CN100397968C

CN100397968C - Electromagnetic shielding sheet

Info

Publication number: CN100397968C
Application number: CNB038239582A
Authority: CN
Inventors: 荒川文裕; 石井康英彦; 桥本大祐; 京田享博; 大石英司
Original assignee: Dai Nippon Printing Co Ltd
Current assignee: Dai Nippon Printing Co Ltd
Priority date: 2002-08-08
Filing date: 2003-08-06
Publication date: 2008-06-25
Anticipated expiration: 2023-08-06
Also published as: DE10393019B4; CN1689386A; KR20050029312A; US20050244609A1; WO2004016058A1; AU2003254831A1; KR20080023269A; DE10393019T5; TW200404493A; TWI253322B; US7371450B2; JP4445858B2; JPWO2004016058A1

Abstract

An electromagnetic wave-shielding sheet (1) comprises a transparent base member and a metal layer that is laid over one face of the transparent base member. The metal layer has a mesh-like mesh portion (103), a mesh-like mesh outer-periphery portion (104) surrounding the mesh portion (103), and a grounding frame portion (101) surrounding the mesh outer- periphery portion (104). The width of a line forming meshes of the mesh outer- periphery portion (104) is gradually expanded in width from the mesh portion (103) toward the grounding frame portion (101). In the entire steps from the production to assembly of the electromagnetic wave-shielding sheet (1), bending or wire breakage is not likely to occur in the sheet, and therefore the sheet has an excellent aptitude for handling.

Description

Slice for electromagnetic wave shielding

Technical field

The present invention relates to be used for shielding (also crying inhibitions) electromagnetic, more detailed saying relates to the front of displays such as being configured in CRT, PDP, shields electromagnetic by this display generation.

Background technology

(technical overview)

Follow the High Level of function of electric/electronic device and the increase of utilization in recent years, electromagnetic noise interference (EMI) increases.Electromagnetic wave noise has roughly been distinguished conducted noise and radiated noise.

The method of removing conducted noise has the method for using noise filter etc.The method of removing radiated noise has: for the space solenoid isolation is utilized the framework of metal or between circuit board, insert metallic plate, with the method for metal forming wraparound cable etc.These methods produce effect on the electromagnetic wave shielding of circuit or power supply area (block)., these members are because opaque, therefore are not suitable for from the shielding electromagnetic waves of the front generation of the display of CRT and Plasmia indicating panel (being called PDP) etc.

Plasmia indicating panel is the assembly that has the glass of data electrode and fluorescence coating and have the glass of transparency electrode.When such Plasmia indicating panel was worked, electromagnetic wave, near infrared ray and heat are a large amount of to be taken place.

Usually, for shielding electromagnetic wave, front plate is set in the front of Plasmia indicating panel.As the shielding electromagnetic waves from the positive generation of display, with regard to the electromagnetic wave of 30MHz-1GHz, 30dB or above function are necessary.

In addition, the near infrared ray from the positive wavelength 800-1100nm that takes place of display also can make other equipment such as VTR delay work.Therefore, near infrared ray also needs similarly to shield with electromagnetic wave.

In addition, recognize image shown on the display in order easily to look, the front plate that electromagnetic wave shielding is used (sheet) is difficult to see the lines portion of wire netting, and the transparency (visible light permeability, visible light transmissivity) that also do not have the scrambling of grid, promptly has an appropriateness is necessary.

In addition, Plasmia indicating panel is a feature with large-scale picture usually.Therefore, the size of slice for electromagnetic wave shielding (overall dimension) for example 37 types has 621 * 831mm unexpectedly, and 42 types have 983 * 583mm unexpectedly, and large-scale again size also has.Therefore, from being fabricated onto to each operation of the assembling of display of slice for electromagnetic wave shielding, easily break in the border of earthy frame portion and wet end, i.e. the suitable property of operation is very bad.

(prior art)

The front plate (sheet) that electromagnetic wave shielding is used is pursued the transparency (visible light transmissivity) of electromagnetic wave shielding performance, appropriateness and the excellent suitable property of operation.

In order to improve the visibility of displayed image, Te Kaiping 5-283889 communique discloses a kind of electromagnetic shielding material, it comprises the chemical deposit of substrate, transparent cementation layer and lattice shape, and by chemical plating, the transparent cementation layer under the chemical deposit becomes black pattern portion.

In addition, the spy opens clear 61-15480 communique and discloses at the surperficial cupric oxide tunicle that forms of the wire netting of electromagnetic wave shielding sheet, suppresses the method for outer reflection of light.

In addition, the spy opens flat 09-293989 communique and discloses: the black resist that uses when adopting the photoresist method to form the wire netting of electromagnetic wave shielding sheet, and will make its former state fixedly remaining after the grid perforate, make the lines portion of grid become the method for black.

In addition, the spy open that flat 10-335885 communique discloses will be with photoetching process at the electromagnetic wave shielding constituting body of plastic film lamination on plastic plate that forms geometric band Copper Foil on the Copper Foil.

Use above-mentioned any method of net-shaped metal layer, the live width that all is wire netting is that target makes with constant., the in fact net of the boundary member of wet end and earthy frame portion and the mixed and disorderly generation of line particularly is difficult to avoid when transportation.In addition, the boundary member of wet end and earthy frame portion, rigidity changes extremely discontinuously.Therefore, from the manufacturing process of slice for electromagnetic wave shielding to each operation of the assembling of display, combination since concentrate on this boundary member stress effect and can bend or break, i.e. the suitable property of operation is very bad.Therefore a lot of these shortcomings of situation that have waste high price parts.

Summary of the invention

The present invention finishes for eliminating such problem.Its objective is provides a kind of slice for electromagnetic wave shielding, it is configured in the front of displays such as CRT, PDP, the electromagnetic wave that shielding takes place from display, on the other hand, do not have the mixed and disorderly of grid, can keep the good visibility of displayed image, even and large-scale, the bad of fractureing of grid lines etc. do not taken place from the whole operations that are fabricated onto assembling yet, the suitable property excellence of operation.

The present invention is a kind of slice for electromagnetic wave shielding, it is characterized in that, possesses transparent base and the lamination metal level on a face of above-mentioned transparent base, above-mentioned metal level has netted wet end, surround the netted net peripheral part of above-mentioned wet end and surround the earthy frame portion of above-mentioned net peripheral part, and the line width of lines that constitutes the grid of above-mentioned net peripheral part is widened to earthy frame portion gradually from wet end.

Slice for electromagnetic wave shielding of the present invention, when being configured in displays such as CRT, PDP positive, the electromagnetic wave that shielding takes place from this display, on the other hand, net is not mixed and disorderly, can keep the good visibility of displayed image, even and large-scale, the bad of fractureing of grid lines etc. do not taken place from the whole operations that are fabricated onto assembling yet, i.e. the suitable property excellence of operation.

Usually, the live width of lines that constitutes the grid of above-mentioned wet end is the same.

Preferred above-mentioned net peripheral part is containing 1-50, preferred especially 1-25 grid from above-mentioned earthy frame portion to the direction of above-mentioned wet end.

Perhaps, preferred above-mentioned net peripheral part is in the wide cut that 0.15-15mm, preferred especially 0.3-7.5mm are arranged to the direction of above-mentioned wet end from above-mentioned earthy frame portion.

