CN100456488C - Display faceplate of full color organic electroluminescence, and fabricating method - Google Patents

Display faceplate of full color organic electroluminescence, and fabricating method Download PDF

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CN100456488C
CN100456488C CN 200610090855 CN200610090855A CN100456488C CN 100456488 C CN100456488 C CN 100456488C CN 200610090855 CN200610090855 CN 200610090855 CN 200610090855 A CN200610090855 A CN 200610090855A CN 100456488 C CN100456488 C CN 100456488C
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electroluminescence
faceplate
method
full
color
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CN 200610090855
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CN1874000A (en )
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赵清烟
陈哲仁
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友达光电股份有限公司
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Abstract

一种全彩有机电致发光显示面板的像素结构,具有多个子像素,该多个子像素包含:至少一个第一电极,形成于基板上;至少一个第一共同层,形成于第一电极上;至少一个屏蔽墙,形成于第一电极的周围;多个发光层,分别形成于对应的各该子像素的第一共同层上;其中,各该发光层于各该第一电极之上不会互相覆盖;至少一个第二共同层,形成于该多个发光层上;以及至少一个第二电极,形成于第二共同层上。 An all-color organic electroluminescent display pixel structure, having a plurality of sub-pixels, the plurality of sub-pixels comprising: at least one first electrode formed on the substrate; at least a first common layer, formed on the first electrode; at least one shield wall, formed around the first electrode; a plurality of light emitting layers, are formed on each of the corresponding first sub-pixel of the common layer; wherein each of the light emitting layer on each of the first electrodes do not covering each other; at least a second common layer, formed on the plurality of light emitting layer; and at least one second electrode formed on the second common layer. 制作时,提供第一、二、三色彩蒸镀源,其独立的蒸镀倾斜方向和蒸镀角度与屏蔽墙的高度和位置相配合,以将第一、二、三色彩发光层个别地蒸镀于第一电极的上方。 Production, providing a first, second and third evaporation source color, height and position independent of the tilt direction and vapor deposition angle mate with the shield wall to the first, second and third color light emitting layer individually evaporated plating over the first electrode.

Description

全彩有机电致发光显示面板及其制造方法 There are full-color panel and manufacturing method of an organic electroluminescent display

技术领域 FIELD

本发明涉及一种全彩有机电致发光显示面板及其制造方法,且特别是涉及一种可降低制造成本、提高面板品质的全彩有机电致发光显示面板的像素结构及其制造方法。 The present invention relates to a full color organic electroluminescence display panel and a manufacturing method, and more particularly relates to a reduction in manufacturing costs and improve the quality of the panel, full-color organic electroluminescent display pixel structure and a manufacturing method.

背景技术 Background technique

有机电致发光显示面一反(organic electroluminescence panel), 相较于其它平面显示技术,拥有自发光、高亮度、广视角、高对比、低耗电、高速应答、 操作温度范围广、发光效率高、工艺简易等优异特性,使得其产品技术发展广受全世界注目。 The organic electroluminescent display surface a trans (organic electroluminescence panel), compared to other flat panel display technology, with a self-luminous, high luminance, wide viewing angle, high contrast, low power consumption, high-speed response, a wide operating temperature range, high emission efficiency , simple crafts and other outstanding features, making their products popular technology worldwide attention.

传统的有机电致发光元件具有多层结构,主要是在阳极层和阴极层之间置入有机发光层,以产生电激发光(elec加luminescence)。 Conventional organic electroluminescent device having a multilayer structure, the organic light emitting layer is placed mainly between the anode layer and the cathode layer to produce electroluminescent light (Elec added luminescence). 在有机发光层和阳极之间,形成空穴注入层和空穴传输层,在有机发光层和阴极之间则形成电子传输层。 Between the organic light emitting layer and an anode, a hole injection layer and a hole transport layer, the electron transport layer is formed between the organic light emitting layer and the cathode. 对于全彩有机电致发光显示面板而言, 一般是由红光、绿光和蓝光(RGB)等次像素元件所组成。 For full-color organic electroluminescent display panel concerned, typically by red, green and blue (RGB) sub-pixel elements and the like formed. 而一个像素至少包括各一个RGB次像素元件。 And each of the at least one pixel comprises a sub-pixel RGB element. 目前的全彩有机电致发光显示面板的RGB次像素排列沿用液晶显示面板的架构,常见的RGB次像素排列方式有条状(stripe)排列、马赛克(mosaic) 排列和三角形(delta)排列(或是称为triangle排列),其中又以条状排列最为常见。 The current RGB sub-pixel has a full-color organic electroluminescent display panel of liquid crystal display panel arranged in use architecture, a common arrangement with a sub-pixel RGB stripe (stripe) are arranged mosaic (Mosaic) and arranged in a triangle (delta) arrangement (or is called a triangle arrangement), among which the most common stripe arrangement. 而由于RGB次像素在制作上是采用屏蔽(shadow mask)蒸镀,导致在量产制作上会产生许多缺点,包括: And because in the production of RGB sub-pixels is shielded (shadow mask) deposition, resulting in the production in the production will have a number of disadvantages, including:

1. 制造成本较高:包括屏蔽制作、精密对位系统、屏蔽腔体、屏蔽清洗系统、屏蔽检测设备等等各种设备成本,使制造成本增加。 1. high manufacturing cost: includes a shield made, precise alignment system, the shield cavity, a shield washing system, various equipment cost shielding detection devices, etc., the manufacturing cost is increased.

2. 生产成品率较低:屏蔽对位时常常因为对位不够精准(misalignment)、 或是尘粒(particle)沾附以及压伤等原故而影响了面板的生产成品率。 2. The low production yield: para position often because mask alignment is not precise enough (misalignment), or dust (Particle) exigencies buildup and crushing, etc. affect the production yield of panels.

3. 面板分辨率较低:每个屏蔽的开口对应一个次像素的蒸镀面积,因此, 3. The lower panel resolution: each opening corresponding to a sub-pixel mask deposition area, therefore,

技术的全彩面板分辨率受限于屏蔽的工艺能力。 Technology, full-color panel resolution is limited by the ability to shield the process. 目前采用屏蔽工艺的面板分 Currently shielded faceplate process

辨率一般约在120到150 ppi (pixel per inch)之间,通常不超过180 ppi。 Resolution is generally between 120 and about 150 ppi (pixel per inch), usually does not exceed 180 ppi.

4.生产弹性较差:屏蔽制作时间一般需要6个星期,且通常一张屏蔽上 4. Production less flexible: the shield shall normally six weeks, and generally a shield

为了避免张力不平均,仅允许形成一种形式的图案,导致在制造生产上的弹性不高。 In order to avoid uneven tension, allows the formation of only one form of a pattern, resulting in flexibility in manufacturing not high.

目前已有许多制造厂商提出不需使用屏蔽,而制作出全彩有机电致发光显示面板(如美国专利案No. 5294869、 No. 6517996等)。 Currently there are many manufacturers made without the use of shielding to prepare a full-color organic electroluminescent display panel (e.g., US Patent No. 5294869, No. 6517996, etc.). 然而这些现有技术都至少具有一个共同的严重缺点:需要改变有机发光元件的RGB的原先元件结构(device structure)来配合,且所制成的元件结构会有不同色彩层相重叠(例如美国专利案No.5294869中,蓝色发光层叠在红色发光层的上方)、或是单一色彩层中混和了其它光色的材料(例如美国专利案No. 6517996中,红色发光层中混和了蓝色发光材料)的情形,而容易产生混光的现象。 However, these prior art all have at least one common serious disadvantages: the need to change the original RGB element structure of an organic light emitting device (device structure) to match, and the element structure will be made of layers of different colors overlap (e.g., U.S. Pat. No.5294869 case, the blue light-emitting layered over the red light emitting layer), or a single layer of mixed color other photochromic material (e.g. US Patent No. 6517996, the mixture of the red light emitting layer emitting blue case material), a phenomenon readily mixed light.

因此,如何在不需使用屏蔽(maskfree)与不改变RGB的原先形成方法, 在控制制造成本的情形下,制作出没有混光缺点、光色纯度高的全彩有机电致发光显示面板,实为研发者一个重要的课题。 Therefore, how to use without shielding (maskfree) and the method does not change the original form of the RGB, in case of manufacturing costs, to produce mixed light without drawbacks, high light color purity full color organic electroluminescent display panel, a solid as developers an important issue.

发明内容 SUMMARY

有鉴于此,本发明的目的就是在提供一种低制造成本、高品质成品的全彩有机电致发光显示面板的像素结构及其制造方法。 In view of this, the object of the present invention is to provide a low manufacturing cost, high-quality full-color organic electroluminescent finished pixel structure and a manufacturing method of a display panel.

根据本发明的目的,提出一种像素结构,适用于全彩有机电致发光显示面板,此像素结构具有多个子像素,该多个子像素包含: The object of the present invention, provides a pixel structure, for full-color organic electroluminescent display panel, pixel structure having a plurality of sub-pixels, the plurality of sub-pixels comprising:

至少一个第一电极,形成于基板上; At least one first electrode formed on the substrate;

至少一个第一共同层,形成于第一电极上; At least a first common layer, formed on the first electrode;

至少一个屏蔽墙,形成于第一电极的周围; At least one shield wall, formed around the first electrode;

多个发光层,分别形成于对应的各该子像素的第一共同层上;其中,各该发光层于各该第一电极之上不会互相覆盖; A plurality of light emitting layers, are formed on each of the corresponding first sub-pixel of the common layer; wherein each of the light emitting layer on each of the first electrodes do not cover each other;

至少一个第二共同层,形成于该多个发光层上;以及至少一个第二电极,形成于第二共同层上。 At least a second common layer, formed on the plurality of light emitting layer; and at least one second electrode formed on the second common layer.

