CN100454472C - Black pasty composition and plasma display panel of black pattern formed therewith - Google Patents
Black pasty composition and plasma display panel of black pattern formed therewith Download PDFInfo
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- CN100454472C CN100454472C CNB021574391A CN02157439A CN100454472C CN 100454472 C CN100454472 C CN 100454472C CN B021574391 A CNB021574391 A CN B021574391A CN 02157439 A CN02157439 A CN 02157439A CN 100454472 C CN100454472 C CN 100454472C
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D17/00—Pigment pastes, e.g. for mixing in paints
- C09D17/004—Pigment pastes, e.g. for mixing in paints containing an inorganic pigment
- C09D17/007—Metal oxide
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D17/00—Pigment pastes, e.g. for mixing in paints
- C09D17/002—Pigment pastes, e.g. for mixing in paints in organic medium
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Abstract
PURPOSE: To provide a black paste component having low contact resistance between a white layer part of a bus electrode, having a dual layer structure of white layer and black layer, and a transparent electrode (ITO layer) after calcination, and high degree of blackness of a panel, capable of forming a calcinated layer without yellowing. CONSTITUTION: A fundamental first mode of a photo-curing component is a black paste component used for a black pattern of a plasma display panel containing (A) heat resistant black pigment, (B) conductive powder except silver, and (C) organic binder. The second mode contains (D) photopolymerizing monomer and (E) start of photopolymerization in addition to the above components. Further, the third mode contains (E) inorganic fine particles in addition to the above components.
Description
Technical field
The present invention relates to a kind of on the front substrate of plasma display panel (being designated hereinafter simply as PDP), forming fine electrode circuit and the useful black paste composition of black matrix, especially, relate to alkali developable and for the black paste composition of light-cured type and have with its formation the bus electrode of white black two-layer structure black layer (lower floor), the PDP of the front substrate that forms black matrix is equipped with.
Background technology
PDP is for utilizing the luminous flat display board that image and information are shown that is produced by plasma discharge, can be divided into DC type and AC type according to the difference of display panel structure, driving method.The displaying principle of color is among the PDP: in the space, two interelectrode chambers (discharge space) in opposite directions that forms in separated front glass substrate in next door (rib rib) and back side glass substrate, produce plasma discharge, the fluorophor that forms with the ultraviolet ray excited inner face of glass substrate overleaf of the discharge generation by being sealed in the gases such as He, Xe in each space, chamber, thus 3 primary colors visible lights produced.In DC type PDP, each space, chamber is divided with grid-like next door, and in the PDP of AC type, uses the next door that is arranged in parallel with real estate spaced apart, and in these two kinds, all realize by the next door at the interval in space, chamber.Carry out simple declaration with reference to the accompanying drawings.
Fig. 1 has partly represented the structure example of face discharge mode PDP of 3 electrode structures of panchromatic demonstration.In front glass substrate 1 below, establish multiple row by the transparency electrode 3a of discharge usefulness or 3b and for the bus electrode 4a of the line resistance that reduces this transparency electrode or a pair of show electrode 2a, the 2b that 4b constitutes with institute determining deviation row.At these show electrodes 2a, above the 2b, be formed with the transparency dielectric layer 5 (low-melting glass) that is used to accumulate electric charge by printing, sintering, evaporation protective layer (MgO) 6 above it.Protective layer 6 has the protection show electrode, keeps effects such as discharge condition.On the other hand, overleaf glass substrate 11 above, the address electrode (data electrode) 13 that disposes in the strip next door 12 of separating discharge space and each discharge space is established a plurality of with the determining deviation row of institute.In addition, at the inner face of each discharge space, dispose the fluorescent membrane of 3 primary colors of red (14a), blue (14b), green (14c) regularly.In panchromatic demonstration, as mentioned above,, constitute 1 pixel with fluorescent membrane 14a, 14b, the 14c of 3 red, blue, green primary colors.
In addition, in a pair of show electrode 2a that forms discharge space, the both sides of 2b,, form the black matrix 10 of tape shape equally in order further to improve the contrast of image.
In the PDP of said structure, between a pair of show electrode 2a, 2b, apply the pulse voltage of interchange, owing between the electrode on the same substrate, discharge, therefore be referred to as " face discharge mode ".
In addition, in the PDP of said structure, it is configured to: fluorescent membrane 14a, 14b, the 14c of the ultraviolet ray excited back substrate 11 that produces by discharge see through the transparency electrode 3a of front substrate 1, the visible light that 3b sees generation.
In the PDP of said structure, in the past, the formation of above-mentioned bus electrode 4a, 4b was by after 3 layers of Cr-Cu-Cr are carried out evaporation and spatter film forming, formed pattern with photolithography.
But, because process number is many, cost is high, after employing is carried out screen painting to electric conductivity pastes such as silver pastes recently, the method of sintering, or, be coated with the photoelectric sensitivity conductive pastel in order to form the live width below the 150 μ m, after exposing by photomask, develop, carry out the method for sintering subsequently.
On the front substrate of the PDP that forms bus electrode 4a, 4b like this, in recent years, in order to improve the contrast of picture, when forming bus electrode, on as the lower floor that shows side (with the contacted layer of transparency electrode 3a, 3b), printing contains the black pastel of black pigment and electroconductive powder, sticks with paste with silver thereon and forms white layer, and the method that forms white black two-layer structure electrode is opened in the flat 4-272634 communique open the spy.Wherein, above-mentioned black pastel uses the resin combination that is combined with ruthenium compound.
But ruthenium compound is the low black pigment of resistance value, and this material price is very expensive, when using as black pigment, exists the problem of cost aspect.
On the other hand,, consider that from aspects such as conductivity, processability, prices silver powder is the most effective, therefore be extensive use of as electroconductive powder.But, the black pastel that contains silver powder, when ITO layer (transparency electrode) is gone up the bus electrode that forms white black two-layer structure, the bus electrode degree of blackness of seeing from picture frame layer behind the sintering partly descends, the silver hair of the part that contacts with base material is given birth to diffusion, causes the problem of the glass substrate generation xanthochromia that falls from the ITO pull-up.