In addition, the line width of lines that preferably constitutes the grid of above-mentioned net peripheral part is widened to earthy frame portion continuously from wet end.Perhaps, the line width of lines that preferably constitutes the grid of above-mentioned net peripheral part is widened to earthy frame portion step by step from wet end.These occasions, the suitable property of operation is fabulous, has prevented bending or permanent bend, can not waste the parts of high price.

In addition, at least one face of preferred above-mentioned metal level is handled by melanism.In the case, because self blackening of net, therefore do not need to be printed as the operation of black architrave shape, good visibility (preventing the flicker of picture) that can the long term maintenance displayed image yet.In addition, in this case, preferably on the face of being handled by melanism at least of above-mentioned metal level, antirust coat is set.

In addition, the peristome of net at least of preferred above-mentioned wet end and above-mentioned net peripheral part is filled with resin, and above-mentioned metal level is flattened in fact.In the case, since peristome concavo-convex of net by landfill, therefore all operation raisings.

In this case, above-mentioned resin preferably contains the colour correction of light of visible waveband of absorbing wavelength 570-605nm with the near infrared ray absorption of the light of the near infrared band of light light absorbers and/or absorbing wavelength 800-1100nm.

In addition, the colour correction of light of visible waveband of absorbing wavelength 570-605nm preferably is set with the near infrared ray absorption layer of the light of the near infrared band of light light absorbers layer and/or absorbing wavelength 800-1100nm at least one face.

Electromagnetic wave shielding sheet of the present invention can be arranged on its substrate surface PDP display side.In the case, can reduce operation and the man-hour that electrode is drawn.

The simple declaration of accompanying drawing

Fig. 1 is the plane graph of the slice for electromagnetic wave shielding of an embodiment of the present invention.

Fig. 2 is the oblique view of a part of schematically representing the slice for electromagnetic wave shielding of an embodiment of the present invention.

Fig. 3 (A) is the A-A line sectional view of Fig. 2, and Fig. 3 (B) is the B-B line sectional view of Fig. 2.

Fig. 4 is the sectional view of the formation of explanation conductive material layer.

Fig. 5 (A) is the plane graph of the processing that begins from take up roll of explanation, and Fig. 5 (B) is its side view.

Fig. 6 is the amplification view of a part of the net peripheral part of an embodiment of the present invention.

Fig. 7 is the sectional view of slice for electromagnetic wave shielding that is fitted in an embodiment of the present invention of display face.

The preferred plan that carries out an invention

Below describe in detail with reference to accompanying drawing about embodiment of the present invention.

(whole formation)

Fig. 1 is the plane graph of the slice for electromagnetic wave shielding of an embodiment of the present invention.Fig. 2 is the oblique view of a part of schematically representing the slice for electromagnetic wave shielding of an embodiment of the present invention.

As shown in Figure 1, the slice for electromagnetic wave shielding 1 of an embodiment of the present invention possesses the wet end 103 that is present in inner central section and is present in the earthy frame portion 101 of outermost perimembranous.Earthy frame portion 101 when the occasion that is arranged on the display, takes ground connection.

At wet end 103, as shown in Figure 2, on a face of base material 11, conductive material layer 109 by adhesive layer 13 laminations.This conductive material layer 109 is form a plurality of peristomes 105 netted densely.The line portion 107 that each net utilization constitutes the frame of peristome 105 constitutes.The width of line portion 107 is called live width W, and the interval of line and line is called spacing P.

Between wet end 103 and earthy frame portion 101, disposing net peripheral part 104.Net peripheral part 104 also is and roughly the same netted of wet end 103, but the line width of the lines of each grid of net peripheral part 104 is little by little widened to earthy frame portion 101 from wet end 103.

(formation of layer)

Fig. 3 (A) is the A-A line sectional view of Fig. 2, and Fig. 3 (B) is the B-B line sectional view of Fig. 2.Fig. 4 is the sectional view of the formation of explanation conductive material layer.

The cross section that Fig. 3 (A) expresses transversal peristome, peristome 105 and line 107 alternately manifest.Fig. 3 (B) expresses the cross section of vertical transversal 107, and the line 107 that comprises conductive material layer 109 manifests continuously.Conductive material layer 109 has metal level 21, to being the two sides in its sightingpiston, the present embodiment at least, carrying out melanism and handles.And, be provided with

antirust coat

25A and 25B and make it to cover face 23A and the 23B that is handled by melanism.Antirust coat only is arranged on the face that melanism was handled at least and gets final product.

Antirust coat

25A, 25B have metal level 21 and the face 23A that is handled by melanism thereof, the antirust function of 23B, and prevent that also the face 23A, the 23B that are handled by melanism from coming off.In addition, when etching and processing metal level 21 forms net, make with the antirust coat 25A of base material 11 adjacency also residually at peristome 105 places by etching, antirust coat 25A also protects base material 11 and adhesive layer 13 to avoid the evil of etching solution.Another face of choosing wantonly at metal level 21 is provided with face 23B and the antirust coat 25B that melanism is handled.That is,

face

23A, 23B and antirust coat 25A, the 25B that melanism handles being set on the two sides is arbitrarily.In a word, preferred face and the antirust coat that the melanism processing is set in the observation side at least, and, on whole of base material 11 sides (corresponding to peristome, line portion), antirust coat 25A is set.

(main points of invention)

Slice for electromagnetic wave shielding 1 of the present invention is being provided with net peripheral part 104 between wet end 103 and earthy frame portion 101.The line width W at the line part place of the lines 107 of grid little by little becomes big from wet end 103 to earthy frame portion 101 in the net peripheral part 104.

Form the zone of net peripheral part 104, from the interior circumferential wet end 103 of earthy frame portion 101, for about 1-50 grid or 0.15-15mm, the part of preferred 1-25 grid or 0.3-7.5mm, further preferably 3-20 grid or 1.5-6.0mm.

Line width continuously (referring to Fig. 6) or step by step (referring to Fig. 1) become big.Line width becomes big occasion step by step, and can resemble Fig. 1 is 1 grade, but concentrates for dispersive stress effectively, preferably 2 grades or more than.

The line width W of the line 107 by making net peripheral part 104 little by little becomes big from wet end 103 to earthy frame portion 101, changes lentamente to earthy frame portion rigidity from wet end.That is, relaxed significantly for extreme stiffness variation in the past.In view of the above, from the manufacturing process of this slice for electromagnetic wave shielding to each operation of the assembling of display, clustered operation, the suitable property of operation is fabulous.That is, prevent the generation of bending or permanent bend, also prevented to take place the broken string of grid at the boundary portion place of grading of earthy frame portion and wet end, can not waste the parts of high price.

Plasmia indicating panel is a feature with large-scale picture.Therefore, the size of slice for electromagnetic wave shielding (overall dimension) for example 37 types has about 620 * 830mm unexpectedly, and 42 types have about 580 * 980mm unexpectedly, and more large-scale size also has.Therefore, to each operation of the assembling of display, clustered operation, the suitable property of operation is very important from the manufacturing process of slice for electromagnetic wave shielding.The slice for electromagnetic wave shielding in past has often been wasted the parts of high price at the boundary portion office of earthy frame portion and wet end broken string or crooked.

In this manual, situation about slice for electromagnetic wave shielding of the present invention being mainly used on the displays such as CRT, PDP is described, but slice for electromagnetic wave shielding of the present invention can be used in also in the electromagnetic purposes of shielding from the device beyond the display.

