CH715925A2 - Cladding element or watch or jewelery dial in conductive material. - Google Patents

Abstract

The invention relates to a method of manufacturing a watch component in conductive material: - a base (1) in conductive material is produced; - It is covered with a first layer (2) of sacrificial metallic protective material; - We engrave a hollow decoration (3), mechanically or by means of a laser; - the first hollow decoration (3) and the remaining part of the first layer (2) are covered with a second layer (4) of metallic and / or colored decorative treatment material; - The first layer (2) is chemically removed to obtain a blank (10) comprising a first decoration formed by the remaining part of the second layer (4).

Description

Field of the invention

The invention relates to a method of manufacturing a cover element or a clock face or jewelry in conductive material.

[0002] The invention also relates to a watch comprising a covering element and / or a dial produced by this method.

[0003] The invention relates to the field of trim or display components for watchmaking, and the field of jewelry.

Background of the invention

For the manufacture of two-tone components, a process is known which consists of: <tb> <SEP> - apply a sacrificial protective layer (photosensitive resin, varnish, adhesive, polymer film) over the entire surface of a blank; <tb> <SEP> - selectively attack the protective layer, with possible etching of the substrate; <tb> <SEP> - carry out a decorative treatment (electroplating, vacuum deposition, varnish, lacquer); <tb> <SEP> - remove the protective layer (chemical attack, dissolution, ion bombardment, mechanical action).

[0005] Excluding the use of photosensitive resin, the definition of the contours is not very good.

[0006] In addition, the material of the sacrificial protective layer may exhibit a degassing phenomenon during a subsequent passage under vacuum, in particular to carry out the decorative treatment by metallization.

[0007] The document JP H05 156425 A in the name of SEIKO EPSON Corp. describes the formation of a hollow letter, or more generally of a pattern, covered with a colored film, on the surface of a base material such as a sintered hard alloy, a platinum or gold alloy white, ceramic, by a dry film forming process. The surface of the material is coated with a colored film as the first layer, an indentation having a depth greater than the thickness of the first layer is formed on the relevant part by laser beam machining, the colored film having a composition different from that of the first layer is applied as a second layer by a dry film forming process, then the first layer and the second layer, outside the area with the pattern, are discharged.

[0008] Document EP 3,067,220 A1 in the name of ROLEX describes a process for decorating a timepiece element, with a deep engraving of a surface to be decorated of the element by a femtosecond laser; and a surface structuring of this surface to be decorated of the watch element, these two decorations being at least partially superimposed on one another.

Summary of the invention

[0009] The invention proposes to develop a method of manufacturing a covering element or a clockwork or jewelry dial made of a conductive material, in particular ceramic or the like, making it possible to obtain decorations engraved metallic and / or colored.

[0010] To this end, the invention relates to a method according to claim 1.

[0011] The invention also relates to a watch comprising a covering element or / and a dial produced by this method.

The proposed procedure allows obtaining high definition decorations on conductive substrates, such as ceramic, sapphire, glass, or the like.

[0013] In addition, the invention makes it possible to dispense with the use of organic protective layers which could exhibit degassing during a subsequent passage under vacuum for metallization.

Finally, the solution presented does not require the acquisition of expensive photolithography equipment (spin coater, mask aligner, yellow room), and can be produced with standard mechanical engraving equipment, or more particularly laser engraving.

