable aspect integrated simultaneously to liquid crystal indicator.

(about manufacturing process)

Secondly, the manufacturing process of the liquid crystal indicator of above-mentioned such formation is described with reference to Fig. 4 (A), (B).

At first, prepare device substrates 20 such as quartz base plate, Bohemian glass substrate, silicon substrate.Here, be preferably in the inert gas atmosphere and carry out annealing in process, by carrying out such pre-treatment (thermal treatment), so that reduce the distortion that substrate takes place in the high-temperature process of Shi Shiing in the back with high temperature.

Secondly, in the lower environment of temperature, utilize decompression CVD method, on device substrate 20, form amorphous silicon film, after this,, the polysilicon film fixed bed is grown to till the thickness that reaches specific by in nitrogen atmosphere, this amorphous silicon film being carried out annealing in process.Thus, carry out the formation of the semiconductor layer 19a of the semiconductor layer 12a of on-off element 12 and function element 18.

Then, temperature with regulation makes the semiconductor layer 12a that constitutes on-off element 12 carry out thermal oxide, forms the thermal oxidation silicon film of thin thickness, again with decompression CVD method, deposit becomes thickness relatively thinner high-temperature oxydation silicon fiml or silicon nitride film, forms the dielectric film 16 with sandwich construction.Here, as the formation method of semiconductor layer 12a, both can be with the polysilicon formation method of laser annealing, also monocrystalline silicon can be fitted on the substrate and form.In addition, in order to form the method that can low temperature forms that dielectric film 16 also can adopt PECVD method etc.

Secondly, utilized deposit such as decompression CVD method behind the polysilicon film, thermal diffusion phosphorus etc. make polysilicon film have electric conductivity.Then, polysilicon film is carried out composition, form the sweep trace 13a and the electric capacity line 13b of compulsory figure shown in Figure 2.Here, also can replace polysilicon film with metal gates with formation Al, Mo, Ti, Ta, Cr, W and their alloys such as sputtering methods.

Secondly, on-off element 12 is had under the situation of TFT of n channel-type of LDD structure making, in order to form low concentration source region and low concentration drain region on semiconductor layer 12a, the gate electrode of a part that will become sweep trace 13a mixes foreign ion as diffusion mask with low concentration.Thus, the semiconductor layer 12a below the sweep trace 13a becomes channel region.

Then, in order to form high concentration source region and the high concentration drain region that constitutes on-off element 12,, mix foreign ion with high concentration using the mask bigger after having formed resist layer on the sweep trace 13a than the width of sweep trace 13a.

Then, repeat each such operation, if form the semiconductor layer 12a that constitutes on-off element 12 with polysilicon film, the same operation of applying greatly when then forming on-off element 12 can form function element or other data line drive circuits and scan line drive circuit, and this is favourable on making.

Secondly, in order to cover sweep trace 13a and the electric capacity line 13b in the on-off element 12, for example form first interlayer insulating film 21 that constitutes by silicon oxide film etc. with normal pressure or decompression CVD method.

Then, for high concentration source region and high concentration drain region are activated,,, form contact hole to the data line 14 of semiconductor layer 12a by etching having carried out after the annealing in process.

In addition, in first interlayer insulating film 21, also open the contact hole that makes sweep trace 13a or electric capacity line 13b be connected usefulness with not shown wiring layer.In addition, form needed contact holes such as wiring similarly to function element 18.

Secondly, form metal film, in addition,, metal film is carried out composition, form data line 14 again by photo-mask process, etching procedure etc. with low resistive metal such as the Al of deposit light-proofness on first interlayer insulating film 21 such as sputtering method or metal silicide etc.Then, for cover data line 14, for example form second interlayer insulating film 22 that constitutes by silicon oxide film etc. with the PECVD method.

Secondly, in on-off element 12, connect the contact hole 12c that pixel electrode 11 and high concentration drain region are used by etching with forming electric conductivity.In addition, utilize sputtering method etc., transparent conducting film such as deposit ITO film on second interlayer insulating film 22, and it is carried out composition, form pixel electrode 11.

