CN100445872C - Liquid delivering and airtight device in submersible photoetching system - Google Patents
Liquid delivering and airtight device in submersible photoetching system Download PDFInfo
- Publication number
- CN100445872C CN100445872C CNB200510049773XA CN200510049773A CN100445872C CN 100445872 C CN100445872 C CN 100445872C CN B200510049773X A CNB200510049773X A CN B200510049773XA CN 200510049773 A CN200510049773 A CN 200510049773A CN 100445872 C CN100445872 C CN 100445872C
- Authority
- CN
- China
- Prior art keywords
- annular
- air
- liquid
- short grooves
- air channel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention discloses a liquid delivering and air sealing device in a submersible photoetching system, which is characterized in that the liquid delivering and air sealing device arranged between a projection lens and a silicon chip to be exposed in the submersible photoetching system is orderly and coaxially formed by assembling an air inlet part, an air outlet part, a liquid filling and recovering part and a top end cover from top to bottom, wherein the air inlet part and the air outlet part are respectively provided with an air pressure equalizing structure and are both in a mazy structure of three layers of annular air channels, and two, four and eight annular short slots are respectively arranged among the air channels. With the mode of arranging slots among the many layers of air channels, airflow which flows stably and has uniform differential pressure is obtained at an air sealing boundary, so that the present invention prevents liquid leakage on one hand, and also prevents air bubble generation on the other hand.
Description
Technical field
The liquid that the present invention relates in the immersion lithographic system transmits and gas sealing mechanism, particularly relates in a kind of slit between projecting lens end component and silicon chip and transmits liquid, and guarantee that the leak free liquid of liquid transmits and gas sealing mechanism.
Background technology
Modern lithographic equipment is based on optical lithography, it utilize optical system the figure on the mask accurately projection exposure to the silicon chip that was coated with photoresist.It comprises a ultraviolet source, an optical system, projection mask version, an alignment system and a silicon chip that covers photosensitive photoresist of being made up of graphics chip.
Immersion lithographic system is full of certain liquid in the slit between projecting lens and silicon chip, improves the numerical aperture of projecting lens by the refractive index that improves this slit medium, thereby improves the resolution and the depth of focus of photoetching.In stepping-scan-type lithographic equipment, silicon chip carries out scanning motion on exposure process high speed ground, and this high-speed motion will promptly can cause leak of liquid the filling liquid band from going out the slit.The liquid that leaks will cause some parts of lithographic equipment can't operate as normal, such as, the interferometer of monitoring wafer position.Therefore, the sealing problem of necessary emphasis solution filling liquid in the immersion lithography.
CN 1501173A has proposed a kind of lithographic projection apparatus, adopts a hermetic seal member around gap between projecting lens end component and the silicon chip.Hermetic seal forms between the surface of described hermetic seal member and silicon chip, with the liquid in the airtight gap.But, in the various hermetic seal structures that it proposed, problems such as exist to flow in the air seal border inhomogeneous, pressure is concentrated, and the inhomogeneous one side of air-flow is unfavorable for hydraulic seal, and in the scanning photoetching process, cause leakage, may produce bubble on the other hand, and bubble enters the exposure field between projecting lens and silicon chip, will influence image quality.
Summary of the invention
The liquid that the purpose of this invention is to provide in a kind of immersion lithographic system transmits and gas sealing mechanism.Adopt hermetic, air inlet and gas exhaust piping all have the equal laminated structure of mazy air pressure, and it is stable to obtain on the air seal border flowing, and the pressure reduction uniform airflow has prevented from leak of liquid from also to have prevented the bubble generation on the other hand on the one hand.
The present invention is that the technical scheme that addresses the above problem employing is: the projecting lens in immersion lithographic system and wait to expose and be equipped with between the silicon chip that liquid transmits and gas sealing mechanism.Described liquid transmit and gas sealing mechanism be from down and on coaxially successively inject and reclaim part and top end cover is assembled by the air inlet part that has the equal laminated structure of air pressure, the exhaust part that has the equal laminated structure of air pressure, liquid; The air inlet part that has the equal laminated structure of air pressure all adopts mazy shellring shape air passage structure with the exhaust part that has the equal laminated structure of air pressure.