(summary of manufacture method)

At first, prepare observing the conductive material layer 109 that side is provided with melanism treated side and antirust coat at least.This conductive material layer 109 by adhesive layer 13 laminations on a face of transparent membranaceous base material 11.Resist layer on conductive material layer 109 be set to lattice shape thereafter.The conductive material layer 109 of the part that covers with resist layer is not removed by etching, removes resist layer (so-called photoetching process) thereafter.

The slice for electromagnetic wave shielding 1 of the present embodiment can use the etching machines of flat members such as existing shadow mask to make.In addition, owing to can carry out a plurality of manufacturing processes continuously, so quality and qualification rate height, production efficiency is also high in addition.

The following material and the formation method of each layer of the slice for electromagnetic wave shielding 1 of explanation the present embodiment.

(conductive material layer)

In the electric conducting material portion 109 of the slice for electromagnetic wave shielding of the present embodiment, at least one face of metal level 21 is handled by melanism, become melanism treated side 23A and/or 23B, and, on this melanism treated side 23A and/or 23B, antirust coat 25A and/or 25B are being set.

Electric conducting material portion 109 is by binding agent and base material 11 laminations that comprise hyaline membrane.It is netted to adopt photoetching process that electric conducting material portion 109 is processed into after lamination.The metal level side is flattened as required, and the luminous ray and/or the near infrared light absorber layer that absorb specific wavelength further are set as required.

When the slice for electromagnetic wave shielding that will have such electric conducting material portion 109 is configured in display positive, electromagnetic wave conductively-closed from the display generation, there is not grid deep or light irregular on the other hand, black or white point-like line defect is few, have the appropriate transparency, promptly can keep the good visibility of the shown image of display.

As the conductive material layer 109 of shielding electromagnetic wave, for example utilize gold, silver, copper, iron, aluminium, nickel, chromium etc. to have the fully metal level 21 of the conductivity of the degree of shielding electromagnetic wave.Metal level 21 not only can be a simple substance, can also be alloy or multilayer.As metal level 21, in the occasion of iron, mild steel, Ni-Fe alloy, the invar of preferred low-carbon (LC) boiling steel and carbon aluminium-killed steel etc.In addition, in the occasion of carrying out cathode deposition, consider preferably copper or copper alloy foil from the easness of deposit.As copper alloy foil, can use rolled copper foil or electrolytic copper foil, but handle from the homogeneity of thickness, with melanism and/or the adhesiveness of chromate (processings) layer and can carry out 10 μ m or the aspect of following filming is considered, preferably electrolytic copper foil.

The thickness of metal level 21 is about 1-100 μ m, preferably 5-20 μ m.During for this value or following thickness, photolithographic net processing becomes easily, but the resistance value of metal increases the infringement electromagnetic shielding effect.On the other hand, during for this value or above thickness, can not get the meticulous mesh shape of desired height, its result, the aperture opening ratio step-down of essence, light transmittance reduces, and the visual angle also reduces, and the visibility of image reduces.

As the surface roughness of metal level 21, preferred Rz value is 0.5-10 μ m.So-called surface roughness Rz is 10 the mean value of measuring according to JIS-B0601.When this value was following, even melanism is handled, also the direct reflection ambient light made visual visibility variation.Be worth when above at this, when coating binding agent or resist etc., do not spread all over the whole or gassing in surface.

(melanism processing)

In order to be absorbed into the lip-deep outdoor sunlight of the wet end that is mapped to slice for electromagnetic wave shielding 1, indoor outer light such as electric light light, improve the visibility of the image of display, the observation side of netted electric conducting material portion 109 is carried out melanism handle.Contrast increases in view of the above.

Melanism is handled and is undertaken by alligatoring and/or melanism metal level.Specifically, all methods of applicable formation metal oxide or metal sulfide or the like.

In the occasion of iron, in steam the temperature exposure 10-20 about 450-470 ℃ minute usually, form the oxide-film (melanism film) about 1-2 μ m.Perhaps, also can handle and form oxide-film (melanism film) by the medicine of red fuming nitric acid (RFNA) etc.

In addition, in the occasion of Copper Foil, preferably in the electrolyte that comprises sulfuric acid, copper sulphate and cobaltous sulfate etc., carry out catholyte and handle the cathode deposition that the cationic particle is adhered to.By the cationic particle is adhered to, when realizing alligatoring, obtain black.As the cationic particle, the alloy particle of applicable copper particle, copper and other metals etc., but the particle of copper-cobalt alloy preferably.

In this manual roughening treatment and black processing are lumped together, the processing that prevents the light reflection that the light absorption on conductive member surface is produced is called melanism and handles.

The preferred black density that melanism is handled be 0.6 or more than.Assay method as black density, use " GRETAG SPM100-11 " (the キモト corporate system of " COLOR CONTROL SYSTEM ", trade name), at observation visual angle 10 degree, observe light source D50, set under the condition of " density criterion ANSI T " determination test sheet after white calibration as types of illumination for.

In addition, the light reflectance of handling as melanism, preferred 5% or below.Light reflectance uses nephelometer HM150 (color corporate system in the village, trade name) to measure according to JIS-K7105.

(alloy particle)

As above-mentioned cationic particle, the alloy particle of applicable copper particle, copper and other metals etc., but the particle of copper-cobalt alloy preferably.

When using the particle of copper-cobalt alloy, the degree of melanism significantly improves, and can absorb visible light well.As the optical characteristics of the visibility of estimating slice for electromagnetic wave shielding, colorimetric system " L*, a*, b*, the Δ E* " expression of tone according to JIS-Z8729.Each absolute value hour of should " a* " reach " b* ", electric conducting material portion 109 becomes not visiblely recognizes the contrast raising of image, as a result of Tu Xiang visibility excellence.When using the particle of copper-cobalt alloy, compare with copper particle, it is little to make " a* " to reach " b* ", roughly approaches 0.

In addition, the preferred 0.1-1 μ of the average grain diameter m of copper-cobalt alloy particle.Be worth when above when the particle diameter that makes copper-cobalt alloy particle increases to this, the thickness attenuation of metal forming 21, with the operation of base material 11 laminations in Copper Foil fracture etc. takes place, processability worsens, in addition, the outward appearance density of dense particles shortcoming, inhomogeneity is obvious.On the other hand, when being worth following particle diameter for this, alligatoring deficiency, so the effect deficiency that prevents external light reflection of light absorption generation, the visibility of image degenerates.

(antirust coat)

For give metal level 21 and/or melanism treated

side

23A, 23B with antirust function and melanism treated side come off or be out of shape prevent function, in metal foil surfaces antirust coat 25A and/or 25B are set at least with melanism treated side.As

antirust coat

25A, 25B, the oxide of applicable nickel, zinc and/or copper or chromate processing layer.The formation of the oxide of nickel, zinc and/or copper gets final product with known plating method.As its thickness is about 0.001-1 μ m, preferably 0.001-0.1 μ m.

(chromate)

Chromate is handled, coating chromate treatment fluid on processed material and carrying out.As this coating process, applicable rolling method, curtain coating method, crowded extrusion method, electrostatic atomization method, infusion process etc.Do not wash just dry getting final product after the coating.For example, the single face of processed material is implemented the occasion that chromate is handled, employing roller coat etc. to the occasion that implement on the two sides, can utilize infusion process at this single face coating chromate treatment fluid.As the chromate treatment fluid, use the CrO that contains 3g/L usually ₂The aqueous solution.Outside this, also can use and add the hydroxy carboxylic acid compound different, the part of 6 valency chromium is reduced into the chromate treatment fluid of 3 valency chromium with chromium anhydride solution.

