CN105755465B - A kind of manufacturing method and equipment of the novel smokeless pot based on ion beam technology - Google Patents
A kind of manufacturing method and equipment of the novel smokeless pot based on ion beam technology Download PDFInfo
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- CN105755465B CN105755465B CN201610105817.4A CN201610105817A CN105755465B CN 105755465 B CN105755465 B CN 105755465B CN 201610105817 A CN201610105817 A CN 201610105817A CN 105755465 B CN105755465 B CN 105755465B
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- A—HUMAN NECESSITIES
- A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
- A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
- A47J36/00—Parts, details or accessories of cooking-vessels
- A47J36/02—Selection of specific materials, e.g. heavy bottoms with copper inlay or with insulating inlay
- A47J36/025—Vessels with non-stick features, e.g. coatings
Abstract
The manufacturing method and equipment of the invention discloses a kind of novel smokeless pot based on ion beam technology.The preparation method of the Cooking pan with no smoke no fume includes: to deposit good, nontoxic, the environmentally friendly superhard diamond-like carbon film layer of one layer of thermal conductivity in the bottom of a pan using ion beam technology using aluminium alloy, stainless steel or iron pan as matrix.Specific deposition method includes: to form metal " pinning layer " in pot substrate surface injection metal Ti ion using metal vacuum steam plasma source (MEVVA), then 90 degree of Magnetic filter metallic cathode Vacuum Arc (FCVA) technologies are used, deposit first layer metal Ti stress release layer in matrix surface；On the first layer stress release layer, it deposits to obtain the superhard diamond-like carbon film layer of the second layer using 180 degree Magnetic filter FCVA method, two layers of composite membrane overall thickness are 0.1-10 microns, the thermal conductivity of film layer is that 500-1000W/mK is 20 times of iron pan thermal conductivity or more, film hardness is 60Gpa simultaneously, is iron, stainless steel or 15 times of aluminum alloy hardness or more.By applying the present invention, New Energy can be produced suitable for various types of slices and the Cooking pan with no smoke no fume of service life length.
Description
Technical field
The present invention relates to beam material surface modifying technology fields, in particular to a kind of to deposit thermal conductivity on ordinary pan bottom
The method and apparatus of rate superelevation, superhard diamond-film-like manufacture Cooking pan with no smoke no fume.
Background technique
As the improvement of people's living standards, the requirement to pot is also higher and higher, reduce or avoid to generate oil when cooking
Cigarette is basic demand of the people to pot, and Cooking pan with no smoke no fume product is used and given birth under this environmental demand.The principle of existing Cooking pan with no smoke no fume is
Using specially-shaped technology, conduction, convection current, radiation theory are integrated, the thermal coefficient of pot is improved, so that the heat transfer of pot is fast, is heated
Uniformly, no localized hyperthermia, when cooking heating, the temperature difference is not above 50 DEG C in pot, and kettle temperature is made to be maintained at edible oil
Within 240 DEG C of critical-temperature of cracking and volatilization, thus will not generate make us the oil smoke worried, fundamentally prevented oil
The generation of cigarette, while also avoiding the radiation excessive problem generated in smoke exhaust ventilator operation.The side of existing manufacture Cooking pan with no smoke no fume
Method has following several: a) in the Teflon figure layer of the bottom of a pan surface spraying E.I.Du Pont Company, base material is the aluminium by hardening oxidation
Alloy, its advantage is that thermally conductive uniform, non-stick pan；The disadvantage is that spades and steel wire lump cannot be used, it cannot the direct cold water punching after cooking
It washes, cannot use vigorous fire, it is fatal there are also one the disadvantage is that Teflon is polytetrafluoroethylene (PTFE) or perfluoroethylene-propylene as main material,
Polytetrafluoroethylene (PTFE) is a kind of carcinogen.B) be made into the jacketed pan of central hollow using two layers pot, it is intermediate usually pour water or
Other liquid, so as to reaching thermally conductive uniform effect, advantage can be tried out in any scoop, does not need any maintenance, disadvantage
It is substrate is aluminium alloy, time length can form pellumina on surface, and more salty dish or the storage of soup class wherein, can generations
Variation is learned, adverse effect is caused to body.