On the other hand,, at first prepare glass substrate etc., for example behind the splash-proofing sputtering metal chromium,, form light shield layer 33 through photo-mask process, etching procedure about counter substrate 30.

After this, utilize sputtering method etc., transparent conducting film such as deposit ITO film on the whole surface of counter substrate 32 forms opposite electrode 32.Above manufacture method only is an example, self-evident well-known low temperature polycrystalline silicon TFT manufacturing process or high temperature polysilicon TFT manufacturing process, body silicon manufacturing process, the SOI manufacturing process etc. of also can adopting.

At last, as mentioned above, dispose device substrate 20 and the counter substrate 32 that has formed each layer across along the frictional direction with regulation, the box of fitting into regulation is thick, makes blank panel.Liquid crystal is enclosed in the panel, made the liquid crystal indicator of present embodiment.

Like this, in the present embodiment, shown in Fig. 4 (A), (B), owing in one deck, form the semiconductor layer 12a of on-off element 12 and the semiconductor layer 19a of function element 18, and in same manufacturing procedure, form, do not need to make respectively existing such function element and liquid crystal indicator, so the cost can seek to reduce the liquid crystal indicator of functional elements internally-arranged type the time.

As mentioned above, if employing present embodiment, then owing to do not adopt such in the past external mode, the function element that can will have the function different with on-off element is assembled in the image display area inside for demonstration that is made of a plurality of pixels that constitute liquid crystal indicator, so can various functions are built-in, can seek multifunction, highly integrated.

In addition, owing to do not need as in the past, to carry out respectively the manufacturing process of liquid crystal indicator and the manufacturing process of various function element, in the manufacturing process of liquid crystal indicator, comprise the technology of making function element, particularly can use the operation identical with substrate process, make various function element, so can seek to simplify manufacturing process, reduction manufacturing cost.

In addition, in Fig. 2, show and use showing the structure example of a configuration feature element 18 among contributive four regional P.Can carry out in realization preferably adopting structure shown in Figure 12 to replace this structure under the situation of the colored liquid crystal indicator that shows.That is, will make vertical rectangle of growing up to showing contributive regional P, the uvea that R, G, the B of color filter is different is distributed to three adjacent points.These three points constitute can carry out a colored pixel that shows.Then, the downside of the each point in Figure 12 is provided with the little regional O to showing that nothing is contributed of area that comparison shows contributive regional P, and function element 18 is configured in each regional O.In addition, in this case, also can dispose the different function element of a plurality of functions.

Like this, under situation about function element such as imageing sensor 18 being configured in two-dimensional approach in the image display area B, preferably change to show contributive regional P and to the area of the regional O of display element contribution than and design.Therefore can suppress the decline of numerical aperture, can suppress owing to the decline that is provided with the demonstration grade that function element 18 causes.

Perhaps, also can be unlike corresponding to each point function element 18 being set one by one as shown in Figure 12, but as shown in figure 13, a function element 18 is set corresponding to R, G, three points of B.

[second embodiment]

Secondly, according to Fig. 5 to Fig. 7 the second embodiment of the present invention is described.In addition, only be illustrated the main item that relates to different parts that illustrates simply for identical with above-mentioned first embodiment in fact structure below.Fig. 5 is the planimetric map of the liquid crystal indicator of expression present embodiment.

In the first above-mentioned embodiment, the configuration feature element though sacrificed the zone that forms pixel electrode, but in the present embodiment, but do not sacrifice pixel electrode, but announced such a case: utilize the zone of energy laying-out and wiring layer or on-off element, in plan view, roughly dispose overlappingly with this zone.

Specifically, in the planar structure of liquid crystal indicator 100, as shown in Figure 5, wiring layer with rectangular formation sweep trace 113a, electric capacity line 113b, data line 114 etc., by pixel electrode 111 being configured on each point of crossing of these sweep traces 113a, data line 114, respectively pixel electrode 111 is constituted that each is rectangular.

