CN100437262C - Vacuum load supporting device - Google Patents
Vacuum load supporting device Download PDFInfo
- Publication number
- CN100437262C CN100437262C CNB200610138287XA CN200610138287A CN100437262C CN 100437262 C CN100437262 C CN 100437262C CN B200610138287X A CNB200610138287X A CN B200610138287XA CN 200610138287 A CN200610138287 A CN 200610138287A CN 100437262 C CN100437262 C CN 100437262C
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- Prior art keywords
- vacuum
- load supporting
- tank
- aqua storage
- supporting device
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Abstract
A vacuum carrying device is prepared as arranging through hole on vacuum carrying platform, connecting the first end of transmission pipeline to through hole and the second end to vacuum pump as well as the third end to deionized water source, connecting vacuum tank between the first and the second ends, connecting water tank between the first and the third ends and using valve to control on/off state of vacuum tank to the first end or water tank to the first end.
Description
Technical field
The present invention relates to a kind of vacuum load supporting device, particularly relate to a kind of vacuum load supporting device that promotes substrate absorption and release efficiency.
Background technology
In the automated production of display panels, how fast automatic transmission, fixing, transfer substrate are for promoting an important loops of efficient, and present panel factory owner will be to use vacuum load supporting device as base plate carrying and fixing instrument.Please refer to Fig. 1, be the synoptic diagram of known vacuum load supporting device.As shown in Figure 1, known vacuum load supporting device 10 includes a vacuum load supporting platform 12, and a transfer conduit 20 is connected to vacuum load supporting platform 12.Vacuum load supporting platform 12 has several through holes 14, and an end of through hole 14 is communicated with transfer conduit 20, the other end then perforate at a loading end 16 of vacuum load supporting platform 12.Transfer conduit 20 has three end points, and wherein first end 21 is communicated with through hole 14, and second end 22 then is connected with a vacuum pump 24 and a deionized water source 26 respectively with the 3rd end 23.
Vacuum load supporting device 10 has absorption and discharges two kinds of operator schemes.Under absorption mode, the through hole 14 of vacuum load supporting platform 12 is communicated with vacuum pump 24, vacuum pump 24 can begin to bleed and made transfer conduit 20 form vacuum states this moment, and absorption fixedly is placed in the substrate 18 of loading end 16 of vacuum load supporting platform 12 to carry out PROCESS FOR TREATMENT whereby.Under release mode, the through hole 14 of vacuum load supporting platform 12 is communicated with deionized water source 26, this moment, vacuum state can be removed, deionized water can inject transfer conduit 20 simultaneously, and gush out by the through hole 14 of vacuum load supporting platform 12, substrate 18 can break away from the loading end 16 of vacuum load supporting platforms 12 and discharge whereby.
But, known vacuum load supporting device 10 has following shortcoming in operation, at first, under absorption mode, have suitable length and space owing to transfer conduit 20, therefore must expend considerable time just can reach the vacuum state that is enough to adsorb substrate 18, and vacuum pump 24 also need possess bigger power.Have, under release mode, because transfer conduit 20 is long and narrow, the process of substrate 18 disengaging vacuum load supporting platforms 12 is also rather consuming time, and causes efficient not high again.
Summary of the invention
The object of the present invention is to provide a kind of vacuum load supporting device, the vacuum load supporting platform can be adsorbed and release substrate fast, and then promote efficient and reduce cost.
To achieve these goals, the invention provides a kind of vacuum load supporting device, in order to carrying with fix a substrate, and be connected with a vacuum pump and a deionized water source.Above-mentioned vacuum load supporting device includes: a vacuum load supporting platform has several through holes; One transfer conduit includes one first end, one second end and one the 3rd end, and this first end is connected to this through hole of this vacuum load supporting platform, and this second end is connected to this vacuum pump, and the 3rd end is connected to this deionized water source; One vacuum tank is connected between this first end and this second end of this transfer conduit; One aqua storage tank is connected between this first end and the 3rd end of this transfer conduit; One valve is connected between this first end, this vacuum tank and this aqua storage tank, so as to controlling the keying state of this vacuum tank and this first end or this aqua storage tank and this first end; One valve is arranged between this first end and this vacuum tank; And a valve, be arranged between this first end and this aqua storage tank.