In addition, contain the black pastel of silver powder, also can be used as the black matrix material and use.But, because black matrix is not to be difficult on the ITO of flavescence, but is easy to the making on glass of flavescence, even there is a spot of silver-colored composition in the black pastel, diffusing glass substrate and dielectric by silver also are easy to flavescence, have the tendency that the yellow chromaticity that makes picture integral body raises significantly.Therefore, contain the black pastel of silver powder, can't satisfy as the required characteristic of black matrix material.
Summary of the invention
Therefore, the present invention is in order to solve the existing problem of conventional art, its main purpose is to provide a kind of black paste composition, to make deceiving in vain in the bus electrode of two-layer structure behind sintering, the contact resistance of white layer segment and transparency electrode (ITO layer) is low, the degree of blackness height of display panel, and the sintering that can form not flavescence films has outstanding economy.
Another object of the present invention is to, a kind of PDP is provided, it has: the high meticulous black pattern that is formed by this black paste composition, specifically, substrate forms on the bus electrode of white black two-layer structure in front, it is low and have black layer (lower floor) telegraph circuit of enough degree of blackness, the front substrate with black matrix of enough blackness to form contact resistance.
Inventors of the present invention, carried out wholwe-hearted research in order to address the above problem, found that: choose the thermal endurance black pigment that has excellent tone behind the sintering by combination, to glass baseplate and the electrolyte coloring is little and resistance value is low electroconductive powder, solve this problem, thereby finished the present invention.
Promptly the invention provides a kind of black paste composition, it is characterized in that, the electroconductive powder that black paste composition of the present invention contains beyond (A) thermal endurance black pigment, (B) desilver reaches (C) organic bond; Its second form is also to contain (D) photopolymerization monomer and reach (E) Photoepolymerizationinitiater initiater except mentioned component; Its 3rd form is also to contain (E) inorganic particles except mentioned component.
Description of drawings
Fig. 1 is the part exploded perspective view of the AC type PDP of face discharge mode.
Embodiment
In black paste composition of the present invention, owing in PDP substrate manufacture process, to accompany by 500～600 ℃ high temperature sintering, so thermal endurance black pigment (A) uses the inorganic pigment that at high temperature has tone stability.
Specifically, comprise the oxide of Cr, Co, Cu, Ni, Fe, Mn etc. and composite oxides etc., but be not limited to these materials, can be used singly or two or more kinds in combination.
Especially, in the present invention, because copper-chromium is that black composite oxide, copper-iron are the black coating film densification that forms behind the sintering such as black composite oxide, cobaltosic oxide, and tone is very good, therefore preferred the use.
In addition, the average grain diameter of above-mentioned thermal endurance black pigment (A) is below the 5 μ m, and preferably using average grain diameter is the above particulate of 0.05 μ m.If average grain diameter is also bigger than 5 μ m, then the sintering degree of blackness of filming reduces easily, should not select for use.
In addition, be below the 5 μ m with maximum particle diameter, average grain diameter is that the cobaltosic oxide of 0.1～2 μ m is scattered in formed slurry in the solvent equably, the pastel that can be used as no secondary agglutinator uses.
This slurry can be modulated into by thermal endurance black pigments such as cobaltosic oxide are evenly dispersed in the solvent.For example, use mixer such as ball mill that solvent, dispersant and cobaltosic oxide are mixed fully to disperse and be modulated into.
Solvent used in above-mentioned slurry can at random be selected, but in order to prevent the conflict of solvent, and is preferably identical with the solvent species that uses in the pastel.In addition, the concentration of slurry can at random be selected, but considers operation etc., is preferably 50～80%.
In addition, the dispersant that uses in the described slurry does not limit especially, as long as can disperse the thermal endurance black pigment equably, for example, macromolecule dispersing agents such as Japanese grease system マ リ ア リ system シ リ one ズ etc.
For the organic bond (C) of 100 weight portions, the use level of this thermal endurance black pigment is suitably 0.5～100 weight portion, is preferably 5～50 weight portions.Its reason is, if the use level of thermal endurance black pigment is also littler than above-mentioned scope, then can't obtain enough blackness behind the sintering, on the other hand, if use level surpasses above-mentioned scope, the permeability deterioration of light then, resolving power descends.
In black paste composition of the present invention, electroconductive powder (B) beyond the desilver can use the no discolouration of electroconductive powder self, and the electroconductive powder to glass substrate or dielectric do not have coloring for example can use to be selected from Au, Pt, Cu, Ni, SnO
2, the SnO that mixes up of ITO, metal
2, indium oxide, ruthenium compound, TiB
2, LaB
6At least a Deng among lanthanum compound, lanthanium complex oxide, yttrium composite oxides, the bismuth composite oxide.
In above-mentioned electroconductive powder, especially, preferably do not have discolouration and coloring, and himself have black, the electroconductive powder that resistance value is low.
As the electroconductive powder that satisfies these conditions, it comprises SnO
2, the SnO that mixes up of ITO, metal
2, ruthenium compound, TiB
2, LaB
6Deng lanthanum compound, lanthanium complex oxide, yttrium composite oxides, bismuth composite oxide etc.
By using these electroconductive powders, when being used for bus electrode, can not make the degree of blackness deterioration, when using, can not make its flavescence as the black template die, can obtain enough degree of blackness.Consequently, after the panelization, do not produce briliancy and descend and the irregular problem of the luminous depth, obtained bigger driving margin, make the contrast of preparation picture improve, the display panel that does not produce xanthochromia becomes possibility.
