CN100516943C - Color filter, substrate, electro-optical device, electronic instrument, film forming method and device - Google Patents

Color filter, substrate, electro-optical device, electronic instrument, film forming method and device Download PDF

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Publication number
CN100516943C
CN100516943C CNB2007101270224A CN200710127022A CN100516943C CN 100516943 C CN100516943 C CN 100516943C CN B2007101270224 A CNB2007101270224 A CN B2007101270224A CN 200710127022 A CN200710127022 A CN 200710127022A CN 100516943 C CN100516943 C CN 100516943C
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layer
mentioned
accuracy testing
substrate
land
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CN101078789A (en
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木口浩史
片上悟
伊藤达也
有贺久
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Kateeva Inc
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Seiko Epson Corp
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Abstract

To provide a color filter which includes a light shielding region having sufficient light shielding performance, and a transmitting region having no color mixing, and which has high contrast without pixel defect and irregularity in color tone. A color filter 1000 of the present invention includes a pixel region 100 and a spotting precision test region 200. The pixel region 100 includes a light shielding region 20 and a transmitting region 30 partitioned by the light shielding region 20. The light shielding region 20 includes a first light shielding layer 22. The transmitting region 30 includes a color element 32. The spotting precision test region 200 is positioned apart from the pixel region 100 and includes a second light shielding layer 122 and a spotting precision test layer 26 provided to cover at least the second light shielding layer 122. The spotting precision test layer region 200 includes an evaluation region partitioned by the second light shielding layer 122.

Description

Color filter, substrate, electro-optical device, electronic device, film build method and device
The application is dividing an application of application number is 02124377.8, the applying date is on June 24th, 2002 original bill application, and the first of this original bill application is JP2001-191562 in first to file, and formerly the applying date is June 25 calendar year 2001; JP2002-159665, formerly the applying date is on May 31st, 2002.
Technical field
The present invention relates to drop material land accuracy testing substrate and manufacture method, electric light machine and electronic device and film build method and film formation device that color filter and manufacture method thereof, color filter are used with drop material land accuracy testing substrate and manufacture method, illuminating substrate and manufacture method thereof, illuminating substrate with above-mentioned color filter or above-mentioned illuminating substrate.
Background technology
In recent years, along with the particularly progress of notebook computer of computer, the demand of liquid color display is sharply increased.Establishing accordingly therewith with moderate price provides the mode of beautiful display just to become the task of top priority.In addition, in recent years, consider, also require to improve or be transformed to the technology that reduces environmental pressure from the viewpoint of environmental protection.
In the past, as 1 manufacture method of color filter, people know following method.In the method, at first,, utilize photoetching process and etch that the film etching of chromium is become figure, form black matrix as light screening material.Then, after utilizing whirl coating etc., can photoetching process be etched into figure by the gap that red, green, basket photoresist is coated between this black matrix of all kinds.Like this, just, can constitute colour matrix red, green, that basket dyed layer (point) is adjacent to dispose.In this manufacture method, to red, green, basket is of all kinds must carry out photo-mask process repeatedly, in addition, will remove unwanted part during etching figure of all kinds, the loss photosensitive material is so what obtain is the heavy high color filter of cost of environmental pressure.
Therefore, as the method for the problem that solves such manufacture method, opened motion in the clear 59-75205 communique and used the method for ink-jet method for example special.In the method, will will form in order to the partition in the formation zone of cutting apart dyed layer with the material low on the transparency carrier the wettability of ink rectangular after, by using ink-jet method non-photosensitive look material is applied in the partition, form dyed layer.In this manufacture method, can reduce miscellaneous property of photo-mask process, and the loss that reduces the look material.After, motion and a plurality of technology of drop material ejection method such as ink-jet method coating non-photosensitive look material of utilizing are made manufacturing method of color filter again.
Summary of the invention
Thereby purpose of the present invention aims to provide and comprises the lightproof area with sufficient light-proofness that forms by ejection drop material and do not have the zone that sees through of colour mixture not have picture element flaw and fuzzy high color filter and the illuminating substrate of contrast of tone.
Other purposes of the present invention are, provide by ejection drop material to make the look material be attached to the manufacturing method of color filter of appointed area and the manufacture method of illuminating substrate accurately.
Other purposes of the present invention are, drop material land accuracy testing substrate and the manufacture method thereof used with drop material land accuracy testing substrate and manufacture method thereof and illuminating substrate for the color filter that by ejection drop material the look material is attached to accurately to use the appointed area are provided.
In addition, other purposes of the present invention are, above-mentioned color filter, illuminating substrate are provided or use the assay method of drop material land precision of the drop material land accuracy testing substrate of their usefulness.
In addition, other purposes of the present invention are, electro-optical device and electronic device with above-mentioned color filter or illuminating substrate are provided.
In addition, other purposes of the present invention are, the film build method and the film formation device that use the drop material are provided.
1. the assay method of color filter and drop material land precision
(A) color filter of the present invention is characterised in that: have and comprise lightproof area and the pixel region of being cut apart by above-mentioned lightproof area that sees through the zone, be positioned at the land accuracy testing in addition of above-mentioned pixel region with regional, be arranged on the 1st light shield layer of above-mentioned lightproof area, be arranged on the above-mentioned look key element that sees through the zone, be arranged on above-mentioned land accuracy testing and be arranged on the land accuracy testing layer of above-mentioned land accuracy testing with the 2nd light shield layer in zone with in order to cover above-mentioned the 2nd light shield layer at least with the zone, with in the zone, be provided with the evaluation region of cutting apart by above-mentioned the 2nd light shield layer in above-mentioned land accuracy testing.
In color filter of the present invention, so-called pixel region comprises the zone of the pixel that color filter uses exactly.In addition, so-called land accuracy testing is with the zone, is exactly the zone that comprises the pixel that does not form pixel or do not use as the pixel of color filter in color filter.In addition, so-called evaluation region becomes the zone of evaluation object of the land precision of drop material exactly in the land accuracy testing of drop material.
According to color filter of the present invention, by with the zone above-mentioned evaluation region being set in above-mentioned land accuracy testing, can carry out the land accuracy testing of drop material on layer in above-mentioned land accuracy testing, so, in pixel region, can make the drop material be attached to the appointed area accurately.Therefore, the feature of color filter of the present invention is, has sufficient light-proofness at above-mentioned lightproof area, and do not have colour mixture in the above-mentioned zone that sees through, so, there are not picture element flaw and tone fuzzy, the contrast height.Details illustrates in the described in the back embodiments of the invention.
(B) color filter of the present invention is characterised in that: have comprise lightproof area and the pixel region that sees through the zone that surrounds by above-mentioned lightproof area, by ejection drop material above-mentionedly see through look key element that the zone forms, with above-mentioned pixel region disposed adjacent and have the neighboring area of lightproof area and be included in the above-mentioned neighboring area and surround and have and the above-mentioned evaluation region that sees through regional shape corresponding shape by lightproof area by above-mentioned neighboring area.
According to color filter of the present invention, by above-mentioned evaluation region is set, can on this zone, carry out the land accuracy testing of drop material, so, in above-mentioned pixel region, can make the drop material be attached to the appointed area accurately.Therefore, the feature of color filter of the present invention is, has sufficient light-proofness at above-mentioned lightproof area, and do not have colour mixture in the above-mentioned zone that sees through, so, there are not picture element flaw and tone fuzzy, the contrast height.
(C) color filter of the present invention is characterised in that: have and comprise lightproof area and the pixel region that sees through the zone that is surrounded by above-mentioned lightproof area, see through the look key element that the zone forms by ejection drop material above-mentioned, with above-mentioned pixel region disposed adjacent and have the neighboring area of lightproof area, the evaluation region that is included in the above-mentioned neighboring area and surrounds by the lightproof area of above-mentioned neighboring area and be arranged on above-mentioned neighboring area by above-mentioned evaluation region area surrounded and have the layer that is not stained with the character of stating the drop material in order to cover.
According to color filter of the present invention, be arranged on above-mentioned neighboring area and have the layer that is not stained with the character of stating the drop material by being provided with in order to cover above-mentioned evaluation region, can on this layer, carry out the land accuracy testing of drop material, so, in above-mentioned pixel region, can make the drop material be attached to the appointed area accurately.Therefore, the feature of color filter of the present invention is, has sufficient light-proofness at above-mentioned lightproof area, and do not have colour mixture in the above-mentioned zone that sees through, so, there are not picture element flaw and tone fuzzy, the contrast height.
(D) color filter of the present invention is characterised in that: have comprise lightproof area and by above-mentioned lightproof area surround a plurality ofly see through the pixel regions in zone, by ejection drop material above-mentionedly see through look key element that the zone forms, with above-mentioned pixel region disposed adjacent and have the neighboring area of lightproof area and be included in the above-mentioned neighboring area and, arranging above-mentioned a plurality of see through regional and above-mentioned evaluation region by the evaluation region that the lightproof area of above-mentioned neighboring area surrounds.
According to color filter of the present invention, by arranging above-mentioned a plurality of zone and above-mentioned evaluation region of seeing through, can on above-mentioned evaluation region, carry out the land accuracy testing of drop material, so, in above-mentioned pixel region, can make the drop material be attached to the appointed area accurately.Therefore, the feature of color filter of the present invention is, has sufficient light-proofness at above-mentioned lightproof area, and do not have colour mixture in the above-mentioned zone that sees through, so, there are not picture element flaw and tone fuzzy, the contrast height.
In addition, use the mensuration of the drop material land precision of color filter of the present invention, with in the zone, undertaken by making drop material land go up formation convex layer with layer to above-mentioned land accuracy testing in above-mentioned land accuracy testing.According to this assay method, in color filter of the present invention, be arranged on the above-mentioned land accuracy testing above-mentioned land accuracy testing in zone formation convex layer on the layer.
Color filter of the present invention can be implemented the form of following (1)～(3).
(1) constitute the above-mentioned lightproof area of above-mentioned pixel region and then comprise accumulation layer, above-mentioned accumulation layer can be arranged on above-mentioned the 1st light shield layer that is arranged in the above-mentioned pixel region.
According to this structure, by above-mentioned accumulation layer being set being arranged on above-mentioned the 1st light shield layer of above-mentioned pixel region, can distinguish the dividing function of setting shade function and look key element independently, so, can bring into play both functions reliably.As a result, the picture element flaw of color filter of the present invention with regard to be difficult for taking place to cause by inadequate light-proofness or colour mixture.In addition, by such dividing function, can select to be used to constitute the material of the best of above-mentioned the 1st light shield layer that is arranged on above-mentioned pixel region and above-mentioned accumulation layer from very wide scope, thereby help reducing production costs.When particularly constituting above-mentioned the 1st light shield layer, just can obtain light-proofness evenly and fully with very little thickness by metal level.
(2) being arranged on above-mentioned land accuracy testing can have and the identical figure of above-mentioned the 1st light shield layer that is arranged on pixel region with regional above-mentioned the 2nd light shield layer.According to this structure, when the above-mentioned land accuracy testing of color filter of the present invention is carried out the accuracy testing of drop material land with layer, be set in and make the situation of drop material land in the above-mentioned pixel region, just can estimate the land precision of drop material to the zone that forms the look key element.
(3) use in the zone in above-mentioned land accuracy testing, vernier layer can be set.According to this structure, above-mentioned land accuracy testing is carried out drop material land when test with layer, can according to the line segment locality specific of the drop material layer that forms on layer in above-mentioned land accuracy testing and above-mentioned vernier layer discern the departing from of landing positions of drop material.
At this moment, can be set to appointed positions in the above-mentioned evaluation region with regard to vernier layer.
In addition, at this moment above-mentioned vernier layer can use with above-mentioned the 2nd light shield layer identical materials and form.
2. color filter is with the assay method of drop material land accuracy testing substrate and drop material land precision
Color filter of the present invention has light shield layer with drop material land accuracy testing substrate and forms the land accuracy testing layer that covers this light shield layer at least, thereby form the land accuracy testing with regional, and, above-mentioned land accuracy testing is provided with the evaluation region of being cut apart by above-mentioned light shield layer with the zone, and then is provided with vernier layer.