根据本发明的目的,再提出一种全彩有机电致发光显示面板的制造方法,包括步骤如下: The object of the present invention further provides a method of manufacturing the full color organic electroluminescent display panel, comprising the steps of:

形成第一电极于基板上; 形成多个屏蔽墙于第一电极的周围; Forming a first electrode on a substrate; forming a plurality of peripheral shield walls of the first electrode;

形成至少一个第一共同层于第一电极上; Forming at least a first layer on the first common electrode;

形成多个第一色彩次像素、多个第二色彩次像素和多个第三色彩次像素,于第一共同层上,包括: Forming a plurality of first color sub-pixels, the plurality of second color sub-pixels and a plurality of third color sub-pixels, on the first common layer, comprising:

提供至少一个第一色彩蒸镀源、至少一个第二色彩蒸镀源和至少一个第三色彩蒸镀源,通过第一色彩蒸镀源、第二色彩蒸镀源和第三色彩蒸镀源独立的蒸镀倾斜方向和蒸镀角度与该多个屏蔽墙相配合,将至少一个第一色彩发光层、至少一个第二色彩发光层、至少一个第三色彩发光层个别地蒸镀于对应相同光色的第一电极的上方; Providing at least a first color vapor deposition source, at least a second color, and at least a third vapor deposition source color vapor deposition source, the deposition source by a first color, second color and third color vapor deposition source independent evaporation source vapor deposition tilt direction and angle of the plurality of mating shield wall, at least a first color light emitting layer, at least a second color light emitting layer, at least a third color light emitting layer is deposited to individually correspond to the same light of color over the first electrode;

形成至少一个第二共同层,覆盖该多个第一色彩次像素、该多个第二色彩次像素和该多个第三色彩次像素;以及 Forming at least one common second layer covering the first plurality of color sub-pixels, the plurality of second color sub-pixel and the plurality of third color sub-pixels; and

形成第二电极于第二共同层上。 Forming a second common electrode on the second layer.

为让本发明的上述目的、特征、和优点能更明显易懂,以下配合附图以及优选实施例,以更详细地说明本发明。 In order to make the above-described object of the present invention, features, and advantages can be more fully understood by reading the following preferred embodiments with the accompanying drawings and embodiments, the present invention is to be described in more detail.

附图说明 BRIEF DESCRIPTION

图1A~ 1C绘示依照本发明优选实施例的全彩有机电致发光显示面板的制造方法。 FIGS. 1A ~ 1C illustrates a full-color in accordance with a preferred embodiment of the present invention, a method of manufacturing an organic electroluminescent display panel.

图2为依照图1A〜1C所制作的单一像素结构的上视图。 FIG 2 is a top view of the structure of a single pixel in accordance with FIG 1A~1C produced. 图3为依照本发明优选实施例的全彩有机电致发光显示面板的单一像素的剖面示意图。 Figure 3 is a full-color in accordance with a preferred embodiment of the present invention is an organic electroluminescent schematic cross-sectional view of a single pixel of the display panel.

图4为本发明第一应用例的像素结构与屏蔽墙设计的示意图。 FIG 4 is a schematic view of a pixel structure of the shield wall of the first application example of the design of the present invention.

图5A〜5C分别为本发明第一应用例的第一、二、三种全彩面板像素排 FIG 5A~5C are respectively applied a first embodiment of the present invention, first, two, three, rows of pixels full-color panel

列与屏蔽墙设计的示意图。 Column schematic design of the shield wall.

图6为本发明的应用例二A的像素结构与屏蔽墙设计的示意图。 Application of pixel structure according to the second shielding wall A of FIG. 6 of the present invention is designed to FIG.

图7A、 7B分别为本发明的应用例二A的两种全彩面板像素排列与屏蔽 7A, the two applications A, 7B are two embodiments of the present invention, full-color pixel arrangement of the shield panel

墙设计的示意图。 Wall design schematic.

图8为本发明的应用例二B的像素结构与屏蔽墙设计的示意图。 Application of the pixel structure and the shield wall 8 II B of FIG schematic design of the present invention.

图9A、 9B分别为本发明的应用例二B的两种全彩面板像素排列与屏蔽 Figures 9A, B are two applications 9B are two embodiments of the present invention, full-color pixel arrangement of the shield panel

墙设计的示意图。 Wall design schematic.

图IO为本发明的应用例二C的像素结构与屏蔽墙设计的示意图。 FIG schematic IO Application Example C and the two pixel structure of the present invention, the shielding wall design.

图11为本发明的应用例二C的全彩面板像素排列与屏蔽墙设计的示意 Application Example 11 FIG di-C of the present invention and the full-color pixel arrangement of the panel of a schematic design of the shield wall

图。 Fig.

图12为本发明的应用例二D的像素结构与屏蔽墙设计的示意图。 Application of the shield wall structure of the pixel of FIG. 12 II D of the present invention is designed to FIG.

图13为本发明的应用例二D的全彩面板像素排列与屏蔽墙设计的示意图。 Application Example D, two full-color pixel arrangement of the shielding wall panel 13 of the present invention. FIG schematic design.

图14A、 14B为本发明第三应用例的两种像素结构与屏蔽墙设计的示意图。 14A, 14B, two types of pixels according to a third application example of a schematic structure of the shield wall design of the present invention.

图15A、 15B分别为依照本发明应用例三的图14A、 14B所完成的全彩面板像素排列与屏蔽墙设计的示意图。 15A, 15B, respectively, a schematic view of an application example according to the present invention, three of Figures 14A, 14B complete the full color pixel arrangement of the shield wall panel design.

图16为本发明第四应用例的像素结构与屏蔽墙设计的示意图。 FIG 16 pixel structure of the fourth embodiment of the present invention is applied and a schematic view of a shield wall design.

图17为依照本发明第四应用例的全彩面板像素排列与屏蔽墙设计的示意图。 17 is a schematic view of a full-color pixel arrangement of the shield wall panel designed according to a fourth embodiment of the present invention is applied.

图18为依照本发明第五应用例的全彩面板像素排列与屏蔽墙设计的示意图。 18 is a schematic view of a wall designed according to a pixel arrangement of the fifth application embodiment of the present invention, full-color panel and the shield.

简单符号说明10:基板12:第一电极13:第一共同层15:第二共同层16:第二电极 Simple Description of Symbols 10: substrate 12: first electrode 13: a first joint layer 15: second common layer 16: second electrode

IIA、 IIB、 41A、 41B、 51A、 81A、 96A:屏蔽墙的第一部份 IIA, IIB, 41A, 41B, 51A, 81A, 96A: the first part of the shielding wall

IIC、 51B、 81B、 96B:屏蔽墙的第二部分 IIC, 51B, 81B, 96B: second shielding wall portion

51C、 96C:屏蔽墙的第三部分 51C, 96C: third shield wall portion

21、 22、 98:屏蔽墙 21, 22, 98: shielding wall

101:红色次像素区域 101: red sub-pixel region

102:绿色次像素区域 102: a green sub-pixel region

103:蓝色次像素区域 103: Blue sub-pixel region

141:红色发光层 141: red light emitting layer

142:绿色发光层 142: green light emitting layer

143:蓝色发光层 143: a blue light emitting layer

161A、 161B:相邻子像素的第一区域162:相邻子像素的第二区域171:第一蒸镀方向 161A, 161B: a first region adjacent subpixels 162: second adjacent sub-pixel region 171: a first deposition direction

172:第二蒸镀方向173:第三蒸镀方向ei:第一倾斜角e2:第二倾斜角e3:第三倾斜角 172: 173 a second deposition direction: a third deposition direction EI: a first inclination angle E2: E3 second inclination angle: a third angle of inclination

具体实施方式 detailed description

本发明提出一种全彩有机电致发光显示面板及其制造方法,主要是在像素结构中形成屏蔽墙(shadow wall )图案,并利用三个具有独立蒸镀方向和蒸镀角度的色彩蒸镀源(如RGB蒸镀源),与该屏蔽墙图案相配合,使三个色彩发光层(如RGB发光层)可分别且单一地蒸镀于三个色彩发光区域之上,而不会有不同色互相覆盖(包括不同色彩层上下重叠、或是单一发光层中具有两种光色材料)的情形产生。 The present invention provides a full color organic electroluminescence display panel and manufacturing method, mainly a shield wall (shadow wall) in the pixel structure pattern, and using three separate color deposition direction and having a vapor deposition angle source (such as a vapor deposition source RGB), the mating shielding wall pattern, so that three color light emitting layers (light emitting layers such as RGB), respectively, and may be deposited on top of the three single color light-emitting region, without the different color case cover each other (including upper and lower overlapping layers of different colors, or a single light-emitting layer has two color materials) is generated.

