CL2014003397A1 - Composición química libre de cianuros para recubrir de manera in situ superficies metálicas; y metodo para recubrir de manera in situ superficies metalicas de manera autocatalitica. - Google Patents
Composición química libre de cianuros para recubrir de manera in situ superficies metálicas; y metodo para recubrir de manera in situ superficies metalicas de manera autocatalitica.Info
- Publication number
- CL2014003397A1 CL2014003397A1 CL2014003397A CL2014003397A CL2014003397A1 CL 2014003397 A1 CL2014003397 A1 CL 2014003397A1 CL 2014003397 A CL2014003397 A CL 2014003397A CL 2014003397 A CL2014003397 A CL 2014003397A CL 2014003397 A1 CL2014003397 A1 CL 2014003397A1
- Authority
- CL
- Chile
- Prior art keywords
- situ
- metal surfaces
- coating metal
- cyanide
- chemical composition
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/54—Contact plating, i.e. electroless electrochemical plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/46—Electroplating: Baths therefor from solutions of silver
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CL2014003397A CL2014003397A1 (es) | 2014-12-12 | 2014-12-12 | Composición química libre de cianuros para recubrir de manera in situ superficies metálicas; y metodo para recubrir de manera in situ superficies metalicas de manera autocatalitica. |
PCT/CL2015/000064 WO2016090512A1 (es) | 2014-12-12 | 2015-12-11 | Composición química para recubrir superficies metálicas |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CL2014003397A CL2014003397A1 (es) | 2014-12-12 | 2014-12-12 | Composición química libre de cianuros para recubrir de manera in situ superficies metálicas; y metodo para recubrir de manera in situ superficies metalicas de manera autocatalitica. |
Publications (1)
Publication Number | Publication Date |
---|---|
CL2014003397A1 true CL2014003397A1 (es) | 2015-08-07 |
Family
ID=56106383
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CL2014003397A CL2014003397A1 (es) | 2014-12-12 | 2014-12-12 | Composición química libre de cianuros para recubrir de manera in situ superficies metálicas; y metodo para recubrir de manera in situ superficies metalicas de manera autocatalitica. |
Country Status (2)
Country | Link |
---|---|
CL (1) | CL2014003397A1 (es) |
WO (1) | WO2016090512A1 (es) |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4944985A (en) * | 1988-04-11 | 1990-07-31 | Leach & Garner | Method for electroless plating of ultrafine or colloidal particles and products produced thereby |
US5036031A (en) * | 1989-05-16 | 1991-07-30 | Patterson James A | Metal plated microsphere catalyst |
US5158604A (en) * | 1991-07-01 | 1992-10-27 | Monsanto Company | Viscous electroless plating solutions |
US6319543B1 (en) * | 1999-03-31 | 2001-11-20 | Alpha Metals, Inc. | Process for silver plating in printed circuit board manufacture |
US5945158A (en) * | 1996-01-16 | 1999-08-31 | N.V. Union Miniere S.A. | Process for the production of silver coated particles |
JP2006514713A (ja) * | 2002-09-20 | 2006-05-11 | ノーブル ファイバ テクノロジーズ,インク. | 改良された銀メッキ方法及びその方法により形成された物品 |
KR101413812B1 (ko) * | 2011-03-29 | 2014-06-30 | 신닛테츠스미킨 카부시키카이샤 | 표면 처리 강판 및 그 제조 방법 |
CL2012002949A1 (es) * | 2012-10-22 | 2013-05-17 | Moreno Eugenio Lizama | Solucion en gel para recubrimientos electroliticos metalicos, que permite el deposito de metales que contiene dioxido de silicio coloidal como agente gelificante, cianuro de plata y cianuro de potasio. |
-
2014
- 2014-12-12 CL CL2014003397A patent/CL2014003397A1/es unknown
-
2015
- 2015-12-11 WO PCT/CL2015/000064 patent/WO2016090512A1/es active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2016090512A1 (es) | 2016-06-16 |
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CL2014003397A1 (es) | Composición química libre de cianuros para recubrir de manera in situ superficies metálicas; y metodo para recubrir de manera in situ superficies metalicas de manera autocatalitica. |