CN100526931C - All-refraction aspherical projection optical system - Google Patents
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- CN100526931C CN100526931C CNB2007101735698A CN200710173569A CN100526931C CN 100526931 C CN100526931 C CN 100526931C CN B2007101735698 A CNB2007101735698 A CN B2007101735698A CN 200710173569 A CN200710173569 A CN 200710173569A CN 100526931 C CN100526931 C CN 100526931C
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Abstract
The invention provides a full-refractive non-spherical projection optical system for projecting the image of a pattern in an object plane in an image plane. The full-refractive non-spherical projection optical system comprises, along the optical axis direction, a front group, an aperture diaphragm and a rear group, wherein the lens assemblies of the front and the rear groups are completely symmetrical to each other in optical structures with respect to the aperture diaphragm as the symmetrical plane, the front group comprises, sequentially from one side of the object side, a first lens group with positive optical power and a second lens group with negative optical power; and the rear group comprises, sequentially from the object side, a third lens group with negative optical power and a fourth lens group with positive optical power. The inventive full-refractive non-spherical projection optical system can effectively correct aberration, improve imaging quality and increase the working distance between the object side and the image side.
Description
Technical field
The present invention relates to a kind of projection optical system, particularly a kind of all-refraction aspherical projection optical system that is used for association areas such as semiconductor lithography.
Background technology
Along with the development of projection lithography technology, the performance of projection optical system progressively improves, and goes for multiple fields such as integrated circuit manufacturing.Now the projection lithography technology is successfully applied to the submicron resolution integrated circuit and has made the field.In semiconductor packaging, the projection lithography technology can be used for fields such as the golden projection/tin projection, silicon chip level chip scale package (WLCSP) technology of requirement low resolution (as several microns), big depth of focus, higher yields.
Yet in the prior art, as U.S. Pat 6,879,383 (day for announcing: on April 12nd, 2005), it adopts the catadioptric structure, with the total refraction texture ratio, disadvantage is that lateral dimension is big, cause the requirement of lens material very harshly, the processing of especially bigbore concave mirror, detect to require all very strictly, and aspects such as field size, operating distance, requirements of dress school, cost also are not so good as the total refraction structure bigger advantage are arranged.Moreover this patent provides among 5 embodiment of this optical system, and its operating distance only reaches 7.5mm～11mm scope, and its optics length overall reaches more than 1150mm～1200mm.In the application of actual projection optical system, this operating distance will propose very harsh size restrictions to the design of work stage, especially mask platform, as use the mask platform of 0.25 inch (6.35mm) thick mask, its size design will be subjected to great restriction, in addition, this patent does not provide image quality yet, does not mention processibility.
Application number is the Chinese patent (open day: on April 20th, 2005) provide a kind of two telecentric objective system that is used for chip detection, but this patent had not both provided the design data of object lens, yet undeclared image quality of CN200310100169.6.
The patent No. is the Chinese patent (day for announcing: on July 23rd, 2003) provided a kind of picture side heart double gauss far away optical system, be applicable to the image-forming objective lens of precision optical instrument of ZL98113037.2.This patent has provided the object lens data, has also provided image quality, but aberration can not satisfy the requirement of projection (Bumping) photoetching technique, and also has 2 cemented surfaces also not meet the requirement of photoetching technique.
Therefore, the projection optical system that how to provide a kind of image quality well to be guaranteed, and the operating distance that improves projection optical system is also compressed its optics length overall, for work stage and mask platform provide bigger design space, has become the technical matters that industry needs to be resolved hurrily.
Summary of the invention
The object of the present invention is to provide a kind of all-refraction aspherical projection optical system, effectively aberration correction, possess favorable imaging quality, and have bigger operating distance.