图1A〜1C,其绘示依照本发明优选实施例的全彩有机电致发光显示面板的制造方法。 FIG 1A~1C, which illustrate the invention according to a preferred embodiment of the present embodiment is a full-color organic EL display panel manufacturing method. 图1A〜1C的图标重点在于RGB三发光层的独立蒸镀,对第一电极、第一共同层、第二共同层与第二电极,皆省略未明确标示。 FIG 1A~1C focused icon independent RGB three light-emitting layer is deposited on the first electrode, the first common layer, the second layer and the second common electrode, are omitted to clearly marked. 图2 为依照图1A~ 1C所制作的单一像素结构的上视图。 FIG 2 is a top view of the structure of a single pixel in accordance with FIGS. 1A ~ 1C produced. 图3为依照本发明优选实施例的全彩有机电致发光显示面板的单一像素的剖面示意图。 Figure 3 is a full-color in accordance with a preferred embodiment of the present invention is an organic electroluminescent schematic cross-sectional view of a single pixel of the display panel.

在此实施例中,三个相邻的子像素组成一个像素,且具有至少一个第一区域(例如红色次像素区域101)、至少一个第二区域(例如绿色次像素区域102) 及至少一个第三区域(例如蓝色次像素区域103)。 In this embodiment, three adjacent sub-pixels to form a pixel, and having at least one first region (e.g., a red sub-pixel region 101), at least one second region (e.g., the green sub-pixel region 102) and at least one of three-zone (e.g., the blue sub-pixel region 103). 而屏蔽墙,环绕于三相邻的子像素的周围,包括呈L型的第一部份IIA、 IIB和线型的第二部分】1C。 The shield wall, surrounded by three adjacent sub-pixels around, as a first portion comprising a second portion of the L-type IIA, IIB and linear] 1C. 其中,呈L型的第一部份11A、 IIB分别设置于红色次像素区域101和蓝色次像素区域103的一侧。 Wherein the first L-shaped portion 11A, IIB are disposed on one side of the red sub-pixel region 101 and the blue sub-pixel region 103. 第二部份11C,分别设置于红色次像素区域101及蓝色次像素区域103的另一侧,且分别对应于呈L型的第一部份IIA、 11B 的短边。 Second part. 11C, are respectively disposed on the other side of the red sub-pixel region 101 and the blue sub-pixel region 103, and respectively correspond to the L-shaped first portion IIA, 11B of the short sides.

请同时参照图1A〜1C、图2和图3。 Referring to FIG. 1A~1C, FIGS. 2 and 3. 首先,提供基板IO,并形成第一电极12于基板10上。 First, the IO board, and the first electrode 12 is formed on the substrate 10. 接着,形成多个屏蔽墙,例如呈L型的第一部份IIA、 11B和线型的第二部分11C于第一电极12上,并形成至少一个第一共同层(first common layer) 13于第一电极12上。 Next, a plurality of shield walls, for example in the second portion of the first portion 11C L type IIA, 11B and line 12 in the first electrode, and forming at least a first common layer (first common layer) 13 in the first electrode 12. 然后,参照图1A〜1C(仅标示出RGB发光层于第一电极上的形成),形成多个第一色彩次像素(如红色次j象素)、多个第二色彩次像素(如绿色次像素)和多个第三色彩次像素(如蓝色次 Then, referring to FIG 1A~1C (indicated only RGB light emitting layer formed on the first electrode), a plurality of first color sub-pixels (e.g., red sub-pixel j), a plurality of second color sub-pixels (e.g., green sub-pixel) and a plurality of third color sub-pixel (e.g. blue sub

像素),于第一共同层13上。 Pixels), the first layer 13 together.

形成色彩次像素的方法包括:提供至少一个第一色彩蒸镀源(evaporation source)、至少一个第二色彩蒸镀源和至少一个第三色彩蒸镀源,通过第一色彩蒸镀源、第二色彩蒸镀源和第三色彩蒸镀源独立的蒸镀倾斜方向和蒸镀角度与屏蔽墙相配合,将至少一个第一色彩发光层、至少一个第二色彩发光层、 至少一个第三色彩发光层个别地蒸镀于对应相同光色的第一电极12的上方。 The method of forming a color sub-pixel comprises: providing at least a first color evaporation source (evaporation source), at least a second vapor deposition source color and the third color of at least a vapor deposition source, the deposition source by a first color, a second evaporation source color and the third color independent evaporation source and vapor deposition angle oblique direction with mating shielding wall, at least a first color light emitting layer, at least a second color light emitting layer, at least a third color light emitting individually deposited layers above the same light color corresponding to the first electrode 12.

如图1A所示,提供具有第一蒸镀方向171的至少一个第一色彩蒸镀源(未显示),例如红色蒸镀源,且第一蒸镀方向171与第一共同层13的表面呈第一倾斜角e,,且第一蒸镀方向171可到达红色次像素区域101,以形成第一色彩发光层,例如红色发光层141。 1A, providing at least a first color having a first vapor deposition source of the vapor deposition direction 171 (not shown), such as red deposition source and form a common surface of the first layer 13 is deposited a first direction 171 first inclination angle e ,, and a first deposition direction 171 may reach the red sub-pixel region 101, the light emitting layer to form a first color, for example red light emitting layer 141. 其中,屏蔽墙L型的第一部份11B的高度则与第一倾斜角e,相对应。 Wherein the height of the first shielding wall portion 11B of the L-shaped with a first angle of inclination is E, corresponds. 而之后的蓝色发光层和绿色发光层则预定形成于图1A中的区域19、 20内。 19, the inner region 20 and after the blue light emitting layer green light emitting layer is formed in a predetermined 1A in FIG.

接着,如图1B所示,提供具有第三蒸镀方向173的至少一个第三色彩蒸镀源(未显示),例如蓝色蒸镀源,且第三蒸镀方向173与第一共同层13的表面呈第三倾斜角93,且第三蒸镀方向173可到达蓝色次像素区域103,以形成第三色彩发光层,例如蓝色发光层143。 Next, as shown in FIG. 1B, at least a third color having a third deposition source 173 is deposited direction (not shown), for example, blue deposition source, the deposition direction 173 and the third layer together with the first 13 the angle of inclination of the third surface was 93, and the third deposition direction 173 to reach the blue sub-pixel region 103, the light emitting layer to form a third color, such as blue light emitting layer 143. 其中,屏蔽墙L型的第一部份IIA的高度则与第三倾斜角03相对应。 Wherein the first portion of the L-shaped shield wall height IIA is the third angle of inclination 03 correspond.

之后,如图1C所示,提供具有第二蒸镀方向172的至少一个第二色彩蒸镀源(未显示),例如绿色蒸镀源,且第二蒸镀方向172与第一共同层13的表面呈第二倾斜角02,且第二蒸镀方向172可到达绿色次像素区域102,以形成第二色彩发光层,例如绿色发光层142。 Thereafter, 1C, providing at least a second color having a second vapor deposition source of the vapor deposition direction 172 (not shown), such as green vapor deposition source, the deposition direction 172 and the second layer 13 and the first common the inclination angle of the surface was 02 second, and the second deposition direction 172 to reach the green sub-pixel region 102, the light emitting layer to form a second color, for example green light emitting layer 142. 对于绿色次像素区域102来说, 两侧有屏蔽墙,因此可形成绿色发光层142;而对于蓝色次像素区域103来说,屏蔽墙的第一部份IIB可防止绿色蒸镀源在蓝色发光层143上方再次地形成绿色发光层,而是在接近屏蔽墙的第二部份IIC处才会形成部分绿色发光层142',由于此区域为非发光区,故不会造成影响。 For green sub-pixel region 102, the shielding wall on both sides, so green light emitting layer 142 may be formed; and for sub-pixel region 103 is blue, the first portion of the shielding wall prevents IIB deposition source in the blue green again above the light emission layers 143 are formed green light emitting layer, but partially green light emitting layer 142 'is formed only in the second part of the shielding wall proximate IIC, since this area is non-light emitting region, it will not be affected.

值得注意的是,屏蔽墙(包括11A、 IIB、 IIC)的位置与第一色彩蒸镀源、 第二色彩蒸镀源和第三色彩蒸镀源的位置对应,屏蔽墙的高度与第一倾斜角e,、第二倾斜角02和第三倾斜角03对应,以在各像素区域内定义出至少一个第一色彩次像素区域(如红色次像素区域101)、至少一个第二色彩次像素区 Notably, the position corresponding to the position of the shielding walls (including 11A, IIB, IIC) a vapor deposition source and the first color, second color and third color vapor deposition source of the vapor deposition source, the height of the first shield wall is inclined e ,, a second angle 02 and a third angle of inclination corresponding to the inclination angle 03, at least a first color sub-pixel region (e.g., the red sub-pixel region 101) define a region in each pixel, the at least a second color sub-pixel region

域(如绿色次像素区域102)和至少一个第三色彩次像素区域(如蓝色次像素区 Domain (e.g., the green sub-pixel region 102) and at least one third color sub-pixel region (e.g., the blue sub-pixel region

域103),务必使RGB的蒸镀区域仅覆盖住所对应发相同光色的第一电极, 而不会覆盖到其它光色的第一电极。 Domain 103), make sure that the region covers only the RGB deposition residence corresponding to a first electrode made of the same light color, and not to cover the first electrodes of other color light. 第一倾斜角e,、该第二倾斜角02和该第三倾斜角03的角度例如是约20度至80度,优选的角度约为30度至70度。 First inclination angle e ,, the second inclination angle 02 and angle 03 of the third example, the inclination angle is about 20 degrees to 80 degrees, preferably an angle of about 30 degrees to 70 degrees. 屏蔽墙的高度大致上为10微米(pm)至500微米(Hm),优选的高度约为20微米(pm)至lOO微米Om),视面板的像素密度大小而定。 Wall of a height substantially 10 microns (PM) to 500 micrometers (Hm), preferably a height of about 20 microns (PM) to lOO [mu] m Om), depending on the size of the pixel density of the panel may be. 屏蔽墙的优选的宽度大致上约为高度的30%至100%。 The preferred width of the shield wall is substantially the height of about 30% to 100%.