The described air inlet part that has the equal laminated structure of air pressure: comprise along radius that between first annular air channel and second annular air channel of axis direction open two the first short grooves of annular symmetrically along airintake direction, included angle is 10 °～30 °; Between second annular air channel and the 3rd annular air channel, open four the second short grooves of annular symmetrically along airintake direction, included angle is 10 °～20 °, and the layout of four the second short grooves of annular should make the short groove of first annular over against the unslotted rib place between the short groove of adjacent two second annulars; Between the 3rd annular air channel and air inlet flat segments, open eight the 3rd short grooves of annular symmetrically along airintake direction, included angle is 10 °～20 °, and the layout of eight the 3rd short grooves of annular should make the short groove of second annular over against the unslotted rib place between the short groove of adjacent two the 3rd annulars; Air inlet flat segments side and horizontal plane angle are 45 °～80 °.
The described exhaust part that has the equal laminated structure of air pressure: comprise along radius that between first annular air channel and second annular air channel of axis direction open two the first short grooves of annular symmetrically along outgassing direction, included angle is 10 °～30 °; Between second annular air channel and the 3rd annular air channel, open four the second short grooves of annular symmetrically along outgassing direction, included angle is 10 °～20 °, and the layout of four the second short grooves of annular should make the short groove of first annular over against the unslotted rib place between the short groove of adjacent two second annulars; Between the 3rd annular air channel and air inlet flat segments, open eight the 3rd short grooves of annular symmetrically along outgassing direction, included angle is 10 °～20 °, and the layout of eight the 3rd short grooves of annular should make the short groove of second annular over against the unslotted rib place between the short groove of adjacent two the 3rd annulars; The flat segments of giving vent to anger is 110 °～135 ° towards the lateral surface of the air inlet part that has the equal laminated structure of air pressure and the angle of horizontal direction; The flat segments of giving vent to anger is injected and is reclaimed the medial surface of part and the angle of horizontal direction is 110 °～135 ° towards liquid.
Described liquid injects and reclaims part: be included in this part upper surface and open liquid injection straight slot and liquids recovery straight slot symmetrically along the fluid injection direction; This part has the taper identical with the terminal end shape of projecting lens towards the medial surface of projecting lens; Fluid injection direction in medial surface upper edge is opened a liquid symmetrically and is injected skewed slot and liquids recovery skewed slot, 45 °～135 ° of included angles; This part injects and reclaims the lateral surface of part and the angle of horizontal direction is 45 °～80 ° towards liquid.
Described top end cover center has reverse taper hole and the terminal conical surface of projecting lens fits tightly.
The useful effect that the present invention has is:
Compare with known hermetic seal structure, the equal laminated structure of labyrinth type air pressure that the present invention proposes is applied in air inlet and the gas exhaust piping structure, thereby it is stable to obtain flowing on the air seal border, and the pressure reduction uniform airflow has prevented that preferably leak of liquid and bubble from producing.
Description of drawings
Fig. 1 rough schematic view that to be the present invention assemble mutually with projecting lens;
Fig. 2 is that the A-A of Fig. 1 is to cut-open view;
Fig. 3 is that the B-B of Fig. 2 is to cut-open view;
Fig. 4 is the C-C partial enlarged drawing of Fig. 3;
Fig. 5 is the axonometric drawing that the present invention has the air inlet part of the equal laminated structure of air pressure;
Fig. 6 is the vertical view of Fig. 5;
Fig. 7 is the axonometric drawing that the present invention has the exhaust part of the equal laminated structure of air pressure;
Fig. 8 is the vertical view of Fig. 7;
Fig. 9 is the axonometric drawing that part is gone into and reclaimed to the vertical view of liquid of the present invention;
Figure 10 is the vertical view of Fig. 9.
Embodiment
The invention will be further described below in conjunction with drawings and Examples.
Liquid transmission and gas sealing mechanism that Fig. 1 has schematically shown embodiment of the present invention assemble rough schematic view mutually with projecting lens, comprise that the coaxial successively air inlet part 1A of the equal laminated structure of air pressure, the exhaust part 1B that has the equal laminated structure of air pressure, the liquid of having injects and reclaims part 1C and top end cover 1D is assembled from bottom to top.
