CN100456177C - Gas path controlling method for chip etching equipment - Google Patents
Gas path controlling method for chip etching equipment Download PDFInfo
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- CN100456177C CN100456177C CNB2005101264559A CN200510126455A CN100456177C CN 100456177 C CN100456177 C CN 100456177C CN B2005101264559 A CNB2005101264559 A CN B2005101264559A CN 200510126455 A CN200510126455 A CN 200510126455A CN 100456177 C CN100456177 C CN 100456177C
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- valve
- gas path
- gas
- value
- total valve
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
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Abstract
The present invention relates to a gas path controlling method for chip etching equipment, which is provided with a counter of which the initial value is zero. The counter is used for counting the current gas path in the opening state, and a master valve is controlled to be opened and closed according to whether the value of the counter is zero. A switch mark is arranged for each gas path, and the state of each switch mark is in the closed state. When one gas path is opened, the value of the counter is increased by 1, the switch mark thereof is in the opening state, and simultaneously, the master valve is opened. When the gas path is closed, the switch mark of the gas path is judged; the switch mark is arranged into the closing state if in the opening state, and the value of the counter is reduced by 1; the value of the current counter is not changed if the switch mark is in the closing state. Whether the value of the counter is zero is judged; if the value is zero, the master valve is closed, and however, the value is not zero, the master valve is not closed.
Description
Technical field
The present invention relates to field of semiconductor manufacture, specifically, relate to the control method of gas circuit in a kind of chip etching equipment.
Background technology
In the process of semiconductor technology etching, etching apparatus can relate to a lot of gas circuits, and each road gas has flow controller and by-pass valve control separately, and all gas circuits have a total by-pass valve control.Because the management valve of each gas circuit and total valve logic more complicated,, designed this gas path control method for the folding of the flow of accurate each gas circuit of control of safety and valve and to the action of total valve.
Summary of the invention
(1) technical matters that will solve
The control method that the purpose of this invention is to provide gas circuit in a kind of chip etching equipment.
(2) technical scheme
In order to achieve the above object, the present invention takes following scheme: chip etching equipment of the present invention comprises an industrial computer and a controlled hardware system that is connected with this industrial computer of having stored control program, this controlled hardware system comprises a plurality of gas circuits, each gas circuit all has independent flow controller and by-pass valve control, all gas circuits are controlled by a total valve, this industrial computer is used for executive control program, and the entire work process of controlled hardware system controlled, the original state of described total valve is for closing, the by-pass valve control original state of described each gas circuit the present invention includes following steps for closing:
A total valve state parameter is set, and this parameter has an initial value, and when described arbitrary gas path control valve door was opened, described total valve state parameter added one; When described arbitrary gas path control valve door was closed, described total valve state parameter subtracted one, and when the value of described total valve state parameter became initial value, described total valve was closed, and the rule change of described total valve state parameter is as follows,
When the state of arbitrary gas circuit becomes when opening by closing, then the total valve parameter is done once reversible computing;
When the state of arbitrary gas circuit becomes when closing by opening, then the total valve parameter is done the inverse operation of above computing.
Wherein, comprise that also described total valve parameter is that an initial value is zero counter, when the state of arbitrary gas circuit becomes when opening by closing, counter is corresponding to add one, and when the state of arbitrary gas circuit becomes when closing by opening, counter subtracts one.
(3) beneficial effect
Compared with the prior art, owing to adopt above scheme, the present invention has guaranteed the consistance to all gas circuit operations, (etching apparatus is the equipment that security requirement is very high, apparatus expensive, there is toxic gas inside), increased the security of personnel and equipment.
Description of drawings
Fig. 1 is an air-channel system structural drawing of the present invention;
Fig. 2 is a gas circuit control flow chart of the present invention.