Brief description of the drawings

Other characteristics and advantages of the invention will become apparent on reading the detailed description which follows, with reference to the accompanying drawings, where: <tb> <SEP> - Figure 1 shows, schematically and in section, an operating sequence of an elementary cycle of the method according to the invention, comprising the production of a base, its cover with a first protective layer sacrificial metallic, the etching of a decoration, the deposition of a second layer of metallic or / and colored decorative treatment, and the elimination of the first sacrificial metallic protective layer; <tb> <SEP> - FIG. 2 represents, in a manner similar to FIG. 1, the single etching step in which all the etchings reach the substrate of the base; <tb> <SEP> - Figure 3 shows, similarly to Figure 1, an optional step of mechanical leveling of the first sacrificial metallic protection layer, and of the second decorative treatment layer, before the removal of the first sacrificial metallic protective layer; <tb> <SEP> - Figure 4 shows, similarly to Figure 3, an optional step of mechanical leveling of the second decorative treatment layer, after removal of the first sacrificial metallic protection layer; <tb> <SEP> - Figure 5 shows, similarly to Figure 1, the single step of depositing a first sacrificial metallic protection layer ,, with two superimposed sacrificial metallic protection layers; <tb> <SEP> - FIG. 6 represents, in a manner similar to FIG. 1, the single step of depositing a second layer of metallic or / and colored decorative treatment, with two superimposed layers of decorative treatment; <tb> <SEP> - FIG. 7 represents an engraving detail comprising conical engravings, alone or superimposed, and engravings of pyramidal type, alone or superimposed; <tb> <SEP> - figure 8 represents, similarly to figure 1, a sequence in nine operations for the manufacture of a component comprising two different decorations, where, in the first five operations, a blank is produced successively as in FIG. 1, then this blank is covered, here in a particular variant with first a layer deposited by dry void, then a layer deposited electrolytically or galvanically, then a second intaglio etching is carried out before cover everything with a surface layer, then remove the sacrificial metallic protection layers to reveal the decorations; <tb> <SEP> - FIG. 9 represents, in a manner similar to FIG. 1, a variant of the second intaglio engraving of FIG. 8, in which this engraving is carried out with straight edges; <tb> <SEP> - Figure 10 shows, similarly to Figure 1, a variant of Figure 9 with a final leveling or surface polishing; <tb> <SEP> - FIG. 11 represents a watch comprising a bezel and a ceramic dial produced and decorated by the method according to the invention.

Detailed description of the preferred embodiments

The invention relates to a method of manufacturing a watch component made of a conductive material, in particular a covering element or of a dial, according to which an elementary cycle is carried out at least once comprising, in this order, the following steps: <tb> <SEP> - in an initial step 100, a base 1 is produced in a substrate made of a conductive material, which is either metallic, or ceramic or organic, or composite, by defining an upper level 101 of the base 1; <tb> <SEP> - in a first covering operation 200, the base 1 is covered, in particular but not limited to by a dry process, with at least a first layer 2 of a first sacrificial metallic protective material; <tb> <SEP> - in a first etching operation 300, the etching of a first hollow decoration 3 is carried out, with a depth at least equal to the local thickness of the first layer 2 of sacrificial metallic protection, or mechanically or by means of a laser, or by means of an ultrashort pulse laser, picolaser or femtolaser type; <tb> <SEP> - in a second covering operation 400, the first hollow decoration 3 and the remaining part of the first layer 2 of sacrificial metal protection are covered, in particular but not limited to by dry process, with at least a second layer 4 of a second material for metallic decorative treatment or / and colored decorative treatment, to produce a first intermediate compound 5; <tb> <SEP> - in a first chemical removal operation 500, each first layer 2 of sacrificial metallic protection is removed, in particular by chemical means, to obtain a first blank 10 comprising a first decoration formed by the remaining part of the second layer 4, and the watch component is produced either directly in the form of the first blank 10, or by a completion of the first blank 10.

More particularly, during the first covering operation 200, the covering is carried out with a first thickness greater than 50 nanometers.

In a variant, during the first covering operation 200, the base 1 is covered by dry route with at least a first layer 2 of sacrificial metallic protection. More particularly, the first covering is carried out by the dry route by PVD OR CVD OR ALD deposition under vacuum.

In another variant, during the first covering operation 200, the base 1 is electrolytically or electrochemically covered with at least a first layer 2 of sacrificial metallic protection.

More particularly, during the second covering operation 400 with at least a second layer 4 of metallic or / and colored decorative treatment, the covering is carried out with a second thickness of between 50 nanometers and 1,000 nanometers.

In a variant, during the second covering operation 400, the base 1 is covered by dry process with at least a second layer 4 of metallic decorative treatment or / and of colored decorative treatment. More particularly, the second coating operation 400 is carried out by the dry route by PVD OR CVD OR ALD deposition under vacuum.

In another variant, during the second covering operation 400, the base 1 is electrolytically or electrochemically covered with at least one second layer 4 of metallic decorative treatment or / and colored decorative treatment.

[0023] In particular, during the etching operation 300 of a first hollow decoration 3, the etching is carried out everywhere up to the substrate of the base 1.