The liquid of embodiment of the present invention transmits and gas sealing mechanism can be used in substep repetition or step-scan formula lithographic equipment.In exposure process, the light (as KrF or argon fluoride excimer laser) that sends from light source (not providing the figure) is by slit between the lens-silicon chip of mask (not providing among the figure), projecting lens and the full of liquid aimed at, and the photoresist of silicon chip surface is exposed.
Fig. 2 be the A-A of assembly shown in Figure 1 to cut-open view, wherein 2A represents the exposure field of projecting lens.
Fig. 3 be the B-B of assembly shown in Figure 2 to cut-open view, wherein 3A represents the lower surface of projecting lens end component, the slit 3C between it and the silicon chip upper surface 3B is and treats the full of liquid zone.
Fig. 4 is the C-C partial enlarged drawing of liquid transmission shown in Figure 3 and gas sealing mechanism.Have the equal laminated structure of air pressure air inlet part 1A inside surface 4A and have between the outside surface 4B of exhaust part 1B of the equal laminated structure of air pressure and form an annular air inlet duct 4C, this groove departs from 10 °～45 ° of projecting lens optical axis directions, groove width 0.5～3mm.Having the inside surface 4D of exhaust part 1B of the equal laminated structure of air pressure and liquid injects and reclaims between the outside surface 4E of part 1C and form an annular outgassing groove 4F, 10 °～45 ° of this groove deflection projecting lens optical axis directions, groove width 0.5～3mm.Air inlet duct and outgassing groove form a hermetic seal 4G in the direction in the face of silicon chip.Liquid 4X flows out slit 3C by conduit 4H and the 4I on liquid injection and the recovery part 1C.4J, 4K and 4L represent to have first, second and the 3rd annular air channel on the air inlet part 1A of the equal laminated structure of air pressure respectively, and a flat segments 4M is arranged between the 3rd annular air channel 4L and air inlet duct 4C.And 4N, 4O and 4P represent to have first, second and the 3rd annular air channel on the exhaust part 1B of the equal laminated structure of air pressure respectively, and a flat segments 4Q is arranged between the 3rd annular air channel 4P and outgassing groove 4F.Describe the structure of each air flue and useful effect thereof in detail below in conjunction with Fig. 5-Fig. 8.
Fig. 5 is the axonometric drawing that has the air inlet part 1A of the equal laminated structure of air pressure shown in Figure 4, and the groove width of each annular air channel 4J, 4K, 4L and rib width equate, be 2～4mm; Each annular air channel 4J, 4K, 4L and air inlet flat segments 4M groove depth equate, be 0.5～3mm.
Fig. 6 is the vertical view that has the air inlet part 1A of the equal laminated structure of air pressure shown in Figure 5, along radius between the first annular air channel 4J and the second annular air channel 4K of axis direction, open two the first short groove 6B of annular symmetrically along airintake direction D-D, included angle is 10 °～30 °; Between the second annular air channel 4K and the 3rd annular air channel 4L, open four the second short groove 6C of annular symmetrically along airintake direction D-D, included angle is 10 °～20 °, and the layout of the short groove 6C of Fourth Ring shape should make the short groove 6B of first annular over against the unslotted rib place between the short groove 6C of adjacent two second annulars; Between the 3rd annular air channel 4L and air inlet flat segments 4M, open eight the 3rd short groove 6D of annular symmetrically along airintake direction D-D, included angle is 10 °～20 °, thereby obtain 22%～33% porosity, the layout of the short groove 6D of eight annulars should make groove 6C over against the unslotted rib place between adjacent two groove 6D, can obtain identical gas pressure distribution in eight short groove exits like this; Behind eight the short groove 6D of annular effluent airs process air inlet flat segments 4M, gas pressure distribution is further even, and it is even finally to obtain air pressure in air inlet duct 4C (see figure 4), and stable air-flow flows.
Fig. 7 is the axonometric drawing that has the exhaust part 1B of the equal laminated structure of air pressure shown in Figure 4, and the groove width of each annular air channel 4N, 4O, 4P and rib width equate, be 2～4mm; Each annular air channel 4N, 4O, 4P and the flat segments 4Q that gives vent to anger groove depth equate, be 0.5～3mm.
