CN100507082C - Method for plating diamond film on surface of stainless steel metal - Google Patents
Method for plating diamond film on surface of stainless steel metal Download PDFInfo
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- CN100507082C CN100507082C CNB2007100435094A CN200710043509A CN100507082C CN 100507082 C CN100507082 C CN 100507082C CN B2007100435094 A CNB2007100435094 A CN B2007100435094A CN 200710043509 A CN200710043509 A CN 200710043509A CN 100507082 C CN100507082 C CN 100507082C
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- stainless steel
- arc source
- diamond film
- discharge
- metal
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Abstract
The present invention discloses process of plating diamond-like coating onto the surface of stainless steel, and features the adoption of pulse arc ionic plating technology. The diamond-like film plating process includes the following steps: activating ion in the surface of the metal workpiece, plating one transition titanium layer, plating one transition titanium carbide layer, and plating diamond-like coating on the transition titanium carbide layer. The present invention has raised adhesion of diamond-like coating, increased thickness and service life of the diamond-like coating and simple technological process, and is especially suitable for surface antiwear treatment of precise metal parts of 1Cr18Ni9Ti, Cr12, 9Cr18, 40Cr and other stainless steel.
Description
Technical field
The present invention relates to the surface treatment of metallic substance, specifically a kind of method at plating diamond film on surface of stainless steel metal.
Background technology
Quasi-diamond (DLC) film is that raising contacts moving parts friction durability relatively and carries out one of surface-treated main raw owing to have performance characteristics such as high rigidity, low-friction coefficient and unreactiveness.But quasi-diamond (DLC) film itself has higher internal stress, and is poor with the matching of metallic substance, and therefore stainless steel especially is difficult in and is coated with the high and thick degree of sticking power on these metal base material and reaches above quasi-diamond (DLC) film of 1m.
Summary of the invention
A kind of method at plating diamond film on surface of stainless steel metal of providing at the deficiencies in the prior art is provided, it has improved quasi-diamond (DLC) film and stainless metallic substance matching, suitably reduce the internal stress of sedimentary quasi-diamond (DLC) film, thereby overcome quasi-diamond on the stainless metal base material (DLC) adhesive force difference and the little shortcoming of sedimentary DLC film thickness.
The technical scheme that realizes the object of the invention is: a kind of method of plating diamond film on surface of stainless steel metal, characteristics comprise the following steps:
1, metal works is fixed on the workpiece rotating disk in the arc ion plating film device vacuum chamber and vacuumizes;
2, argon gas is fed vacuum chamber, and keep the stable of vacuum tightness, open ion source then the metal works surface active;
3, close argon gas, will load negative bias between metal works and the vacuum chamber, and unlatching titanium arc source makes metal works surface deposition ti interlayer;
4, nitrogen is fed vacuum chamber, and keep the stable of vacuum tightness, make metal works surface deposition titanium nitride transition layer;
5, open the graphite arc source, set the initial discharge frequency in graphite arc source, and the certain umber of pulse of the control every discharge in graphite arc source suitably improves discharge frequency and makes metal works surface deposition titanium carbonitride transition layer;
6, close nitrogen, titanium arc source, the discharge pulse number in control graphite arc source makes metal works surface deposition diamond like carbon film.
The vacuum tightness of described a step vacuum chamber is better than 5 * 10
-3Pa.
When described vacuum chamber fed argon gas, vacuum tightness should be stabilized in 3.2 * 10
-2Pa～4.9 * 10
-2Pa, when feeding nitrogen, vacuum tightness should be stabilized in 1.0 * 10
-2Pa～1.3 * 10
-2Pa.
Load negative bias between described metal works and the vacuum chamber and be-800V～-1500V.
The initial discharge frequency setting in described graphite arc source is 16Hz.
The discharge pulse numerical control in described f step graphite arc source is made as 250000～300000.
Described ionogenic operating voltage is 2.0kV～3.0kV, and the working hour is 10min～30min
The working current of described titanium arc source is 55A～90A, and the working hour is 2min～5min
It is 1000～3000 pulses of every discharge that the certain umber of pulse of the every discharge in described graphite arc source suitably improves discharge frequency, and discharge frequency improves 8Hz, and discharge frequency is elevated to the deposition of finishing the titanium carbonitride transition layer behind the 32Hz.
The present invention has improved (DLC) adhesion of thin film of quasi-diamond on the stainless metal base and thickness, prolonged the wear-resistant life-span of stainless metal substrate surface quasi-diamond (DLC) film, technology is simple, be particularly useful for the accurate movable members surface abrasion resistance of stainless metal base such as 1Cr18Ni9Ti, Cr12,9Cr18,40Cr decreases the scale production of handling.