Embodiment
With reference to Fig. 1, every gas circuit all by an air intake opening, manually operated control valve, pressure transducer, two valves, a mass flow controller is formed, and is example with article one gas circuit, gas can enter gas circuit by air intake opening 1, open manual control valve 11, gas after pressure is normal, is opened valve 31 by pressure transducer 21, gas enters mass flow controller 41, the gas that feeds arrives a certain amount of the time, opens valve 51, and gas enters total valve 30;
With reference to figure 2, the gas circuit control flow is as follows: an initial value is set is zero counter, be used for whether the current gas circuit that is in open mode is counted and be zero to control the opening and closing of total valve according to the numerical value of this counter, the steps include:
For each gas circuit is provided with a switch sign, the original state of this switch sign is for closing, and when opening one road gas, counter increases one, and its switch sign state of being changed to out is opened total valve simultaneously;
When adjusting the gas flow of gas circuit, do not change the value of the switch sign state sum counter of gas circuit;
When closing gas circuit, the switch sign of gas circuit is judged, for opening state, then be set to off status and counter subtracts one, be off status, then keep not changing current counter values;
Judge whether counter values is zero, if zero, then close total valve, if non-vanishing, then do not close total valve.
Claims (1)
1. the control method of gas circuit in the chip etching equipment, described chip etching equipment comprises an industrial computer and a controlled hardware system that is connected with this industrial computer of having stored control program, this controlled hardware system comprises a plurality of gas circuits, each gas circuit all has independent flow controller and by-pass valve control, all gas circuits are controlled by a total valve, this industrial computer is used for executive control program, and the entire work process of controlled hardware system controlled, the original state of described total valve is for closing, the by-pass valve control original state of described each gas circuit is characterized in that for closing described method comprises the steps:
A total valve state parameter is set, and this parameter has an initial value, and when described arbitrary gas path control valve door was opened, described total valve state parameter added one; When described arbitrary gas path control valve door was closed, described total valve state parameter subtracted one, and when the value of described total valve state parameter became initial value, described total valve was closed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005101264559A CN100456177C (en) | 2005-12-09 | 2005-12-09 | Gas path controlling method for chip etching equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005101264559A CN100456177C (en) | 2005-12-09 | 2005-12-09 | Gas path controlling method for chip etching equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1848005A CN1848005A (en) | 2006-10-18 |
| CN100456177C true CN100456177C (en) | 2009-01-28 |
Family
ID=37077599
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2005101264559A Active CN100456177C (en) | 2005-12-09 | 2005-12-09 | Gas path controlling method for chip etching equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100456177C (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109654773A (en) * | 2019-02-13 | 2019-04-19 | 格力电器（合肥）有限公司 | Air conditioner outdoor unit recovery system and method for preventing refrigerant leakage |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08292971A (en) * | 1994-12-09 | 1996-11-05 | Tokyo Gas Co Ltd | Block extracting method and block altering method for duct |
| CN1182874A (en) * | 1996-11-14 | 1998-05-27 | 回宇志 | Self-controlled diaphragm type combustion gas flow meter |
| CN1272623A (en) * | 2000-06-14 | 2000-11-08 | 北京三金智能仪表有限公司 | Measuring and controlling method of gas meter and its device |
-
2005
- 2005-12-09 CN CNB2005101264559A patent/CN100456177C/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08292971A (en) * | 1994-12-09 | 1996-11-05 | Tokyo Gas Co Ltd | Block extracting method and block altering method for duct |
| CN1182874A (en) * | 1996-11-14 | 1998-05-27 | 回宇志 | Self-controlled diaphragm type combustion gas flow meter |
| CN1272623A (en) * | 2000-06-14 | 2000-11-08 | 北京三金智能仪表有限公司 | Measuring and controlling method of gas meter and its device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1848005A (en) | 2006-10-18 |
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Address after: No. 8, Wenchang Avenue, Beijing economic and Technological Development Zone, 100176 Patentee after: Beijing North China microelectronics equipment Co Ltd Address before: 100016 Jiuxianqiao East Road, Chaoyang District, Chaoyang District, Beijing Patentee before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing |
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