Fig. 8 is the vertical view that has the exhaust part 1B of the equal laminated structure of air pressure shown in Figure 7, along radius between the first annular air channel 4N and the second annular air channel 4O of axis direction, open two the first short groove 8B of annular symmetrically along outgassing direction E-E, included angle is 10 °～30 °; Between the second annular air channel 4O and the 3rd annular air channel 4P, open four the second short groove 8C of annular symmetrically along outgassing direction E-E, included angle is 10 °～20 °, and the layout of the short groove 8C of Fourth Ring shape should make the short groove 8B of first annular over against the unslotted rib place between the short groove 8C of adjacent two second annulars; At the 3rd annular air channel 4P with give vent to anger between flat segments 4Q, open eight the 3rd short groove 8D of annular symmetrically along outgassing direction E-E, included angle is 10 °～20 °, thereby obtain 22%～33% porosity, the layout of eight the 3rd short groove 8D of annular should make the short groove 8C of second annular over against the unslotted rib place between the short groove 8D of adjacent two the 3rd annulars, can obtain identical gas pressure distribution in eight short groove exits like this; Gas flows into the flat segments 4Q that gives vent to anger that flows through before eight short groove 8D of annular, thereby it is further even to use entraining air stream, and it is even finally to obtain air pressure in outgassing groove 4F (see figure 4), and stable air-flow flows.
After adopting the air inlet and the equal laminated structure of exhaust air pressure of Fig. 5-Fig. 8, it is stable just can to obtain on the air seal border in the face of silicon chip flowing, and the pressure reduction uniform airflow has prevented from leak of liquid from also to have prevented the bubble generation on the other hand on the one hand.
Fig. 9 is the axonometric drawing that liquid shown in Figure 4 injects and reclaim part 1C.
Figure 10 is the vertical view that liquid shown in Figure 9 injects and reclaim part 1C, opens a liquid at upper surface symmetrically along fluid injection direction F-F and injects straight slot 9H and liquids recovery straight slot 4H; Medial surface 9A has the taper identical with the terminal end shape of projecting lens 2; Open a liquid symmetrically at medial surface 9A upper edge fluid injection direction F-F and inject skewed slot 9I and liquids recovery skewed slot 4I, 45 °～135 ° of included angles.
In a word, the present invention is different from existing gas sealing structure in the background technology, provides the liquid in a kind of immersion lithography system to transmit and gas sealing mechanism.Adopt hermetic, air inlet and gas exhaust piping all have the equal laminated structure of mazy air pressure, and it is stable to obtain on the air seal border flowing, and the pressure reduction uniform airflow has prevented from leak of liquid from also to have prevented the bubble generation on the other hand on the one hand.
Claims (3)
1, the liquid in a kind of immersion lithographic system transmits and gas sealing mechanism, be liquid to be housed between projecting lens (2) in immersion lithographic system and the silicon chip to be exposed (3) transmit and gas sealing mechanism, it is characterized in that: described liquid transmit and gas sealing mechanism (1) be from down and on coaxially successively inject and reclaim part (1C) and top end cover (1D) is assembled by the air inlet part (1A) that has the equal laminated structure of air pressure, the exhaust part (1B) that has the equal laminated structure of air pressure, liquid; The exhaust part (1B) that has the air inlet part (1A) of the equal laminated structure of air pressure and have an equal laminated structure of air pressure all adopts mazy shellring shape air passage structure;