Embodiment
Embodiment 1
1, will process material is that the metal works of 1Cr18Ni9Ti is separately fixed on the workpiece rotating disk in the arc ion plating film device vacuum chamber and vacuumizes, and its vacuum tightness is better than 5 * 10
-3Pa;
2, feed argon gas, and keep vacustat 3.2 * 10
-3Pa opens ion source activated metal surface, and ionogenic operating voltage is 3.0kV, and the working hour is 30min;
3, close argon gas, with loading negative bias between metal works and the vacuum chamber be-800V, and open the titanium arc source and make metal works surface deposition ti interlayer, the working current of titanium arc source is 90A, and the working hour is 2min;
4, feed nitrogen, and keep vacustat 1.0 * 10
-2Pa, open the graphite arc source, the initial discharge frequency that makes the graphite arc source is 16Hz, and improve the discharge frequency that 8Hz regulates the graphite arc source by 1000 impulsive discharge frequencies of the every discharge in graphite arc source and make metal works surface deposition titanium carbide transition layer, discharge frequency is closed nitrogen, titanium arc source after being elevated to 32Hz, finishes the deposition of titanium carbonitride transition layer;
5, the discharge pulse number in control graphite arc source is 250000, makes metal works surface deposition quasi-diamond (DLC) film.
Embodiment 2
1, will process material is that the metal works of 9Cr18 and 40Cr is separately fixed on the workpiece rotating disk in the arc ion plating film device vacuum chamber and vacuumizes, and its vacuum tightness is better than 5 * 10
-3Pa;
2, feed argon gas, and keep vacustat 4.9 * 10
-3Pa opens ion source activated metal surface, and ionogenic operating voltage is 2.0kV, and the working hour is 30min;
3, close argon gas, with loading negative bias between metal works and the vacuum chamber be-1500V, and open the titanium arc source and make metal works surface deposition ti interlayer, the working current of titanium arc source is 55A, and the working hour is 10min;
4, feed nitrogen, and keep vacustat 1.1 * 10
-2Pa, open the graphite arc source, the initial discharge frequency that makes the graphite arc source is 16Hz, and by the every discharge 30 in graphite arc source (00 impulsive discharge frequency improves the discharge frequency that 8Hz regulates the graphite arc source makes metal works surface deposition titanium carbide transition layer, discharge frequency is closed nitrogen, titanium arc source after being elevated to 32Hz, finishes the deposition of titanium carbonitride transition layer;
5, the discharge pulse number in control graphite arc source is 280000, makes metal works surface deposition quasi-diamond (DLC) film.
Embodiment 3
1, will process material is that the metal works of Cr12 is fixed on the workpiece rotating disk in the arc ion plating film device vacuum chamber and vacuumizes, and its vacuum tightness is better than 5 * 10
-3Pa;
2, feed argon gas, and keep vacustat 3.7 * 10
-3Pa opens ion source activated metal surface, and ionogenic operating voltage is 2.50kV, and the working hour is 20min;
3, close argon gas, with loading negative bias between metal works and the vacuum chamber be-1000V, and open the titanium arc source and make metal works surface deposition ti interlayer, the working current of titanium arc source is 75A, and the working hour is 5min;
4, feed nitrogen, and keep vacustat 1.3 * 10
-2Pa, open the graphite arc source, the initial discharge frequency that makes the graphite arc source is 16Hz, and improve the discharge frequency that 8Hz regulates the graphite arc source by 2000 impulsive discharge frequencies of the every discharge in graphite arc source and make metal works surface deposition titanium carbide transition layer, discharge frequency is closed nitrogen, titanium arc source after being elevated to 32Hz, finishes the deposition of titanium carbonitride transition layer;
5, the discharge pulse number in control graphite arc source is 300000, makes metal works surface deposition quasi-diamond (DLC) film.
The present invention adopt the pulsed arc ion-plating technique in the metallic surface titanium deposition, titanium carbide and titanium carbonitride transition layer successively, plating diamond on the titanium carbonitride transition layer (DLC) film, its film is not hydrogeneous, there is not sharp interface between each layer in whole film is, make quasi-diamond (DLC) film thickness can reach more than the 1 μ m, improve quasi-diamond (DLC) adhesion of thin film greatly, improved the wear-resistant life-span of stainless metal base material surface quasi-diamond (DLC) film.
Claims (9)
1, a kind of method of plating diamond film on surface of stainless steel metal is characterized in that comprising the following steps:
A. metal works is fixed on the workpiece rotating disk in the arc ion plating film device vacuum chamber and vacuumizes;
B. argon gas is fed vacuum chamber, and keep the stable of vacuum tightness, open ion source then the metal works surface active;
C. close argon gas, will load negative bias between metal works and the vacuum chamber, open the titanium arc source and make metal works surface deposition ti interlayer;
D. nitrogen is fed vacuum chamber, and keep the stable of vacuum tightness, make metal works surface deposition titanium nitride transition layer;
E. open the graphite arc source, set the initial discharge frequency in graphite arc source, and the certain umber of pulse of the control every discharge in graphite arc source suitably improves discharge frequency and makes metal works surface deposition titanium carbonitride transition layer;
F. close nitrogen, titanium arc source, the discharge pulse number in control graphite arc source makes metal works surface deposition diamond like carbon film.
