CN100375349C - 半导体激光元件及其制造方法 - Google Patents

半导体激光元件及其制造方法 Download PDF

Info

Publication number
CN100375349C
CN100375349C CNB2005101202196A CN200510120219A CN100375349C CN 100375349 C CN100375349 C CN 100375349C CN B2005101202196 A CNB2005101202196 A CN B2005101202196A CN 200510120219 A CN200510120219 A CN 200510120219A CN 100375349 C CN100375349 C CN 100375349C
Authority
CN
China
Prior art keywords
layer
waveguide area
ridge
waveguide
type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB2005101202196A
Other languages
English (en)
Chinese (zh)
Other versions
CN1783606A (zh
Inventor
松村拓明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nichia Corp
Nichia Chemical Industries Ltd
Original Assignee
Nichia Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nichia Chemical Industries Ltd filed Critical Nichia Chemical Industries Ltd
Publication of CN1783606A publication Critical patent/CN1783606A/zh
Application granted granted Critical
Publication of CN100375349C publication Critical patent/CN100375349C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Semiconductor Lasers (AREA)
CNB2005101202196A 2000-06-08 2001-04-25 半导体激光元件及其制造方法 Expired - Fee Related CN100375349C (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000172797 2000-06-08
JP2000172797 2000-06-08
JP2001116197 2001-04-13

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CNB018108644A Division CN1251372C (zh) 2000-06-08 2001-04-25 半导体激光元件及其制造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN2006100958321A Division CN1877934B (zh) 2000-06-08 2001-04-25 半导体激光元件的制造方法

Publications (2)

Publication Number Publication Date
CN1783606A CN1783606A (zh) 2006-06-07
CN100375349C true CN100375349C (zh) 2008-03-12

Family

ID=35851438

Family Applications (2)

Application Number Title Priority Date Filing Date
CNB2005101202196A Expired - Fee Related CN100375349C (zh) 2000-06-08 2001-04-25 半导体激光元件及其制造方法
CN2006100958321A Expired - Fee Related CN1877934B (zh) 2000-06-08 2001-04-25 半导体激光元件的制造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN2006100958321A Expired - Fee Related CN1877934B (zh) 2000-06-08 2001-04-25 半导体激光元件的制造方法

Country Status (2)

Country Link
CN (2) CN100375349C (ru)
RU (1) RU2262171C2 (ru)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111106534B (zh) * 2019-10-30 2020-11-27 华灿光电股份有限公司 激光二极管及其制作方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06260727A (ja) * 1993-01-07 1994-09-16 Nec Corp 光半導体素子およびその製造方法
JPH07174931A (ja) * 1993-12-20 1995-07-14 Nec Corp 半導体光導波路およびその製造方法
EP0729042A1 (fr) * 1995-02-22 1996-08-28 Alcatel N.V. Guide optique segmenté pouvant notamment être inclus dans un dispositif semiconducteur
JPH08307009A (ja) * 1987-08-04 1996-11-22 Sharp Corp 半導体レーザ素子
JP2000031599A (ja) * 1998-07-14 2000-01-28 Sony Corp 窒化物系iii−v族化合物半導体レーザ
JP3031415B1 (ja) * 1998-10-06 2000-04-10 日亜化学工業株式会社 窒化物半導体レーザ素子

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08307009A (ja) * 1987-08-04 1996-11-22 Sharp Corp 半導体レーザ素子
JPH06260727A (ja) * 1993-01-07 1994-09-16 Nec Corp 光半導体素子およびその製造方法
JPH07174931A (ja) * 1993-12-20 1995-07-14 Nec Corp 半導体光導波路およびその製造方法
EP0729042A1 (fr) * 1995-02-22 1996-08-28 Alcatel N.V. Guide optique segmenté pouvant notamment être inclus dans un dispositif semiconducteur
JP2000031599A (ja) * 1998-07-14 2000-01-28 Sony Corp 窒化物系iii−v族化合物半導体レーザ
JP3031415B1 (ja) * 1998-10-06 2000-04-10 日亜化学工業株式会社 窒化物半導体レーザ素子

Also Published As

Publication number Publication date
RU2262171C2 (ru) 2005-10-10
CN1783606A (zh) 2006-06-07
CN1877934A (zh) 2006-12-13
CN1877934B (zh) 2011-07-27

Similar Documents

Publication Publication Date Title
TW490898B (en) Semiconductor laser device
KR100683877B1 (ko) 질화물 반도체 레이저소자
US8062959B2 (en) Method of manufacturing semiconductor element
US8306085B2 (en) Nitride compound semiconductor element and method for manufacturing same
WO2002103865A1 (fr) Dispositif laser a semi-conducteur et procede de production
TW200828707A (en) Multiwavelength semiconductor laser array and method of manufacturing the same
JP3716974B2 (ja) 半導体レーザ素子及びその製造方法
CN101471536B (zh) 氮化物半导体激光器芯片及其制造方法
EP2790279A1 (en) Method for manufacturing semiconductor laser element, and semiconductor laser element
JP3671807B2 (ja) レーザ素子
CN100375349C (zh) 半导体激光元件及其制造方法
US7263114B2 (en) Semiconductor laser diode
JP4959644B2 (ja) 半導体レーザ素子、半導体ウェハおよび半導体レーザ素子の製造方法
JP4127269B2 (ja) レーザ素子
JP5010096B2 (ja) 窒化物半導体レーザ素子及びそれを用いたld装置
US20240178638A1 (en) Semiconductor laser diode array and the method for manufacturing a two-dimensional semiconductor laser diode array
JP3849876B2 (ja) 半導体レーザ素子及びその製造方法
KR200318416Y1 (ko) 질화물 반도체 레이저 소자
JP2000216490A (ja) 半導体レ―ザ
JP2008166835A (ja) 窒化物半導体レーザ素子の製造方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20080312

Termination date: 20200425

CF01 Termination of patent right due to non-payment of annual fee