另外,第一蒸镀方向171、第二蒸镀方向172和第三蒸镀方向173两两之间于基板10上的投影分别具有第一夹角912、第二夹角623及第三夹角631(未显示),且大致上约为大于或等于90度。 Further, a first deposition direction 171, a second 172 and a third vapor deposition direction 173 twenty-two direction between the projection 10 on the substrate 912 each have a first angle, the second angle and the third angle 623 631 (not shown), and is substantially equal to or greater than about 90 degrees.

在形成各色彩发光层之后,接着形成至少一个第二共同层15,以覆盖该多个第一色彩发光层(如红色发光层141)、该多个第二色彩发光层(如绿色发光层142)和该多个第三色彩发光层(如蓝色发光层143)。 After the formation of each of the color luminescent layers, at least a second common layer 15 is then formed to cover the plurality of first color light emitting layers (red light emitting layer 141), the plurality of second color light emitting layer (e.g., green light emitting layer 142 ) and the plurality of third color light emitting layer (e.g., blue light emitting layer 143). 最后,形成第二电极16于第二共同层15上,如图3所示。 Finally, a second electrode 16 is formed on the second layer 15 together, as shown in FIG.

综上,本发明的屏蔽墙设计可在不需使用屏蔽(mask free)与不改变OELD的RGB的原先元件结构的情形下,确保各色彩发光层在各子像素区域中不会相互覆盖,制作出没有混光缺点、光色纯度高的全彩有机电致发光显示面板。 In summary, the shielding wall can be designed according to the present invention in the case of the original configuration without the use of shielding elements (mask free) and does not change the OELD of RGB, each color light emitting layer to ensure that each sub-pixel region does not overwrite each other, making the mixed light without drawbacks, high light color purity full color organic electroluminescent display panel. 再者,由于屏蔽墙的特殊设计,可使第一色彩发光层(如红色发光层141)、第二色彩发光层(如绿色发光层142)和第三色彩发光层(如蓝色发光层143)在第一共同层13上依次形成。 Furthermore, due to the special design of the shielding wall, the light emitting layer can first color (e.g., red light emitting layer 141), a second color light-emitting layer (such as a green light emitting layer 142) and the third color light-emitting layer (such as a blue light emitting layer 143 ) are sequentially formed on the first layer 13 together.

在实际应用时,屏蔽墙可随全彩有机电致发光显示面板(筒称全彩面板) 的像素结构与排列的不同,而设置在适当的位置。 In practice, the shield walls may be full color in the organic electroluminescent display panel of different (called cylindrical full color panel) pixel structure and arrangement, provided at an appropriate position. 以下第一〜第五应用例, 根据全彩面板各种不同的像素排列与屏蔽墙设计,提出详细说明。 The following first to fifth application example, according to a variety of full-color pixel arrangement panel and wall shield design, presented in detail. 然而,这些应用例并不会限缩本发明欲保护的范围。 However, these application examples do not limit the scope of the present invention is reduced to be protected. 本发明的技术并不限于应用例中所叙述的模式。 The techniques of this invention is not limited to the application example described mode. 另外,在绘制图标时省略不必要的元件,以清楚显示本发明的应用例。 Further, unnecessary elements are omitted to render icons, to clearly show the application of the present invention.

第一应用例 First Application Example

图4为本发明第一应用例的像素结构与屏蔽墙设计的示意图。 FIG 4 is a schematic view of a pixel structure of the shield wall of the first application example of the design of the present invention. 在此应用例中,三个相邻的子像素组成一个像素,且具有至少一个第一区域(例如红色次像素区域101)、至少一个第二区域(例如绿色次像素区域102)及至少一个第三区域(例如蓝色次像素区域103)。 In this application example, three adjacent sub-pixels to form a pixel, and having at least one first region (e.g., a red sub-pixel region 101), at least one second region (e.g., the green sub-pixel region 102) and at least one of three-zone (e.g., the blue sub-pixel region 103). 而屏蔽墙包括L型部份41A和41B, And the shield wall comprises an L-shaped portions 41A and 41B,

分别设置在红色次像素区域101和蓝色次像素区域103的一侧。 They are provided at a side of the red sub-pixel region 101 and the blue sub-pixel region 103. 接着,依次提供第一色彩蒸镀源(如红色蒸镀源)、第二色彩蒸镀源(如绿色蒸镀源)和第三色彩蒸镀源(如蓝色蒸镀源)。 Next, the vapor deposition source sequentially provides a first color (e.g., red evaporation source), a second vapor deposition source color (e.g., green deposition source) and the third deposition source color (e.g., blue evaporation source).

第一色彩蒸镀源(如红色蒸镀源)、第二色彩蒸镀源(如绿色蒸镀源)和第 A first vapor deposition source color (e.g., red evaporation source), a second vapor deposition source color (e.g., green deposition source) and

三色彩蒸镀源(如蓝色蒸镀源)的第一蒸镀方向171、第二蒸镀方向172和第三蒸镀方向173分别与基板表面呈第一倾斜角e,、第二倾斜角92和第三倾斜角63(请参考实施例中图1A〜1C和图3及相关说明)。 A first vapor deposition source direction three color (e.g., blue evaporation source) 171, a second deposition direction 172 and direction 173 are deposited as a third angle of inclination of the first inclination angle e ,, a second surface of the substrate 92 and the third inclination angle 63 (see Example 3 and FIG 1A~1C and instructions embodiment).

屏蔽墙41A和41B的位置与第一色彩蒸镀源(如红色蒸镀源)、第二色彩蒸镀源(如绿色蒸镀源)和第三色彩蒸镀源(如蓝色蒸镀源)的位置对应,且屏蔽墙41A和41B的高度与该第一倾斜角e,、该第二倾斜角62和第三倾斜角e3对应,以在各该像素区域内定义出至少一个第一色彩次像素区域(如红色次像素区域101)、至少一个第二色彩次像素区域(如绿色次像素区域102)和至少一个第三色彩次像素区域(如蓝色次像素区域103)。 A first position shielding wall 41A and 41B vapor deposition source color (e.g., red evaporation source), a second vapor deposition source color (e.g., green deposition source) and the third deposition source color (e.g., blue evaporation source) corresponding to the position, and the shield walls 41A and 41B and the height of the first inclined angle e ,, the second 62 and the third angle of inclination corresponding to the inclination angle e3, at least a first color to define the views in each of the pixel region pixel region (e.g., the red sub-pixel region 101), at least a second color sub-pixel region (e.g., the green sub-pixel region 102) and at least one third color sub-pixel region (e.g., the blue sub-pixel region 103). 而第一蒸镀方向171、 第二蒸镀方向172和第三蒸镀方向173分别到达各该像素区域内的第一色彩次像素区域(如红色次像素区域101)、第二色彩次像素区域(如绿色次像素区域102)和第三色彩次像素区域(如蓝色次像素区域103)内,以分别形成第一色彩发光层(如红色发光层141)、第二色彩发光层(如绿色发光层142)和第三色彩发光层(如蓝色发光层143)。 And the first deposition direction 171, a second 172 and a third vapor deposition direction 173 respectively to the first direction of the color sub-pixel region (e.g., the red sub-pixel region 101) in each pixel region, a second color sub-pixel region (e.g., the green sub-pixel region 102) and the third color sub-pixel region (e.g., the blue sub-pixel region 103), a first color light emitting layers (red light emitting layer 141) to form, respectively, a second color light-emitting layer (such as green the light emitting layer 142) and the third color light-emitting layer (such as a blue light emitting layer 143).

图5A〜5C分别为本发明第一应用例的第一、二、三种全彩面板像素排列与屏蔽墙设计的示意图。 FIG 5A~5C are present three kinds of panel full color pixel arrangement schematic of the shield wall design of the present invention a first application example of the first, second. 图5A〜5C亦分别为条状(stripe)、马赛克(mosaic) 和三角形(delta)(或是称为triangle)的RGB次像素排列方式。 FIG 5A~5C are also strip-shaped (stripe), Mosaic (Mosaic) and triangles (Delta) (or called Triangle) arrangement of RGB sub-pixels.

值得注意的是,当图4的像素结构与屏蔽墙重复地形成条状像素排列时(如图5A所示),原先图4中屏蔽墙的L型部份41A、 41B的短边,亦等同于图2中线型的第二部分IIC。 Notably, when the pixel structure and the shield wall 4 is repeatedly when the stripe pixel arrangement (FIG. 5A) is formed, L-type part of the original 4 in FIG short shield walls 41A, 41B of the side, also equivalent FIG 2 in the second portion of the linear IIC.