In addition, from the plane, form semiconductor layer 112a overlappingly with these data lines 114 and sweep trace 113a, this semiconductor layer 112a is used for forming the transistor that constitutes the on-off element 112 of selecting pixel electrode 111 usefulness, in addition, from the plane, function element 118 is configured in and the wiring layer of data line 114, sweep trace 113a etc. or above-mentioned on-off element 112 roughly on the position overlapped.

In addition, on-off element 112 utilizes semiconductor layer 112a to be connected with data line 114 electric conductivity ground, is connected with pixel electrode 111 electric conductivity ground simultaneously.

In liquid crystal indicator 100 with above-mentioned such structure, as Fig. 5 and shown in Figure 6, form by pixel electrode 111 constitute to showing contributive regional P; And, utilize the regional O to the contribution of demonstration nothing shown in Figure 6, the configuration feature element by the regional O that sweep trace 113a, data line 114, electric capacity line 113b constitute to showing that nothing is contributed.This was exactly the zone of transmitted light not to the regional O that show not to have contribution originally, so even the configuration feature element can not reduce the demonstration grade yet.

In addition, in the cross-section structure of liquid crystal indicator 100, as shown in Figure 7, comprising: the device substrate 120 that has constituted pixel electrodes 111, on-off element 112, sweep trace 113a and data line 114 etc.; Formed the counter substrate 130 of function element 118, insulation course 131, light shield layer 133, opposite electrode 132; And be filled in liquid crystal layer 140 between these device substrates 120 and the counter substrate 130.

Promptly, in planar structure shown in Figure 5, function element 118 is configured on the wiring layer or above-mentioned on-off element 112 position overlapped of plane and data line 114, sweep trace 113a etc., in cross-section structure shown in Figure 7, on the surface of liquid crystal layer 140 1 sides of above-mentioned counter substrate 130, form zone corresponding to above-mentioned on-off element 112.

In addition, be covered with function element 118 and counter substrate 130 formation insulation courses 131, in lower floor, form light shield layer 133, be covered with above-mentioned light shield layer 133 and insulation course 131 forms opposite electrodes 132 corresponding to the insulation course 131 in the zone of above-mentioned on-off element 112.In addition, light shield layer 133 be positioned at counter substrate 130 1 sides or be positioned at counter substrate 130 1 sides and device substrate 120 1 sides or be positioned at any situations such as device substrate 120 1 sides can.At this moment, though incident light can be from device substrate 120, counter substrate 130 any one party incidents,, preferably above-mentioned light shield layer 133 is configured in counter substrate 130 1 sides utilizing light shield layer 133 to block under the situation from the light of counter substrate 130 1 sides.In addition, omitted, be preferably disposed on counter substrate 130 1 sides though relate to the wiring layer of function element 118.In addition, also can form function element 118 in the position that is equivalent between light shield layer 133 and the liquid crystal layer 140.

At this moment, as shown in Figure 7, show that contributive regional P is subjected to the restriction of the wiring width of data line 114, sweep trace 113a and electric capacity line 113b etc. on the device substrate 120 and the size of above-mentioned on-off element 112 etc., constitutes the open area that light is passed through though form 111 pairs of pixel electrodes.That is, form pixel electrodes 111 beyond each pixel electrode 111 between become as non-display area to showing the regional O that does not have contribution.

And, the function element 118 of present embodiment is configured in such to showing on the position arbitrarily among the regional O that does not have contribution.In addition, function element institute position overlapped also can constitute like this: at least one side integrally or overlapping partly in sweep trace, electric capacity line, data line, the on-off element.

Here, in above-mentioned first embodiment,,, can expect the part deepening that numerical aperture descends so consider degradation problem under the numerical aperture owing to the space arbitrarily that function element is configured in the image display area.

Different therewith, in the present embodiment, because in as plan view to zone that show not have contribution, with function element be configured in wiring layer or on-off element position overlapped on, so can not produce because the decline of the demonstration grade that the decline of numerical aperture causes.Thus, in such transmission window circlet border such as the liquid crystal indicator that can utilize, watch when showing and become favourable as the display of portable type information terminals such as PDA or mobile phone.