According to the present invention, before making color filter,, fully confirm the land precision of drop material by color filter of the present invention is carried out the accuracy testing of drop material land with land accuracy testing substrate, after improving the land precision, just can carry out the formation of look key element of the color filter of actual manufacturing.Like this, in the manufacturing of color filter, just can make the drop material be attached to the appointed area accurately, so, can be manufactured on above-mentioned lightproof area and have sufficient light-proofness and see through the zone and do not have colour mixture, do not have picture element flaw and tone is fuzzy, contrast is high color filter above-mentioned.
In addition, use color filter of the present invention mensuration with the land precision of the drop material of drop material land accuracy testing substrate, by make in above-mentioned land accuracy testing with the zone drop material land to above-mentioned land accuracy testing with layer on formation convex layer carry out.According to this assay method, use in the drop material land accuracy testing substrate at color filter of the present invention, use in above-mentioned land accuracy testing to form the convex layer on the layer.
In addition, use in the drop material land accuracy testing substrate, vernier layer can be set at color filter of the present invention.
At this moment, can be set to appointed positions in the above-mentioned evaluation region with regard to above-mentioned vernier layer.
In addition, at this moment can be with forming above-mentioned vernier layer with above-mentioned light shield layer identical materials.
According to said structure, have effect substantially the same and effect with the color filter of the invention described above.
3. manufacturing method of color filter
Manufacturing method of color filter of the present invention is characterised in that: comprise
(a) by the 1st light shield layer setting that in pixel region, forms matrix figure with appointment comprise the 1st light shield layer lightproof area operation and by the 2nd light shield layer that has a matrix figure of appointment with zone formation in the land accuracy testing that is arranged in beyond the above-mentioned pixel region form the evaluation region of cutting apart by the 2nd light shield layer operation,
(b) above-mentioned land accuracy testing form in order to cover above-mentioned the 2nd light shield layer at least in the zone land accuracy testing with the operation of layer,
(c) in above-mentioned pixel region, form the operation of cutting apart by above-mentioned lightproof area that sees through the zone by form zone formation look key element in the look key element.
In this manual, so-called look key element forms the zone, is exactly the zone that forms above-mentioned look key element in above-mentioned pixel region, particularly, and the zone of in above-mentioned pixel region, cutting apart exactly by above-mentioned lightproof area.Above-mentioned lightproof area is mainly by above-mentioned the 1st light shield layer and accumulation layer (back explanation) formation that is provided with as required.
According to manufacturing method of color filter of the present invention, can there be the color filter that picture element flaw and tone are fuzzy, contrast is high by simple operation manufacturing.
In manufacturing method of color filter of the present invention, can implement the form of following (1)～(6).
(1) above-mentioned operation (b) can be when above-mentioned land accuracy testing is used layer with the zone above-mentioned land accuracy testing of formation, forms the operation of accumulation layer in above-mentioned pixel region on above-mentioned the 1st light shield layer.According to this manufacture method, utilize above-mentioned accumulation layer can make the drop materials such as toner for example red, green, that basket is of all kinds be attached to above-mentioned look key element and form the zone with the state that does not have colour mixture, so, can obtain not having the high color filter of contrast of defectives such as tone is fuzzy.
(2) so can comprise (d) in above-mentioned land accuracy testing with in the zone, make drop material land go up with layer and form the operation of convex layer to above-mentioned land accuracy testing.
According to this manufacture method, use in the zone in above-mentioned land accuracy testing, the drop material layer land that make convex are after the evaluation of above-mentioned land accuracy testing with the land precision of carrying out the drop material on the layer, just can be in above-mentioned pixel region, make drop material land form the zone, form the actual look key element of using as pixel to above-mentioned look key element.Like this, just can make above-mentioned look key element be attached to the appointed area accurately, so, can be manufactured on lightproof area with simple operation and have sufficient light-proofness and seeing through the zone and do not have colour mixture, do not having picture element flaw and tone is fuzzy, contrast color filter especially.
(3) in above-mentioned operation (a), the above-mentioned the 1st and the 2nd light shield layer is to form on substrate after the metal level, this metal level is etched into by utilizing photoetching process and etch figure forms.According to this structure,,, just can obtain light-proofness fully and uniformly with very little thickness by using metal level as the above-mentioned the 1st and the 2nd shading wealth.This metal level can utilize methods such as evaporation method, sputtering method, plated film are big to form.
(4) above-mentioned operation (a) can be that the appointed positions in above-mentioned evaluation region forms the operation of vernier layer when above-mentioned land accuracy testing is with above-mentioned the 2nd light shield layer of formation in the zone.
(5) above-mentioned operation (b) can be to form on above-mentioned the 1st light shield layer in above-mentioned pixel region after the photo-sensitive resin by utilizing photoetching process that this photo-sensitive resin is etched into the operation that figure forms above-mentioned accumulation layer.This accumulation layer does not require light shield layer, so, need not to be black, thereby can from general available photosensitive resin composition, select widely.
(6) above-mentioned operation (c) can be to use drop material shower nozzle to make the drop material be attached to that above-mentioned look key element forms the zone and the operation that forms above-mentioned look key element.According to this method, use operation simply and seldom just can form color filter of the present invention.That is, form above-mentioned look key element, can deduct the operation of using photolithographic etching forming, thereby can simplify working process by using drop material shower nozzle ejection drop material.In addition, form the zone owing to use drop material shower nozzle to make the drop material be attached to the look key element, so, can only supply with the drop material to the zone of needs.Therefore, can be as not utilizing photoetching process to carry out removing unwanted part and loss look material the etching forming, thus can reduce the cost of color filter.In the present invention, above-mentioned drop material can be supplied with the fine droplet of 6～30 picoliters.By controlling the number that drips of such fine droplet, can make the drop material accuracy of desirable amount be attached to for example fine zone at 40～100 μ m angles.
4. color filter is with the manufacture method of drop material land accuracy testing substrate
Color filter of the present invention is characterised in that with the manufacture method of drop material land accuracy testing substrate: comprise
(a) light shield layer that has a matrix figure of appointment by formation forms the operation of the evaluation region of being cut apart by this light shield layer; And
(b) form land accuracy testing operation with zone with layer in order to cover this light shield layer at least by forming the land accuracy testing,
Wherein, above-mentioned operation (a) is the operation that the appointed positions in above-mentioned evaluation region forms vernier layer when forming above-mentioned light shield layer,
According to the manufacture method of color filter of the present invention, have effect substantially the same and effect with the manufacturing method of color filter of the invention described above with drop material land accuracy testing substrate.
In the manufacture method of color filter of the present invention, can implement the form of following (1)～(3) with drop material land accuracy testing substrate.
(1) can and then comprise
(c) use in the zone in above-mentioned land accuracy testing, drop material land are gone up and the operation of formation convex layer with layer to above-mentioned land accuracy testing.
(2) in above-mentioned operation (a), above-mentioned light shield layer can form on substrate after the metal level, forms by utilizing photoetching process and etch that this metal level is etched into figure.
(3) above-mentioned operation (a) can be the operation that the appointed positions in above-mentioned evaluation region forms vernier layer when forming above-mentioned light shield layer.
Manufacture method according to shown in above-mentioned (1)～(3) has effect substantially the same with the manufacturing method of color filter of the invention described above and effect.In addition, by before the color filter manufacturing of actual manufacturing, carrying out the method shown in above-mentioned (1), can fully confirm the land precision of drop material in drop material land accuracy testing substrate and carry out the formation of look key element of the color filter of actual manufacturing after improving the land precision at color filter of the present invention.Like this, the drop material is attached on the look key element accurately, so can make does not have the color filter that picture element flaw and tone are fuzzy, contrast is high.
5. illuminating substrate
(A) illuminating substrate of the present invention is characterised in that: have the light-emitting zone that comprises storage area and cut apart by above-mentioned storage area pixel region, be positioned at beyond the above-mentioned pixel region the land accuracy testing with the zone, be arranged on the functional layer of above-mentioned light-emitting zone and be arranged on above-mentioned land accuracy testing with the land accuracy testing in zone with layer.
In illuminating substrate of the present invention, so-called pixel region just is included in the zone of the pixel of using on the illuminating substrate.In addition, in the illuminating substrate, so-called land accuracy testing is with the zone, comprises the zone of the pixel that does not form pixel or do not use as the pixel of illuminating substrate exactly.In addition, the called function layer comprises luminescent layer and the layer of the hole conveying/input horizon that is provided with as required exactly.
According to illuminating substrate of the present invention, be arranged on the land accuracy testing layer of above-mentioned land accuracy testing by having with the zone, can carry out the land accuracy testing of drop material on layer in above-mentioned land accuracy testing, so, in pixel region, can make the drop material be attached to the appointed area accurately.Therefore, the feature of illuminating substrate of the present invention is, have sufficient light-proofness at above-mentioned storage area, and do not have colour mixture at above-mentioned light-emitting zone, so, there are not picture element flaw and tone fuzzy, the contrast height.
Details illustrates in the described in the back embodiments of the invention.
(B) illuminating substrate of the present invention is characterised in that: the pixel region with the light-emitting zone that comprises cut zone and surrounded by above-mentioned cut zone, the functional layer that forms at above-mentioned light-emitting zone by ejection drop material, the neighboring area that is adjacent to dispose with above-mentioned pixel region, be included in the above-mentioned neighboring area and have with the evaluation region of the shape corresponding shape of above-mentioned light-emitting zone and be arranged on above-mentioned neighboring area in order to cover above-mentioned evaluation region and to have the layer that is not stained with the character of stating the drop material.
In illuminating substrate of the present invention, so-called evaluation region, the zone of carrying out the land accuracy testing of drop material exactly.
According to illuminating substrate of the present invention, be arranged on above-mentioned neighboring area and have the layer that is not stained with the character of stating the drop material by being provided with in order to cover above-mentioned evaluation region, can on this layer, carry out the land accuracy testing of drop material, so, can make the drop material be attached to the appointed area accurately in wherein at silver nitrate.Therefore, the feature of illuminating substrate of the present invention is, have sufficient light-proofness in above-mentioned cut zone, and do not have colour mixture at above-mentioned light-emitting zone, so, there are not picture element flaw and tone fuzzy, the contrast height.
(C) illuminating substrate of the present invention is characterised in that: have the pixel region of a plurality of light-emitting zones that comprise cut zone and surround by above-mentioned cut zone, by ejection drop material the functional layer that above-mentioned light-emitting zone forms, and the above-mentioned pixel region neighboring area that is adjacent to dispose and be included in the above-mentioned neighboring area and have evaluation region with the shape corresponding shape of above-mentioned light-emitting zone, arranging above-mentioned a plurality of light-emitting zone and above-mentioned evaluation region.
According to illuminating substrate of the present invention, have above-mentioned evaluation region,, can on this zone, carry out the land accuracy testing of drop material by arranging above-mentioned a plurality of light-emitting zone and above-mentioned evaluation region, so, in pixel region, can make the drop material be attached to the appointed area accurately.Therefore, the feature of illuminating substrate of the present invention is, have sufficient light-proofness in above-mentioned cut zone, and do not have colour mixture at above-mentioned light-emitting zone, so, there are not picture element flaw and tone fuzzy, the contrast height.
In addition, use the mensuration of land precision of the drop material of illuminating substrate of the present invention, undertaken by make in the zone drop material land form the convex layer on layer in above-mentioned land accuracy testing to above-mentioned land accuracy testing.According to this assay method, in illuminating substrate of the present invention, be arranged on above-mentioned land accuracy testing usefulness above-mentioned land accuracy testing wherein formation convex layer on the layer.
In illuminating substrate of the present invention, can implement the form of following (1)～(5).
(1) the above-mentioned functions layer can form between pair of electrode layers.
(2) above-mentioned storage area can constitute by ordered set layer the 1st insulation course and resin bed.