应用第一应用例的像素结构与屏蔽墙设计,可在不需使用屏蔽(mask free) 与不改变RGB的原先形成方法的情形下,使各色彩发光层在各子像素区域中可单一且独立地形成,不会有相互覆盖和混光的缺点。 Pixel structure shielding wall design of the first application example of the application, can be used without the shield (mask free) under the case of a method originally formed without changing the RGB, each color light emitting layer may be a single pixel in each sub-region and independently is formed, there is no mutual mixing light cover and disadvantages.

第二应用例 Second Application Example

在第二应用例中,主要是将屏蔽墙设计和两个相邻的子像素相配合。 In the second application example, the sub-pixel main shield wall and two adjacent mating design. 以下应用例二A〜二D分别揭露四个可应用的屏蔽墙"^殳计。 应用例二A图6为本发明的应用例二A的像素结构与屏蔽墙设计的示意图。每一个像素具有至少二个第一区域(first portion)161A、 161B及至少一个第二区域162。屏蔽墙具有至少一个第一部份(呈U字形)51A及至少二第二部份(呈直线形)51B,其中第一部份51A分别对应设置于第一区域161A、 161B的一侧, 而第二部份51B分别对应设置于第二区域162的二侧。接着,依次提供第一色彩蒸镀源(如红色蒸镀源)、第二色彩蒸镀源(如绿色蒸镀源)和第三色彩蒸镀源(如蓝色蒸镀源)。 The following two application examples disclosed A~ D are two four-shielding wall can be applied "^ Shu weight. Application Example II A 6 is a schematic structure of a pixel according to a second application of the invention A shield wall design of the present. Each pixel has at least two first region (first portion) 161A, 161B and at least one second region 162. The first shield wall having at least one portion (U shape) and at least two second portion 51A (linear shape) 51B, wherein the first portion 51A respectively corresponding to a first color vapor deposition source disposed in the first region 161A, 161B of the side, and the second portion 51B are disposed corresponding to both sides of the second region 162. Next, turn provides (e.g., red evaporation source), a second vapor deposition source color (e.g., green deposition source) and the third deposition source color (e.g., blue evaporation source).

同样地,第一色彩蒸镀源(如红色蒸镀源)、第二色彩蒸镀源(如绿色蒸镀源)和第三色彩蒸镀源(如蓝色蒸镀源)的第一蒸镀方向171、第二蒸镀方向172 和第三蒸镀方向173亦分别与基板表面呈适当的倾斜角,以在第一区域161A 中形成第一色彩发光层(如红色发光层141),在第二区域162中形成第二色彩发光层(如绿色发光层142),在第一区域161B中形成第三色彩发光层(如蓝色发光层143)。 The first vapor deposition in the same manner, a first vapor deposition source color (e.g., red evaporation source), a second vapor deposition source color (e.g., green deposition source) and the third deposition source color (e.g., blue evaporation source) direction 171, a second 172 and a third vapor deposition direction is also 173 directions respectively form an appropriate inclination angle of the substrate surface to form a light emitting layer of a first color (e.g., red light emitting layer 141) in the first region 161A, the second second color light-emitting layer (such as a green light emitting layer 142) is formed in the second region 162, forming a third color light emitting layer (e.g., blue light emitting layer 143) in the first region 161B.

图7A、 7B则分别为本发明的应用例二A的两种全彩面板像素排列与屏蔽墙设计的示意图。 Two kinds 7A, 7B of the two application examples of the present invention, respectively A full-color panel pixel arrangement of FIG shield wall design of Fig. 依照应用例二A的像素结构与屏蔽墙设计,可在不需使用屏蔽(maskfree)与不改变OELD的RGB的原先元件结构的情形下,使各色彩发光层在各子像素区域中可单一且独立地形成,不会有相互覆盖和混光的缺点。 In accordance with the pixel structure according to the second shielding wall design application A, the element may be in the case of the original configuration without the use of RGB shield (maskfree) and does not change the OELD, each color light emitting layer may be a single pixel in each sub-region and formed independently, there is no mutual mixing light cover and disadvantages.

应用例二B Application Example II B

图8为本发明的应用例二B的像素结构与屏蔽墙设计的示意图。 Application of the pixel structure and the shield wall 8 II B of FIG schematic design of the present invention. 每一个像素亦具有至少二个第一区域(firstportion)161A、 161B及至少一个第二区域162。 Each pixel also has at least two first region (firstportion) 161A, 161B and at least one second region 162. 与应用例二A不同的是:应用例二B中屏蔽墙具有呈U字形的第一部份81A及呈直线形的二个第二部份81B。 Application Example II A except that: the application B, according to the second shield wall having a first U-shaped part 81A and two second rectilinear portions 81B. 其中第一部份81A分别对应设置于第一区域161A、 161B的一侧,而第二部份81B分别对应设置于第二区域162的二侧。 Wherein the first portion 81A are respectively disposed corresponding to the first region 161A, 161B of the side, and the second portion 81B are disposed corresponding to both sides of the second region 162. 接着,依次或同时提供第一色彩蒸镀源(如红色蒸镀源)、第二色彩蒸镀源(如绿色蒸镀源)和第三色彩蒸镀源(如蓝色蒸镀源)。 Next, sequentially or simultaneously to provide a first vapor deposition source color (e.g., red evaporation source), a second vapor deposition source color (e.g., green deposition source) and the third deposition source color (e.g., blue evaporation source).

同样地,第一色彩蒸镀源(如红色蒸镀源)、第二色彩蒸镀源(如绿色蒸镀源)和第三色彩蒸镀源(如蓝色蒸镀源)的第一蒸镀方向171、第二蒸镀方向172 和第三蒸镀方向173亦分别与基板表面呈适当的倾斜角,以在第一区域161A 中形成第一色彩发光层(如红色发光层141),在第二区域162中形成第二色彩发光层(如绿色发光层142),在第一区域161B中形成第三色彩发光层(如 The first vapor deposition in the same manner, a first vapor deposition source color (e.g., red evaporation source), a second vapor deposition source color (e.g., green deposition source) and the third deposition source color (e.g., blue evaporation source) direction 171, a second 172 and a third vapor deposition direction is also 173 directions respectively form an appropriate inclination angle of the substrate surface to form a light emitting layer of a first color (e.g., red light emitting layer 141) in the first region 161A, the second second color light-emitting layer (such as a green light emitting layer 142) is formed in the second region 162, is formed in the first region of the third color light emitting layer 161B (e.g.

蓝色发光层143)。 The blue light emitting layer 143). 另外,因配合屏蔽墙的位置,应用例二A和应用例二B 的第二蒸镀方向172亦不相同。 Further, due to the location with the shield wall, according to a second application of a second deposition direction A and B according to the second application 172 is not the same.

图9A、 9B则分别为本发明的应用例二B的两种全彩面板像素排列与屏蔽墙设计的示意图。 Figures 9A, B are two cases two applications of the present invention, respectively 9B full color pixel arrangement of the shield wall panel design. FIG. 依照应用例二B的像素结构与屏蔽墙设计,同样地可在不需使用屏蔽(maskfree)与不改变OELD的RGB的原先元件结构的情形下, 使各色彩发光层在各子像素区域中可单一且独立地形成,不会有相互覆盖和混光的缺点。 In accordance with the pixel structure according to the second shielding wall B of the design application, may be similarly in the case of the RGB original configuration without the use of shielding elements (maskfree) and does not change the OELD, each color light emitting layer in each sub-pixel region single and independently formed, there will be no mutual mixing light cover and disadvantages.

应用例二C Di-C Application Example

图10为本发明的应用例二C的像素结构与屏蔽墙设计的示意图。 Application Example C is two pixel structure of the shield wall 10 a schematic view of the design of the present invention. 在应用例二C中,采用应用例二A和二B的像素结构与屏蔽墙设计,因此,图10中的左上图案即为图6,右上图案则为图8上下颠倒后的图形。 In the application example di-C, using two application examples of the shield structure A and the pixel B of two wall design, therefore, the pattern in FIG. 10 is the upper left in FIG. 6, FIG. 8 top right pattern was reversed after the vertical pattern.

图11则为本发明的应用例二C的全彩面板像素排列与屏蔽墙设计的示意图。 Application Example 11 was full color pixel arrangement panel C with two shielding wall design of the present invention. FIG. 将图10中两个图形左右并排后,形成一单元,在重复排列后即为图11的图形。 After the two side by side in FIG. 10 left and right pattern, forming a unit pattern is repeatedly arranged after FIG. 11.

依照应用例二C的像素结构与屏蔽墙设计,同样地可在不需使用屏蔽与不改变OELD的RGB的原先元件结构的情形下,使各色彩发光层在各子像素区域中可单一且独立地形成,不会有相互覆盖和混光的缺点。 Application Example In accordance with the pixel structure of the shield wall design di-C, similarly to the case of the original may need to use the element structure of the shield and does not change the OELD of RGB, each color light emitting layer may be a single pixel in each sub-region and independently is formed, there is no mutual mixing light cover and disadvantages.