Summary of the invention
In view of this, the first purpose of the embodiment of the present invention is to utilize diamond-like carbon film layer high rigidity performance, excellent heat
The characteristic for learning performance and asepsis environment-protecting, it is heavy in combination with metal vacuum steam plasma source (MEVVA) and magnetic filtered vacuum arc
Product system (FCVA) proposes the manufacturing method and equipment of a kind of completely new Cooking pan with no smoke no fume, can be prepared and have in the actual environment
There are very high life, and the excellent Cooking pan with no smoke no fume suitable for any slice of film-substrate cohesion.
For further, which includes: to carry out metal ion implantation in the substrate surface to form gold
Belong to " pinning layer ", deposited in pinning layer surface and obtain first layer metal stress release layer, then deposits second in the first layer surface
The superhard diamond-like rock layers of layer.
In some embodiments, it includes: to utilize metal vacuum steam that diamond-film-like deposition is carried out on the pot matrix
Basad injection metal Ti forms metal " pinning layer ", (FCVA) system is deposited using 90 degree of magnetic filtered vacuum arcs, in institute
It states on " pinning layer ", Magnetic filter deposits first layer metal stress release layer, finally utilizes the 180 degree magnetic filtered vacuum arc
(FCVA) system of deposition, deposition obtains the superhard diamond-film-like of the second layer in first layer film layer.
In some embodiments, the substrate injects that form " pinning layer " include: to utilize metal vacuum steam plasma source
(MEVVA), Xiang Suoshu substrate layer injects Ti；Wherein, the injecting voltage of Ti is 4~15kV, and beam intensity is 1~10mA, injection
Dosage is 1 × 1015~1 × 1017/cm2, injection depth is 70~120nm.
It in some embodiments, include: to utilize 90 Magnetic filter in the enterprising row metal deposition of the metal " pinning layer "
Vacuum Arc deposits (FCVA) system, and on the metal " pinning layer ", Magnetic filter deposits metal stresses releasing layer；Wherein,
The metallic element of the metal stresses releasing layer is Ti, with a thickness of 10~500nm.
In some embodiments, the superhard DLC film layer of the second layer is deposited in the first layer metal stress release layer surface, it should
Method includes: to obtain DLC film layer in the-layer metal surface using 180 degree filtered cathodic vacuum arc (FCVA) system；Its
In, the DLC film layer is with a thickness of 5~10 μm, and negative pressure uses -300V, duty ratio to be deposited for 20--50% when deposition.
In some embodiments, the precipitation equipment includes:
First precipitation equipment, for utilizing 90 degree of filtered cathodic vacuum arcs FCVA system, in the metal " pinning
" upper Magnetic filter deposits metallic diaphragm to layer；Wherein, the metallic diaphragm film layer, metallic element Ti, with a thickness of 10~500
nm；
Second precipitation equipment is discharged for utilizing 180 degree filtered cathodic vacuum arc FCVA system in the metal stresses
On layer, Magnetic filter deposits superhard diamond-like carbon film layer, with a thickness of 0.1~10um；
In some embodiments, the injection device includes: injection device, for utilizing metallic vapour ion source
(MEVVA), metal ion implantation is carried out to the basal layer and forms " pinning layer "；Wherein, the injecting voltage of Ti be 4~
15kV, beam intensity are 1~10mA, and implantation dosage is 1 × 1015~1 × 1017/cm2, injection depth is 70~120nm；
Compared with the existing technology, various embodiments of the present invention have the advantage that
1, the embodiment of the present invention proposes to deposit superhard DLC film method and apparatus in pot substrate based on ion beam technology, leads to
The metallic element injection for carrying out high-energy to substrate is crossed, substrate sub-surface atom and injection metal is made to form metal-substrate atom
The structure that " pinning layer " structure of mixing, " pinning layer " structure formed in this way and basal layer or even subsequent Magnetic filter deposit
The binding force of property film layer is all very good, so that its peel strength be made to be enhanced；
2, compared to the methods of magnetron sputtering, coating, magnetically filter arc deposition equipment atom ionization level is very high, about exists
90% or more.In this way, plasma density can be made to increase since atom ionization level is high, bulky grain is reduced when film forming, is conducive to mention
High film hardness, wearability, compactness, film-substrate cohesion etc. enable Cooking pan with no smoke no fume of the invention to use any slice；
3, the coating that the method for the present invention utilizes is diamond-like carbon film layer, since its main component is carbon, is not appointed to human body
What side effect, is to belong to nontoxic, environmentally friendly film material.