The average grain diameter that this conductive powder (B) uses is below the 10 μ m, and preferably using average grain diameter is the particulate of 0.05 μ m～10 μ m.Its reason is, if the size ratio of electroconductive powder 10 μ m are also big, and when then forming electrode line style pattern (ラ イ Application パ one Application), the linearity deterioration of line style pattern, the line style pattern expands easily during sintering, produces the short circuit of electrode and directly discharge sometimes.On the other hand, if average grain diameter less than 0.05 μ m, then there is following situation: compare with thickness behind the sintering of the black layer of the bus electrode of white black two-layer structure, it is very little to become, be difficult to obtain the white layer segment of bus electrode and the conducting of transparency electrode (ITO layer), contact resistance value becomes and is not very low.
In this respect, if the average grain diameter of electroconductive powder is also littler than 10 μ m, when then forming electrode line style pattern, then the linearity of line style pattern is not produced infringement, and the white layer segment of bus electrode and transparency electrode (ITO layer) conducting, contact resistance is reduced.
For the thermal endurance black pigment (A) of 100 weight portions, the use level of this electroconductive powder (B) is 0.05～300 weight portion, is preferably 0.1～200 weight portion.Its reason is, if the use level of electroconductive powder is littler than above-mentioned scope, the contact resistance value behind the sintering can't descend significantly.On the other hand, if surpass above-mentioned scope, then for the use level of thermal endurance black pigment, the use level of electroconductive powder is too much, so the degree of blackness deterioration.
In black paste composition of the present invention, above-mentioned organic bond (C) is not particularly limited, and can use anyly to contain the resin of carboxyl or itself be to have the photoresist that contains carboxyl of ethylenical unsaturated double bonds and do not contain the resin that contains carboxyl of ethylenical unsaturated double bonds.The suitable resin of selecting for use (can for oligomer and high polymer arbitrary) is following listed.
(1) resin that contains carboxyl by (a) unsaturated carboxylic acid and the compound copolymerization that (b) contains unsaturated double-bond are obtained
(2) in the copolymer of (a) unsaturated carboxylic acid and the compound that (b) contains unsaturated double-bond, introduce the photosensitive resin that contains carboxyl that the olefinic unsaturated group obtains as side group
(3) make (a) unsaturated carboxylic acid and (c) contain the compound of epoxy radicals and unsaturated double-bond and (b) contain the copolymer reaction of the compound of unsaturated double-bond, the secondary hydroxyl that makes (d) multi-anhydride and generation reacts and the photoresist that contains carboxyl that obtains
(4) make (f) to contain the photoresist that contains carboxyl that the compound of hydroxyl obtains with the copolymer reaction that (e) contains the acid anhydrides of unsaturated double-bond and the compound that (b) contains unsaturated double-bond
(5) make (f) to contain the photoresist that contains carboxyl that the compound of hydroxyl and unsaturated double-bond obtains with the copolymer reaction that (e) contains the acid anhydrides of unsaturated double-bond and the compound that (b) contains unsaturated double-bond.
(6) make (g) epoxy compounds and (h) unsaturated monocarboxylic reaction, the secondary hydroxyl that makes (d) multi-anhydride and generation reacts and the photoresist that contains carboxyl that obtains
(7) make the epoxy reaction that contains 1 carboxyl in (i) 1 molecule and do not contain the organic acid of ethylenical unsaturated double bonds and the copolymer of the compound that (b) contains unsaturated double-bond and (methyl) glycidyl acrylate, the secondary hydroxyl that makes (d) multi-anhydride and generation reacts and the resin that contains carboxyl that obtains
The resin that contains carboxyl that (d) multi-anhydride is obtained with (j) containing the polymer reaction of hydroxyl
(9) make (d) multi-anhydride and the resin that contains carboxyl that the polymer reaction that (j) contains hydroxyl obtains, further make it the photoresist that contains carboxyl that obtains with the compound reaction that (c) contains epoxy radicals and unsaturated double-bond.
The above-mentioned resin that contains the photoresist of carboxyl and contain carboxyl can use or mix use separately, but under any circumstance, the cooperation total amount of these materials is preferably 10～80 weight % of total composition.If compare with above-mentioned scope, when the use level of these polymer is very few, then form film in the distribution of the above-mentioned resin heterogeneity that becomes easily, be difficult to obtain the enough photo-curables and the photocuring degree of depth, thereby be difficult to form pattern by exposure, the development selected.On the other hand, if compare with above-mentioned scope, its use level is too much, then be easy to generate during sintering pattern crook and live width is shunk, be worthless therefore.
In addition, all preferably to use weight average molecular weight be 1,000～100 to the above-mentioned resin that contains the photoresist of carboxyl and contain carboxyl, 000, preferred 5,000～70,000, acid number is 50～250mgKOH/g, in addition, and when when containing the photoresist of carboxyl, its pair key equivalent is 350～2,000, preferred 400～1,500 material.When the molecular weight ratio 1,000 of above-mentioned resin was low, the adaptation that can film when developing produced harmful effect, on the other hand, when higher than 100,000, is easy to generate poor visualization, is worthless therefore.In addition, when acid number was lower than 50mgKOH/g, it was to the dissolubility deficiency of aqueous alkali, be easy to generate poor visualization, on the other hand, when acid number is higher than 250mgKOH/g, produce the film deterioration of adaptation and the dissolving of photocuring portion (exposure portion) during development, therefore inadvisable.And then when when containing the photoresist of carboxyl, if two key equivalent proportions 350 of photoresist are little, then easy residual during sintering have a residue, on the other hand, if bigger than 2,000, the abundant intensity of operation narrows down when then developing, and needs high exposure during photocuring, and is therefore inadvisable.