The described labyrinth type shellring shape air passage structure that has the air inlet part (1A) of the equal laminated structure of air pressure: along radius between first annular air channel (4J) and second annular air channel (4K) of axis direction, open two the first short grooves (6B) of annular symmetrically along airintake direction (D-D), included angle is 10 °～30 °; Between second annular air channel (4K) and the 3rd annular air channel (4L), open four the second short grooves (6C) of annular symmetrically along airintake direction (D-D), included angle is 10 °～20 °, and the layout of four the second short grooves of annular (6C) should make the first short groove of annular (6B) over against the unslotted rib place between the adjacent two second short grooves of annular (6C); Between the 3rd annular air channel (4L) and air inlet flat segments (4M), open eight the 3rd short grooves (6D) of annular symmetrically along airintake direction (D-D), included angle is 10 °～20 °, and the layout of eight the 3rd short grooves of annular (6D) should make the second short groove of annular (6C) over against the unslotted rib place between adjacent two the 3rd short grooves of annular (6D); Air inlet flat segments (4M) side (4A) is 45 °～80 ° with horizontal plane angle;
The described labyrinth type shellring shape air passage structure that has the exhaust part (1B) of the equal laminated structure of air pressure: along radius between first annular air channel (4N) and second annular air channel (4O) of axis direction, open two the first short grooves (8B) of annular symmetrically along outgassing direction (E-E), included angle is 10 °～30 °; Between second annular air channel (4O) and the 3rd annular air channel (4P), open four the second short grooves (8C) of annular symmetrically along outgassing direction (E-E), included angle is 10 °～20 °, and the layout of four the second short grooves of annular (8C) should make the first short groove of annular (8B) over against the unslotted rib place between the adjacent two second short grooves of annular (8C); Between the 3rd annular air channel (4P) and air inlet flat segments (4Q), open eight the 3rd short grooves (8D) of annular symmetrically along outgassing direction (E-E), included angle is 10 °～20 °, and the layout of eight the 3rd short grooves of annular (8D) should make the second short groove of annular (8C) over against the unslotted rib place between adjacent two the 3rd short grooves of annular (8D); The flat segments of giving vent to anger (4Q) is 110 °～135 ° towards the lateral surface (4B) of the air inlet part (1A) that has the equal laminated structure of air pressure and the angle of horizontal direction; The flat segments of giving vent to anger (4Q) is 110 °～135 ° towards the medial surface (4D) of liquid injection and recovery part (1C) and the angle of horizontal direction.
2, the liquid in a kind of immersion lithographic system according to claim 1 transmits and gas sealing mechanism, it is characterized in that: described liquid injection and recovery part (1C) are included in this part upper surface and open liquid injection straight slot (9H) and liquids recovery straight slot (4H) symmetrically along fluid injection direction (F-F); The medial surface (9A) of this part towards projecting lens (2) has the identical taper of terminal end shape with projecting lens (2); Medial surface (9A) upper edge fluid injection direction (F-F) is opened a liquid symmetrically and is injected skewed slot (9I) and liquids recovery skewed slot (4I), 45 °～135 ° of included angles; This part is 45 °～80 ° towards the lateral surface (4E) of liquid injection and recovery part (1C) and the angle of horizontal direction.
3, the liquid in a kind of immersion lithographic system according to claim 1 transmits and gas sealing mechanism, and it is characterized in that: described top end cover (1D) center has reverse taper hole and the terminal conical surface of projecting lens (2) fits tightly.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB200510049773XA CN100445872C (en) | 2005-05-09 | 2005-05-09 | Liquid delivering and airtight device in submersible photoetching system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB200510049773XA CN100445872C (en) | 2005-05-09 | 2005-05-09 | Liquid delivering and airtight device in submersible photoetching system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1687847A CN1687847A (en) | 2005-10-26 |
| CN100445872C true CN100445872C (en) | 2008-12-24 |
Family
ID=35305889
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB200510049773XA Expired - Fee Related CN100445872C (en) | 2005-05-09 | 2005-05-09 | Liquid delivering and airtight device in submersible photoetching system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100445872C (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100462848C (en) * | 2007-03-15 | 2009-02-18 | 浙江大学 | Liquid supply and recovery seal controller in immersion type photoetching system |