In addition, because function element is set at the light shield layer overlapping areas with counter substrate one side, so can in lighttight zone, constitute function element.In addition, because function element is arranged on counter substrate one side, so compare with the situation that is configured in device substrate one side, the density of element is low, and qualification rate improves.

In addition, for example in temperature correction circuit, constituted under the situation of function element 118,, can proofread and correct the temperature in the actual image display area B in image display area B by the plurality of temperature correcting circuit is set.

As mentioned above, if employing present embodiment, then owing to do not adopt such in the past external mode, and can adopt and the wiring or the equitant form of on-off element that constitute liquid crystal indicator, function element is assembled in inside, so can seek highly integrated, at this moment, owing to forming function element with wiring and on-off element position overlapped, thus can not hinder pixel electrode to showing contributive zone (open area), show that grade can not descend.

[the 3rd embodiment]

Secondly, according to Fig. 8 (A), (B) third embodiment of the present invention is described.Fig. 8 (A), (B) are the planimetric maps of the expression third embodiment of the present invention.

In the present embodiment, announced the example of such a case: its structure is to make the number of the function element that forms in image display area few with respect to the number of pixel electrode.

Specifically, in the planar structure of the liquid crystal indicator 200 of present embodiment, shown in Fig. 8 (A), the wiring layer of data line 214a, the data line 214b that function element is used etc. that use with rectangular formation sweep trace 213a, electric capacity line 213b, pixel electrode, by pixel electrode 211 being configured on each point of crossing of these sweep traces 213a, data line 214a, 214b, can constitute pixel electrode 211 rectangular respectively.

In addition, from the plane, form semiconductor layer 212a overlappingly with these data lines 114a, 214b, sweep trace 213a, electric capacity line 213b, this semiconductor layer 212a is used for forming the transistor that constitutes the on-off element 212 of selecting pixel electrode 211 usefulness.

In addition, in zone that data line 214b and sweep trace 213a and electric capacity line 213b intersect, between four adjacent pixel electrodes 211, function element 218 is set.

In the present embodiment, owing to be configuration feature element 218 on same one deck (same plane) at pixel electrode 211 with device substrate, thus the structure of taking the counterpart with pixel electrode 211 to cut away, so that corresponding to the shape of function element 218.In addition, in the present embodiment, utilize that data line 214b that function element uses and sweep trace 213a intersect to showing the non-display area that does not have contribution, configuration feature element 218.

By such formation, shown in Fig. 8 (B), make each function element 218 interval d1 each other wideer than each pixel electrode 211 interval d2 each other, reduce density difference, promptly reduce the density of the function element 218 in the image display area.

Like this, by reducing the configuration quantity of function element 218, reduce function element 218 in the plane occupy the zone, reduction in the pixel electrode 211 to showing the obstruction degree in contributive zone, can with printing opacity to showing that contributive zone forms more greatly, make the decline of numerical aperture reach Min., can prevent to show the decline of grade.

In addition, owing on roughly with one deck, form function element and pixel electrode,, can seek to improve the throughput rate in the manufacturing and reduce cost so also can in same manufacturing process, carry out.In addition, because the number of function element is few, so can improve qualification rate.

In addition, in the present embodiment, though for example understand situation with respect to a function element of four pixel electrodes configurations, with this distribution be that it doesn't matter.For example also can be with respect to function element of nine pixel electrode configurations.During the different a plurality of function element of configuration feature, be fit to adopt present embodiment.That is,, then can provide multi-functional, high performance liquid crystal indicator if make function different a plurality of function element skews and configuration similarly.

In addition, although understand the situation that the number make function element is lacked than the number of pixel electrode, but the situation that the number of pixel electrode is lacked than the number of function element is also passable, and importantly the interval of pixel electrode is different with the interval of function element gets final product.

In addition,, under the situation that forms wiring layer and pixel electrode part overlapping areas, form the electric capacity line, can also improve numerical aperture by upper strata at sweep trace as becoming example.