In the present invention, photopolymerization monomer (D) is used to promote the photo-curable of composition and improves development.Photopolymerization monomer (D) comprising: acrylic acid 2-hydroxyl ethyl ester for example, acrylic acid 2-hydroxypropyl acrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, polyethyleneglycol diacrylate, poly-urethane diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, tetramethylol methane tetraacrylate, trimethylolpropane ethylene oxide modification triacrylate, trimethylolpropane propylene oxide modification triacrylate, dipentaerythritol five acrylate, dipentaerythritol acrylate reaches and corresponding each methyl acrylic ester of aforesaid propylene acid esters; Polyacids such as phthalic acid, adipic acid, maleic acid, itaconic acid, butanedioic acid, trimellitic acid, terephthalic acid (TPA) and hydroxyalkyl (methyl) acrylate single, two, three or above polyester etc., but be not limited to specific material, and these materials can use separately or 2 be used in combination more than heavy.In these photopolymerization monomers, preferably in 1 molecule, contain the acryloyl group more than 2 or the polyfunctional monomer of methacryl.
The use level of above-mentioned photopolymerization monomer (D), for the above-mentioned organic bond of 100 weight portions (contain the photoresist of carboxyl and/or contain the resin of carboxyl), its suitable use level is 20～100 weight portions.When the use level of photopolymerization monomer (D) than above-mentioned scope hour, the enough photo-curables of composition are difficult to obtain, on the other hand, if surpass above-mentioned scope, its use level more for a long time, then, because it is fast that photocuring is compared in the surface element of filming and deep, therefore be easy to generate the curing inhomogeneities.
The instantiation of above-mentioned Photoepolymerizationinitiater initiater (E) comprising: benzoin and benzoin alkylether classes such as benzoin, benzoin methylether, benzoin ethyl ether, benzoin iso-propylether; Acetophenone, 2,2-dimethoxy-2-phenyl acetophenone, 2,2-diethoxy-2-phenyl acetophenone, 1, acetophenones such as 1-dichloroacetophenone; 2-methyl isophthalic acid-[4-(methyl mercapto) phenyl]-2-morpholinyl propane-1-ketone, 2-benzyl-2-methylamino-1-(4-morpholinyl phenyl)-aminoacetophenone classes such as butanone-1; Anthraquinone classes such as 2-methylanthraquinone, 2-EAQ, 2-tert-butyl group anthraquinone, 1-chloroanthraquinone; 2,4-dimethyl thioxanthones, 2,4-diethyl thioxanthone, 2-clopenthixal ketone, 2, thioxanthene ketones such as 4-diisopropyl thioxanthones; Ketal classes such as acetophenone dimethyl ketal, benzyldimethylketal; Benzene two ketones such as benzene diketone; Or xanthene ketone; (2,6-dimethoxy benzoyl)-2,4,4-amyl group phosphine oxide, two (2,4, the 6-trimethylbenzoyl)-phenyl phosphine oxide, 2,4,6-trimethylbenzoyl diphenyl phosphine oxide, ethyl-2,4, phosphinoxides such as 6-trimethylbenzoyl phenyl phosphide; Various peroxides etc., these known Photoepolymerizationinitiater initiaters commonly used can use separately or be used in combination more than 2 kinds.(C), the suitable use level of these Photoepolymerizationinitiater initiaters (E) is 1～30 weight portion, preferred 5～20 weight portions for the above-mentioned organic bond of 100 weight portions (contain the photoresist of carboxyl and/or contain the resin of carboxyl).
In addition, above-mentioned Photoepolymerizationinitiater initiater (E) also can with N, N-dimethyl ethyl aminobenzoate, N, being used in combination more than a kind or 2 kinds of the light sensitizer of tertiary amines such as N-dimethylaminobenzoic acid isopentyl ester, amyl group-4-dimethylaminobenzoic acid ester, triethylamine, triethanolamine.
In addition, when requiring the photocuring degree of depth darker, can be that Photoepolymerizationinitiater initiater, white dyestuff etc. are used in combination as auxiliary curing agent with the two luxuriant titaniums such as Irgacure-84 that in the visible region, cause the Ciba Speciality Chemicals corporate system of radical polymerization in case of necessity.
In addition, when requiring photocuring hardness darker, can and use hot polymerization catalyst and above-mentioned Photoepolymerizationinitiater initiater (E) in case of necessity.This hot polymerization catalyst is for through about a few minutes to 1 hour, pass through high temperature ageing, make the material of uncured photopolymerization monomer reaction, specifically, it is peroxide such as benzoyl peroxide, azo-compounds such as azodiisobutyronitrile etc., preferred 2,2 '-azodiisobutyronitrile, 2,2 '-azo two (2-methylbutyronitrile), 2,2 '-azo two (2,4-two valeronitriles), 1 '-azo two (the own nitrile of 1-chlorine), dimethyl-2,2 '-azo-bis-isobutyrate, 4,4 '-azo two (4-cyanopentanoic acid), 2-methyl-2,2 '-azo, two propionitrile, 2,4-dimethyl-2,2,2 ', 2 '-azo, two valeronitriles, 1,1 '-azo two (1-acetoxyl group-1-vinylbenzene), 2,2,2 ', 2 '-azo two (2-methylbutyryl amidoxime) dichloride etc., preferred example is a no cyano group free from environmental pollution, 1 of halogen type, 1 '-azo two (1-acetoxyl group-1-vinylbenzene).
Composition of the present invention, can cooperate softening point in case of necessity is 400～600 ℃ inorganic particles such as glass powder, SiO 2 powder, its content with the rerum natura of not damaging black paste composition of the present invention cooperates.
Owing to can improve behind the sintering adaptation with conductor circuit, therefore for the thermal endurance black pigment (A) of 100 weight portions, can add 500 weight portions following, be preferably the following glass powder of 300 weight portions.Preferably, the glass transition temperature of this glass powder (Tg) is 300～500 ℃, and glass softening point (Ts) is 400～600 ℃.In addition, consider that from image dissection degree aspect preferably using average grain diameter is below the 10 μ m, more preferably use the following glass powder of 5 μ m.
By in the black paste composition, adding above-mentioned glass powder, exposure, filming after developing at just sintering easily below 600 ℃.But, owing to used the good organic bond of flammability in the composition of composition of the present invention, and adhesive is deviate to finish before the glass powder fusion, therefore, if the softening point of glass powder is lower than 400 ℃, under than the low temperature of this temperature, produce fusion, encase organic bond easily, because remaining organic bond decomposes, in composition, form bubble easily, be worthless therefore.