From the above, the present invention is by the vacuum tank that forvacuum is set in transfer conduit, and the aqua storage tank of water storage in advance, can effectively accelerate to adsorb the speed of substrate and release substrate, and can promote the efficient of vacuum load supporting device.
Describe the present invention below in conjunction with the drawings and specific embodiments, but not as a limitation of the invention.
Description of drawings
Fig. 1 is the synoptic diagram of known vacuum load supporting device;
Fig. 2 is the synoptic diagram of the vacuum load supporting device of a preferred embodiment of the present invention;
Fig. 3 is the synoptic diagram of vacuum load supporting device under absorption mode of present embodiment;
Fig. 4 and Fig. 5 are the synoptic diagram of vacuum load supporting device under release mode of present embodiment.
Wherein, Reference numeral:
10 vacuum load supporting devices, 12 vacuum load supporting platforms
14 through holes, 16 loading ends
18 substrates, 20 transfer conduit
21 first ends, 22 second ends
23 the 3rd ends, 24 vacuum pumps
26 deionized water source, 30 vacuum load supporting devices
32 vacuum load supporting platforms, 34 substrates
36 loading ends, 38 through holes
40 transfer conduit, 41 first ends
42 second ends 43 the 3rd end
44 vacuum pumps, 46 deionized water source
48 vacuum tanks, 50 aqua storage tanks
52 valves, 54 compressed air sources
56 first bypass lines, 58 second bypass lines
60 valves
Embodiment
Please refer to Fig. 2, be the synoptic diagram of the vacuum load supporting device of a preferred embodiment of the present invention.As shown in Figure 2, the vacuum load supporting device 30 of present embodiment includes a vacuum load supporting platform 32, and a transfer conduit 40.Vacuum load supporting platform 32 has a loading end 36, in order to carrying with fix a substrate 34, and vacuum load supporting platform 32 is for cellular structure designs, it includes several through holes 38, one end of through hole 38 is communicated with transfer conduit 40, the other end then perforate at the loading end 36 of vacuum load supporting platform 32.Transfer conduit 40 includes one first end 41, one second end 42 and one the 3rd end 43, and wherein first end 41 through hole 38, the second ends 42 that are connected to vacuum load supporting platform 32 are connected to 43 at a vacuum pump 44, the three ends and are connected to a deionized water source 46.
The vacuum load supporting device 30 of present embodiment includes a vacuum tank (vacuum tank) 48, be connected between first end 41 and second end 42 of transfer conduit 40, one aqua storage tank (water tank) 50, be connected between first end 41 and the 3rd end 43 of transfer conduit 40, and at least one valve 52, be connected between first end 41, vacuum tank 48 and the aqua storage tank 50, so as to the keying state of control vacuum tank 48 and first end 41 or the aqua storage tank 50 and first end 41.The vacuum load supporting device of present embodiment, also include a compressed air source (compressed dry air, CDA) 54, be communicated in aqua storage tank 50, and can be communicated in vacuum tank 48.Between vacuum load supporting device 30 on-stream periods, vacuum tank 48 remains on the state of forvacuum at any time, also stores deionized water in advance in the aqua storage tank 50 simultaneously.In addition, vacuum tank 48 and aqua storage tank 50 all are connected in the transfer conduit 40 near first end 41 in the present embodiment, and when the position of vacuum tank 48 and aqua storage tank 50 is set, the position of vacuum tank 48 and aqua storage tank 50 is the closer to first end 41 of transfer conduit 40, just the closer to vacuum load supporting platform 32, the effect when the absorption of carrying out substrate 34 or release is good more.The vacuum load supporting device 30 of present embodiment also can include one first bypass line (bypass pipe) 56, connects vacuum tank 48 and vacuum pump 44, and one second bypass line 58, connects aqua storage tank 50 and deionized water source 46.In addition, transfer conduit 40 also can be provided with several valves 60, is located at respectively between each unit of vacuum load supporting device 30, so as to the flow path or the flow of control air or deionized water in operating process.