The object of the present invention is achieved like this: a kind of all-refraction aspherical projection optical system, one side to image planes one side comprises preceding group, aperture diaphragm and back group successively along its optical axis direction from object plane, wherein: lens subassembly of group and this back group is a plane of symmetry optical texture symmetry fully with this aperture diaphragm before this, should preceding group be the second mirror group that has the first mirror group of positive light coke and have negative power in turn from object plane one side, this first and second mirror group be made up of first to the 9th lens; This back group is the 4th mirror group that has the 3rd mirror group of negative power and have positive light coke from object plane one side in turn, the the 3rd and the 4th mirror group is made up of the tenth to the 18 lens, wherein, this first, the 7th, the 8th, the 11, the 12 and the single face of the 18 lens be aspheric surface, described aperture diaphragm is positioned between this second mirror group and the 3rd mirror group, wherein:
One side to image planes one side comprises first to the 6th lens to this first mirror group successively along its optical axis direction from object plane, wherein these first lens are that double-concave negative lens and its exit surface are aspheric surfaces, these second lens are concave surface bent moon positive lenss towards object plane one side, the 3rd lens are concave surface bent moon negative lenses towards object plane one side, the the 4th and the 5th lens are biconvex positive lenss, and the 6th lens are double-concave negative lens;
This second mirror group comprises the 7th to the 9th lens successively from object plane one side to image planes one side, wherein the 7th lens are double-concave negative lens, the 8th lens are biconvex positive lenss, the 9th lens are concave surface bent moon negative lenses towards object plane one side, and the exit surface of the 7th and the 8th lens is aspheric surfaces;
The 3rd mirror group has lens the tenth to the 12 lens successively from object plane one side to image planes one side, the optical parametric of these group lens respectively with the 9th to the 7th lens of this second mirror group about this aperture diaphragm symmetry, the 11 and the incidence surface of the 12 lens are aspheric surfaces;
The 4th mirror group has the 13 to the 18 lens successively from object plane one side to image planes one side, the optical parametric of these group lens respectively with the 6th to first lens of this first mirror group about this aperture diaphragm symmetry, the incidence surface of the 18 lens is aspheric surfaces.
Above-mentioned all-refraction aspherical projection optical system, wherein: these the first and the 18 lens are selected the crown glass of low-refraction, low abbe number, high permeability, such as BK7HT glass.
Above-mentioned all-refraction aspherical projection optical system, wherein: these the second and the 17 lens are selected the flint glass of high index of refraction, high abbe number, high permeability, such as LF5HT glass.
Above-mentioned all-refraction aspherical projection optical system, wherein: the 3rd and the 16 lens are selected the flint glass of high index of refraction, high abbe number, high permeability, such as LLF1HT glass
Above-mentioned all-refraction aspherical projection optical system, wherein: four, the 8th, the 11 and the 15 lens are selected high permeability crown glass with especial dispersion ability, such as SFPL51Y glass
Above-mentioned all-refraction aspherical projection optical system, wherein: five, the 7th, the 12 and the 14 lens are selected the flint glass of high index of refraction, high abbe number, high permeability, such as PBM18Y glass.
Above-mentioned all-refraction aspherical projection optical system, wherein: the 6th and the 13 lens are selected the crown glass of low-refraction, low abbe number, high permeability, such as BAL15Y glass.
Above-mentioned all-refraction aspherical projection optical system, wherein: the 9th and the tenth lens are selected the flint glass of high index of refraction, high abbe number, high permeability, such as F2HT glass.
Compared with prior art, projection optical system of the present invention adopts the total refraction structure of symmetrical expression, and aberration correction improves image quality effectively, and has the advantage of good, the big visual field of two hearts far away, long working distance.
Description of drawings
The concrete structure of all-refraction aspherical projection optical system of the present invention is provided by following embodiment and accompanying drawing.
Fig. 1 is the structure and the light path synoptic diagram of all-refraction aspherical projection optical system of the present invention;
Fig. 2 is the transport function MTF synoptic diagram of embodiments of the invention.
Embodiment
Below will be described in further detail all-refraction aspherical projection optical system of the present invention.