At this moment, above-mentioned land accuracy testing comprises the 2nd insulation course with the zone, constitute the identical height of above-mentioned the 1st insulation course that above-mentioned land accuracy testing is used above-mentioned the 2nd insulation course formation in zone and constitute above-mentioned storage area in above-mentioned pixel region, and, identical figure can be had.
(3) above-mentioned pixel region and above-mentioned land accuracy testing comprise on-off element respectively with the zone, can have identical structure with the on-off element that the zone forms with the above-mentioned on-off element that forms at above-mentioned pixel region in above-mentioned land accuracy testing.
(4) use in the zone in above-mentioned land accuracy testing, vernier layer can be set.
At this moment, the on-off element that forms at above-mentioned pixel region comprises metallic wiring layer, and above-mentioned vernier layer can form the height identical with above-mentioned metallic wiring layer.
(5) be arranged on above-mentioned land accuracy testing with the zone above-mentioned land accuracy testing with layer on can form the convex layer.
According to the form of above-mentioned (1)～(5), have effect substantially the same and effect with the color filter of the invention described above.
6. the drop material land accuracy testing substrate used of illuminating substrate
The drop material land accuracy testing substrate that illuminating substrate of the present invention is used is characterised in that: the storage insulation course of the figure that be included in the on-off element that forms on the substrate, the electrode layer that is connected with above-mentioned on-off element, has appointment and the land accuracy testing that forms on above-mentioned electrode layer are with layer.
According to the drop material land accuracy testing substrate that illuminating substrate of the present invention is used, have substantially the same effect and the effect of using with the color filter of the invention described above of drop material land accuracy testing substrate.
In addition, use the mensuration of land precision of the drop material of the drop material land accuracy testing substrate that illuminating substrate of the present invention uses, form a convex layer and carry out by drop material land are gone up with layer to above-mentioned land accuracy testing.According to this assay method, in the drop material land accuracy testing substrate that illuminating substrate of the present invention is used, at above-mentioned land accuracy testing formation convex layer on the layer.
In addition, in the drop material land accuracy testing substrate that illuminating substrate of the present invention is used, vernier layer can be set on aforesaid substrate.
At this moment, above-mentioned vernier layer can be formed by metal level.
According to said structure, have substantially the same effect and the effect of using with the color filter of the invention described above of drop material land accuracy testing substrate.
7. the manufacture method of illuminating substrate
The manufacture method of illuminating substrate of the present invention is characterised in that: comprise
(a) form the operation that forms the storage area of figure in the pixel region with appointment,
(b) be arranged in beyond the above-mentioned pixel region the land accuracy testing with the zone form the land accuracy testing with the operation of layer,
(c) in above-mentioned pixel region, by in the zone of cutting apart by above-mentioned storage area, forming the operation that functional layer forms the light-emitting zone of being cut apart by above-mentioned storage area.
According to the manufacture method of illuminating substrate of the present invention, can there be the illuminating substrate that picture element flaw and tone are fuzzy, contrast is high with simple operation manufacturing.
In the manufacture method of illuminating substrate of the present invention, can implement the form of following (1)～(6).
(1) and then can comprise
(d) in above-mentioned pixel region, form to give the operation of the pair of electrode layers of above-mentioned functions layer additional charge.
(2) in above-mentioned operation (a), above-mentioned storage area forms by collection layer resin bed on the 1st insulation course.
At this moment, above-mentioned operation (a) is included in when forming the 1st insulation course in the above-mentioned pixel region in the operation of above-mentioned land accuracy testing with formation the 2nd insulation course in the zone, above-mentioned the 1st insulation course can be formed identical height with above-mentioned the 2nd insulation course, and form identical figure.
In addition, at this moment, in above-mentioned operation (a), above-mentioned resin bed can form photo-sensitive resin in above-mentioned pixel region, forms by utilizing photoetching process to be etched into figure then.
In addition, at this moment, can carry out with same operation with the operation of layer in above-mentioned operation (a), forming the operation of above-mentioned resin bed and in above-mentioned operation (b), forming above-mentioned land accuracy testing.
(3) and then can comprise
(e) form the operation of on-off element in the zone respectively in above-mentioned pixel region and above-mentioned land accuracy testing with same structure.
(4) and then can comprise
(f) use in the zone in above-mentioned land accuracy testing, thereby make the drop land that comprise the drop material go up an operation that forms the convex layer with layer to above-mentioned land accuracy testing.
(5) above-mentioned operation (a) can be included in the operation of above-mentioned land accuracy testing with formation vernier layer in the zone.
At this moment, in above-mentioned operation (e), the above-mentioned on-off element that is arranged on above-mentioned pixel region comprises metallic wiring layer, above-mentioned vernier layer can be formed the height identical with above-mentioned metallic wiring layer.
(6) above-mentioned operation (c) can be to use drop material shower nozzle to make the drop material be attached to the zone of being cut apart by above-mentioned storage area and form the operation of above-mentioned functions layer.
Manufacture method according to shown in above-mentioned (1)～(6) has effect substantially the same with the manufacturing method of color filter of the invention described above and effect.
8. the manufacture method of the drop material land accuracy testing substrate used of illuminating substrate
The manufacture method of the drop material land accuracy testing substrate that illuminating substrate of the present invention is used is characterised in that: comprise
(a) on substrate, form on-off element, electrode layer and have appointment figure insulation course operation,
(b) on above-mentioned electrode layer, form the operation of land accuracy testing with layer.
The manufacture method of the drop material land accuracy testing substrate of using according to illuminating substrate of the present invention has the substantially the same effect and the effect of manufacture method of the drop material land accuracy testing substrate of using with the color filter of the invention described above.
In the manufacture method of the drop material land accuracy testing substrate that illuminating substrate of the present invention is used, can implement the form of following (1)～(4).
(1) above-mentioned operation (b) can be to form the operation of above-mentioned land accuracy testing with layer on above-mentioned electrode layer and above-mentioned insulation course.
(2) and then can comprise
(c) make drop material land go up the operation that forms the convex layer with layer to above-mentioned land accuracy testing.
(3) above-mentioned operation (b) can be after forming photo-sensitive resin, forms the operation of above-mentioned land accuracy testing with layer by utilizing photoetching process to be etched into figure.
(4) above-mentioned operation (a) can be included in the operation that forms vernier layer on the aforesaid substrate.
According to the manufacture method shown in above-mentioned (1)～(4), have substantially the same effect and the effect of manufacture method of using drop material land accuracy testing substrate with the color filter of the invention described above.
9. electro-optical device and electronic device
(1) electro-optical device of the present invention is characterised in that: comprise the color filter of the invention described above, above-mentioned color filter is separated by appointed interval and the subtend substrate that disposes and be configured in above-mentioned color filter and above-mentioned subtend substrate between electro-optical material layer.
At this moment, as above-mentioned electro-optical material layer,, just can constitute the liquid crystal indicator of can degree of the comparing high demonstration that does not have pixel defectives such as tone blurs if use liquid crystal material layer.
(2) electro-optical device of the present invention comprises the illuminating substrate of the invention described above, and the above-mentioned functions layer that constitutes above-mentioned illuminating substrate can be by electroluminescence and luminous.
(3) electronic device of the present invention can comprise the electro-optical device of the present invention shown in above-mentioned (1) or (2).
According to electro-optical device of the present invention and electronic device, can reflect the color filter of the invention described above or the action effect of illuminating substrate, realize reducing cost, and can not have the high demonstration of contrast of pixel defectives such as tone is fuzzy.
10. film build method
(1) film build method of the present invention is characterised in that: be included in be arranged in film form beyond the zone the land accuracy testing with the zone form the land precision confirmation with the operation of figure, above-mentioned land accuracy testing form with the zone in order to cover at least above-mentioned land accuracy testing with the land accuracy testing of figure with layer operation, by the drop material is ejected into above-mentioned land accuracy testing with layer on above-mentioned land precision confirmation form the operation of convex layer with position corresponding to graph position and use the operation of the relative position evaluation land precision of figure and above-mentioned convex layer according to above-mentioned land accuracy testing.
According to film build method of the present invention,, can correctly estimate the land precision of above-mentioned drop material by having according to the operation of above-mentioned land precision confirmation with the relative position evaluation land precision of figure and above-mentioned convex layer.Like this, just, can obtain the high film forming of precision.
(2) in addition, film build method of the present invention is characterised in that: be included in and be arranged in the land accuracy testing that film forms beyond the zone and form the operation of land precision confirmation with figure with the zone, form in the zone in order to cover above-mentioned land accuracy testing at least with the land accuracy testing of figure operation in above-mentioned land accuracy testing with layer, by being ejected into, the drop material forms the operation of a plurality of convex layers with the above-mentioned land precision confirmation on the layer with the corresponding position of graph position with above-mentioned land accuracy testing and according to the operation of the relative position of above-mentioned a plurality of convex layers evaluation land precision.
According to film build method of the present invention,, can correctly estimate the land precision of above-mentioned drop material by having the operation of estimating the land precision according to the relative position of above-mentioned a plurality of convex layers.Like this, just, can obtain the high film forming of precision.
In addition, in the film build method of above-mentioned (1) or (2), above-mentioned land accuracy testing can have with layer is not stained with the character of stating the drop material.
11. film formation device
(1) film formation device of the present invention is characterised in that: have the nozzle that is used to spray the drop material, form land precision confirmation figure with the zone being arranged in the land accuracy testing that film forming forms beyond the zone, above-mentioned land accuracy testing form in the zone in order to cover at least above-mentioned land precision confirmation with the land accuracy testing of figure with layer, by from said nozzle the drop material being ejected into and forming convex layer with the above-mentioned land precision confirmation on the layer with the corresponding position of graph position with the above-mentioned land accuracy testing that figure forms, estimate the land precision with the relative position of figure and above-mentioned convex layer according to above-mentioned land precision confirmation in order to cover above-mentioned land precision confirmation at least.
According to film formation device of the present invention,, can correctly estimate the land precision of above-mentioned drop material by estimating the land precision with the relative position of figure and above-mentioned convex layer according to above-mentioned land precision confirmation.Like this, just, can obtain the high film forming of precision.
(2) in addition, film formation device of the present invention is characterised in that: have the nozzle that is used to spray the drop material, form land precision confirmation figure with the zone being arranged in the land accuracy testing that film forming forms beyond the zone, above-mentioned land accuracy testing form in the zone in order to cover at least above-mentioned land precision confirmation with the land accuracy testing of figure with layer, by from said nozzle the drop material being ejected into and forming a plurality of convex layers with the above-mentioned land precision confirmation on the layer with the corresponding position of graph position with the above-mentioned land accuracy testing that figure forms, estimate the land precision according to the relative position of above-mentioned a plurality of convex layers in order to cover above-mentioned land precision confirmation at least.
According to film formation device of the present invention, estimate the land precision by relative position according to above-mentioned a plurality of convex layers, can correctly estimate the land precision of above-mentioned drop material.Like this, just, can obtain the high film forming of precision.
In addition, in the film formation device of above-mentioned (1) or (2), above-mentioned land accuracy testing can have with layer is not stained with the character of stating the drop material.
Description of drawings
Fig. 1 is the partial plan of the color filter of the pattern ground expression embodiment of the invention 1.
Fig. 2 is the sectional view of pattern ground expression along the part of the A-A line of Fig. 1.
Fig. 3 (A)～(D) is the fragmentary cross-sectional view of the manufacturing process of pattern ground presentation graphs 1 and color filter shown in Figure 2.
Fig. 4 (A)～(D) is the fragmentary cross-sectional view of the manufacturing process of pattern ground presentation graphs 1 and color filter shown in Figure 2.
The partial plan of Fig. 5 color filter that to be pattern ground expression obtain by Fig. 3 and operation shown in Figure 4 is near the figure that amplifies the A-A line with Fig. 1.
Fig. 6 is the partial plan of the color filter of the pattern ground expression embodiment of the invention 2.
Fig. 7 is the fragmentary cross-sectional view of pattern ground expression along the part of the A-A line of Fig. 6.
Fig. 8 (A)～(D) is the fragmentary cross-sectional view of the manufacturing process of pattern ground presentation graphs 6 and color filter shown in Figure 7.