According to the adhesion amount of 6 valency chromium what, and be coloured to from faint yellow, but 3 valency chromium self are colourless to yellowish-brown.If therefore control 3 valency chromium and 6 valency chromium, then obtain the practical no problem transparency that.

As the hydroxy carboxylic acid compound, can be separately or and land used use tartaric acid, malonic acid, citric acid, lactic acid, glycolic, glyceric acid, tropic acid, diphenylglycollic acid, hydroxypentanoic acid etc.Because reproducibility is different because of compound, so addition is based on the reproducibility of 3 valency chromium is determined.

Specifically, can utilize ア Le サ-Off 1000 (Japanese ペイ Application ト corporate system, chromate inorganic agent trade name), PM-284 (Japanese パ-カライジ Application グ corporate system, chromate treatment fluid trade name) etc.Go up the occasion of implementing the chromate processing at melanism treated side (layer), obtaining also to obtain melanism processing stiffening effect on the rust-proof effect basis.

Melanism treated side and antirust face are arranged on the occasion of observing side, and contrast is improved, and make the visibility of image of display good.On the other hand, promptly be arranged on the occasion of display face side, suppress, still improve the visibility of image from the stray light of display generation.

(base material)

As the material of base material 11, if the transparency, insulating properties, thermal endurance, mechanical strength etc. of the condition that satisfies service condition and make, then applicable all materials are arranged.For example can utilize PETG, polybutylene terephthalate (PBT), PEN, poly terephthalic acid ethylene isophthalate copolymer, terephthalic acid (TPA) cyclohexanedimethanol glycol copolymer, the polyester based resin of the co-extruded films of PETG/PEN etc., nylon 6, nylon 66, the polyamide-based resin of NYLON610 etc., polypropylene, the polyolefin-based resins of polymethylpentene etc., the vinyl resin of polyvinyl chloride etc., polyacrylate, polymethacrylates, the acrylic resin of polymethyl methacrylate etc., polyimides, polyamidoimide, the imide series resin of Polyetherimide etc., polyarylate, polysulfones, polyether sulfone, polyphenylene oxide, polyphenylene sulfide (PPS), Nomex, polyether-ketone, the polyethers nitrile, polyether-ether-ketone, the engineering resin of polyethers sulfite etc., Merlon, the phenylethylene resin series of polystyrene resin etc. etc.

Base material 11 also can be to be the copolymer resins or the mixture (comprising alloy) of principal component or to comprise a plurality of layers laminated body with these resins.Base material 11 can be that stretched film also can be a unstretching film, but for the purpose that improves intensity, preferably the film that stretched at single shaft direction or biaxially oriented.About the common applicable 12-1000 μ m of the thickness of base material 11, but preferred 50-700 μ m, most preferably 100-500 μ m.During for the following thickness of this value, warpage or lax etc. takes place in the mechanical strength deficiency, during for the above thickness of this value, reaches superfluous performance, also waste on the cost.

Base material 11 adopts formation such as at least 1 layer film comprising these resins, sheet, plate, and these forms are referred to as film in this manual.Usually the polyester mesentery of PETG, PEN etc. is owing to the transparency, good heat resistance, and cost is also cheap, is therefore preferably used.PETG most preferably.In addition, the transparency is high more good more, preferred luminous ray transmitance be 80% or more than.

Base material film, before the coating binding agent, can carry out tackify knots such as Corona discharge Treatment, plasma treatment, ozone treatment, flame treatment, bottoming (be also referred to as cementation coating, adhesive accelerant, increase binding agent) coating processing, The pre-heat treatment, dust removal process, vapor deposition treatment, alkali treatment to this coated face and handle.In this resin molding, can add additives such as filler, plasticizer, anti-live agent as required.

(lamination method)

As lamination (also the being lamination) method of base material 11 and conductive material layer 109, coating binding agent or adhesive on side of base material 11 or conductive material layer 109 or two sides, dry as required, in heating or do not pressurize under the heated state.Can as required under 30-80 ℃ temperature carry out slaking (maintenance) thereafter.In addition, base material 11 self, perhaps base material 11 comprises a plurality of layers occasion, with the lamination face of conductive material layer 109, for example if the heat adhesiveness resin of ionomer resin, vinyl-vinyl acetate copolymer, ethylene-acrylic acid copolymer, vinyl-acrylate copolymer etc. then gets final product in following heating of heating.In the case, can omit adhesive layer 13.

In addition, also can on base material 11, adopt chemical plating, chemical plating and electrolysis plating and directly form conductive material layer 109 with methods such as, evaporations.This occasion also can be omitted adhesive layer 13.

(binding agent)

Do not limit especially as binding agent, for example can utilize acrylic resin, mylar, ammonia ester resin, vinyl chloride-vinyl acetate copolymerization resin etc.Dyeing that preferred use etching solution causes or the method that deterioration is few, suitable good thermosetting resin, the those skilled in the art of property of processing are called the dry lamination method.And also preferred the use adopts ultraviolet ray ionization radial lines such as (UV) to solidify the UV gel-type resin of (reaction).

(dry lamination)

So-called dry lamination method is solvent and the dry overlapping lamination of applying base material that disperses or dissolves binding agent in inside with being coated with, and 30-120 ℃ of slaking several hours to several days, makes adhesive cures thus, makes the method for 2 kinds of material laminations.

The non-solvent laminating that has improved the dry lamination method also can be utilized.This is binding agent self and the dry overlapping lamination of applying base material that does not disperse or dissolve in the solvent being coated with, and 30-120 ℃ of slaking several hours to several days, makes adhesive cures thus, makes the method for 2 kinds of material laminations.

As the binding agent that in dry lamination method or non-solvent laminating, uses, the binding agent that the ionization radial line of applicable employing heat or ultraviolet electron ray etc. solidifies.As hot setting adhesive, applicable particularly 2 solution curing type binding agents, for example to comprise acrylic acid ammonia ester be that resin, poly ester urethane are that resin, poly(ether-urethane) are that the ammonia ester of resin etc. is that binding agent, acrylic acid series binding agent, polyester are that binding agent, polyamide-based binding agent, polyvinyl acetate are that binding agent, epoxy are that binding agent, rubber are binding agent etc., but preferred 2 solution curing type ammonia esters are binding agent.

As 2 solution curing type ammonia esters is resin, for example can use the polymer that is obtained by the reaction of polyfunctional isocyanate and hydroxy-containing compounds (polyalcohol) particularly.Specifically, for example as the polyfunctional isocyanate, can use the polyfunctional isocyanate of aliphat (or alicyclic) polyisocyanates etc. of the aromatic polyisocyanate of toluene di-isocyanate(TDI), methyl diphenylene diisocyanate, polymethylene polyphenylene(poly)isocyanate etc. or hexamethylene diisocyanate, XDI, IPDI etc.As these polyisocyanates, also can use the polymer (trimer etc.) of above-mentioned isocyanates or add adult.In addition, as hydroxy-containing compounds, can use polyethers is that polyalcohol, polyester are the hydroxy-containing compounds of polyalcohol, polyacrylate polyol etc.The 2 liquid type ammonia esters that can use the reaction by these polyfunctional isocyanates and hydroxy-containing compounds to obtain are resin.

Can preferably use dyeing, the deterioration that does not have etching solution to cause and cooperate and use the polyester-polyurethane of styrene-maleic acid copolymer modification and the binding agent of aliphatic polyisocyante.