The invention provides a kind of all-refraction aspherical projection optical system, as shown in Figure 1, this projection optical system is a symmetrical structure, promptly comprise preceding group, aperture diaphragm, back group in turn from object plane one side, and preceding group of each lens subassembly with the back group is that (surface radius, interval equate the complete symmetry of plane of symmetry optical texture with this aperture diaphragm, the optical material unanimity), enlargement ratio is-1.Multiplying power is according to the primary aberration theory for the advantage of-1 symmetrical structure, and axial aberration hangs down: coma, distortion, ratio chromatism, are zero from normal moveout correction, and group and back group are proofreaied and correct the scheme of axial aberration respectively before adopting then.
All-refraction aspherical projection optical system of the present invention comprises 18 lens altogether, is divided into four mirror groups of G1-G4 successively.From object plane one side is the first mirror group G1, the second mirror group G2 of negative power, the 3rd mirror group G3 of negative power, the 4th mirror group G4 of positive light coke with positive light coke in turn.
Group is made up of this first mirror group G1 and this second mirror group G2 before above-mentioned.
This first mirror group G1 comprises lens L1-L6, wherein lens L1 is a double-concave negative lens, the exit surface of lens L1 is an aspheric surface, lens L2 is the bent moon positive lens of concave surface towards object plane one side, lens L3 is the bent moon negative lens of concave surface towards object plane one side, lens L4, L5 are the biconvex positive lenss, and lens L6 is a double-concave negative lens.It is to keep two hearts far away that this first mirror group G1 mainly acts on, and proofreaies and correct the curvature of field simultaneously, and G1 itself has positive light coke and produces negative spherical aberration, is used for balance by the comprehensive positive spherical aberration that produces of many lens of the second mirror group G2.Come dispersed light focal power burden with lens L4, L5, promptly reduce plane of refraction curvature, help the correction that axle is gone up some high-order spherical aberration and off-axis point high-order spherical aberration, solve spherical aberration correction and stigmatic contradictory problems.Wherein non-spherical surface adopts fitting of a polynomial, and formula is as follows:
Wherein, r represents the surface radius of lens, and the arbitrfary point on the h presentation surface is to the distance of optical axis, constant k, C
4, C
6, C
8, C
10... waiting is surperficial asphericity coefficient.
This second mirror group G2 comprises lens L7-L9, and wherein lens L7 is a double-concave negative lens, and lens L8 is the biconvex positive lens, and lens L9 is the bent moon negative lens of concave surface towards object plane one side.The exit surface of these lens L7, L8 is an aspheric surface.The optimal combination that this first mirror group G1 and the second mirror group G2 select flint glass and crown glass for use is equilibrium position aberration and spherochromatism effectively.Wherein lens L4, L8 select crown glass with especial dispersion performance, help proofreading and correct second order spectrum.
Like this, first and second mirror group G1, the G2 of group before this projection optical system can spherical aberration correctors, the curvature of field, astigmatism, chromatism of position, second order spectrum, spherochromatism, and axial aberration is well proofreaied and correct.
The above-mentioned back group of this all-refraction aspherical projection optical system is divided into the 3rd mirror group G3 with negative power successively and has the 4th mirror group G4 of positive light coke.
Above-mentioned aperture diaphragm is positioned between this second mirror group G2 and the 3rd mirror group G3.
Lens L10, the L11 of the 3rd mirror group G3, the optical parametric of L12, with the optical parametric of lens L9, the L8 of this second mirror group G2, L7 respectively about the aperture diaphragm symmetry.Wherein, the incidence surface of lens L11, L12 is an aspheric surface.
The optical parametric of lens L13, the L14 of the 4th mirror group G4, L15, L16, L17, L18, with the optical parametric of lens L6, the L5 of this first mirror group G1, L4, L3, L2, L1 respectively about the aperture diaphragm symmetry.Wherein, the incidence surface of lens L18 is an aspheric surface.