More particularly, during the first covering operation 200, the first covering is carried out with a first thickness which is greater than or equal to the difference between, on the one hand, a second thickness of a second layer 4 of metallic decorative treatment or / and colored to be applied during step 400 of covering the first recessed decoration 3 and the remaining part of the first layer 2 of sacrificial metallic protection, and on the other hand the depth of etching in the substrate of the base 1 during the engraving operation 300 of a first hollow decoration 3.

More particularly, during the etching operation 300, the etching is carried out in the form of a juxtaposition of conical or deep pyramidal cups.

More particularly, during the etching operation 300, the etching is carried out with a depth in the base 1 of between 20 nanometers and the total thickness of the base 1.

[0027] In a variant, during the first covering operation 200, the covering is carried out at least partially by the dry route, or entirely by the dry route, with superposition of several first layers 2, 21, 22, of a different nature.

In another variant, during the first covering operation 200, the covering is carried out at least partially electrolytically or electrochemically, or entirely by electrolytic or electrochemical means, with superposition of several first layers 2, 21, 22 , different in nature.

In yet another variant, the deposition of certain layers is carried out by the dry route, and of certain other layers by the electrolytic or electrochemical route.

In a particular variant, as can be seen in FIG. 6, during step 400 of covering the hollow decoration 3 and the remaining part of said first layer 2 of sacrificial metallic protection, by at least a second layer 4 of metallic or / and colored decorative treatment, the covering is carried out with superposition of several second layers 4 of different nature, 41, 42.

In a variant, during the second covering operation 400, the covering is carried out at least partially by the dry route, or entirely by the dry route, with superposition of several second layers 4, 41, 42, of a different nature.

In another variant, during the second covering operation 400, the covering is carried out at least partially electrolytically or electrochemically, or entirely by electrolytic or electrochemical route, with superposition of several second layers 4, 41, 42 , different in nature.

In yet another variant, the deposition of certain layers is carried out by the dry route, and of certain other layers by the electrolytic or electrochemical route.

More particularly, one carries out the superposition of several second layers 4, 41, 42, with at least one chromium layer 41 of 50 to 250 nanometers and a gold layer 42 of 50 to 150 nanometers. More particularly, the deposition is carried out by superimposing a layer of chromium approximately 200 nanometers thick, and a layer of gold approximately 100 nanometers thick.

Figure 1 shows a variant 410, less easy to perform, where the operation 400 is modified by depositing the second decorative treatment layer flush with the first layer 2 of sacrificial metal protection.

For a particular application of producing metallized and / or colored etched conductive dials, an advantageous operating sequence of the invention comprises particular parameters: <tb> <SEP> - 200: laying of a sacrificial metallic protective layer: preferably but not limited to aluminum, or chromium, or copper. This sacrificial metallic protective layer can be produced by the dry process, more particularly by PVD, CVD, ALD, or similar deposition; it can also be produced by electrolytic or electrochemical treatment, or the like. <tb> <SEP> - 300: engraving of the decoration with a laser, or with an ultrashort pulse laser, type picolaser or femtolaser of the decoration, or with a nanolaser, even an attolaser at the other extreme, with selective ablation of the sacrificial metallic protective layer 2, and possibly etching of the substrate 1, called lower etching G1, as can be seen in the figures; <tb> <SEP> - 400: decorative metallic treatment (gold, rhodium, chromium, silicon, or other.) or colored (oxides, for example silicon dioxide, or corundum, or other, metallic nitrides and carbides as well as any combination of their stack) produced by the dry route, more particularly PVD, CVD, ALD, or the like, or else produced by electrolytic or electrochemical treatment, or other; <tb> <SEP> - 500: removal of the protective layer by chemical means (alkaline solution of NaOH type for aluminum, but also possibly acid for chromium, or other).

[0037] The choice of materials is directly defined by the constraints of the operating sequence.

In fact, the nature of each sacrificial layer and that of each decorative layer must be chosen so that: <tb> <SEP> - the stripping solution allows the removal of the protective layer without altering the decorative coating; <tb> <SEP> - the protective layer is not altered during engraving, in particular during laser engraving (in particular but not limited to ultrashort pulse type picolaser or femtolaser, but also nanolaser or other), in d '' other place than in the defined engraving zone (possible alteration near the engraving, projection of incandescent particles); <tb> <SEP> - the protective layer must withstand any intermediate cleaning.