In the dry lamination method, to be that the adhesive composition of principal component is to organic solvent dissolution or dispersion with these materials, utilizing it for example, rubbing methods such as roller coat, contrary roller coat cloth, grooved roll coating, the contrary coating of grooved roll, the coating of transfer type grooved roller, kiss coating, the coating of coiling rod, comma coating, scraper coating, dip coated, showering cloth, spraying are coated on the base material, by dry solvent etc., can form the lamination adhesion coating.Preferred roller coat cloth or the contrary roller rubbing method of using.

The thickness of adhesion coating is about 0.1-20 μ m under drying regime, preferably 1-10 μ m.Adhesion coating by 30-120 ℃ of slaking several hours to several days, makes adhesive cures once forming the base material of lamination applying immediately.Base material is adhered in view of the above.The coated face of binding agent can be base material side, electric conducting material portion side wantonly 1.Be preferably Copper Foil side through alligatoring.In the case, binding agent spreads all over the integral body of alligatoring face, being suppressed of bubble.

The non-solvent laminating is same with the dry lamination method basically, but adhesive composition directly uses not to organic solvent dissolution or dispersion.Especially for viscosity is reduced, also adhesive composition is heated and heats sometimes.

(adhesive)

As adhesive, applicable pressure-sensitive and the known adhesive that bonds.Do not limit especially as adhesive, the synthetic rubber that for example can be suitable for natural rubber system, butyl rubber, polyisoprene, polyisobutene, polychlorobutadiene, styrene-butadiene copolymer resins etc. is that the vinyl acetate of the siloxane-based resin of resin, dimethyl polysiloxane etc., acrylic resin, polyvinyl acetate, EVAc etc. is that resin, ammonia ester are the rosin series resin of resin, acrylonitrile, hydrocarbon resin, alkyl phenol resin, rosin, rosin triglyceride, Foral etc.

(rubber is adhesive)

At this, as rubber is adhesive, at neoprene, acrylonitrile-butadiene rubber, acrylic rubber, styrene butadiene ribber, styrene isoprene styrene, styrene butadiene styrene, the styrene ethylene butadiene styrene, butyl rubber, Oppanol, natural rubber, cooperated phenol resin among the sticking rubber of polyisoprene rubber etc. one or more, modified phenolic resin, ketone resin, alkyd resins, the rosin series resin, coumarone resin, phenylethylene resin series, Petropols, one or more adhesive of the tackify material of vinyl chloride-based resin etc. is effective.

Rubber is adhesive, compares resistance to chemical reagents, anti-swelling, heatproof degree, adhesiveness and peel strength excellence with the acrylic acid series binding material.Therefore, though adhesive segment be exposed to acidity or alkalescence material in do not peel off yet.In addition, rubber is that jointing material in acid or alkaline soup hydrolysis takes place hardly, and the bonding life-span is long.

(formation of adhesive phase)

These resins or these mixtures are made into latex, aqueous dispersions or organic solvent solution, with the known print process or the rubbing method printing of silk screen printing or comma coating etc. or be coated on the square bar material.Overlapping and the pressurization of the dry as required back of this material with another material.

(processing that begins from take up roll)

Fig. 5 (A) and Fig. 5 (B) are the plane graph and the side views of the processing that begins from take up roll of explanation.Details is, Fig. 5 (A) is a plane graph, the state that expression launches from the take up roll unwinding, and slice for electromagnetic wave shielding 1 is disposing at certain intervals.Fig. 5 (B) is a side view, the state that expression launches from the take up roll unwinding, and conductive material layer 109 laminations are on base material 11.

As concrete lamination method, at first form above-mentioned melanism treated side and antirust coat at the conductive material layer 109 that launches from take up roll.After coating binding agent and the drying, overlapping base material 11 also pressurizes on antirust coat.And, in 30-80 ℃ atmosphere, carry out several hours to several days slaking (health, sclerosis) as required, reel again and be wound into the cylinder shape.

(photoetching process)

The conductive material layer veil grid pattern shape of above-mentioned laminated body resist layer is set, remove not the conductive material layer of the part that is covered by resist layer by etching method, thereafter, remove resist layer (photoetching process).Thus, conductive material layer becomes netted.

As described above, the conductive material layer 109 of base material 11 and conductive material layer 109 laminated body adopts photoetching process to form netted.This operation is also carried out the banded laminated body that is wound into the cylinder shape.That is, laminated body is lax and launch, and carries continuously or off and on one side, the respectively processing of implement on one side to shelter, etching, resist being peeled off.

(sheltering)

For example the photonasty resist-coating is on conductive material layer 109.After drying, with version (photomask) contact exposure of the figure (the line portion of net) of regulation, carry out the water developing, implement dura mater processing etc., bake.

Coating about resist, carry the banded laminated body of launching (base material 11 and conductive material layer 109) on one side continuously or off and on, on one side to resists such as 109 method coating caseins of conductive material layer, PVA, gelatin with dipping, curtain coating cloth, flow coat (hanging け stream) etc.In addition, replace painting erosion resistant agent, also can use dried resist film.In the case, transaction capabilities enough improves.The occasion of casein resist bakes at 200-300 ℃ and carries out.Especially in order to prevent the warpage of laminated body, this temperature low temperature of preferably trying one's best.

(etching)

Carry out etching after sheltering.As the etching solution that in etching, uses, carrying out continuously among etched the present invention, preferably the solution of frerrous chloride that can recycle easily or stannous chloride.In addition, this etching work procedure is the same operation of operation of the shadow mask of the colored TV cathode-ray tube of the thin plate of banded continuous thickness 20-80 μ m with making etching basically.Therefore, can use the existing device of making this shadow mask and directly implement continuously from sheltering etching, efficient is fabulous.After the etching, wash, adopt alkali lye to peel off resist, washing, dry thereafter.

(net)

Wet end 103 has a plurality of peristomes 105 that surround with line 107.The shape of peristome 105 does not limit especially, for example applicable equilateral triangle, isosceles triangle equilateral triangle, square, rectangle, rhombus, polygons such as quadrangle, pentagon, hexagon, octagon, circle, ellipse etc. such as trapezoidal.These peristomes are a plurality of be combined into netted.

From the non-visibility of aperture opening ratio, net, and the visibility of image consider that the width W at the line 107 line part places of wet end 103 is decided to be in the scope of setting ± 30%.In addition, link upper base in the line cross sectional shape with the transparency carrier quadrature and the radius of curvature of the sidewall face of going to the bottom be above-mentioned thickness of electrically conductive layer 1.5-3.0 doubly.The steady state value of the line width W of preferred wet end 103 in the 5-25 mu m range, selecting, the steady state value of the spacing between line in the 150-500 mu m range, selecting.In addition, about the part of 1-50 grid constituting net peripheral part 104 in the periphery of wet end 103 or the part of 0.15-15mm, as described later, enlarge gradually towards earthy housing 101 traverse line width.

Usually, on the slice for electromagnetic wave shielding that large-scale plasma display panel is used, form several thousand or above straight line lines, and intersect respectively.By suppressing the line width deviation of this line, and the radius of curvature of upper base and the side wall surface of going to the bottom in the regulation tie line cross sectional shape, can access on the basis of the transparency with electromagnetic wave shielding performance and appropriateness, grid deep or light irregular less, black and white point-like and line defect is few, the flicker of display light less, the also repressed slice for electromagnetic wave shielding 1 of external light reflection with excellent visual visibility.