Like this, each lens combination of group and back group is that the plane of symmetry is realized optical texture symmetry fully with this aperture diaphragm face before this, thereby makes vertical axial aberration, and promptly coma, distortion, ratio chromatism, are zero from normal moveout correction.
The front focus that the back focus of group and this back are organized before being somebody's turn to do overlaps, and overlaps with this aperture diaphragm center, just constitutes two far projection optical systems of core structures.The imaging light cone of object space and image space is all about the chief ray symmetry, and promptly the chief ray of object space and image space is parallel to optical axis.Like this, even object plane and image planes are in the out of focus position, the height of thing and picture does not still change on perpendicular to optical axial plane, and promptly enlargement ratio does not change.So just guarantee that enlargement ratio does not change along moving of optical axis direction with object plane and image planes.
The rule in applied optics field is that the surface of the close object plane of a certain lens is front surface (being incidence surface), surface near image planes is rear surface (being exit surface), then the front surface of the front surface of the front surface of the rear surface of the rear surface of the rear surface of the lens L1 of all-refraction aspherical projection optical system of the present invention, L7, L8, L11, L12, L18 is an aspheric surface, and all the other lens surfaces are sphere.
Lens L1, the L18 of above-mentioned all-refraction aspherical projection optical system selects the crown glass of low-refraction, low abbe number, high permeability, such as BK7HT glass; Lens L2, L17 select the flint glass of high index of refraction, high abbe number, high permeability, such as LF5HT glass; Lens L3, L16 select the flint glass of high index of refraction, high abbe number, high permeability, such as LLF1HT glass; The high permeability crown glass that lens L4, L8, L11, L15 selection have the especial dispersion ability is such as SFPL51Y glass; Lens L5, L7, L12, L14 select the flint glass of high index of refraction, high abbe number, high permeability, such as PBM18Y glass; Lens L6, L13 select the crown glass of low-refraction, low abbe number, high permeability, such as BAL15Y glass; Lens L9, L10 select the flint glass of high index of refraction, high abbe number, high permeability, such as F2HT glass.
As shown in table 1, all-refraction aspherical projection optical system of the present invention be 0.20 as number formulary value aperture, operation wavelength is 436nm, 405nm, 365nm, i.e. g line, h line, the i line of optical field definition; As square visual field radius is 31.466mm, and the rectangular field of 44.5mm * 44.5mm can be provided, and effect is that the graphic projection with object plane is imaged on the image planes; Owing to be symmetrical structure, object space and the work of picture side are apart from being 25.9808mm, and enlargement ratio is-1 times.
Table 1
| Operation wavelength | 436nm、405nm、365nm |
| Picture number formulary value aperture | 0.20 |
| Visual field, picture side (radius) | 31.466mm |
| Enlargement ratio | -1 |
| Object-image conjugate is apart from (optics length overall) | 949.999946mm |
| Object space work distance | 25.9808mm |
| Picture side's work distance | 25.9808mm |
Table 2 has provided the concrete parameter value of each piece lens of the all-refraction aspherical projection optical system of present embodiment, wherein, and each surperficial pairing lens between " affiliated object " hurdle has been indicated from the object plane to image planes; " radius " hurdle has provided each surperficial pairing spherical radius; " thickness/spacing " hurdle has provided the axial distance between adjacent two surfaces, if this two surface belongs to same lens, the thickness of these lens of numeric representation of " thickness/spacing " then, otherwise expression object plane/image planes are to the distance of lens or the spacing of adjacent lens." optical material " hurdle indicated the material of corresponding lens, " semiaperture " hurdle indicated 1/2 aperture value on corresponding surface.