In addition, though can apparatus and method of the present invention be described according to several certain embodiments, this professional can carry out various distortion to the embodiment that records and narrates in the text of the present invention under the situation that does not break away from the spirit and scope of the invention.

For example; in above-mentioned second embodiment; though show the situation of function element between light shield layer and counter substrate; but be not limited thereto; as shown in Figure 9; also can with on the face M of the opposite side of liquid crystal layer 140 1 sides of counter substrate 130, form protective seam 134, with function element 136 be configured in this protective seam 134 with light shield layer 133 and light shield layer 135 position overlapped on.In addition, protective seam 134 for example can use nitride film or oxide film etc.

In addition, also the wiring layer of function element and function element can be arranged to be layered in the on-off element on the device substrate and the upper strata of wiring layer.

Specifically, as shown in figure 10, in the cross-section structure of liquid crystal indicator 400, comprising: the device substrate 420 that has constituted on-off element 412, sweep trace 413a, data line 414 and pixel electrode 411 etc.; Formed the counter substrate 430 of opposite electrode 432; And be filled in liquid crystal layer 440 between these device substrates 420 and the counter substrate 430.

Comprising on the device substrate 420: formation is configured in the semiconductor layer 412a that the pixel electrode 411 on this device substrate 420 selects the transistor of the on-off element 412 of usefulness to use; Make the dielectric film that comprises gate insulating film 416 of above-mentioned semiconductor layer 412a and sweep trace 413a insulation usefulness; On above-mentioned dielectric film 416, separate sweep trace 413a and the electric capacity line 413b that forms respectively; Be covered with first interlayer insulating film 421 of above-mentioned sweep trace 413a, electric capacity line 413b, dielectric film 416, device substrate 420 formation; Second interlayer insulating film 422 that forms along the zone that covers above-mentioned first interlayer insulating film 421; In the zone that forms above-mentioned semiconductor layer 412a, connect above-mentioned first interlayer insulating film 421 and above-mentioned second interlayer insulating film 422 and the data line 414 of configuration; And on above-mentioned second interlayer insulating film 422, form in the regional O of above-mentioned semiconductor layer 412a contact on data line 414 and the function element 452 that forms.

Here, in function element 452, constitute: form the semiconductor layer 452a that the transistor that is formed in the on-off element that the function element that forms on above-mentioned second interlayer insulating film 422 and the data line 414 uses is used; Make the dielectric film 452b that comprises gate insulating film of the sweep trace 453 insulation usefulness that above-mentioned semiconductor layer 452a and function element use; And the electrode 455 that is connected with semiconductor layer 452a electric conductivity that function element is used.

And, in device substrate 420, constitute: the sweep trace 452 that the function element that forms on above-mentioned dielectric film 452b is used; The 3rd interlayer insulating film 423 that is covered with above-mentioned sweep trace 453, dielectric film 452b, second interlayer insulating film 422 and forms; The data line 454 that the function element that disposes in the zone of above-mentioned semiconductor layer 452a on forming above-mentioned the 3rd interlayer insulating film 423 is used; Spread all over the 4th interlayer insulating film 424 that the zone that covers data line 454 and the 3rd interlayer insulating film 423 forms, forms at the regional split shed of the formation of electrode 455 simultaneously; And the pixel electrode 411 of avoiding forming the regional O of above-mentioned semiconductor layer 412a, on above-mentioned the 4th interlayer insulating film 424, forming.

In addition, form the contact hole that connects second interlayer insulating film 422, first interlayer insulating film 421, dielectric film 416, can carry out data line 414 and be connected with the electric conductivity of semiconductor layer 452a with semiconductor layer 412a and data line 414.In addition, form the contact hole that connects the 4th interlayer insulating film 424, the 3rd interlayer insulating film 423, second interlayer insulating film 422, first interlayer insulating film 421, dielectric film 412b, can carry out pixel electrode 411 and be connected with the electric conductivity of semiconductor layer 412a.