应用例二D Application Example II D

图12为本发明的应用例二D的像素结构与屏蔽墙设计的示意图。 Application of the shield wall structure of the pixel of FIG. 12 II D of the present invention is designed to FIG. 图12 中包含RGB发光区域近乎上下对称的两个像素。 FIG 12 contains the RGB light emitting region almost two pixels vertically symmetrical. 在应用例二D中,变化应用例二A的像素结构与屏蔽墙设计,因此,图12中的上方图案即为图6的变化(屏蔽墙之间没有连接),下方图案则为图6上下颠倒后的图形。 In Application Example D, two, pixel structure according to the second shielding wall A design change applications, therefore, change over the pattern in FIG. 12 is the FIG. 6 (no connection between the shielding walls), compared with FIG. 6 below a patterned vertical graphical after reversed. 因此, 图12的屏蔽墙包括:呈U字形的第一部份51A、呈直线形的二第二部份51B 及第三部份51C。 Thus, FIG shield wall 12 comprises: a first portion 51A U-shaped form, the two rectilinear second portion 51B, and a third part 51C. 其中,第一部份51A分别对应设置于第一区域161A、 161B 的一侧;第二部份51B分别对应设置于第二区域162的二侧;第三部份51C 则设置于第一区域161A、 161B的另一侧,并在重复排列后与第一部分51A 相连接(如图13所示)。 Wherein the first portion 51A are respectively disposed corresponding to the first region 161A, 161B of the side; a second portion 51B are disposed at two sides corresponding to the second region 162; a third portion 51C is disposed in the first region 161A , 161B of the other side, and after repeated arrangement is connected to the first portion 51A (FIG. 13).

图13为本发明的应用例二D的全彩面板像素排列与屏蔽墙设计的示意图。 Application Example D, two full-color pixel arrangement of the shielding wall panel 13 of the present invention. FIG schematic design. 其中,将图12重复排列后即为图13的图形。 Wherein the repeating pattern of FIG 12 FIG 13 after arrangement. 依照应用例二D的像素结构与屏蔽墙设计,同样地可在不需使用屏蔽与不改变OELD的RGB的原先元件结构的情形下,使各色彩发光层在各子像素区域中可单一且独立地形 Application Example In accordance with the pixel structure of the shield wall design II D, can be similarly in the case of the original configuration without the use of the shield member and does not change the OELD of RGB, each color light emitting layer may be a single and independently in each sub-pixel region terrain

成,不会有相互覆盖和混光的缺点。 So, there will be no mutual mixing light cover and disadvantages.

第三应用例 Third Application Example

图14A、 14B为本发明第三应用例的两种像素结构与屏蔽墙设计的示意图。 14A, 14B, two types of pixels according to a third application example of a schematic structure of the shield wall design of the present invention. 在此应用例中,三个相邻的子像素组成一个像素,包括第一区域(例如红色次像素区域101)、第二区域(例如绿色次像素区域102)及第三区域(例如蓝色次像素区域103)。 In this application example, three adjacent sub-pixels to form a pixel, comprising a first region (e.g., a red sub-pixel region 101), a second region (e.g., the green sub-pixel region 102) and the third region (e.g. blue sub pixel region 103).

在图14A中,屏蔽墙21环绕于三个相邻的子像素的周围。 In FIG. 14A, a shield wall is surrounded on three adjacent sub-pixels 21. 在图14B中, 屏蔽墙22设置于三相邻的子像素的两两之间。 In FIG. 14B, the shield wall 22 is disposed between any two of the three adjacent sub-pixels. 之后,依次提供第一色彩蒸镀源(如红色蒸镀源)、第二色彩蒸镀源(如绿色蒸镀源)和第三色彩蒸镀源(如蓝色蒸镀源)。 Thereafter, the vapor deposition source sequentially provides a first color (e.g., red evaporation source), a second vapor deposition source color (e.g., green deposition source) and the third deposition source color (e.g., blue evaporation source).

同样地,第一色彩蒸镀源(如红色蒸镀源)、第二色彩蒸镀源(如绿色蒸镀源)和第三色彩蒸镀源(如蓝色蒸镀源)的第一蒸镀方向171、第二蒸镀方向172 和第三蒸镀方向173亦分别与基板表面呈适当的倾斜角,以在第一区域(例如红色次像素区域IOI)中形成第一色彩发光层(如红色发光层141),在第二区域(例如绿色次像素区域102)中形成第二色彩发光层(如绿色发光层142), 在第三区域(例如蓝色次像素区域103)中形成第三色彩发光层(如蓝色发光层143)。 The first vapor deposition in the same manner, a first vapor deposition source color (e.g., red evaporation source), a second vapor deposition source color (e.g., green deposition source) and the third deposition source color (e.g., blue evaporation source) direction 171, a second 172 and a third vapor deposition direction is also 173 directions, respectively, with an appropriate inclination angle of the substrate surface was at a first color light emitting layer (e.g. the red sub-pixel region IOI) in the first region (such as red the light emitting layer 141), a second region (e.g., a second color light-emitting layer (such as a green light emitting layer 142) is formed 102) of the green sub-pixel region, the third region (the third color is formed e.g. 103), the blue sub-pixel region a light emitting layer (e.g., blue light emitting layer 143).

图15A、 15B则分别为依照本发明应用例三的图14A、 14B所完成的全彩面板像素排列与屏蔽墙设计的示意图。 15A, 15B, respectively, a schematic view of the embodiment according to the present invention, three applications in FIG. 14A, 14B complete the full color pixel arrangement of the shield wall panel design. 依照应用例三的像素结构与屏蔽墻设计,同样地可在不需使用屏蔽(maskfree)与不改变OELD的RGB的原先元件结构的情形下,使各色彩发光层在各子像素区域中可单一且独立地形成, 不会有相互覆盖和混光的缺点。 In accordance with the shield wall structure of a pixel according to a third design application, may be similarly in the case of the original configuration without the use of the shield member (maskfree) and does not change the OELD of RGB, each color light emitting layer may be a single pixel in each sub-region and separately formed, there will be no mutual mixing light cover and disadvantages.

第四应用例 Fourth Application Example

图16为本发明第四应用例的像素结构与屏蔽墙设计的示意图。 FIG 16 pixel structure of the fourth embodiment of the present invention is applied and a schematic view of a shield wall design. 虛线部分代表一个像素,而发出相同光色的四个发光层则形成同一色彩的次像素区域,包括第一区域(例如红色次像素区域101)、第二区域(例如绿色次像素区域102)及第三区域(例如蓝色次像素区域103)。 The dotted line represents a pixel, sub-pixel region and emits four light emitting layers of the same color is formed of a same color, including a first region (e.g., a red sub-pixel region 101), a second region (e.g., the green sub-pixel region 102) and a third region (e.g., the blue sub-pixel region 103). 第四应用例的屏蔽墙包括第一部份(呈U字形)96A、第二部份(呈直线形)96B和第三部分96C。 Fourth application embodiment of the shielding wall comprises a first portion (U-shape) 96A, second portion (rectilinear) 96B and a third portion 96C. 其中, 第一部份96A分别对应设置于红色次像素区域101和绿色次像素区域102 的一侧;第二部份96B对应设置于蓝色次像素区域103的两侧;第三部分96C则设置在红色次像素区域101和绿色次像素区域102的另一侧,并连接 Wherein the first portion 96A disposed on one side of corresponding red sub pixel region 101 and the green sub-pixel region 102; a second portion 96B provided on both sides corresponding to the blue sub-pixel region 103; the third portion 96C is provided on the other side 102 of the red sub-pixel region and the green sub-pixel region 101, and is connected

第一部份96A与第二部份96B。 The first part of the second part 96A and 96B. 接着,依次提供第一色彩蒸镀源(如红色蒸镀源)、第二色彩蒸镀源(如绿色蒸镀源)和第三色彩蒸镀源(如蓝色蒸镀源)。 Next, the vapor deposition source sequentially provides a first color (e.g., red evaporation source), a second vapor deposition source color (e.g., green deposition source) and the third deposition source color (e.g., blue evaporation source). 同样地,第一色彩蒸镀源(如红色蒸镀源)、第二色彩蒸镀源(如绿色蒸镀 Likewise, a first vapor deposition source color (e.g., red evaporation source), a second vapor deposition source color (such as green vapor deposition

源)和第三色彩蒸镀源(如蓝色蒸镀源)的第一蒸镀方向ni、第二蒸镀方向i72 Source) and the third deposition source color (e.g., blue evaporation source) in a first deposition direction ni, a second deposition direction i72

和第三蒸镀方向173亦分别与基板表面呈适当的倾斜角,以在第一区域(例如红色次像素区域101)中形成第一色彩发光层(如红色发光层141),在第二区域(例如绿色次像素区域102)中形成第二色彩发光层(如绿色发光层142), 在第三区域(例如蓝色次像素区域103)中形成第三色彩发光层(如蓝色发光层143)。 And a third deposition direction 173 are also suitable shape and inclination angle of the substrate surface, a first color-emitting layers (red light emitting layer 141) is formed in a first region (e.g., a red sub-pixel region 101) in the second region (e.g., the green sub-pixel region 102) emitting a second color layer (e.g., green light emitting layer 142) is formed in the third region of the third color light emitting layer (e.g., a blue sub-pixel region 103) is formed (such as blue light emitting layer 143 ).

图17为依照本发明第四应用例的全彩面板像素排列与屏蔽墙设计的示意图。 17 is a schematic view of a full-color pixel arrangement of the shield wall panel designed according to a fourth embodiment of the present invention is applied. 依照第四应用例的像素结构与屏蔽墙设计,同样可在不需使用屏蔽(maskfree)与不改变OELD的RGB的原先元件结构的情形下,使各色彩发光层在各子像素区域中可单一且独立地形成,不会有相互覆盖和混光的缺点。 In accordance with the pixel structure of the shield wall design of the fourth application example, also be the case in the original configuration without the use of the shield member (maskfree) and does not change the OELD of RGB, each color light emitting layer may be a single pixel in each sub-region and separately formed, there will be no mutual mixing light cover and disadvantages.