With lens L1 and L2 is example, and the spherical radius of the front surface 1 of L1 is-78.480734mm, and the front surface 1 of L1 is 35.182211mm to the spacing of object plane, and its optical material is BK7HT, and the semiaperture of L1 front surface 1 is 36.872032mm; The spherical radius of the rear surface 2 of L1 is 245.337640mm, the rear surface 2 of the front surface 1 to L1 of L1, and promptly the center thickness of lens L1 is 32.005629mm, and the semiaperture of the rear surface 2 of L1 is 51.257702mm, and promptly L1 is a biconcave lens.The spherical radius and the semiaperture of the front surface 3 of L2 is respectively-565.630612mm and 53.375534mm, and the spacing of the rear surface 2 of the front surface 3 to L1 of L2 is 10.103872mm, and the optical material of lens L2 is LF5HT; The spherical radius and the semiaperture of the rear surface 4 of L2 is respectively-74.523384mm and 57.051331mm, and the center thickness of lens L2 is 33.000000mm, and promptly L2 is the bent moon positive lens of concave surface towards object plane one side.Except representing the radius of visual field, picture side the semiaperture of image planes (surperficial Image) that all the other each surperficial parameter value implications are analogized according to L1, L2.
Except 18 lens of front and back group L1-L18, also be provided with aperture diaphragm STOP between lens L9 and the L10, its spacing to lens L9 rear surface 18 is 1.000000mm, the change of its 1/2 aperture size will influence the imaging effect of this projection optical system.
Table 2
Table 3
Fig. 2 has shown the transport function MTF of the all-refraction aspherical projection optical system of present embodiment, has reflected the image quality of this all-refraction aspherical projection optical system.When operation wavelength is 436nm, 405nm, 365nm, according to the analytical calculation of professional optical design software CODE_V as can be known: wave aberration RMS value is less than 10nm, heart angle error far away is less than 0.23 °=4mrad, magnification error is 2.3ppm, under broadband light (g line, h line, i line) condition of work, high imaging quality can be effectively obtained, bigger object space and picture side's field size can be realized simultaneously.The object-image conjugate distance is less than 950mm, and object space picture side work distance is 25.98mm.
The numerical aperture maximum of projection optical system of the present invention reaches 0.20, and the highest optical resolution of system can reach 0.5 μ m (for the semiperiod length of 1: 1 Periodic Object of dutycycle).Reach 31.466mm as square visual field radius, the visual field, square picture side of 44.5mm * 44.5mm can be provided, be enough to satisfy the technical requirement that projection (Bumping) encapsulation litho machine is used for 44mm * 44mm field size Chip Packaging.
Claims (8)
1, a kind of all-refraction aspherical projection optical system, one side to image planes one side comprises preceding group, aperture diaphragm and back group successively along its optical axis direction from object plane, it is characterized in that: lens subassembly of group and this back group is a plane of symmetry optical texture symmetry fully with this aperture diaphragm before this, should preceding group be the second mirror group (G2) that has the first mirror group (G1) of positive light coke and have negative power in turn from object plane one side, this first and second mirror group (G1, G2) be made up of first to the 9th lens (L1-L9); This back group is the 4th mirror group (G4) that has the 3rd mirror group (G3) of negative power and have positive light coke from object plane one side in turn, the the 3rd and the 4th mirror group (G3, G4) is made up of the tenth to the 18 lens (L10-L18), wherein, this first, the 7th, the 8th, the 11, the single face of the 12 and the 18 lens (L1, L7, L8, L11, L12, L18) is aspheric surface, described aperture diaphragm is positioned between this second mirror group (G2) and the 3rd mirror group (G3), wherein:
One side to image planes one side comprises first to the 6th lens (L1-L6) to this first mirror group (G1) successively along its optical axis direction from object plane, wherein these first lens (L1) are that double-concave negative lens and its exit surface are aspheric surfaces, these second lens (L2) are the bent moon positive lens of concave surface towards object plane one side, the 3rd lens (L3) are the bent moon negative lens of concave surface towards object plane one side, the the 4th and the 5th lens (L4-L5) are the biconvex positive lenss, and the 6th lens (L6) are double-concave negative lens;
This second mirror group (G2) comprises the 7th to the 9th lens (L7-L9) successively from object plane one side to image planes one side, wherein the 7th lens (L7) are double-concave negative lens, the 8th lens (L8) are the biconvex positive lenss, the 9th lens (L9) are the bent moon negative lens of concave surface towards object plane one side, and the exit surface of the 7th and the 8th lens (L7, L8) is an aspheric surface;
The 3rd mirror group (G3) has lens the tenth to the 12 lens (L10-L12) successively from object plane one side to image planes one side, the optical parametric of these group lens respectively with the 9th to the 7th lens (L9-L7) of this second mirror group (G2) about this aperture diaphragm symmetry, the incidence surface of the 11 and the 12 lens (L11, L12) is an aspheric surface;
The 4th mirror group (G4) has the 13 to the 18 lens (L13-L18) successively from object plane one side to image planes one side, the optical parametric of these group lens respectively with the 6th to first lens (L6-L1) of this first mirror group (G1) about this aperture diaphragm symmetry, the incidence surface of the 18 lens (L18) is an aspheric surface.