Fig. 9 (A)～(D) is the fragmentary cross-sectional view of the manufacturing process of pattern ground presentation graphs 6 and color filter shown in Figure 7.
The partial plan of Figure 10 color filter that to be pattern ground expression obtain by Fig. 8 and operation shown in Figure 9 is near the figure that amplifies the A-A line with Fig. 6.
Figure 11 is the partial plan of the color filter of the pattern ground expression embodiment of the invention 3 with drop material land accuracy testing substrate.
Figure 12 is the fragmentary cross-sectional view of pattern ground expression along the part of the A-A line of Figure 11.
The partial plan of the color filter that the color filter that Figure 13 is pattern ground expression by embodiment 3 obtains with the manufacturing process of drop material land accuracy testing substrate is near the figure that amplifies the A-A line with Figure 11.
Figure 14 is the sectional view of pattern ground expression as the liquid crystal indicator of an example of the electro-optical device of the embodiment of the invention 4.
Figure 15 is the sectional view of pattern ground expression as the EL display device of an example of the electro-optical device of the embodiment of the invention 5.
Figure 16 is the sectional view of the illuminating substrate shown in the pattern ground presentation graphs 15.
Figure 17 (A)～(C) is the fragmentary cross-sectional view of the manufacturing process of the illuminating substrate shown in the pattern ground presentation graphs 16.
Figure 18 (A)～(C) is the fragmentary cross-sectional view of the manufacturing process of the illuminating substrate shown in the pattern ground presentation graphs 16.
Figure 19 is the oblique view of expression as the digital camera of an example of the electronic device of the embodiment of the invention 6.
Figure 20 (A)～(C) is the figure of application examples of the electronic device of the expression embodiment of the invention 6, (A) is mobile phone, (B) is wrist-watch, (C) is the portable information machine.
Figure 21 is the partial plan that the drop material land accuracy testing substrate that the illuminating substrate of the embodiment of the invention 7 is used is represented on pattern ground.
Embodiment
Below, with reference to assay method, electro-optical device and the electronic device of the drop material land precision of the color filter of the description of drawings embodiment of the invention and manufacture method thereof, the above-mentioned color filter of use.
Embodiment 1.
(color filter)
Fig. 1 is the partial plan of the color filter of the pattern ground expression embodiment of the invention 1, and Fig. 2 is the fragmentary cross-sectional view of pattern ground expression along the part of the A-A line of Fig. 1.
The color filter 1000 of present embodiment comprises transparent substrate 10, the pixel region 100 and the neighboring area that form respectively on substrate 10.Here, so-called neighboring area is that be adjacent to dispose and comprise the zone of lightproof area with pixel region 100 exactly.This neighboring area comprises the land accuracy testing with regional 200.That is, the land accuracy testing is positioned at beyond the pixel region 100 with zone 200.In the present embodiment, represented the example that the land accuracy testing forms in the neighboring of pixel region 100 with zone 200, still, the land accuracy testing does not limit this place with the formation position in zone 200.
(1) pixel region
As depicted in figs. 1 and 2, pixel region 100 comprises lightproof area 20 and sees through regional 30 by what lightproof area 20 was cut apart.Lightproof area 20 is zones that light (visible light) does not in fact see through, and seeing through zone 30 is zones that light can see through.In pixel region 100, as shown in Figure 1, lightproof area 20 and see through the matrix pattern arrangement of zone 30 by appointment.
The accumulation layer 24 that lightproof area 20 has the 1st light shield layer 22 and forms on the 1st light shield layer 22.And, be provided with look key element 32 through zone 30.Look key element 32 is for example forming on the substrate 10.
Below, lightproof area 20 is described earlier.
The 1st light shield layer 22 matrix figure by appointment on substrate 10 that constitutes lightproof area 20 forms.And the 1st light shield layer 22 has sufficient light-proofness, can play the function of black matrix, and its material etc. do not limit especially, can use metal, resin etc.As the material of the 1st light shield layer 22,, preferably use metal from can obtain the angle consideration of light-proofness fully and uniformly with very little thickness.The metal that uses as the 1st light shield layer 22 does not limit especially, can consider to comprise film forming and photoetching whole operations efficient and select.As such metal, the metal that can use for example chromium, nickel, aluminium etc. in the electron device processing technology, to use.When constituting the 1st light shield layer 22,, just can obtain sufficient light-proofness as long as its thickness is more than 0.1 μ m with metal, and if then the tight contact of consideration metal level and fragility etc., preferably its thickness is less than 0.5 μ m.
Accumulation layer 24 forms on the 1st light shield layer 22, has the matrix figure of appointment.This accumulation layer 24 is cut apart the zone that forms the look key element, prevents the mixture of colours (colour mixture) of adjacent look key element.Therefore, the thickness of accumulation layer 24 can not overflow for the drop material as the look material that injects when forming the look key element and set according to the relations such as height of this drop material layer.According to such viewpoint, accumulation layer 24 is preferably in for example interior formation of scope of thickness 1～5 μ m.
Accumulation layer 24 is made of the resin bed that can carry out photoetching.Such photoresist not necessarily must be to the contact angle of water resin big hydrophobicity excellence or that have light-proofness, can select in very wide scope.Resin as constituting accumulation layer 24 can use to comprise for example photosensitive resin composition of urethane resin, acryloyl group resin, novalac epoxy, カ Le De resin, polyimide resin, polycarboxylated styrene, polyvinyl alcohol (PVA) etc.
Below, illustrate to see through zone 30.Seeing through zone 30 is zones of being cut apart by lightproof area 20.See through in the zone 30 at this, be provided with look key element 32.
Look key element 32 is trichromaticly had red, green, that basket is of all kinds a plurality of look key element 32r, 32g, 32b and constitutes by what constitute light.These look key elements 32 are according to the arrangement of appointment for example colour band arrangement, rounded projections arranged or inlay spread geometries such as arrangement and be configured, and constitute 1 pixel by the look key element of 3 continuous looks.This look key element 32 is made of the dyed layer that for example comprises pigment or dyestuff.
(2) the land accuracy testing is with regional
The land accuracy testing is included in the above-mentioned neighboring area with zone 200.This land accuracy testing comprises by being included in the above-mentioned neighboring area and being surrounded and had a zone with the shape corresponding shape that sees through zone 30 by the lightproof area (being the 2nd light shield layer 122 here) of above-mentioned neighboring area with zone 200.Disposed the regional area surrounded that sees through by above-mentioned neighboring area.Particularly, the land accuracy testing comprises the 2nd light shield layer 122 (lightproof area) and land accuracy testing layer 26 as shown in Figure 2 with zone 200.
Constitute 2nd light shield layer 122 of land accuracy testing, on substrate 10, form by the matrix figure of appointment with zone 200.The 2nd light shield layer 122 can have and the identical figure of the 1st light shield layer 22 that constitutes pixel region 100.In the present embodiment, the 2nd light shield layer 122 has the figure identical with the 1st light shield layer 22, and forms by identical relation.That is, the 2nd light shield layer 122 is the same with the 1st light shield layer 22, has sufficient light-proofness, can play the function of black matrix, and its material etc. do not limit especially, can use materials such as metal, resin.
The land accuracy testing is arranged in the above-mentioned neighboring area in order to covering lightproof area (the 2nd light shield layer 122) area surrounded by above-mentioned neighboring area with layer 26, and has the character of not being stained with the drop material.This land accuracy testing is arranged on the land accuracy testing with in the zone, in order to cover the 2nd light shield layer at least with layer 26.In the color filter 1000 of present embodiment, the land accuracy testing forms on substrate 10 with layer 26, in order to cover the 2nd light shield layer 122.
The land accuracy testing is in order to make drop material land to its surface, to measure the land precision of drop material and use with layer 26.Use in the zone 200 in the land accuracy testing, be provided with the zone of cutting apart by the 2nd light shield layer (evaluation region).In the present embodiment, the zone of being cut apart by the 1st light shield layer 22 has identical figure with the zone of being cut apart by the 2nd light shield layer 122 (evaluation region).
In addition, in order to measure the land precision of drop material reliably, the land accuracy testing must have hydrophobicity to the drop material with the surface of layer 26.Here, if having hydrophobicity, be exactly low to the wettability of drop material to the drop material.In order to make the land accuracy testing have hydrophobicity to the drop material with layer 26 surface, can form land accuracy testing layer 26 with the drop material being had hydrophobic material, perhaps give its hydrophobic surface treatment with the surface of layer 26, for example carry out the processing such as surface fluorination of Cement Composite Treated by Plasma the drop material to the land accuracy testing.In the present embodiment, the land accuracy testing forms with accumulation layer 24 identical materials that layer 26 could utilize and form pixel region 10.
The land accuracy testing not necessarily must form in 200 whole zone, zone in the land accuracy testing with layer 26, can be only the land accuracy testing with zone 200 in indicator to carry out the zone that the land of drop material test be the zone formation of land drop material.
(manufacturing method of color filter)
Below, the manufacturing method of color filter of present embodiment is described with reference to Fig. 3～Fig. 5.Fig. 3 and Fig. 4 be pattern be illustrated in the sectional view of the layer structure of part corresponding in each operation with the B-B line of Fig. 1.The partial plan of Fig. 5 color filter that to be pattern ground expression obtain by Fig. 3 and operation shown in Figure 4 is near the figure that amplifies the A-A line with Fig. 1.
(1) formation of light shield layer
At first, shown in Fig. 3 (A), use in the zone 200, on transparent substrate 10, utilize for example metal level 220 of accumulation thickness 0.1～0.5 μ m such as sputtering method, evaporation method, electroless plating of dry type electrochemical plating at pixel region 100 and land accuracy testing.As the material of metal level 220, as previously mentioned, can use various metals such as chromium, nickel, aluminium.Then, on the surface of metal level 220, form the resist layer R1 of figure by photoetching with appointment.Here, use in the zone 200, use mask to carry out photo-mask process with identical figure at pixel region 100 and land accuracy testing.Then, R1 corrodes as mask with resist layer, is etched into the figure of metal level 220.Like this, shown in Fig. 3 (B), use in the zone 200, on substrate 10, form the 1st and the 2nd light shield layer 22 and 122 of matrix figure respectively with appointment at pixel region 100 and land accuracy testing.Here, the 1st has identical figure with the 2nd light shield layer 22,122.
(2) formation of accumulation layer
Shown in Fig. 3 (C), use in the zone 200 at pixel region 100 and land accuracy testing, on the substrate 10 that forms the 1st and the 2nd light shield layer 22,122, form resin bed 240.This resin bed can utilize the resist of negative-type or positive type to form.Resin bed 240 is made of the photoresist of each constrictive types (negative-type) such as for example urethane resin or acryloyl group resin.And, use photomask M1 to expose, and then resin bed 240 be etched into figure by carrying out development treatment.Like this, shown in Fig. 3 (D), just form accumulation layer 24, and when forming lightproof area 20, just forming land accuracy testing layer 26 with zone 200 in the land accuracy testing at pixel region 100.Structure about accumulation layer 24 and land accuracy testing usefulness layer 26 is described, so, omit herein.In this operation, the look key element of being cut apart by lightproof area 20 by the matrix figure formation of appointment at pixel region 100 forms zone 330.
Then, as required, before the formation operation of the look key element of carrying out in the back, carry out the surface treatment of exposing face of substrate 10.As such surface treatment, can use methods such as ultraviolet irradiation, plasma irradiating and laser radiation.By carrying out such surface treatment, remove attached to substrate 10 expose polluter on the face 10 etc., reduce the right contact angle of this surface 10a, thereby can improve the wettability of drop material.More specifically, the surface of exposing face 10a and accumulation layer 24 of substrate 10 to the difference of the contact angle of water more preferably greater than 15 °.Like this, the surface of exposing face 10a and accumulation layer 24 by control basal plate 10 is to the contact angle of water, can make the drop material be attached to the look key element and form exposing on the face 10a of zone 330 with tight contact good state, simultaneously, utilize accumulation layer 24 not to be stained with the character of drop material, prevent that the drop material from crossing accumulation layer and overflow.In addition, in the drying way of drop material, suppress the drop material and be stored layer stretching and the membrane thickness unevenness of generation.