第五应用例 Fifth Application Example

图18为依照本发明第五应用例的全彩面板像素排列与屏蔽墙设计的示意图。 18 is a schematic view of a wall designed according to a pixel arrangement of the fifth application embodiment of the present invention, full-color panel and the shield. 在此应用例中,三个相邻的子像素组成一个像素,包括第一区域(例如红色次像素区域101)、第二区域(例如绿色次像素区域102)及第三区域(例如蓝色次像素区域103)。 In this application example, three adjacent sub-pixels to form a pixel, comprising a first region (e.g., a red sub-pixel region 101), a second region (e.g., the green sub-pixel region 102) and the third region (e.g. blue sub pixel region 103). 而屏蔽墙98环绕于三相邻的子像素的其中二子像素的周围;如图18所示,屏蔽墙98环绕红色次像素区域101和绿色次像素区域102。 The shielding wall surrounding two subpixel surrounded by three pixels 98 wherein adjacent; 18, shielding wall 98 surrounding the red sub-pixel region 101 and the green sub-pixel region 102. 接着,依次提供第一色彩蒸镀源(如红色蒸镀源)、第二色彩蒸镀源(如绿色蒸镀源)和第三色彩蒸镀源(如蓝色蒸镀源),以分别形成第一色彩发光层(如红色发光层141)、第二色彩发光层(如绿色发光层142)、和第三色彩发光层(如蓝色发光层143)。 Next, the vapor deposition source sequentially provides a first color (e.g., red evaporation source), a second color evaporation source (evaporation source such as green) color, and a third evaporation source (evaporation source such as blue), respectively, to form a first color light emitting layers (red light emitting layer 141), a second color light-emitting layer (such as a green light emitting layer 142), a light emitting layer, and a third color (e.g., blue light emitting layer 143).

依照第五应用例的像素结构与屏蔽墙设计,同样可在不需使用屏蔽与不改变OELD的RGB的原先元件结构的情形下,使各色彩发光层在各子像素区域中可单一且独立地形成,不会有相互覆盖和混光的缺点。 In accordance with the pixel structure of the shield wall design fifth application example, also be the case in the original configuration without the use of the shield member and does not change the OELD of RGB, each color light emitting layer may be a single and independently in each of the sub-pixel region is formed, there is no mutual mixing light cover and disadvantages.

综上所述,虽然本发明以优选实施例揭露如上,然而其并非用以限定本发明,本领域的技术人员在不脱离本发明的精神和范围内,可作些许的更动与润饰,因此本发明的保护范围应当以权利要求所界定者为准。 Although the present invention is disclosed in the above preferred embodiment, however, not intended to limit the present invention, those skilled in the art without departing from the spirit and scope of the present disclosure, may make various modifications and variations, so the scope of the present invention should be defined by the claims and their equivalents.

Claims (18)