The deviation of line width for example line width is the occasion of 14 μ m, is suppressed at 14 ± 4.2 μ m, i.e. 9.8-18.2 μ m.If be in this scope, deep or light irregular, black and/or white point-like and the line defect of grid then takes place hardly.If line width has the above width of this value, it is deep or light irregular then to produce grid.In addition, in the big occasion of the deviation of line width, when people observed displayed image, the wide part of line width is visual recognized into black spot defect, and the narrow part of line width is visual recognizes into white-spot defects.When for the image of integral body white point and/or stain being arranged sporadicly, people feel extremely strong sticky feeling.

,,, make the scope of the deviation of line width, so the blocky generation of grid is few in regulation by utilizing continuous photoetching process according to the slice for electromagnetic wave shielding of the present embodiment, and electromagnetic wave shielding performance and transparent no problem.In addition, deep or light irregular or black and/or white point-like of grid and line defect, the spittle of resist liquid also took place attached to time on the unwanted part when painting erosion resistant agent, but in continuous photoetching process, it is very rare that such phenomenon takes place.

In addition, the controlling schemes of line width, wet end 103 exists different with net peripheral part 104.The line width W of line part place of lines 107 is controlled so as to towards earthy frame portion 101 and becomes big gradually in the net peripheral part 104.

Net peripheral part 104 makes it to surround wet end 103 between wet end 103 and earthy frame portion 101.That is, about 1-50 grid or 0.15-15mm, from interior week of earthy frame portion 101 towards the central part of wet end 103 preferred 1-25 grid or 0.3-7.5mm, further preferably 3-20 grid or 1.5-6.0mm become net peripheral part 104.

Net peripheral part 104 has the occasion in the zone more than this, looks at the display periphery and recognizes shade shape frame, and the sensation image is little, and Tu Xiang visibility also reduces in addition.On the other hand, 104 occasions that have less than this zone of net peripheral part, the stiffness variation of grid lines is still too violent, and the bending of lines etc. can take place.As the scheme that line width is widened gradually, can widen continuously along a plurality of peristomes 105 (cell), perhaps each peristome 105 (cell) can be widened step by step.

Fig. 6 is the amplification view of a part of the net peripheral part 104 of the present embodiment.

The line width of the line portion 107 of the regulation of wet end 103 is W, towards earthy frame portion 101, line width W1, the W2 of net peripheral part 104, W3 ,～, Wi ,～, Wn be W＜W1＜W2＜W3＜～＜Wi＜～＜Wn.

In the scheme that line width is widened continuously gradually, each line width W1, W2, W3 ,～Wn widens continuously.That is, for example corresponding to the line width Wi of 1 cell (i=1 ..., n) self widen gradually.

On the other hand, in the scheme that line width is widened step by step, for example the line width Wn corresponding to 1 cell self is same width.In the case, the progression n that widens be 1 or more than, but preferably 2 or more than, disperse to concentrate on the stress of wet end 103 peripheries multistagely.

For example the example of Fig. 6 is n=5, is the situation that unit is widened step by step with 1 cell.In addition, line width widen scheme, need be not identical in whole lines, also can to each line change W1, W2, W3 ,～Wn.

As the method that realizes such line width of widening gradually, the dried resist of will fitting on conductive material layer 109 perhaps is coated with the photonasty resist, is used for pattern on the pattern plate of contact exposure after the drying and is altered to the sort of desired pattern and gets final product.So-called pattern plate is equivalent to the plate-making film that this area practitioner is called, the photonasty resist is the occasion of minus (exposed portion solidify and residual), it is that the part suitable with peristome 105 is opaque, and the part suitable with line 107 is transparent plate-making film (the negative film of line).The photonasty resist is the occasion of eurymeric (unexposed portion is residual), and the plate-making film is positive film.In this pattern plate, the width of the part suitable with line, in zone, be designated as the line width W of regulation corresponding to wet end 103, in the zone corresponding with its peripheral net peripheral part 104, towards earthy frame portion 101 become gradually (W＜) W1＜W2＜W3＜～＜Wn gets final product.

In addition, the inclination angle that the limit of the end of line and slice for electromagnetic wave shielding (bottom surfaces) constitutes is 45 degree in the example of Fig. 1, but is not limited thereto, and in order to eliminate reticulate pattern etc., can consider the suitable selection of the displayer pixel and the characteristics of luminescence.

(planarization)

One forms net, and the line portion 107 of net just has the thickness of conductive material layer, but peristome 105 removal conductive material layers become recess.That is, electric conducting material portion 109 is concavo-convex state.The occasion of coating binding agent or adhesive in next procedure, landfills such as above-mentioned this binding agent of concavo-convex usefulness., at that time, the air of this recess is fully with displacements such as binding agents, and easily remaining with bubble form.When residual bubble, in the light scattering of the interface of bubble and binding agent, turbidity (mist value) uprises.In order to prevent this problem, preferably before bonding, fill above-mentioned recess with transparent resin in advance and carry out planarization.

As planarization, transparent resin is coated on recess and imbeds, but transparent resin is not when invading each corner of recess, and bubble is residual, transparent deterioration.For this reason, transparent resin with dilution such as solvent with low viscosity coating and dry, while or remove air and be coated with.Form planarization layer 29 (referring to Fig. 7 or Fig. 3) as described above.

The planarization layer 29 preferably transparency is high, good and good with the caking property of the binding agent of next operation with the caking property of the electric conducting material of net.But, when there are projection, depression in the surface at planarization layer 29, when irregular, display are set when positive at electromagnetic wave shielding sheet 1, reticulate pattern, interference fringe, Newton's ring etc. take place, so not preferred.As preferable methods, behind the heat reactive resin or ultraviolet curable resin of coating, lamination flatness excellence, the base material of fissility is arranged as resin, make the resin solidification of coating earlier with heat or ultraviolet ray, peel off fissility base material and removal.In the case, the surface at the surface transfer flatness base material of planarization layer 29 forms level and smooth face.

As for forming the resin that planarization layer 29 uses, do not limit applicable various natural or synthetic resin, heat reactive resin or ionization radial line cured resin etc. especially.Especially from considerations such as the easness of the durability of resin, coating, planarization, flatness, the ultraviolet curable resin of preferred acrylic acid series.

(NIR absorbent)

And, in the resin that uses for formation planarization layer 29, also can add the light absorbent that absorbs visible and/or near infrared specific wavelength.By absorbing visible and/or near infrared specific wavelength, discomfort is suppressed, and the visibility of image improves.At this, so-called near infrared particular wavelength band is about 780-1200nm, particularly the wave band about 800-1100nm.The preferred wave band that absorbs 780-1200nm 80% or more than.

As near infrared ray absorption (being called the NIR absorbent), not specific qualification, applicable have rapid absorption near infrared light area, the photopermeability height of visible region 380-780nm and do not have the pigment etc. of the big absorption of specific wavelength at visible region.

In addition, as from the PDP visible light emitted, orange many as the luminescent spectrum of neon atom usually, so picture tone is shifted to orange than natural colour.In order to proofread and correct it, the preferred colour correction light light absorbers of adding with near the characteristic the absorbing wavelength 570-605nm to a certain degree.

As near infrared ray absorption, it is complex, immonium based compound, diimmonium based compound etc. that cyanine based compound, phthalocyanine based compound, naphthalocyanine based compound, naphthoquinones based compound, anthraquinone based compound, dithiol are arranged.