4, in addition, the embodiment of the present invention also proposes a kind of depositing device, which is provided with any of the above-described technical side
Described in case.
It should be noted that for the aforementioned method embodiment, for simple description, therefore, it is stated as a series of
Combination of actions, but those skilled in the art should understand that, the present invention is not limited by the sequence of acts described, because
According to the present invention, some steps may be performed in other sequences or simultaneously.Secondly, those skilled in the art should also know
It knows, the embodiments described in the specification are all preferred embodiments, and related movement not necessarily present invention institute is required
's.
The above description is only an embodiment of the present invention, is not intended to limit the invention, it is all in spirit of the invention and
Within principle, any modification, equivalent replacement, improvement and so on be should all be included in the protection scope of the present invention.
More features and advantages of the embodiment of the present invention will be explained in specific embodiment later.
Detailed description of the invention
The attached drawing for constituting a part of the embodiment of the present invention is used to provide to further understand the embodiment of the present invention, the present invention
Illustrative embodiments and their description be used to explain the present invention, do not constitute improper limitations of the present invention.In the accompanying drawings:
Fig. 1 is the preparation method flow diagram provided in an embodiment of the present invention based on ion beam Cooking pan with no smoke no fume；
Fig. 2 is the structural schematic diagram provided in an embodiment of the present invention that film layer is prepared based on ion beam Cooking pan with no smoke no fume；
Fig. 3 is provided in an embodiment of the present invention 90,180 degree Magnetic filter FCVA and MEVVA injected system structural representation
Figure；
Fig. 4 is Ti/DLC composite film surface optical microscopy map (400 ×) provided in an embodiment of the present invention；
Fig. 5 Ti/DLC Composite Films Composite films provided in an embodiment of the present invention impregnate 50 in room temperature and 250 degrees Celsius of oil temperatures
Small middle hardness test result；
The coefficient of friction of Fig. 6 Ti/DLC composite membrane provided in an embodiment of the present invention；
Description of symbols
200 pots of substrates
210 metals " pinning layer "
220 metal Ti stress release layers
230 superhard DLC layers
300 180 degree FCVA cathodes
310 conduits
320 magnetic field line packets
330 work stages
340 high pressure extraction electrodes
350 MEVVA cathodes
360 negative ports
370 90 degree of FCVA cathodes
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts it is all its
His embodiment, shall fall within the protection scope of the present invention.
It should be noted that in the absence of conflict, the feature in the embodiment of the present invention and embodiment can be mutual group
It closes.
With reference to the accompanying drawing, each preferred embodiment of the invention is described further:
Embodiment of the method
With the development of science and technology and people are higher and higher to the attention degree of health, the use to kitchen tools
More focus on environment protection health.Cooking pan with no smoke no fume is a kind of efficient, energy-saving and environment-friendly kitchen tools, and the Cooking pan with no smoke no fume haveing excellent performance is to kinsfolk
Health have very important meaning.Here, a kind of manufacturing method of Cooking pan with no smoke no fume product is provided.
It should be noted that being transformed in ordinary pan substrate in the present embodiment, gold is prepared by ion beam technology
Category/diamond-like composite membrane, the basal layer of selection are iron, aluminium alloy and stainless-steel pan substrate.Referring to Fig.1, it illustrates this realities
Apply the compound membrane preparation method of metal/diamond-like, the preparation method the following steps are included:
S100: utilizing metal vapor vacuum arc (MEVVA) ion source, and basad layer injects the first metallic element, forms gold
Belong to " pinning layer ".
Wherein, this step is that metal ion implantation formation " pinning layer " being capable of shape using high-energy metals ion implanting substrate
At the mixed layer of metal and base material, the binding force of its surface subsequent film and substrate is improved.
It should be pointed out that Ti can be used in the first metallic element in S100.As a kind of optional embodiment, the first gold medal
The injecting voltage for belonging to element is 4~15kV, and beam intensity is 1~15mA (closing end value), and implantation dosage is 1 × 1015~1 ×
1017/cm2(closing end value), injection depth are 70~120nm (closing end value).
S200: utilizing filtered cathodic vacuum arc (FCVA) system, and on substrate " pinning layer " surface, 90 degree of Magnetic filters are heavy
Product obtains first layer metal Ti internal stresses release layer.
In this step, metal Ti is with a thickness of 10~500nm.