The choice, during step 200, of a metallic sacrificial protective layer avoids degassing. In fact, this sacrificial metallic protection is made up of a material which is inert under the conditions of pressure (which can drop down to P = 1.10 <-8> mbar) and temperature (typically T ≤ 300 ° C) encountered during the decorative treatment. of step 400, unlike the lacquers / varnishes used in the prior art, which have the drawback, under these conditions, of degassing and / or partially decomposing, which could disturb the quality and / or the aesthetics of the decorative treatment.

Preferably, before performing step 200 of covering the base 1 with at least a first layer 2 of sacrificial metallic protection, cleaning is carried out: detergent and / or solvent, with / without ultrasound, with / without mechanical stress, with / without temperature, to ensure the cleanliness of the surface and thus ensure the good adhesion of the sacrificial metal protection.

In a particular variant, during the engraving operation 300 of a hollow decoration 3, the etching is carried out everywhere in the substrate of the base 1, as can be seen in FIG. 2.

Of course, the blank should be cleaned after the etching operation, before proceeding with the second decorative treatment deposit, in particular by PVD OR CVD OR ALD. This cleaning is conventional (detergent and / or solvent, with / without ultrasound, with / without mechanical stress, with / without temperature), but it must not alter the sacrificial metallic protection. In particular, in the case where the sacrificial metallic protection comprises aluminum, it is necessary to exclude washing solutions having a too basic pH.

In a variant of the invention, before or after the elimination (in step 500) by chemical means of each first layer 2 of sacrificial metallic protection, the compound thus produced is mechanically leveled (in a step 550) at the level top of the base 1.

In a particular variant, after the covering step 400 where the hollow decoration 3 and the remaining part of the first layer 2 of sacrificial metallic protection have been covered with at least a second layer 4 of metallic decorative treatment or / and colored, the compound thus produced is mechanically leveled in a step 450 at the upper level of the first layer 2 of sacrificial metallic protection.

In another particular variant, before the chemical elimination 500 of each first layer 2 of sacrificial metallic protection, the compound thus produced is mechanically leveled in step 550 at the upper level of the base 1.

In another particular variant, after the chemical elimination 500 of each first layer 2 of sacrificial metallic protection, the compound thus produced is mechanically leveled in step 550 at the upper level of the base 1.

In a variant, during the step 200 of covering the base 1 with at least a first layer 2 of sacrificial metallic protection, this covering is carried out by the dry route by PVD OR CVD OR ALD deposition under vacuum; different methods may also be suitable: vacuum evaporation, vacuum spraying, PECVD, or others. In another variant, this covering is carried out electrolytically or electrochemically.

In a particular variant, during step 200 of covering the base 1 with at least a first sacrificial metallic protective layer 2, this covering is carried out with a first thickness greater than 50 nanometers.

In an advantageous variant, during step 400 of covering the hollow decoration 3 and the remaining part of the first layer 2 of sacrificial metallic protection, by at least a second layer 4 of metallic decorative treatment or / and colorful; this covering can be carried out by the dry route, in particular by PVD deposition under vacuum (different methods may be suitable: evaporation under vacuum, spraying under vacuum, CVD, ALD or others), or else by electrolytic or electrochemical route.

More particularly, during step 400 of covering the hollow decoration 3 and the remaining part of the first layer 2 of sacrificial metallic protection, by at least one second layer 4 of metallic or / and colored decorative treatment, this covering is carried out with a second thickness of between 50 nanometers and 2000 nanometers, more particularly between 50 nanometers and 1000 nanometers.

Preferably, during the step 200 of covering the base 1 with at least a first layer 2 of sacrificial metallic protection, the covering is carried out with a first thickness which is greater than or equal to the difference between, d 'on the one hand a second thickness of a second layer 4 of metallic or / and colored decorative treatment during step 400 of covering the recessed decoration 3 and the remaining part of said first layer 2 of sacrificial metallic protection, and d 'on the other hand the etching depth in the substrate of the base 1 during the etching operation 30 of a hollow decoration 3.