Please refer to Fig. 3, be the synoptic diagram of vacuum load supporting device under absorption mode of present embodiment, wherein thick line is partly represented gas or flow of liquid crystal route in the drawings.As shown in Figure 3, when being set at absorption mode, valve 52 can be adjusted into to vacuum tank 48 unlatchings and to aqua storage tank 50 closing state, first end 41 and vacuum tank 48 (the second end 42) conducting of transfer conduit 40 just, and because vacuum tank 48 forvacuum, but the through hole of vacuum load supporting platform 32 just reaches vacuum state with absorption substrate 34 in 38 short time.In addition, under absorption mode, valve that first bypass line 56 and vacuum tank are 48 60 is for opening, whereby can be when vacuum pump 44 vacuumizes via first bypass line 56, and avoid sucking the water that vacuum tank 48 bottoms may be accumulated.
Please refer to Fig. 4 and Fig. 5, Fig. 4 and Fig. 5 are the synoptic diagram of vacuum load supporting device under release mode of present embodiment, and wherein thick line is partly represented gas or flow of liquid crystal route in the drawings.As shown in Figure 4, phase one under release mode, valve 52 can be adjusted to aqua storage tank 50 unlatchings and to vacuum tank 48 to closing, first end, 41 meetings and aqua storage tank 50 (the 3rd end 43) conducting whereby, and owing to stored deionized water in advance in the aqua storage tank 50, relend the pressing aid pressurized air that air source 54 injected that contracts, the deionized waters in the aqua storage tank 50 can be gushed out so that substrate 34 breaks away from vacuum load supporting platforms 32 through the through hole 38 of vacuum load supporting platform 32.In addition, the valve 60 that is positioned at 48 of compressed air source 54 and vacuum tanks also can be unlocked, and pressurized air also can inject in the vacuum tank 48 whereby, and the water that accumulates of vacuum tank 48 bottoms is emitted through vacuum pump 44.
As shown in Figure 5, subordinate phase under release mode, when the deionized water in the aqua storage tank 50 arrives low-water level, deionized water source 48 meeting water supply starts, and continue deionized water is injected in the through hole 38 of vacuum load supporting platform 32 through second bypass line 58, with release substrate 34, simultaneously deionized water source 48 also can continue to replenish the interior deionized water of aqua storage tank 50 at this moment to high water stage.
From the above, the present invention is by the vacuum tank that forvacuum is set in transfer conduit, and the aqua storage tank of water storage in advance, can effectively accelerate to adsorb the speed of substrate and release substrate, and can promote the efficient of vacuum load supporting device.What deserves to be explained is that the application of vacuum load supporting device of the present invention is not limited to the design configurations of the foregoing description, but can be changed design according to actual needs.For instance, based on the consideration of cost and efficient, vacuum load supporting device of the present invention also can be provided with vacuum tank separately and aqua storage tank is not set, or separately aqua storage tank is set and vacuum tank is not set.In addition, the setting of the valve of transfer conduit also is not limited to the foregoing description, for example, can be not limited to the shown in the drawings single variable valve of the foregoing description, anyly have the valve that turns to or combined by several valves and can be in order to select the valve of absorption mode or release mode.What deserves to be explained is in addition, vacuum load supporting device of the present invention can be applicable to all kinds of technological processes of display panels, the for example grinding process flow of colored filter substrate, or any PROCESS FOR TREATMENT flow process of utilizing vacuum suction to be carried fixing substrate.
Certainly; the present invention also can have other various embodiments; under the situation that does not deviate from spirit of the present invention and essence thereof; those of ordinary skill in the art can make various corresponding changes and distortion according to the present invention, but these corresponding changes and distortion all should belong to the protection domain of the appended claim of the present invention.