As glass powder, the suitable use with the amorphism frit as main component such as lead oxide, bismuth oxide, lithia or zinc oxide.
When cooperating a large amount of inorganic fillers and glass powder in the black paste composition, its storage stability deterioration of resultant composition, because gelation and mobile decline, the coating operability has the tendency of deterioration.Therefore, in order to improve the storage stability of composition, preferably in composition of the present invention, add and have and form complex compound as the metal of inorganic filler and glass powder composition or oxide powder or form the compound of effects such as salt as stabilizer.
As stabilizer, it comprises various inorganic acids such as nitric acid, sulfuric acid, hydrochloric acid, boric acid; Various organic acids such as malonic acid, adipic acid, formic acid, acetate, acetoacetate, citric acid, stearic acid, maleic acid, fumaric acid, phthalic acid, benzene sulfonic acid, sulfamic acid; Acid such as various phosphate cpds (inorganic phosphate, organic phospho acid) such as phosphoric acid, phosphorous acid, hypophosphorous acid, methyl orthophosphoric acid, etherophosphoric acid, butylphosphoric acid ester, phenyl phosphate, phosphorous acid ethyl ester, phosphorous acid diphenyl ester, list (2-methacryloxyethyl) phosphate ester acid can be used separately or be used in combination more than 2 kinds.For above-mentioned glass powder of 100 weight portions and inorganic particles (F), the adding proportion of this stabilizer is preferably 0.1～10 weight portion.
The especially preferably synthetic amorphous silica micropowder of SiO 2 powder, its instantiation is the AEROSIL (registered trade mark) 50 that Japanese AEROSIL (strain) makes, 130,200,200V, 200CF, 200FAD, 300,300CF, 380, OX50, TT600, MOX80, MOX170, COK84, Nipsil (registered trade mark) AQ that Japan's Silica industry (strain) is made, AQ-S, VN3, LP, L300, N-300A, ER-R, ER, RS-150, ES, NS, NS-T, NS-P, NS-KR, NS-K, NA, KQ, KM, DS etc., these materials can use separately or be used in combination more than 2 kinds.Wherein, preferred primary particle size is 5～50nm, and specific area is 50～500m
2The material of/g.
Above-mentioned synthetic amorphous silica micropowder is added in the above-mentioned Photocurable resin composition, and in sintering circuit, it plays the effect of aggregate, the distortion in the time of can suppressing sintering.
In the present invention, for the viscosity adjustment that is implemented in pastel in the painting process and make by drying and forming-film and contact exposure and become possibility, can cooperate organic solvent as diluent.Specifically comprise: ketones such as methylethylketone, cyclohexanone; Arenes such as toluene, dimethylbenzene, durol; Glycol ethers such as cellosolve, methyl cellosolve, carbitol, methyl carbitol, butyl carbitol, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, DPG list ether, Triethylene glycol ethyl ether; Acetate esters such as ethyl acetate, butyl acetate, cellosolve acetate, butyl cellosolve acetate, carbitol acetic acid esters, acetate of butyl carbitol, propylene glycol methyl ether acetate; Alcohols such as ethanol, propyl alcohol, ethylene glycol, propylene glycol, terpineol; Aliphatic hydrocarbon such as octane, decane; Oil series solvents such as benzinum, naphtha, hydrotreated naphtha, solvent naphtha, these materials can use separately or be used in combination more than 2 kinds.
In case of necessity, black paste composition of the present invention can further cooperate froth breaking, levelling agents such as silicon system, acrylic acid series, is used to improve other additives such as silane coupling agent of adaptation of filming.In addition, in case of necessity, can further add known antioxidant commonly used, when being used to improve thermal polymerization inhibitor, the sintering of thermal stability when preserving as with particulates such as the metal oxide of the binding constituents of substrate, silica, boron oxide.
Black paste composition of the present invention, its form can be pasty state, or on film of synthetic resin such as PET film forming and form membranaceous.For being pre-formed membranaceous situation, can be laminated on the substrate.And for paste composition, can scrape Tu method, scraper plate with silk screen print method, coiling rod scrapes suitable coating process such as Tu method it is applied to substrate, for example become on the glass substrate of PDP front substrate, subsequently, in order to obtain dry to touch, with heated air circulation type drying oven, far infrared drying stove etc., under about 60～120 ℃ temperature, dry about 5～40 minutes, thus with organic solvent evaporation, obtain filming of dry to touch., selectively expose, development, sintering thereafter, thus form decide telegraph circuit, the black matrix of pattern.
As exposure process, the negative mask of can apparatus deciding exposing patterns to some extent carries out contact exposure and noncontact exposure.As exposure light source, can use Halogen lamp LED, high-pressure mercury-vapor lamp, laser, metal halide lamp, black light lamp, electrodeless lamp etc.Preferred 50～the 1000mJ/cm of exposure
2
Developing procedure can use spraying process, infusion process etc.Developer solution can use the metal alkaline aqueous solution such as NaOH, potassium hydroxide, sodium carbonate, potash, sodium metasilicate, amine aqueous solutions such as monoethanolamine, diethanol amine, triethanolamine, preferred especially working concentration is about 1.5 quality % or less than the dilute alkaline aqueous solution of 1.5 quality %, the carboxyl of resin that contains carboxyl in the composition is by saponification, can remove uncured portion (unexposed portion), developer solution is not limited to above-mentioned substance.In addition, the back of developing is preferably washed or the acid neutralization in order to remove developer solution not.
In sintering circuit, the substrate after developing in air or in the nitrogen atmosphere gas, is carried out about 400～600 ℃ heat treated, form the desired pattern that obtains.Preferably, Ci Shi programming rate is set in below 20 ℃/minute.