As the surface-treated method, consider from the angle that is suitable for the operation pipelining, preferably use into the surface treatment method of the plasma irradiating mode of serial type.
(3) drop material land accuracy testing
In pixel region 100, form before the look key element 32, the land accuracy testing with zone 200 in, the drop material land of using when look key element 32 is formed with on the layer 26, are measured the land precision of this drop material to the land accuracy testing.
In the present embodiment, as the method for adhering to the drop material, use method by drop material shower nozzle ejection drop material.In pixel region 100, for make drop accurately land form zone 330 to for example fine look key element at 50 μ m angles, preferably use the drop material ejection method of number make the drop miniaturization of ejection and can control the drop of ejection.
When utilizing drop material ejection method to adhere to the drop material, land are not to the reason of contemplated material as the drop material, and the relative position that bending, the ejection agley from nozzle of drop material, substrate and drop material shower nozzle taken place the nozzle itself that has drop material shower nozzle to be provided with being bent, to use when spraying the drop material has taken place to depart from etc.Use method shown below, estimate the land precision of drop material, find out these reasons, can improve the land precision of drop material.
At first, shown in Fig. 4 (A), use in the zone 200, make the drop material be attached to the land accuracy testing, form the drop material layer 320 of convex with on the layer 26 in the land accuracy testing.Make convex layer 320 be attached to the land accuracy testing part that on the 2nd light shield layer 122, does not form in the layer 26.That is, make convex layer 320 the land accuracy testing with layer 26 on land in by the edge part 122a area surrounded of the 2nd light shield layer 122 (referring to Fig. 5).As shown in Figure 5, the land precision of drop material is estimated according to relative position between the convex layer 320 of the relative position of the edge part 122a of convex layer 320 and the 2nd light shield layer 122 and/or land etc.When estimating, as shown in Figure 5,, estimate the land precision according to the relative position between the convex layer 320 at land accuracy testing a plurality of convex layers 320 of formation on the layer 26 with the relative position between the convex layer 320.
In the present embodiment, form the 1st and the 2nd light shield layer 22 and 122 with identical figure in pixel region 100 and land accuracy testing respectively in zone 200.That is, has identical figure with zone that the 2nd light shield layer 22,122 is cut apart by the 1st.Particularly, shown in Fig. 4 (A), the width h that the 1st adjacent light shield layer is 22 aThe width h that (the look key element forms zone 330 width) and adjacent the 2nd light shield layer are 122 bBasically equate.Therefore, use in the zone 200 in the land accuracy testing, by make convex layer 320 land to the land accuracy testing with in the edge part 122a area surrounded by the 2nd light shield layer 122 on the layer 26, just it is contemplated that to make drop material land form zone 330, thereby can estimate the land precision of drop material to the look key element of pixel region 100.The result of the land accuracy testing of above drop material when the land precision is undesirable, can improve the adjustment of land precision as required.
(4) formation of look key element
Then, form the actual look key element 32 that becomes pixel.At first, shown in Fig. 4 (B),, form the zone and 330 form the drop material layer, form look key element 32 (32g, 32r, 32b) by making the drop material be attached to the look key element of cutting apart by the 1st light shield layer 22 and accumulation layer 24 at pixel region 100.In the present embodiment, as the method for adhering to the drop material, be applied in the drop ejection method of using in the accuracy testing of foregoing drop material land.
For the drop that makes miniaturization is attached to position as target (substrate 10 expose face 10a) accurately, at first, the size that control makes drop and the look key element as target form the consistent size of exposing face 10a in zone 330.Form zone 330 for for example look key element at 50 μ m angles, the size of drop preferably is controlled to be 6～30 picoliters.In addition, if consider throughput, the size of drop 12～20 picoliters preferably then.In addition, correctly be ejected on the target from drop material shower nozzle, preferably control drop and in the way of ejection, do not divide in order to make drop, and straight ahead.
In the present invention, the layer that is included in the drop material of ejection adheres to, after dry, the sclerosis, improve the following method of flatness in the dry run in order to make uniform film thickness.
One of method is that high boiling solvent is added in the drop material, slows down the method for the rate of drying of drop material.As high boiling solvent, can use from acetate butyl card must acid esters, select the methoxyl butylacetic acid ester, ethoxy butyl propionic ester, methoxyl-2-aldehyde acetic acid esters at least a kind.Such solvent if boiling point is 150～300 ℃ a solvent, can be considered the dissolubility etc. of dispersing of pigments or dyestuff and selects in very wide scope.
Additive method, the method for the rate of drying of the drop material that adheres to of control exactly.The drop material is after adhering to, and from the low boiling point solvent start vaporizer, smooth gradually and viscosity rises, and the resinous principle that contains pigment or dyestuff is heated and hardens.Drying condition according to the characteristic of salt material, can cure at least one side in the prebake of the adjustment in the natural atmosphere and 40～100 ℃ and 150～300 ℃ last combination.The drop material has intrinsic viscosity, surface tension and flow characteristics.Therefore, in order to obtain dried homogeneous film thickness, select the scope and the combination of above-mentioned drying condition according to the intrinsic characteristic of material on the one.When dry curing condition and drop properties of materials did not match, the thickness of look key element was inhomogeneous easily, thereby will become the reason of the deviation of pixel tone.
In the present embodiment, look key element 32 forms by order of all kinds red, green, basket.The formation order of such look key element 32 does not limit especially.For example, also can form green look key element 32g earlier, form the look key element 32b of red look key element 32r or basket then, form the look key element of remaining look at last.
If select color nozzle or a plurality of shower nozzle of drop material ejection mode, the look key element red, green, that basket is of all kinds also can form simultaneously.
(5) formation of overlayer etc.
Shown in Fig. 4 (C), after forming look key element 32, as required, form overlayer 40 in order to obtain smooth surface.In addition, shown in Fig. 4 (D),, as required,, can obtain color filter 1000 by forming common accumulation 50 on the surface of overlayer 40.These overlayers 40 and common accumulation 50 can be provided with according to the structure of the electro-optical device of using color filter.
(action effect)
Below, the significant feature effect of the color filter of present embodiment is described.
(a) color filter of present embodiment is used in the zone 200 in the land accuracy testing, drop material layer 320 land that make convex are after the evaluation of land accuracy testing with the land precision of carrying out the drop material on the layer 26, in pixel region 100, make drop material land form zone 330, form the actual look key element of using as pixel 32 to the look key element.Like this, just can make look key element 32 be attached to the appointed area accurately.
Particularly in the color filter of present embodiment, use in the zone 200, be provided with the zone of cutting apart by the 2nd light shield layer 122 (evaluation region) in the land accuracy testing.According to this structure, when adhering to drop material layer 320 (referring to Fig. 4 (A)), can measure the land precision of drop material layer 320 reliably.As a result, just can form look key element 32 accurately, so, have sufficient light-proofness at lightproof area 20, and in seeing through zone 30, do not have colour mixture.Therefore, there are not picture element flaw and tone fuzzy, and the contrast height.
(b) by the 1st light shield layer 22 and accumulation layer 24 being set, can distinguishing the dividing function of setting shade function and look key element independently, so, can bring into play both functions reliably.As a result, the color filter of present embodiment just is difficult for the picture element flaw that generation is caused by inadequate light-proofness and colour mixture.In addition, by such dividing function, can select to be used to constitute the material of the best of the 1st light shield layer 22 and accumulation layer 24 from very wide scope, thereby help reducing cost.Particularly, when constituting the 1st light shield layer 22, can obtain light-proofness evenly and fully with very little thickness by metal level.
In addition, according to the manufacturing method of color filter of present embodiment, mainly contain following action effect.
(a) according to the manufacturing method of color filter of present embodiment, use in the zone 200 in the land accuracy testing, drop material layer (convex layer) 320 land that make convex to the land accuracy testing with carrying out on the layer 26 after the evaluation of drop material land precision, in pixel region 100, make drop material land form zone 330, form the actual look key element of using as pixel 32 to the look key element.Promptly, can estimate drop material land precision with easy method, and according to this evaluation result, adjustment by carrying out device as required etc., improve drop material land precision, then, in pixel region 100, form look key element 32, so, can make look key element 32 be attached to desirable zone accurately.Like this, in lightproof area 20, just have sufficient whole property, and in seeing through zone 30, do not have colour mixture, so can make does not have picture element flaw and tone to blur and the high color filter of contrast.
(b) in addition, form look key element 32, can deduct and use photoetching process and the operation of etched figure, thereby can simplify working process by utilizing drop material ejection method.Therefore, can form the color filter of present embodiment with few operation.In addition, adhere to the drop material, form look key element 32 with drop material ejection method, so, the drop material only can be supplied with needed look key element and be formed the zone.Therefore, can be as not utilizing photoetching process to carry out wasting the look material owing to removing unwanted part the etched figure, thus can reduce the cost of color filter.
Embodiment 2.
(color filter)
Fig. 6 is the partial plan of the color filter of the pattern ground expression embodiment of the invention 2, and Fig. 7 is the fragmentary cross-sectional view of pattern ground expression along the part of the A-A line of Fig. 7.
The color filter 1001 of present embodiment forms the vernier layer 28 except using in the land accuracy testing stirring on 10 in the zone 200, has and Fig. 1～similar structure of color filter shown in Figure 5.In color filter 1001, be marked with identical symbol for having in fact, and omit its detailed explanation with the part of color filter 1000 identical functions of embodiment 1.
As shown in Figure 6 and Figure 7, vernier layer 28 is used in the zone 200 in the land accuracy testing, forms in the zone of being cut apart by the 2nd light shield layer 122 (evaluation region).In Fig. 6, the flat shape of vernier layer 28 is a cruciform, and still, the flat shape of vernier layer 28 does not limit so, can be various shapes such as circle, triangle, rectangle.On vernier layer 28, form land accuracy testing layer 26.
When forming the land accuracy testing with layer 26 and convex layer 320 on vernier layer 28, if vernier layer 28 can be from the face that the is provided with side identification of convex layer 320, its material etc. just do not limit especially, can use metal, resin etc.When forming vernier layer 28, can use with the 1st and the 2nd light shield layer 22,122 identical materials to form with the same operation of the 1st and the 2nd light shield layer 22,122 usefulness.
(manufacturing method of color filter)
Below, the manufacture method of the color filter 1001 of present embodiment is described with reference to Fig. 8～Figure 10.Fig. 8 and Fig. 9 be pattern be illustrated in the sectional view of the layer structure of part corresponding in each operation with the B-B line of Fig. 6.The partial plan of Figure 10 color filter that to be pattern ground expression obtain by Fig. 8 and operation shown in Figure 9 is near the figure that amplifies the A-A line with Fig. 6.In each manufacturing process, in fact with the identical part of manufacturing process of the color filter 1000 of embodiment 1, omit detailed explanation.
(1) formation of light shield layer and vernier layer
In the present embodiment, form the 1st and the 2nd light shield layer 22,122 and vernier layer 28 with same operation.At first, shown in Fig. 8 (A), pixel wherein 100 and the land accuracy testing with wherein in 200, behind deposit layer 220 on the transparent substrate 10, utilize photoetching process to form the resist layer R2 of figure on the surface of metal level 220 with appointment.Then, R2 corrodes as mask with this resist layer, with metal level 220 etched figures, shown in Fig. 8 (B), in pixel region 100, on substrate 10, form the 1st light shield layer 22 of matrix figure, simultaneously with appointment, use in the zone 200 in the land accuracy testing, form the 2nd light shield layer 122 and vernier layer 28.In this operation, vernier layer 28 forms in the zone of being cut apart by the 2nd light shield layer 122 (evaluation region).