S300: filtered cathodic vacuum arc (FCVA) system is used, in first layer metal internal stresses release layer surface, 180 degree
Magnetic filter deposits to obtain the superhard diamond-like carbon film layer of the second layer.
In this step, optionally, the cathode that the starting the arc forms plasma is carbon, and back bias voltage is -300V, and duty ratio is
20-50%, the overall thickness of deposition are 0.1-10 μm.
In this way, preparing gold in substrate above by the Ti element that metal vacuum steam plasma source (MEVVA) system is injected
Belong to " pinning layer ", the stress release layer that the metal Ti element of 90 degree of magnetic filtered vacuum arc depositing system (FCVA) depositions is constituted,
The DLC superabrasive layer of 180 degree magnetic filtered vacuum arc depositing system (FCVA) deposition.The layer utilizes metal ion implantation system
System forms metal mixed " pinning layer ", and subsequent deposition film layer and base material is made to have extraordinary bond strength；It ties simultaneously
The characteristics such as the ultralow friction coefficient, ultrahigh hardness and excellent heat transfer of DLC film layer have been closed, its Cooking pan with no smoke no fume bottom surface is applied
Layer has apparent advantage in terms of temperature uniformity, binding force and environmental protection characteristic.
Apparatus embodiments
For the preparation method for realizing above-mentioned metallic diaphragm, the various embodiments described above are based on, the present embodiment proposes a kind of Cooking pan with no smoke no fume
Manufacturing equipment, which is mainly based upon the modified device at ordinary pan bottom, including following device:
A) injection device
Wherein, injection device is used to utilize MEVVA ion source, and Xiang Suoshu basal layer injects the first metallic element, to described
Basal layer carries out metal-doped injection.
It should be noted that MEVVA ion source mainly generates area by plasma and ion beam draw-out area forms, plasma
Body generates area i.e. metal vapor vacuum arc region of discharge.MEVVA ion implanting is exactly the load generated using MEVVA ion source
Can ion beam bombardment material surface, ion implanting is carried out to workpiece surface, to change the physics of material surface, chemical property
Process enables film to be securely joined with workpiece substrate.
B) precipitation equipment
Precipitation equipment (FCVA) is mainly used for substrate deposition metal Ti stress release layer and diamond-like carbon film layer；
It should be noted that FCVA mainly utilizes DC low-voltage arc discharge to generate metal or carbon plasma, lead to
It crosses magnetic filter and is drawn out to matrix surface plated film, by adding cation to matrix surface plus negative pressure in substrate surface
Speed enables coating to be further firmly combined with workpiece substrate.
It should be pointed out that precipitation equipment can be used such as Fig. 3 left (180 degree Magnetic filter), right half in the various embodiments described above
FCVA depositing system shown in (90 degree), the FCVA ion source deposit system include: left 180 degree FCVA cathode 300, plasma
Body canal 310, magnetic field 320, sample workpiece platform 330, negative pressure terminal 360, and right 90 degree of FCVA cathodes 370.
In addition, the injection of the MEVVA ion source as shown in part under Fig. 3 system can be used in injection device in the various embodiments described above
System, which includes: MEVVA cathode 340 and extraction electrode 350.In the following, combining an example,
In the specific implementation process, the Cooking pan with no smoke no fume manufacturing method to above-mentioned based on ordinary pan is described further:
It is described with reference to the drawings, using 90 degree of Magnetic filter FCVA cathodes be Ti and 180 degree Magnetic filter FCVA cathode is carbon, MEVVA
For cathode is Ti, the detailed manufacturing method for introducing a kind of Cooking pan with no smoke no fume based on ion beam technology of the invention, implementation steps
It is as follows:
1. prepared by metal " pinning layer " 210:
Injection: being fixed on sample stage 330 for substrate 200, and turns to injection target position and start to inject.It is pure for injecting ion source
The pure Ti of degree 99.9%, injection condition are as follows: vacuum degree 1 × 10-3~6 × 10-3Pa injects arc voltage: 50~70V, high pressure: 6~
10kV, arc stream: 3~6mA, implantation dosage 1 × 1014~1 × 1015Ti/cm2。
2.Ti film discharges stressor layers 220 and prepares:
Ti deposition: rotation sample to 90 degree of Magnetic filter deposition target position starts to deposit.Deposit the Ti arc that arc source is purity 99%
Source, sedimentary condition are as follows: vacuum degree 1 × 10-3~6 × 10-3Pa deposits arc stream: 100~120A, field supply: 1.4~2.4A,
Arc stream: 80~140mA, back bias voltage: -100V~-300V, duty ratio 50%~100%, sedimentation time 3~120 seconds.