In an advantageous variant embodiment, during step 30 of etching a hollow decoration 3, with a depth at least equal to the local thickness of the first layer 2 of sacrificial metallic protection, the process is carried out. engraving mechanically or by means of a laser, in particular nano-, pico- or femto-laser.

As an alternative to the invention, it is possible, according to a similar procedure, to carry out this etching by different means, alone or in combination: laser, tool machining, ion bombardment, chemical attack, or the like.

In a particular variant, during step 300 of etching a hollow decoration 3, with a depth at least equal to the local thickness of the first layer 2 of sacrificial metallic protection, the etching is carried out under form of a juxtaposition of deep conical or pyramidal bowls.

More particularly, this etching 300 is carried out with a depth in the base 1 of between 20 nanometers and the total thickness of the base 1. One can, thus, for example, hollow out a very deep conical bowl over any the thickness of a dial, for example to a thickness of the order of a millimeter.

More particularly, for other applications, in particular display, a laser engraving is carried out, substantially flat, approximately 20 μm deep.

In another variant, a deeper laser engraving is carried out, for example to define a cuvette, or even a bevelled date window, or the like. The invention allows the very fine production of such a two-tone beveled window, excessively difficult to achieve by other means.

In a particular variant, as can be seen in FIG. 5, during the step 200 of covering the base 1 with at least one first layer 2 of sacrificial metallic protection, the covering is carried out with superposition of several firsts layers 2 of different nature 21, 22.

The choice of materials that can be used is quite wide: <tb> <SEP> - for the conductive substrate one can use in particular: ceramic, sapphire, glass, organic glass, plastic, enamel, at least partially amorphous material: <tb> <SEP> - for sacrificial metallic protection, for example aluminum or chromium: <tb><SEP> <SEP> o for a sacrificial metallic protection comprising aluminum, a decorative treatment may include: Au, Cr, Rh, Ti, Si, and / or alloys and / or oxides and / or nitrides and / or carbides and / or combinations of these metals; <tb><SEP> <SEP> o for a sacrificial metallic protection comprising chromium, a decorative treatment may include: Au, Rh, Ti, Si, and / or alloys and / or oxides and / or nitrides and / or carbides and / or combinations of these metals.

In a variant, after the first chemical removal operation 500, in a third covering operation 600, the first blank 10 is covered by a galvanic process with at least one surface layer 7 of the first metallic protective material sacrificial or other sacrificial metallic shielding material. The galvanic process however needs to be applied to a conductive substrate.

In another variant, after the first chemical removal operation 500, in a third covering operation 600 is covered by the dry route, more particularly by PVD, CVD, ALD, or similar deposition, the first blank 10 of at least a third layer 6 of the first sacrificial metallic protective material, or of another sacrificial metallic protective material. This method of covering is independent of the nature of the substrate.

In yet another variant, during the covering operation 600, after having created such a third layer 6, the third layer 6 is then covered by a galvanic process with at least one surface layer 7 of the first material protective metallic shield, or sacrificial metallic shielding material of the third layer 6, or other sacrificial metallic shielding material. The choice of a third conductive layer 6 allows the application of the galvanic process for constituting the surface layer 7. Nothing prevents the material of the third layer 6 from being the same as that of the surface layer 7, for example of copper.

More particularly, is carried out, after the third covering operation 600, a second engraving operation 700 in which is carried out, mechanically or by means of a laser, the engraving of a second hollow decoration 8, with a depth at least equal to the cumulative thickness of the layers deposited during the third covering operation 600, on the first blank 10, to produce a second intermediate compound 15.

More particularly still, is carried out, after this second etching operation 700, a fourth covering operation 800, during which the second hollow decoration 8 and the outermost surface of the second intermediate compound 15 are covered, with at at least a fifth layer 9 of a fifth material for metallic decorative treatment or / and colored decorative treatment, to obtain a third intermediate compound 16.

More particularly still, is carried out, after this fourth covering operation 800, a second chemical removal operation 900, by which each sacrificial metallic protective layer is chemically removed, to obtain a second blank 20 comprising the first decoration formed by the remaining part of the second layer 4, and a second decoration formed by the remaining part of the fifth layer 9, and the watch component is produced either directly in the form of this second blank 20, or by a completion of this second blank 20.

