CN100466171C - High depth-width ratio deep sub-micrometer, nanometer metal structure making process based on self-supporting thin film - Google Patents
High depth-width ratio deep sub-micrometer, nanometer metal structure making process based on self-supporting thin film Download PDFInfo
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- CN100466171C CN100466171C CNB2004101018738A CN200410101873A CN100466171C CN 100466171 C CN100466171 C CN 100466171C CN B2004101018738 A CNB2004101018738 A CN B2004101018738A CN 200410101873 A CN200410101873 A CN 200410101873A CN 100466171 C CN100466171 C CN 100466171C
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- metal structure
- width ratio
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- micrometer
- high depth
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 87
- 239000002184 metal Substances 0.000 title claims abstract description 87
- 238000000034 method Methods 0.000 title claims description 36
- 239000010409 thin film Substances 0.000 title 1
- 229910052737 gold Inorganic materials 0.000 claims abstract description 27
- 238000010894 electron beam technology Methods 0.000 claims abstract description 21
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 17
- 239000007788 liquid Substances 0.000 claims abstract description 16
- 238000009713 electroplating Methods 0.000 claims abstract description 14
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 26
- 239000010931 gold Substances 0.000 claims description 26
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 24
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 18
- 239000011651 chromium Substances 0.000 claims description 16
- 239000000853 adhesive Substances 0.000 claims description 13
- 230000001070 adhesive effect Effects 0.000 claims description 13
- 239000008367 deionised water Substances 0.000 claims description 12
- 229910021641 deionized water Inorganic materials 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- 238000007747 plating Methods 0.000 claims description 8
- 238000000609 electron-beam lithography Methods 0.000 claims description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 6
- 229920002120 photoresistant polymer Polymers 0.000 claims description 5
- 238000013459 approach Methods 0.000 claims description 4
- 238000005566 electron beam evaporation Methods 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 3
- 238000010884 ion-beam technique Methods 0.000 claims description 3
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract 2
- 238000000151 deposition Methods 0.000 abstract 1
- 239000003292 glue Substances 0.000 abstract 1
- 238000011031 large-scale manufacturing process Methods 0.000 abstract 1
- 239000000693 micelle Substances 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 5
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Images
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- Electroplating Methods And Accessories (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Micromachines (AREA)
Abstract
Description
Claims (12)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2004101018738A CN100466171C (en) | 2004-12-30 | 2004-12-30 | High depth-width ratio deep sub-micrometer, nanometer metal structure making process based on self-supporting thin film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2004101018738A CN100466171C (en) | 2004-12-30 | 2004-12-30 | High depth-width ratio deep sub-micrometer, nanometer metal structure making process based on self-supporting thin film |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1801458A CN1801458A (en) | 2006-07-12 |
CN100466171C true CN100466171C (en) | 2009-03-04 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2004101018738A Active CN100466171C (en) | 2004-12-30 | 2004-12-30 | High depth-width ratio deep sub-micrometer, nanometer metal structure making process based on self-supporting thin film |
Country Status (1)
Country | Link |
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CN (1) | CN100466171C (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101520600B (en) * | 2008-02-27 | 2011-06-01 | 中国科学院微电子研究所 | Method for preparing transparent nano imprinting template based on X-ray exposure technology |
CN102466832B (en) * | 2010-11-12 | 2013-09-11 | 中国科学院微电子研究所 | Method for manufacturing photon sieve with high height-width ratio |
CN102608862A (en) * | 2011-01-19 | 2012-07-25 | 中国科学院微电子研究所 | Method for producing device in structure with large height-to-width ratio |
CN106933054B (en) * | 2015-12-31 | 2019-12-24 | 上海微电子装备(集团)股份有限公司 | Graphical process method |
CN106094445B (en) * | 2016-06-12 | 2018-11-20 | 中国科学院微电子研究所 | The production method of large ratio of height to width nano level metal structure |
CN108557754B (en) * | 2018-04-13 | 2020-11-10 | 杭州电子科技大学 | Preparation method of self-supporting metal nano-pore film |
CN110970147B (en) * | 2019-11-07 | 2022-11-18 | 复旦大学 | High-resolution hard X-ray tungsten/gold Fresnel zone plate and preparation method thereof |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4018938A (en) * | 1975-06-30 | 1977-04-19 | International Business Machines Corporation | Fabrication of high aspect ratio masks |
US5178975A (en) * | 1991-01-25 | 1993-01-12 | International Business Machines Corporation | High resolution X-ray mask having high aspect ratio absorber patterns |
-
2004
- 2004-12-30 CN CNB2004101018738A patent/CN100466171C/en active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4018938A (en) * | 1975-06-30 | 1977-04-19 | International Business Machines Corporation | Fabrication of high aspect ratio masks |
US5178975A (en) * | 1991-01-25 | 1993-01-12 | International Business Machines Corporation | High resolution X-ray mask having high aspect ratio absorber patterns |
Also Published As
Publication number | Publication date |
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CN1801458A (en) | 2006-07-12 |
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C06 | Publication | ||
PB01 | Publication | ||
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
EE01 | Entry into force of recordation of patent licensing contract |
Assignee: KUNSHAN MICROOPTIC ELECTRONIC CO.,LTD. Assignor: Institute of Microelectronics of the Chinese Academy of Sciences Contract record no.: 2011320010027 Denomination of invention: High depth-width ratio deep sub-micrometer, nanometer metal structure making process based on self-supporting thin film Granted publication date: 20090304 License type: Common License Open date: 20060712 Record date: 20110325 |
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ASS | Succession or assignment of patent right |
Owner name: INST OF MICROELECTRONICS, C. A. S Effective date: 20130419 Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHA Free format text: FORMER OWNER: INST OF MICROELECTRONICS, C. A. S Effective date: 20130419 |
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C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 100029 CHAOYANG, BEIJING TO: 201203 PUDONG NEW AREA, SHANGHAI |
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TR01 | Transfer of patent right |
Effective date of registration: 20130419 Address after: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee after: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) Corp. Patentee after: Institute of Microelectronics of the Chinese Academy of Sciences Address before: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee before: Institute of Microelectronics of the Chinese Academy of Sciences |