In addition, in black paste composition of the present invention, when the non-photosensitive composition does not contain photopolymerization monomer (D) and Photoepolymerizationinitiater initiater (E), can adopt etching to form black pattern by resist is set.Especially, for electrode, can adopt the method for in white layer exposure, development, black layer being developed with white black two-layer structure.
Embodiment
Below in conjunction with embodiment the present invention is specifically described, but the present invention is not limited to following examples.Below " part " in the explanation if there is not special instruction, all is a weight portion.
Synthesis example 1
In the flask that is equipped with thermometer, mixer, dropping funel and reflux cooler, mol ratio by 0.87: 0.13, pack into methyl methacrylate and methacrylic acid, add solvent dipropylene glycol monomethyl ether, catalyst azodiisobutyronitrile, under nitrogen atmosphere gas, in 80 ℃ of stirrings 2～6 hours, prepare organic bond-A into resin solution.Copolymer resins among this organic bond-A, its weight average molecular weight is about 10,000, and acid number is 74mgKOH/g.
The weight average molecular weight of prepared copolymer resins adopts and has Port Application プ LLC-6AD that Shimadzu Seisakusho Ltd. makes and clear and Column Shodex (registered trade mark) KF-804 that the electrician makes, the high-speed liquid chromatography instrument that three posts of KF-802 are formed by connecting are measured.
With the above-mentioned organic bond-A for preparing, cooperate by ratio of components shown below, stir with mixer, carry out mixingly with 3 roller opening rubber mixing machines, make it become pasty state.
As the low-melting glass powder, use 50% Bi
2O
3, 15% B
2O
3, 15% ZnO, 6% SiO
2Pulverize with 17% BaO, and be made for thermalexpansioncoefficient
300=85 * 10
-7/ ℃, glass transition temperature is 460 ℃, average grain diameter is the material of 1.6 μ m.Electric conductivity paste is used on upper strata (white layer):
100.0 parts of organic bond-A
50.0 parts of pentaerythritol triacrylates
5.0 parts of 2-benzyl-2-dimethylamino-1-(4-morpholinyl phenyl) butane-1-ketone
80.0 parts of dipropylene glycol monomethyl ethers
450.0 parts in silver powder
22.0 parts in low-melting glass powder
1.0 parts of hypophosphorous acid
Lower floor's (black layer) uses pastel:
Composition example 1
100.0 parts of organic bond-A
50.0 parts of pentaerythritol triacrylates
15.0 parts of 2-benzyl-2-dimethylamino-1-(4-morpholinyl phenyl) butane-1-ketone
70.0 parts of dipropylene glycol monomethyl ethers
35.0 parts of cobaltosic oxides
70.0 parts in low-melting glass powder
1.0 parts of malonic acid
3.0 parts in ito glass material
Composition example 2
100.0 parts of organic bond-A
50.0 parts of pentaerythritol triacrylates
15.0 parts of 2-benzyl-2-dimethylamino-1-(4-morpholinyl phenyl) butane-1-ketone
70.0 parts of dipropylene glycol monomethyl ethers
35.0 parts of cobaltosic oxides
70.0 parts in low-melting glass powder
1.0 parts of malonic acid
7.0 parts in ito glass material
Composition example 3
100.0 parts of organic bond-A
50.0 parts of pentaerythritol triacrylates
15.0 parts of 2-benzyl-2-dimethylamino-1-(4-morpholinyl phenyl) butane-1-ketone
70.0 parts of dipropylene glycol monomethyl ethers
35.0 parts of cobaltosic oxides
70.0 parts in low-melting glass powder
1.0 parts of malonic acid
SnO
27.0 parts of frits
Composition example 4
100.0 parts of organic bond-A
50.0 parts of pentaerythritol triacrylates
15.0 parts of 2-benzyl-2-dimethylamino-1-(4-morpholinyl phenyl) butane-1-ketone
70.0 parts of dipropylene glycol monomethyl ethers
Cu-Cr-Mn is black composite oxide (CuO-Cr
2O
3-Mn
2O
3) 35.0 parts
70.0 parts in low-melting glass powder
1.0 parts of malonic acid
7.0 parts in ito glass material
Composition example 5
100.0 parts of organic bond-A
50.0 parts of pentaerythritol triacrylates
7.5 parts of 2-benzyl-2-dimethylamino-1-(4-morpholinyl phenyl) butane-1-ketone
55.0 parts of dipropylene glycol monomethyl ethers
50.0 parts in cobaltosic oxide slurry
70.0 parts in low-melting glass powder
1.0 parts of malonic acid
7.0 parts in ito glass material
Composition example 6
100.0 parts of organic bond-A
50.0 parts of pentaerythritol triacrylates
7.5 parts of 2-benzyl-2-dimethylamino-1-(4-morpholinyl phenyl) butane-1-ketone
55.0 parts of dipropylene glycol monomethyl ethers
50.0 parts in cobaltosic oxide slurry
70.0 parts in low-melting glass powder
1.0 parts of malonic acid
SiO
27.0 parts of frits
Comparative composition example 1
100.0 parts of organic bond-A
50.0 parts of pentaerythritol triacrylates
15.0 parts of 2-benzyl-2-dimethylamino-1-(4-morpholinyl phenyl) butane-1-ketone
70.0 parts of dipropylene glycol monomethyl ethers
35.0 parts of cobaltosic oxides
70.0 parts in low-melting glass powder
1.0 parts of malonic acid
Comparative composition example 2
100.0 parts of organic bond-A
50.0 parts of pentaerythritol triacrylates
15.0 parts of 2-benzyl-2-dimethylamino-1-(4-morpholinyl phenyl) butane-1-ketone
70.0 parts of dipropylene glycol monomethyl ethers
35.0 parts of cobaltosic oxides
70.0 parts of low-melting glasses
1.0 parts of malonic acid
7.0 parts in silver powder
Comparative composition example 3
100.0 parts of organic bond-A
50.0 parts of pentaerythritol triacrylates
7.5 parts of 2-benzyl-2-dimethylamino-1-(4-morpholinyl phenyl) butane-1-ketone
55.0 parts of dipropylene glycol monomethyl ethers
50.0 parts in cobaltosic oxide slurry
70.0 parts in low-melting glass powder
1.0 parts of malonic acid
7.0 parts in silver powder
Contact resistance value
On the ito surface of the PD200 that has the ITO film (Asahi Glass society system, high deformation point glass), to estimate with the black pastel with 200 purpose polyester nets and comprehensively to print fully, subsequently, with the heated air circulation type drying oven under 90 ℃ temperature, be dried 40 minutes, thereby form good the filming of dry to touch.