It is prepared by 4.DLC superabrasive layer 230:
DLC film deposition: DLC films deposited 230 on 220, sedimentary condition are as follows: deposition arc source is the carbon arc of purity 99%
Source, vacuum degree: 1 × 10-3~6 × 10-3Pa deposits arc stream: 100~120A, field supply: 1.4~2.4A, arc stream: 80~
140mA, back bias voltage: -300V, duty ratio 20%~30%, sedimentation time 4h.
To be illustrated to the compound film properties of Ti/DLC, it can refer to Fig. 4,5 and 6 here, be respectively the present invention in base
Depositing Ti/DLC composite membrane 150Kg Rockwell load mould surface optical shape appearance figure on bottom；Ti/DLC composite membrane is taken the photograph in room temperature and 250
Microhardness value and the friction and wear test result schematic diagram of Ti/DLC nano composite membrane after family name's degree oil temperature is impregnated 50 hours.
In conjunction with Fig. 4 it is found that illustrating the knot of Ti/DLC film layer Yu stainless steel base without apparent crackle and peeling around 150Kg load mould
Resultant force is pretty good.As seen from Figure 5, film layer microhardness reaches as high as 6788HV, compared to stainless steel base 300HV or so
Hardness improve nearly 20 times, close to hardness with diamond, so existing any pot can be suitable in practical application
Shovel；After being impregnated 50 hours in 250 degrees Celsius of oil temperatures test hardness when find, lowered hardness it is very small, fall exists
Within 5%；In conjunction with Fig. 6's it is found that DLC coefficient of friction (ball milling, object ZrN) is 0.085.In short, the Cooking pan with no smoke no fume is in cooking
When, since firmness change is small in 250 degree of oil temperatures, coefficient of friction is low for itself, so that the application life of this Cooking pan with no smoke no fume is very
It is long.
Claims (5)
1. a kind of method of the Cooking pan with no smoke no fume manufacture based on ion beam technology characterized by comprising
A) aluminium alloy, iron or stainless steel ordinary pan substrate are injected using metal vacuum steam plasma source (MEVVA) to it
Metal Ti ion forms metal " pinning layer "；Wherein injection parameter are as follows: injecting voltage be 4~15kV, beam intensity be 1~
10mA, implantation dosage are 1 × 1015~1 × 1017/cm2, injection depth is 70~120nm；
B) 90 degree of filtered cathodic vacuum arc (FCVA) methods are used, deposit to obtain first layer for discharging stress in substrate surface
Metal Ti transition zone；Sedimentary condition are as follows: vacuum degree 1 × 10-3~6 × 10-3Pa, striking current 90-120A, bend pipe magnetic field 2.0
~4.0A；
C) on the intermediate metal of release stress, using 180 degree filtered cathodic vacuum arc (FCVA) method, deposition is obtained
Superhard diamond-like carbon film layer (DLC)；Sedimentary condition are as follows: deposition arc source is the carbon target material of purity 99%, vacuum degree: 1 × 10-3~6
×10-3Pa deposits arc stream: 100~120A, field supply: 1.4~2.4A, line: 80~140mA；
D) deposition obtains metal/diamond-like composite membrane of the thickness range at 0.1-10 μm.
2. a kind of method of the Cooking pan with no smoke no fume manufacture based on ion beam technology according to claim 1, it is characterised in that:
(a) in the intermediate metal of deposition release stress, the target used is metal Ti cathode, 90~120A of striking current,
2.0~4.0A of field supply, 50~200mA of line, back bias voltage -300V~-600V, duty ratio 20%~100%；
(b) when depositing the superhard DLC film, the target used is carbon cathode, 90~120A of striking current, bend pipe magnetic field 2.0-
4.0A, negative pressure -200~-600V, duty ratio are 20~100%, 1~5h of sedimentation time.
3. a kind of method of the Cooking pan with no smoke no fume manufacture based on ion beam technology according to claim 1, which is characterized in that discharge stress
Intermediate metal with a thickness of 10-500nm.