More particularly, we choose at least a sixth metal decorative treatment material or / and colored decorative treatment, and we reiterate, for the production of the blank, with the same sacrificial metal protection materials or others analogous sacrificial metallic shielding materials, the sequence combining the third covering operation 600, the second etching operation 700, the fourth covering operation 800, and the second chemical removal operation 900, to perform at least one further decor in addition to the first decor and the second decor.

More particularly, is carried out, after the fourth covering operation 800 and before the second chemical removal operation 900, an intermediate etching operation 810 during which the etching is carried out, mechanically or by means of a laser. of a third hollow decoration 81.

More particularly, before or after a chemical removal operation of a sacrificial metallic protective layer, a mechanical leveling operation 550 or 910 is carried out, during which the compound thus produced is mechanically leveled at the upper level 101 of the base 1, or below this upper level 101, to produce an appearance surface at the upper level 411 of the remaining part of the component. More particularly, after the completion of the first elementary cycle and a cleaning, at least one other elementary cycle is carried out with parameters modified for the engraving operation and / or for the choice of the decorative treatment.

The invention lends itself particularly well to the preferred case where, during the production step 100 of the base 1, a ceramic substrate is used.

More particularly, at least one sacrificial metallic protection material is used which is copper or aluminum or gold or platinum.

More particularly, the watch component is manufactured to form a covering element or a dial.

[0072] Thus, more particularly, the method according to the invention is well suited to the manufacture of a covering element such as a box, a bezel, a flange, or a watch or jewelry dial. , or else a jewelry component, for example a bracelet or jewelry element, made of a conductive material, in particular ceramic or the like, making it possible to obtain metallized and / or colored engraved decorations.

The invention makes it possible to produce two-color or multi-color components.

Indeed, one can perform an iteration of the process, with different engraved decorations, or / and different decorative treatments.

Thus, after the execution of phase 500 and completion of a first elementary cycle, and after cleaning, at least one other elementary cycle can be carried out with parameters modified for the etching operation and / or for the choice of decorative treatment.

It is therefore possible, without limiting the number of iterations, to start over, with modified parameters, the entire operating sequence of the elementary cycle with: <tb> <SEP> - sacrificial metallic protection deposit; <tb> <SEP> - etching of another decoration, for example elsewhere on the substrate and / or partially on an etching already carried out in a previous phase; <tb> <SEP> - deposit of another decorative treatment; <tb> <SEP> - dissolution of the sacrificial metallic shield.

This cycle can be repeated several times to obtain multicolored components, for example having parts of different appearance in Au, Ti, Si, Rh, or others.

A particular texture of the engraving can also make it possible to obtain a particular visual appearance, depending on the roughness, the density and the depth of the engraving, which determine reflections or a particular rendering of the decorative treatment applied, for example satin. , semi-mat, gloss, or other.

The invention also relates to a watch 1000, which comprises a covering element 110, such as a bezel, box, or the like, in particular in ceramic, or / and which comprises a dial 120, in particular in ceramic, produced by the method according to the invention.

This procedure makes it possible to dispense with the use of costly photolithography equipment to obtain decorations of very good definition.

In addition, the use of a metallic sacrificial protective layer makes it possible to avoid any problematic degassing during the preferred vacuum treatment for the application of the metallic and / or colored decorative treatment layer.

The invention lends itself well to the decoration of conductive dials (ceramic, enamel, sapphire, plastic, or other), crystals (glass, sapphire, or other), plastic components, watch cases, cases, glasses, crowns, and more. The quality, finesse and contrast of the decorations, which can be made in precious metals, allow a decoration of great finesse compatible with luxury watchmaking, and in particular the decoration of complication elements, such as phase indicators, for example. moonlight at high resolution. The reasonable cost of the implementation of the method also allows its use for components of watches or jewelry of wider distribution.

Naturally, the invention is advantageous, not only for timepiece or jewelry components, but also for jewelry or jewelry components, even eyewear or fashion items.

Indeed, the invention makes it possible to modify and significantly enrich the appearance of components directly visible to the user, with innovative decorations, and participates in the promotion of the brand and the product. More particularly, the invention can be used for identification markings and / or anti-counterfeiting markings.