2,, it is characterized in that the vacuum tightness of described a step vacuum chamber is better than 5 * 10 according to the method for the described plating diamond film on surface of stainless steel metal of claim 1
-3Pa.
3, according to the method for the described plating diamond film on surface of stainless steel metal of claim 1, when it is characterized in that described vacuum chamber feeds argon gas, vacuum tightness should be stabilized in 3.2 * 10
-2Pa～4.9 * 10
-2Pa, when feeding nitrogen, vacuum tightness should be stabilized in 1.0 * 10
-2Pa～1.3 * 10
-2Pa.
4, according to the method for the described plating diamond film on surface of stainless steel metal of claim 1, it is characterized in that between described metal works and the vacuum chamber loading negative bias for-800V～-1500V.
5, according to the method for the described plating diamond film on surface of stainless steel metal of claim 1, the initial discharge frequency setting that it is characterized in that described graphite arc source is 16Hz.
6, according to the method for the described plating diamond film on surface of stainless steel metal of claim 1, the discharge pulse numerical control that it is characterized in that described f step graphite arc source is built in 250000～300000.
7, according to the method for the described plating diamond film on surface of stainless steel metal of claim 1, it is characterized in that described ionogenic operating voltage is 2.0kV～3.0kV, the working hour is 10min～30min.
8, according to the method for the described plating diamond film on surface of stainless steel metal of claim 1, the working current that it is characterized in that described titanium arc source is 55A～90A, and the working hour is 2min～5min.
9, according to the method for the described plating diamond film on surface of stainless steel metal of claim 1, it is characterized in that it is 1000～3000 pulses of every discharge that the certain umber of pulse of the every discharge in described graphite arc source suitably improves discharge frequency, discharge frequency improves 8Hz, and discharge frequency is elevated to the deposition of finishing the titanium carbonitride transition layer behind the 32Hz.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2007100435094A CN100507082C (en) | 2007-07-05 | 2007-07-05 | Method for plating diamond film on surface of stainless steel metal |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2007100435094A CN100507082C (en) | 2007-07-05 | 2007-07-05 | Method for plating diamond film on surface of stainless steel metal |
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|---|---|
| CN101082131A CN101082131A (en) | 2007-12-05 |
| CN100507082C true CN100507082C (en) | 2009-07-01 |
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| CNB2007100435094A Expired - Fee Related CN100507082C (en) | 2007-07-05 | 2007-07-05 | Method for plating diamond film on surface of stainless steel metal |
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| CN101209606B (en) * | 2007-12-25 | 2011-05-04 | 浙江大学 | Self-lubricating abrasion-proof graphite//TiC gradient composite thin film |
| CN101748370B (en) * | 2008-12-19 | 2011-11-30 | 中国科学院兰州化学物理研究所 | Preparation method of textured diamond-like carbon composite film for water lubrication |
| JP5016016B2 (en) * | 2009-11-27 | 2012-09-05 | トヨタ自動車株式会社 | Surface-treated mold and manufacturing method thereof |
| AT510421B1 (en) * | 2011-02-23 | 2012-04-15 | Boehlerit Gmbh & Co Kg | DIAMOND-COATED HARD-METAL BODY AND METHOD FOR THE PRODUCTION THEREOF |
| CN102534614A (en) * | 2011-12-30 | 2012-07-04 | 星弧涂层科技(苏州工业园区)有限公司 | Coating method for DLC (diamond-like carbon) coating on spinning reed and equipment |
| CN104073762B (en) * | 2014-06-23 | 2016-09-14 | 中国科学院宁波材料技术与工程研究所 | A kind of method improving radiofrequency ablation therapy wire surface smoothness |
| CN105755465B (en) * | 2016-02-26 | 2019-04-23 | 北京师范大学 | A kind of manufacturing method and equipment of the novel smokeless pot based on ion beam technology |
| CN106191794A (en) * | 2016-06-30 | 2016-12-07 | 上海材料研究所 | The coating method of titanium alloy surface superhard anti-friction wear-resistant composite film and titanium alloy material |
| CN106119783B (en) * | 2016-08-08 | 2018-12-11 | 珠海罗西尼表业有限公司 | Diamond-like carbon film of functionally gradient and preparation method thereof and product |
| CN107937914B (en) * | 2017-11-27 | 2019-12-24 | 浙江工业大学 | Method for preparing diamond film on transition layer on surface of stainless steel |
| CN108396306A (en) * | 2018-01-12 | 2018-08-14 | 华南理工大学 | A kind of method for the diamond-like carbon composite film that low temperature depositing hardness is controllable |
| CN112111737B (en) * | 2020-08-19 | 2023-03-07 | 中国船舶重工集团公司第七二五研究所 | Thread seizure prevention coating for stainless steel pipeline on ship and preparation method thereof |
| CN113265597B (en) * | 2021-05-17 | 2022-01-14 | 无锡市源通传动科技有限公司 | Wear-resistant and corrosion-resistant material, preparation method thereof and gear |
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