  1. 1.一种像素结构,适用于全彩有机电致发光显示面板,该像素结构具有多个子像素,该多个子像素包含: 至少一个第一电极,形成于基板上; 至少一个第一共同层,形成于该第一电极上; 至少一个屏蔽墙,形成于该第一电极的周围; 多个发光层,分别形成于对应的各该子像素的该第一共同层上;其中,各该发光层于各该第一电极之上不会互相覆盖; 至少一个第二共同层,形成于该多个发光层上;以及至少一个第二电极,形成于该第二共同层上, 其中各像素具有至少二个第一区域及至少一个第二区域,且该屏蔽墙具有至少一个第一部份及至少二个第二部份,该第一部份分别对应设置于该多个第一区域的一侧,该多个第二部份分别对应设置于该第二区域的二侧。 1. A pixel structure, for full-color organic electroluminescent display panel, the pixel structure having a plurality of sub-pixels, the plurality of sub-pixels comprising: at least one first electrode formed on the substrate; at least a first common layer, is formed on the first electrode; at least one shield wall, formed around the first electrode; a plurality of light emitting layers, are formed on each of the corresponding sub-pixels of the first common layer; wherein each of the light emitting layer not overlies each of the first electrodes to each other; at least a second common layer, formed on the plurality of light emitting layer; and at least one second electrode formed on the second layer together, wherein each pixel has at least two first regions and at least one second region, and the shield wall having at least one first portion and at least two second portion, the first portion disposed respectively corresponding to the plurality of first side region , respectively corresponding to the plurality of second portion disposed at two sides of the second region.
  2. 2. 如权利要求1所述的像素结构,其中该屏蔽墙,还包括至少一个第三部份,设置于该多个第一区域的另一侧,且与该第一部份相连。 2. The pixel structure according to claim 1, wherein the shield wall, further comprising at least one third portion disposed on the other side of the plurality of first regions, and connected to the first portion.
  3. 3. 如权利要求1所述的像素结构,其中该屏蔽墙,还包括至少一个第三部份,设置于该多个第一区域的另一侧,且与该第一部份及该多个第二部份相连。 3. The pixel structure according to claim 1, wherein the shield wall, the other side further comprising at least one third portion disposed in the first plurality of regions, and the first portion and the plurality connected to the second part.
  4. 4. 如权利要求1所述的像素结构,其中该屏蔽墙的高度为10微米至500微米。 The pixel structure as claimed in claim 1, wherein the shield wall height of 10 microns to 500 microns.
  5. 5. 如权利要求4所述的像素结构,其中该屏蔽墙的宽度为高度的30% 至100%。 The pixel structure according to claim 4, wherein the shield wall height width of 30 to 100%.
  6. 6. —种像素结构,适用于全彩有机电致发光显示面板,该像素结构具有多个子像素,该多个子像素包含:至少一个第一电极,形成于基板上; 至少一个第一共同层,形成于该第一电极上; 至少一个屏蔽墙,形成于该第一电极的周围; 多个发光层,分别形成于对应的各该子像素的该第一共同层上;其中, 各该发光层于各该第一电极之上不会互相覆盖;至少一个第二共同层,形成于该多个发光层上;以及至少一个第二电极,形成于该第二共同层上,其中各该多个子像素中的各三个相邻的子像素组成一像素,且该屏蔽墙环绕于各该三个相邻的子像素的周围,而各该三个相邻的子像素的两两之间不具有该屏蔽墙,或者该屏蔽墙设置于各该三个相邻的子像素的两两之间,而各该三个相邻的子像素的周围不具有该屏蔽墙。 6. - Structure kinds of pixels, for full-color organic electroluminescent display panel, the pixel structure having a plurality of sub-pixels, the plurality of sub-pixels comprising: at least one first electrode formed on the substrate; at least a first common layer, is formed on the first electrode; at least one shield wall, formed around the first electrode; a plurality of light emitting layers, are formed on each of the corresponding sub-pixels of the first common layer; wherein each of the light emitting layer not overlies each of the first electrodes to each other; at least a second common layer, formed on the plurality of light emitting layer; and at least one second electrode formed on the second layer together, wherein each of the plurality of sub- three adjacent sub-pixels in each pixel is composed of a pixel, and the shield wall surrounds the periphery of each of the three adjacent sub-pixels, and each having no between any two of the three adjacent subpixels the shielding wall or the shielding walls each disposed between any two of the three adjacent sub-pixels, and around each of the three adjacent sub-pixels does not have the shielding wall.
  7. 7. —种像素结构,适用于全彩有机电致发光显示面板,该像素结构具有多个子像素,该多个子像素包含:至少一个第一电极,形成于基板上; 至少一个第一共同层,形成于该第一电极上; 至少一个屏蔽墙,形成于该第一电极的周围;多个发光层,分别形成于对应的各该子像素的该第一共同层上;其中, 各该发光层于各该第一电极之上不会互相覆盖;至少一个第二共同层,形成于该多个发光层上;以及至少一个第二电极,形成于该第二共同层上,其中各该多个子像素中的各三个相邻的子像素组成一像素,该三个相邻的子像素具有至少一个第一区域、至少一个第二区域及至少一个第三区域,且该屏蔽墙具有至少二个L型的第一部份、该多个L型的第一部份,分别设置于该第一区域及该第三区域的一侧。 7. - Structure kinds of pixels, for full-color organic electroluminescent display panel, the pixel structure having a plurality of sub-pixels, the plurality of sub-pixels comprising: at least one first electrode formed on the substrate; at least a first common layer, is formed on the first electrode; at least one shield wall, formed around the first electrode; a plurality of light emitting layers, are formed on each of the corresponding sub-pixels of the first common layer; wherein each of the light emitting layer not overlies each of the first electrodes to each other; at least a second common layer, formed on the plurality of light emitting layer; and at least one second electrode formed on the second layer together, wherein each of the plurality of sub- three adjacent sub-pixels in each pixel is composed of a pixel, the three adjacent sub-pixels having at least a first region, the at least one second region, and at least a third region of the shielding wall and has at least two a first L-shaped portion, the first portion of the plurality of L-shaped, are disposed on one side of the first region and the third region.
  8. 8. 如权利要求7所述的像素结构,其中该屏蔽墙还包括至少两个第二部份,该多个第二部份,分别设置于该第一区域及该第三区域的另一侧,且分别对应于该多个L型的第一部份的短边。 8. The pixel structure according to claim 7, wherein the shield further comprises at least two second wall portions, the plurality of second portions respectively disposed on the other of the first region and the third region of the side and respectively corresponding to the plurality of L-shaped first portion of the short side.
  9. 9. 一种像素结构,适用于全彩有机电致发光显示面板,该像素结构具有多个子像素,该多个子像素包含:至少一个第一电极,形成于基板上; 至少一个第一共同层,形成于该第一电极上; 至少一个屏蔽墙,形成于该第一电极的周围;多个发光层,分别形成于对应的各该子像素的该第一共同层上;其中,各该发光层于各该第一电极之上不会互相覆盖;至少一个第二共同层,形成于该多个发光层上;以及至少一个第二电极,形成于该第二共同层上,其中该多个子像素中的各三个相邻的子像素组成一像素,且该屏蔽墙仅环绕于各该三个相邻的子像素的其中二个子像素的周围。 A pixel structure, for full-color organic electroluminescent display panel, the pixel structure having a plurality of sub-pixels, the plurality of sub-pixels comprising: at least one first electrode formed on the substrate; at least a first common layer, is formed on the first electrode; at least one shield wall, formed around the first electrode; a plurality of light emitting layers, are formed on each of the corresponding sub-pixels of the first common layer; wherein each of the light emitting layer not overlies each of the first electrodes to each other; at least a second common layer, formed on the plurality of light emitting layer; and at least one second electrode formed on the second layer together, wherein the plurality of sub-pixels around the three adjacent sub-pixels each composed of a pixel, and the shield wall surrounds only to each of the three adjacent sub-pixels, wherein the two sub-pixels.
  10. 10. —种像素结构,适用于全彩有机电致发光显示面板,该像素结构具有多个子像素,该多个子像素包含:至少一个第一电极,形成于基板上; 至少一个第一共同层,形成于该第一电极上; 至少一个屏蔽墙,形成于该第一电极的周围;多个发光层,分别形成于对应的各该子像素的该第一共同层上;其中, 各该发光层于各该第一电极之上不会互相覆盖;至少一个第二共同层,形成于该多个发光层上;以及至少一个第二电极,形成于该第二共同层上,其中该多个子像素的至少三个分别当作一第一区域、 一第二区域及一第三区域,且该屏蔽墙具有至少一第一部份、至少一第二部份与至少一第三部份,该第一部份分别对应设置于该第一区域及该第二区域、该第二部份分别对应设置于该第三区域的二侧、以及第三部份设置于该第一区域和第二区域的另一侧 10. - Structure kinds of pixels, for full-color organic electroluminescent display panel, the pixel structure having a plurality of sub-pixels, the plurality of sub-pixels comprising: at least one first electrode formed on the substrate; at least a first common layer, is formed on the first electrode; at least one shield wall, formed around the first electrode; a plurality of light emitting layers, are formed on each of the corresponding sub-pixels of the first common layer; wherein each of the light emitting layer not overlies each of the first electrodes to each other; at least a second common layer, formed on the plurality of light emitting layer; and at least one second electrode formed on the second layer together, wherein the plurality of sub-pixels at least three are used as a first region, a second region and a third region, and the shield wall having at least one first portion, at least a second portion and at least one third portion, the second a portion corresponding to the provided first region and the second region, the second portion disposed respectively corresponding to the two sides of the third region, and a third portion disposed in the first region and the second region The other side 并连接第一部份与第二部份。 And connecting the first portion and the second portion.
  11. 11. 一种全彩有机电致发光显示面板的制造方法,该方法包括: 形成第一电极于基板上; 形成多个屏蔽墙于该第一电极上; 形成至少一个第一共同层于该第一电极上;形成多个第一色彩次像素、多个第二色彩次像素和多个第三色彩次像素,于该第一共同层上,包括:提供至少一个第一色彩蒸镀源、至少一个第二色彩蒸镀源和至少一个第三色彩蒸镀源,通过该第一色彩蒸镀源、该第二色彩蒸镀源和该第三色彩蒸镀源独立的蒸镀倾斜方向和蒸镀角度与该多个屏蔽墙相配合,将至少一个第一色彩发光层、至少一个第二色彩发光层、至少一个第三色彩发光层个别地蒸镀于对应相同光色的该第一电极的上方,其中该第一色彩蒸镀源、该第二色彩蒸镀源和该第三色彩蒸镀源的第一蒸镀方向、第二蒸镀方向和第三蒸镀方向分别与该基板的表面呈第一倾斜角e,、第 A full color organic electroluminescence display panel manufacturing method, the method comprising: forming a first electrode on a substrate; a plurality of shield walls are formed on the first electrode; forming at least a first layer on the first common an upper electrode; a first plurality of color sub-pixels are formed, the plurality of second color sub-pixels and a plurality of third color sub-pixels, on the first common layer, comprising: providing at least a first color vapor deposition source, at least a second color at least a third vapor deposition source and the deposition source color, the first color by a vapor deposition source, the vapor deposition source and the second color and the third color independent evaporation source and vapor deposition oblique direction the angle of the plurality of mating shielding wall, at least a first color light emitting layer, at least a second color light emitting layer, at least a third color light emitting layer individually deposited over the first electrode corresponding to the same light color wherein the first vapor deposition source direction of the first color, the second color and the third color vapor deposition source of the vapor deposition source, the deposition direction and the second direction form a third vapor deposition surface of the substrate, respectively, and first inclination angle of e ,, 倾斜角62和第三倾斜角e3, 该第一倾斜角e,、该第二倾斜角02和该第三倾斜角03的角度范围为20度至80度或30度至70度;形成至少一个第二共同层,覆盖该多个第一色彩次像素、该多个第二色彩次像素和该多个第三色彩次像素;以及形成第二电极于该第二共同层上。 62 and the third inclination angle of the inclination angle e3, the first inclination angle of the second inclination angle e ,, 02 and the third angular range of the inclination angle 03 is 20 degrees to 80 degrees or 30 degrees to 70 degrees; forming at least one a second common layer covering the plurality of first color sub-pixels, the plurality of second color sub-pixel and the plurality of third color sub-pixels; and forming a second common electrode on the second layer.
  12. 12. 如权利要求11所述的制造方法,其中该基板上具有多个像素区域, 且各该像素区域由至少一个第一色彩次像素、至少一个第二色彩次像素和至少一个第三色彩次像素所组成。 12. The manufacturing method according to claim 11, wherein a plurality of pixel regions on the substrate, each of the pixel region and at least a first color sub-pixel, the at least one second color sub-pixel and at least one third color sub composed of pixels.
  13. 13. 如权利要求11所述的制造方法,其中该多个屏蔽墙的位置与该第一色彩蒸镀源、该第二色彩蒸镀源和该第三色彩蒸镀源的位置对应,该多个屏蔽墙的高度与该第一倾斜角e,、该第一倾斜角02和该第三倾斜角03对应, 以在各该像素区域内定义出至少一个第一色彩次像素区域、至少一个第二色彩次像素区域和至少一个第三色彩次像素区域。 13. The manufacturing method of claim 11, wherein the plurality of position of the shield wall of the first vapor deposition source color, the second color position corresponding vapor deposition source and the deposition source of the third color, the multi- a shield wall with the height of the first angle of inclination of the first inclination angle e ,, 02 and 03 corresponding to the third angle of inclination, at least a first color zone defining a sub-pixel in each pixel region, at least one of two color sub-pixel region and at least a third color sub-pixel region.
  14. 14. 如权利要求13所述的制造方法,其中该第一蒸镀方向、该第二蒸镀方向和该第三蒸镀方向分别到达各该像素区域内的该第一色彩次像素区域、 该第二色彩次像素区域和该第三色彩次像素区域内,以分别形成多个第一色彩发光层、多个第二色彩发光层和多个第三色彩发光层。 14. The manufacturing method according to claim 13, wherein the first vapor deposition direction, the second direction and the third vapor deposition directions reaches the first color sub-pixel region in each pixel region, the the second color sub-pixel regions and the third color sub-pixel areas, respectively form the plurality of first color light emitting layer, a plurality of second color light emitting layer and a plurality of third color light emitting layer.
  15. 15. 如权利要求11所述的制造方法,其中该第一蒸镀方向、该第二蒸镀方向和该第三蒸镀方向两两之间于该基板上的投影分别具有第一夹角e12、 第二夹角923及第三夹角e31。 15. The manufacturing method according to claim 11, wherein the first vapor-deposited between any two directions, the second and the third vapor deposition direction to the projection direction on the substrate, each having a first angle e12 , the second angle and the third angle 923 e31.
  16. 16. 如权利要求15所述的制造方法,其中该第一夹角e12、该第二夹角023及该第三夹角631大于或等于90度。 16. The manufacturing method according to claim 15, wherein the first angle E12, the second angle 023 and the third angle 631 is greater than or equal to 90 degrees.
  17. 17. 如权利要求11所述的制造方法,其中形成该屏蔽墙的高度为10微米至500微米。 17. The manufacturing method according to claim 11, wherein the shield wall is formed a height of 10 to 500 microns.
  18. 18. 如权利要求11所述的制造方法,其中形成该屏蔽墙的宽度为高度的30%至100%。 18. The manufacturing method according to claim 11, wherein the width of the shielding wall is formed to a height of 30-100%.
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