Claims (32)

1. A method of manufacturing a watch component made of a conductive material, in particular a covering element or of a dial, characterized in that an elementary cycle is carried out at least once comprising, in this order, the following steps: - in an initial step (100) a base (1) is produced in a substrate of conductive material, which is either metallic, or ceramic or organic, or composite, by defining an upper level (101) of said base (1) ; - in a first covering operation (200) said base (1) is covered with at least a first layer (2) of a first sacrificial metallic protective material; - in a first etching operation (300) is carried out the etching of a first hollow decoration (3), with a depth at least equal to the local thickness of said first layer (2) of sacrificial metallic protection, mechanically or by means of a laser, or by means of an ultrashort pulse laser, picolaser or femtolaser type; - in a second covering operation (400), said first hollow decoration (3) and the remaining part of said first layer (2) of sacrificial metallic protection are covered, with at least a second layer (4) of a second material metallic decorative treatment or / and colored decorative treatment, to produce a first intermediate compound (5); - in a first chemical removal operation (500) each said first layer (2) of sacrificial metallic protection is chemically removed, to obtain a first blank (10) comprising a first decoration formed by the remaining part of said second layer (4), and in that said watch component is produced either directly in the form of said first blank (10), or by a completion of said first blank (10). 2. Method according to claim 1, characterized in that, during said first covering operation (200), said covering is carried out with a first thickness greater than 50 nanometers. 3. Method according to claim 1 or 2, characterized in that, during said first covering operation (200), said base (1) is covered by dry process with at least one said first layer (2) of metallic protection. sacrificial. 4. Method according to claim 3, characterized in that said first covering is carried out by the dry route by PVD OR CVD OR ALD deposition under vacuum. 5. Method according to claim 1 or 2, characterized in that, during said first covering operation (200), said base (1) is electrolytically or electrochemically covered with at least one said first layer (2) of sacrificial metal protection. 6. Method according to one of claims 1 to 5, characterized in that, during said second covering operation (400) by at least a second layer (4) of metallic or / and colored decorative treatment, said covering is carried out. with a second thickness between 50 nanometers and 1,000 nanometers. 7. Method according to one of claims 1 to 6, characterized in that, during said second covering operation (400), said base (1) is covered by dry process with at least one said second layer (4). metallic decorative treatment or / and colored decorative treatment. 8. The method of claim 7, characterized in that said second coating operation (400) is carried out by dry process by PVD OR CVD OR ALD deposition under vacuum. 9. Method according to one of claims 1 to 6, characterized in that, during said second covering operation (400), said base (1) is electrolytically or electrochemically covered with at least one said second layer ( 4) metallic decorative treatment or / and colored decorative treatment. 10. Method according to one of claims 1 to 9, characterized in that, during said etching operation (300) of said first intaglio decoration (3), said etching is carried out everywhere up to said substrate of said substrate. base (1). 11. Method according to one of claims 1 to 10, characterized in that, during the first covering operation (200), said first covering is carried out with a first thickness which is greater than or equal to the difference between, of a starts with a second thickness of a second layer (4) of metallic or / and colored decorative treatment to be applied during the step (400) of covering said first hollow decoration (3) and said remaining part of said first layer ( 2) of sacrificial metallic protection, and on the other hand the depth of etching in the substrate of said base (1) during said operation of etching (300) of said first hollow decoration (3). 12. Method according to one of claims 1 to 11, characterized in that, during said etching operation (300), said etching is carried out in the form of a juxtaposition of conical or deep pyramidal cups. 13. Method according to one of claims 1 to 12, characterized in that during said etching operation (300), said etching is carried out with a depth in said base (1) of between 20 nanometers and the total thickness of said base (1). 14. Method according to one of claims 1 to 13, characterized in that, during said first covering operation (200), said covering is carried out at least partially by the dry route, or entirely by the dry route, with superposition of several said first layers (2; 21; 22) of different nature. 15. Method according to one of claims 1 to 13, characterized in that, during said first covering operation (200), said covering is carried out at least partially electrolytically or electrochemically, or entirely by electrolytic or electrochemical route. , with superposition of several said first layers (2; 21; 22) of different nature. 16. Method according to one of claims 1 to 15, characterized in that, during said second covering operation (400), said covering is carried out at least partially by the dry route, or entirely by the dry route, with superposition of several said second layers (4; 41; 42) of different nature. 