Thereafter, be light source with the metal halide lamp, half of printing carried out overall exposing, make the light summation on the composition reach 600mJ/cm
2, use 30 ℃ of liquid temperature thereafter, the Na of 0.4wt%
2CO
3The aqueous solution develops, and washes then.
Then, be coated with upper strata (white layer) with 325 purpose stainless steel cloths comprehensively and use electric conductivity paste, use the heated air circulation type drying oven subsequently under 90 ℃ temperature, be dried 30 minutes, thereby form dry to touch good white black 2 layers and filming of individual layer in vain., with the negative mask dialogue that be of a size of 300 μ m * 3cms black 2 layer segments carry out pattern exposure, make the light summation on the composition reach 400mJ/cm thereafter
2, use 30 ℃ of liquid temperature thereafter, the Na of 0.4wt%
2CO
3The aqueous solution develops, and washes then.
At last, under air atmosphere gas, heat up,, thereby prepare substrate 600 ℃ sintering temperatures 30 minutes with 5 ℃/minute speed.Arbitrfary point on the white black 2 layer line type patterns that mensuration so prepares and ITO be resistance value (measuring with tester) and the distance between the arbitrfary point upward, measures several points and mapping, thereby tries to achieve contact resistance value.
L
*, a
*, b
*Value:
White black 2 layers
On the ito surface of the PD200 that has the ITO film, to estimate with 200 purpose polyester nets and comprehensively to print fully with pastel, subsequently, with the heated air circulation type drying oven under 90 ℃ temperature, be dried 40 minutes, thereby form good the filming of dry to touch.
Then, be coated with upper strata (white layer) with 325 purpose stainless steel cloths comprehensively and use electric conductivity paste, use the heated air circulation type drying oven subsequently under 90 ℃ temperature, be dried 30 minutes, thereby form dry to touch good white black 2 layers and filming of individual layer in vain.
At last, under air atmosphere gas, heat up,, thereby prepare substrate 600 ℃ sintering temperatures 30 minutes with 5 ℃/minute speed.
Sintering for above-mentioned preparation is filmed, and with tinge colour difference meter (ミ ノ Le カ メ ラ manufacturing, CR-211), according to JIS-Z-8729, measures L from non-coated face side
*, a
*, b
*The value of color specification system is with the L of index of expression brightness
*Value is as the index of degree of blackness, a
*Value is as the index of red degree, b
*Value is estimated as the index of yellow chromaticity.This L
*Be worth more for a short time, degree of blackness is excellent more, a
*Be worth lowly more, red degree is low more, b
*Be worth lowly more, yellow chromaticity is low more.
Black individual layer
On the TOP of PD200 face, will estimate with 200 purpose polyester nets and comprehensively to print fully with pastel, subsequently, under 90 ℃ temperature, be dried 40 minutes, thereby form good the filming of dry to touch with the heated air circulation type drying oven.
Subsequently, under air atmosphere gas, heat up,, thereby prepare substrate 600 ℃ sintering temperatures 30 minutes with 5 ℃/minute speed.
The L that the sintering of above-mentioned preparation is filmed
*, a
*, b
*Value is measured.
It the results are shown in table 1, the table 2.From the result shown in these tables as can be seen, according to black paste composition of the present invention, not only do not make the contact resistance value deterioration, and can obtain excellent L
*, a
*, b
*Value.That is, according to black paste composition of the present invention, behind sintering, can be formed in the bus electrode of white black two-layer structure, the contact resistance of white layer segment and transparency electrode (ITO layer) is low, the degree of blackness height of display panel, and the sintering of not flavescence is filmed.
Table 1
Table 2
As mentioned above, according to the present invention, it provides in a kind of bus electrode that can be formed on the white black two-layer structure behind the sintering, and the contact resistance of white layer segment and transparency electrode (ITO layer) is low, the degree of blackness height of display panel, and the sintering of the not flavescence black paste composition of filming.Consequently, it provides a kind of PDP, it has: the high meticulous black pattern that is formed by black paste composition of the present invention, particularly, substrate forms in the bus electrode of white black two-layer structure in front, it is low and have black layer (lower floor) telegraph circuit of enough blackness, the front substrate with black matrix of enough blackness to form contact resistance.
Claims (6)
1, a kind of black paste composition, it is the black paste composition that is used for the black pattern of plasma display panel, it is characterized in that, contain: (A) thermal endurance black pigment, it is selected from cobaltosic oxide, copper-chromium is that black composite oxide and copper-iron are at least a among the black composite oxide; (B) electroconductive powder, it is selected from SnO
2, ITO, metal-doped SnO
2, TiB
2, at least a among ruthenium compound, lanthanum compound, lanthanium complex oxide, yttrium composite oxides and the bismuth composite oxide; Reach (C) organic bond; Wherein, the use level of described thermal endurance black pigment (A) is 0.5～100 weight portion with respect to the described organic bond of 100 weight portions (C), and the use level of described electroconductive powder (B) is 0.05～300 weight portion with respect to the described thermal endurance black pigments of 100 weight portions (A).
2, black paste composition according to claim 1 is characterized in that, further contains (D) photopolymerization monomer, reaches (E) Photoepolymerizationinitiater initiater.
3, black paste composition according to claim 1 and 2 is characterized in that, further contains (F) inorganic particles.