With the light light absorbers phthalocyanine based compound etc. is arranged as colour correction.

(NIR absorbed layer)

Replacement is added the NIR absorbent to planarization layer 29, and the other layer (being called the NIR absorbed layer) with NIR absorbent also can be set at least one face.

The NIR absorbed layer can be arranged on base material 11 sides of planarization layer 29 sides and/or opposition side.Being arranged on the occasion of planarization layer 29 sides, is NIR absorbed layer 31B shown in Figure 3, is arranged on the occasion of base material 11 sides, is NIR absorbed layer 31A shown in Figure 3.NIR absorbed layer 31B and NIR absorbed layer 31A have the commercial membrane (for example Japan's corporate system of twisting flax fibers and weaving, trade name No2832) of NIR absorbent or make adhesive contain NIR absorbent and coating and obtain with the binding agent lamination.As the applicable mylar of adhesive, polyurethane resin, acrylic resin with gel-type resin of reaction curing such as heat or ultraviolet ray, that utilize epoxy, acrylate, methacrylate, NCO etc. etc.In addition, about colour correction with the light light absorbers similarly can with the planarization layer 29 form lamination of layer independently.

(AR layer)

And, though not shown, anti-reflection layer (being called the AR layer) can be set in the observation side of slice for electromagnetic wave shielding.Anti-reflection layer is the layer that prevents the luminous ray reflection, all anti-reflection layers of market sale individual layer and multilayer.The anti-reflection layer of multilayer alternately lamination high refractive index layer and low-index layer.As high refractive index layer, niobium oxide, titanium oxide, zirconia, ITO etc. are arranged.As low-index layer, silica, magnesium fluoride etc. are arranged.The anti-reflection layer that layer with micro concavo-convex surface that the outer light of irregular reference is arranged is also arranged in addition.

(hard conating, stain-proofing layer, antiglare layer)

And, except that antireflection (AR) layer, also hard conating, stain-proofing layer, antiglare layer can be set.Hard conating is the layer that has H or above hardness in the pencil hardness test of JIS-K5400, can be with heat or ionization radial line make that the polyfunctional acrylic ester of polyester acrylate, ammonia ester acrylate, epoxy acrylate etc. solidifies layer.Stain-proofing layer is the coating of hydrophobicity, oleophobic property, applicable siloxane-based, fluoro-alkyl silyl compound etc.Antiglare layer is the layer with micro concavo-convex surface of the outer light of irregular reference.

(sheetization)

Cutting obtains the slice for electromagnetic wave shielding 1 of monolithic as described above with the lamination member of continuous banded state manufacturing.Slice for electromagnetic wave shielding 1 is fitted on the transparency carriers such as glass.With NIR absorbed layer, AR layer, hard conating, stain-proofing layer, antiglare layer combination, become the display front plate as required.

As aforesaid substrate, in the giant display time spent, the substrate of used thickness 1-10mm with abundant rigidity.In addition, in small-sized display times spent such as character indicators, the plastic film of used thickness 0.01-0.5mm.That is, according to the size and the purposes of display, aforesaid substrate can suit to select.At this, slice for electromagnetic wave shielding 1 is in case as after the combination of display front plate, be arranged on the front of display.For this reason, base material 11 sides become the observation side., slice for electromagnetic wave shielding 1 also can directly be fitted in the front of display.

(directly fitting)

Fig. 7 is the sectional view that is fitted in the slice for electromagnetic wave shielding of the present invention of display face.In this case, being netted metal forming side becomes the observation side, on the two sides of metal forming melanism treated side and antirust coat is being set in proper order.In the case, because earthy frame portion 101 exposes laterally, therefore easy extraction electrode is easily obtained ground connection.In addition, because the black flour that earthy frame portion 101 is handled by melanism becomes the observation side, therefore the black printing to the enforcement of above-mentioned glass plate architrave shape ground is unwanted, can shorten operation, and is also favourable aspect cost.

(embodiment 1)

As electric conducting material, use the surface has been implemented to handle, add the electrolytic metal paper tinsel by the thickness 10 μ m of the antirust double melanism processing layer due to the chromate (processing) by the melanism due to copper-cobalt alloy particle of average grain diameter 0.3 μ m.With biaxial stretch-formed PETG (PET) the film A4300 of the chromate (processing) of 2 these electric conducting materials of solution curing type polyurethane series binding agent lamination layer and thickness 100 μ m (Japan twist flax fibers and weave corporate system, trade name), thereafter, 56 ℃ of slakings 4 days.As binding agent, use host ケラ Star Network A-310 that comprises polyalcohol and the curing agent A-10 (being military field pharmaceutical industries corporate system, trade name) that comprises polyisocyanates, coating weight is counted 7 μ m by dried thickness.

In order to form grid, use the manufacturing line that colored TV shadow mask uses continuous ribbon-shaped members is carried out from sheltering etched operation through photoetching process.Specifically, at first comprise caseic photonasty resist in the coating on the whole of electric conducting material aspect with flow coat method.Secondly, this conductive material layer is transported to next station, uses pattern plate and high-pressure mercury lamp with following shape to make it contact exposure.Thereafter, conductive material layer one after the other is transported to each station on one side, on one side the water developing, dura mater is handled, and bakes at 100 ℃ again.

Above-mentioned pattern plate be shaped as following such shape: at wet end, peristome is a square, line width is 22 μ m, line (spacing) at interval is 300 μ m, the inclination angle is 49 degree, and at the wide net peripheral part of 5mm, line width increases towards earthy frame portion continuously from 22 μ m, in the part that is connected with earthy frame portion is 40 μ m, and the width of earthy frame portion (grounding parts) is 5mm.

Conductive material layer further is transported to next station, by with the solution of ferrous chloride of spray-on process winding-up as 40 ℃, the 40 ° Baume degrees of liquid temperature of etching solution, carries out etching, forms peristome.Thereafter, conductive material layer one after the other is transported to each station on one side, washed on one side, resist is stripped from, and washing is again 100 ℃ of dryings.Obtain the slice for electromagnetic wave shielding of embodiment 1 in view of the above.

(comparative example 1)

As the shape of pattern plate, at wet end and net peripheral part, peristome is a square, and line width is 22 all identical μ m till earthy frame portion, and line (spacing) at interval is 300 μ m, and the inclination angle is 49 degree, and is identical with embodiment 1 in addition.Obtain the slice for electromagnetic wave shielding of comparative example 1 in view of the above.

(embodiment 2)

At the planarization layer composition that wet end and the net peripheral part of embodiment 1 is coated with following composition, filling opening portion recess.Thereafter, the SP-PET20-BU of laminate thickness 50 μ m (ト-セロ corporate system, PET film trade name is handled in the surperficial demoulding) uses high-pressure mercury lamp to carry out 200mj/cm ²Exposure (press 365nm convert).Then, peel off SP-PET20-BU, obtain the slice for electromagnetic wave shielding of the embodiment 2 that wet end and net peripheral part be flattened.This slice for electromagnetic wave shielding has performance similarly to Example 1.

As the planarization layer composition, N-vinyl-2-Pyrrolidone 20 mass parts, dicyclopentenyl acrylate 25 mass parts, oligoester acrylate (East Asia synthetic (strain) system have been used, M-8060) 52 mass parts, 1-hydroxycyclohexylphenylketone (チバガイギ-corporate system, イ Le ガキユア 184) 3 mass parts.