(2) formation of accumulation layer
Operation shown below is identical with the manufacturing process of the color filter of embodiment 1.Promptly, shown in Fig. 8 (C), use in the zone 200 at pixel region 100 and land accuracy testing, after forming resin bed 240 on the substrate 10 that forms the 1st and the 2nd light shield layer 22,122,, resin bed 240 is etched into figure by using photomask M1 to expose also and then carrying out development treatment, shown in Fig. 8 (D), thereby formation accumulation layer 24 forms lightproof areas 20 on pixel region 100, simultaneously, forms land accuracy testings layer 26 in the land accuracy testing with zone 200.In addition, in this operation, the look key element of being cut apart by lightproof area 20 by the matrix figure formation of appointment forms zone 330.Then, as required, carry out the surface treatment of substrate surface before the formation operation of the look key element of carrying out in the back.
(3) drop material land accuracy testing
Secondly, in pixel region 100, form before the look key element 32, the land accuracy testing with zone 200 in, make the drop material land used when forming look key element 32 to the land accuracy testing with on the layer 26, measure the land precision of drop material.In the present embodiment, also the same with embodiment 1, use drop material ejection method and form look key element 32.That is, in the present embodiment, use the method identical with embodiment 1, the land accuracy testing with zone 200 in mensuration drop material land precision.
At first, shown in Fig. 9 (A), use in the zone 200, make the drop material be attached to the land accuracy testing, form the drop material layer 320 of convex with on the layer 26 in the land accuracy testing.As previously mentioned, the land precision of drop material is estimated according to relative position between the convex layer 329 of the relative position of the edge part 122a (referring to Figure 10) of convex layer 320 and the 2nd light shield layer 122 and land etc.In addition, in the color filter 1001 of present embodiment, owing on substrate 10, formed vernier layer 28, so, as shown in Figure 5, can discern the departing from of landing positions of drop material clearly according to the convex layer 320 and the relative position of vernier layer 28.
The result of above drop material land accuracy testing is when the land precision is undesirable, as required, after being used to improve the adjustment of land precision, shown in Fig. 9 (B)～Fig. 9 (D), carry out the identical operation of manufacturing process with the color filter of embodiment 1, make color filter 1001.
The color filter 1001 of present embodiment is except the action effect of the color filter 1000 of the foregoing description 1, owing on substrate 10, formed vernier layer 28, so, can discern the departing from of land precision of drop material clearly according to the convex layer 320 and the relative position of vernier layer 28.
Embodiment 3.
Figure 11 is the partial plan of the color filter of the pattern ground expression embodiment of the invention 3 with drop material land accuracy testing substrate, and Figure 12 is the sectional view of pattern ground expression along the part of the A-A line of Figure 11.
The color filter of present embodiment has and the land accuracy testing of the color filter 1001 that constitutes the foregoing description 2 regional 200 similar structures with drop material land accuracy testing substrate 1002.That is, on drop material land accuracy testing substrate 1002, pixel region shown in Figure 6 100 is not set, is formed on said land accuracy testing usefulness zone 200 among Fig. 6 comprehensively.Color filter with drop material land accuracy testing substrate 1002 in, be marked with identical symbol for having in fact, and omit its detailed explanation with the part of color filter 1001 identical functions of embodiment 2.
Color filter comprises the land accuracy testing with regional 200 with drop material land accuracy testing substrate 1002.The land accuracy testing layer 26 that this land accuracy testing comprises light shield layer 122 with zone 200 and forms in order to cover light shield layer 122.This drop material land accuracy testing substrate 1002 makes for the land accuracy testing of carrying out the drop material.The land accuracy testing that is provided with on land accuracy testing substrate 1002 is with in the zone 200, and is the same with zone 200 (referring to Fig. 2) with the land accuracy testing of the color filter 1000 of embodiment 1, is provided with the zone of being cut apart by light shield layer 122 (evaluation region).In the manufacturing process of color filter, before reality is made color filter, the land accuracy testing of the drop material when using drop material land accuracy testing substrate 1002 to carry out the formation of look key element.
Drop material land accuracy testing substrate 1002 has and the actual identical structure of making of color filter except not forming the pixel region this point.That is, drop material land accuracy testing substrate 1002 uses the substrate identical with the color filter of actual manufacturing and makes, and has the light shield layer 122 with the identical figure of light shield layer that forms on the color filter of actual manufacturing.In addition, in by 122 area surrounded of the light shield layer on the substrate 10, form vernier layer 28, in addition, on substrate 10, formed land accuracy testing layer 26.
(the color filter manufacture method of drop material land accuracy testing substrate)
Color filter drop material land accuracy testing substrate 1002 can be by making with the identical operation of the operation in zone 200 with formation land accuracy testing in the color filter 1001 of embodiment 2.In addition, in the present embodiment, the land accuracy testing of drop material can be undertaken by the operation identical with the operation shown in Figure 9 of embodiment 2.At this moment, as previously mentioned,, before the manufacturing of the color filter of actual manufacturing, carry out the land accuracy testing of the drop material of drop material land accuracy testing substrate 1002.
Figure 13 is the partial plan of the drop material land accuracy testing substrate 1002 after the accuracy testing of pattern ground expression drop material land, is the figure with near the amplification of the A-A line of Figure 11.
Drop material land accuracy testing substrate 1002 has and the actual identical structure of making of color filter, so, can with the color filter of actual manufacturing is tested the same land accuracy testing of carrying out.In addition, according to present embodiment, before making color filter, the drop material land accuracy testing substrate 1002 as the test dedicated substrate is carried out the accuracy testing of drop material land.This drop material land accuracy testing substrate 1002 forms the 2nd light shield layer 122 with the actual identical figure of making of color filter, so, in advance this drop material land accuracy testing substrate 1002 is tested, can after fully confirming the land precision of drop material and improving the land precision, be carried out the formation of look key element of the color filter of actual manufacturing.Like this, just can make does not have picture element flaw and tone to blur and the high color filter of contrast.
Embodiment 4.
(electro-optical device)
Figure 14 represents the sectional view of color liquid crystal display arrangement as an example of the electro-optical device of the color filter 1000 of having assembled embodiment 1.In Figure 14, pixel region 100 parts in the color filter 1000 have only been expressed.
Color liquid crystal display arrangement 1100 normally constitutes color filter 1000 with the 80 mutual combinations of subtend substrate and by liquid-crystal composition 70 is sealing between the two.On the medial surface of the substrate 80 on one side of liquid crystal indicator 1000, TFT (thin film transistor (TFT)) element (not shown) and pixel electrode 52 form rectangular.In addition, as the substrate of another side, for the look key element 32 of, basket red, green and be provided with color filter 1000 in the positional alignment relative with pixel electrode 52.On the relative face of substrate 80 and color filter 1000, form alignment films 60 and 62.These alignment films 60,62 are carried out friction treatment, and liquid crystal molecule is arranged in a certain direction.In addition, on the face in the outside of substrate 80 and color filter 1000, polaroid 90 and 92 are set respectively.In addition,, use the combination of fluorescent light (not shown) and scatter plate usually, show by the function that makes liquid-crystal composition work the optical shutter of the transmitance that changes light as rear light.
In the present embodiment, represented that color filter 1000 with embodiment 1 is assembled into the example in the liquid crystal indicator, still, color filter 1001 that also can assembled embodiment 2 replaces color filters 1000 and makes liquid crystal indicator.
Embodiment 5.
(illuminating substrate and electro-optical device)
Figure 15 represents illuminating substrate 1003 and as the sectional view of colored EL display device 1200 of an example of the electro-optical device of having assembled illuminating substrate 1003.In addition, Figure 16 is the planimetric map of the illuminating substrate 1003 shown in the pattern ground presentation graphs 15.In the present embodiment, illustrate that illuminating substrate 1003 is situations of colour lighting base plate.Have the structure identical, be marked with identical symbol for part, and omit its explanation with identical effect and effect with the color filter 1000 of embodiment 1.
As shown in figure 15, colored EL display device 1200 comprises substrate 112 and the illuminating substrate 1003 that is arranged on the substrate 112.
The summary of illuminating substrate 1003 at first, is described.As Figure 15 and shown in Figure 16, illuminating substrate 1003 comprises pixel region 110 and neighboring area.Here, so-called neighboring area, the zone that is adjacent to dispose with pixel region 110 exactly.This neighboring area comprises the land accuracy testing with regional 210.That is, the land accuracy testing is positioned at beyond the pixel region 110 with zone 210.This land accuracy testing 210 is included in the above-mentioned neighboring area with the zone, and comprises the evaluation region that has with the shape corresponding shape of light-emitting zone 230.Below, pixel region 110 is described earlier.
(1) pixel region
As Figure 15 and shown in Figure 16, pixel region 110 comprises storage area (cut zone) 220 and light-emitting zone 230.This storage area 220 and light-emitting zone 230 form on substrate 111.In addition, light-emitting zone 230 is cut apart by storage area 220.Particularly, as shown in figure 16, in pixel region 110, light-emitting zone 230 is cut apart by storage area 220.
In addition, pixel region 110 and then be included on the substrate 111 on-off element 202 that forms.
Substrate 111 is supports, works the function of the face that takes out light simultaneously.Therefore, substrate 111 to consider light permeability and heat stability and select.As substrate 111 employed transparency carrier materials, can be for example glass substrate and transparent plastic etc.
As on-off element 202, can be TFT element for example.Adjacent on-off element 202 is separated by insulation course 221.
The pair of electrode layers that light-emitting zone 230 comprises functional layer and is made of the 1st and the 2nd electrode layer 227,229.Hole conveying/the input horizon that the above-mentioned functions layer comprises luminescent layer and is provided with as required.In the illuminating substrate 1003 of present embodiment, the above-mentioned functions layer comprises luminescent layer 42 (42g, 42r, 42b) and hole conveying/input horizon 204.
Luminescent layer 42 is pressed the matrix pattern arrangement of appointment on substrate 111, and is cut apart by storage area 220.In addition, as shown in figure 15, luminescent layer 42 forms between the 1st electrode layer 227 and the 2nd electrode layer 229.In the present embodiment, luminescent layer 42 constitutes by having a plurality of luminescent layer 42r, 42g, the 42b of all kinds trichromatic red, green, basket that constitute light.These luminescent layers 42 are by the arrangement of appointment for example striped arrangement, triangle arrangement or inlay spread geometries such as arrangement and dispose, and constitute 1 pixel by the look key element of 3 continuous looks.In addition, in the present embodiment, luminous material forms luminescent layer 42 by passing through electroluminescence.
As shown in figure 15, in the illuminating substrate 1003 of present embodiment, can between the 1st electrode layer 227 and luminescent layer 42, form hole conveying/input horizon 204.Here, so-called hole conveying/input horizon is carried the hole or can be injected the layer in hole effectively to luminescent layer from anode exactly.
Storage area 220 mainly forms in order to cut apart luminescent layer 42.As storage area 42, can use the layer-collecting body that constitutes by storage insulation course (the 1st insulation course) 222 and resin bed 224.Storage insulation course 222 is made of for example silicon oxide layer.Resin bed 224 is made of for example polyimide.Storage insulation course 222 collection layers are on insulation course 221, and resin bed 224 forms on storage insulation course 222.In addition, storage insulation course 222 is cut apart light-emitting zone 230 as the textural element of storage area 220, has the function of separating between the 1st adjacent electrode layer 227 simultaneously.
The the 1st and the 2nd electrode layer the 227, the 229th is provided with in order to supply with electric charge to luminescent layer 42.In the present embodiment, the 1st electrode layer 227 is anodes, and the 2nd electrode layer 229 is negative electrodes.The 1st electrode layer 227 can use the potpourri of big (for example more than the 4eV) metal, alloy, conductive compound or these materials of work function.For example, with ITO, CuI, SnO 2, transparent conductive material such as ZnO constitutes the 1st electrode layer 227.In addition, as the 2nd electrode layer 229, can use the potpourri of electronics injection metal, alloy conductive compound and these materials.