17. Method according to one of claims 1 to 15, characterized in that, during said second covering operation (400), said covering is carried out at least partially electrolytically or electrochemically, or entirely by electrolytic or electrochemical route. , with the superposition of several said second layers (4; 41; 42) of different nature. 18. The method of claim 16 or 17, characterized in that said superposition of several said second layers (4; 41; 42) is carried out with at least one chromium layer (41) of 50 to 250 nanometers and a layer of 'gold (42) from 50 to 150 nanometers. 19. Method according to one of claims 1 to 14, characterized in that, after said first chemical removal operation (500), in a third covering operation (600), said first blank is covered by a galvanic process. (10) at least one surface layer (7) of said first sacrificial metallic shielding material or other sacrificial metallic shielding material. 20. Method according to one of claims 1 to 14, characterized in that, after said first chemical removal operation (500), in a third covering operation (600), said first blank is covered by the dry route ( 10) at least a third layer (6) of said first sacrificial metallic protective material or of another sacrificial metallic protective material. 21. The method of claim 20, characterized in that, during said covering operation (600), after having created said third layer (6), then covered, by a galvanic process, said third layer (6) by au at least one surface layer (7) of said first sacrificial metallic shielding material or of the sacrificial metallic shielding material of said third layer (6), or other sacrificial metallic shielding material. 22. Method according to one of claims 19 to 21, characterized in that one carries out, after said third covering operation (600), a second engraving operation (700) in which is carried out, mechanically or by means of a laser, the etching of a second hollow decoration (8), with a depth at least equal to the cumulative thickness of the layers deposited during said third covering operation (600), on said first blank (10), for making a second intermediate compound (15). 23. The method of claim 22, characterized in that one carries out, after said second engraving operation (700), a fourth covering operation (800), during which said second hollow decoration (8) is covered and outermost surface of said second intermediate compound (15), with at least a fifth layer (9) of a fifth material for metallic decorative treatment or / and colored decorative treatment. 24. The method of claim 23, characterized in that one carries out, after said fourth covering operation (800), a second chemical removal operation (900) by which each sacrificial metallic protective layer is chemically removed, to obtain a second blank (20) comprising said first decoration formed by the remaining part of said second layer (4), and a second decoration formed by the remaining part of said fifth layer (9), and in that said watch component either directly in the form of said second blank (20), or by a completion of said second blank (20). 25. The method of claim 24, characterized in that at least a sixth metal decorative treatment material or / and colored decorative treatment is chosen, and in that it reiterates, for its realization, with the same metallic protection materials. sacrificial or other similar sacrificial metallic shielding materials, the sequence combining said third coating operation (600), said second etching operation (700), said fourth coating operation (800), and said second chemical removal operation (900), for the production of at least one other decoration being added to said first decoration and to said second decoration. 26. The method of claim 24 or 25, characterized in that one performs, after said fourth covering operation (800) and before said second chemical removal operation (900), an intermediate etching operation (810) during which is carried out, mechanically or by means of a laser, the engraving of a third hollow decoration (81). 27. Method according to one of claims 1 to 26, characterized in that, before or after an operation of chemical removal of a sacrificial metallic protective layer, a mechanical shaving operation (550; 910) is carried out during from which the compound thus produced is mechanically leveled at said upper level (101) of said base (1) or below said upper level (101) to produce an appearance surface at the upper level (411) of the remaining part of said component. 28. Method according to one of claims 1 to 27, characterized in that, after the completion of the first said elementary cycle and cleaning, at least one other said elementary cycle is carried out with parameters modified for said etching operation and / or for the choice of said decorative treatment. 29. Method according to one of claims 1 to 28, characterized in that, during the production step (100) of said base (1), a ceramic substrate is used. 30. Method according to one of claims 1 to 29, characterized in that at least one sacrificial metallic protective material which is copper or aluminum or gold or platinum. 31. Method according to one of claims 1 to 30, characterized in that said watch component is manufactured to form a cover element or a dial. 32. Watch (1000) comprising at least one horological component produced by the method according to one of claims 1 to 31.