| NL2003638A (en) * | 2008-12-03 | 2010-06-07 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1501173A (en) * | 2002-11-12 | 2004-06-02 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
| CN1501172A (en) * | 2002-11-12 | 2004-06-02 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
| WO2004092833A2 (en) * | 2003-04-10 | 2004-10-28 | Nikon Corporation | Environmental system including a transport region for an immersion lithography apparatus |
| US20050018155A1 (en) * | 2003-06-27 | 2005-01-27 | Asml Netherlands B. V. | Lithographic apparatus and device manufacturing method |
| CN2798147Y (en) * | 2005-05-09 | 2006-07-19 | 浙江大学 | Apparatus for liquid delivering and air-tight sealing in immersed photoetching system |
-
2005
- 2005-05-09 CN CNB200510049773XA patent/CN100445872C/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1501173A (en) * | 2002-11-12 | 2004-06-02 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
| CN1501172A (en) * | 2002-11-12 | 2004-06-02 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
| WO2004092833A2 (en) * | 2003-04-10 | 2004-10-28 | Nikon Corporation | Environmental system including a transport region for an immersion lithography apparatus |
| US20050018155A1 (en) * | 2003-06-27 | 2005-01-27 | Asml Netherlands B. V. | Lithographic apparatus and device manufacturing method |
| CN2798147Y (en) * | 2005-05-09 | 2006-07-19 | 浙江大学 | Apparatus for liquid delivering and air-tight sealing in immersed photoetching system |
Non-Patent Citations (6)
| Title |
|---|
| 环形分布器内气体变质量流动及压强分布规律. 吕志敏，李春忠，丛德滋，古宏晨，刘红来，胡英.华东理工大学学报，第26卷第4期. 2000 |
| 环形分布器内气体变质量流动及压强分布规律. 吕志敏，李春忠，丛德滋，古宏晨，刘红来，胡英.华东理工大学学报，第26卷第4期. 2000 * |
| 环形分布器气体的流动及气流均布. 吕志敏，李春忠，丛德滋.化学工程，第29卷第2期. 2001 |
| 环形分布器气体的流动及气流均布. 吕志敏，李春忠，丛德滋.化学工程，第29卷第2期. 2001 * |
| 环形流道变质量流动的静压分布模型. 吕志敏，李春忠，丛德滋，张曙明，刘洪来，胡英.华东理工大学学报，第27卷第6期. 2001 |
| 环形流道变质量流动的静压分布模型. 吕志敏，李春忠，丛德滋，张曙明，刘洪来，胡英.华东理工大学学报，第27卷第6期. 2001 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1687847A (en) | 2005-10-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7446859B2 (en) | Apparatus and method for reducing contamination in immersion lithography | |
| CN107991843B (en) | Micro-channel gas-liquid separation and recovery device for immersion lithography machine | |
| CN100462848C (en) | Liquid supply and recovery seal controller in immersion type photoetching system | |
| TW201512792A (en) | Apparatus and method for providing fluid for immersion lithography | |
| KR20020068492A (en) | Non-contact seal using purge gas | |
| CN100565352C (en) | Be used for litho machine submergence control device | |
| CN101452219B (en) | Submerge liquid supplying recovery controlling device for photoetching machine | |
| CN110327780A (en) | A kind of gas-liquid separation device based on micropore film wire | |
| JP2008147577A (en) | Exposure apparatus, and method of manufacturing device | |
| JP2006253456A (en) | Exposure device and method for manufacturing device | |
| CN100445872C (en) | Liquid delivering and airtight device in submersible photoetching system | |
| KR20080076853A (en) | Exposure apparatus and method for manufacturing device | |
| CN102621818B (en) | Immersion control device for lithography machine | |
| CN102707580B (en) | Hermetic sealing and gas-liquid separation and recovery device for immersed photoetching machine | |
| CN101408731B (en) | Immerge control device for immersed photoetching machine | |
| TW202046016A (en) | A fluid handling structure, a lithographic apparatus, a method of using a fluid handling structure and a method of using a lithographic apparatus | |
| CN101452218B (en) | Submerge self-adapting gas seal device for photoetching machine | |
| JP2007019463A (en) | Exposure device, exposure method, and method of manufacturing device | |
| CN2798147Y (en) | Apparatus for liquid delivering and air-tight sealing in immersed photoetching system | |
| CN201017176Y (en) | Liquid supplying and recycling seal control device in immersed photolithography system | |
| US9164395B2 (en) | Exposure apparatus, and method of manufacturing a device | |
| CN113138540B (en) | Immersion liquid supply and recovery device with gas-liquid separation and recovery functions | |
| CN201233505Y (en) | Immersion control device used for photo-etching machine | |
| CN103969964B (en) | For hermetic seal and the micropore packoff of immersed photoetching machine | |
| CN102566031A (en) | Anti-bubble liquid control device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20081224 Termination date: 20140509 |