(2) the land accuracy testing is with regional
The land accuracy testing is included in the above-mentioned neighboring area with zone 210.This land accuracy testing with zone 210 comprise be included in the above-mentioned neighboring area and have a zone with the shape corresponding shape of light-emitting zone 230.Arranging the zone that has with the shape corresponding shape of above-mentioned light-emitting zone 230.Particularly, as shown in figure 15, use in the zone 210, formed land accuracy testing layer 226 in the land accuracy testing.In addition, use in the zone 210 in the land accuracy testing, the same with pixel region 110, formed at the storage insulation course (the 2nd insulation course) 222 that forms on the substrate 111, main that on storage insulation course 222, form and the 1st electrode layer 227 that is connected with on-off element 202 and the storage insulation course 222 that the 1st adjacent electrode layer 227 is separated.
The land accuracy testing is arranged in the above-mentioned neighboring area in order to covering with layer 226 has zone with the shape corresponding shape of light-emitting zone 230, and has the character of not being stained with the drop material.This land accuracy testing can be formed by resin bed 224 identical materials with the storage area 220 that constitutes pixel region 110 with layer 226.For example, when this resin bed 224 was formed by the polyimide resin, the land accuracy testing equally also can be formed by the polyimide resin with layer 226.
In addition, constitute the land accuracy testing and in pixel region 110, can use the operation formation identical with the storage insulation course that constitutes storage area 220 (the 1st insulation course) 222 with the storage insulation course (the 2nd insulation course) 222 in zone 210.That is, constitute the 1st storage insulation course 222 of land accuracy testing with zone 210, in pixel region 110 from substrate 112 begin to form with constitute storage area 220 the 2nd store the identical height of insulation course 222, and can have identical figure.
In addition, the on-off elements 202 that form with zone 210 in the land accuracy testing can be with forming with the on-off element 202 identical operations that form at pixel region 119, and can have identical structure.
In addition, in the illuminating substrate 1003 of present embodiment, as shown in figure 15, use in the zone 210, on substrate 111, form vernier layer 228 in the land accuracy testing.This vernier layer 228 has and identical effect and the effect of vernier layer that constitutes color filter in the foregoing description 2.In the illuminating substrate 1003 of present embodiment, this vernier layer 228 forms from substrate 112 beginnings and the identical height of metallic wiring layer (not shown) that constitutes on-off element 202.At this moment, vernier layer 228 can be by forming with this metallic wiring layer identical materials.For example, when this metallic wiring layer was made of chromium or aluminium, vernier layer 228 also can be formed by chromium or aluminium.
(action of equipment)
Below, the action and the effect of the colored EL display device 1200 that has formed illuminating substrate 1003 shown in Figure 15 are described.
Be added on the 1st electrode layer (anode) 227 and the 2nd electrode layer (negative electrode) 229 by voltage, in luminescent layer 42, inject electronics from negative electrode 229 respectively, and in luminescent layer 42, inject the hole from anode 227 with appointment.In luminescent layer 42, compound by electronics and hole, generate exciton, when this exciton went to swash, fluorescence or phosphorescence etc. just took place.
(manufacture method of illuminating substrate)
Below, the manufacture method of the illuminating substrate 1003 of present embodiment is described with reference to Figure 17 and Figure 18.Figure 17 (A)～(C) and Figure 18 (A)～(C) are the fragmentary cross-sectional views of the manufacturing process of the illuminating substrate 1003 shown in the pattern ground presentation graphs 16, are the figure of expression along the section of the CC face cut-out of Figure 16.
(1) formation of light shield layer
At first, shown in Figure 17 (A), pixel region 110 and land accuracy testing with zone 210 in, on substrate 111 with well-known method form on-off element 202 in proper order, with insulation course the 221, the 1st electrode layer 227 of adjacent on-off element 202 separation with have the storage insulation course (the 1st and the 2nd insulation course) 222 of the figure of appointment.Here, shown in Figure 17 (A), before forming, the 1st electrode layer 227 after the zone (being positioned at the zone on the on-off element 202) of the appointment of insulation course 221 forms peristome,, on-off element 202 and the 1st electrode layer 227 are electrically connected by formation the 1st electrode layer 227 on this insulation course 221.In addition, in the described in the back operation, as shown in figure 16, form light-emitting zone 230 in the part that does not form storage insulation course 222.
Then, on whole, form after the photo-sensitive resin (not shown), by utilizing photoetching process to be etched into figure, in pixel region 110, form storage area 220 by on storage insulation course 222, forming resin bed 224, simultaneously the land accuracy testing with zone 210 in, on storage insulation course 222 and the 1st electrode layer 227, form the land accuracy testing with layer 226.In addition, by forming storage area 220, in the described in the back operation, form peristome in the zone that forms light-emitting zone 230.That is, this peristome becomes functional layer and forms zone 430.That is, it is zones of being cut apart by storage area 220 that this functional layer forms zone 430, is the zone that forms functional layer (luminescent layer 42 and hole conveying/input horizon 204) in the described in the back operation.
(2) formation of hole conveying/input horizon
Then, shown in Figure 17 (B) and Figure 17 (C), be applied in the drop material ejection method of the drop material shower nozzle 500 that uses in the drop material ejection mode, form zone 430 in functional layer and form hole conveying/input horizon 204.As the material 502 that is used to form hole conveying/input horizon 204, can use the potpourri of for example poly-ethylidene dioxy base thiophene and polystyrolsulfon acid ester.In the present embodiment, form and each colored hole conveying/input horizon of putting identical material, still, also can according to circumstances use the hole conveying/injecting material that be suitable for luminescent layer to form hole conveying/input horizon each luminescent layer.
(3) drop material land accuracy testing
In pixel region 110, form before the luminescent layer 42, the land accuracy testing with zone 210 in, the drop material land of using when these luminescent layers 42 are formed with on the layer 226, are measured the land precision of this drop material to the land accuracy testing.
In the present embodiment, the method for using when forming with above-mentioned hole conveying/input horizon 204 is the same, uses drop material ejection method and forms luminescent layer 42.
When utilizing drop material ejection method to adhere to the drop material, as previously mentioned, land are not to the reason of material of imagination for the drop material, and the relative position that bending, the ejection agley from nozzle of drop material, substrate and drop material shower nozzle taken place the nozzle itself that has drop material shower nozzle to be provided with being bent, to use when spraying the drop material has taken place to depart from etc.Use method shown below, estimate the land precision of drop material, find out these reasons, can improve the land precision of drop material.
At first, shown in Figure 18 (A), use in the zone 210, make the drop material be attached to the land accuracy testing, form the drop material layer 420 of convex with on the layer 226 in the land accuracy testing.Here, make convex layer 420 land be positioned at the area inside (referring to Figure 16) that zone on the storage area 222 promptly is positioned at the edge part 222a of storage area 222 in 226 with layer to the land accuracy testing.As shown in figure 16, the land precision of drop material is estimated according to the relative position between the convex layer 420 of the relative position of the edge part 222a of convex layer 420 and storage area 222 and/or land.When estimating, as shown in figure 16,, estimate the land precision according to the relative position between the convex layer 420 at land accuracy testing a plurality of convex layers 420 of formation on the layer 226 with the relative position between the convex layer 420.
In the present embodiment, use in the zone 210, form storage insulation course 222 with identical figure respectively at pixel region 110 and land accuracy testing.Therefore, use in the zone 210 in the land accuracy testing, use on the layer 226 in the land accuracy testing, by making convex layer 420 land in edge part 222a area surrounded by storage area 222, imagination drop material land form regional 430 situation to the functional layer of pixel region 110, just can estimate the land precision of drop material.
The result of above drop material land accuracy testing, when the land precision is undesirable, the adjustment that is used to improve the land precision as required.
(4) formation of luminescent layer
Then, form the actual luminescent layer 42 (42g, 42r, 42b) that becomes pixel.At first, shown in Figure 18 (B), utilize drop material ejection method respectively red light emitting layer to be applied on the hole conveying/input horizon 204 with the drop material with drop material and blue light-emitting layer with drop material, green light emitting layer.Then, remove and to desolvate, and heat-treat in nitrogen atmosphere, make sclerosis of drop material composite or gripping altogether, such shown in Figure 18 (C) forms trichromatic red light emitting layer 42r, green light emitting layer 42g and blue light-emitting layer 42b red, green, basket.The luminescent layer of gripping is insoluble to solvent altogether by thermal treatment.By above operation, just formed light-emitting zone shown in Figure 15 230.
Drop material ejection method according to such can form fine figure easily at short notice.In addition, the concentration and the spray volume of the solid constituent by changing the drop material are just can silicon fiml thick.
In addition, before forming luminescent layer 42, can use oxygen and fluorocarbon plasma that hole conveying/input horizon 204 is carried out continuous Cement Composite Treated by Plasma.Like this, just form fluoride layer on hole conveying/input horizon 204, ionization potential raises, thereby organic EL substrate of hole injection efficiency excellence can be provided.
According to the kind of luminescent material, can utilize drop material ejection method to form 1 in the organic luminous layer and disturb or 2 looks, and form other 2 looks or 1 look with the coating process that has earlier.According to this method, even not too be suitable for the luminescent material of drop material ejection method,, also can form organic EL substrate of full color by making up with operable other luminous organic materials of drop material ejection method, so this has just increased the degree of freedom of element design.Coating process as beyond the drop material ejection method has print process, transfer printing, infusion process, whirl coating, casting method, capillary tube technique, roll coated method, bar code method etc.
The formation of (5) the 2nd electrode layers
As shown in figure 15, as negative electrode, form the 2nd electrode layer 229.As the 2nd electrode layer 229, can use metallic film.Metal as constituting the 2nd electrode layer 229 has for example magnesium, silver, aluminium, lithium etc.In addition, in addition, also can use the little material of work function, for example, can use alkaline metal such as alkaline metal or potassium and comprise these alkali-metal alloys.In addition, fluoride that also can applied metal.The 2nd electrode layer 229 like this can utilize formation such as evaporation method and sputtering method.
In addition, also can on the 2nd electrode layer 229, form diaphragm.By forming diaphragm, can prevent the 2nd electrode layer 229 and each luminescent layer 42 deterioration, damage and peel off etc.
As the constituent material of such diaphragm, epoxy resin, acryloyl group resin, liquid glass etc. are arranged.In addition, as the formation method of diaphragm, for example whirl coating, casting method, infusion process, bar code method, roll coated method, capillary tube technique etc. are arranged.
The 2nd electrode layer 229 can be provided with according to the structure of the electro-optical device of using luminophor.Then, by cutting off illuminating substrate 1003, form a plurality of luminophors at assigned address.
In above-mentioned manufacture method,, can use well-known material as the material of each layer.In addition, as the material of hole conveying/input horizon, luminescent layer etc., can use the applicant to be willing to flat 11-134320 communique and special material of being willing to that flat 11-250486 communique is put down in writing the spy.
In addition, in above-mentioned manufacture method, having illustrated with drop material ejection method to form the hole conveying/input horizon of the colored point of formation and the example of luminescent layer, still, can only be luminescent layer also.Perhaps, also electron transport/input horizon can and then be set.
In addition, the same with the color filter of embodiment 3 with drop material land accuracy testing substrate, also can form the drop material land accuracy testing substrate (referring to the described embodiment 7 in back) that does not form pixel region 110 in the illuminating substrate 1003 of present embodiment.Drop material land accuracy testing substrate according to this illuminating substrate, by carrying out the accuracy testing of drop material land to comprising figure the 1st electrode layer 227 identical and the drop material land accuracy testing substrate of the 2nd electrode layer 229 with the actual illuminating substrate of making, can fully confirm the land precision of drop material, and after improving the land precision, can form the luminescent layer of the illuminating substrate of actual manufacturing.Like this, just, can make does not have picture element flaw and tone to blur and the high illuminating substrate of contrast.
Embodiment 6.
Below, provide the example of the electronic device that uses liquid crystal indicator as electro-optical device of the present invention.
(1) digital camera
Below, the digital camera that the liquid crystal indicator 110 of the embodiment of the invention 4 is applied to view finder is described.Figure 19 is the oblique view of structure of this digital camera of expression, in addition, has also expressed simply and being connected of external mechanical.