In addition, form to connect the contact hole of the 3rd interlayer insulating film 423, dielectric film 452b, the electric conductivity that can carry out the semiconductor layer 452a that data line 454 that function element uses and function element use is connected.In addition, form the contact hole that connects the 3rd interlayer insulating film 423 and dielectric film 452b, can carry out electrode 455 and be connected with the electric conductivity of semiconductor layer 452a.In other words, the data line 454 that function element is used is connected the input and output terminal sharing with the data line 414 electric conductivity ground that the pixel electrode that is used to select pixel electrode is used.Here, form data line 414 and semiconductor layer 452a, can make on-off element and the function element input and output independently of selecting pixel electrode to use by not carrying out the connection of electric conductivity ground.

Identical with the pixel electrode 411 of device substrate 420, opposite electrode 432 (common electrode) is formed and is formed on the whole surface that spreads all over counter substrate 430 by transparent conducting films such as ITO films.

In the liquid crystal indicator 400 that constitutes like this, have effect identical and effect, can adopt the sweep trace 413a of on-off element 412 and the sweep trace 453 and the stacked independently structure of data line 454 difference of data line 414 and function element 452 with the various embodiments described above.

In addition, in the various embodiments described above,, also can be the situation that multiple different building blocks of function is set as function element though for example understand the situation of formation based on the situation that a kind of function element is set.

In addition, in the various embodiments described above,, also can not the liquid crystal of active array type though constitute with the liquid crystal of active array type.Promptly, also can constitute like this: as alignment be positioned on the substrate, line is positioned at the passive matrix on another piece substrate, be strip under the situation of intersecting on the substrate up and down at pixel electrode, by selecting both sides' alignment and line, apply voltage respectively, the liquid crystal activity becomes during the selection during applying voltage.In the case, in image display area B, can dispose and be connected many data lines crossing one another and the sensor on the multi-strip scanning line function element with having electric conductivity with electrode (function element electrode).This becomes the structure that the function element with the liquid crystal indicator of passive matrix and active array type combines.

On the other hand, shown in Figure 14,15, liquid crystal drive one side has: many data line 14a that cross one another and multi-strip scanning line 13a; And the pixel electrode 11 used of the liquid crystal drive that in by data line 14a and sweep trace 13a area surrounded, is provided with respectively.On the other hand, function element 18 1 sides have the pair of electrodes that is made of with the electrode (not shown) of electrode 18a and counter substrate 30 sides the sensor of device substrate 20 sides.And, also can constitute like this: device substrate 20 1 sides are selected sensor electrode 18a with column select circuit shown in Figure 14 53, counter substrate 30 1 sides are selected the electrode of line 55 selection counter substrate one side that circuit 54 is connected with shown in Figure 15 and direction row side quadrature with row, in the pixel that the electrode pair of selecting is by both party answered, carry out reading of data by testing circuit 51.

Utilize this structure, can realize the structure that the function element with the liquid crystal indicator of active array type and passive matrix combines.If make up arbitrarily, make a side for passive matrix, then can make simple in structurely, price reduces.

Perhaps, as shown in figure 16, also can constitute like this: to showing configuration feature element in the contributive zone, electrode 56 double as liquid crystal drive are with electrode and function element electrode, and on-off element 57 double as are added in liquid crystal drive with voltage and carry out writing of data or read the on-off element of usefulness with the on-off element of using on the electrode with to function element.In the case, concerning data line drive circuit 3, the controller 52 of testing circuit 51 and its usefulness of control just necessitates.

In addition, on the device substrate of the liquid crystal indicator in Fig. 1, also can be according to situations such as the quality of this liquid crystal indicator in manufacture process or when dispatching from the factory, defectives, on device substrate, be not provided with and scan line drive circuit, and for example replace by the anisotropic conducting film on the peripheral part that is arranged on device substrate, electric conductivity ground and mechanically with TAB (band automated bonding) substrate on the driving of having installed be connected with LSI.