(embodiment 3)

In the planarization layer composition of embodiment 2, contain mercaptan-nickel complex 1 mass parts as near infrared ray absorption.In addition, obtain the slice for electromagnetic wave shielding of embodiment 3 similarly to Example 2.This slice for electromagnetic wave shielding has performance similarly to Example 1.The visibility of displayed image is further good.

(embodiment 4)

On the planarization layer of embodiment 2 with adhesive lamination NIR absorbing film No2832 (Japan twist flax fibers and weave corporate system, near-infrared absorption film trade name).In addition, obtain the slice for electromagnetic wave shielding of embodiment 4 similarly to Example 2.This slice for electromagnetic wave shielding has performance similarly to Example 1.The visibility of displayed image is further good.

(embodiment 5)

As the shape of above-mentioned pattern plate, at wet end, peristome is a square, line width is 20 μ m, and line (spacing) at interval is 250 μ m, and the inclination angle is 60 degree, at the wide net peripheral part of 5mm, line width increases towards earthy frame portion continuously from 20 μ m, is 26 μ m in the part that is connected with earthy frame portion.In addition, identical with embodiment 1.In view of the above, obtain the slice for electromagnetic wave shielding of embodiment 5.

(embodiment 6)

As the shape of above-mentioned pattern plate, at wet end, peristome is a square, line width is 20 μ m, and line (spacing) at interval is 250 μ m, and the inclination angle is 60 degree, at the wide net peripheral part of 3mm, line width increases towards earthy frame portion continuously from 20 μ m, is 26 μ m in the part that is connected with earthy frame portion.In addition, identical with embodiment 1.In view of the above, obtain the slice for electromagnetic wave shielding of embodiment 6.

(embodiment 7)

Shape as above-mentioned pattern plate, at wet end, peristome is a square, line width is 20 μ m, line (spacing) at interval is 300 μ m, and the inclination angle is 49 degree, at the net peripheral part of 25 grids, line width increases by 1.0 μ m from 20 μ m step by step towards per 1 cell of earthy frame portion, is 45 μ m in the part that is connected with earthy frame portion.In addition, identical with embodiment 1.In view of the above, obtain the slice for electromagnetic wave shielding of embodiment 7.

(embodiment 8)

Shape as above-mentioned pattern plate, at wet end, peristome is a square, line width is 20 μ m, line (spacing) at interval is 300 μ m, and the inclination angle is 49 degree, at the net peripheral part of 5 grids, line width increases by 3.0 μ m from 20 μ m step by step towards per 1 cell of earthy frame portion, is 35 μ m in the part that is connected with earthy frame portion.In addition, identical with embodiment 1.In view of the above, obtain the slice for electromagnetic wave shielding of embodiment 8.

(embodiment 9)

Press the PET film at melanism treated side that adopts copper-cobalt alloy particle to form and the surface layer opposite with chromate (processing) layer.In addition, similarly to Example 2.Obtain the slice for electromagnetic wave shielding of embodiment 9 in view of the above.

(result)

In embodiment 1, the line width that has used wet end is the resist pattern plate of 22 μ m, but the line width of the wet end of the reality after the etching is 7-17 μ m.And, the line width of the net peripheral part of the reality after the etching, the part that is connected with wet end is 7-17 μ m, the part that is connected with earthy frame portion is 17-29 μ m.

In comparative example 1, the line width of the wet end of the reality after the etching is 10-16 μ m from the part that is connected with wet end to being about to be connected part before with earthy frame portion, but the part that is connected with earthy frame portion is 5-20 μ m, and deviation is big.

In addition, for each 100 of the slice for electromagnetic wave shielding of embodiment 1 and comparative example 1, form planarization layer similar to Example 2.Its result 100 of embodiment 1 goes up and has not unusually just formed planarization layer, but in the comparative example 12 go up and break, qualification rate is low.

And each 100 of the slice for electromagnetic wave shielding of embodiment 1 and comparative example 1 are assembled on the PDP panel.Its result, 100 of embodiment 1 not unusual just assemblings, but in the comparative example 11 bend, 1 is broken, qualification rate is low.

The slice for electromagnetic wave shielding of embodiment 1 to embodiment 8 and comparative example 1 is processed into front plate, is arranged on the front of PDP display, displayed image is estimated visibility, and visibility is all good as a result.

In addition, be set on the PDP display with the substrate surface of adhesive with the slice for electromagnetic wave shielding of embodiment 9, flicker does not have yet, and the visibility of image is good, and the process number of drawing of electrode reduces, and does not need the black printing of architrave shape yet.

Claims

1. slice for electromagnetic wave shielding, it is characterized in that, possesses transparent base and the lamination metal level on the one side of above-mentioned transparent base, above-mentioned metal level has netted wet end, surround the mesh network peripheral part of above-mentioned wet end and surround the earthy frame portion of above-mentioned net peripheral part, and the line width of lines that constitutes the grid of above-mentioned net peripheral part is widened to earthy frame portion gradually from wet end.

2. slice for electromagnetic wave shielding according to claim 1 is characterized in that, the live width of lines that constitutes the grid of above-mentioned wet end is the same.

3. slice for electromagnetic wave shielding according to claim 1 and 2 is characterized in that, above-mentioned net peripheral part is containing 1-50 grid from above-mentioned earthy frame portion to the direction of above-mentioned wet end.

4. slice for electromagnetic wave shielding according to claim 1 and 2 is characterized in that, above-mentioned net peripheral part is at the width that has 0.15-15mm from above-mentioned earthy frame portion to the direction of above-mentioned wet end.

5. slice for electromagnetic wave shielding according to claim 3 is characterized in that, above-mentioned net peripheral part is containing 1-25 grid from above-mentioned earthy frame portion to the direction of above-mentioned wet end.

6. slice for electromagnetic wave shielding according to claim 4 is characterized in that, above-mentioned net peripheral part is at the width that has 0.3-7.5mm from above-mentioned earthy frame portion to the direction of above-mentioned wet end.

7. slice for electromagnetic wave shielding according to claim 1 and 2 is characterized in that, the line width of lines that constitutes the grid of above-mentioned net peripheral part is widened to earthy frame portion continuously from wet end.

8. slice for electromagnetic wave shielding according to claim 1 and 2 is characterized in that, the line width of lines that constitutes the grid of above-mentioned net peripheral part is partly widened to earthy frame from wet end with going on foot.

9. slice for electromagnetic wave shielding according to claim 1 and 2 is characterized in that, at least one face of above-mentioned metal level is handled by melanism.

10. slice for electromagnetic wave shielding according to claim 9 is characterized in that, on the face that the melanism at least of above-mentioned metal level was handled antirust coat is set.

11. slice for electromagnetic wave shielding according to claim 1 and 2 is characterized in that, the peristome of net at least of above-mentioned wet end and above-mentioned net peripheral part is filled with resin, and above-mentioned metal level is by planarization in fact.

12. slice for electromagnetic wave shielding according to claim 11, it is characterized in that above-mentioned resin contains the colour correction of light of visible waveband of absorbing wavelength 570-605nm with the near infrared ray absorption of the light of the near infrared band of light light absorbers and/or absorbing wavelength 800-1100nm.

13. slice for electromagnetic wave shielding according to claim 11, it is characterized in that the colour correction of light of visible waveband that absorbing wavelength 570-605nm is set is with the near infrared ray absorption layer of the light of the near infrared band of light light absorbers layer and/or absorbing wavelength 800-1100nm at least one face of slice for electromagnetic wave shielding.