Common camera is to utilize the light image of subject to make film exposure, and in contrast, 2000 of digital cameras utilize CCD imaging apparatuss such as (Charge Coupled Device) that the light image of subject is carried out light-to-current inversion, generates image pickup signal.Here,, be provided with the LCDs of above-mentioned liquid crystal indicator 1000 in Figure 19, show according to the image pickup signal of CCD at the back side (being front face side) of the casing 2202 of digital camera 2000.Therefore, 1100 functions that show the view finder of subject of liquid crystal indicator.In addition, the front face side (being rear side in Figure 19) at casing 2202 is provided with the light receiving unit 2204 that comprises optical lens and CCD etc.
Here, confirm the shot object image that liquid crystal indicator 1100 shows and when pressing shutter release button 2206 the cameraman, this constantly the image pickup signal of CCD just to the memory transfer of circuit board 2208 and store.In addition, on this digital camera 2000,, be provided with the input and output terminal 2214 that video signal output terminal 2212 and data communication are used in the side of casing 2202.And, as shown in figure 19, TV monitor 2300 can be connected with the former video signal output terminal 2212 as required, in addition, also the input and output terminal 2214 that computer 2400 and the latter's data communication are used can be connected.In addition, store image pickup signal in the storer of circuit board 2208 into to TV monitor 2300 or computer 2400 outputs by the operation of appointment.
(2) mobile phone, other electronic devices
Figure 20 (A), (B), (C) are the outside drawing of expression use as the example of other electronic devices of the liquid crystal indicator of electro-optical device of the present invention.Figure 20 (A) is a mobile phone 3000, has liquid crystal indicator 1100 above its front.Figure 20 (B) is a wrist-watch 4000, is provided with the display part that uses liquid crystal indicator 1100 in the front of its body central authorities.Figure 20 (C) is a portable information machine 5000, has the display part and the input part 5100 that are made of liquid crystal indicator 1100.
These electronic devices are except liquid crystal indicator 1100, there is not detailed icon, but, all comprise various circuit such as display message output source, display message treatment circuit, clock generating circuit and by the shows signal generating unit that constitutes to power circuit of these circuit supplies etc.At display part, from the information of input part 5100 inputs etc., form display image when for example being portable information machine 5000 by supplying with the shows signal that generates by the shows signal generating unit.
As the electronic device of having assembled liquid crystal indicator 1100 of the present invention, being not limited to digital camera, mobile phone, wrist-watch and portable information machine, also can be the various electronic devices such as video camera, counter, car steering guide piece, the device with touch-screen, clock of the computer (PC) of electronic notebook, pager, POS terminal, IC-card, Mini Disk machine, liquid crystal projection apparatus, multimedia correspondence and engineering workstation (EWS), notebook computer, word processor, TV, find a view type or monitor direct viewing type.
LCDs, say by type of drive, can use display screen itself do not use on-off element simple matrix LCDs and static driving lcd, use with TFT (thin film transistor (TFT)) as the trigistor of representative or with the active-matrix liquid-crystal displaying screen of TFD (thin film diode) as the two-terminal switch element of representative, press electro-optical characteristic and say, can use various types of LCDs such as TN type, STN type, guest-host type, phase transfer type, strong dielectric type.
Device of the present invention is illustrated according to several certain embodiments, and still, the present invention can have various distortion in the scope of its purport.For example, in the above-described embodiments, image-display units (electric light display part) as electro-optical device, the situation of using the liquid crystal indicator 1100 of the embodiment of the invention 4 has been described, but, the present invention does not limit this kind situation, for example, can use the EL display device 1200 of the embodiment of the invention 5 yet.In addition, electro-optical device of the present invention can be applied to use the various electro-optical devices such as micro television, electroluminescence, plasma scope, CRT monitor, FED (Field EmissionDisplay) display screen, electrophoresis showed apparatus of slim oscillatron or liquid crystal color shutters etc.
Embodiment 7.
(the drop material land accuracy testing substrate that the illuminating substrate is used)
Figure 21 is the partial plan that the drop material land precision trial base 1004 that the illuminating substrate of the embodiment of the invention 7 is used is represented on pattern ground.
The drop material land accuracy testing substrate 1004 that the illuminating substrate of present embodiment is used has and the land accuracy testing of the illuminating substrate 1003 that the constitutes the foregoing description 5 approximate structure of zone 210 (referring to Figure 15).That is, on drop material land accuracy testing substrate 1004 shown in Figure 21, pixel region shown in Figure 15 100 is not set, and on whole, is formed on said land accuracy testing usefulness zone 210 among Figure 15.In the drop material land accuracy testing substrate 1004 that the illuminating substrate is used, be marked with identical symbol for having in fact, and omit its detailed explanation with the part of illuminating substrate 1003 identical functions of embodiment 5.
The drop material land accuracy testing substrate 1004 that the illuminating substrate is used is included in on-off element 202, electrode 227, storage insulation course 222 and the land accuracy testing layer 226 that forms on the substrate 111.Electrode 227 is connected with on-off element 202, and the land accuracy testing forms on electrode 227 with layer 226.Storage insulation course 226 has the figure of appointment, and has the function that adjacent electrode 227 is separated.
This drop material land accuracy testing substrate 1004 makes for the land accuracy testing of carrying out the drop material.That is, in the manufacturing process of illuminating substrate, before reality is made the illuminating substrate, the land accuracy testing of the drop material when using this drop material land accuracy testing substrate 1004 to carry out functional layer formation.
Drop material land accuracy testing substrate 1004 has and the actual identical structure of making of illuminating substrate except not forming the pixel region this point.That is, drop material land accuracy testing substrate 1004 uses the substrate identical with the actual illuminating substrate of making to make.Storage insulation course 226 and electrode 227 have the figure identical with the storage insulation course 226 of the illuminating substrate 1003 shown in Figure 15 that forms and electrode 227 on the illuminating substrate of actual manufacturing.In addition, on substrate 111, form the vernier layer 228 that constitutes by metal level.This vernier layer 228 is the same with illuminating substrate 1003 shown in Figure 15, can begin to form and the identical height of metallic wiring layer (not shown) that will constitute on-off element 202 from substrate 112.
(manufacture method of the drop material land accuracy testing substrate that the illuminating substrate is used)
The drop material land accuracy testing substrate 1004 that the illuminating substrate is used can be with making with the identical operation of operation in zone 210 with formation land accuracy testing in the illuminating substrate 1003 of embodiment 5.In addition, in the present embodiment, the land accuracy testing of drop material can be with carrying out with the identical operation of operation shown in Figure 18 (A) of embodiment 5.At this moment, as previously mentioned,, before the illuminating substrate manufacturing of actual manufacturing, carry out the land accuracy testing of the drop material of drop material land accuracy testing substrate 1004.
This drop material land accuracy testing substrate 1004 has and the actual identical structure of making of illuminating substrate, so, can with the illuminating substrate of actual manufacturing is tested the same land accuracy testing of carrying out.In addition, according to present embodiment, before making the illuminating substrate, the drop material land accuracy testing substrate 1004 as the test dedicated substrate is carried out the accuracy testing of drop material land.The result of test, the same with illuminating substrate shown in Figure 15, use on the layer 226 in the land accuracy testing, form convex layer (not shown in Figure 21).
This drop material land accuracy testing substrate 1004 forms figure and actual identical storage insulation course 222 and the electrode layer of making 227 of illuminating substrate, so, can test in advance this drop material land accuracy testing substrate 1004, fully confirm the land precision of drop material, after improving the land precision, can carry out the formation of functional layer of the illuminating substrate of actual manufacturing.Like this, just, can make does not have picture element flaw and tone to blur and the high illuminating substrate of contrast.

Claims (9)

1. the drop material land accuracy testing substrate that the illuminating substrate is used is characterized in that: the land accuracy testing layer that is included in on-off element, the electrode layer that is connected with above-mentioned on-off element that forms on the substrate, the storage insulation course that is connected with above-mentioned electrode layer with assignment graph and forms on above-mentioned electrode layer and storage insulation course.
2. the drop material land accuracy testing substrate of using by the described illuminating substrate of claim 1, it is characterized in that: be provided with vernier layer on aforesaid substrate, this vernier layer has identical height with the metallic wiring layer of above-mentioned on-off element.
3. the drop material land accuracy testing substrate of using by the described illuminating substrate of claim 2, it is characterized in that: above-mentioned vernier layer is made of metal level.
4. the drop material land accuracy testing substrate of using by the described illuminating substrate of arbitrary claim of claim 1～3 is characterized in that: use in above-mentioned land accuracy testing to form the convex layer on the layer.
5. the manufacture method of the drop material land accuracy testing substrate used of an illuminating substrate is characterized in that: comprise
The operation of electroplax layer that (a) on substrate, form on-off element, is connected with above-mentioned on-off element and the storage insulation course that is connected with above-mentioned electrode layer with assignment graph,
(b) on above-mentioned electrode layer, form the operation of land accuracy testing with layer.
6. the manufacture method of the drop material land accuracy testing substrate of using by the described illuminating substrate of claim 5, it is characterized in that: above-mentioned operation (b) is to form the operation of above-mentioned land accuracy testing with layer on above-mentioned electrode layer and above-mentioned storage insulation course.
7. the manufacture method of the drop material land accuracy testing substrate of using by claim 5 or 6 described illuminating substrates is characterized in that: and then comprise
(c) make drop material land go up the operation that forms the convex layer with layer to above-mentioned land accuracy testing.
8. the manufacture method of the drop material land accuracy testing substrate of using by claim 5 or 6 described illuminating substrates, it is characterized in that: above-mentioned operation (b) is after forming photo-sensitive resin, forms the operation of above-mentioned land accuracy testing with layer by utilizing photoetching process to be etched into figure.
9. the manufacture method of the drop material land accuracy testing substrate of using by claim 5 or 6 described illuminating substrates, it is characterized in that: above-mentioned operation (a) is included in and forms the operation that the vernier layer of equal height is arranged with the metallic wiring layer of above-mentioned on-off element on the aforesaid substrate.
CNB2007101270224A 2001-06-25 2002-06-24 Color filter, substrate, electro-optical device, electronic instrument, film forming method and device Expired - Fee Related CN100516943C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP191562/01 2001-06-25
JP2001191562 2001-06-25
JP159665/02 2002-05-31

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CN101078789A CN101078789A (en) 2007-11-28
CN100516943C true CN100516943C (en) 2009-07-22

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CNB2007101270101A Expired - Fee Related CN100541242C (en) 2001-06-25 2002-06-24 Color filter, substrate, electro-optical device, electronic device, film build method and device
CNB2007101270239A Expired - Fee Related CN100516944C (en) 2001-06-25 2002-06-24 Color filter, substrate, electro-optical device, electronic instrument, film forming method and device
CNB2007101270224A Expired - Fee Related CN100516943C (en) 2001-06-25 2002-06-24 Color filter, substrate, electro-optical device, electronic instrument, film forming method and device
CNB2005100874853A Expired - Fee Related CN100472246C (en) 2001-06-25 2002-06-24 Colour filter, substrate, electrooptical device, electronic apparatus, film forming method and apparatus

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Application Number Title Priority Date Filing Date
CNB2007101270101A Expired - Fee Related CN100541242C (en) 2001-06-25 2002-06-24 Color filter, substrate, electro-optical device, electronic device, film build method and device
CNB2007101270239A Expired - Fee Related CN100516944C (en) 2001-06-25 2002-06-24 Color filter, substrate, electro-optical device, electronic instrument, film forming method and device

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Application Number Title Priority Date Filing Date
CNB2005100874853A Expired - Fee Related CN100472246C (en) 2001-06-25 2002-06-24 Colour filter, substrate, electrooptical device, electronic apparatus, film forming method and apparatus

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Also Published As

Publication number Publication date
CN1715964A (en) 2006-01-04
CN101078789A (en) 2007-11-28
CN100541242C (en) 2009-09-16
CN100472246C (en) 2009-03-25
CN101078790A (en) 2007-11-28
CN100516944C (en) 2009-07-22
CN101078788A (en) 2007-11-28

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