In addition, for example also can correspond respectively to mode of operation or normal white mode/often black patterns such as TN (twisted-nematic) pattern, directions according to the rules such as polarizing coating, phase shift films, polarising means are configured in a side of the emergent light outgoing of the side of projection light incident of counter substrate and device substrate.

In addition, being not limited to the liquid crystal indicator of transmission-type, also can be the liquid crystal indicator of reflection-type, the liquid crystal indicator of mixed type that both have both.At this moment, the liquid crystal indicator of embodiment for example preferably is applied in the electronic installations such as portable type information terminal.In the case, can realize showing that grade is good, have the electronic installation of multiple function such as membrane keyboard.

In addition, also can on counter substrate, form lenticule correspondingly with each pixel.If do like this, then, can realize bright liquid crystal indicator by improving the convergence efficient of incident light.In addition, make the refractive index interfering layer all inequality of any one deck, utilize interference of light, also can form the dichroic filter that produces the RGB look by deposit on counter substrate.If adopt the counter substrate that has this dichroic filter, then can realize brighter color liquid crystal display arrangement.

In addition, as the on-off element that is arranged on each pixel, for the multi-crystal TFT of quadrature shift or coplanar type or reverse-staggered TFT, other forms of TFT or body silicon MOSFET, bipolar transistors etc. such as the setting silicon TFT of unit, SOI-MOSFET, each embodiment is effective.

In addition, comprise the various stages in the above-described embodiments,, can realize all inventions by the suitable combination of disclosed a plurality of textural elements.In other words, comprise certainly between each above-mentioned embodiment or in them any one and each become any one combined example in the example.In addition, it is also passable to remove the structure of several textural elements from the entire infrastructure key element shown in the embodiment.For example, in the above description, though electro-optical device has been described as liquid-crystal apparatus, but the invention is not restricted to this, for the electro-optical device of the various electrooptic cells of the fluorescence that uses electroluminescence (EL), Digital Micromirror Device (DMD) or luminescence of plasma or electronics to discharge to produce etc. and the electronic installation that has this electro-optical device, can both be suitable for, this is self-evident.

And record so far just discloses an example of embodiments of the invention, can carry out suitable distortion and/or change within the limits prescribed, but each embodiment is exemplary, rather than restrictive.

As mentioned above, if employing the present invention, then owing to the external mode that does not rely in the past, the function element that can will have the function different with driving element is assembled in the intra-zone that is shown by the confession that is made of a plurality of pixels that constitutes liquid crystal indicator, so can various functions are built-in, can seek multifunction, highly integrated.

In addition, owing to do not need to carry out respectively the manufacturing process of liquid crystal indicator and the manufacturing process of function element as in the past, the technology of making function element is included in the technology of making liquid crystal indicator, and cost reduces so can seek during fabrication.

Claims (2)

1. liquid crystal indicator, it has the driving element that is arranged in rectangular a plurality of pixels and drives a pixel in above-mentioned a plurality of pixels, and this liquid crystal indicator is characterised in that:

With the above-mentioned same one side that is arranged in rectangular a plurality of pixels in, be provided with a plurality of function element, simultaneously with function different with the function of above-mentioned driving element

Form the semiconductor layer of the driving element that drives an above-mentioned pixel and the semiconductor layer of function element with same operation,

The pixel electrode that the function element that function element has has with an electrode and an above-mentioned pixel is formed on same one deck and is electrically connected with the semiconductor layer of function element,

Make the area of above-mentioned pixel different with the area of function element.

2. electro-optical device, it has the driving element that is arranged in rectangular a plurality of pixels and drives a pixel in described a plurality of pixels, and this electro-optical device is characterised in that:

With the above-mentioned same one side that is arranged in rectangular a plurality of pixels in, be provided with a plurality of function element, simultaneously with function different with the function of above-mentioned driving element

Form the semiconductor layer of the driving element that drives an above-mentioned pixel and the semiconductor layer of function element with same operation,

The pixel electrode that the function element that function element has has with an electrode and an above-mentioned pixel is formed on same one deck and is electrically connected with the semiconductor layer of function element,

Make the area of above-mentioned pixel different with the area of function element.

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