4. a kind of method of the Cooking pan with no smoke no fume manufacture based on ion beam technology, equipment are characterized in that according to claim 1, comprising:
(a) injection device, is configured to using metal vapor vacuum arc (MEVVA) system, using the MEVVA ion source to described
Substrate surface injects metal Ti element, is formed metal " pinning layer "；
(b) precipitation equipment is configured to filtered cathodic vacuum arc (FCVA) system, heavy using 90 degree of Magnetic filter depositional modes of single tube
Product intermediate metal, deposits DLC layer, the precipitation equipment includes: in the way of two-tube 180 degree Magnetic filter
First precipitation equipment, for utilizing the FCVA system, on the metal " pinning layer ", Magnetic filter deposits first layer
Metal；Wherein, the metallic element of the metal cladding is Ti, with a thickness of 10~500nm；
Second precipitation equipment, for utilizing the FCVA system, in first layer internal stresses release layer surface, Magnetic filter deposits to obtain
The second layer obtains superhard DLC film layer, wherein the superhard DLC film layer with a thickness of 0.1~10 μm.
5. a kind of using such as a kind of described in any item methods of the Cooking pan with no smoke no fume manufacture based on ion beam technology of Claims 1 to 4
In the diamond-like coating of pot matrix deposition.
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| CN201610105817.4A CN105755465B (en) | 2016-02-26 | 2016-02-26 | A kind of manufacturing method and equipment of the novel smokeless pot based on ion beam technology |
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| CN201610105817.4A CN105755465B (en) | 2016-02-26 | 2016-02-26 | A kind of manufacturing method and equipment of the novel smokeless pot based on ion beam technology |
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Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108546920B (en) * | 2018-04-20 | 2019-09-27 | 北京师范大学 | A kind of cathode vacuum arc plasma magnetic filter and its application |
| CN108842133B (en) * | 2018-05-31 | 2020-07-10 | 北京师范大学 | Preparation method and equipment of graphical electrostatic chuck |
| EP3622864A1 (en) * | 2018-09-17 | 2020-03-18 | IHI Hauzer Techno Coating B.V. | Bakeware, cookware and/or grillware item, method of forming a bakeware, cookware and/or grillware item, and apparatus for coating a bakeware, cookware and / or grillware item |
| CN109136852B (en) * | 2018-10-10 | 2020-10-09 | 中国原子能科学研究院 | Method for plating tungsten film on metal-based lining |
| CN113564523A (en) * | 2021-07-13 | 2021-10-29 | 南京邮电大学 | Preparation device and preparation method of carbon-plated porous aluminum current collector |
| CN115137203B (en) * | 2021-09-08 | 2024-04-23 | 武汉苏泊尔炊具有限公司 | Magnetic conduction cooker and preparation method thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1858296A (en) * | 2006-06-08 | 2006-11-08 | 哈尔滨工业大学 | Composite reinforcing and treating method for alumium or alumium alloy substrate surface through ion implantation and deposition |
| CN101082131A (en) * | 2007-07-05 | 2007-12-05 | 中国航天科技集团公司第五研究院第五一○研究所 | Method for plating diamond film on surface of stainless steel metal |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009132950A (en) * | 2007-11-28 | 2009-06-18 | Shimadzu Corp | Film deposition apparatus, film deposition method, and film deposition program |
| US20150292080A1 (en) * | 2012-02-06 | 2015-10-15 | Nanyang Technological University | Apparatus for the generation of nanocluster films and methods for doing the same |
| MY183150A (en) * | 2014-03-25 | 2021-02-16 | Fuji Electric Malaysia Sdn Bhd | Protective layer for a magnetic recording medium, and a method of manufacturing the same |
-
2016
- 2016-02-26 CN CN201610105817.4A patent/CN105755465B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1858296A (en) * | 2006-06-08 | 2006-11-08 | 哈尔滨工业大学 | Composite reinforcing and treating method for alumium or alumium alloy substrate surface through ion implantation and deposition |
| CN101082131A (en) * | 2007-07-05 | 2007-12-05 | 中国航天科技集团公司第五研究院第五一○研究所 | Method for plating diamond film on surface of stainless steel metal |
Non-Patent Citations (2)
| Title |
|---|
| "磁过滤等离子体沉积和注入技术";张荟星 等;《核技术》;20020930;第25卷(第9期);第695-698页 |
| "采用磁过滤阴极弧沉积技术制备含Ti类金刚石薄膜的研究";张旭 等;《核技术》;20071231;第30卷(第12期);第971-974页 |
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