Claims (8)
1, a kind of vacuum load supporting device, in order to carrying with fix a substrate, and be connected with a vacuum pump and a deionized water source, it is characterized in that, include:
One vacuum load supporting platform has several through holes;
One transfer conduit includes one first end, one second end and one the 3rd end, and this first end is connected to this through hole of this vacuum load supporting platform, and this second end is connected to this vacuum pump, and the 3rd end is connected to this deionized water source;
One vacuum tank is connected between this first end and this second end of this transfer conduit;
One aqua storage tank is connected between this first end and the 3rd end of this transfer conduit;
One valve is connected between this first end, this vacuum tank and this aqua storage tank, so as to controlling the keying state of this vacuum tank and this first end or this aqua storage tank and this first end;
One valve is arranged between this first end and this vacuum tank; And
One valve is arranged between this first end and this aqua storage tank.
2, vacuum load supporting device according to claim 1 is characterized in that, also includes a compressed air source, is communicated in this aqua storage tank.
3, vacuum load supporting device according to claim 2 is characterized in that, this compressed air source also is communicated in this vacuum tank.
4, vacuum load supporting device according to claim 1 is characterized in that, this vacuum tank is connected near on this transfer conduit of this first end.
5, vacuum load supporting device according to claim 1 is characterized in that, this aqua storage tank is connected near on this transfer conduit of this first end.
6, vacuum load supporting device according to claim 1 is characterized in that, also includes one first bypass line, connects this vacuum tank and this vacuum pump.
7, vacuum load supporting device according to claim 1 is characterized in that, also includes one second bypass line, connects this aqua storage tank and this deionized water source.
8, vacuum load supporting device according to claim 1, it is characterized in that, this vacuum load supporting device has an absorption mode and a release mode, under this absorption mode, be connected in this valve between this first end, this vacuum tank and this aqua storage tank to this vacuum tank for unlatching to this aqua storage tank for closing, make this first end and this vacuum tank conducting, under this release mode, be connected in this valve between this first end, this vacuum tank and this aqua storage tank to this aqua storage tank for unlatching to this vacuum tank for closing, make this first end and this aqua storage tank conducting.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB200610138287XA CN100437262C (en) | 2006-11-10 | 2006-11-10 | Vacuum load supporting device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB200610138287XA CN100437262C (en) | 2006-11-10 | 2006-11-10 | Vacuum load supporting device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1959487A CN1959487A (en) | 2007-05-09 |
| CN100437262C true CN100437262C (en) | 2008-11-26 |
Family
ID=38071255
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB200610138287XA Expired - Fee Related CN100437262C (en) | 2006-11-10 | 2006-11-10 | Vacuum load supporting device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100437262C (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10135316A (en) * | 1996-10-28 | 1998-05-22 | Sony Corp | Vacuum chucking method for thin substrate and vacuum chuck table apparatus therefor |
| US20020067585A1 (en) * | 2000-06-02 | 2002-06-06 | Nikon Corporation | Electrostatic wafer chucks and charged-particle-beam exposure apparatus comprising same |
| US20020148566A1 (en) * | 2001-04-17 | 2002-10-17 | Tokyo Electron Limited | Substrate processing unit |
| CN1754629A (en) * | 2004-08-31 | 2006-04-05 | 东京応化工业株式会社 | Base board platform and base board adsorption and peel off method |
-
2006
- 2006-11-10 CN CNB200610138287XA patent/CN100437262C/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10135316A (en) * | 1996-10-28 | 1998-05-22 | Sony Corp | Vacuum chucking method for thin substrate and vacuum chuck table apparatus therefor |
| US20020067585A1 (en) * | 2000-06-02 | 2002-06-06 | Nikon Corporation | Electrostatic wafer chucks and charged-particle-beam exposure apparatus comprising same |
| US20020148566A1 (en) * | 2001-04-17 | 2002-10-17 | Tokyo Electron Limited | Substrate processing unit |
| CN1754629A (en) * | 2004-08-31 | 2006-04-05 | 东京応化工业株式会社 | Base board platform and base board adsorption and peel off method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1959487A (en) | 2007-05-09 |
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| C14 | Grant of patent or utility model | ||
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Granted publication date: 20081126 Termination date: 20201110 |