4, black paste composition according to claim 1 and 2 is characterized in that, described thermal endurance black pigment (A) is that average grain diameter is that the following thermal endurance black pigment of 5 μ m is evenly dispersed in the slurry that obtains in the solvent.
5, black paste composition according to claim 3 is characterized in that, described thermal endurance black pigment (A) is that average grain diameter is that the following thermal endurance black pigment of 5 μ m is evenly dispersed in the slurry that obtains in the solvent.
6, a kind of plasma display panel, it has the front substrate of the black pattern that the sinter by any one described black paste composition in the aforesaid right requirement 1～5 forms.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001-387404 | 2001-12-20 | ||
| JP2001387404A JP3986312B2 (en) | 2001-12-20 | 2001-12-20 | Black paste composition and plasma display panel using the black paste composition |
| JP2001387404 | 2001-12-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1427438A CN1427438A (en) | 2003-07-02 |
| CN100454472C true CN100454472C (en) | 2009-01-21 |
Family
ID=19188059
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB021574391A Expired - Fee Related CN100454472C (en) | 2001-12-20 | 2002-12-20 | Black pasty composition and plasma display panel of black pattern formed therewith |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP3986312B2 (en) |
| KR (1) | KR100967978B1 (en) |
| CN (1) | CN100454472C (en) |
| TW (1) | TWI282099B (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3939687B2 (en) * | 2003-08-22 | 2007-07-04 | 太陽インキ製造株式会社 | Alkali-developable photocurable conductive paste composition and plasma display panel using the same |
| KR100826163B1 (en) * | 2003-12-16 | 2008-04-30 | 마쯔시다덴기산교 가부시키가이샤 | Plasma display panel |
| KR100667931B1 (en) | 2004-11-15 | 2007-01-11 | 삼성에스디아이 주식회사 | A plasma display panel |
| KR100927610B1 (en) | 2005-01-05 | 2009-11-23 | 삼성에스디아이 주식회사 | Photosensitive paste composition, and plasma display panel manufactured using the same |
| KR100939416B1 (en) | 2005-07-13 | 2010-01-28 | 다이요 잉키 세이조 가부시키가이샤 | Black paste composition, method for black matrix pattern formation using the same, and its black matrix pattern |
| KR100705888B1 (en) | 2005-08-26 | 2007-04-09 | 제일모직주식회사 | Non-photosensitive black stripe composition, and plasma display panel comprising black stripe using the same and method of manufacturing thereof |
| JP4849851B2 (en) * | 2005-09-16 | 2012-01-11 | 太陽ホールディングス株式会社 | Photocurable composition and plasma display panel formed with black pattern using the same |
| KR101357333B1 (en) * | 2006-11-29 | 2014-02-04 | 코오롱인더스트리 주식회사 | Photosensitive resin composition and black matrix thereof |
| JP2008269862A (en) * | 2007-04-18 | 2008-11-06 | Matsushita Electric Ind Co Ltd | Plasma display panel |
| US20110181174A1 (en) * | 2007-04-18 | 2011-07-28 | Matsushita Electric Industrial Co., Ltd. | Plasma display panel |
| JP2008269861A (en) * | 2007-04-18 | 2008-11-06 | Matsushita Electric Ind Co Ltd | Plasma display panel |
| JP2008269863A (en) * | 2007-04-18 | 2008-11-06 | Matsushita Electric Ind Co Ltd | Manufacturing method of plasma display panel |
| JP5137459B2 (en) * | 2007-05-08 | 2013-02-06 | 住友ゴム工業株式会社 | Black conductive paste and plasma display panel |
| JP4591478B2 (en) * | 2007-05-28 | 2010-12-01 | パナソニック株式会社 | Plasma display panel |
| KR100898295B1 (en) * | 2007-09-12 | 2009-05-18 | 삼성에스디아이 주식회사 | Plasma display panel |
| KR101422071B1 (en) * | 2007-09-21 | 2014-08-13 | 주식회사 동진쎄미켐 | A slurry for producing pdp electrode |
| JP2009149461A (en) * | 2007-12-19 | 2009-07-09 | Taiyo Ink Mfg Ltd | Paste composition |
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| JP3479463B2 (en) * | 1999-01-29 | 2003-12-15 | 太陽インキ製造株式会社 | Photocurable conductive composition and plasma display panel formed with electrodes using the same |
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| JP3854753B2 (en) * | 1999-06-21 | 2006-12-06 | 株式会社ノリタケカンパニーリミテド | Black conductive paste composition, black conductive thick film and method for forming the same |
| JP2001236885A (en) * | 2000-02-22 | 2001-08-31 | Matsushita Electric Ind Co Ltd | Plasma display panel and its manufacturing method |
-
2001
- 2001-12-20 JP JP2001387404A patent/JP3986312B2/en not_active Expired - Fee Related
-
2002
- 2002-12-12 TW TW091136001A patent/TWI282099B/en not_active IP Right Cessation
- 2002-12-20 KR KR1020020081521A patent/KR100967978B1/en not_active IP Right Cessation
- 2002-12-20 CN CNB021574391A patent/CN100454472C/en not_active Expired - Fee Related
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| JPH08287834A (en) * | 1995-04-18 | 1996-11-01 | Fujitsu Ltd | Plasma display panel |
| JPH10333322A (en) * | 1997-05-27 | 1998-12-18 | Toray Ind Inc | Photosensitive electrically conductive paste and production of electrode for plasma display |
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Also Published As
| Publication number | Publication date |
|---|---|
| JP2003187692A (en) | 2003-07-04 |
| JP3986312B2 (en) | 2007-10-03 |
| TW200301490A (en) | 2003-07-01 |
| CN1427438A (en) | 2003-07-02 |
| KR20030053031A (en) | 2003-06-27 |
| KR100967978B1 (en) | 2010-07-07 |
| TWI282099B (en) | 2007-06-01 |
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