2, all-refraction aspherical projection optical system as claimed in claim 1 is characterized in that: these the first and the 18 lens (L1, L18) are selected the crown glass of low-refraction, low abbe number, high permeability.
3, all-refraction aspherical projection optical system as claimed in claim 1 is characterized in that: these the second and the 17 lens (L2, L17) are selected the flint glass of high index of refraction, high abbe number, high permeability.
4, all-refraction aspherical projection optical system as claimed in claim 1 is characterized in that: the 3rd and the 16 lens (L3, L16) are selected the flint glass of high index of refraction, high abbe number, high permeability.
5, all-refraction aspherical projection optical system as claimed in claim 1 is characterized in that: four, the 8th, the 11 and the 15 lens (L4, L8, L11, L15) are selected high permeability crown glass with especial dispersion ability.
6, all-refraction aspherical projection optical system as claimed in claim 1 is characterized in that: five, the 7th, the 12 and the 14 lens (L5, L7, L12, L14) are selected the flint glass of high index of refraction, high abbe number, high permeability.
7, all-refraction aspherical projection optical system as claimed in claim 1 is characterized in that: the 6th and the 13 lens (L6, L13) are selected the crown glass of low-refraction, low abbe number, high permeability.
8, all-refraction aspherical projection optical system as claimed in claim 1 is characterized in that: the 9th and the tenth lens (L9, L10) are selected the flint glass of high index of refraction, high abbe number, high permeability.
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Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102200624B (en) * | 2010-03-23 | 2013-05-22 | 上海微电子装备有限公司 | Photo-etching projection lens |
| CN102375214B (en) * | 2010-08-17 | 2013-07-17 | 上海微电子装备有限公司 | Projection objective lens for large-area photo-etching |
| JP6349459B2 (en) * | 2014-07-28 | 2018-06-27 | ハンズ レーザー テクノロジー インダストリー グループ カンパニー リミテッド | Photographic objective lens and photographing apparatus |
| CN111999868B (en) * | 2014-10-10 | 2022-07-05 | 扬明光学股份有限公司 | Zoom lens |
| CN110764224B (en) * | 2018-07-27 | 2020-12-18 | 上海微电子装备（集团）股份有限公司 | Photoetching projection objective lens |
| CN114859515B (en) * | 2022-05-23 | 2024-01-12 | 张家港中贺自动化科技有限公司 | Catadioptric objective optical system for projection lithography and projection lithography system |
| CN115808771B (en) * | 2022-12-30 | 2024-04-19 | 中国科学院长春光学精密机械与物理研究所 | Large target surface ultra-wide angle transmission visible light lens |
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| US4061419A (en) * | 1976-03-03 | 1977-12-06 | Xerox Corporation | Variable magnification lens system |
| US5886835A (en) * | 1995-03-24 | 1999-03-23 | Nikon Corporation | Relay optical system |
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| CN101021607A (en) * | 2007-03-27 | 2007-08-22 | 上海微电子装备有限公司 | Symmetrical double-telecentric projection optical system |
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